Abstract: A thin film semiconductor die circuit package is provided utilizing low dielectric constant (k) polymer material for the insulating layers of the metal interconnect structure. Five embodiments include utilizing glass, glass-metal composite, and glass/glass sandwiched substrates. The substrates form the base for mounting semiconductor dies and fabricating the thin film interconnect structure.

Abstract: A method for producing printed circuits utilizing direct printing methods to apply a pattern mask to a substrate. The direct printing methods include correcting positional errors in a printing apparatus by ascertaining the errors in the printer through comparison of a printed pattern and a known standard pattern. Printer inputs are manipulated to compensate for the ascertained errors of the printer. The pattern mask applied by the corrected printer may be an etch resist mask for forming conductive pathways by an etching process, or the pattern mask may be a plating mask with conductive pathways being formed by a plating operation. The process of the present invention is applicable to forming both single-sided and double-sided printed circuit boards.

Abstract: A flip-chip package and packaging method use a substrate having bond pad spacing that matches terminal spacing on a chip at an elevated temperature, such as the temperature of the chip during bonding to the substrate, the melting point of solder used on the chip, a temperature within the range of thermal cycling of the chip, or an operating temperature of the chip. Matching spacing at an elevated temperature permits a better alignment at the bonding temperature for formation of stronger bonds.

Abstract: Conductive contacts in a semiconductor structure, and methods for forming the conductive components are provided. The contacts are useful for providing electrical connection to active components beneath an insulation layer in integrated circuits such as memory devices. The conductive contacts comprise boron-doped TiCl4-based titanium nitride, and possess a sufficient level adhesion to the insulative layer to eliminate peeling from the sidewalls of the contact opening and cracking of the insulative layer when formed to a thickness of greater than about 200 angstroms.

Abstract: A method for forming a semiconductor device includes fabricating one or more digital circuits on a substrate; selectively fabricating either a memory circuit or a conductive pattern substantially above the digital circuits to control portion of digital circuits; and fabricating an interconnect and routing layer substantially above the digital circuits and memory circuits to connect digital circuits and one of the memory circuit or the conductive pattern.

Abstract: A method for forming printed re-routing for wafer level packaging, especially chip size packaging. The method includes forming a contact layer on a semiconductor die, printing a conductive redistribution structure on the contact layer, and etching the contact layer of the die by using the conductive redistribution structure as a self-aligning mask.

Abstract: MRAM cells are placed in the upper regions (BEOL) of an integrated circuit while simultaneously maintaining the dimensions needed for good MRAM performance and also for good operation of the logic circuit by setting the standard vertical dimension of the BEOL at the value that is suitable for logic circuits. In the areas where MRAM cells are to be placed, the (N+1)th level is etched separately. A standard etch is applied in logic areas and a deeper etch is applied in MRAM areas, so that the interlevel distance in the logic areas is the standard amount and the interlevel distance is MRAM areas is a lesser amount that is appropriate to accommodate the vertical dimensions of the material layers that go into the MRAM cells.

Abstract: A method of forming conductive patterns comprises preparing layout data about macro cells, preparing data about layouts of top-layer conductive pattern metal cells and preparing data about conductive patterns between the macro cells, inputting to the macro cells and outputting from the macro cells. Then measurement-required points of the conductive patterns lying between the macro cells are specified. The top-layer conductive pattern metal cell is interposed in each of the measurement-required points. Finally, layouts of the macro cells and conductive patterns are determined so that layout data is created.

Abstract: Two types of topologically different three-dimensional integrated circuits (for example a 4-layer three-dimensional memory array and an 8-layer three-dimensional memory array) are fabricated from a single set of photolithographic masks. In one example, masks 1-5 are used along with other masks to create the first four levels of memory cells in both a 4-layer memory array and an 8-layer memory array. The 8-layer memory array is completed with masks used to form the top four layers of the array. An integrated circuit identification circuit generates an appropriate circuit identification signal for both types of integrated circuits by sensing whether a conductive path across some or all of the device levels of the integrated circuit is continuous, and then by selecting the appropriate circuit identification signal.

Abstract: Selective application of solder bumps in an integrated circuit package. Solder bumps are selectively applied in a solder bump integrated circuit packaging process so that portions of a circuit can be effectively disabled. The bumps may be selectively applied either to a die or to the substrate using multiple solder masks, one for each pattern of solder bumps desired or can be otherwise applied in multiple patterns depending upon which portions of the circuitry are to be active and which are to be disabled.

Abstract: A method of reducing substrate coupling and noise for one or more RFCMOS components comprising the following steps. A substrate having a frontside and a backside is provided. One or more RFCMOS components are formed over the substrate. One or more isolation structures are formed within the substrate proximate the one or more RFCOMS components. The backside of the substrate is etched to form respective trenches within the substrate and over at least the one or more isolation structures. The respective trenches are filled with dielectric material whereby the substrate coupling and noise for the one or more RFCMOS components are reduced.

Abstract: A method for making an HDI circuit including backside connections uses parylene as a protective coating. The method includes the steps of: procuring an insulating substrate including an active chip which has exposed electrical or thermal connection(s) on the rear surface thereof, applying a parylene coating to the exposed connections to protect the connections; performing additional HDI interconnect processing steps as desired on the front surface of the substrate; selectively removing a portion of the parylene coating to expose at least a portion of a connection; and making electrical connection to the exposed backside connections by application of a conductive material in its liquid state to the removed regions. The parylene coating is removed by an excimer laser. The step of making electrical connection to the backside electrical connections may be performed by application of solder, or conductive epoxy in its liquid state.

Abstract: In a semiconductor device using fill shape patterns incorporated into wiring levels to increase the planarity of the wiring levels, the fill shapes are aligned from one wiring level to another wiring level to provide lines of sight to lower wiring levels for visual inspection. Also, in accordance with the invention, selected aligned fill shapes are interconnected with vias to form conductive stacks for contacting lower wiring level conductive wires from upper wiring levels in order to perform electrical test probing/diagnostics.

Abstract: The positions of first terminals of a first semiconductor chip have a plane symmetrical relationship with the positions of second terminals of a second semiconductor chip. First buffer circuits of the first semiconductor chip are identical with second buffer circuits of the second semiconductor chip at least in design. First and second internal circuits are identical with each other at least in design. The first and second semiconductor chips have different interconnecting lines.

Abstract: A semiconductor device includes a semiconductor chip and a circuit formed in the semiconductor chip. Pads are arranged in a plurality of rows on the semiconductor chip and electrically connected to the circuit. The pads on adjacent rows are offset from each other. Leads are provided on the semiconductor chip and bonding wires selectively connect the leads to the pads.

Abstract: An integrated circuit is protected from reverse engineering by connecting doped circuit elements of like conductivity with a doped implant in the substrate, rather than with a metallized interconnect. The doped circuit elements and their corresponding implant interconnections can be formed in a common fabrication step with common implant masks, such that they have an integral structure with similar dopant concentrations. The metallization above the substrate surface can be designed to provide further masking of the interconnects, and microbridges can be added to span strips of transistor gate material in the interconnect path.

Abstract: A method for providing a fill pattern for integrated circuit designs is disclosed. A keepout file having keepout data is generated from a chip design layout file having chip design layout data. The keepout file includes a map of areas of an integrated circuit design where fill patterns cannot be placed. The map of areas from the keepout file is then overlaid with a fill pattern to yield a fill-pattern file. Fill patterns from the fill-pattern file is removed from locations that coincide with locations as defined by the keepout data to yield a final-fill file with crucial fill pattern data. The crucial fill pattern data from the final-fill file is overlaid on the design layout data in the chip design layout file to yield a complete design layout file. Finally, the design rule integrity and logical to physical correspondence of the complete design layout file is verified.

Abstract: Methods and apparatus for increasing the yield achieved during high density interconnect (HDI) production. In particular, processes in which panels are tested to identify good cells/parts, good cells are removed from the panels, and new panels created entirely of identified/known good cells allow increases in the number of layers used in a HDI without incurring the decrease in yield normally associated with such a layering process.

Abstract: An automatic wiring method for a semiconductor package includes: a provisional wiring step for sequentially specifying a plurality of lines of the terminals from the innermost periphery to the outermost periphery of bonding pads, connecting the bonding pads to predetermined vias present on the specified line of the terminal with line segments, and provisionally determining a wiring route for each line of the terminal such that the line segment passes through between the vias in each line of the terminal at equal intervals; and a wiring formation step for forming the wiring based on a design rule such that the wiring pattern passes through between the lines of the terminals with uniform intervals between wires based on the provisionally wired wiring routes.

Abstract: In one aspect, the invention provides a method of forming an electrical connection in an integrated circuitry device. According to one preferred implementation, a diffusion region is formed in semiconductive material. A conductive line is formed which is laterally spaced from the diffusion region. The conductive line is preferably formed relative to and within isolation oxide which separates substrate active areas. The conductive line is subsequently interconnected with the diffusion region. According to another preferred implementation, an oxide isolation grid is formed within semiconductive material. Conductive material is formed within the oxide isolation grid to form a conductive grid therein. Selected portions of the conductive grid are then removed to define interconnect lines within the oxide isolation grid. According to another preferred implementation, a plurality of oxide isolation regions are formed over a semiconductive substrate.

Abstract: An integrated chip package structure and method of manufacturing the same is by adhering dies on a silicon substrate and forming a thin-film circuit layer on top of the dies and the silicon substrate. Wherein the thin-film circuit layer has an external circuitry, which is electrically connected to the metal pads of the dies, that extends to a region outside the active surface of the dies for fanning out the metal pads of the dies. Furthermore, a plurality of active devices and an internal circuitry is located on the active surface of the dies. Signal for the active devices are transmitted through the internal circuitry to the external circuitry and from the external circuitry through the internal circuitry back to other active devices. Moreover, the chip package structure allows multiple dies with different functions to be packaged into an integrated package and electrically connecting the dies by the external circuitry.

Abstract: A method of fabricating a microdevice having the steps of forming a first regular array of lines and spaces from a first layer of material deposited on a substrate; patterning the first regular array of lines and spaces to form a first portion of a microdevice component; providing an intermediate layer over the first portion of the microdevice component; forming a second regular array of lines and spaces from a second layer of material deposited on the intermediate layer; patterning the second regular array of lines and spaces to form a second portion of the microdevice component; and forming contact holes in the intermediate layer to establish conductivity between the first portion of the microdevice component and the second portion of the microdevice component.

Abstract: A 16 megabit (224) or greater density single deposition layer metal Dynamic Random Access Memory (DRAM) part is described which allows for a die that fits within an industry-standard 300 ml wide SOJ (Small Outline J-wing) package or a TSOP (Thin, Small Outline Package) with little or no speed loss over previous double metal deposition layered 16 megabit DRAM designs. This is accomplished using a die architecture which allows for a single metal layer signal path, together with the novel use of a lead frame to remove a substantial portion of the power busing from the die, allowing for a smaller, speed-optimized DRAM. The use of a single deposition layer metal results in lower production costs, and shorter production time.

Abstract: A method for installing protective components in integrated circuits constructed from standard cells includes reserving sufficient space in the standard cells for at least one protective component, wiring the standard cells and determining which standard cells require a protective component and inserting at least one protective component into the standard cells. A place marker can mark the space required for a protective component in the integrated circuit layout. The protective component can be a protective diode. Protective component connections can be provided in the standard cells. The standard cells can be gate arrays.

Abstract: A wiring pattern formation method for forming a wiring pattern on a wafer by using a transcribing operation includes a transcribing step of thermally pressing and adhering a transcribing original substrate 19 that contains a metallic wiring layer 15 to be transcribed and has a linear expansion coefficient in which a dimensional error from a wafer 10 is within a predetermined range in a heated condition, on the wafer 10, and then adhering and transcribing the metallic wiring layer 15.

Abstract: The present invention is directed to an apparatus and method for connecting integrated circuits placed on opposite sides of a circuit board through utilization of conduction elements embedded in the circuit board and extending from one surface of the board to the other. Conductive traces extend along the surface of the circuit board from the conduction elements to the integrated circuits. The conductive traces may be formed from multiple conductive layers.

Abstract: Components or solid-state chips having electrical contacts containing copper are laminated to Kapton dielectric film, and through vias are formed down to copper-containing material of the component. A fabrication method is described for making reliable connections to the copper-containing materials. The method includes precoating the copper-containing material with SPIE, together with at least argon plasma cleaning, and possibly fluorine plasma etching, of the vias and copper material exposed at the bottoms of the vias.

Abstract: The master slice type semiconductor integrated circuit includes sequential circuit cells (2) and combinational circuit cells (3), which are alternately arranged in an inner core area on a semiconductor chip (1), and a plurality of selective driving elements (MC101 to MC108, MC201 to MC216 and MC301 to MC316), which are connected in a shape of a tree, for selectively distributing a poliphase clock signal for each division area formed by uniformly dividing the inner core area. The plurality of selective driving elements are placed and connected on the semiconductor chip such that load and wiring length between the sequential circuit cells within the respective division areas and input terminals to which the poliphase clock signal is inputted are equal.

Abstract: A repair fuse element and method of construction are disclosed that eliminate or substantially reduce the disadvantages and problems associated with prior fuse elements. In one embodiment, the fuse element is constructed with a rectangular-shaped contact. The contact is made long enough so that it makes contact at each end with a metal layer, but design rule spacing is still maintained between the connections with the metal layer. The overlapping areas between the rectangular contact and the metal layers are asymmetrical. Alternatively, these overlapping areas are smaller than the design rule overlap requirements. In a second embodiment, a fuse element is constructed with a plurality of rectangular-shaped contacts. As a result, a current value that is significantly lower than conventional fuse current values, can be used to melt such a contact or blow the fuse.

Abstract: The present invention is to provide a method of computing wiring capacitance to be able to get parasitic capacity depending on the wiring at high speed and with great accuracy, and to provide a method of computing signal propagation delay due to cross talk to be able to remove surplus margins at high speed when delay is predicted. In design of LSIs such as microprocessors or the like, total capacity Ctotal per unit length is determined about each of a plurality of models altering adjacent wiring ((a) no adjacent wiring, (b) one-side adjacent wiring, and (c) both-sides adjacent wiring) and/or crossing ratios ((i) 0%, (ii) 33%, (iii) 67%, and (iv) 100%) and, thereby, a library is formed from these to design the LSI. Regarding characteristic of this total capacity per unit length, the capacity depending on increase of the crossing ratio has a high increase rate in an area of a low crossing ratio, while the capacity depending on increase of the crossing ratio has the low increase rate in high crossing ratio.

Abstract: A semiconductor device is designed by disposing a plurality of cells. The semiconductor device is equipped with a semiconductor substrate 1, transistors formed in the semiconductor substrate, a first wiring pattern 100 and a second wiring pattern 200 formed respectively in a first cell and a second cell disposed adjacent to each other in a X direction in a wiring layer disposed over the semiconductor substrate in layer, the first wiring pattern 100 and the second wiring pattern 200 having portions extending in parallel with each other in a Y direction perpendicular to the X direction, and an interlayer dielectric layer formed as a lower layer of the wiring layer, the interlayer dielectric layer having openings formed at locations corresponding to a position 11 or 12 of the first wiring pattern and a position 22 or 21 of the second wiring pattern, respectively.

Abstract: There is disclosed a semiconductor device comprising a copper interconnect layer 7 where a copper film is buried in a concave in an insulating film 3 via a barrier metal film, wherein the copper interconnect layer 7 has a line/space ratio of 4.5 or less and an interconnect occupancy of 10 to 60%. It can effectively prevent dishing and erosion, as well as increase and dispersion in an interconnect resistance when forming damascene copper interconnects.

Abstract: A data bus architecture for integrated circuit embedded dynamic random access memory (“DRAM”) having a large aspect ratio (length to width ratio) which serves to reduce power requirements in the data path through the use of multiple metal layers to reduce capacitance on the data busses. This architecture is particularly advantageous for use in addressing data bussing problems inherent in integrated circuit devices having embedded DRAM with a large aspect ratio as well as a relatively large number of input/outputs (“I/Os”) which must be located along one narrow side of the memory. In accordance with the present invention, the memory is divided into multiple sections with data bussing in those sections routed in one metal, or conductive, layer. A different metal layer is used to route global data across these sections to a data register located on one edge of the memory.

Abstract: A 2-input NOR gate with NMOS transistors and PMOS transistors formed on different semiconductor layers, and a fabricating method for the same, are disclosed. The NMOS and PMOS transistors of the CMOS transistors are formed on different semiconductor layers unlike in the conventional technique, thereby improving the chip density. Further, the device isolating film forming process can be eliminated, and therefore, the fabrication process can be simplified, while the problems such as punch-through, latch-up and the like can be solved.

Abstract: A structure and a method for forming cells in power line areas between macro cell in a macro block area. In a power line level, a pin is formed between VSS and VDD lines. The pin is connected to the buffer cell. Next a signal line layer is formed and the signal line is connected to the pin and to a driver. In a first embodiment the driver is formed in a standard cell area. In a second embodiment the driver is formed in a micro cell. A signal line is connected to the pin and the driver.

Abstract: The present invention is a level of an integrated circuit. The level of integrated circuit has a first area having a plurality of features having a first density and the level of the integrated circuit has a second area adjacent to the first area wherein the second area has a plurality of dummy features having a density substantially similar to the first density.

Abstract: A multi-chip module (“MCM”) and methods of operation and manufacture thereof. The MCM includes: (1) a substrate for supporting a plurality of separate integrated circuit (IC) chips thereon, (2) first and second separate IC chips mounted on the substrate, the first separate IC chip including first and second circuit portions coupled together by at least one signal conductor, and (3) interconnecting means that directly couples at least one signal conductor of the first separate IC chip to the second separate IC chip, the interconnecting means bypassing the second circuit portion of the first separate IC chip.

Abstract: A memory device wherein a diode is serially connected to a programmable resistor and is in electrical communication with a buried digit line. An electrically conductive plug is electrically interposed between the digit line and a strapping layer, thereby creating a double metal scheme wherein the strapping layer is a second metal layer overlying metal wordlines. In a method of a first embodiment the strapping material is electrically connected to the digit line through a planar landing pad overlying the conductive plug. An insulative material is sloped to the planar landing pad in order to provide a surface conducive to the formation of the strapping material.

Abstract: A method of manufacturing conductive lines that are thicker (not wider) in the critical paths areas. We form a plurality of first level conductive lines over a first dielectric layer. The first conductive lines run in a first direction. The first level conductive lines are comprised of a first level first conductive line and a second first level conductive line. We form a second dielectric layer over the first level conductive lines and the first dielectric layer. Next, we form a via opening in the second dielectric layer over a portion of the first level first conductive line. A plug is formed filling the via opening. We form a trench pattern in the second dielectric layer. The trench pattern is comprised of trenches that are approximately orthogonal to the first level conductive lines. We fill the trenches with a conductive material to form supplemental second lines. We form second level conductive lines over the supplemental second lines and the plug.

Abstract: A method for assigning signal traces to one of a plurality of power planes on a power layer of an integrated circuit package. The integrated circuit package has an integrated circuit signal contact region, a top routing layer, and a bottom routing layer. The power layer underlies both the top routing layer and the bottom routing layer. First signal traces on the bottom routing layer are routed from contacts disposed in a core portion of the integrated circuit signal contact region to first ball contacts disposed within a first perimeter of the integrated circuit package. The first perimeter has dimension corresponding to a first distance from the integrated circuit signal contact region. Second signal traces on the top routing layer are routed from contacts disposed in a peripheral portion of the integrated circuit signal contact region to second ball contacts.

Abstract: A multichip semiconductor package, and method of making is provided that has a plurality of semiconductor chips fabricated in electrical isolation one from another integrally on a singular coextensive substrate useful for numerous and varied semiconductor chip applications. The semiconductor chips, instead of being singulated into a plurality of single-chip packages, are kept as integrally formed together and are thereafter electrically connected together so as to form a larger circuit. Encapsulated follows so as to form a single, multichip package. Common signals of the plurality of semiconductor chips are bussed together in electrical common across the substrate to a common electrode suitable for electrically providing the signal to another, external circuit, such as a PWB. The common bussing is achieved by conductive leads disposed across the substrate in pair sets having an extended portion that accommodates the common electrode in contact therewith.

Abstract: The shape of chrome patterns on an optical pattern transfer tool are adjusted to get a desired shape on a wafer in the manufacture of semiconductor devices, wherein very small regions on a photoresist are defined and these regions are controlled with a high degree of accuracy. The optical pattern transfer tool has first and second planar surfaces lying in substantially parallel planes and a plurality of opaque regions overlying the first planar surface. First and second steps formed between and the first and second planar surfaces at first and second edges, respectively, define a width of the first planar surface. Each of the opaque regions are spaced from one another and offset from one another such that they are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge.

Abstract: In the present method for fabricating metal interconnections, a Ni film is deposited on an insulating substrate by electroless plating, and a photoresist film is formed in a specified pattern on the Ni film. An Au film is deposited by electroless plating in a region where the Ni film is exposed and where the resist is not formed. The photoresist film is removed, and the Ni film exposed by the removal of the photoresist film is removed by etching. A Cu film is formed on the Au film by electroplating or electroless plating selectively. This method consists of only wet deposition process, involves less etching process and provides metal interconnections of low resistance.

Abstract: Disclosed is a nonvolatile memory device comprising a semiconductor substrate defining first and second active regions arranged in one direction; a first gate insulating layer and a floating gate deposited on the first and second active regions in a predetermined pattern; a second gate insulating layer and a control gate line deposited in one direction perpendicular to the first and second active regions and covering the floating gate; first impurity regions formed in the first and second active regions at one side of the control gate line; second impurity regions formed in the first and second active regions at other side of the control gate line; first contact plugs contacted with the first impurity regions; and a common conductive line formed in one direction on the semiconductor substrate at the other side of the control gate line, for connecting the second impurity regions of the first and second active regions.

Abstract: A ROM is embedded within an array of DRAM cells by changing a single mask in a DRAM fabrication process to selectively short circuit the DRAM capacitor lower electrode to its own wordline to create a read-only “1” or to the wordline of an adjacent cell to create a read only “0”.

Abstract: The present invention provides a three-dimensional chip assembly and the corresponding methods for producing such an assembly. The present invention utilizes flip chip technology, i.e., using solder balls to directly connect the chip to the substrate, to create chip assemblies that can be arranged in horizontal arrays of varying geometries as well as being stacked at chosen points in such arrays to produce a three dimensional array or assembly of semiconductor chips. Since the designer can specify the geometry of the arrays, this invention allows the creation of customized three-dimensional chip assemblies that maximize the internal space utilization of the devices that they are integrated into.

Abstract: A method for positioning bond pads in a semiconductor die comprises the steps of (I) setting parameters including (a) setting a baseline pad pitch to a first value, (b) setting a first pad position equal to a first pad value and (c) providing a focal point; (II) determining a first angle between a first line through a center of the first pad position and the focal point and a second line through a center of the semiconductor die and normal to the edge; (III) determining a first pad spacing increment value equal to the first value divided by a cosine of the first angle; (IV) setting a second pad position equal to a second pad value, wherein the second pad value at least equals the first pad value plus the first value if both of the first bond pad and the second bond pad are ground pad or power pad with the same potential, else the second pad value at least equals the first pad value plus the first pad spacing increment value; and (V) using the first and second pad values to respectively position a first bond p

Abstract: A method of manufacturing conductive lines that are thicker (not wider) in the critical paths areas. We form a plurality of first level conductive lines over a first dielectric layer. The first conductive lines run in a first direction. The first level conductive lines are comprised of a first level first conductive line and a second first level conductive line. We form a second dielectric layer over the first level conductive lines and the first dielectric layer. Next, we form a via opening in the second dielectric layer over a portion of the first level first conductive line. A plug is formed filling the via opening. We form a trench pattern in the second dielectric layer. The trench pattern is comprised of trenches that are approximately orthogonal to the first level conductive lines. We fill the trenches with a conductive material to form supplemental second lines. We form second level conductive lines over the supplemental second lines and the plug.

Abstract: A method of forming a local interconnect is provided. A semiconductor is provided. An isolation structure, a transistor and a conductive layer are formed on the substrate. A dielectric layer with an opening is formed over the substrate. A part of the dielectric layer is removed by a photolithography and etching process to form a via opening to expose a part of the gate of the transistor or a part of the conductive layer. A conformal barrier layer is formed in the via opening and overflows the dielectric layer. A conductive plug is formed in the via opening. The barrier layer is patterned to form a local interconnect.

Abstract: A method is proposed for use to break integrally-connected electrically-conductive traces on a circuited substrate used in TFBGA (Thin & Fine Ball Grid Array) semiconductor packaging technology, so as to make the electrically-conductive traces open-circuited for the implementation of open-circuited testing on the electrically-conductive traces on the substrate. The proposed method is characterized in the forming of a resistively-enlarged point at the terminal of each electrically-conductive trace on the substrate, which can be melted away while leaving each electrically-conductive trace intact simply by applying an electrical current of an adequate magnitude to pass through each electrically-conductive trace. As each electrically-conductive trace is open-circuited, an open-circuited testing procedure can be then performed on the electrically-conductive on the substrate.