Resin Or Prepolymer Containing Ethylenical Unsaturation Patents (Class 430/286.1)
  • Patent number: 10852637
    Abstract: Provided are a pattern forming method including a step of applying a composition for forming an upper layer film, containing a resin having a C log P(Poly) of 3.0 or more and at least one compound selected from the group consisting of (A1) to (A4) described in the specification onto a resist film to form an upper layer film, a step of exposing the resist film, and a step of developing the exposed resist film with a developer including an organic solvent; a resist pattern formed by the pattern forming method; a method for manufacturing an electronic device, including the pattern forming method; and the composition for forming an upper layer film.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: December 1, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Naoki Inoue, Naohiro Tango, Kei Yamamoto, Michihiro Shirakawa, Akiyoshi Goto
  • Patent number: 10802400
    Abstract: A resist composition comprising a polymer-bound acid generator, i.e., a polymer comprising recurring units derived from a sulfonium or iodonium salt having a brominated linker between a polymerizable unsaturated bond and a fluorosulfonic acid offers a high sensitivity and reduced LWR or improved CDU independent of whether it is of positive or negative tone.
    Type: Grant
    Filed: June 12, 2018
    Date of Patent: October 13, 2020
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi
  • Patent number: 10590308
    Abstract: The present invention relates to an aqueous coating composition system for the treatment of cellulosic articles, which includes a first aqueous composition having a pH of at least 10 and comprises potassium silicate and a penetration aiding agent, wherein the potassium silicate is present in a range of from 1.5 to 32% by weight, the molar ratio of silicon (Si) to potassium (K) of said potassium silicate is 1.2-2.1; and a second aqueous composition comprising an emulsion of at least one alkoxy silane and/or siloxane compound. The present invention further relates to a method for treating cellulosic articles and uses thereof.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: March 17, 2020
    Assignee: SIOO FÄRGKULTUR AB
    Inventors: Herje Boström, Börje Gevert
  • Patent number: 10459339
    Abstract: This resist pattern forming method comprises: a step for coating a substrate with a chemically amplified resist; a subsequent step for forming a latent image of a pattern by exposing the resist film on the substrate; a subsequent step for irradiating the exposed resist film selectively with infrared light from a first heating source having wavelengths 2.0-6.0 ?m; a subsequent step for heating the substrate by means of a second heating source that is different from the first heating source for the purpose of diffusing an acid that is produced in the resist film by exposure; and a subsequent step for forming a pattern of the resist film by supplying a developer liquid to the substrate. Consequently, roughening of sidewalls of the resist pattern can be suppressed.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: October 29, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuo Fukuoka, Yoshio Kimura, Gousuke Shiraishi
  • Patent number: 10416558
    Abstract: A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of specific structure has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: September 17, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Masaki Ohashi
  • Patent number: 10381361
    Abstract: Embodiments of the inventive concepts provide a method for manufacturing a semiconductor device. The method includes forming a stack structure including insulating layers and sacrificial layers which are alternately and repeatedly stacked on a substrate. A first photoresist pattern is formed on the stack structure. A first part of the stack structure is etched to form a stepwise structure using the first photoresist pattern as an etch mask. The first photoresist pattern includes a copolymer including a plurality of units represented by at least one of the following chemical formulas 1 to 3, wherein “R1”, “R2”, “R3”, “p”, “q” and “r” are the same as defined in the description.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: August 13, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Suk Koo Hong, Miyeong Kang, Hyosung Lee, Kyoungyong Cho, Sunkak Jo
  • Patent number: 10196464
    Abstract: Pre-ceramic monomer formulations for creating self-propagating polymer waveguides, and a system and method of using the same, is disclosed. The formulation includes a plurality of unsaturated molecules, wherein the unsaturated molecules contain a significant amount of non-carbon atoms, a molecule having structure of R?—X1-H (e.g., X1=O, S, N), and a photoinitiator. R? can also have non-carbon atoms. The system includes a light source, a reservoir having a monomer formulation and a patterning apparatus configured to guide a light beam from the light source into the pre-ceramic monomer formulation to form at least one self-propagating polymer waveguide and can be directly converted to interconnected three-dimensional ceramics.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: February 5, 2019
    Assignee: HRL Laboratories, LLC
    Inventors: Chaoyin Zhou, Alan J. Jacobsen
  • Patent number: 10151975
    Abstract: A lithographic printing plate precursor includes (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, and (ii) a coating including a photopolymerisable layer, characterised in that the photopolymerisable layer includes a compound including at least one free radically polymerisable group and at least one moiety having a structure according to Formula (I): wherein X represents O or NR* and R* represents hydrogen, an optionally substituted alkyl, aryl, aralkyl or heteroaryl group; and * denotes the linking positions to the rest of the compound.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: December 11, 2018
    Assignee: AGFA NV
    Inventors: Marin Steenackers, Johan Loccufier, Sam Verbrugghe
  • Patent number: 10123948
    Abstract: A dental cement hardened by a cement reaction involving the specific polymerizable polyacidic polymer and optionally additional crosslinkable groups, has reduced shrinkage and improved mechanical properties, in particular with regard to flexural strength and fracture toughness. Moreover, the specific polymerizable polyacidic polymer of the present invention contains a high number of acidic groups which is not reduced by the presence of polymerizable moieties, whereby water solubility of the uncured polymer is not impaired by the presence of the polymerizable moieties.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: November 13, 2018
    Assignee: DENTSPLY SIRONA Inc.
    Inventors: Joachim E Klee, Helmut Ritter, Sven Pohle, Oliver Elsner, Mareike Bardts
  • Patent number: 9993395
    Abstract: A process for producing a water-soluble, hydrolysis-stable, polymerizable polymer, comprising a) a step of copolymerizing a mixture comprising (i) a first copolymerizable monomer comprising at least one optionally protected carboxylic acid group and a first polymerizable organic moiety, and (ii) a second copolymerizable monomer comprising one or more optionally protected primary and/or secondary amino groups and a second polymerizable organic moiety, for obtaining an amino group containing copolymer; b) a step of coupling to the amino group containing copolymer a compound having a polymerizable moiety and a functional group reactive with an amino group of repeating units derived from the second copolymerizable monomer in the amino group containing copolymer obtained in the first step wherein the optionally protected amino group is deprotected, so that polymerizable pendant groups are linked to the backbone by hydrolysis-stable linking groups, and, optionally, a step of deprotecting the protected carboxylic ac
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: June 12, 2018
    Assignee: DENTSPLY SIRONA Inc.
    Inventors: Joachim E. Klee, Helmut Ritter, Maximilliam Maier, Julia Gansel, Andreas Facher, Oliver Elsner, Sven Pohle
  • Patent number: 9960093
    Abstract: Disclosed are a packaging structure, a packaging method and a template used in packaging method. The packaging structure comprises: a substrate; a chip mounted on the substrate; bonding wires for electrically connecting the substrate to the chip; and a protective layer which is formed on the substrate and is used for covering the chip, the bonding wires and bonding pads connected to the bonding wires, the size of the protective layer being smaller than that of the substrate. The packaging structure, the packaging method and the template used in packaging method can solve the problems in the prior art of the great difficulty in designing a mold chase, a complicated molding process, a high manufacturing cost and a high molding material consumption.
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: May 1, 2018
    Assignee: TSINGHUA UNIVERSITY
    Inventors: Qian Wang, Lin Tan, Jian Cai, Yu Chen
  • Patent number: 9851639
    Abstract: A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L?-C(CF3)2(OH). L? is a divalent linking group comprising at least one carbon and the starred bond of L? is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.
    Type: Grant
    Filed: March 31, 2012
    Date of Patent: December 26, 2017
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Robert David Allen, Phillip Joe Brock, Masaki Fujiwara, Kazuhiko Maeda, Hoa D. Truong
  • Patent number: 9782794
    Abstract: Fingerprint-erasing cured films for rendering fingerprint depositions on various surfaces quickly less visible, or invisible; a manufacturing method therefor; a display or touch panel using the same; and electronic devices using these are provided. A liquid coating film including a solvent and a polymerizable resin composition curable by an activating energy beam is formed. In a state of the solvent being included within the film, the film is cured to form a cured film containing the solvent, preferably using a release material whose surface has undergone matte processing; and the solvent is evaporated in a subsequent drying step, whereby a cured film with a multitude of micropores on the surface is formed. Fingerprint soiling is rendered not readily visible or invisible. By using the cured film, there are obtained displays, touch panels, and electronic devices having fingerprint-erasability. To improve fingerprint-erasability, adding a water-absorbent compound to the film composition is preferable.
    Type: Grant
    Filed: February 21, 2014
    Date of Patent: October 10, 2017
    Assignee: TSUJIDEN CO., LTD.
    Inventors: Akira Miyazaki, Yasunori Mori, Koichi Kubo, Haruya Kakuta
  • Patent number: 9788422
    Abstract: The present invention provides a conductive material including: (A) a ?-conjugated polymer, (B) a dopant polymer which contains one or more repeating units selected from “a1” to “a4” respectively represented by the following general formula (1) and has a weight-average molecular weight in the range of 1,000 to 500,000, and (C) one or more metal oxide nanoparticles whose metal oxide is selected from indium-tin oxides, tin oxides, antimony-tin oxides, antimony-zinc oxides, antimony oxides, and molybdenum oxides having a particle diameter of 1 to 200 nm. There can be provided a conductive material that has excellent film-formability and also can form a conductive film having high transparency and conductivity, superior flexibility and flatness when the film is formed from the material.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: October 10, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takayuki Nagasawa
  • Patent number: 9751353
    Abstract: A photocurable relief image printing element is described. The photocurable relief image printing element comprises (a) a support layer; (b) one or more photocurable layers disposed on the support layer, wherein the one or more photocurable layers comprise: (i) a binder; (ii) one or more monomers; (iii) a photoinitiator; and (iv) an additive selected from the group consisting of phosphites, phosphines, thioether amine compounds, and combinations of one or more of the foregoing; (c) a laser ablatable masking layer disposed on the one or more photocurable layers, the laser ablatable masking layer comprising a radiation opaque material; and (d) optionally, a removable coversheet. The photocurable relief image printing element provides improved surface cure in digital relief image printing elements.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: September 5, 2017
    Inventors: Jonghan Choi, Kerry O'Brate
  • Patent number: 9740102
    Abstract: A photoresist composition comprising: a resin (A1) which has an acid-labile group; a resin (A2) which comprises a structural unit represented by formula (I); wherein R1 represents a C1-C13 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1-C6 alkanediyl group, or *-A2-X1-(A3-X2)a-(A4)b-, and R2 represents a C1-C18 hydrocarbon group; and an acid generator.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: August 22, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Shingo Fujita, Koji Ichikawa
  • Patent number: 9709888
    Abstract: A photosensitive resin composition for CTP flexographic printing original plate containing at least a hydrophobic polymer obtained from water-dispersible latex (A), a hydrophilic polymer (B), a photopolymerizable unsaturated compound (C), a photopolymerization initiator (D), and if necessary, rubber (E), characterized in that, the photopolymerizable unsaturated compound (C) comprises a photopolymerizable oligomer containing no hydroxyl group (C-1), a hydroxyl group-containing photopolymerizable monomer having a pentaerythritol skeleton, a dipentaerythritol skeleton or a glycerol skeleton (C-2) and, optionally, a photopolymerizable monomer containing no hydroxyl group (C-3). The content of the hydroxyl group-containing photopolymerizable monomer (C-2) is 1 to 20% by mass of the photosensitive resin composition. The content of the rubber (E) is preferably 0.5 to 15% by mass of the photosensitive resin composition.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: July 18, 2017
    Assignee: TOYOBO CO., LTD.
    Inventors: Hiroto Yamada, Yukimi Yawata, Kazuya Yoshimoto
  • Patent number: 9678429
    Abstract: A method of producing a relief image printing element from a photocurable printing blank. The method includes the steps of a) providing a photocurable printing blank, the photocurable printing blank comprising (i) a backing or support layer; and (ii) one or more photocurable layers disposed on the backing or support layer. The one or more photocurable layers are selectively imaged by exposing the layers to actinic radiation to selectively crosslink and cure portions of the one or more photocurable layers, and then developed to remove uncured portions of the one or more photocurable layers and reveal the relief image therein. The relief image comprises a plurality of relief printing dots, including relief printing dots that have a rounded top and relief printing dots that have a flat top.
    Type: Grant
    Filed: August 18, 2015
    Date of Patent: June 13, 2017
    Inventor: Chouaib Boukaftane
  • Patent number: 9657115
    Abstract: A polymer compound for a conductive polymer including one or more repeating units represented by general formula (1), which has been synthesized by ion-exchange of a lithium salt, sodium salt, potassium salt, or nitrogen compound salt of a sulfonic acid residue, and has a weight average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or methyl group, R2 represents a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms which may have either or both of an ether group and an ester group, and Z represents a phenylene group, naphthylene group, or ester group. There can be provided a polymer compound for a conductive polymer having a specific super strongly acidic sulfo group, which is soluble in an organic solvent, and suitably used for a fuel cell or dopant for a conductive material.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: May 23, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa, Masayoshi Sagehashi
  • Patent number: 9632417
    Abstract: A shrink material is provided comprising a polymer comprising recurring units of formula (1) and a solvent containing an anti-vanishing solvent. A pattern is formed by applying a resist composition comprising a base resin and an acid generator onto a substrate to form a resist film, exposing, developing in an organic solvent developer to form a negative resist pattern, applying the shrink material onto the pattern, and removing the excessive shrink material with an organic solvent for thereby shrinking the size of holes and/or slits in the pattern.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: April 25, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Kentaro Kumaki, Satoshi Watanabe, Daisuke Domon, Jun Hatakeyama
  • Patent number: 9588423
    Abstract: An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4 and R5 each independently represent a monovalent hydrocarbon group, or the like. R6 and R7 each independently represent a monovalent hydrocarbon group, or the like. R8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R9 represents a monovalent hydrocarbon group, or the like. R10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R11 and R12 each independently represent a monovalent hydrocarbon group, or the like. R13 and R14 each independently represent a monovalent hydrocarbon group, or the like.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: March 7, 2017
    Assignee: JSR CORPORATION
    Inventors: Hayato Namai, Norihiko Ikeda
  • Patent number: 9551930
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: January 24, 2017
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • Patent number: 9546859
    Abstract: An electrically responsive composite material (1110) specially adapted for touch screen, comprising a carrier layer (1301) having a length and a width and a thickness (1303) that is relatively small compared to said length and said width. The composite material also comprises a plurality of electrically conductive or semi-conductive particles (201). The particles (201) are agglomerated to form a plurality of agglomerates (104, 1403) dispersed within the carrier layer such that each said agglomerate comprises a plurality of the particles (201). The agglomerates are arranged to provide electrical conduction across the thickness of the carrier layer in response to applied pressure such that the electrically responsive composite material has a resistance that reduces in response to applied pressure.
    Type: Grant
    Filed: March 26, 2012
    Date of Patent: January 17, 2017
    Assignee: Peratech Holdco Limited
    Inventors: Christopher John Lussey, Paul Jonathan Laughlin, Adam Graham, David Bloor, David Lussey
  • Patent number: 9527936
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: December 27, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Patent number: 9493597
    Abstract: The present invention provides a polymer compound which comprises both repeating unit “a” represented by the following general formula (1-1) and repeating unit “b” represented by the following general formula (1-2), and has a weight average molecular weight in the range of 1,000 to 500,000, wherein R1 represents a hydrogen atom or a methyl group, R2 represents a single bond, an ester group, or a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms which may have either or both of an ether group and an ester group, Z represents a phenylene group, a naphthylene group, or an ester group, and “a” and “b” satisfy 0<a<1.0 and 0<b<1.0. There can be provided a polymer compound having a specific super strongly acidic sulfo group, which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: November 15, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa
  • Patent number: 9470977
    Abstract: The present invention has an objective of providing a composition for a lithographic printing plate, which provides an image-forming layer exhibiting superior ink receptivity and uniformity, and in which a coating solution containing the composition possesses a good defoaming property and can effectively form an image-forming layer at high speed. In addition, the present invention has another objective of providing a lithographic printing plate precursor or a dummy plate which can be produced at high speed with superior production efficacy. The present invention provides a composition for a lithographic printing plate containing a fluoroaliphatic group-containing copolymer having a specific chemical structure, the lithographic printing plate precursor or a dummy plate containing a layer having the aforementioned composition.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: October 18, 2016
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Masamichi Kamiya, Yasuhiro Asawa, Akira Igarashi
  • Patent number: 9470976
    Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: October 18, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Paul J. LaBeaume, Vipul Jain, Suzanne M. Coley, James W. Thackeray, James F. Cameron, Amy M. Kwok, David A. Valeri
  • Patent number: 9469705
    Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: October 18, 2016
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Vipul Jain, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok, David A. Valeri
  • Patent number: 9429841
    Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, m and Z1+ are defined in the specification.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: August 30, 2016
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji Ichikawa, Takashi Hiraoka, Hiromu Sakamoto
  • Patent number: 9405189
    Abstract: Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: August 2, 2016
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE TEXAS A&M UNIVERSITY SYSTEM
    Inventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
  • Patent number: 9329480
    Abstract: A photocurable relief image printing element is described. The photocurable relief image printing element comprises (a) a support layer; (b) one or more photocurable layers disposed on the support layer, wherein the one or more photocurable layers comprise: (i) a binder; (ii) one or more monomers; (iii) a photoinitiator; and (iv) an additive selected from the group consisting of phosphites, phosphines, thioether amine compounds, and combinations of one or more of the foregoing; (c) a laser ablatable masking layer disposed on the one or more photocurable layers, the laser ablatable masking layer comprising a radiation opaque material; and (d) optionally, a removable coversheet. The photocurable relief image printing element provides improved surface cure in digital relief image printing elements.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: May 3, 2016
    Inventors: Jonghan Choi, Kerry O'Brate
  • Patent number: 9233945
    Abstract: A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: January 12, 2016
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji Ichikawa, Hiromu Sakamoto, Shingo Fujita
  • Patent number: 9223215
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: December 29, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Natsumi Yokokawa, Takeshi Kawabata, Hiroo Takizawa, Hideaki Tsubaki, Shuji Hirano
  • Patent number: 9223205
    Abstract: There is disclosed an acid generator generating a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: As a result, there is provided a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of exposure margin and MEF particularly without degradation of resolution and can be effectively and widely used, a chemically amplified resist composition using the same, and a patterning process.
    Type: Grant
    Filed: February 19, 2013
    Date of Patent: December 29, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Takayuki Nagasawa, Ryosuke Taniguchi
  • Patent number: 9221928
    Abstract: A fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). And a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: December 29, 2015
    Assignee: Central Glass Company, Limited
    Inventors: Misugi Kato, Yoshimi Isono, Satoru Narizuka, Ryozo Takihana, Kazunori Mori
  • Patent number: 9216948
    Abstract: A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 ?m, to reduce the sodium content of the polymerization initiator solution to not more than 300 ppb with respect to the weight of the polymerization initiator. Further, the method for producing a copolymer for semiconductor lithography includes a polymerization step wherein the polymer for semiconductor lithography is synthesized by a radical polymerization reaction in the presence of a polymerization initiator purified by the above purification method.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: December 22, 2015
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventor: Youji Suzuki
  • Patent number: 9207534
    Abstract: A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.
    Type: Grant
    Filed: January 13, 2012
    Date of Patent: December 8, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Takeru Watanabe, Tomohiro Kobayashi
  • Patent number: 9175180
    Abstract: Provided is an ultraviolet curable inkjet ink and an inkjet image formation method that uses said inkjet ink. The inkjet ink can be ejected from an inkjet head without being diluted by a solvent, has high photo curing sensitivity and produces high quality images with excellent weather resistance (smear resistance). The inkjet ink is characterized by a polymerizable compound which contains a maleimide compound having a chiral group and a compound selected from a vinyl ether compound and a N-vinyl compound.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: November 3, 2015
    Assignee: KONICA MINOLTA, INC.
    Inventors: Masaki Nakamura, Kouki Kawashima, Yusuke Takaku, Takayuki Toeda
  • Patent number: 9170491
    Abstract: The present invention relates to a negative-type photoresist composition for thick film, comprising: (A) 20 to 50 wt % of an alkali-soluble resin which is polymerized from a plurality of kinds of monomers, wherein the monomers includes compounds represented by formulas (1A) and (1B), and based on the weight ratio of the monomers to the alkali-soluble resin, the sum of the formula (1A) compound and the formula (1B) compound are 20 to 60%, and X of the formula (1A) and (1B) may be independently H, methyl or ethyl. (B) 10 to 30 wt % of crosslinker which can be a bisphenol fluorene derivative monomer having at least one ethylenically unsaturated double bond; (C) 5 to 15 wt % of photo initiator; and (D) residual solvent. The present invention also relates to use of the above-mentioned negative-type photoresist compound for thick film.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: October 27, 2015
    Assignee: EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION
    Inventors: Yi Jing Chen, Nai Tien Chou, Hsin Yi Huang, Yen-Cheng Li
  • Patent number: 9152045
    Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
    Type: Grant
    Filed: June 10, 2014
    Date of Patent: October 6, 2015
    Assignee: Central Glass Company, Limited
    Inventors: Kazunori Mori, Satoru Narizuka, Fumihiro Amemiya, Masaki Fujiwara
  • Patent number: 9134607
    Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by formula (I); wherein R1 represents a hydrogen atom or a methyl group, and R2 represents C1-C10 hydrocarbon group; and a resin which comprises a structural unit having an acid-labile group and no structural unit represented by formula (I); and an acid generator represented by formula (II): wherein X2 represents a C1-C6 alkanediyl group where a hydrogen atom can be replaced by a hydroxyl group or a group —O—R5 and where a methylene group can be replaced by an oxygen atom or a carbonyl group, R4 and R5 each independently represent a C1-C24 hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom or a hydroxyl group and where a methylene group can be replaced by an oxygen atom or a carbonyl group, and Z+ represents an organic cation.
    Type: Grant
    Filed: July 15, 2013
    Date of Patent: September 15, 2015
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamaguchi
  • Patent number: 9104102
    Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: August 11, 2015
    Assignee: JSR CORPORATION
    Inventors: Yasuhiko Matsuda, Takanori Kawakami, Kazuki Kasahara, Ken Maruyama
  • Patent number: 9086625
    Abstract: A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a copolymer comprising recurring units derived from (meth)acrylate, vinyl ether, vinylfluorene, vinylanthracene, vinylpyrene, vinylbiphenyl, stilbene, styrylnaphthalene or dinaphthylethylene, and fluorine-containing recurring units, as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the EUV lithography. The resist film has a hydrophilic surface and is effective for suppressing formation of blob defects after development.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: July 21, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Kazuhiro Katayama, Kenji Funatsu
  • Publication number: 20150132700
    Abstract: A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is useful to pattern circuits by visible light.
    Type: Application
    Filed: February 19, 2013
    Publication date: May 14, 2015
    Inventor: Eugen PAVEL
  • Publication number: 20150125794
    Abstract: A photoresist film containing a sulfonium or iodonium salt of carboxylic acid having an amino group has a high dissolution contrast and offers improved resolution, wide focus margin and minimal LWR when used as a positive resist film adapted for alkaline development and a negative resist film adapted for organic solvent development.
    Type: Application
    Filed: October 31, 2014
    Publication date: May 7, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Masayoshi Sagehashi
  • Publication number: 20150125791
    Abstract: Disclosed is a method and apparatus for mitigation of photoresist line pattern collapse in a photolithography process by applying a gap-fill material treatment after the post-development line pattern rinse step. The gap-fill material dries into a solid layer filling the inter-line spaces of the line pattern, thereby preventing line pattern collapse due to capillary forces during the post-rinse line pattern drying step. Once dried, the gap-fill material is depolymerized, volatilized, and removed from the line pattern by heating, illumination with ultraviolet light, by application of a catalyst chemistry, or by plasma etching.
    Type: Application
    Filed: July 3, 2014
    Publication date: May 7, 2015
    Inventors: Mark H. SOMERVELL, Benjamen M. RATHSACK, Ian J. BROWN, Steven SCHEER, Joshua S. HOOGE
  • Publication number: 20150126005
    Abstract: A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.
    Type: Application
    Filed: November 3, 2014
    Publication date: May 7, 2015
    Inventors: Jeong-Won KIM, Ki-Hyun CHO, Kwang-Woo PARK, Chul-Won PARK, Jin-Ho JU, Dong-Min KIM, Eun JEAGAL
  • Publication number: 20150118622
    Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: May 22, 2014
    Publication date: April 30, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Jin-Hee KANG, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Publication number: 20150118623
    Abstract: A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 30, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Takuya TSURUTA, Tomotaka TSUCHIMURA, Kaoru IWATO
  • Patent number: 9011987
    Abstract: A liquid crystal display including a first substrate; a second substrate facing the first substrate; a thin film transistor disposed on the first substrate; an organic layer disposed on the thin film transistor; a pixel electrode disposed on the organic layer; a lower alignment layer disposed on the pixel electrode; a common electrode disposed on the second substrate; and an upper alignment layer disposed on the common electrode, wherein a first free radical included in the organic layer and a second free radical included in at least one of the lower alignment layer and the upper alignment layer are radical bonded.
    Type: Grant
    Filed: July 20, 2012
    Date of Patent: April 21, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jun Hyup Lee, Sang Gyun Kim, Jang-Hyun Kim, Tae Hoon Kim, Seung Wook Nam, Keun Chan Oh, Taek Joon Lee