Resin Or Prepolymer Containing Ethylenical Unsaturation Patents (Class 430/286.1)
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Patent number: 9216948Abstract: A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 ?m, to reduce the sodium content of the polymerization initiator solution to not more than 300 ppb with respect to the weight of the polymerization initiator. Further, the method for producing a copolymer for semiconductor lithography includes a polymerization step wherein the polymer for semiconductor lithography is synthesized by a radical polymerization reaction in the presence of a polymerization initiator purified by the above purification method.Type: GrantFiled: April 20, 2012Date of Patent: December 22, 2015Assignee: Maruzen Petrochemical Co., Ltd.Inventor: Youji Suzuki
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Patent number: 9207534Abstract: A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.Type: GrantFiled: January 13, 2012Date of Patent: December 8, 2015Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Takeru Watanabe, Tomohiro Kobayashi
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Patent number: 9175180Abstract: Provided is an ultraviolet curable inkjet ink and an inkjet image formation method that uses said inkjet ink. The inkjet ink can be ejected from an inkjet head without being diluted by a solvent, has high photo curing sensitivity and produces high quality images with excellent weather resistance (smear resistance). The inkjet ink is characterized by a polymerizable compound which contains a maleimide compound having a chiral group and a compound selected from a vinyl ether compound and a N-vinyl compound.Type: GrantFiled: May 20, 2011Date of Patent: November 3, 2015Assignee: KONICA MINOLTA, INC.Inventors: Masaki Nakamura, Kouki Kawashima, Yusuke Takaku, Takayuki Toeda
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Patent number: 9170491Abstract: The present invention relates to a negative-type photoresist composition for thick film, comprising: (A) 20 to 50 wt % of an alkali-soluble resin which is polymerized from a plurality of kinds of monomers, wherein the monomers includes compounds represented by formulas (1A) and (1B), and based on the weight ratio of the monomers to the alkali-soluble resin, the sum of the formula (1A) compound and the formula (1B) compound are 20 to 60%, and X of the formula (1A) and (1B) may be independently H, methyl or ethyl. (B) 10 to 30 wt % of crosslinker which can be a bisphenol fluorene derivative monomer having at least one ethylenically unsaturated double bond; (C) 5 to 15 wt % of photo initiator; and (D) residual solvent. The present invention also relates to use of the above-mentioned negative-type photoresist compound for thick film.Type: GrantFiled: March 24, 2014Date of Patent: October 27, 2015Assignee: EVERLIGHT CHEMICAL INDUSTRIAL CORPORATIONInventors: Yi Jing Chen, Nai Tien Chou, Hsin Yi Huang, Yen-Cheng Li
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Patent number: 9152045Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.Type: GrantFiled: June 10, 2014Date of Patent: October 6, 2015Assignee: Central Glass Company, LimitedInventors: Kazunori Mori, Satoru Narizuka, Fumihiro Amemiya, Masaki Fujiwara
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Patent number: 9134607Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by formula (I); wherein R1 represents a hydrogen atom or a methyl group, and R2 represents C1-C10 hydrocarbon group; and a resin which comprises a structural unit having an acid-labile group and no structural unit represented by formula (I); and an acid generator represented by formula (II): wherein X2 represents a C1-C6 alkanediyl group where a hydrogen atom can be replaced by a hydroxyl group or a group —O—R5 and where a methylene group can be replaced by an oxygen atom or a carbonyl group, R4 and R5 each independently represent a C1-C24 hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom or a hydroxyl group and where a methylene group can be replaced by an oxygen atom or a carbonyl group, and Z+ represents an organic cation.Type: GrantFiled: July 15, 2013Date of Patent: September 15, 2015Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Tatsuro Masuyama, Satoshi Yamaguchi
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Patent number: 9104102Abstract: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7).Type: GrantFiled: July 27, 2012Date of Patent: August 11, 2015Assignee: JSR CORPORATIONInventors: Yasuhiko Matsuda, Takanori Kawakami, Kazuki Kasahara, Ken Maruyama
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Patent number: 9086625Abstract: A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a copolymer comprising recurring units derived from (meth)acrylate, vinyl ether, vinylfluorene, vinylanthracene, vinylpyrene, vinylbiphenyl, stilbene, styrylnaphthalene or dinaphthylethylene, and fluorine-containing recurring units, as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the EUV lithography. The resist film has a hydrophilic surface and is effective for suppressing formation of blob defects after development.Type: GrantFiled: August 29, 2013Date of Patent: July 21, 2015Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Kazuhiro Katayama, Kenji Funatsu
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Publication number: 20150132700Abstract: A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is useful to pattern circuits by visible light.Type: ApplicationFiled: February 19, 2013Publication date: May 14, 2015Inventor: Eugen PAVEL
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Publication number: 20150126005Abstract: A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.Type: ApplicationFiled: November 3, 2014Publication date: May 7, 2015Inventors: Jeong-Won KIM, Ki-Hyun CHO, Kwang-Woo PARK, Chul-Won PARK, Jin-Ho JU, Dong-Min KIM, Eun JEAGAL
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Publication number: 20150125794Abstract: A photoresist film containing a sulfonium or iodonium salt of carboxylic acid having an amino group has a high dissolution contrast and offers improved resolution, wide focus margin and minimal LWR when used as a positive resist film adapted for alkaline development and a negative resist film adapted for organic solvent development.Type: ApplicationFiled: October 31, 2014Publication date: May 7, 2015Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Masaki Ohashi, Masayoshi Sagehashi
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Publication number: 20150125791Abstract: Disclosed is a method and apparatus for mitigation of photoresist line pattern collapse in a photolithography process by applying a gap-fill material treatment after the post-development line pattern rinse step. The gap-fill material dries into a solid layer filling the inter-line spaces of the line pattern, thereby preventing line pattern collapse due to capillary forces during the post-rinse line pattern drying step. Once dried, the gap-fill material is depolymerized, volatilized, and removed from the line pattern by heating, illumination with ultraviolet light, by application of a catalyst chemistry, or by plasma etching.Type: ApplicationFiled: July 3, 2014Publication date: May 7, 2015Inventors: Mark H. SOMERVELL, Benjamen M. RATHSACK, Ian J. BROWN, Steven SCHEER, Joshua S. HOOGE
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Publication number: 20150118622Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.Type: ApplicationFiled: May 22, 2014Publication date: April 30, 2015Applicant: Cheil Industries Inc.Inventors: Jin-Hee KANG, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
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Publication number: 20150118623Abstract: A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.Type: ApplicationFiled: December 30, 2014Publication date: April 30, 2015Applicant: FUJIFILM CorporationInventors: Takuya TSURUTA, Tomotaka TSUCHIMURA, Kaoru IWATO
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Patent number: 9011987Abstract: A liquid crystal display including a first substrate; a second substrate facing the first substrate; a thin film transistor disposed on the first substrate; an organic layer disposed on the thin film transistor; a pixel electrode disposed on the organic layer; a lower alignment layer disposed on the pixel electrode; a common electrode disposed on the second substrate; and an upper alignment layer disposed on the common electrode, wherein a first free radical included in the organic layer and a second free radical included in at least one of the lower alignment layer and the upper alignment layer are radical bonded.Type: GrantFiled: July 20, 2012Date of Patent: April 21, 2015Assignee: Samsung Display Co., Ltd.Inventors: Jun Hyup Lee, Sang Gyun Kim, Jang-Hyun Kim, Tae Hoon Kim, Seung Wook Nam, Keun Chan Oh, Taek Joon Lee
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Patent number: 9005491Abstract: A photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the definitions of R1, R2, R3 and R4 are the same as set forth in specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.Type: GrantFiled: January 19, 2012Date of Patent: April 14, 2015Assignee: Cheil Industries Inc.Inventors: Chang-Min Lee, Yeon-Soo Lee, Yong-Hee Kang, Man-Suk Kim, Taek-Jin Baek, Hyun-Moo Choi, Kyung-Hee Hyung, Sang-Hyun Hong
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Publication number: 20150079506Abstract: Disclosed herein are various amine treated maleic anhydride containing polymers and compositions thereof, which are useful for forming self-imageable films. In some embodiments, such polymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units are either ring-opened or have been transformed into maleimide repeat units. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.Type: ApplicationFiled: September 5, 2014Publication date: March 19, 2015Applicants: SUMITOMO BAKELITE CO., LTD, PROMERUS, LLCInventors: PRAMOD KANDANARACHCHI, LARRY F. RHODES, OSAMU ONISHI
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Publication number: 20150064613Abstract: [Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. [Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having a pKa of 2.0 to 15.7, a photo-polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, developed with an inorganic developer, and heated, so that a cured film can be obtained.Type: ApplicationFiled: April 5, 2013Publication date: March 5, 2015Inventors: Daishi Yokoyama, Atsuko Noya, Yuji Tashiro, Naofumi Yoshida, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Katsuto Taniguchi, Toshiaki Nonaka
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Publication number: 20150056545Abstract: A polymer compound has a carboxyl group and a siloxane chain and is obtained in the presence of an acid catalyst by condensation of at least; (I) a siloxane compound having phenol groups at both terminals, as shown by formula (1), (II) phenols shown by formula (2) and/or phenols shown by formula (3), and (III) one or more kinds of aldehydes and ketones shown by the following general formula (4). A polymer compound can be used suitably as a base resin of a chemically amplified negative resist composition with which the problem of delamination generated on metal wires, an electrode, and a substrate, can be improved, and with which a fine pattern can be formed without generating a scum and a footing profile in the pattern bottom and on the substrate, using a widely used aqueous 2.38% TMAH solution as a developer.Type: ApplicationFiled: June 20, 2014Publication date: February 26, 2015Inventors: Hiroyuki URANO, Masashi IIO, Katsuya TAKEMURA, Takashi MIYAZAKI
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Publication number: 20150021289Abstract: A photoresist composition includes a polymer with repeat units having the structure wherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.Type: ApplicationFiled: July 16, 2013Publication date: January 22, 2015Inventors: Matthias S. OBER, Vipul JAIN, John B. ETIENNE
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Publication number: 20150021597Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.Type: ApplicationFiled: July 15, 2014Publication date: January 22, 2015Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Ming Huei Wang, Meko McCray, Yu Xia, Antonio Facchetti
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Publication number: 20150024173Abstract: The invention provides a photosensitive resin composition comprising (A) an alkali-soluble resin having a phenolic hydroxyl group, (B) a compound that generates an acid by light, and (C) an acrylic resin having a group that crosslinks with the component (A), as well as a method for manufacturing a patterned cured film, and an electronic component prepared therewith.Type: ApplicationFiled: February 4, 2013Publication date: January 22, 2015Inventors: Shingo Tahara, Shigeki Katogi, Hiroshi Matsutani, Kouichi Abe, Akitoshi Tanimoto, Yu Aoki
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Patent number: 8927196Abstract: The invention relates to a method for making a polymer wherein during the polymerization is incorporated in the polymer chain by ring opening polymerization a cyclic (alkyl)acryloyl carbonate having the formula (4): wherein R1 and R2 each independently are hydrogen, methyl or ethyl. Preferable the polymer is an (alkyl)acryloyl polycarbonate such that at least one first monomer a cyclic (alkyl)acryloyl carbonate having the formula (4). The (alkyl)acryloyl polyester may be modified and used in biodevices.Type: GrantFiled: December 4, 2009Date of Patent: January 6, 2015Assignee: SSENS B.V.Inventors: Wei Chen, Fenghua Meng, Rong Wang, Ru Cheng, Zhiyuan Zhong
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Patent number: 8920689Abstract: A photosensitive resin composition for a color filter includes (A) a dye polymer composite including a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as described in the detailed description, (B) an acrylic-based photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a solvent, and a color filter using the same.Type: GrantFiled: March 28, 2013Date of Patent: December 30, 2014Assignee: Cheil Industries Inc.Inventors: Taek-Jin Baek, Seong-Ryong Nam, Won-A Noh, Chang-Min Lee, Sang-Won Cho, Gyu-Seok Han
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Patent number: 8916335Abstract: A photo-curable transfer sheet having a photo-curable transfer layer comprising a photo-curable composition, the photo-curable composition being deformable by application of pressure and containing a reactive polymer having a photopolymerizable functional group, wherein the photo-curable transfer layer shows linearity in relationship between strain [?] (%) and time [t] (second) measured by a creep test using a dynamic viscoelasticity measuring apparatus under the conditions of an ordinary temperature, stress of 50 Pa and a time period of 120 seconds, and satisfies a following formula: log ?=a+b·log t, in which “a” is a real number, and “b” is in the range of 0.10 to 0.53; and a process for the preparation of an optical information recording medium using the sheet and an optical information recording medium.Type: GrantFiled: October 6, 2004Date of Patent: December 23, 2014Assignee: Bridgestone CorporationInventors: Hideki Kitano, Takato Inamiya, Kenji Murayama, Hidefumi Kotsubo, Yasuhiro Morimura
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Patent number: 8911647Abstract: Disclosed is a photosensitive resin composition for a color filter including (A) a dye-polymer composite wherein the dye includes a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.Type: GrantFiled: October 30, 2013Date of Patent: December 16, 2014Assignee: Cheil Industries Inc.Inventors: Sang-Won Cho, Won-A Noh, Soo-Young Heo, Han-Chul Hwang, Gyu-Seok Han
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Patent number: 8906271Abstract: Disclosed is a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from the compound represented by the following Chemical Formula 1, wherein each substituent is the same as defined in the detailed description; (B) an acryl-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent.Type: GrantFiled: October 16, 2012Date of Patent: December 9, 2014Assignee: Cheil Industries Inc.Inventors: Yeon-Soo Lee, Seong-Ryong Nam, Taek-Jin Baek, Sang-Won Cho, Jae-Hyun Kim, Chang-Min Lee, Gyu-Seok Han
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Publication number: 20140356790Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.Type: ApplicationFiled: August 13, 2014Publication date: December 4, 2014Inventors: Yoshinori HIRANO, Hideyoshi YANAGISAWA
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Patent number: 8901225Abstract: A photosensitive resin composition which can impart insulating properties and light-shielding properties against light having a wavelength lying in an ultra-violet range, a visible range and a near-infrared range to a substrate more readily when applied onto the substrate, wherein the substrate has such properties that the permeability to light having a wavelength of 400 to 900 nm inclusive is less than 3.0% and the maximum value of the permeability to light having a wavelength of longer than 900 nm and not longer than 1300 nm is 3.0% or more. The photosensitive resin composition is characterized by comprising (a) an alkali soluble resin, (b) a specific tungsten oxide and/or a specific composite tungsten oxide, (c) a photopolymerizable compound having at least two polymerizable groups, (d) an oxime-type photopolymerization initiator, and (e) a solvent.Type: GrantFiled: October 26, 2010Date of Patent: December 2, 2014Assignee: Toray Industries, Inc.Inventors: Yumiko Okuda, Toru Okazawa, Masao Kamogawa, Mitsuhito Suwa
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Publication number: 20140349222Abstract: Provided is a photosensitive resin composition which comprises: (A-1) a resin containing a structure represented by general formula (1); and (B) a photo-acid generating agent. In general formula (1), X, R1 to R7, m1 to m4, n1, n2, Y and W are each as defined in the description.Type: ApplicationFiled: December 6, 2012Publication date: November 27, 2014Applicant: ASAHI KASEI E-MATERIALS CORPORATIONInventors: Satoshi Shibui, Tatsuya Hirata, Takahiro Sasaki, Taisuke Yamada
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Patent number: 8895224Abstract: Lithographic printing plates and processes for preparing the lithographic printing plates are provided. The plates have excellent printing durability, staining resistance and staining resistance over time. The lithographic printing plate precursor includes: a substrate; a photosensitive layer provided on the substrate; and an extra layer optionally provided between the substrate and the photosensitive layer. The photosensitive layer or the extra layer adjacent to the substrate contains (A) a copolymer. The copolymer (A) includes: (a1) a repeating unit of formula (a1-1) below in a side chain, and (a2) a repeating unit having at least one of the structures represented by formulae (a2-1) to (a2-6) shown in the specification in a side chain. L1, Z1, R1, and R21, R22 and R23 in formula (a1-1) and the variables in formulae (a2-1) to (a2-6) are as defined in the specification.Type: GrantFiled: August 26, 2013Date of Patent: November 25, 2014Assignee: FUJIFILM CorporationInventors: Hiroyuki Suzuki, Junya Abe, Takafumi Nakayama, Kohei Takeshita
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Patent number: 8871315Abstract: Optical films are described having a polymerized microstructured surface that comprises the reaction product of a polymerizable resin composition comprising at least one polymerizable ethylenically unsaturated triphenyl monomer. Also described are certain triphenyl(meth)acrylate monomers and polymerizable resin compositions.Type: GrantFiled: September 10, 2013Date of Patent: October 28, 2014Assignee: 3M Innovative Properties CompanyInventors: Bryan V. Hunt, Kyle J. Lindstrom, Judith M. Invie, David B. Olson, Anthony M. Renstrom
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Patent number: 8865841Abstract: The invention provides a rubber composition comprising a styrene-butadiene copolymer and having improved compatibility with a thiol-based crosslinking agent and also having increased curability. As means for solving the problems, the inventive thiol-containing liquid rubber composition comprises (A) a styrene-butadiene copolymer which is liquid at 25° C. and (B) a polythiol derived from mercaptocarboxylic acid, wherein the styrene-butadiene copolymer (A) desirably has a bound styrene content of 20 to 90% by mass.Type: GrantFiled: April 16, 2010Date of Patent: October 21, 2014Assignee: Bridgestone CorporationInventors: Hajime Kitano, Shuyou Akama
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Patent number: 8828282Abstract: Disclosed are a photosensitive resin composition for a color filter including (A) a colorant including a dye represented by the following Chemical Formula 1 and/or a dye represented by the following Chemical Formula 2, wherein in the following Chemical Formulae 1 and 2, each substituent is the same as described in the detailed description; (B) an acrylic-based binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, and a color filter using the same.Type: GrantFiled: September 30, 2013Date of Patent: September 9, 2014Assignee: Cheil Industries Inc.Inventors: Kyung-Hee Hyung, Nam-Gwang Kim, Se-Young Choi, Yu-Jin Lee, Gyu-Seok Han
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Patent number: 8822125Abstract: A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive.Type: GrantFiled: May 23, 2007Date of Patent: September 2, 2014Assignee: LG Display Co., Ltd.Inventor: Jin-Wuk Kim
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Publication number: 20140242502Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.Type: ApplicationFiled: May 9, 2014Publication date: August 28, 2014Applicant: FUJIFILM CORPORATIONInventors: Tomotaka TSUCHIMURA, Hiroo TAKIZAWA
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Publication number: 20140242504Abstract: The present invention relates to a positive photosensitive resin composition and a method for forming patterns by using the same. The positive photosensitive resin composition includes a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B), a hydroxycompound (C) and a solvent (D). The novolac resin (A) further includes a hydroxy-type novolac resin (A-1) and a xylenol-type novolac resin (A-2). The hydroxy-type novolac resin (A-1) is synthesized by condensing hydroxyl benzaldehyde compound with aromatic hydroxyl compound. The xylenol-type novolac resin (A-2) is synthesized by condensing aldehyde compound with xylenol compound. The postbaked positive photosensitive resin composition can be beneficially formed to patterns with high film thickness and well cross-sectional profile.Type: ApplicationFiled: February 19, 2014Publication date: August 28, 2014Applicant: CHI MEI CORPORATIONInventors: Chi-Ming LIU, Chun-An SHIH
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Patent number: 8816211Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment, and the photocurable compositions can be used to form various articles.Type: GrantFiled: February 14, 2011Date of Patent: August 26, 2014Assignee: Eastman Kodak CompanyInventor: Deepak Shukla
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Publication number: 20140234777Abstract: It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive composition includes a resin (A) having a phenolic hydroxyl group, a crosslinking agent (B1) having at least two oxazoline groups and a crosslinking agent (B2) having at least two groups represented by —CH2OR (wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group) and a photosensitive acid-generating agent (C).Type: ApplicationFiled: January 29, 2014Publication date: August 21, 2014Applicant: JSR CORPORATIONInventors: Tomohiko SAKURAI, Masaaki HANAMURA
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Publication number: 20140234776Abstract: A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group.Type: ApplicationFiled: January 23, 2014Publication date: August 21, 2014Applicant: Samsung Display Co., Ltd.Inventors: Jin Ho JU, Seung Bo SHIM, Jun Gi KIM, Yang-Ho JUNG, Hyang-Shik KONG, Byung-Uk KIM, Jin-Sun KIM, Tae-Hoon YEO, Hyoc-Min YOUN, Sang-Hoon LEE
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Publication number: 20140212814Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.Type: ApplicationFiled: March 28, 2014Publication date: July 31, 2014Applicant: FUJIFILM CORPORATIONInventors: Junichi ITO, Akinori SHIBUYA, Tomoki MATSUDA, Yoko TOKUGAWA, Toshiaki FUKUHARA, Naohiro TANGO, Kaoru IWATO, Masahiro YOSHIDOME, Shinichi SUGIYAMA, Shohei KATAOKA
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Publication number: 20140183162Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer and a mixed solvent including a first solvent, a second solvent having a higher volatility than the first solvent, and a third solvent having a higher volatility than the second solvent. The coating layer is exposed to light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.Type: ApplicationFiled: June 6, 2013Publication date: July 3, 2014Inventors: Ki-Hyun CHO, Hoon KANG, Jae-Sung KIM, Dong-Min KIM, Seung-Ki KIM, Eun JEAGAL
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Publication number: 20140178823Abstract: A photosensitive polyimide and negative type photo-resist composition containing the same are provided. The photosensitive polyimide is represented by formula (I): wherein X1 and X3 are the same or different organic functional groups having four covalent bonds; X2 and X4 are the same or different organic functional groups having two covalent bonds, and X2 contains functional groups of OH or COOH and any one selected from the functional groups below: wherein R is H or CH3, p and q are integers of 1 to 20, and m and n in formula (I) are numbers of repeat units.Type: ApplicationFiled: June 3, 2013Publication date: June 26, 2014Inventors: Chen-Lung LIN, Fu-Shun HSU, Kuo-Chan CHIOU
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Publication number: 20140141375Abstract: Disclosed herein is a composition comprising a graft block copolymer comprising a copolymer comprising a backbone polymer; and a first graft polymer that comprises a surface energy reducing moiety; the first graft polymer being grafted onto the backbone polymer; where the surface energy reducing moiety comprises a fluorine atom, a silicon atom, or a combination of a fluorine atom and a silicon atom; a photoacid generator; and a crosslinking agent.Type: ApplicationFiled: November 19, 2012Publication date: May 22, 2014Inventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
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Patent number: 8728687Abstract: A resin including (i) a main chain portion containing a nitrogen atom, (ii) a group X that has a functional group having a pKa of 14 or less and is bonded to a nitrogen atom present in the main chain portion, and (iii) an oligomer chain or polymer chain Y having a number average molecular weight of from 500 to 1,000,000 in a side chain.Type: GrantFiled: January 29, 2009Date of Patent: May 20, 2014Assignee: FUJIFILM CorporationInventors: Yushi Kaneko, Wataru Kikuchi, Kazuhiro Fujimaki, Shigekazu Suzuki, Shuichiro Osada
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Publication number: 20140113233Abstract: Photopolymerizable flexographic printing elements which contain cyclohexanepolycarboxylic esters as plasticizers and also their use for producing flexographic printing forms for printing with UV inks, in particular for UV narrow web printing.Type: ApplicationFiled: December 31, 2013Publication date: April 24, 2014Applicant: FLINT GROUP GERMANY GMBHInventors: Uwe Stebani, Stefanie Döttinger
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Publication number: 20140106267Abstract: A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second phase comprising a plurality of structures dispersed within the first phase, and the unexposed areas comprising a second polymer network comprising third and fourth phases that are chemically connected and have different refractive indices, the third phase being continuous, and the fourth phase comprising a plurality of structures dispersed within the third phase. The first and second polymer networks are chemically connected, and morphology formed by the first and second phases is different than that formed by the third and fourth phases.Type: ApplicationFiled: December 18, 2013Publication date: April 17, 2014Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventors: Mieczyslaw H. Mazurek, Raymond P. Johnston, John E. Potts, Marc D. Radcliffe, Kevin R. Schaffer, Audrey A. Sherman, Wendi J. Winkler
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Publication number: 20140106278Abstract: There is provided a dry film resist sheet, including: a base film; a first dry film resist layer formed on the base film, the first dry film resist layer containing a binder polymer, a multi-functional monomer, and a photoinitiator; and a second dry film resist layer formed on the first dry film resist layer, the second dry film resist layer containing a binder polymer, a multi-functional monomer, a photoinitiator, and a thermal initiator.Type: ApplicationFiled: December 31, 2012Publication date: April 17, 2014Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Hye Jin CHO, Suk Jin HAM, Sung Hee LIM, Kyoung Soon PARK
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Publication number: 20140099572Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.Type: ApplicationFiled: December 12, 2013Publication date: April 10, 2014Applicant: FUJIFILM CorporationInventors: Takeshi INASAKI, Takeshi KAWABATA, Tomotaka TSUCHIMURA
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Patent number: 8691352Abstract: Disclosed is a photopolymerizable composition which contains a photopolymerization initiator (A) that has a partial structure represented by the following Formula (1) and a polymerizable compound (B). In General formula (1), R3 and R4 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group or an alkoxy group; R3 and R4 may form a ring with each other; and X represents OR5, SR6, or NR17R18. The photopolymerizable composition is capable of forming a cured film that has high sensitivity, excellent intra-membrane curability and excellent adhesion to a support. The cured film is able to maintain a patterned shape even during post-heating after development and has good pattern formability, while coloring due to heating with passage of time being suppressed.Type: GrantFiled: August 10, 2010Date of Patent: April 8, 2014Assignee: FUJIFILM CorporationInventor: Masaomi Makino