Abstract: The transition metal-catalyzed amination of aryl halides, in conjunction with an orthogonal protective group scheme, forms the basis of two routes to oligoaniline precursors. The oligoaniline precursors are soluble in a variety of common organic solvents, and are easily converted to the deprotected oligoanilines. The method allows the preparation of oligoanilines of even or odd chain lengths, and the incorporation of a variety of functional groups into the oligomers. Polyanilines of low polydispersity can also be prepared by this method.

Abstract: A method for converting an integrated circuit design to a phase-shift complaint mask design. The method comprises the steps of locating features of the integrated circuit that violate predetermined design criteria converting error flags to physical marker shapes, modifying the located features using layout modification system technology based on a predetermined cost constraint, determining if all violations are corrected, and either changing the cost constraint to a higher cost constraint if violations still exist and repeating the process or terminating the conversion if all violations are corrected.

Abstract: The present invention mask 1 has a mask-portion 12. The mask-portion 12 comprises: a bed sheet layer 12c made of paper or resin; and an irradiation-resistant layer 12e made of metal and coated on the irradiation side of the bed sheet layer 12c. The irradiation-resistant layer 12e has durability with respect to the emitted energy such as laser beam than the bed sheet layer 12c.

Abstract: A photolithographic projection system for selectively irradiating a photosensitive layer on a wafer according to a predetermined pattern on a mask is discussed. The photolithographic projection system includes a radiation source which generates radiation such as light. A reflector reflects the radiation from the radiation source on a path which intersects the wafer. This reflector includes a radiation reflecting portion and a phase-shifting and partially reflecting portion adjacent the radiation reflecting portion. The reflecting portion may include a plurality of reflecting portions surrounded by the absorbing portion, or the reflecting portion may surround the absorbing portion. Alternately, the reflector may include a reflecting portion and an absorbing portion adjacent the reflecting portion. Related methods are also discussed.

Abstract: A control negative for use in setting up exposure conditions for three colors in a photo-printer contains a mosaic pattern in a frame. The mosaic pattern is constituted of a plurality of segments of different densities and sizes. The segments are arranged such that the same area transmittance density can be obtained when density values are measured from different areas of the frame. The control negative is useful for different type photo-printers having different photometric areas for measuring the area transmittance density of the control negative.

Abstract: A method for fabricating a color solid-state image sensor having a plurality of photoelectric conversion regions includes the steps of respectively forming a magenta color filter layer, a yellow color filter layer, and a cyan color filter layer over three photoelectric conversion regions of the plurality of photoelectric conversion regions; and implanting ions into the magenta and cyan color filter layers, thereby reducing transmittivity of blue composition of light which passes the magenta and cyan color filter layers.

Abstract: A method for preparing a color filter array element is disclosed which includes coating an image receiving layer on one surface of a thin support, with the thin support being rigid in the horizontal plane. Thereafter, a colored pattern of pixel cells is transferred from a colorant donor sheet onto the image receiving layer. The method further includes laminating to a surface of a rigid, transparent support either the coated surface of the thin, rigid support carrying the colored pattern of pixel cells or the other surface of the thin, rigid support, to thereby form the color filter array element.

Abstract: The present invention is directed to a process for device fabrication in which a spatially resolved latent image of latent features in an energy sensitive resist material is used to control process parameters. In the present process, an energy sensitive resist material is exposed to radiation using a patternwise or blanket exposure. An image of the latent effects of the exposure is obtained using a near-field imaging technique. This image of the latent effects of the exposure is used to control parameters of the lithographic process such as focus, lamp intensity, exposure dose, exposure time, and post exposure baking by comparing the image so obtained with the desired effects of the exposure and adjusting the relevant lithographic parameter to obtain the desired correlation between the image obtained and the desired effect.

Abstract: The preparation of a filter comprises illuminating a photographic material and a mask located at a given distance therefrom with light from the opposite directions to make a hologram and then reproducing an reproduced image of said hologram in the photographic material, thus making it possible to prepare a precise color filter with no need of any close contact of the mask with the photographic material and without causing the mask image to shade off. According to the reproduction of a hologram applicable as a color filter, a master hologram having recorded red, green and blue stripes is located in opposition to a photographic material, and then illuminated with light obtained by mixing the three colors from the photographic material, thus making it possible to reproduce the reproduced image in the photographic material at one exposure operation, while dispensing with a photolithographic step, precise alignment or registration, etc.

Abstract: A shadow mask of a color cathode ray tube has a large number of electron beam apertures through which electron beams emitted from the electron gun pass. Bach of the electron beam apertures has a larger opening open to a surface of the shadow mask on a phosphor screen side, and a smaller opening open to a surface of the shadow mask on an electron gun side and communicating with the larger opening. The smaller opening of each of the electron beam apertures located at a peripheral portion of the shadow mask is defined by a wall surface of the shadow mask. The wall surface includes an outward portion which is located outward in a radial direction with respect to a center of the shadow mask and a central-side portion which is located on a central side of the shadow mask. An angle defined by the outward portion and a central axis of the smaller opening is larger than an angle defined by the central-side portion and the central axis of the smaller opening.

Abstract: A method of forming a refractive index distribution in a light transmission path including a core and a cladding layer involves steps of applying a photosensitive material layer to the surface of the cladding layer, forming a mask pattern of the photosensitive material layer through photolithography, and irradiating the light transmission path with an electromagnetic wave having a wavelength not exceeding that of visible light and especially a wavelength of X-rays; through the mask pattern, thereby forming in the core a refractive index fluctuation distribution corresponding to the mask pattern.

Abstract: In an optical projection system for use in projection printing of masks to wafers, comprising an illumination system including a light source and a mask positioned in the optical path of the illumination system, an optical phase structure is positioned in the optical path between the light source and the mask. The phase structure comprises a pattern of distributed transparent features having at least one refractive index, the transparent features of said phase structure being related in position and orientation to the opaque features of the mask.

Abstract: A method of producing a color filter array on a transparent support, includes the steps of: forming a polymer image-receiving layer on the transparent support; baking the polymer image-receiving layer on the transparent support so as to harden the polymer image-receiving layer; and imagewise thermally transferring different colorants to form multicolored pixels in the polymer image-receiving layer. The method further includes fixing the colorant pixels into the polymer receiving layer to form the color filter array; and coating the such formed color filter array with an overcoat.

Abstract: The invention is directed to a method and apparatus of projection lithography in which the contrast introduced into a radiation sensitive material caused by the proximity effect is effectively removed in a single exposure. Patterned radiation is transmitted through a lens system with at least one lens and a back focal plane filter. The back focal plane filter has at least two apertures, an image aperture and a proximity effect correction aperture. Patterned radiation is transmitted through the image aperture and introduces the desired image into the energy sensitive resist material. A portion of the inverse pattern radiation is transmitted through the proximity effect correction aperture and onto the energy sensitive resist material to effectively remove the contrast therein caused by the proximity effect.

Abstract: Disclosed is a shadow mask plate material which consists of an Fe-Ni-based alloy containing iron and nickel as main constituents, has an unrecrystallized texture with a grain size of 10 .mu.m or less, and is excellent in etching characteristics for forming electron beam apertures.

Abstract: The invention relates to membrane elements for reverse osmosis, comprising a permeate pipe with a membrane wound around it, around which glass fibers are wound radially and fixed by reaction resins, and is characterized in that the reaction resins are cross linked by photopolymerization.

Abstract: Disclosed is an apparatus for heat development of a migration imaging member containing migration marking material and a softenable material capable of softening upon exposure to heat at a development temperature, which apparatus comprises a heating source, a conveyance means for conveying the migration imaging member past the heating source, a first pinch roller in contact with the conveyance means, and a second pinch roller in contact with the conveyance means, wherein the imaging member passes through a nip between the conveyance means and the first pinch roller subsequent to entering the apparatus and prior to exposure to the heating source and passes through a nip between the conveyance means and the second pinch roller subsequent to exposure to the heating source and prior to exiting the apparatus, wherein the surface temperature of the first pinch roller is maintained at a temperature at least 20.degree. C.

Abstract: An X-ray grid is produced by exposing of a photosensitive glass with a differential of solubility not less than 25 and with a radiation having a wavelength shorter than a wavelength of ultraviolet radiation.

Abstract: Fabrication of 0.25 gm design rule or smaller devices on chips, that may attain levels of 256 megabit or higher depends upon lithographic patterning by use of accelerated charged particle beams. Fabrication is expedited by acceleration values resulting in deBroglie wavelengths at least in order of magnitude smaller than such design rule to permit cost saving both in fabricating apparatus and resulting devices. Most importantly, such wavelength values permit significant variation in spatial angle of incidence of beam to wafer to permit both large instantaneous exposure areas and in temporal angle of incidence to expedite beam scanning as emitted from a fixed particle source.

Abstract: A method of printing an image on a substrate by applying to the substrate a film which is chemically activated by heat, and scanning the film by a beam of radiation according to the image to be printed, to chemically activate the film by heat and thereby to produce a pattern in the film according to the image scanned. The film includes a reagent capable of undergoing a redox reaction when heated in the presence of another reagent present with the film when scanned by the beam, to produce the redox reaction between the two reagents.

Abstract: In an optical lithographical system (e.g., 100) for printing features of a patterned mask (e.g., 103) into a workpiece (e.g., 120), such as in a semiconductor device, a one- or two-dimensional (depending on the features of the mask) optical transmission phase-shift diffracting device (e.g., 107) is inserted between an optical condensor (e.g., 105) and the patterned mask whose features are to be printed into the workpiece. The diffracting device is designed so as to enable an imaging lens system (e.g., 102) to collect more than merely a single order of the resulting diffraction patterns of the features of the mask and, by varying the spatial periodicity of the diffracting device, to tailor the illumination incident on the mask in accordance with the features (e.g., 114, 115) of the mask.

Abstract: A collimator for use in an imaging system with a radiation point source has a plurality of channels formed therein along longitudinal axes aligned with selected orientation angles that correspond to the direct beam path from the radiation source to the radiation detectors. The collimator comprises a photosensitive material coated with a radiation absorbent material. The cross-sectional shape of the channels corresponds to the cross-sectional shape of the radiation detecting area of the detector element adjoining the channel, and the sidewalls of the channel are smooth along their length.

Abstract: Standard processing techniques for creating a patterned polyimide film from a radiation sensitive polyimide film forming composition are modified to include a post-develop, flood exposure/hardening step which crosslinks precursors of the polyimide film prior to curing. The flood exposure/hardening step prevents pull-back of the wall profile which occurs during the shrinkage of radiation sensitive polyimide film forming composition which occurs during thermal curing.

Abstract: A collimator for use in an imaging system with a radiation point source is formed from a plurality of collimator plates stacked together. Passages in each collimator plate in conjunction with the respective passages in adjoining plates form a plurality of channels through the collimator. The channel longitudinal axes are aligned with selected orientation angles that correspond to the direct beam path from the radiation source to the radiation detectors. The collimator plates are made up of patterned sheets of radiation absorbent material or alternatively comprise patterned photosensitive material substrates coated with a radiation absorbent material. The cross-sectional shape of each channel corresponds to the cross-sectional shape of the radiation detecting area of the detector element adjoining the channel.

Abstract: Amphiphilic compounds and oligomers and polymers derived therefrom suitable for Langmuir Blodgett deposition wherein the compounds have a polyamide backbone and hydrophobic groups pendant therefrom which pendant groups preferably contain chromophore groups. The compounds can be used to form non-centrosymmetric bilayers and are useful for forming various non-linear optical elements.

Abstract: Alignment marks capable of providing accurate registration signals even if substrate surface is rough and capable of effectively preventing degradation of registration accuracy due to unevenness of a surface of a resist film, and method of forming such alignment marks are disclosed. The alignment marks include flat portions 1a having high vertical reflectance serving as the alignment mark portions and rough portions 1b, formed spaced apart from each other by a prescribed distance on a surface of a substrate 1 by irradiation of laser beam 50. Therefore, fluctuation of height of a surface of a resist film 13 formed on the alignment marks with an upper layer film posed therebetween can be prevented, and in turn, degradation of registration accuracy of masks due to the unevenness of the resist film surface can be effectively prevented. Even if the surface of the substrate is rough, flat portions 1a providing accurate signal waveforms can be easily formed.

Abstract: A mask structure according to an aspect of the invention includes a base having a first zone for an alignment pattern and a second zone for a circuit pattern; an alignment pattern forming material with which the alignment pattern is formed in the first zone; and a circuit pattern forming material with which the circuit pattern is formed in the second zone; wherein the alignment pattern forming material and the circuit pattern forming material are different from each other.

Abstract: Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons. Use of such masks is of value as applied to scanning systems providing for dynamic correction of aberrations by physical movement of or field shaping of the objective lens to maintain the optical axis coincident with the scanning information-scanning beam.

Abstract: A phase-shifting mask, having plateau and trench surfaces located on a major surface of the mask, has a defect in the form of an indentation region located on a plateau (or trench) surface. The mask is repaired with respect to the defect by spinning on the major surface of the mask a planarization layer for which dry-etching conditions exist at which this planarization layer anisotropically etches at the same rate as that of the mask substrate material--e.g., quartz. Then the portion of the planarization layer overlying the defect is dry-etched under those conditions, using in one embodiment a patterned protective masking layer, such as chrome, having an aperture overlying the defect. This aperture need not be precisely laterally aligned with the defect (unless the defect extends to an edge of the plateau surface). The etching is continued until it reaches a depth H beneath the level of the plateau (or trench) surface that is equivalent to a phase shift of 2n .pi.

Abstract: A defect in the form of excess material, located in a trench region at a major surface of a phase-shifting mask, is removed by spinning on the major surface a planarization layer for which dry-etching conditions exist at which it anisotropically etches at the same rate as that of the excess material. Then the planarization layer is dry-etched under those conditions, using a patterned protective masking layer, such as chrome, having an aperture overlying the defect in the trench. This aperture need not be precisely laterally aligned with the defect (unless the defect extends to an edge of the trench). A plurality of such defects can be simultaneously removed. Likewise, defects located on plateau regions of the mask can be repaired.

Abstract: A deformable mirror device comprises a plurality of groups of colored mirrors responsive to electronic signals. Each group of mirrors is coated with a mixture of resist and dye thereby reflecting specified wavelengths of visible light. A process for manufacturing such a color deformable mirror device ("DMD") includes forming a layer of material on the DMD comprising a resist and a dye and selectively removing portions of the layer of material from the DMD.

Abstract: Expedient fabrication of phase masks providing for many values of phase delay for exiting pattern delineating radiation depends upon a two-step procedure. Such masks offer improvement in ultimate device fabrication relative to that offered by prior binary-valued masks. In the first step, which may be carried out coincident with introduction of device feature information, apertures of appropriate size and distribution are produced in the relevant mask layer; in the second step material surrounding such apertures is heated to result in backflow-filling. The consequential layer thinning is such as to introduce the desired local change in phase delay.

Abstract: Method for fabricating components for integrated optics are provided wherein a film of polystyrene doped with methyl red (PS-MR) on a glass substrate, is masked, e.g. with one or more metallic strips on a glass plate and such film is irradiated with, e.g. a UV lamp, tuned within the absorption band of such film, in air, to photobleach the film portions around channels covered by the masking strips and reduce the refractive index thereof below that of the unbleached film channels. The bleached film portions then provide reflective beam confining interfaces which define the unbleached channels and form waveguides within the film. The invention also provides for interfering two laser beams of like .lambda., at a coupling spot on the film, which beams are again tuned within the absorption band of such film, which bleach alternate lines or bars of such film to provide a phase grating therein.

Abstract: The invention provides a method by which a transparent defect (3) in a lithographic mask (1) can be effectively restored in a simple manner. For this purpose, the mask (1) is provided with a photosensitive layer (4) and is introduced into a solution of a metal ion (5). Subsequently, the mask is exposed at the area of the defect. The photosensitive layer (4) is capable of depositing the metal ion in the form of metal under the influence of the radiation (6) supplied. According to the invention, the exposure is continued until such a quantity of metal (7) has been deposited that the radiation can no longer penetrate to the photosensitive layer (4). At that instant, the metal deposition is stopped so that overgrowth of the metal deposit (7) is automatically counteracted in a simple manner.

Abstract: In a process for depositing a planarising material in spaces between a pattern of regions, such as dye stripes or dots, on a substrate, the planarising material is deposited as a layer over the pattern. The substrate is irradiated, from the reverse side, by a source of radiation, such as UV, to which the pattern material is opaque and to which the planarising material is responsive such that it is rendered insoluble to a particular solvent. The radiation acts on only those parts of the planarising material which are in the spaces. The remainder of the planarising layer is then removed by use of the solvent. Alternatively, or additionally, an ITO or other UV transparent layer may be formed over the pattern and a layer of resist formed thereover. The radiation then passes through the spaces and acts on only the resist areas over the spaces to render them soluble. Those areas and the ITO layer beneath them are then removed by etching, leaving ITO areas accurately aligned with the pattern.

Abstract: Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons.

Abstract: A light control sheet capable of scattering an incident light of particular incident angle is produced by a method composed of preparing a film of a composition containing at least two photopolymerizable components having different refractive indexes, irradiating on the film a light from a particular direction, and obtaining a cured film of the light control sheet product. Such other light control sheets as capable of scattering a plurality of incident lights each of particular incident angle are obtained by modification of the above-mentioned method.

Abstract: A new class of sensitizers for photopolymerizable compositions is disclosed derived from cyclic ketones and tricyclic aminoaldehydes. A preferred compound is cyclopentanone, 2.

Abstract: Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on descrimination as between scattered and unscattered radiation.

Abstract: A soft edge mask comprises a panel having an opaque area forming a mask portion and defined by a clearly focussed edge of a predetermined shape, a transparent area forming a clear portion defined by a clearly focussed edge of the same said predetermined shape, and a margin portion extending between the opaque portion and the clear portion, the margin portion having a light transmissability varying progressively from the edge of the mask portion to the edge of the clear portion, and, at each position between the mask portion and the clear portion, being clearly focussed and having the same said predetermined shape.

Abstract: A filter is formed on a substrate, such as a solid state imager, by providing successively on the substrate a layer of an absorber material, a layer of a barrier material, and a layer of a photoresist material. The photoresist is patternwise exposed and developed, thereby baring regions of the barrier layer underlying selected regions of the photoresist layer. The coated substrate is reactive ion etched under a first set of etching conditions to etch away the bared regions of the barrier layer and to bare but not substantially etch the underlying regions of the absorber layer, and then reactive ion etched under a second set of etching conditions, thereby etching away the remaining regions of the photoresist layer and the bared regions of the absorber layer, so forming a filter on the substrate. To form multi-colored filters, the process may be repeated with a different dye, or additional dyes may be deposited by other processes, such as that described in U.S. Pat. No. 4,808,501.

Abstract: The present invention relates to a durable pattern forming material having a protective film comprising a radiation cured product of a curable compound, comprising a phosphazene of the formula:--{NP(x) (Y)}.sub.n --wherein at least one of x and y is a polymerizable group and n is at least 3, superior in mechanical, optical and chemical properties which is characterized in that a cured protective film of a curable compound is formed on a photo mask or lith film on which a pattern of desired shape has been provided. This pattern forming material can be suitably used for formation of pattern in production of IC, printed circuit and hybrid IC.

Abstract: Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack.The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.

Abstract: According to the present blank plate and method for forming multi-color fluorescent planes, a photosensitive layer is formed on one side of a substrate and exposed to light from the other side thereof. The step of exposure to light is carried out with a combination of a full-color pattern including light-transmitting segments in coincidence with every color pattern with a single-color mask including light-transmitting segments corresponding to each color pattern. After the full-color pattern has been formed on the substrate, the photosensitive layer containing a fluorophore is formed and, then, exposed to light from the side of the substrate opposite to the side having the photosensitive layer formed thereon through the single-color mask attached in place, followed by development. The above steps are repeated to form a multi-color fluorescent plane having the desired pattern.

Abstract: A method of manufacturing color filters in which a photosensitive film, which is used for forming filter elements, is formed on a substrate. A photomask with a given stripe pattern is placed above the photoresistive film. Under this condition, the photomasked-film is subjected to a first exposure process. The photomask is then moved in the direction of the stripes in the mask pattern. Following a second exposure process, developing, dyeing and dyeing-preventing processes are performed for color filter element formation. The foregoing steps are performed for each filter element for a specified color.

Abstract: Process for the production of a photographic mask for tonal correction by dry dot etching wherein the selection of a particular halftone color separation image or overlaying registering combination of halftone color separation images used in a known process of mask production is not determined on the basis of the subjective attribute of color, i.e., hue, those areas to be color corrected, but is determined on the basis of optical density differences in at least one such halftone color separation, i.e., differences in contrast, between each area to be isolated as a substantially transparent area, and at least one particular background area surrounding each area to be isolated. The density differences can be compared between individual isolated areas and associated background areas directly or as the algebraic sums of such differences for a plurality of such areas. The calculation of the density differences and their comparison can be carried out by a computer.

Abstract: A highlight mask, especially suited for printing from positive color transparencies, is made of photochromic glass which, like Corning PHOTOGRAY EXTRA sunglass lens material, darkens not only under ultraviolet radiation but also under visible radiation in the blue range. The mask is made by mounting, onto its upper surface, a photo transparency and exposing it to flashes of intense light strong in the blue range. Such radiation penetrates the thin or highlight areas of a photo transparency, regardless of their color tint, and creates a negtive highlight-masking image in the glass. While it does not effect general contrast reduction over the entire film area, the highlight masking image requires no further development, remains in registration with the transparency for photoprinting, and fades in time or when heated, so that the glass may be reused.

Abstract: A method of making an integrated optical component in which a central planar region includes an optical circuit path and a lateral region includes an optical fiber positioning groove in alignment with the path. A glass body having central and lateral regions is coated with a mask material. A photolithographic technique is used to provide the mask material with a patterned opening in the central region corrsponding in shape to the circuit path and a patterned opening in the lateral region corresponding to the shape of the alignment groove. A layer of resisting material is applied over the mask on the central region and the lateral region is etched to form the groove. The layer of resisting material is removed, and the zone of the central region that is exposed by the opening in the mask is subjected to an ion exchange process in order to form therein an optical path that is in registration with the fiber positioning groove.

Abstract: In an optical lithographical system (e.g., 100) for printing features of a patterned mask (e.g., 103) into a workpiece (e.g., 120), such as in a semiconductor device, a one- or two-dimensional (depending on the features of the mask) optical transmission phase-shift diffracting device (e.g., 107) is inserted between an optical condensor (e.g., 105) and the patterned mask whose features are to be printed into the workpiece. The diffracting device is designed so as to enable an imaging lens system (e.g., 102) to collect more than merely a single order of the resulting diffraction patterns of the features of the mask and, by varying the spatial periodicity of the diffracting device, to tailor the illumination incident on the mask in accordance with the features (e.g., 114, 115) of the mask.

Abstract: Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons.