Abstract: A gate insulating film has a convex portion conforming to a surface shape of a gate electrode and a step portion that changes in height from a periphery of the gate electrode along the surface of the gate electrode. An oxide semiconductor layer is disposed on the gate insulating film so as to have a transistor constituting region having a channel region, a source region, and a drain region in a continuous and integral manner and a covering region being separated from the transistor constituting region and covering the step portion of the gate insulating film. A channel protective layer is disposed on the channel region of the oxide semiconductor layer. A source electrode and a drain electrode are disposed in contact respectively with the source region and the drain region of the oxide semiconductor layer. A passivation layer is disposed on the source electrode and the drain electrode.

Abstract: A repairing method, repairing device and repairing structure for repairing a signal line of an array substrate having the disconnected defect, including: setting a repairing route according to a position of the disconnected defect and determining a position at which a filling portion is required to be formed according to the repairing route; forming the filling portion at the position at which the filling portion is required to be formed; and forming a repairing line along the repairing route. By detecting the repairing route before repairing the disconnected defect by forming the filling portion according to the repairing route, the present disclosure can avoid the disconnection of the repairing line caused by great height differences of the surface under the repairing line and improve the repairing success rate of the disconnected defect.

Abstract: A substrate supporting thin film transistors thereon, each including a semiconductor layer and source-drain electrodes, wherein the source-drain electrodes are formed from a nitrogen-containing layer or oxygen/nitrogen-containing layer and a thin film of pure copper or copper alloy. The nitrogen-containing layer or oxygen/nitrogen-containing layer has respectively part or all of its nitrogen or part or all of its oxygen or nitrogen connected to silicon in the semiconductor layer of the thin film transistor, and the thin film of pure copper or copper alloy is connected to the semiconductor layer of said thin film transistor through the nitrogen-containing layer or oxygen/nitrogen-containing layer.

Abstract: The present invention relates to an array substrate for a fringe field switching (FFS) mode liquid crystal display device and a method for fabricating the same. The liquid crystal display device may include a gate line formed on the substrate; a data line crossed with the gate line to define a pixel region; a thin-film transistor (TFT) formed at an intersection of the gate and data line; an organic insulating layer formed to have an opening portion for exposing the TFT; a common electrode having an area formed at an upper portion of the organic insulating layer, and an auxiliary electrode pattern connected to the TFT through the opening portion; a passivation layer formed to expose the auxiliary electrode pattern connected to the TFT; and pixel electrodes electrically connected to the TFT through the exposed auxiliary electrode pattern.

Abstract: A liquid crystal display includes a first substrate, a second substrate, and a liquid crystal layer disposed therebetween. The first substrate includes: a first base substrate, a gate line disposed on the first base substrate, a first electrode disposed on the first base substrate, the first electrode configured to receive a driving voltage, a data line crossing the gate line, a bump disposed on and formed along the data line, and a second electrode including a shielding electrode portion disposed on the bump and a common electrode portion disposed in association with a center portion of the first electrode. The second substrate includes: a second base substrate facing the first base substrate, and color filters disposed on the second base substrate. Adjacent color filters partially overlap one another in a region comprising the bump to provide a protrusion portion protruded from the second base substrate towards the first base substrate.

Abstract: In a liquid crystal display device and a method of fabricating the same in accordance with the present invention, there is provided a liquid crystal display device with a color filter on TFT (COT) structure for a high-image quality and high-performance display, in which a light blocking pattern is formed with a double layer structure of an upper layer having a low-reflectance characteristic and a lower layer having a low-transmittance and high-conductance characteristic to replace a black matrix, thereby solving the image quality and luminance issues.

Abstract: A polarized glasses type stereoscopic image display device and a fabricating method thereof according to the present disclosure is characterized in that in a polarized glasses type stereoscopic image display device in which an image panel is implemented as a color filter on TFT (COT) type liquid crystal display (LCD) device, an internal reflection due to light shielding patterns with high reflectivity can be reduced by opening light shielding patterns formed on a black stripe region to the full and simultaneously forming a light shielding layer in such a manner of additionally depositing color pigments on the open light shielding patterns.

Abstract: A display panel includes a substrate, a first insulation layer, a first electrode, a liquid crystal layer, a second electrode and a second insulation layer. The substrate includes a thin film transistor (TFT). The first insulation layer is disposed on the substrate. The first electrode is disposed on the first insulation layer and is electrically connected to the TFT. The liquid crystal layer is disposed on the first electrode. The second electrode is disposed on the liquid crystal layer and includes a first grid structure adjacent to the liquid crystal layer. The second insulation layer is disposed on the second electrode and includes a second grid structure. Therefore, the durability of the display panel may be increased and light leakage may be prevented.

Abstract: A liquid crystal display includes a substrate; a thin film transistor on the substrate; a pixel electrode connected to the thin film transistor; a first insulating layer facing the pixel electrode; a plurality of microcavities each defined between the pixel electrode and the first insulating layer and including a liquid crystal injection hole exposing an inside of the microcavity; a liquid crystal layer including liquid crystal molecules, in the microcavities; a light blocking layer between adjacent microcavities; and a passivation layer member enclosing the light blocking layer.

Abstract: A manufacturing method of a liquid crystal display includes: providing a pixel electrode on an insulation substrate; providing a sacrificial layer on the pixel electrode; providing a common electrode on the sacrificial layer; providing a photoresist layer on the common electrode; exposing a portion of the photoresist layer, common electrode and the sacrificial layer with light; developing the portion of the photoresist layer exposed with the light; etching a layer between the photoresist layer and the sacrificial layer using the developed photoresist layer as a mask to expose the portion of the sacrificial layer exposed with the light; removing the portion of the sacrificial layer exposed with the light; providing a roof layer on the insulation substrate and etching the roof layer to form a liquid crystal injection hole therein; and removing the sacrificial layer exposed through the liquid crystal injection hole to form a microcavity.

Abstract: An organic light emitting diode (OLED) display and a method for manufacturing the same are provided. The OLED display includes a substrate, an active layer and a capacitor lower electrode positioned on the substrate, a gate insulating layer positioned on the active layer and the capacitor lower electrode, a gate electrode positioned on the gate insulating layer at a location corresponding to the active layer, a capacitor upper electrode positioned on the gate insulating layer at a location corresponding to the capacitor lower electrode, a first electrode positioned to be separated from the gate electrode and the capacitor upper electrode, an interlayer insulating layer positioned on the gate electrode, the capacitor upper electrode, and the first electrode, a source electrode and a drain electrode positioned on the interlayer insulating layer, and a bank layer positioned on the source and drain electrodes.

Abstract: Disclosed is a liquid crystal display device having touch sensors embedded therein. The liquid crystal display device includes a liquid crystal layer interposed between upper and lower substrates, pixels, each of which includes pixel and common electrodes applying a horizontal electric field to the liquid crystal layer, a pixel thin film transistor to drive the pixel electrode, and a common thin film transistor to drive the common electrode, touch sensors, each of which forms a sensing capacitor between an object and the common electrode, sensor power lines, readout lines, and sensor gate lines. Each touch sensor includes the common electrode, a first sensor thin film transistor charging the common electrode with the sensing driving voltage in response to control of the previous sensor gate line, and a second sensor thin film transistor outputting the sensing signal to the readout line in response to control of the current sensor gate line.

Abstract: A liquid crystal display device includes a pair of substrates of which one substrate is provided with a plurality of scanning lines and a plurality of common wirings, a first insulation film covering the scanning lines, the common wirings, and the one substrate, a plurality of signal lines provided on the first insulation film, a thin film transistor provided near an intersection part of the scanning lines and the signal lines, a lower electrode formed below the first insulation film and connected to the common wirings, a second insulation film formed on surfaces of the thin film transistor, the signal lines, and the first insulation film, and an upper electrode formed on the second insulation film and having a slit, a display region in which the liquid crystal layer is driven by an electric field, and a non-display region that is formed outside the display region.

Abstract: A display device includes a substrate, a thin film transistor disposed on the substrate, a pixel electrode connected to the thin film transistor, a common electrode disposed opposite to the pixel electrode and spaced apart from the pixel electrode, where a microcavity is defined between the common electrode and the pixel electrode, and a cutout is defined in the common electrode, an insulating layer disposed on the common electrode, a roof layer disposed on the insulating layer, where a liquid crystal injection hole is defined through the common electrode and the roof layer such that the common electrode and the roof layer expose a portion of the microcavity, a liquid crystal layer disposed in the microcavity, and an encapsulation layer disposed on the roof layer, where the encapsulation layer covers the liquid crystal injection hole, and seals the microcavity.

Abstract: The present invention provides a method for manufacturing a highly reliable display device at a low cost with high yield. According to the present invention, a step due to an opening in a contact is covered with an insulating layer to reduce the step, and is processed into a gentle shape. A wiring or the like is formed to be in contact with the insulating layer and thus the coverage of the wiring or the like is enhanced. In addition, deterioration of a light-emitting element due to contaminants such as water can be prevented by sealing a layer including an organic material that has water permeability in a display device with a sealing material. Since the sealing material is formed in a portion of a driver circuit region in the display device, the frame margin of the display device can be narrowed.

Abstract: A liquid crystal display includes a plurality of pixel electrodes and common electrodes disposed on a first substrate that overlap each other with a passivation layer interposed therebetween, and a connection portion disposed between a common voltage applying unit and the common electrode. The common electrode has a plurality of first cutouts, the passivation layer has a plurality of second cutouts, and the first cutout and the second cutout have substantially the same planar shape. The connection portion includes a lower connection portion formed from a same layer as the common electrode, and an upper connection portion disposed on the lower connection portion that includes a low resistance metal.

Abstract: An organic light-emitting display device includes a capacitor lower electrode that includes a semiconductor material doped with ion impurities. A first insulating layer covers an active layer and the capacitor lower electrode. A gate electrode includes a gate lower electrode formed of a transparent conductive material and a gate upper electrode formed of metal. A pixel electrode is electrically connected to the thin film transistor. A capacitor upper electrode is at the same level as the pixel electrode. An etch block layer is formed between the first insulating layer and the capacitor upper electrode. Source and drain electrodes are electrically connected to the active layer. A second insulating layer has an opening completely exposing the capacitor upper electrode. A third insulating layer exposes the pixel electrode. An intermediate layer includes an emissive layer. An opposite electrode faces the pixel electrode.

Abstract: An organic light emitting display device includes a substrate, a plurality of sub-pixels on the substrate, each sub-pixel including a first region configured to emit light and a second region configured to transmit external light, a plurality of thin film transistors disposed in the first region of the each sub-pixel, a plurality of first electrodes disposed in the first region of each sub-pixel and electrically connected to the thin film transistors, a first insulating layer on at least a portion of the first region of each sub-pixel to cover a portion of the first electrode, an organic emission layer on the first electrode, a second insulating layer on at least a portion of the second region of each sub-pixel, the second insulating layer including a plurality of openings therein, and a second electrode covering the organic emission layer, the first insulating layer, and the second insulating layer.

Abstract: The present invention provides a method for manufacturing a highly reliable display device at a low cost with high yield. According to the present invention, a step due to an opening in a contact is covered with an insulating layer to reduce the step, and is processed into a gentle shape. A wiring or the like is formed to be in contact with the insulating layer and thus the coverage of the wiring or the like is enhanced. In addition, deterioration of a light-emitting element due to contaminants such as water can be prevented by sealing a layer including an organic material that has water permeability in a display device with a sealing material. Since the sealing material is formed in a portion of a driver circuit region in the display device, the frame margin of the display device can be narrowed.

Abstract: The present disclosure discloses a method for manufacturing a TFT array substrate, comprising: depositing a gate metal layer, a gate insulating layer, a semiconductor layer and a source-drain electrode layer in this order on a base substrate, performing a first photolithograph process to form a common electrode line, a gate line, a gate electrode, a source electrode, a drain electrode and a channel defined between the source electrode and the drain electrode; depositing a passivation layer, performing a second photolithograph process to form a first via hole and a second via hole in the passivation layer; and depositing a pixel electrode layer and a data line layer in this order, perform a third photolithograph process to form a data line connected to the source electrode through the first via hole and a pixel electrode connected to the drain electrode through the second via hole.

Abstract: A display panel includes a lower substrate, an upper substrate and a liquid crystal layer. The liquid crystal layer includes a plurality of domains, a horizontal domain boundary texture area and a vertical domain boundary texture area. The domains are disposed in a matrix shape. The horizontal domain boundary texture area extends in a first direction in a boundary between the domains adjacent to each other in a second direction and has a slope of a liquid crystal slowly (e.g., less) inclined compared to that of the domains. The vertical domain boundary texture area extends in the second direction in a boundary between the domains adjacent to each other in the first direction and has a width larger than that of the horizontal domain boundary texture area.

Abstract: A photosensitive resin composition comprises about 10 wt % to about 50 wt % of a solute comprising about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound; and a solvent comprising a glycol-based material having a boiling point of greater than about 190° C., wherein the acryl-based copolymer is a copolymer of an unsaturated carbonic acid or an anhydride thereof, an epoxy group-containing unsaturated compound, and an olefin-based unsaturated compound.

Abstract: A liquid crystal display, includes: a substrate; a gate line including a gate pad and a data line including a data pad, the gate and data lines being disposed on the substrate; a thin film transistor connected to the gate line and the data line; an organic layer disposed on the thin film transistor; a pixel electrode disposed on the organic layer; a first contact assistant disposed on the gate pad; a second contact assistant disposed on the data pad; a first insulating layer disposed on the pixel electrode; and a common electrode disposed on the first insulating layer, the common electrode overlapping with the pixel electrode. The common electrode includes first cutouts, the first insulating layer includes second cutouts, the plane shapes of the first and second cutouts are substantially the same, and the pixel electrode includes a polycrystalline transparent conductive material.

Abstract: An electroluminescence element includes an electroluminescence substrate including a thin film transistor substrate, and a light-emitting layer provided over the thin film transistor substrate and divided by picture-element separating portions so as to correspond to unit picture elements; and a sealing substrate arranged to hermetically seal the light-emitting layer of the electroluminescence substrate. At least one of the electroluminescence substrate and the sealing substrate is a flexible substrate. Spacers are provided between the electroluminescence substrate and the sealing substrate.

Abstract: A liquid crystal display includes a microcavity formed on an insulation substrate that has a tapered side wall; a liquid crystal layer positioned in the microcavity; and a column portion in contact with the tapered side wall of the microcavity and between microcavities. The column portion includes a second column organic layer and a first column insulating layer formed outside the second column organic layer, and a side surface of first column insulating layer coincides with the side wall of the microcavity.

Abstract: A method of manufacturing an array substrate for an FFS mode LCD device includes forming a gate line and a gate electrode on a substrate, forming a pixel electrode in the pixel region, forming a gate insulating layer on the gate line, the gate electrode and the pixel electrode, forming a data line, a source electrode, a drain electrode, and a semiconductor layer on the gate insulating layer, forming a passivation layer on the data line, the source electrode and the drain electrode, the passivation layer including a drain contact hole and a pixel contact hole, and forming a connection pattern and a common electrode on the passivation layer, wherein the common electrode includes bar-shaped first openings in the pixel region, and the connection pattern contacts the drain electrode and the pixel electrode through the drain contact hole and the pixel contact hole, respectively.

Abstract: A light-emitting element of the present invention includes (i) a light-emitting layer (109), (ii) an electrode layer (110) being transparent to part of light emitted from the light-emitting layer (109), (iii) color converting layers (113, 114), and (iv) a transparent layer (115). The color converting layers (113, 114) and the transparent layer (115) sandwich the transparent electrode layer (110) with the light-emitting layer (109). The color converting layers (113, 114) and the transparent electrode layer (115) contain particles (116, 117, 118) expressing a surface plasmon phenomenon, respectively.

Abstract: A method for fabricating a display panel includes the following steps. A surface of a first substrate is adhered to a first supporting substrate with a first adhesive layer. First devices are formed on the other surface of the first substrate. The other surface of the first substrate is adhered to a second supporting substrate with a second adhesive layer. The first adhesive layer and supporting substrate are separated from the first substrate. Second devices are formed on the surface of the first substrate. A second substrate is adhered to a third supporting substrate with a third adhesive layer. The first substrate and the second substrate are assembled, and a display medium layer is interposed between the first substrate and the second substrate. The second adhesive layer and supporting substrate are separated from the first substrate, and the third adhesive layer and supporting substrate are separated from the second substrate.

Abstract: Substrates for solar cells are prepared by etching a plurality of metallurgical grade wafers; depositing aluminum layer on backside of each wafer; depositing a layer of hydrogenated silicon nitride on front surface of each wafer; annealing the wafers at elevated temperature; removing the hydrogenated silicon nitride without disturbing the aluminum layer. A solar cell is then fabricated on the front surface of the wafer while the aluminum remain to serve as the back contact of the cell.

Abstract: A liquid crystal display (LCD) includes an array of pixels over a thin film transistor (TFT) substrate. The TFT substrate includes a TFT that has a first metal layer to form a gate electrode and a second metal layer to form a source electrode and a drain electrode for each pixel. The LCD also includes an organic insulation layer disposed over the TFT substrate, where the organic insulator layer has trenches on a top surface. The LCD further includes a third metal layer disposed over the organic insulation layer in the trenches, the trenches having a trench depth at least equal to the thickness of the third metal layer. The LCD also includes a passivation layer over the third metal layer, and a pixel electrode for each pixel over the passivation layer. The LCD further includes a polymer layer over the pixel electrode, and liquid molecules on the polymer layer.

Abstract: A liquid crystal display includes a display area and a non-display area. The liquid crystal display includes a first base substrate, a pixel disposed on the first base substrate in the display area, a second base substrate, a common electrode disposed on the second base substrate, a liquid crystal layer disposed between the first base substrate and the second base substrate, and an electric field control line disposed on the first base substrate in the non-display area. The electric field control line is disposed on a same layer as the pixel electrode.

Abstract: A carbon doped short period superlattice is provided. A heterostructure includes a short period superlattice comprising a plurality of quantum wells alternating with a plurality of barriers. One or more of the quantum wells and/or the barriers includes a percolated carbon atomic plane.

Abstract: To provide a laser cutting method that is capable of cutting the substrates high accurately with high throughput at a low cost. It is a laser cutting method for cutting a laminated substrate that is formed by laminating at least a pair of substrates. The method comprises the steps of: providing a pattern member with a characteristic of absorbing light of a wavelength that transmits each of the substrates, between each of the substrates along a cutting position of the laminated substrate; and irradiating a laser of the wavelength that transmits the substrates along the pattern member, whereby the laminated substrate is cut along the pattern member.

Abstract: One object is to provide a method for manufacturing a display device in which shift of the threshold voltage of a thin film transistor including an oxide semiconductor layer can be suppressed even when ultraviolet light irradiation is performed in the process for manufacturing the display device. In the method for manufacturing a display device, ultraviolet light irradiation is performed at least once, a thin film transistor including an oxide semiconductor layer is used for a switching element, and heat treatment for repairing damage to the oxide semiconductor layer caused by the ultraviolet light irradiation is performed after all the steps of ultraviolet light irradiation are completed.

Abstract: A method of manufacturing an array substrate for an FFS mode LCD device includes forming a gate line, a gate electrode and a pixel electrode on a substrate; forming a gate insulating layer; forming a data line, source and drain electrodes, and a semiconductor layer on the gate insulating layer, the drain electrode overlapping the pixel electrode; forming a passivation layer on the data line, the source and drain electrodes; forming a contact hole exposing the drain electrode and the pixel electrode by patterning the passivation layer and the gate insulating layer; and forming a common electrode and a connection pattern on the passivation layer, wherein the common electrode includes bar-shaped openings and a hole corresponding to the contact hole, and the connection pattern is disposed in the hole, is spaced apart from the common electrode and contacts the drain electrode and the pixel.

Abstract: The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.

Abstract: A liquid crystal display includes a first substrate including a plurality of pixels, a second substrate facing the first substrate, and a liquid crystal layer interposed between the first substrate and the second substrate. At least one of the pixels includes a thin film transistor disposed on a first insulating substrate, an insulating layer overlapping the thin film transistor, and a pixel electrode disposed on the insulating layer. A contact hole is formed through the insulating layer to expose a first electrode of the thin film transistor, the pixel electrode is electrically connected to the first electrode through the contact hole, and the pixel electrode has a single-layer in an area where the contact hole is formed and a double-layer on the insulating layer.

Abstract: A display panel comprises: a first substrate and a second substrate between which a liquid crystal cell is formed; the first substrate comprises a first electrode layer provided thereon, and the second substrate comprises a second electrode layer provided thereon; the first electrode layer comprises a plurality of first electrode strips that are electrically connected, The second electrode layer comprises a plurality of second electrode strips that are electrically connected, and the first electrode strips and the second electrode strips are disposed alternately; each pair of the first electrode strip and the second electrode strip adjacent to each other are capable of generating a horizontal electric field therebetween after being applied with a voltage.

Abstract: A method of fabricating a fringe field switching (FFS)-liquid crystal display (LCD) device may have the following advantage. An inferior connection between the drain electrode and the pixel electrode may be prevented by preventing formation of a copper compound on the drain electrode, by performing a back channel etching after patterning a pixel electrode, and by performing a wet strip rather than a dry strip. This may result in a direct contact between copper and ITO, thereby reducing the number of mask processes.

Abstract: A pressure purging device for an inkjet recording apparatus includes a back pressure tank 21, a distribution tank 12, ink opening/closing electromagnetic valves 13, and recording heads 14, and in which the distribution tank 12 is connected to the back pressure tank 21 via an ink supply path 24, the ink opening/closing electromagnetic valves 13 are attached to the distribution tank 12 while being connected to the recording heads 14 via the distribution supply pipe 15, the ink opening/closing electromagnetic valves 13 are directly attached to the distribution tank 12, and there is provided an air switching three-port electromagnetic valve 61 connected to an upper part inside of the back pressure tank 21 via an air path 63 while being connected to a compressed air supply path 62.

Abstract: A thin film transistor for increasing the conductivity of a channel region and suppressing the leakage current of a back channel region, and a display device including the thin film transistor, are discussed. According to an embodiment, the thin film transistor includes a gate electrode arranged on a substrate, a source electrode and a drain electrode spaced from each other on the substrate, a gate insulating film to insulate the gate electrode from the source electrode and the drain electrode, and a semiconductor layer insulated from the gate electrode through the gate insulating film, the semiconductor layer including a channel region and a back channel region, the semiconductor layer made of (In2O3)x(Ga2O3)y(ZnO)z(0?x?5, 0?y?5, 0?z?5), wherein X or Z is greater than Y in the channel region of the semiconductor layer, and Y is greater than X and Z in the back channel region of the semiconductor layer.

Abstract: A display apparatus includes a display substrate and a counter substrate. The display substrate includes a first substrate and a plurality of pixel electrodes formed on the first substrate. The counter substrate includes a second substrate facing the first substrate, a common electrode formed on the second substrate, a first spacer formed on the common electrode and making contact with the display substrate, a second spacer having a first gap with the display substrate, a third spacer having a second gap larger than the first gap with the display substrate, and a fourth spacer having a third gap larger than the second gap with the display substrate.

Abstract: A display substrate is provided that can prevent the opening of an upper conduction layer. The display substrate comprises a semiconductor layer pattern formed on a substrate, a data interconnection pattern formed on the semiconductor layer pattern, a protection layer formed on the substrate and the data interconnection pattern, contact holes formed on the substrate to expose at least a portion of an upper surface of the semiconductor pattern and at least a portion of an upper surface of the data interconnection pattern, and contact electrodes formed in the contact holes to be in contact with the exposed upper surfaces of the data interconnection pattern and the semiconductor layer pattern.

Abstract: Technologies are generally described for generating an image in a holographic imaging device by causing multiple reflections of a hologram reconstruction light on one side of a display panel in the holographic imaging device. An example device may include a display panel, a semi-transparent mirror layer on the display panel, a mirror layer at a side of the semi-transparent mirror layer opposite to the display panel, and a light irradiation unit opposite to the semi-transparent mirror layer. The light irradiation unit may irradiate a hologram reconstruction light on the semi-transparent mirror layer at a predetermined incident angle. The semi-transparent mirror layer may reflect a portion of the hologram reconstruction light such that the reflected portion of the hologram reconstruction light may be incident on the mirror layer. The semi-transparent mirror layer may transmit the other portion of the hologram reconstruction light to cause interference in the hologram.

Abstract: A method of forming a liquid crystal alignment layer includes the following steps. A substrate is provided. A base layer is then formed on the substrate. A first liquid crystal alignment layer is formed on the base layer. The first liquid crystal alignment layer includes a plurality of first organic molecules. Each of the first organic molecules includes a first carboxyl group part and a first alkyl group part. A display panel includes the substrate, a counter substrate, a liquid crystal layer, and the first liquid crystal alignment layer. The substrate is disposed opposite to the counter substrate. The liquid crystal layer is disposed between the substrate and the counter substrate. The first liquid crystal alignment layer is disposed between the liquid crystal layer and the substrate.

Abstract: The present invention relates to photoreactive compounds that are particularly useful in materials for the alignment of liquid crystals.

Abstract: A method for laser separation of a thin film structure with multi junction photovoltaic materials. The method includes providing an optically transparent substrate having a thickness, a back surface region, and a front surface region including an edge region. The method further includes forming a thin film structure including a conductive layer on the optical transparent substrate. The conductive layer immediately overlies the front surface region. Additionally, the method includes aligning a laser beam with a beam spot on a first portion of the edge region from the back surface region through the thickness of the optically transparent substrate. The method further includes subjecting at least partially the conductive layer overlying the first portion via absorbed energy from the laser beam to separate an edge portion of the thin film structure from the first portion of the edge region.

Abstract: To provide a light-emitting device including the plurality of light-emitting elements having a structure in which a light-emitting area is large and defects in patterning of light-emitting elements are suppressed. To provide a lighting device including the light-emitting device. The light-emitting device includes a first wiring provided over a substrate having an insulating surface, an insulating film provided over the first wiring, a second wiring provided over the insulating film, and a light-emitting element unit including a plurality of light-emitting elements provided over the first wiring with the insulating film provided therebetween. The plurality of light-emitting elements each include a first electrode layer having a light-blocking property, a layer containing an organic compound in contact with the first electrode layer, and a second electrode layer having a light-transmitting property in contact with the layer containing an organic compound.

Abstract: A method to manufacture a display device, includes: forming, on a substrate of the display device, a sacrificial layer including a material, the material including at least one of amorphous carbon, a metal, and an inorganic material; forming a layer covering the sacrificial layer; forming an injection hole exposing the sacrificial layer; removing, via the injection hole, the sacrificial layer to form a microcavity; and disposing liquid crystal in the microcavity.

Abstract: A liquid crystal display includes a gate line formed on an insulation substrate. A data line, insulated from the gate line, crosses the gate line. A first pixel is connected to the gate line and the data line. The pixel includes a thin film transistor having a control terminal connected to the gate line and an input terminal connected to the data line. A first liquid crystal capacitor has one end connected to an output terminal of the thin film transistor. A second liquid crystal capacitor has one end connected to the other end of the first liquid crystal capacitor. The first liquid crystal capacitor includes a first liquid crystal layer formed in a first microcavity and the second liquid crystal capacitor includes a second liquid crystal layer formed in a second microcavity.