With Inorganic Material Patents (Class 51/307)
  • Patent number: 11926781
    Abstract: A method of forming a shaped abrasive particle including extruding a mixture into a form, applying a dopant material to an exterior surface of the form, and forming a precursor shaped abrasive particle from the form.
    Type: Grant
    Filed: February 28, 2020
    Date of Patent: March 12, 2024
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Doruk O. Yener, Paul Braun
  • Patent number: 11926019
    Abstract: A coated abrasive article includes a substrate and a plurality of abrasive particles overlying the substrate, and the plurality of abrasive particles including tapered abrasive particles having a taper fraction standard deviation of at least 0.025 and not greater than 0.090.
    Type: Grant
    Filed: December 23, 2020
    Date of Patent: March 12, 2024
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Samuel S. Marlin, Ralph Bauer, Stefan Vujcic, Paul W. Rehrig, Marie-Camille Auscher, Darrell K. Everts, Hua Fan, Sujatha K. Iyengar, Christopher Arcona, Anthony Martone, Brahmanandam V. Tanikella
  • Patent number: 11919115
    Abstract: The present invention discloses a flexible dot matrix bonding apparatus and an adaptive clamping method for a disk-type planar component. The apparatus mainly comprises three components: a substrate, connecting rods and an auxiliary support. The threaded holes in a circumferential array are uniformly distributed in the substrate, and the connecting rods are fixed at different circumferential positions of the substrate in a threaded connection manner, which play a role in bonding and supporting the disk-type planar component. The auxiliary support is matched with the substrate, so that a workpiece after turning can be taken out without damage. According to detection results of machining deformation of the disk-type planar component, the installation positions of the connecting rods on the substrate are adjusted accordingly, thus changing bonding positions of the disk-type planar component.
    Type: Grant
    Filed: October 13, 2021
    Date of Patent: March 5, 2024
    Assignee: DALIAN UNIVERSITY OF TECHNOLOGY
    Inventors: Yuwen Sun, Shuyang Yan, Shutao Qi, Jinting Xu
  • Patent number: 11919092
    Abstract: A cutting tool including a rake face, a flank face, and a cutting edge portion, comprising a substrate and an AlTiN layer, the AlTiN layer including cubic AlxTi1-xN crystal grains, Al having an atomic ratio x of 0.7 or more and 0.95 or less, the AlTiN layer including a central portion, the central portion at the rake face being occupied in area by (200) oriented crystal grains at a ratio of 80% or more, the central portion at the flank face being occupied in area by (200) oriented crystal grains at a ratio of 80% or more, the central portion at the cutting edge portion being occupied in area by (200) oriented crystal grains at a ratio of 80% or more.
    Type: Grant
    Filed: February 27, 2020
    Date of Patent: March 5, 2024
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Yasuki Kido, Anongsack Paseuth, Susumu Okuno, Shinya Imamura
  • Patent number: 11896964
    Abstract: A polycrystalline diamond construction comprising a body of polycrystalline diamond material formed of a mass of diamond grains exhibiting inter-granular bonding, wherein between around 50 wt % to around 99 wt % of the diamond grains in a cross-section of the body of polycrystalline diamond material taken at any orientation have a sectorial growth structure. A method of making the polycrystalline diamond construction is also disclosed.
    Type: Grant
    Filed: December 6, 2019
    Date of Patent: February 13, 2024
    Assignee: Element Six (UK) Limited
    Inventor: Rafael Vila Anton
  • Patent number: 11885182
    Abstract: A cutting element comprises a supporting substrate, and a cutting table attached to an end of the supporting substrate. The cutting table comprises inter-bonded diamond particles, and a thermally stable material within interstitial spaces between the inter-bonded diamond particles. The thermally stable material comprises a carbide precipitate having the general chemical formula, A3XZn-1, where A comprises one or more of Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Ac, Th, Pa, and U; X comprises one or more of Al, Ga, Sn, Be, Bi, Te, Sb, Se, As, Ge, Si, B, and P; Z comprises C; and n is greater than or equal to 0 and less than or equal to 0.75. A method of forming a cutting element, an earth-boring tool, a supporting substrate, and a method of forming a supporting substrate are also described.
    Type: Grant
    Filed: May 11, 2022
    Date of Patent: January 30, 2024
    Assignee: Baker Hughes Holdings LLC
    Inventors: Wanjun Cao, Marc W. Bird
  • Patent number: 11879087
    Abstract: A shaped abrasive particle including a body having a first major surface, a second major surface, and a side surface joined to the first major surface and the second major surface, and the body has at least one partial cut extending from the side surface into the interior of the body.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: January 23, 2024
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Ralph Bauer, Jennifer H. Czerepinski, Lucie Fraichard, Flavien Fremy, Jun Jia, Frederic Josseaux, David F. Louapre, Samuel S Marlin, Doruk O. Yener
  • Patent number: 11851570
    Abstract: Polishing articles and methods of manufacturing polishing articles used in polishing processes and cleaning processes are provided. More particularly, implementations disclosed herein relate to composite polishing articles having tunable properties such as hydrophilicity and zeta potential. 3D printed chemical-mechanical planarization (CMP) pads composed of UV curable acrylic chemistry are generally hydrophobic in nature. Such hydrophobic behavior affects the wetting properties with abrasive-based polishing slurries such as ceria-base slurries. However, in order to increase the planarization and removal rate while decreasing defects, hydrophilic pads are preferred. In addition, it is desirable that the zeta potential (Zp) of the pads be tunable over a wide range of conditions at different pH values. Implementations of the present disclosure include methods for increasing the hydrophilicity and tuning the Zp of the pads with anionic additives and pads produced using these methods.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: December 26, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Uma Sridhar, Sivapackia Ganapathiappan, Ashwin Chockalingam, Yingdong Luo, Daniel Redfield, Rajeev Bajaj, Nag B. Patibandla, Hou T. Ng, Sudhakar Madhusoodhanan
  • Patent number: 11851584
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive, (b) a cobalt accelerator, and (c) an oxidizing agent that oxidizes a metal, wherein the polishing composition has a pH of about 4 to about 10. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: December 26, 2023
    Assignee: CMC MATERIALS, INC.
    Inventors: Steven Kraft, Phillip W. Carter, Andrew R. Wolff
  • Patent number: 11828108
    Abstract: A cutting element includes a substrate that is axially symmetric about a central axis. The substrate has a radius perpendicular to the central axis and that extends from the central axis to an outer surface of the substrate. A super-hard material is coupled to the substrate, and the central axis passes through the super-hard material. The super-hard material has an external surface defining at least one ridge protruding from a remainder of the external surface. A central point on the central axis is offset from the external surface of the super-hard material by a distance equal to the radius of the substrate. A distance measured from the external surface of the super-hard material to the central point is greatest at a position between 25° and 45° from the central axis of the substrate.
    Type: Grant
    Filed: January 11, 2017
    Date of Patent: November 28, 2023
    Assignee: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventors: Ronald B. Crockett, Dwain Norris, Aaron Madsen, Neil Cannon, John Daniel Belnap
  • Patent number: 11802333
    Abstract: A cutting tool comprising a substrate and a coating film disposed on the substrate, wherein the coating film comprises a first layer; the first layer has a thickness of 0.2 ?m or more and 9 ?m or less; the first layer is composed of Ti(1-x-y)AlxMyN, wherein M is at least one element such as zirconium; in the first layer, x and y change along the thickness direction of the first layer; a maximum value of x, xmax, is 0.20 or more and 0.70 or less; a minimum value of x, xmin, is 0 or more and 0.6 or less; xmax and xmin satisfy 0.01?xmax?xmin?0.7; a maximum value of y, ymax, is 0.01 or more and 0.20 or less; a minimum value of y, ymin, is 0 or more and 0.19 or less; and ymax and ymin satisfy 0.01?ymax?ymin?0.2.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: October 31, 2023
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Hironari Moroguchi, Yuki Tsutsumiuchi, Satoru Kukino
  • Patent number: 11794307
    Abstract: Various embodiments disclosed relate to an abrasive article. The abrasive article includes a nonwoven web. The non-woven web includes a first irregular major surface and an opposite second irregular major surface. The nonwoven web further includes a fiber component comprising staple fibers having a linear density ranging from about 50 denier to about 2000 denier and a crimp index value ranging from about 15% to about 60%. The nonwoven web further includes a binder dispensed on the fiber component and abrasive particles dispersed throughout the nonwoven web.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: October 24, 2023
    Assignee: 3M Innovative Properties Company
    Inventors: Louis S. Moren, Scott M. Mevissen, Gregory G. Mehsikomer, Shawn C. Bell, Gary T. Stram
  • Patent number: 11780778
    Abstract: Provided is a polycrystalline diamond cutter with a substrate and a diamond body in which the diamond body includes bonded diamond particles and discernable diamondene fragments. The polycrystalline diamond cutter is manufactured by a high pressure high temperature method that includes sintering a diamond feed layer in which the diamond feed layer includes diamond particles and diamondene fragments.
    Type: Grant
    Filed: June 28, 2018
    Date of Patent: October 10, 2023
    Assignee: DIAMOND INNOVATIONS, INC.
    Inventor: Gary Flood
  • Patent number: 11773030
    Abstract: A cBN sintered material comprising cBN particles and a binder phase, in which the binder phase contains AlN and AlB2, a content proportion of cBN particles is 70 to 97 vol %, cBN sintered material has a volume resistivity up to 5×10?3 ?cm, a rate of a peak intensity derived from Al with respect to a peak intensity derived from cBN particles is less than 1.0%, cBN particles include fine particles and coarse particles, coarse particles optionally include ultra-coarse particles, with respect to the entire cBN particles, a content proportion ? of fine particles is from 10 vol %, a content proportion ? of coarse particles is from 30 vol %, a content proportion ? of ultra-coarse particles is 25 vol % or less, and a total of the content proportion ? of fine particles and the content proportion ? of coarse particles is 50 to 100 vol %.
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: October 3, 2023
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Keita Miyamoto, Satoru Kukino, Akihiko Ueda, Michiko Matsukawa
  • Patent number: 11761062
    Abstract: Polycrystalline diamond constructions are formed from a mixture of diamond grains including a first volume of fine-sized diamond grains, and a second volume of coarse-sized diamond grains. The fine-sized diamond grains are partially graphitized, and the coarse-sized diamond grains are not graphitized. The mixture of diamond grains is subjected to high pressure/high temperature sintering process conditions in the presence of a sintering aid thereby forming polycrystalline diamond. Contact areas between coarse-sized diamond grains in the polycrystalline diamond construction are substantially free of graphite.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: September 19, 2023
    Assignee: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventor: Georgiy Voronin
  • Patent number: 11731092
    Abstract: A method of forming a polycrystalline diamond body includes mixing a sintering agent with diamond powder to form a premixed layer, the sintering agent including at least one alkaline earth metal carbonate; forming an infiltration layer adjacent to the premixed layer, the infiltration layer including an infiltrant material including at least one alkaline earth metal carbonate; and subjecting the premixed layer and the infiltration layer to high pressure high temperature conditions.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: August 22, 2023
    Assignee: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventors: Yahua Bao, J. Daniel Belnap, Anatoliy Garan, Michael David France
  • Patent number: 11732532
    Abstract: A cutting element comprises a supporting substrate, a cutting table comprising a hard material attached to the supporting substrate, and a fluid flow pathway extending through the supporting substrate and the cutting table. The fluid flow pathway is configured to direct fluid delivered to an outermost boundary of the supporting substrate through internal regions of the supporting substrate and the cutting table. A method of forming a cutting element and an earth-boring tool are also described.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: August 22, 2023
    Assignee: BAKER HUGHES HOLDINGS LLC
    Inventors: Wanjun Cao, Xu Huang, Steven W. Webb, Bo Yu
  • Patent number: 11713404
    Abstract: The present invention relates to a polishing agent including: a water-soluble polymer including a copolymer of a monomer (A) which includes at least one member selected from the group consisting of an unsaturated dicarboxylic acid, a derivative thereof, and salts of the unsaturated dicarboxylic acid and the derivative thereof and a monomer (B) other than the monomer (A), comprising an ethylenic double bond and no acidic group; a cerium oxide particle; and water, in which the polishing agent has a pH of 4 to 9.
    Type: Grant
    Filed: May 12, 2021
    Date of Patent: August 1, 2023
    Assignee: AGC INC.
    Inventor: Toshihiko Otsuki
  • Patent number: 11702343
    Abstract: The diamond particle according to the present invention has an ionic conductivity Di represented by the following expression of 0.8 mS/m or lower: Di=Ds?Dw wherein Ds represents an ionic conductivity of an aqueous solution obtained by dissolving-out in a pressure cooker test carried out according to IEC68-2-66; and Dw represents an ionic conductivity of distilled water.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: July 18, 2023
    Assignee: SEKISUI CHEMICAL CO., LTD.
    Inventors: Masataka Sugimoto, Taku Sasaki, Abison Scaria, Hidehito Nishizawa
  • Patent number: 11673231
    Abstract: There is provided a vitrified bond super-abrasive grinding wheel including: a core; and a super-abrasive grain layer provided on the core, wherein the super-abrasive grain layer includes a plurality of super-abrasive grains and a vitrified bond that joins the plurality of super-abrasive grains, and the vitrified bond has a plurality of bond bridges located between the plurality of super-abrasive grains to join the plurality of super-abrasive grains, not less than 80% of the plurality of super-abrasive grains are joined to the super-abrasive grains adjacent thereto by the bond bridges, and not less than 90% of the plurality of bond bridges in a cross section of the super-abrasive grain layer have a thickness equal to or smaller than an average grain size of the super-abrasive grains, and have a length greater than the thickness.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: June 13, 2023
    Assignee: A.L.M.T. Corp.
    Inventors: Shuichi Amino, Tomohiro Ishizu
  • Patent number: 11667574
    Abstract: A precursor of an alumina sintered compact including aluminum, yttrium, and at least one metal selected from iron, zinc, cobalt, manganese, copper, niobium, antimony, tungsten, silver, and gallium. The aluminum content is 98.0% by mass or more as an oxide (Al2O3) in 100% by mass of the precursor of an alumina sintered compact; the yttrium content is 0.01 to 1.35 parts by mass as an oxide (Y2O3) based on 100 parts by mass of the content of the aluminum as an oxide; the total content of the metals selected from the foregoing group is 0.02 to 1.55 parts by mass as an oxide based on 100 parts by mass of the content of aluminum as an oxide; and the aluminum is contained as ?-alumina. Also disclosed is an alumina sintered compact, and a method for producing an alumina sintered compact and for producing abrasive grains.
    Type: Grant
    Filed: December 25, 2018
    Date of Patent: June 6, 2023
    Assignee: SHOWA DENKO K.K.
    Inventors: So Miyaishi, Satoshi Iinou
  • Patent number: 11660724
    Abstract: A manufacturing method of a pad conditioner by reverse plating is disclosed. The method comprises: forming a first plating layer on a temporary substrate to have multiple recesses; forming a second adhesive photosensitive film on the first plating layer; putting grains into the recesses; forming a first filling layer to support the grains; forming a second filling layer to support the grains; removing the second adhesive photosensitive film and forming a second boundary layer on the entire surface; forming a second plating layer on the second boundary layer; removing the temporary substrate and attaching a final substrate to the second plating layer; removing the first boundary layer and the first plating layer; removing the second boundary layer excluding a portion not exposed to the outside; and forming a third plating layer on an entire surface opposite to the final substrate to support the grains.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: May 30, 2023
    Assignee: Saesol Diamond Ind. Co., Ltd.
    Inventor: Ju-Ho Maeng
  • Patent number: 11649377
    Abstract: Provided is a CMP polishing liquid used for removing a part of an insulating portion of a base substrate, which includes a substrate, a stopper provided on one surface of the substrate, and the insulating portion provided on a surface of the stopper opposite to the substrate, by CMP to expose the stopper, the polishing liquid containing: abrasive grains containing cerium; a nonionic water-soluble compound A; a polymer compound B having at least one selected from the group consisting of carboxylic acid groups and carboxylate groups; a basic pH adjusting agent which is optionally contained; and water, in which a content of the basic pH adjusting agent is less than 1.3×10?2 mol/kg based on the total mass of the polishing liquid.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: May 16, 2023
    Assignee: RESONAC CORPORATION
    Inventors: Masayuki Hanano, Toshio Takizawa
  • Patent number: 11623893
    Abstract: A surface-coated cutting tool according to the present invention includes a tool body and a hard coating layer including a complex carbonitride layer containing a small amount of chlorine and (Ti(1-x)ZrxyHfx(1-y))(N(1-z)Cz) (0.10?x?0.90, 0<y?1.0, 0.08<z<0.60), a ZrHf and C content ratios in cycles, a cycle distance between a maximum ZrHf content point and an adjacent minimum ZrHf content point and a cycle distance between a maximum C content point and an adjacent minimum C content point are 5 to 100 nm, an average value of content ratio differences ?x and ?z is 0.02 or more, a distance between the maximum ZrHf content point and the maximum C content point is ? or less of the distance between a maximum content point and a minimum content point of adjacent ZrHf components, and a composition fluctuation structure is 10% or more.
    Type: Grant
    Filed: October 11, 2019
    Date of Patent: April 11, 2023
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventors: Akihiro Murakami, Masaki Okude, Shin Nishida
  • Patent number: 11607776
    Abstract: An abrasive agglomerate particle includes fused aluminum oxide mineral bonded in a vitreous matrix. The fused aluminum oxide mineral is present in a range from 70 percent by weight to 95 percent by weight and the vitreous matrix is present at least at five percent by weight, based on the weight of the abrasive agglomerate particle. The fused aluminum oxide mineral has an average particle size of up to 300 micrometers, and the abrasive agglomerate particle has a frusto-pyramidal shape with side walls having a taper angle in a range from 2 to 15 degrees and a dimension of at least 400 micrometers. The abrasive agglomerate particles are useful in abrasive articles. The method includes contacting the workpiece with an abrasive article and moving the workpiece and the abrasive article relative to each other to abrade the workpiece.
    Type: Grant
    Filed: July 19, 2017
    Date of Patent: March 21, 2023
    Assignee: 3M Innovative Properties Company
    Inventors: Mark A. Lukowski, Brian D. Goers, Negus B. Adefris, Scott W. Peterson
  • Patent number: 11583978
    Abstract: A superabrasive element includes a substrate and a superabrasive table bonded to the substrate, the superabrasive table including a polished surface having a polished finish, the polished surface extending over at least a central, apical region of the superabrasive table, and an unpolished surface including an unpolished finish, the unpolished surface surrounding a majority of the polished surface. A method of manufacturing a superabrasive element includes providing a superabrasive element having a substrate and a superabrasive table bonded to the substrate and polishing at least a central, apical region of the superabrasive table to form a polished surface, without polishing an unpolished surface of the superabrasive table, the unpolished surface surrounding a majority of the polished surface.
    Type: Grant
    Filed: May 16, 2019
    Date of Patent: February 21, 2023
    Assignee: US Synthetic Corporation
    Inventors: Grant Kyle Daniels, Jeremy Dane Wood, Jarid Lynn Spencer, John Christian Marx
  • Patent number: 11548102
    Abstract: A method for repairing composite components includes installing a plug within a feature defined by a composite component, with the plug being formed from one or more neutral materials. Furthermore, the method includes infiltrating the composite component with an infiltrant to densify a repair region of the composite component, with the plug blocking a flow of the infiltrant into the feature. Moreover, after infiltrating the composite component, the method includes removing the plug from the feature.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: January 10, 2023
    Assignee: General Electric Company
    Inventors: Herbert Chidsey Roberts, Christopher James Scott
  • Patent number: 11534836
    Abstract: A surface-coated cutting tool includes: a substrate including a rake face and a flank face; a first coating film that coats the rake face; and a second coating film that coats the flank face, wherein the first coating film includes a first composite nitride layer at a region d1 on the rake face, the second coating film includes a second composite nitride layer at a region d2 on the flank face, the first composite nitride layer includes Ti1-x1-y1Alx1Tay1C?1N?1, the second composite nitride layer includes Ti1-x2-y2Alx2Tay2C?2N?2.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: December 27, 2022
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Kouhei Yoshimura, Haruyo Fukui, Makoto Setoyama, Keizo Tanaka
  • Patent number: 11535520
    Abstract: A method of processing a polycrystalline diamond body includes positioning an electrode near the polycrystalline diamond body such that a gap is defined between the electrode and the polycrystalline diamond body, the polycrystalline diamond body having a metallic material disposed in interstitial spaces defined within the polycrystalline diamond body. The method includes applying a voltage between the electrode and the polycrystalline diamond body, and passing a processing solution through the gap. The electrode is a cathode and the polycrystalline diamond body is an anode. An assembly for processing a polycrystalline diamond body includes the polycrystalline diamond body, an electrode positioned such that a gap is defined between the electrode and the polycrystalline diamond body, a processing solution passing through the gap such that the processing solution is in electrical communication with each of the polycrystalline diamond body and the electrode, and at least one power source.
    Type: Grant
    Filed: June 23, 2020
    Date of Patent: December 27, 2022
    Assignee: US Synthetic Corporation
    Inventor: Mark Pehrson Chapman
  • Patent number: 11518920
    Abstract: A slurry containing abrasive grains and a liquid medium, in which the abrasive grains include first particles and second particles in contact with the first particles, a particle size of the second particles is smaller than a particle size of the first particles, the first particles contain cerium oxide, the second particles contain a cerium compound, and in a case where a content of the abrasive grains is 0.1% by mass, an absorbance for light having a wavelength of 380 nm in a liquid phase obtained when the slurry is subjected to centrifugal separation for 5 minutes at a centrifugal acceleration of 5.8×104 G exceeds 0.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: December 6, 2022
    Assignee: SHOWA DENKO MATERIALS CO., LTD.
    Inventors: Tomoyasu Hasegawa, Tomohiro Iwano, Takaaki Matsumoto
  • Patent number: 11498873
    Abstract: A polycrystalline super hard construction comprises a body of polycrystalline super hard material and a substrate bonded to the body along an interface. The substrate a first end surface forming the interface, the first end surface comprising a projection extending from the body of the substrate into the body of super hard material towards the cutting face, the body of polycrystalline material extending around the projection. The body of polycrystalline material comprises a first region more thermally stable than a second region, the first region comprising an annular portion located around the projection, the second region extending between and bonding the first region to the substrate. The first region has a thickness from the cutting face along the peripheral side edge to the interface of at least around 3 mm and a portion of the projection has a thickness measured in a plane extending along the longitudinal axis of at least around 3 mm.
    Type: Grant
    Filed: May 9, 2019
    Date of Patent: November 15, 2022
    Assignee: ELEMENT SIX ABRASIVES HOLDINGS LIMITED
    Inventors: Maweja Kasonde, Valentine Kanyanta, Teresa Rodriguez Suarez
  • Patent number: 11458593
    Abstract: In a high-porosity CBN vitrified grinding stone having a homogeneous structure, a CBN abrasive grain, a large-diameter inorganic hollow filler having an average particle diameter in a range from a grain size one class coarser to a grain size one class finer with respect to a class indicating a grain size of the CBN abrasive grain, and a small-diameter inorganic hollow filler having an average particle diameter of ? to ½ of that of the CBN abrasive grain are bonded by an inorganic bonding agent.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: October 4, 2022
    Assignee: NORITAKE CO., LIMITED
    Inventors: Ryoma Ito, Takeshi Mishima, Kouichi Yoshimura
  • Patent number: 11453589
    Abstract: A method of producing a boron nitride polycrystal includes: a first step of obtaining a thermally treated powder by thermally treating a powder of a high pressure phase boron nitride at more than or equal to 1300° C.; and a second step of obtaining a boron nitride polycrystal by sintering the thermally treated powder under a condition of 8 to 20 GPa and 1200 to 2300° C.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: September 27, 2022
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Yuh Ishida, Hitoshi Sumiya
  • Patent number: 11447872
    Abstract: A hard coating includes a three kinds of layers that are alternately laminated. The three kinds of layers consist of a single composition layer and two kinds of nanolayer-alternated layers. The single composition layer is constituted by one of an A composition (nitride of AlCr?), a B composition (nitride of AlTiCr?) and a C composition (nitride of AlCr(SiC)?). The two kinds of nanolayer-alternated layers include nanolayers which are alternately laminated and which are constituted by two of three combinations consisting of a combination of the A composition and B composition, a combination of the A composition and C composition and a combination of the B composition and C composition. The single composition layer has a thickness of 0.5-1000 nm. Each of the nanolayers constituting the two kinds of nanolayer-alternated layers has a thickness of 0.5-500 nm, and each of the two kinds of nanolayer-alternated layers has a thickness of 1-1000 nm.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: September 20, 2022
    Assignee: OSG CORPORATION
    Inventors: Mei Wang, Hiroyuki Hanyu
  • Patent number: 11427930
    Abstract: In a diamond polycrystal, a value of a ratio (d?/d) of d? to d is less than or equal to 0.98 in a Vickers hardness test performed under a condition defined in JIS Z 2244:2009, where the d represents a length of a diagonal line of a first Vickers indentation formed in a surface of the diamond polycrystal when a Vickers indenter with a test load of 4.9 N is pressed onto the surface of the diamond polycrystal, and the d? represents a length of a diagonal line of a second Vickers indentation remaining in the surface of the diamond polycrystal after releasing the test load.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: August 30, 2022
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Hitoshi Sumiya, Katsuko Yamamoto
  • Patent number: 11421341
    Abstract: In a diamond polycrystal, a value of a ratio (a?/a) of a? to a is less than or equal to 0.99 in a Knoop hardness test performed under a condition defined in JIS Z 2251:2009, where the a represents a length of a longer diagonal line of a first Knoop indentation formed in a surface of the diamond polycrystal when a Knoop indenter with a test load of 4.9 N is pressed onto the surface of the diamond polycrystal, and the a? represents a length of a longer diagonal line of a second Knoop indentation remaining in the surface of the diamond polycrystal after releasing the test load.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: August 23, 2022
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Hitoshi Sumiya, Katsuko Yamamoto
  • Patent number: 11407048
    Abstract: A method for producing a workpiece having a toothing or profiling, including the steps: a) soft machining the workpiece to produce the toothing or profiling; b) hardening the toothing or profiling; c) hard fine machining the toothing or profiling with a first tool that is a grinding worm, a grinding wheel or a honing wheel, wherein the first tool has a base body with a first elastic modulus; d) reinforcement of at least a section of the workpiece by shot blasting; and, following step d), e) repeated hard fine machining of the toothing or profiling with a second tool that is a grinding worm, a grinding wheel, a set of grinding wheels or a honing wheel. The second tool has a plastic or rubber base body with a second elastic modulus which is at most 33% of the first elastic modulus.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: August 9, 2022
    Assignee: KAPP NILES GMBH & CO. KG
    Inventor: Sergiy Grinko
  • Patent number: 11400559
    Abstract: The polishing pad according to an embodiment adjusts the content of elements present in the polishing layer, thereby controlling the bonding strength between the polishing pad and the polishing particles and enhancing the bonding strength between the polishing particles and the semiconductor substrate (or wafer), resulting in an increase in the polishing rate. It is possible to enhance not only the mechanical properties of the polishing pad such as hardness, tensile strength, elongation, and modulus, but also the polishing rate for both a tungsten layer or an oxide layer. Accordingly, it is possible to efficiently fabricate a semiconductor device of excellent quality using the polishing pad.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: August 2, 2022
    Assignee: SKC solmics CO., LTD.
    Inventors: Eun Sun Joeng, Jong Wook Yun, Sunghoon Yun, Jang Won Seo
  • Patent number: 11377716
    Abstract: Provided is a cermet having improved toughness, the cermet including particles each of which has a complete solid-solution carbide of two or more metals selected, including titanium, from among Group IVa, Va, and VIa metals in the periodic table and has a core/rim structure composed of a core region and a rim region, and a binder composed of a metal, wherein the composition of the Group VIa metal in the core region is lower than the composition in the rim region, and the lattice constant in the rim region is larger than that in the core region.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: July 5, 2022
    Assignee: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
    Inventors: Shinhoo Kang, Heung Nam Han, Choongkwon Park, Nojun Kwak
  • Patent number: 11365472
    Abstract: A coated cutting tool includes a body and a PVD coating disposed on the body. The body being cemented carbide, cermet, ceramics, polycrystalline diamond, polycrystalline cubic boron nitride based materials or a high speed steel. The coating includes a first layer of (Ti1-xAlx)N wherein 0.3?x?0.7, and a second layer of (Ti1-p-qAlp Siq)N with 0.15?p?0.45, and 0.05?q?0.20, wherein the second layer is deposited outside the first layer as seen in a direction from the body.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: June 21, 2022
    Assignee: Seco Tools AB
    Inventors: Gied Rutten, Lennart Karlsson
  • Patent number: 11278967
    Abstract: A surface-coated cutting tool has a hard coating layer including an upper layer ?, an adhesion layer ?, and a lower layer ?. The upper layer ? is formed of an ?-Al2O3 layer formed under low temperature conditions. The adhesion layer ? includes a TiCN layer having a thickness of 0.5 ?m or more in an outermost layer and contains 0.5 to 3 ?m to a maximum depth of 0.5 ?m toward the inside in a layer thickness direction of the TiCN layer from the interface between the TiCN layer and the upper layer ?. The lower layer ? is formed of (Ti1-XAlX)(CYN1-Y) of a single phase of a NaCl type face-centered cubic structure, in which an average content ratio Xavg of Al and an average content ratio Yavg of C in this composition formula satisfy 0.60?Xavg?0.95 and 0?Yavg?0.005.
    Type: Grant
    Filed: March 29, 2017
    Date of Patent: March 22, 2022
    Assignee: MITSUBISHI MATERIALS CORPORATION
    Inventors: Kousuke Yanagisawa, Sho Tatsuoka, Kenichi Sato, Shin Nishida
  • Patent number: 11214711
    Abstract: The present invention is a polishing composition, containing zirconium oxide as abrasive grains, the polishing composition having pH of 11.0 or more and less than 12.5, the zirconium oxide having element concentrations of sodium, magnesium, aluminum, potassium, calcium, titanium, chromium, iron, manganese, nickel, copper, zinc, lead, and cobalt of less than 1 ppm each. There can be provided a polishing composition that enables semiconductor substrates having high flatness not only in the inner circumferential portion but also in the outer circumferential portion with little contamination due to metal impurities to be obtained at high productivity.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: January 4, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoshihiro Nojima, Mitsuhito Takahashi
  • Patent number: 11167357
    Abstract: A surface-coated cutting tool includes a substrate and a coating film. The coating film includes an alternate layer. The alternate layer includes a first layer having a first composition and a second layer having a second composition. The alternate layer is formed by alternately stacking at least one first layer and at least one second layer. The first layer and the second layer each have a thickness not smaller than 2 nm and not greater than 100 nm. The first composition is expressed as TiaAlbSicN (0.25?a?0.45, 0.55?b?0.75, 0?c?0.1, a+b+c=1). The second composition is expressed as TidAleSifN (0.35?d?0.55, 0.45?e?0.65, 0?f?0.1, d+e+f=1). The first composition and the second composition satisfy a condition of 0.05?d?a?0.2 and 0.05?b?e?0.2.
    Type: Grant
    Filed: March 3, 2017
    Date of Patent: November 9, 2021
    Assignee: Sumitomo Electric Hardmetal Corp.
    Inventors: Shuhei Misumi, Haruyo Fukui, Shinya Imamura, Kazuhiro Hirose, Hiroki Takeshita
  • Patent number: 11130181
    Abstract: A surface-coated cutting tool includes a substrate and a coating formed on a surface of the substrate, the coating including one or two or more layers, at least one of the layers being an Al-rich layer including hard particles, the hard particle having a sodium chloride type crystal structure, and including a first unit phase in a form of a plurality of lumps and a second unit phase interposed between the lumps of the first unit phase, the first unit phase being composed of a nitride or carbonitride of AlxTi1-x, the first unit phase having an atomic ratio x of Al of 0.7 or more and 0.96 or less, the second unit phase being composed of a nitride or carbonitride of AlyTi1-y, the second unit phase having an atomic ratio y of Al exceeding 0.5 and less than 0.7.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: September 28, 2021
    Assignees: Sumitomo Electric Hardmetal Corp., Sumitomo Electric Industries, Ltd.
    Inventors: Anongsack Paseuth, Yasuki Kido, Shinya Imamura, Koji Kuramochi
  • Patent number: 11104980
    Abstract: The invention relates to a method for producing a carbide with a toughness-increasing structure, comprising the following steps: providing a hard material powder, wherein the average BET particle size of the hard material powder is less than 1.0 mm; mixing the hard material powder with a binder powder; shaping the mixture made of hard material powder and binder powder to form a green body; and sintering the green body. The invention also relates to a carbide with a toughness-increasing structure comprising a phase made of hard material particles and a phase made of binder metal heterogeneously distributed in the carbide, which is present in the form of binder islands, wherein the carbide with a toughness-increasing structure produced after the sintering has a phase made of hard material particles with an average particle size in the region between 1 nm and 1000 nm, and the binder islands have an average size of 0.1 ?m to 10.0 ?m and an average distance between the binder islands of 1.0 ?m to 7.0 ?m.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: August 31, 2021
    Assignee: H. C. STARCK TUNGSTEN GMBH
    Inventors: Tino Saeuberlich, Johannes Poetschke, Volkmar Richter
  • Patent number: 11103930
    Abstract: A cutting tool includes: a substrate including a rake face; and a coating film that coats the rake face, wherein the coating film includes an ?-Al2O3 layer disposed on the substrate, the ?-Al2O3 layer includes crystal grains of ?-Al2O3, an area ratio of crystal grains oriented in (001) among the crystal grains is 50% to 90% in the ?-Al2O3 layer at the rake face, a film residual stress AA determined based on a crystal plane interval of a (001) plane of the ?-Al2O3 layer at the rake face is more than or equal to ?1000 MPa and less than 0 MPa, and a film residual stress BA determined based on a crystal plane interval of a (110) plane of the ?-Al2O3 layer at the rake face is more than or equal to ?1000 MPa and less than 0 MPa, and a relational expression of |AA|?|BA| is satisfied.
    Type: Grant
    Filed: July 5, 2019
    Date of Patent: August 31, 2021
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Susumu Okuno, Shinya Imamura, Satoshi Ono, Anongsack Paseuth
  • Patent number: 11091678
    Abstract: A fixed abrasive article including a blend of abrasive particles having a first type of shaped abrasive particle comprising a first height (h1), a second type of shaped abrasive particle comprising a second height (h2) less than the first height, where the blend of abrasive particles includes a first content of the first type of shaped abrasive particles and a second content of the second type of shaped abrasive particle, and the first content is different as compared to the second content.
    Type: Grant
    Filed: January 10, 2017
    Date of Patent: August 17, 2021
    Assignees: SAINT-GOBAIN ABRASIVES, INC., SAINT-GOBAIN ABRASIFS
    Inventor: Sujatha Iyengar
  • Patent number: 11072008
    Abstract: A wear-resistant tool includes composite polycrystalline diamond as a core, the composite polycrystalline diamond being composed of polycrystalline diamond in which particulate diamond is directly bonded and non diamond carbon. The polycrystalline diamond in the composite polycrystalline diamond is three-dimensionally continuous in composite polycrystal and primary particles have an average particle size from 10 to 500 nm.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: July 27, 2021
    Assignees: Sumitomo Electric Industries, Ltd., A.L.M.T. Corp.
    Inventors: Hitoshi Sumiya, Takeshi Sato, Makoto Yukawa, Bunya Suemitsu
  • Patent number: 11053595
    Abstract: Compositions and methods for etching cobalt chromium alloys are disclosed. The compositions generally include at least two mineral acids, certain component metals of the alloy to be etched, and optionally iron (Fe). For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). The methods provide for etching an entire surface of a substrate or etching a surface of a substrate in a pattern using selective coating patterns and/or coating removal. Thus, unlimited patterns, as well as etch depths and variations in etch depths are achievable using the compositions and methods disclosed.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: July 6, 2021
    Assignee: Tech Met, Inc.
    Inventors: Michael Vidra, Daniel Jon Schutzer
  • Patent number: 11046834
    Abstract: To provide a surface-modified nanodiamond including an N-substituted or unsubstituted amino group having excellent reactivity with other compounds; and having excellent dispersibility in dispersion media and resins. The surface-modified nanodiamond according to the present invention is a surface-modified nanodiamond including a surface-modifying group on a surface of a nanodiamond particle, wherein the surface-modifying group includes a group represented by Formula (1) below, wherein reference signs in Formula (1) below are as described in the present specification.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: June 29, 2021
    Assignee: DAICEL CORPORATION
    Inventor: Kouichi Umemoto