Abstract: A process for producing vinyl fluoride polymer comprising polymerizing vinyl fluoride in an aqueous polymerization medium containing initiator and halogen-free surfactant with a critical micelle concentration of less than about 0.05 weight percent at 25° C. The halogen-free surfactant is present in the aqueous polymerization medium in an amount less than about 0.1 weight percent based on the weight of the aqueous polymerization medium. The aqueous polymerization medium is essentially free of halogen-containing surfactant. An aqueous dispersion comprising vinyl fluoride polymer particles present in a range of from about 5 to about 40 weight percent based on the weight of the aqueous phase, wherein said vinyl fluoride polymer particles have a Dv(50) of less than about 20 microns, and halogen-free surfactant, wherein said halogen-free surfactant is present in said aqueous dispersion in an amount less than 0.1 weight percent based on the weight of the aqueous phase.

Abstract: A polymeric compound having a backbone structure including an addition product of a (meth)acrylate compound and a nucleophile of a cobalt porphyrin complex including a tetraphenylporphyrin derivative represented by Formula 1 coordinated to a cobalt metal, wherein substituents R1 to R4 are as described in the specification, an oxygen permeable membrane including the polymeric compound, and an electrochemical device including the oxygen permeable membrane.

Abstract: Articles such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a hydrocarbon-based hardcoat composition and at least one perfluoropolyether urethane additive. The surface layer exhibits low lint attraction in combination with high contact angles. Hardcoat coating compositions comprising a perfluoropolyether urethane additive and a silicone (meth)acrylate additive are also described.

Abstract: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

Abstract: This invention pertains to a thermoplastic fluoropolymer composition comprising: at least one thermoplastic hydrogen-containing fluoropolymer [polymer (A)]; and from 0.1 to 10% by weight of (A) of at least one per(halo)fluoropolymer chosen among tetrafluoroethylene (TFE) copolymers having a dynamic viscosity at a shear rate of 1 rad sec?1 of less than 10 Pa sec at a temperature of 280° C. [polymer (B)]. The addition of a TFE copolymer [polymer (B)] of low melt viscosity advantageously enables improvement of rheological behavior of thermoplastic hydrogen-containing fluoropolymer (A), making possible processing in less severe conditions and yielding final parts with outstanding surface aspect and good homogeneity and coherency. Still objects of the invention are a process for manufacturing said thermoplastic fluoropolymer composition and the articles, such as shaped articles, films, cable sheathing, pipes, flexible pipes, hollow bodies comprising said thermoplastic fluoropolymer composition.

Abstract: A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

Abstract: A fluorinated ester monomer is provided having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are H or a monovalent hydrocarbon group, or R2 and R3 forms a hydrocarbon ring, R4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.

Abstract: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n?6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.

Abstract: A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.

Abstract: Presently described is a composition comprising at least one first divalent unit comprising a pendant perfluoropolyether or perfluoroalkyl group; at least one second divalent unit comprising a pendant phosphorus-containing acid group; and at least one third unit comprising a terminal or pendant alkoxy silane group. Also described is a coating comprising the composition described herein dissolved or dispersed in a solvent and a method of providing a coated article or surface. Such method is particularly useful for providing corrosion protection to a metallic surface.

Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer comprising recurring units derived from a styrene, indene, benzofuran or benzothiophene monomer having 1,1,1,3,3,3-hexafluoro-2-propanol, and recurring units derived from a styrene, vinylnaphthalene, indene, benzofuran, benzothiophene, stilbene, styrylnaphthalene or dinaphthylethylene monomer and an ether solvent.

Abstract: The present invention relates to a partially-crystalline copolymer comprising tetrafluoroethylene, hexafluoropropylene in an amount corresponding to HFPI of from about 2.8 to 5.3, and preferably from about 0.2% to 3% by weight of perfluoro(alkyl vinyl ether), said copolymer having less than about 50 ppm alkali metal ion, having a melt flow rate of within the range of about 30±3 g/10 min, and having no more than about 50 unstable endgroups/106 carbon atoms and which can be extruded at high speed onto conductor over a broad polymer melt temperature range to give insulated wire of high quality.

Abstract: The present invention provides a water- and oil-repellent soil-resistant composition comprising (A) a fluorine-containing polymer having repeating units derived from a monomer comprising a fluorine-containing monomer and (B) a silane compound. The water- and oil-repellent soil-resistant composition comprising the fluorine-containing acrylate polymer can impart the excellent water- and oil-repellency and soil resistance to the porous substrate and is free from an organic solvent.

Abstract: The invention relates to a coating composition comprising short chain fluorinated acrylates and to the use of short chain fluorinated acrylates as levelling agents for pigmented and unpigmented coating compositions. The coating composition comprises a) a film forming binder resin, and b) a copolymer made by controlled polymerization or by conventional radical polymerization comprising a monomer (M1x) selected from unsaturated monomers out of the group of (meth)acrylates, styrenic monomers or (meth)acrylamides whereby the copolymer contains at least >30 wt % (meth)acrylates; and a monomer (M2y) selected from C1-C4-fluoralkyl(meth)acrylates; x denotes the total number of monomers M1 within the structural element (M1x): x>5, preferred, 10-1000, most preferred, 10-500; y denotes the total number of monomers M2 within the structural element (M2y): y>1, preferred, 2-20, most preferred 2-10; c) optional other conventional coating components and/or additives.

Abstract: The present invention relates to the reduction of oligomer content of melt-processible fluoropolymer so that the fluoropolymer has at least 25 ppm less oligomer than the as-polymerized fluoropolymer.

Abstract: A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.

Abstract: A method to provide acid etch resistance to contacting a calcareous substrate with a copolymer prepared from fluorinated methacrylate, short chain branched (meth)acrylate, and (meth)acrylic acid salt and a treated substrate.

Abstract: Fluoropolymers containing one or more azide group wherein the azide group is not a sulfonyl-azide group and processes of preparing them.

Abstract: A measuring tube for a lining of a measuring tube of a flow measuring device, wherein a nanoparticle is chemically bound to a polymer.

Abstract: The present invention involves a cross-linked carboxylic acid hydrophobically modified copolymer product in which cross-linked carboxylic acid is modified with a non-hydrocarbyl hydrophobe, namely, poly(dimethyl siloxane) or fluoronated alkyl methacrylates.

Abstract: A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

Abstract: The invention provide a new lens curing method for making hydrogel contact lenses. The new lens curing method is based on actinically-induced step-growth polymerization. The invention also provides hydrogel contact lenses prepared from the method of the invention and fluid compositions for making hydrogel contact lenses based on the new lens curing method. In addition, the invention provide prepolymers capable of undergoing actinically-induced step-growth polymerization to form hydrogel contact lenses.

Abstract: A water and oil repellent composition having excellent durability, which can impart excellent water and oil repellency to an object, even in a process at low temperatures, and which enables water and oil repellent treatment providing a soft hand. A water and oil repellent composition which comprises, as an essential component, a copolymer containing polymerization units of the following monomer (a) and polymerization units of the following monomer (b): monomer (a): an Rf group-containing monomer which forms a photopolymer having no melting point or a melting point of at most 55° C. attributable to fine crystals derived from the Rf groups and having a glass transition point of at least 20° C. monomer (b): a monomer having no Rf group and having a cross-linkable functional group.

Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).

Abstract: The present invention provides a method of producing a fluoroelastomer excellent in dispersion stability at low cost, at a high rate of polymerization and in high yields. The present invention is a method of producing a fluoroelastomer comprising an emulsion polymerization of a fluorinated monomer in the presence of a water-soluble radical polymerization initiator, wherein the emulsion polymerization is carried out in the presence of a compound (1) containing a functional group reactive in radical polymerization and a hydrophilic group and a fluorinated compound (2) containing a fluorocarbon group comprising 1 to 6 continuously united carbon atom with fluorine atom directly bound to each of them as well as a hydrophilic group.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in an alkali developing solution under action of acid, the resist composition including a polymeric compound containing a base decomposable group in a main chain thereof.

Abstract: Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5). In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.

Abstract: Azeotropic or azeotrope-like compositions of the present technology include methyl chloride and at least one hydrofluorocarbon or hydrofluoro-olefin. In some examples, the at least one hydrofluorocarbon or hydrofluoro-olefin can be selected from the group consisting of 1,1,1,2-tetrafluoroethane and 1,3,3,3-tetrafluoropropene. The azeotropic or azeotrope-like compositions can be used as solvents or diluents in polymerization processes, including slurry polymerization processes.

Abstract: The invention relates to a copolymer which can be obtained by free-radical copolymerization of one or more urethane-based, polysiloxane-containing macromonomers and one or more further free-radically polymerizable comonomers. Processes for preparing the copolymer and its use as additive in coating compositions and plastics and as wetting agent and dispersant in homogeneous dispersions are also described.

Abstract: A process for preparing a fluorine-containing polymer which includes a first step for preparing a dispersion of fluorine-containing emulsified particles (A) having ionic functional groups where a fluorine-containing monomer mixture (i) is polymerized by using a water soluble radical polymerization initiator (a) without addition of an emulsifying agent, and a second step for preparing a fluorine-containing polymer (b) having a small amount of ionic functional groups where fluorine-containing monomers (ii) are emulsion-polymerized by using a radical polymerization initiator (b) in the presence of the fluorine-containing emulsified particles (A) having ionic functional groups without addition of an emulsifying agent.

Abstract: Blended release materials including a blend of a fluoro-functional silicone release polymer and a fluoropolymer are described. Exemplary fluoropolymers include fluoroolefin-based polymers and linear fluoropolymers including linear fluoroacryaltes. Articles including such release materials such as release liners, and adhesive articles, including silicone adhesive articles, are also described.

Abstract: A compound represented by formula (1), a liquid crystal composition, a liquid crystal display device are described. In formula (1), for example, the ring A1 and the ring A4 are phenylene or cyclohexylene; Z1, Z2, Z3 and Z4 are a single bond or alkylene having 1 to 6 carbons; L1 is a single bond; s and t are 0; and P1, P2, P3 and P4 are a polymerizable group.

Abstract: A process is provided for polymerizing fluoromonomer in an aqueous medium, wherein a dispersion of essentially surfactant-free hydrocarbon-containing oleophilic nucleation sites is first formed in the aqueous medium, and then polymerization is commenced to form a dispersion of fluoropolymer particles at the oleophilic nucleation sites, wherein the nucleation sites can be derived from hydrocarbon-containing compound. The surfactant used to stabilize the fluoropolymer dispersion can also be hydrocarbon-containing.

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(M)COO(CH2)nPhXPhZCrF2r+1??(I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, n is an integer of from 0 to 2, Ph is a phenylene group, X is CH2O or OCH2, Z is a single bond, a C1-4 alkylene group containing an etheric oxygen atom, or COO(CH2)m (wherein m is an integer of from 1 to 4), and r is an integer of from 1 to 6).

Abstract: A functional TFE copolymer fine powder is described, wherein the TFE copolymer is a polymer of TFE and at least one functional comonomer, and wherein the TFE copolymer has functional groups that are pendant to the polymer chain. The functional TFE copolymer fine powder resin is paste extrudable and expandable. Methods for making the functional TFE copolymer are also described. The expanded functional TFE copolymer material may be post-reacted after expansion.

Abstract: To provide an antifouling composition which is a fluorine-type antifouling composition using a short chain perfluoroalkyl group and which is excellent in antifouling properties and water/oil repellency and presents good durability against washing. An antifouling composition comprising a fluorocopolymer which comprises from 30 to 65 mass % of polymerized units (a) having a C1-6 perfluoroalkyl group, from 1 to 67 mass % of polymerized units (b1) having —(C2H4O)— and from 3 to 34 mass % of polymerized units (b2) having —(C4H8O)—, wherein the content of —(C2H4O)— is from 20 to 65 mass %, and the content of —(C4H8O)— is from 2 to 13 mass %.

Abstract: A polymer for forming a resist protection film which is used in a liquid immersion lithography process to protect a photoresist layer, a composition for forming a resist protection film, and a method of forming a pattern of a semiconductor device using the composition are disclosed. The polymer for forming a resist protection film includes a repeating unit represented by Formula 1 below. In Formula 1, R1 is a hydrogen atom (H), a fluorine atom (F), a methyl group (—CH3), a C1-C20 fluoroalkyl group, or a C1-C5 hydroxyalkyl group, R2 is a C1-C10 linear or branched alkylene group or alkylidene group, or a C5-C10 cycloalkylene group or cycloalkylidene group, X is wherein n is an integer of 0 to 5 and * denotes the remaining moiety of Formula 1 after excluding X, and m, the stoichiometric coefficient of X, is 1 or 2.

Abstract: A process for the preparation of a fluoroolefin polymer from an azeotropic mixture of monomers having a constant composition, the process including the step of: contacting in a reaction zone: (i) an initiator; and (ii) an azeotropic mixture of monomers including at least one fluoroolefin and, optionally, at least one ethylenically unsaturated comonomer capable of copolymerizing therewith; wherein the contacting is carried out at a temperature, pressure and length of time sufficient to produce the fluoroolefin polymer.

Abstract: Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.

Abstract: A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the like, R2 represents a hydrocarbon group that forms a cyclic structure, R3 represents a fluorine atom or the like, R4 represents a carbon atom, and n1 is an integer from 1 to 7.

Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.

Abstract: The present invention provides peroxidic fluoropolyether and a fluorine-containing dispersion obtained from polymerization of fluorine-containing monomers in the presence of peroxidic fluoropolyether as a surfactant. The peroxidic fluoropolyether can be used as surfactant for producing aqueous dispersion of fluorine-containing monomer in place of PFOA or the salts thereof. Thus the amount of PFOA or the salts thereof is reduced and the natural environment is protected. In addition, applying peroxidic fluoropolyether as surfactant and combining it with adjuvants, such as initiator, can induce the reaction moderate and can be beneficial to the polymerization control, thus reducing the amount of initiator or shortening the reaction time.

Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

Abstract: The present invention provides inks and methods for making colored silicone hydrogel contact lenses. The ink of the invention comprises an actinically-curable binder copolymer comprising fluorine-containing segments and is characterized by having capability to be cured actinically or thermally to form a colored film on a molding surface of a mold or a silicone hydrogel contact lens and by having an increased durability in a solvated state in a silicone-hydrogel lens formulation in relation to a control colored film obtained from a control ink including an actinically-curable fluorine-free binder copolymer. The invention also provides methods for making colored silicone hydrogel contact lenses based on print-on-mold processes for producing colored contact lenses.

Abstract: A process comprising polymerizing at least one fluorinated monomer in an aqueous medium containing initiator and polymerization agent to form an aqueous dispersion of particles of fluoropolymer, the polymerization agent comprising: fluoropolyether acid or salt thereof having a number average molecular weight of at least about 800 g/mol; and fluorosurfactant having the formula: [R1—On-L-A?]Y+ wherein: R1 is a linear or branched partially or fully fluorinated aliphatic group which may contain ether linkages; n is 0 or 1; L is a linear or branched alkylene group which may be nonfluorinated, partially fluorinated or fully fluorinated and which may contain ether linkages; A? is an anionic group selected from the group consisting of carboxylate, sulfonate, sulfonamide anion, and phosphonate; and Y+ is hydrogen, ammonium or alkali metal cation; with the proviso that the chain length of R1—On-L- is not greater than 6 atoms.

Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.

Abstract: A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

Abstract: There is provided a polymer made from a monomer having Formula I: where: R and Y are independently selected from the group consisting of H, D, alkyl, fluoroalkyl, aryl, fluoroaryl, alkoxy, aryloxy, NR?2, R?, R? is a crosslinkable group; R? is independently selected from the group consisting of H, alkyl, fluoroalkyl, aryl, fluoroaryl, and R?; X is a leaving group; Z is C, Si, or N; Q is (ZR?n)b; a is an integer from 0 to 5; b is an integer from 0 to 20; c is an integer from 0 to 4; q is an integer from 0 to 7; and n is an integer from 1 to 2.

Abstract: A coating composition for forming a low-refractive-index layer includes a first fluorine compound represented by Formula 1 below, (CH2?CR1COO)2Rf??Formula 1 and a reactive silicon compound, a (meth)acrylate compound, a polymerization initiator, and a solvent. The first fluorine compound represented by Formula 1, the reactive silicon compound, the (meth)acrylate compound, the polymerization initiator, and the solvent may each be different from one another, and in Formula 1, Rf may be a C1-19 perfluoro group, and R1 may be a hydrogen atom or a methyl group.

Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.