Contains An Exterior Ethylenic Substituent Bonded To A Single Carbon Atom Of The Bridged Ring System Patents (Class 526/282)
  • Publication number: 20030088037
    Abstract: A polymerization process comprises contacting one or more olefinic comonomers in the presence of at least a high molecular weight catalyst and at least a low molecular weight catalyst in a single reactor; and effectuating the polymerization of the olefinic comonomers in the reactor to obtain an olefin polymer. Preferably, both catalysts have the ability to incorporate a substantially similar amount of comonomers in the olefin polymer. The polymers produced by the process may have a relatively higher level of long chain branching while maintaining a relatively narrow molecular weight distribution, i.e., MWD less than about 6. These interpolymers may exhibit processability similar to or better than LDPE but have physical properties similar to metallocene catalyzed polymers.
    Type: Application
    Filed: March 15, 2002
    Publication date: May 8, 2003
    Applicant: The Dow Chemical Company
    Inventors: James C. Stevens, Daniel D. VanderLende
  • Publication number: 20030082479
    Abstract: A copolymer of an acrylic monomer having at least one C6-20 alicyclic structure with a norbornene derivative or styrene monomer having a hexafluoroalcohol pendant is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.
    Type: Application
    Filed: June 25, 2002
    Publication date: May 1, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Patent number: 6552148
    Abstract: The present invention relates to a thermoplastic interpolymer product comprising an &agr;-olefin interpolymerized with at least one vinyl or vinylidene aromatic monomer and/or at least one hindered aliphatic or cycloaliphatic vinyl or vinylidene aromatic monomer and, in at least one aspect, is characterized as having substantially synergistic thermal properties. The invention also relates to a process for manufacturing the interpolymer product wherein the process employs two or more single site or metallocene catalyst systems in at least one reaction environment and wherein at least two of the catalyst systems have (a) different monomer incorporation capabilities or reactivities and (b) the same or, optionally, different monomer sequencing and/or tacticity characteristics.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: April 22, 2003
    Assignee: The Dow Chemical Company
    Inventors: Yunwa W. Cheung, Martin J. Guest, Robert K. Rosen, Brian W. Kolthammer
  • Patent number: 6552102
    Abstract: Described are chiral liquid crystalline polymer materials and polymerizable compounds used for preparing them. The polymer materials can serve as a carrier material or are coated onto a carrier material. Also described are methods of making such materials and using them to make pigment flakes used in paints, printing inks, spray paints, cosmetic products, colored plastics, optical elements and security applications.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: April 22, 2003
    Assignee: Merck Patent Gesellschaft mit beschränkter Haftung
    Inventors: Eike Poetsch, Gerhard Pfaff, Matthias Kuntz, Stephan Derow, David Coates
  • Patent number: 6545120
    Abstract: An alicyclic (meth)allyl ester monomer obtained by a specific production process. An alicyclic (meth)allyl ester compound for plastic lenses, which can be obtained by a simple and easy production process and which can endure a long-term storages, is produced using the monomer, and a plastic lens is obtained using the compound.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: April 8, 2003
    Assignee: Showa Denko K.K.
    Inventors: Kazuhiko Ooga, Tsuneo Tajima, Hiroshi Uchida
  • Patent number: 6538085
    Abstract: The present invention is directed to copolymers of norbornene and functional group containing norbornene comonomers and processes for the preparation thereof. These polymers may be random, alternating or block copolymers or terpolymers, etc. In general, the present invention describes a polymer composition of the formula: [A]S— and —[B]T wherein A is monomer repeat unit derived from one or more norbornene or substituted norbornene monomers and B is a monomer repeat unit derived from one or more functionalized norbornene compounds.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: March 25, 2003
    Assignee: Eastman Kodak Company
    Inventors: Christopher Moore Killian, Peter Borden Mackenzie, John Anthony Hyatt, Leslie Shane Moody, Gino Georges Lavoie
  • Patent number: 6538080
    Abstract: A gas phase fluidized bed process is described for producing ethylene polymers having improved processability and an MWD of less than about 2.9. Multiple reactors in series or parallel may be used to produce in-situ blended polymers. Each reactor can separately have a constrained geometry catalyst or a conventional Ziegler-Natta catalyst as needed for obtaining in-situ blended polymer with the desired properties as long as there is a constrained geometry catalyst in at least one reactor. Olefin polymers can be produced according to this invention which have low susceptibility to melt fracture, even under high shear stress conditions.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: March 25, 2003
    Assignee: BP Chemicals Limited
    Inventors: Robert D. Swindoll, Bruce A. Story, Brian W. S. Kolthammer, Kevin P. Peil, David R. Wilson, James C. Stevens
  • Publication number: 20030050411
    Abstract: A polymerization process comprises (1) contacting at least one polymerizable monomer in the presence of a metal catalyst in a reactor; (2) effectuating polymerization of the monomer; (3) adding a substituted olefin having at least one polar group to the reactor. The substituted olefin is different from the monomer. Vinyl-terminated macromers preferably are generated which can be homopolymerized or copolymerized with the monomer by the metal catalyst. A polymer of an olefin monomer and a substituted olefin comprising a backbone and a plurality of side chains. The polymer is characterized by an Rv of greater than about 0.85, where Rv is a measure of the relative number of vinyl groups in the polymer. In some polymers, the vinyl endgroups are transformed to other useful end groups.
    Type: Application
    Filed: June 11, 2002
    Publication date: March 13, 2003
    Applicant: Dow Global Technologies Inc.
    Inventors: Scott Gaynor, Michael Mullins, Phillip Athey, Harold Boone
  • Publication number: 20030040592
    Abstract: To provide a hydrocarbon resin for improving rubber compositions, wherein the hydrocarbon resin has improved durability, abrasion resistance, stretch, and productivity, while retaining puncturing strength and tear strength of vulcanized rubber products such as tires and the like; and to also provide a rubber composition comprising the hydrocarbon resin, or vehicle tire obtained from the rubber composition,
    Type: Application
    Filed: July 3, 2002
    Publication date: February 27, 2003
    Applicant: Nippon Petrochemicals Co., Ltd.
    Inventors: Shuichi Tajima, Kazuo Kawai
  • Patent number: 6525153
    Abstract: Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin monomer containing the pendant anhydride functionality can be copolymerized with other polycycloolefin monomers that contain pendant functional groups to yield random copolymer products.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: February 25, 2003
    Assignees: Sumitomo Bakelite Co., Ltd., International Business Machines Corp.
    Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian, Robert David Allen, Juliann Opitz, Thomas I. Wallow
  • Publication number: 20030036612
    Abstract: 1 A metallocene compound of general formula (I): LGZMXp, wherein L is a divalent group, Z is a moiety of formula (II), wherein R3 and R4 are selected from hydrogen and hydrocarbon groups; A and B are selected from S, O or CR5, wherein R5 is selected from hydrogen and hydrocarbon groups, either A or B being different from CR5; G is a moiety of formula (III), wherein R6, R7, R8 and R9 are selected from hydrogen and hydrocarbon groups, M is an atom of a transition metal, X is selected from a halogen atom, a R10, OR10, OSO2CF3, OCOR10, SR10, NR102 or PR102 group, wherein the substituents R10 is hydrogen and a hydrocarbon group; p is an integer from 0 to 3.
    Type: Application
    Filed: August 27, 2001
    Publication date: February 20, 2003
    Inventors: Ilya E. Nifant'ev, Simona Guidotti, Luigi Resconi, Ilya P. Laishevtsev
  • Patent number: 6515084
    Abstract: Ruthenium and osmium carbene compounds that are stable in the presence of a variety of functional groups and can be used to catalyze olefin metathesis reactions on unstrained cyclic and acyclic olefins are disclosed. Also disclosed are methods of making the carbene compounds. The carbene compounds are of the formula where M is Os or Ru; R1 is hydrogen; R is selected from the group consisting of hydrogen, substituted or unsubstituted alkyl, and substituted or unsubstituted aryl; X and X1 are independently selected from any anionic ligand; and L and L1 are independently selected from any neutral electron donor. The ruthenium and osmium carbene compounds of the present invention may be synthesized using diazo compounds, by neutral electron donor ligand exchange, by cross metathesis, using acetylene, using cumulated olefins, and in a one-pot method using diazo compounds and neutral electron donors.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: February 4, 2003
    Assignee: California Institute of Technology
    Inventors: Robert H. Grubbs, Peter Schwab, Sonbinh T. Nguyen
  • Publication number: 20030023013
    Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula:
    Type: Application
    Filed: July 16, 2002
    Publication date: January 30, 2003
    Applicant: The B.F.Goodrich Company
    Inventors: John-Henry Lipian, Larry F. Rhodes, Brian L. Goodall, Andrew Bell, Richard A. Mimna, John C. Fondran, Saikumar Jayaraman, April D. Hennis, Christine N. Elia, Jennifer D. Polley, Ayusman Sen
  • Patent number: 6511756
    Abstract: A thermoplastic dicyclopentadiene ring-opening polymer obtained by ring-opening polymerization of a monomer component containing a dicyclopentadiene monomer, characterized in that polycyclic rings which are repeating units of the polymer are bonded in cis-position relative to the carbon-carbon double bond of the main chain of the polymer in 50 mol % or more of the repeating units based on the total repeating units and the content of a low-molecular weight component of 2,000 or less in molecular weight is 10% by weight or less based on the total polymer components, and a hydrogenation product obtained by hydrogenating the carbon-carbon unsaturated bond of the thermoplastic dicyclopentadiene ring-opening polymer.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: January 28, 2003
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Kazuyuki Obuchi, Masaharu Tokoro, Teruhiko Suzuki, Hajime Tanisho, Kenji Otoi
  • Publication number: 20030018138
    Abstract: A ring-opened metathesis copolymer formed by the ring-opening metathesis copolymerization of a cyoloolefin monomer having a carboxylic anhydride group selected from bicycloheptene derivatives, tetracyclododecene derivatives and hexacycloheptadecene derivatives with a cycloolefin monomer selected from bicycloheptene derivatives, tetracycloheptene derivatives and hexacycloheptene derivatives; and a hydrogenation product of the copolymer. This copolymer is produced by using a polymerization catalyst comprises an organoruthenium compound having a heterocyclic carbene compound as a ligand. The ring-opened metathesis copolymer and the hydrogenation product thereof have a low dielectric constant, a low water absorption, a high adhesion to metals and a high heat resistance.
    Type: Application
    Filed: June 7, 2002
    Publication date: January 23, 2003
    Inventors: Masato Sakamoto, Yasuo Tsunogae
  • Publication number: 20030013831
    Abstract: The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
    Type: Application
    Filed: May 11, 2001
    Publication date: January 16, 2003
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Patent number: 6503687
    Abstract: A photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units, a resist composition containing the photosensitive polymer and a preparation method thereof, wherein the photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl group, R2 is &ggr;-butyrolactone-2-yl, &ggr;-butyrolactone-3-yl, pantolactone-2-yl, mevalonic lactone, 3-tetrahydrofuranyl, 2,3-propylenecarbonate-1-yl or 3-methyl-&ggr;-butyrolactone-3-yl, R3 is a hydrogen atom, methyl, ethyl or C3 to C20 alicyclic hydrocarbon, and p/(p+q+r) is 0.1˜0.8, q/(p+q+r) is 0.2˜0.8, and r/(p+q+r) is 0.0˜0.4. To prepare the photosensitive polymer, at least two different norbornene-type compounds having an ester group as a substituent are reacted in the presence of an initiator at a temperature of about 120 to about 150 ° C. without a reaction catalyst.
    Type: Grant
    Filed: December 8, 2000
    Date of Patent: January 7, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun-woo Kim, Si-hyueng Lee, Ki-young Kwon, Dong-won Jung, Sang-jun Choi, Sang-gyun Woo
  • Publication number: 20030004289
    Abstract: An acetal group containing norbornene-based copolymer useful for a photoresist composition, a method for producing the same, and a photoresist composition containing the same are disclosed. According to the present invention, a copolymer of the present invention has excellent transparency at a wavelength of not more than about 250 nm, excellent resolution, excellent sensitivity, dry etching resistance and excellent adhesion to the substrate.
    Type: Application
    Filed: April 22, 2002
    Publication date: January 2, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jung Han Shin, Bong Seok Moon, Ouck Han, Keun Byoung Yoon, Eun Sil Han
  • Publication number: 20030004286
    Abstract: Group 4 metal complexes of the constrained geometry type, catalysts derived therefrom, and polymerization processes using the same, characterized by an alkaryl-substituted silane bridging group are disclosed.
    Type: Application
    Filed: May 23, 2002
    Publication date: January 2, 2003
    Inventors: Jerzy Klosin, William J. Kruper, Peter N. Nickias, Gordon R. Roof, Jorge Soto, David D. Graf
  • Publication number: 20020177066
    Abstract: The present invention relates to a silicon-containing copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit. The silicon-containing copolymer is suitable for use as a top layer resist in a bilayer resist system.
    Type: Application
    Filed: May 16, 2001
    Publication date: November 28, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Tsing-Tang Song, Tsong-Shin Jean, Weir-Torn Jiaang, Chih-Shin Chuang, Han-Bin Cheng, Jui-Fa Chang, Tzu-Yu Lin
  • Patent number: 6486282
    Abstract: The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: November 26, 2002
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Publication number: 20020169263
    Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula 1
    Type: Application
    Filed: May 21, 2002
    Publication date: November 14, 2002
    Applicant: California Institute of Technology
    Inventors: Bob R. Maughon, Takeharu Morita, Robert A. Grubbs
  • Publication number: 20020169267
    Abstract: The present invention provides a phase retarder made of a copolymer prepared by polymerizing one non-cyclic olefin monomer (A) selected from ethylene and &agr;-olefin compound having 3 to 20 carbon atoms, one cyclic olefin monomer (B) selected from cyclic olefin compound such as norbornene, and one cyclic vinyl monomer (C) selected from vinyl compound having a cyclic unit made of an aromatic hydrocarbon or an alicyclic hydrocarbon such as styrene or vinylcyclohexane; wherein (1) an amount of the aromatic vinyl monomer is from about 1 to about 20 mol % and a total amount of the non-cyclic olefin monomer (A) and the cyclic olefin monomer (B) is from about 80 to about 99 mol % in case the component (C) is the aromatic vinyl monomer, or (2) an amount of the alicyclic vinyl monomer is from about 80 to about 99 mol % and a total amount of the non-cyclic olefin monomer and th cyclic olefin monomer is from about 1 to about 20 mol % in case the component (C) is the alicyclic vinyl monomer.
    Type: Application
    Filed: April 17, 2002
    Publication date: November 14, 2002
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Keiichi Minakuchi, Koji Higashi, Nobuo Oi
  • Patent number: 6479592
    Abstract: A functionalized and polymerizable polymer is described which is obtainable by ring-opening metathesis polymerization and is suitable in particular as a dental material and especially as a constituent of dental adhesives owing to an adhesion-boosting effect.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: November 12, 2002
    Assignee: Ivoclar Vivadent AG
    Inventors: Volker Rheinberger, Norbert Moszner, Franz Stelzer, Regina Schitter, Frank Zeuner
  • Patent number: 6479606
    Abstract: The present invention relates to polymerizable compositions for the manufacture of optical lenses with a high refractive index and a high Abbe number, and optical lenses comprising these compositions.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: November 12, 2002
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Peiqi Jiang, Gilles Widawski, Gilbert Menduni
  • Publication number: 20020161150
    Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-15 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
    Type: Application
    Filed: January 16, 2002
    Publication date: October 31, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Seiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi
  • Publication number: 20020160301
    Abstract: The present invention provides a cross-linker monomer of formula 1, a photoresist polymer derived from a monomer comprising the same, and a photoresist composition comprising the photoresist polymer. The cross-linking unit of the photoresist polymer can be hydrolyzed (or degraded or broken) by an acid generated from a photoacid generator on the exposed region. It is believed that this acid degradation of the cross-linking unit increases the contrast ratio between the exposed region and the unexposed region. The photoresist composition of the present invention has improved pattern profile, enhanced adhesiveness, excellent resolution, sensitivity, durability and reproducibility.
    Type: Application
    Filed: April 9, 2002
    Publication date: October 31, 2002
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Ho Baik
  • Publication number: 20020161148
    Abstract: A copolymer of an acrylate monomer containing fluorine at &agr;-position with a norbornene derivative is highly transparent to VUV radiation and resistant to dry etching. A resist composition using the resin as a base polymer is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
    Type: Application
    Filed: February 8, 2002
    Publication date: October 31, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Publication number: 20020156207
    Abstract: The present invention is intended to provide a polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith, a process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof. The polar group-containing olefin copolymer comprises a constituent unit derived from an &agr;-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation. The polar group-containing olefin copolymer can be prepared by polymerizing the &agr;-olefin with the polar group-containing monomer and/or the macromonomer in the presence of a metallocene catalyst.
    Type: Application
    Filed: September 7, 2001
    Publication date: October 24, 2002
    Inventors: Junichi Imuta, Nori Kashiwa, Seiji Ota, Satoru Moriya, Tadahito Nobori, Kazumi Mizutani
  • Patent number: 6465584
    Abstract: The invention relates to an elastomeric copolymer derived from components comprising a) ethylene, b) an &agr;-olefin, c) a non-conjugated polyene (C) having one C═C bond that is copolymerizable using a Ziegler-Natta catalyst, and d) optionally a non-conjugated polyene (D) which in the molecule contains two or more C═C bonds that are copolymerizable using a Ziegler-Natta catalyst. The copolymer is characterized by, inter alia, a specific branching coefficient BC. The invention also relates to a process for the preparation of such copolymers.
    Type: Grant
    Filed: December 27, 1999
    Date of Patent: October 15, 2002
    Assignee: DSM N.V.
    Inventors: Georges G. Evens, Emanuel M. J. Pijpers, Andreas A. Oosterlaken, Jacob Renkema, Henri J. H. Beelen
  • Patent number: 6462158
    Abstract: Disclosed herein are polymerizable compounds represented by the following formula (1): wherein one of R1 and R2 represents an alkyl group, which has 1 to 4 carbon atoms and is other than a tert-butyl group, and the other represents a hydrogen atom or an alkyl group which has 1 to 4 carbon atoms and is other than a tert-butyl group, R3 to R9 each independently represent a hydrogen atom, a silyl group, a cyano group, a hydroxyl group, a halogen atom or a monovalent nonpolymerizable organic substituent group, and A represents a polymerizable group having a carbon-carbon double bond; polymers obtained by singly polymerizing the polymerizable compounds or copolymerizing them with copolymerizable compounds; and resist compositions comprising the polymers. These polymers are useful as base polymers for resist materials for an exposure light source of a short wavelength.
    Type: Grant
    Filed: August 16, 2000
    Date of Patent: October 8, 2002
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Takuya Miwa, Nobuyuki Oka, Masao Kaneko
  • Patent number: 6455650
    Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R′)zM(L′)x(L″)y]b[WCA]d wherein [(R′)zM(L′)x(L″)y] is a cation complex where M represents a Group 10 transition metal; R′ represents an anionic hydrocarbyl containing ligand; L′ represents a Group 15 neutral electron donor ligand; L″ represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.
    Type: Grant
    Filed: October 5, 1999
    Date of Patent: September 24, 2002
    Assignees: The B.F. Goodrich Company, The Penn State Research Foundation
    Inventors: John-Henry Lipian, Larry F. Rhodes, Brian L. Goodall, Andrew Bell, Richard A. Mimna, John C. Fondran, Saikumar Jayaraman, April D. Hennis, Christine N. Elia, Jennifer D. Polley, Ayusman Sen
  • Publication number: 20020132937
    Abstract: This invention relates to a method to start up an olefin polymerization process comprising:
    Type: Application
    Filed: December 6, 2001
    Publication date: September 19, 2002
    Inventor: William Howard Sachs
  • Patent number: 6451946
    Abstract: A copolymer of (a)ethylene and/or an &agr;-olefin, (b) a cyclic olefin and (c) an alkenyl aromatic hydrocarbon, having acyclic olefin content of 0.01 to 66 mol % and a styrene content of 3 to 99 mol %, wherein the styrene content is more than a half of the cyclic olefin content, a process for producing the copolymer with a specific catalyst and a molded article made from the copolymer. The copolymer and molded article thereof are transparent, and excellent in flexibility and heat resistance.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: September 17, 2002
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Oi, Yasuro Suzuki, Tatsuya Miyatake
  • Patent number: 6451937
    Abstract: A process for the catalytic coupling of aliphatic or alkyl branched alicyclic hydrocarbons with a functionalizing reagent under thermal conditions to selectively functionalize the hydrocarbon at its primary C—H site.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: September 17, 2002
    Assignees: Shell Oil Company, Yale University
    Inventors: John F. Hartwig, Thomas Carl Semple, Huiyuan Chen
  • Publication number: 20020128408
    Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
    Type: Application
    Filed: May 8, 2001
    Publication date: September 12, 2002
    Inventors: Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas Wallow
  • Publication number: 20020123581
    Abstract: The present invention relates to a process for the preparation of rubber-like ethylene/&agr;-olefin copolymers and ethylene/&agr;-olefin/non-conjugate diene terpolymers using a metallocene as catalyst, which process is characterized in that the metallocene used is a compound of the general formula (I) 1
    Type: Application
    Filed: July 13, 2001
    Publication date: September 5, 2002
    Inventors: Peter Schertl, Wolfgang Nentwig, Rudiger Engehausen, Walter Kaminsky, Ulrich Weingarten
  • Publication number: 20020115809
    Abstract: An extruded product comprising an ethylene-&agr;-olefin-nonconjugated diene copolymer rubber in which a weight ratio of ethylene unit content and &agr;-olefin unit content is 64/36-58/42, and a content of the nonconjugated diene unit is 12-16% by weight (the total weight of the ethylene unit, the &agr;-olefin unit and the non-conjugated diene unit being 100% by weight), and a Mooney viscosity (ML1+4 100° C.) is 85-100. This extruded article is excellent in compressive permanent strain and elongation, causes no blooming and can be filled with carbon black, plasicizers and the like at high rates.
    Type: Application
    Filed: December 12, 2001
    Publication date: August 22, 2002
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takeru Wadaki, Takaaki Sakai, Tomoaki Okita
  • Publication number: 20020111446
    Abstract: A polymerization system for ring opening polymerization of cycloolefins, comprising a catalyst [MOX2L2], a Lewis acid as co-catalyst, and a chain-transfer agent, 1
    Type: Application
    Filed: December 7, 2000
    Publication date: August 15, 2002
    Inventors: Shakti L. Mukerjee, Vernon L. Kyllingstad
  • Publication number: 20020099155
    Abstract: A process for producing a polar olefin copolymer comprises copolymerizing a non-polar olefin and a polar olefin in the presence of a transition metal compound selected from Groups 4, 5, 6 and 11 of the periodic table, which is represented by the following formula (IV): 1
    Type: Application
    Filed: July 3, 2001
    Publication date: July 25, 2002
    Inventors: Yoshihisa Inoue, Shigekazu Matsui, Yasuhiko Suzuki, Yasunori Yoshida, Yukihiro Takagi, Terunori Fujita, Tomoaki Matsugi, Takashi Nakano
  • Publication number: 20020091216
    Abstract: The present invention relates to novel monomers which can be used to form polymers which are useful in a photolithography employing a light source in the far ultraviolet region of the light spectrum, copolymers thereof, and photoresist compositions prepared therefrom.
    Type: Application
    Filed: February 19, 2002
    Publication date: July 11, 2002
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Cha Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Patent number: 6410670
    Abstract: The present invention relates to novel monomers and their polymers, which are useful in a photolithography employing a light source in the far ultraviolet region of the light spectrum, copolymers thereof, and photoresist compositions prepared therefrom. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, R is substituted or non-substituted linear or branched (C1-C10)alkyl, substituted or non-substituted (C1-C10)ether, substituted or non-substituted (C1-C10)ester, or substituted or non-substituted (C1-C10)ketone; X and Y are independently CH2, CH2CH2, oxygen or sulfur; and i is 0 or an integer of 1 to 2.
    Type: Grant
    Filed: August 26, 1999
    Date of Patent: June 25, 2002
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Cha Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Publication number: 20020077434
    Abstract: Polymeric compositions of matter are described comprising olefin polymer chains having Mn of about 400 to 75,000, a ratio of vinyl groups to total olefin groups according to the formula 1 vinyl ⁢   ⁢ groups olefin ⁢   ⁢ groups ≥ [ comonomer ⁢   ⁢ mole ⁢   ⁢ percentage + 0.
    Type: Application
    Filed: November 6, 2001
    Publication date: June 20, 2002
    Inventor: Eric J. Markel
  • Patent number: 6403281
    Abstract: The present invention provides a cross-linker monomer of formula 1, a photoresist polymer derived from a monomer comprising the same, and a photoresist composition comprising the photoresist polymer. The cross-linking unit of the photoresist polymer can be hydrolyzed (or degraded or broken) by an acid generated from a photoacid generator on the exposed region. It is believed that this acid degradation of the cross-linking unit increases the contrast ratio between the exposed region and the unexposed region. The photoresist composition of the present invention has improved pattern profile, enhanced adhesiveness, excellent resolution, sensitivity, durability and reproducibility. where A, B, R1, R2, R3, R4, R5, R6 and k are as defined herein.
    Type: Grant
    Filed: August 22, 2000
    Date of Patent: June 11, 2002
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Ho Baik
  • Publication number: 20020058765
    Abstract: The present invention relates to a metal-free cyclopentadienide compound which, in conjunction with a metallocene, is able to form a catalyst system that can be used for the polymerization of olefins. It is thus possible to dispense with the use of methylaluminoxane (MAO) or boron-containing compounds as co-catalyst and nevertheless achieve a high degree of catalytic activity. The invention relates also to a process for the preparation of the metal-free cyclopentadienide compound and to the use thereof as a catalyst component in the preparation of polyolefins.
    Type: Application
    Filed: August 3, 2001
    Publication date: May 16, 2002
    Inventors: Sigurd Becke, Uwe Denninger, Steffen Kahlert, Werner Obrecht, Claudia Schmid, Heike Windisch
  • Publication number: 20020058767
    Abstract: A method for producing an olefin type copolymer having a cyclic structure, which comprises copolymerizing ethylene (M1) and dicyclopentadiene or tricyclopentadiene (M2), and, as optionally introduced, a cyclic olefin (M3), wherein, as a catalyst, a catalyst comprising a metallocene compound (A) of the following formula [1]:
    Type: Application
    Filed: November 5, 2001
    Publication date: May 16, 2002
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Shigeharu Yamamoto, Sakae Kamiyama, Toshifumi Takemori, Yoji Suzuki, Kazuhiko Mizuno, Yoko Furuyama, Hiroshi Yamazaki
  • Publication number: 20020058769
    Abstract: The present invention is directed to copolymers of norbornene and functional group containing norbornene comonomers and processes for the preparation thereof. These polymers may be random, alternating or block copolymers or terpolymers, etc.
    Type: Application
    Filed: November 2, 2001
    Publication date: May 16, 2002
    Inventors: Christopher Moore Killian, Peter Borden Mackenzie, John Anthony Hyatt, Leslie Shane Moody, Gino Georges Lavoie
  • Patent number: 6388032
    Abstract: A cyclic olefin polymer having a small content of a catalyst residue, a production process for the same and use of the same as an optical material. Catalysts used for polymerization and/or hydrogenation reaction for forming the cyclic olefin polymer are decomposed efficiently by adding at least one compound selected from the group consisting of an &agr;-oxyacid and &bgr;-oxyacid having one hydroxyl group and one carboxyl group in the molecule and derivatives obtained by substituting hydroxyl group thereof by an alkoxyl group, and the decomposition products are removed by rendering them insoluble in a reaction solvent used for the polymerization and/or hydrogenation reaction and precipitating them efficiently.
    Type: Grant
    Filed: April 14, 2000
    Date of Patent: May 14, 2002
    Assignee: Teijin Limited
    Inventors: Michio Yamaura, Kiyonari Hashidzume, Hideaki Nitta, Masaki Takeuchi, Kaoru Iwata
  • Patent number: 6387592
    Abstract: A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: wherein R1 indicates a hydrogen atom or an alkyl group; R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; R4 indicates a hydrogen atom or an alkyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: May 14, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Takahiro Matsuo, Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka
  • Patent number: 6384162
    Abstract: A process for production of an ethylene-propylene-diene-methylene (EPDM) tetrapolymer having long chain branching is described. The process comprises the step of polymerizing a monomer mixture comprising ethylene, propylene, a first diolefin monomer containing one polymerizable double bond (preferably ENB) and a second diolefin containing two polymerizable double bonds (preferably VNB) in the presence of a catalyst system. The catalyst system comprises: a catalyst comprising a compound containing vanadium +3 with the proviso that the compound does not comprise a halogen directly bound to the vanadium; a halogenated organoaluminum cocatalyst having a halogen to aluminum molar ratio in the range of from about 1 to about 2; and an activator. The branched polymer product of the present process exhibits a molecular weight distribution of less than about 3.5 and improved rheological properties and enhanced processability characteristics.
    Type: Grant
    Filed: December 15, 2000
    Date of Patent: May 7, 2002
    Assignee: Bayer Aktiengesellschaft
    Inventors: Hayder A. Zahalka, Dilipkumar Padliya, Harald Bender