With Inorganic Material Patents (Class 51/307)
  • Patent number: 10283373
    Abstract: An embodiment of the present invention relates to a CMP polishing liquid used for polishing a polishing target surface having at least a cobalt-containing portion and a metal-containing portion that contains a metal other than cobalt, wherein the CMP polishing liquid contains polishing particles, a metal corrosion inhibitor and water, and has a pH of 4.0 or less, and when the corrosion potential EA of cobalt and the corrosion potential EB of the metal are measured in the CMP polishing liquid, the absolute value of the corrosion potential difference EA?EB between the corrosion potential EA and the corrosion potential EB is 0˜300 mV.
    Type: Grant
    Filed: July 8, 2015
    Date of Patent: May 7, 2019
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Masahiro Sakashita, Naomi Watanabe, Masayuki Hanano, Kouji Mishima
  • Patent number: 10279454
    Abstract: A polycrystalline compact includes a plurality of diamond grains of micron size, submicron size, or both, and a plurality of diamond nanoparticles disposed in interstitial spaces between the plurality of diamond grains. A method of forming a polycrystalline compact includes combining a plurality of micron and/or submicron-sized diamond grains and a plurality of diamond nanoparticles to form a mixture and sintering the mixture in a presence of a carburized binder to form a polycrystalline hard material having a plurality of inter-bonded diamond grains and diamond nanoparticles. Cutting elements including a polycrystalline compact and earth-boring tools bearing such compacts are also disclosed.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: May 7, 2019
    Assignees: Baker Hughes Incorporated, Element Six Limited
    Inventors: Anthony A. DiGiovanni, Roger William Nigel Nilen
  • Patent number: 10280687
    Abstract: Embodiments relate to polycrystalline diamond compacts and methods of manufacturing such compacts in which an at least partially leached polycrystalline diamond (“PCD”) table is infiltrated with first and second infiltrants. The first infiltrant includes a low viscosity cobalt-based and/or nickel-based alloy infiltrant. The second infiltrant (e.g., copper) is specifically selected to be more easily infiltrated and/or removed (e.g., leached) than a pure cobalt infiltrant. In an embodiment, a method includes forming a PCD table in the presence of a metal-solvent catalyst in a first high-pressure/high-temperature (“HPHT”) process. The PCD table may be at least partially leached to remove at least a portion of the metal-solvent catalyst therefrom. The leached PCD table and a substrate are subjected to a second HPHT process effective to bond the substrate to the leached PCD table while at least partially infiltrating the PCD table with at least the first and second infiltrants.
    Type: Grant
    Filed: June 24, 2014
    Date of Patent: May 7, 2019
    Assignee: US SYNTHETIC CORPORATION
    Inventors: Debkumar Mukhopadhyay, Brandon Paul Linford, Jed Clarke
  • Patent number: 10272498
    Abstract: A composite sintered material contains cubic boron nitride particles and binder particles. The composite sintered material contains 40 vol % or more and 80 vol % or less of the cubic boron nitride particles. The binder particles contain TiCN particles. The composite sintered material shows a first peak belonging to a (200) plane of the TiCN particles in a range in which a Bragg angle 2? is 41.7° or more and 42.6° or less in an X-ray diffraction spectrum measured using a Cu-K? ray as a ray source.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: April 30, 2019
    Assignee: Sumitomo Electric Hardmetal Corp.
    Inventors: Naoki Watanobe, Yusuke Matsuda, Katsumi Okamura, Nozomi Tsukihara, Makoto Setoyama
  • Patent number: 10253216
    Abstract: A barrier chemical mechanical planarization polishing composition is provided that includes suitable chemical additives. The suitable chemical additives are silicate compound and high molecular weight polymers/copolymers. There is also provided a chemical mechanical polishing method using the barrier chemical mechanical planarization polishing composition.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: April 9, 2019
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Matthias Stender, Maitland Gary Graham, Dnyanesh Chandrakant Tamboli, Xiaobo Shi
  • Patent number: 10253410
    Abstract: A coated cutting insert includes a substrate that is either a ceramic substrate or polycrystalline cubic boron nitride-containing substrate and has a substrate surface.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: April 9, 2019
    Assignee: KENNAMETAL INC.
    Inventors: Vineet Kumar, Ronald M. Penich, Peter R. Leicht, Mark S. Greenfield, Yixiong Liu
  • Patent number: 10202686
    Abstract: In one aspect, articles are described herein comprising refractory coatings employing an inter-anchored multilayer architecture. Articles having refractory coatings described herein, in some embodiments, are suitable for high wear and/or abrasion applications such as metal cutting operations. A coated article described herein comprises a substrate and a coating deposited by CVD adhered to the substrate, the coating including a refractory layer comprising a plurality of sublayer groups, a sublayer group comprising a Group IVB metal nitride sublayer and an adjacent layer alumina sublayer, the Group IVB metal nitride sublayer comprising a plurality of nodules interfacing with the alumina sublayer.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: February 12, 2019
    Assignee: KENNAMETAL INC.
    Inventors: Zhenyu Liu, Yixiong Liu
  • Patent number: 10196314
    Abstract: Multi-step milling processes to prepare cBN composite powder forms a first powder mixture by adding a binder and a first cBN component, mills the first powder mixture for a first time period, combines a second cBN component with the milled first powder mixture to form a second powder mixture, and mills the second powder mixture for a second time period (less than the first time period) to form the cBN composite powder. A ratio of the D50 value of the second cBN component to the D50 value of the first cBN component is at least 3.0. Two-step milling with different milling times for the two cBN component fractions controls the amount of mill debris in the cBN composite powder mixture. Further processing of the cBN composite powder under HPHT conditions forms a cBN-based ceramic with an average value of a cBN particle free diameter of less than 2.0 microns.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: February 5, 2019
    Assignee: Diamond Innovations, Inc.
    Inventors: Jacob Palmer, Lawrence Dues, Rui Shao, Gerold Weinl
  • Patent number: 10179737
    Abstract: Provided are spherical silicon oxycarbide particle material and manufacturing method thereof, wherein the average particle size is in the range of 0.1-100 ?m and having a sphericity of 0.95-1.0. Spherical silicon oxycarbide particle material and manufacturing method thereof are provided as follows. Organotrialkoxysilane is hydrolyzed in a pH 3-6 acetic acid aqueous solution, thereafter an alkaline aqueous solution such as a pH 7-12 ammonia water was added to the obtained hydrolysate. The condensation reaction is performed in an alkaline range to form spherical polysilsesquioxane particles that are spherical silicon oxycarbide precursors that has no melting point or softening point. Sintering was then performed at a sintering temperature of 600-1400° C. under inert atmosphere to obtain spherical silicon oxycarbide particle material.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: January 15, 2019
    Assignee: JNC CORPORATION
    Inventors: Tetsuro Kizaki, Keizo Iwatani
  • Patent number: 10174421
    Abstract: A coated tool is, for example, a cutting tool which is provided with a base material and a coating layer located on a surface of the base material, wherein a cutting edge and a flank surface are located on the coating layer, the coating layer has a portion in which at least a titanium carbonitride layer and an aluminum oxide layer having an ?-type crystal structure are laminated in this order, and, with regard to a texture coefficient Tc (hkl) which is calculated on a basis of a peak of the aluminum oxide layer analyzed by an X-ray diffraction analysis, a texture coefficient Tc1 (0 1 14) as measured from a surface side of the aluminum oxide layer on a side of the flank surface is 1 or more.
    Type: Grant
    Filed: December 17, 2014
    Date of Patent: January 8, 2019
    Assignee: KYOCERA CORPORATION
    Inventors: Yoshikazu Kodama, Takahito Tanibuchi, Kou Ri
  • Patent number: 10167675
    Abstract: Polycrystalline diamond cutting elements having enhanced thermal stability, drill bits incorporating the same, and methods of making the same are disclosed herein. In one embodiment, a cutting element includes a substrate having a metal carbide and a polycrystalline diamond body bonded to the substrate. The polycrystalline diamond body includes a plurality of diamond grains bonded to adjacent diamond grains by diamond-to-diamond bonds and a plurality of interstitial regions positioned between adjacent diamond grains. At least a portion of the plurality of interstitial regions comprise lead or lead alloy, a catalyst material, metal carbide, or combinations thereof. At least a portion of the plurality of interstitial regions comprise lead or lead alloy that coat portions of the adjacent diamond grains such that the lead or lead alloy reduces contact between the diamond and the catalyst.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: January 1, 2019
    Assignee: Diamond Innovations, Inc.
    Inventors: Christopher Allen Long, Andrew Gledhill
  • Patent number: 10166655
    Abstract: A method for making a carbonate polycrystalline diamond body includes combining a first quantity of diamond with a first quantity of magnesium carbonate to form a first layer for forming a working surface, and combining a second quantity of magnesium carbonate to form a second layer adjacent to the first layer, forming an assembly. The method includes placing a quantity of silicon or aluminum in or adjacent to at least a portion of the assembly and sintering the assembly including the silicon or aluminum at high pressure and high temperature, causing the silicon or aluminum to infiltrate at least one layer of the assembly.
    Type: Grant
    Filed: December 6, 2016
    Date of Patent: January 1, 2019
    Assignee: SMITH INTERNATIONAL, INC.
    Inventor: Yahua Bao
  • Patent number: 10167415
    Abstract: The present disclosure provides a method for reducing large particle counts (LPCs) in copper chemical mechanical polishing slurry by way of using high purity removal rate enhancer (RRE) in the slurry. The conductivity of the RRE in deionized water solutions correlates very strongly with the number of LPCs in the RRE, and thus in a slurry using the RRE.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: January 1, 2019
    Assignee: FUJIFILM PLANAR SOLUTIONS, LLC
    Inventors: James McDonough, Laura John, Deepak Mahulikar
  • Patent number: 10134582
    Abstract: A tantalum compound, a method of forming a thin film, and a method of fabricating an integrated circuit device, the tantalum compound being represented by the following General Formula (I):
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: November 20, 2018
    Assignees: SAMSUNG ELECTRONICS CO., LTD., ADEKA CORPORATION
    Inventors: Seung-min Ryu, Takanori Koide, Naoki Yamada, Jae-soon Lim, Tsubasa Shiratori, Youn-joung Cho
  • Patent number: 10125065
    Abstract: A method for the separation of diamond particle clusters into discrete diamond particles and/or into smaller diamond particle clusters comprising fewer diamond particles is disclosed. The diamond particle clusters are combined with at least one liquid phase organic or inorganic compound, or with a solution of at least one organic or inorganic compound in at least one solvent to form a reaction mixture. Mechanical means are then used to separate the diamond particle clusters into discrete diamond particles and/or into smaller clusters within the reaction mixture producing diamond particles with dangling bonds or free bonding sites on the surface of the diamond particles. The at least one organic or inorganic compound then reacts with these dangling bonds present on the diamond particle surface.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: November 13, 2018
    Assignee: University of Newcastle Upon Tyne
    Inventors: Lidija Siller, Yuriy Butenko
  • Patent number: 10100405
    Abstract: A coated cutting insert for a chipforming material removal operation wherein the coated insert has a substrate and a coating scheme on the substrate. The coating scheme includes a CVD transition coating layer. The coating scheme further includes a CVD multi-layered coating scheme having a plurality of coating sets. Each one of the coating sets has an aluminum oxide coating layer and a nitrogen-containing coating layer.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: October 16, 2018
    Assignee: KENNAMETAL INC.
    Inventors: Rodrigo A. Cooper, Zhenyu Liu, Peter R. Leicht, Yixiong Liu
  • Patent number: 10099347
    Abstract: Polycrystalline elements include a substrate and a polycrystalline table attached to an end of the substrate. The polycrystalline table includes a first region of superabrasive material having a first permeability and at least a second region of superabrasive material having a second, lesser permeability, the at least a second region being interposed between the substrate and the first region. Methods of forming a polycrystalline element involve attaching a polycrystalline table including a first region of superabrasive material having a first permeability and at least a second region of superabrasive material having a second, lesser permeability to an end of a substrate, the at least a second region being interposed between the first region and the substrate. Catalyst material is removed from at least the first region of the polycrystalline table.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: October 16, 2018
    Assignee: Baker Hughes Incorporated
    Inventors: Nicholas J. Lyons, Danny E. Scott, Anthony A. DiGiovanni, Derek L. Nelms
  • Patent number: 10068602
    Abstract: The present invention provides a method for manufacturing a glass substrate for a magnetic disk or the like according to which surface roughnesses of main surfaces of a glass substrate can be reduced more than with currently available methods. In the present invention, by mirror-polishing (final finishing-polishing) the main surfaces of the glass substrate used in a magnetic disk, for example, using a polishing liquid containing organic-based particles made of a styrene-based resin, an acrylic resin, or a urethane-based resin, as polishing abrasive particles, surface roughnesses of the main surfaces of the substrate can be reduced more than with currently available methods.
    Type: Grant
    Filed: June 29, 2014
    Date of Patent: September 4, 2018
    Assignee: HOYA CORPORATION
    Inventor: Yoshihiro Tawara
  • Patent number: 10060192
    Abstract: Embodiments of the invention are disclosed for methods of making polycrystalline diamond compacts having substrates including bonding features thereon and polycrystalline diamond bodies including complementary configurations, as well as embodiments of polycrystalline diamond compacts made using the same.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: August 28, 2018
    Assignee: US SYNTHETIC CORPORATION
    Inventors: David P. Miess, Robert K. Galloway
  • Patent number: 10030299
    Abstract: A surface-coated boron nitride sintered body tool includes a cubic boron nitride sintered body and a coating film formed thereon. The coating film includes an A layer and a C layer. The A layer is formed of Ti1-xaMaxaC1-yaNya (where Ma is one or more of Cr, Nb and W; 0?xa?0.7; 0?ya?1). The C layer is formed of Al1-(xc+yc)CrxcMcycN (where Mc is one or more of Ti, V and Si; 0.2?xc?0.8; 0?yc?0.6; 0.2?xc+yc?0.8). The A layer is formed on an outermost surface of the coating film or between the outermost surface of the coating film and the C layer. A distance between the outermost surface of the coating film and an upper surface of the C layer is 0.1 ?m or more and 1.0 ?m or less.
    Type: Grant
    Filed: September 19, 2014
    Date of Patent: July 24, 2018
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Nozomi Tsukihara, Makoto Setoyama, Katsumi Okamura
  • Patent number: 10030451
    Abstract: Embodiments relate to a polycrystalline diamond compact (“PDC”) including a polycrystalline diamond (“PCD”) table having at least two regions and being bonded to a fine grained cemented tungsten carbide substrate. In an embodiment, a PDC includes a cemented carbide substrate having a cobalt-containing cementing constituent cementing tungsten carbide grains together that exhibit an average grain size of about 1.5 ?m or less, and a PCD table having at least one upper region including diamond grains exhibiting an upper average grain size and at least one lower region adjacent to the upper region a lower average grain size that may be at least two times greater than the upper average grain size. The cemented carbide substrate includes an interfacial surface and a depletion zone depleted of the cementing constituent that extends inwardly from the interfacial surface to a depth of, for example, about 30 ?m to about 60 ?m.
    Type: Grant
    Filed: November 12, 2014
    Date of Patent: July 24, 2018
    Assignee: US SYNTHETIC CORPORATION
    Inventors: Debkumar Mukhopadhyay, Greg Carlos Topham, Renato Ventura
  • Patent number: 10017390
    Abstract: Diamond bodies and methods of manufacture are disclosed. Diamond bodies are formed from at least a bimodal, alternatively a tri-modal or higher modal, feedstock having at least one fraction of modified diamond particles with a fine particle size (0.5-3.0 ?m) and at least one fraction of diamond particles with coarse particle size (15.0 to 30 ?m). During high pressure—high temperature processing, fine particle sized, modified diamond particles in the first fraction preferentially fracture to smaller sizes while preserving the morphology of coarse particle sized diamond particles in the second fraction. Diamond bodies incorporating the two fractions have a microstructure including second fraction diamond particles dispersed in a continuous matrix of first fraction modified diamond particles and exhibit improved wear characteristics, particularly for wear associated with drilling of geological formations.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: July 10, 2018
    Assignees: DIAMOND INNOVATIONS, INC., BAKER HUGHES, A GE COMPANY, LLC
    Inventors: Alexanne Johnson, Andrew Dean Gledhill, Danny Eugene Scott, Marc William Bird
  • Patent number: 10016813
    Abstract: A surface-coated boron nitride sintered body tool is provided, in which at least a cutting edge portion includes a cubic boron nitride sintered body and a coating film formed on a surface of the cubic boron nitride sintered body. The coating film contains Si and includes a B layer formed by alternately stacking one or more of each of a B1 compound layer and a B2 compound layer that are different in composition. A ratio between an average thickness t1 of the B1 compound layers and an average thickness t2 of the B2 compound layers is defined as t2/t1 that satisfies a relation of 0.5<t2/t1?10.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: July 10, 2018
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Nozomi Tsukihara, Katsumi Okamura, Makoto Setoyama
  • Patent number: 9988573
    Abstract: The polishing liquid according to the embodiment comprises abrasive grains, an additive and water, wherein the abrasive grains satisfy either or both of the following conditions (a) and (b). (a) Producing absorbance of at least 1.50 for light with a wavelength of 400 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %, and also producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %. (b) Producing absorbance of at least 1.000 for light with a wavelength of 290 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 0.0065 mass %, and also producing light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with a content of the abrasive grains adjusted to 1.0 mass %.
    Type: Grant
    Filed: November 21, 2011
    Date of Patent: June 5, 2018
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Tomohiro Iwano, Takenori Narita, Daisuke Ryuzaki
  • Patent number: 9970104
    Abstract: Provided is a coated tool exhibiting enhanced wear resistance and adhesiveness of an aluminum oxide layer and superior wear resistance and defect resistance. A cutting tool (1) in which at least a titanium carbonitride layer (8) and an aluminum oxide layer (10) having an ?-type crystalline structure are laminated in that order on a surface of a substrate (5). A surface-side Tc(116) in a surface-side peak is greater than a substrate-side Tc(116) in a substrate-side peak where Tc(116) is an orientation factor of the aluminum oxide layer (10) when comparing the substrate-side peak detected by measuring a portion on a substrate (5) side of the aluminum oxide layer (10) and the surface-side peak detected by measuring a portion on a surface side of the aluminum oxide layer (10) in X-ray diffraction analysis of the aluminum oxide layer (10).
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: May 15, 2018
    Assignee: KYOCERA CORPORATION
    Inventors: Takahito Tanibuchi, Yoshikazu Kodama
  • Patent number: 9963346
    Abstract: A seamless hexagonal h-BN atomic monolayer thin film has a pseudo-single crystal structure including a plurality of h-BN grains that are seamlessly merged. Each of the h-BN grains has a dimension in a range from about 10 ?m to about 1,000 ?m. The seamless hexagonal boron nitride (h-BN) atomic monolayer thin film may be fabricated by a process including pre-annealing a metal thin film at a first temperature in a chamber while supplying hydrogen gas to the chamber; supplying nitrogen source gas and boron source gas to the chamber; and forming the seamless h-BN atomic monolayer thin film having a pseudo-single crystal atomic monolayer structure having a grain dimension in a range from about 10 ?m to about 1,000 ?m by annealing the pre-annealed metal thin film at a second temperature.
    Type: Grant
    Filed: February 8, 2016
    Date of Patent: May 8, 2018
    Assignees: SAMSUNG ELECTRONICS CO., LTD., RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Hwansoo Suh, Youngjae Song, Qinke Wu, Sungjoo Lee, Minwoo Kim, Sangwoo Park
  • Patent number: 9945029
    Abstract: A coated cutting tool includes a substrate and a surface coating, wherein the coating is a Ti(C,N,O) layer comprising at least one columnar fine-grained MTCVD Ti(C,N) layer with an average grain width of 0.05-0.4 ?m and an atomic ratio of carbon to the sum of carbon and nitrogen (C/(C+N)) contained in the MTCVD Ti(C,N) layer being on average 0.50-0.65. A method for manufacturing the coated cutting tool includes depositing the MTCVD Ti(C,N) layer.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: April 17, 2018
    Assignee: SANDVIK INTELLECTUAL PROPERTY AB
    Inventor: Carl Bjormander
  • Patent number: 9914852
    Abstract: The present disclosure provides a method for reducing large particle counts (LPCs) in copper chemical mechanical polishing slurry by way of using high purity removal rate enhancer (RRE) in the slurry. The conductivity of the RRE in deionized water solutions correlates very strongly with the number of LPCs in the RRE, and thus in a slurry using the RRE.
    Type: Grant
    Filed: August 19, 2014
    Date of Patent: March 13, 2018
    Assignee: FUJIFILM PLANAR SOLUTIONS, LLC
    Inventors: James McDonough, Laura John, Deepak Mahulikar
  • Patent number: 9879350
    Abstract: A surface-coated cutting tool according to the present invention includes a coating. The coating includes an ?-Al2O3 layer. Each of the ?-Al2O3 layers on a side of a rake face and a side of a flank face shows (001) orientation. In the ?-Al2O3 layer on the rake face side, a length LR3 of a ?3 crystal grain boundary exceeds 80% of a length LR3-29 of a ?3-29 crystal grain boundary and is not lower than 10% and not higher than 50% of a total length LR of all grain boundaries. In the ?-Al2O3 layer on the flank face side, a length LF3 of a ?3 crystal grain boundary exceeds 80% of a length LF3-29 of a ?3-29 crystal grain boundary and is not lower than 10% and not higher than 50% of a total length LF of all grain boundaries. A ratio LR3/LR3-29 is higher than a ratio LF3/LF3-29.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: January 30, 2018
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Anongsack Paseuth, Hideaki Kanaoka, Takanori Detani, Shinya Imamura
  • Patent number: 9881803
    Abstract: The present disclosure relates to a method of performing a chemical mechanical planarization (CMP) process with a high germanium-to-oxide removal selectivity and a low rate of germanium recess formation. The method is performed by providing a semiconductor substrate having a plurality of germanium compound regions including germanium interspersed between a plurality of oxide regions including an oxide. A slurry is then provided onto the semiconductor substrate. The slurry has an oxidant and an etching inhibitor configured to reduce a removal rate of the germanium relative to the oxide. A CMP process is then performed by bringing a chemical mechanical polishing pad in contact with top surfaces of the plurality of germanium compound regions and the plurality of oxide regions.
    Type: Grant
    Filed: July 21, 2016
    Date of Patent: January 30, 2018
    Assignees: Taiwan Semiconductor Manufacturing Co., Ltd., UWiZ Technology Co., Ltd.
    Inventors: Chia-Jung Hsu, Yun-Lung Ho, Neng-Kuo Chen, Wen-Feng Chueh, Sey-Ping Sun, Song-Yuan Chang
  • Patent number: 9878373
    Abstract: A surface-coated cutting tool according to the present invention includes a coating. The coating includes an ?-Al2O3 layer. Each of the ?-Al2O3 layers on a side of a rake face and a side of a flank face shows (001) orientation. In the ?-Al2O3 layer on the rake face side, a length LR3 of a ?3 crystal grain boundary exceeds 80% of a length LR3-29 of a ?3-29 crystal grain boundary and is not lower than 10% and not higher than 50% of a total length LR of all grain boundaries. In the ?-Al2O3 layer on the flank face side, a length LF3 of a ?3 crystal grain boundary exceeds 80% of a length LF3-29 of a ?3-29 crystal grain boundary and is not lower than 10% and not higher than 50% of a total length LF of all grain boundaries. A ratio LR3/LR3-29 is lower than a ratio LF3/LF3-29.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: January 30, 2018
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Anongsack Paseuth, Hideaki Kanaoka, Takanori Detani, Shinya Imamura
  • Patent number: 9849517
    Abstract: A surface-coated cutting tool includes a base material and a coating formed on the base material. The coating includes an ?-Al2O3 layer containing a plurality of ?-Al2O3 crystal grains. The ?-Al2O3 layer includes: a first region made up of an edge ridgeline, a region A of a rake face, and a region B of a flank face; a second region which is a region of the rake face except for the region A and covered with the coating; and a third region which is a region of the flank face except for the region B. The ?-Al2O3 layer satisfies a relation b?a>0.5, where a is an average value of a TC(006) in the first region in texture coefficient TC(hkl) and b is an average value of the TC(006) in the second region or the third region in texture coefficient TC(hkl).
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: December 26, 2017
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Takanori Detani, Shinya Imamura, Hideaki Kanaoka, Anongsack Paseuth
  • Patent number: 9850177
    Abstract: A surface-coated boron nitride sintered body tool is provided, in which at least a cutting edge portion includes a cubic boron nitride sintered body and a coating film formed on a surface of the cubic boron nitride sintered body. The coating film includes an A layer and a B layer. The A layer is formed of columnar crystals each having a particle size of 10 nm or more and 400 nm or less. The B layer is formed of columnar crystals each having a particle size of 5 nm or more and 70 nm or less. The B layer is formed by alternately stacking two or more compound layers having different compositions. The compound layers each have a thickness of 0.5 nm or more and 300 nm or less.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: December 26, 2017
    Assignee: SUMITOMO ELECTRIC HARDMETAL CORP.
    Inventors: Nozomi Tsukihara, Katsumi Okamura, Makoto Setoyama
  • Patent number: 9844853
    Abstract: An abrasive tool can include a bonded abrasive including a body and a barrier layer bonded to a major surface of the body. The body can include abrasive particles contained within a bond material. The barrier material can include a metal-containing film. In an embodiment, the barrier layer may further include a polymer-containing film. In another embodiment, the barrier layer may include a biaxially oriented material. The abrasive tool may be formed such that the barrier layer is formed in-situ with the formation of the bonded abrasive.
    Type: Grant
    Filed: December 30, 2015
    Date of Patent: December 19, 2017
    Assignee: SAINT-GOBAIN ABRASIVES, INC./SAINT-GOBAIN ABRASIFS
    Inventors: Nan Y. Pacella, Lawrence J. Lavallee, Jr., Michael K. Montgomery, Katherine M. Sahlin
  • Patent number: 9777537
    Abstract: Embodiments of the invention relate to polycrystalline diamond (“PCD”) fabricated by sintering a mixture including diamond particles and a selected amount of graphite particles, polycrystalline diamond compacts (“PDCs”) having a PCD table comprising such PCD, and methods of fabricating such PCD and PDCs. In an embodiment, a method includes providing a mixture including graphite particles present in an amount of about 0.1 weight percent (“wt %”) to about 20 wt % and diamond particles. The method further includes subjecting the mixture to a high-pressure/high-temperature process sufficient to form PCD.
    Type: Grant
    Filed: December 12, 2014
    Date of Patent: October 3, 2017
    Assignee: US SYNTHETIC CORPORATION
    Inventor: Mohammad N. Sani
  • Patent number: 9725620
    Abstract: The present invention provides a cerium oxide based composite polishing powder and a preparation method thereof. The polishing powder contains the element magnesium in an amount of 0.005 wt %-5 wt % to magnesium oxide meter. The preparation method includes: (1) uniformly mixing a salt solution containing cerium serving as the main component of the polishing powder; (2) uniformly mixing a precipitating agent of an aqueous magnesium bicarbonate solution with the mixed solution prepared in step (1) to obtain a slurry; (3) aging the slurry prepared in step (2) for 0-48 h while the temperature of the slurry is kept at 30-90 degrees centigrade, and filtering the aged slurry to obtain the precursor powder of the polishing powder; (4) calcinating the precursor powder at 600-1000 degrees centigrade, then dispersing and separating the calcinated precursor powder to obtain the polishing powder. The present invention improves the polishing performance and the suspension performance of polishing powder.
    Type: Grant
    Filed: November 7, 2013
    Date of Patent: August 8, 2017
    Assignee: GRIREM ADVANCED MATERIALS CO., LTD.
    Inventors: Xiaowei Huang, Ying Yu, Zhiqi Long, Liangshi Wang, Dali Cui, Yongke Hou, Meisheng Cui
  • Patent number: 9725811
    Abstract: A coated cutting tool has a substrate and a coating layer. At least one layer of the coating layer is a coarse grain layer with an average layer thickness of 0.2 to 10 ?m and an average grain diameter in excess of 200 nm measured at the direction parallel to the interface of the coating layer. A composition of the layer is represented by (AlaTibMc)X, wherein M represents at least one of Zr, Hf, V, Nb, Ta, Cr, Mo, W, Y, B and Si, X represents at least one of C, N and O, and a, b and c represents atomic ratios of Al, Ti and M relative to one another such that 0.30?a?0.65, 0.35?0.70, 0?c?0.20 and a+b+c=1.
    Type: Grant
    Filed: March 4, 2014
    Date of Patent: August 8, 2017
    Assignee: Tungaloy Corporation
    Inventor: Masakazu Kikuchi
  • Patent number: 9670334
    Abstract: A shear thickening formulation and composite material employing the same are provided. The shear thickening formulation includes inorganic particles and polyethylene glycol. The inorganic particles and the polyethylene glycol have a weight ratio of 3 to 4. The inorganic particles can be silica, aluminum oxide, silicon carbide, nano diamond, or a combination thereof.
    Type: Grant
    Filed: August 14, 2015
    Date of Patent: June 6, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Hao Lai, Shih-Ming Chen, Cheng-Yi Lin
  • Patent number: 9663369
    Abstract: A process comprises combining a Ce (IV) salt dissolved in a solvent comprising water with a carbon material comprising CNT or graphene wherein the Ce (IV) salt is selected from a Ce (IV) ammonium salt of a nitrogen oxide acid, Ce (IV) ammonium salt of a sulfur oxide acid, Ce (IV) salt of a lower alkyl organo sulfur acid, or Ce (IV) salt of a lower alkane organo sulfur acid. In one embodiment the Ce (IV) salt is selected from Ce (IV) ammonium nitrate, Ce (IV) ammonium sulfate, Ce (IV) lower alkyllsulfonate, or Ce (IV) trifluoro lower alkanesulfonate. A product is produced by this process. An article of manufacture comprises this product on a substrate.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: May 30, 2017
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Bhupesh Chandra, George S. Tulevski
  • Patent number: 9657529
    Abstract: Embodiments of the invention relate to thermally-stable polycrystalline diamond compacts (“PDCs”), and methods of fabricating such PDCs. In an embodiment, a PDC includes a substrate and a pre-sintered polycrystalline diamond (“PCD”) table bonded to the substrate. The pre-sintered PCD table includes bonded diamond grains defining a plurality of interstitial regions. The pre-sintered PCD table further including a first region remote from the substrate including a nonmetallic catalyst and a metallic catalyst each of which is disposed interstitially between the bonded diamond grains thereof, and a second region bonded to the substrate including a metallic-catalyst infiltrant disposed interstitially between the bonded diamond grains thereof. A nonplanar boundary is located between the first region and the second region.
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: May 23, 2017
    Assignee: US SYNTHETICS CORPORATION
    Inventors: Kenneth E. Bertagnolli, Michael A. Vail
  • Patent number: 9579728
    Abstract: To provide a cutting tool that includes a coating layer capable of exhibiting optimum cutting performance in each of a cutting edge, rake face, and flank face. A cutting tool (1) includes a substrate (2) that is coated with a coating layer (6) composed of SiaM1-a(C1-xNx), where M represents at least one element selected from Ti, Al, Cr, W, Mo, Ta, Hf, Nb, Zr, and Y, 0.01?a?0.4, and 0?x?1, and that has a cutting edge (5) at an intersecting ridge line of a rake face (3) and a flank face (4). The Si content ratio in the coating layer (6) on the rake face (3) is higher than that on the cutting edge (5).
    Type: Grant
    Filed: December 25, 2013
    Date of Patent: February 28, 2017
    Assignee: Kyocera Corporation
    Inventor: Yoshiki Sakamoto
  • Patent number: 9583359
    Abstract: Stable aqueous polishing compositions that can selectively polish silicon nitride (SiN) films and nearly stop (or polish at very low rates) on silicon oxide films are provided herein. The compositions comprise an anionic abrasive, a nitride removal rate enhancer containing a carboxyl or carboxylate group, water, and optionally, an anionic polymer. The synergistic combination of anionic (negatively charged) abrasives and the nitride removal rate enhancer provide beneficial charge interactions with the dielectric films during CMP, a high SiN rate and selectivity enhancement (over oxide), and stable colloidal dispersed slurries.
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: February 28, 2017
    Assignee: Fujifilm Planar Solutions, LLC
    Inventors: Abhudaya Mishra, Luling Wang
  • Patent number: 9574080
    Abstract: Systems, methods, and articles of manufacture related to composite materials are discussed herein. These materials can be based on a mixture of diamond particles with a matrix and fibers or fabrics. The matrix can be formed into the composite material through optional pressurization and via heat treatment. These materials display exceptionally low friction coefficient and superior wear resistance in extreme environments.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: February 21, 2017
    Assignee: The United States of America as Represented by the Administrator of National Aeronautics and Space Administration
    Inventors: Kenneth Street, Oleg A Voronov, Bernard H Kear
  • Patent number: 9555476
    Abstract: Problem: To provide a cutting tool that exhibits superior chipping resistance and wear resistance. Resolution means: A cutting tool 1 is provided with a base 2, and a coating layer 6 comprising columnar crystals 7 that cover the surface of the base 2. A Cutting edge 5 is formed at the crossing ridge line of a rake face 3 and a flank face 4. The average inclination angle (?2) of the flank face 4, in the longitudinal direction of the columnar crystals 7 with respect to the direction orthogonal to the surface of the base 2, is greater than the average inclination angle (?1) of the rake face 3, in the longitudinal direction of the columnar crystals 7 with respect to the direction orthogonal to the surface of the base 2.
    Type: Grant
    Filed: February 20, 2014
    Date of Patent: January 31, 2017
    Assignee: KYOCERA CORPORATION
    Inventor: Yaocan Zhu
  • Patent number: 9539704
    Abstract: A polycrystalline diamond body, and a method for making a carbonate polycrystalline diamond body includes combining a first quantity of diamond particles with a first quantity of magnesium carbonate to form a first layer in an enclosure, the first layer having a working surface, and placing a second quantity of magnesium carbonate in the enclosure forming a second layer, the first layer and the second layer forming an assembly. A quantity of at least one of silicon or aluminum is mixed in with or placed adjacent to at least one of the first layer or the second layer. The assembly, including the at least one of silicon or aluminum, is sintered at high pressure and high temperature, causing the at least one of silicon or aluminum to infiltrate at least one layer of the assembly, forming a polycrystalline diamond body.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: January 10, 2017
    Assignee: Smith International, Inc.
    Inventor: Yahua Bao
  • Patent number: 9539703
    Abstract: A method for making a carbonate polycrystalline diamond body includes combining a first quantity of diamond with a first quantity of magnesium carbonate to form a first layer for forming a working surface, and combining a second quantity of magnesium carbonate to form a second layer adjacent to the first layer, forming an assembly. The method includes placing a quantity of silicon or aluminum in or adjacent to at least a portion of the assembly and sintering the assembly including the silicon or aluminum at high pressure and high temperature, causing the silicon or aluminum to infiltrate at least one layer of the assembly.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: January 10, 2017
    Assignee: Smith International, Inc.
    Inventor: Yahua Bao
  • Patent number: 9534292
    Abstract: A hard-coated tool comprising a titanium carbonitride layer formed directly on a WC-based cemented carbide substrate by a chemical vapor deposition method; the titanium carbonitride layer having a composition comprising 74-81% by mass of titanium, 13-16% by mass of carbon and 6-10% by mass of nitrogen; the titanium carbonitride layer having a structure comprising columnar crystal grains having an average transverse cross section diameter of 0.01-0.22 ?m; a layer of W diffused from the substrate to the titanium carbonitride layer having an average thickness of 30-200 nm; and the titanium carbonitride layer having an X-ray diffraction peak of a (422) plane in a 2? range of 122.7-123.7°.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: January 3, 2017
    Assignee: Hitachi Tool Engineering, Ltd.
    Inventors: Yuuzoh Fukunaga, Syuuhou Koseki, Kazuyuki Kubota, Kenichi Inoue
  • Patent number: 9463513
    Abstract: A coated cutting tool comprising substrate and a coating, wherein the coating comprises a layer of MTCVD TiCN, and a layer of ?-Al2O3, wherein the ?-Al2O3 layer exhibits an X-ray diffraction pattern, as measured using CuK? radiation, the (hkl) reflections used are (012), (104), (110), (113), (116), (300), (214) and (0 0 12), and the TC(0 0 12) is higher than 5 and a full width half maximum (FWHM) of a rocking curve peak of the (0 0 12) plane of the ?-Al2O3 is lower than 30°.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: October 11, 2016
    Assignee: SANDVIK INTELLECTUAL PROPERTY AB
    Inventors: Åke Östlund, Jonny Edman, Erik Lindahl, Jan Engqvist
  • Patent number: 9447306
    Abstract: A CMP polishing liquid comprises water and an abrasive particle, wherein the abrasive particle comprises a composite particle having a core including a first particle, and a second particle provided on the core, the first particle contains silica, the second particle contains cerium hydroxide, and the pH of the CMP polishing liquid is equal to or lower than 9.5.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: September 20, 2016
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Hisataka Minami, Keisuke Inoue, Chisato Kikkawa, Yutaka Nomura, Tomohiro Iwano
  • Patent number: 9446504
    Abstract: Polycrystalline compacts include non-catalytic, non-carbide-forming particles in interstitial spaces between interbonded grains of hard material in a polycrystalline hard material. Cutting elements and earth-boring tools include such polycrystalline compacts. Methods of forming polycrystalline compacts include forming a polycrystalline material including a hard material and a plurality of particles comprising a non-catalytic, non-carbide-forming material. Methods of forming cutting elements include infiltrating interstitial spaces between interbonded grains of hard material in a polycrystalline material with a plurality of non-catalytic, non-carbide-forming particles.
    Type: Grant
    Filed: July 28, 2014
    Date of Patent: September 20, 2016
    Assignee: Baker Hughes Incorporated
    Inventor: Anthony A. DiGiovanni