Contains An Exterior Ethylenic Substituent Bonded To A Single Carbon Atom Of The Bridged Ring System Patents (Class 526/282)
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Publication number: 20020052454Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula:Type: ApplicationFiled: October 5, 1999Publication date: May 2, 2002Inventors: JOHN-HENRY LIPIAN, LARRY F. RHODES, BRIAN L. GOODALL, ANDREW BELL, RICHARD A. MIMNA, JOHN C. FONDRAN, SAIKUMAR JAYARAMAN, APRIL D. HENNIS, CHRISTINE N. ELIA, JENNIFER D. POLLEY, AYUSMAN SEN
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Publication number: 20020049292Abstract: The invention is directed to essentially saturated hydrocarbon polymer composition comprising essentially saturated hydrocarbon polymers having A) a backbone chain; B) a plurality of essentially hydrocarbyl sidechains connected to A), said sidechains each having a number-average molecular weight of from 2500 Daltons to 125,000 Daltons and a MWD by SEC of 1.0-3.5; and having A) a Newtonian limiting viscosity (&eegr;0) at 190° C. at least 50% greater than that of a linear olefinic polymer of the same chemical composition and weight average molecular weight, preferably at least twice as great as that of said linear polymer, B) a ratio of the rubbery plateau modulus at 190° C. to that of a linear polymer of the same chemical composition less than 0.5, preferably <0.3, C) a ratio of the Newtonian limiting viscosity (&eegr;0) to the absolute value of the complex viscosity in oscillatory shear (&eegr;*)at 100 rad/sec at 190° C.Type: ApplicationFiled: August 23, 2001Publication date: April 25, 2002Inventors: Cesar A. Garcia-Franco, David J. Lohse, Robert A. Mendelson, Lewis J. Fetters, Scott T. Milner, Nikos Hadjichristidis, David W. Mead
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Patent number: 6372935Abstract: The present invention relates to a copolymer resin for ultra-shortwave light source such as KrF or ArF, process for preparation thereof, and photoresist comprising the same resin. The copolymer resin according to the present invention is easily prepared by conventional radical polymerization due to the introduction of norbornyl(meth)acrylate unit to a structure of copolymer for photoresist. The resin has high transparency at 193 nm wavelength, provides increased etching resistance and enhanced adhesive strength due to a hydrophilic functional group in the norbornyl group, and shows excellent resolution of 0.15 Fm in practical experiment of patterning.Type: GrantFiled: May 18, 2001Date of Patent: April 16, 2002Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Publication number: 20020042488Abstract: Novel substantially random functionalized interpolymers and processes for making them are disclosed. The novel interpolymers include those prepared from ethylene and vinyl aromatic monomers such as ethylene-styrene interpolymers which are then functionalized with a variety of electrophilic and nucleophilic reagents.Type: ApplicationFiled: January 10, 2001Publication date: April 11, 2002Inventors: Ray E. Drumright, Robert H. Terbrueggen, Kenneth A. Burdett, Francis J. Timmers, Stephen F. Hahn
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Patent number: 6368770Abstract: The present invention provides a novel photoresist monomer, photoresist copolymer derived from the same, and the photoresist composition comprising the same. In particular, the present invention provides a photoresist monomer of the formula: wherein, A, A′, X, m and n are those defined herein. The photoresist composition of the present invention has an excellent etching and heat resistance, and enhances the resolution and profile of the photoresist film.Type: GrantFiled: July 21, 2000Date of Patent: April 9, 2002Assignee: Hyundai Electronics Industries Co. Ltd.Inventors: Min Ho Jung, Jae Chang Jung, Geun Su Lee, Ki Ho Baik
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Patent number: 6369143Abstract: A radiation-sensitive polymer and a chemical amplification resist composition based on the polymer, which can be easily controlled in sensitivity by regulating the content and kind of the carboxylic acid-grafted norbornene derivatives in the matrix polymer and is superior in adherence to substrate and dry etch resistance, so that it can be formed into resist patterns improved in transparency, photosensitivity and resolution by use of KrF or ArF excimer lasers. The polymer is represented by the formula I: wherein, X is an acid-dissociable grafted norbornene derivative selected from the group consisting of the formulas II and III; Y is a carboxylic acid-grafted norbornene derivative represented by the formula IV, and l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=l and 0.4≦o≦0.Type: GrantFiled: June 21, 1999Date of Patent: April 9, 2002Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Joo-Hyeon Park, Seong-Ju Kim, Dong-Chul Seo, Sun-Yi Park
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Publication number: 20020040109Abstract: The present invention provides a method to improve the efficiency of ROMP-hydrogenation and ROMP-hydrogenolysis processes. Thus the invention provides a means for increasing the rate of reaction of the hydrogenation step of the ROMP-hydrogenation process via the addition of non-inert solvent such as methanol. The present invention permits multiple cycles of ROMP-hydrogenation-ROMP and ROMP-hydrogenolysis-ROMP without additional catalyst, thus allowing the formation of tailored polymer blends in a ‘one-pot’ reaction. Moreover, the ROMP-hydrogenation reactions of the present invention may be carried out at pressures as low as atmospheric pressure.Type: ApplicationFiled: March 26, 2001Publication date: April 4, 2002Inventors: Deryn Elizabeth Fogg, Samantha Dawn Drouin, Fojan Zamanian
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Publication number: 20020037988Abstract: Novel substantially random functionalized interpolymers and processes for making them are disclosed. The novel interpolymers include those prepared from ethylene and vinyl aromatic monomers such as ethylene-styrene interpolymers which are then functionalized with a variety of electrophilic and nucleophilic reagents.Type: ApplicationFiled: October 10, 2001Publication date: March 28, 2002Inventors: Ray E. Drumright, Robert H. Terbrueggen, Kenneth A. Burdett, Francis J. Timmers, Stephen F. Hahn
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Publication number: 20020037982Abstract: Polymers are produced using transition metal complexes that have sites capable of binding a Lewis acid in close proximity to the metal center.Type: ApplicationFiled: May 31, 2001Publication date: March 28, 2002Inventors: Lynda Kaye Johnson, Alison Margaret Anne Bennett, Kerwin D. Dobbs, Alex Sergey Ionkin, Steven Dale Ittel, Ying Wang, Catherine E. Radzewich, Lin Wang, Elisabeth Hauptman
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Patent number: 6359095Abstract: A process for the preparation of an olefin polymer by polymerization or copolymerization of an olefin of the formula Ra—CH═CH—Rb, in which Ra and Rb are identical or different and are a hydrogen atom or a hydrocarbon radical having 1 to 14 carbon atoms, or Ra and Rb, together with the atoms connecting them, can form a ring, at a temperature of from −60 to 200° C., at a pressure of from 0.Type: GrantFiled: October 28, 1999Date of Patent: March 19, 2002Assignee: Basell Polyolefine GmbHInventors: Andreas Winter, Martin Antberg, Bernd Bachmann, Volker Dolle, Frank Küber, Jürgen Rohrmann, Walter Spaleck
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Publication number: 20020028896Abstract: The invention is directed to essentially saturated hydrocarbon polymer composition comprising essentially saturated hydrocarbon polymers having A) a backbone chain; B) a plurality of essentially hydrocarbyl sidechains connected to A), said sidechains each having a number-average molecular weight of from 2500 Daltons to 125,000 Daltons and a MWD by SEC of 1.0-3.5; and having A) a Newtonian kimiting viscosity (&eegr;0) at 190° C. at least 50% greater than that of a linear olefinic polymer of the same chemical composition and weight average molecular weight, preferably at least twice as great as that of said linear polymer, B) a ratio of the rubbery plateau modulus at 190° C. to that of a linear polymer of the same chemical composition less than 0.5, preferably <0.3, C) a ratio of the Newtonian limiting viscosity (&eegr;0) to the absolute value of the complex viscosity in oscillatory shear (&eegr;*)at 100 rad/sec at 190° C.Type: ApplicationFiled: August 30, 2001Publication date: March 7, 2002Inventors: Cesar A. Garcia-Franco, David J. Lohse, Robert A. Mendelson, Lewis J. Fetters, Scott T. Milner, Nikos Hadjichristidis, David W. Mead
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Patent number: 6350837Abstract: The present invention is directed to copolymers of norbornene and functional group containing norbornene comonomers and processes for the preparation thereof. These polymers may be random, alternating or block copolymers or terpolymers, etc. In general, the present invention describes a polymer composition of the formula: [A]S— and —[B]T wherein A is monomer repeat unit derived from one or more norbornene or substituted norbornene monomers and B is a monomer repeat unit derived from one or more functionalized norbornene compounds.Type: GrantFiled: June 9, 2000Date of Patent: February 26, 2002Assignee: Eastman Chemical CompanyInventors: Christopher Moore Killian, Peter Borden Mackenzie, John Anthony Hyatt, Leslie Shane Moody, Gino Georges Lavoie
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Patent number: 6350832Abstract: A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonapthalene, 5,5′-(1,2-ethanediyl)bisbicyclo[2.2.1]hept-2-ene, and 1,4,4a,4b,5,8,8a,8b-octahydro-1,4:5,8-dimethanobiphenylene are disclosed. The catalyst includes an organonickel or organopalladium transition metal procatalyst and an activator compound. Polymerization can be carried out in a reaction injection molding process to yield thermoplastic and thermoset molded polymeric articles possessing high glass transition temperatures.Type: GrantFiled: December 8, 1999Date of Patent: February 26, 2002Assignee: The B. F. Goodrich CompanyInventors: Andrew Bell, Larry F. Rhodes, Brian L. Goodall, John C. Fondran
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Patent number: 6346581Abstract: A curable resin composition comprising a modified cycloolefin addition polymer (A) obtained by introducing a functional group into a cycloolefin addition polymer containing a repeating unit (a) derived from a cycloolefin monomer having an organic group having at least 4 carbon atoms at its side chain at a rate of introduction of the functional group of 0.1 to 50 mol % based on the whole repeating unit of the cycloolefin addition polymer, and a hardening agent (B), and a modified cycloolefin addition polymer (A) obtained by introducing a functional group into a cycloolefin addition polymer containing a repeating unit (a) derived from a cycloolefin monomer having an organic group having at least 4 carbon atoms at its side chain at a rate of introduction of the functional group of 0.1 to 50 mol % based on the whole repeating unit of the cycloolefin addition polymer, and having a weight average molecular weight (Mw) of 1,000 to 1,000,000.Type: GrantFiled: January 18, 2000Date of Patent: February 12, 2002Assignee: Nippon Zeon Co., LtdInventors: Yasuo Tsunogae, Masahiro Ichinose, Yasuhiro Wakizaka
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Patent number: 6342621Abstract: Penta-coordinated ruthenium catalysts for the metathesis reactions of olefins, in particular ring opening metathesis polymerization (ROMP) of cyclo-olefin monomers, which are cationic complexes represented by formula I, II or III: wherein each of X1 and X2, which may be the same or different, is an optionally substituted C3-C20 hydrocarbon group having an allyl moiety as an end group bonded to the ruthenium atom, or X1 and X2 together form a group, optionally substituted, which results from dimerization of an alkene and has at each end an allyl group bonded to the ruthenium atom; L1 and L2 are mono-dentate neutral electron donor ligands, preferably highly sterically encumbered neutral electron donor ligands such as alkyl phosphines or amines; L{circumflex over ( )}L is a bidentate neutral electron donor ligand, preferably phosphine, amino, imino, arsine or arphos; L3 is a solvent molecule or a neutral mono-dentate electron donor ligand; L{circumflex over ( )}L{circumflex over ( )}L is a tridType: GrantFiled: January 27, 2000Date of Patent: January 29, 2002Assignee: Nippon Zeon Co., Ltd.Inventors: Shakti L. Mukerjee, Vernon L. Kyllingstad
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Publication number: 20020007030Abstract: This invention relates to olefin polymerization processes suitable for limiting or eliminating aromatic solvents or diluents. The invention processes can be conducted by contacting polymerizable olefin monomers with catalyst complexes of Group 3-11 metal cations and noncoordinating or weakly coordinating anions bound directly to the surfaces of finely divided substrate particles or to polymer chains capable of effective suspension or solvation in polymerization solvents or diluents under polymerization conditions. These processes minimize problems associated with using largely insoluble organometallic or organometalloid catalysts and cocatalysts in aliphatic, solution, or diluent polymerization processes.Type: ApplicationFiled: December 20, 2000Publication date: January 17, 2002Inventor: Patrick Brant
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Publication number: 20020004567Abstract: This invention relates to olefin polymers particularly suited to satisfying the dielectric properties required in electrical device use. The olefin polymers can be prepared by contacting polymerizable olefin monomers with catalyst complexes of Group 3-11 metal cations and noncoordinating or weakly coordinating anion compounds bound directly to the surfaces of finely divided substrate particles or to polymer chains capable of effective suspension or solvation in polymerization solvents or diluents under solution polymerization conditions. Thus, the invention includes polyolefin products prepared by the invention processes, particularly ethylene-containing copolymers, having insignificant levels of mobile, negatively charged particles as detectable by Time of Flight SIMS.Type: ApplicationFiled: December 20, 2000Publication date: January 10, 2002Inventor: Patrick Brant
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Patent number: 6337364Abstract: Disclosed is a low modulus of elasticity-rubber composition, which is useful for sealing a telecommunication cable closure even in low temperature range, utilizing an ethylene-propylene-diene rubber. Said low modulus of elasticity-rubber composition comprising (1) an ethylene-propylene-diene rubber [Mooney viscosity (100° C.): 90 to 130° C., diene: ethylidenenorbornene, iodine value: not more than 20, ethylene content: not more than 55% based on the total amount of ethylene and propylene] and (2) a softener [pour point: not more than −40° C.Type: GrantFiled: February 9, 2000Date of Patent: January 8, 2002Assignee: Sumitomo Rubber Industries, Ltd.Inventors: Toshiaki Sakaki, Tetsuo Mizoguchi
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Publication number: 20020002255Abstract: Ethylene copolymers with octene and/or ethylene terpolymers with alpha-olefins from 3 to 12 carbon atoms, optionally in the presence of other comonomers containing more than one unsaturation, usable as additives to increase the gas oil properties at low temperatures, obtainable by polymerization of the monomers in the presence of catalysts comprising: a bis-cyclopentadienyl derivative having the general formula:Type: ApplicationFiled: June 22, 2001Publication date: January 3, 2002Applicant: SOCIETA' ITALIANA ADDITIVI PERCARBURANTI S.R.L.Inventor: Paolo Falchi
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Publication number: 20010053834Abstract: The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (—OH).Type: ApplicationFiled: August 21, 2001Publication date: December 20, 2001Inventors: Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Patent number: 6331600Abstract: Novel copolymers of ethylene with propylene and optionally with minor proportions of a diene or polyene having good elastomeric properties in their uncured state. The copolymers are characterized by a structure in which the propylene is partially present in the form of short isotactic sequences. Tension set values (200%) of less than 15 are obtained by when the ethylene/propylene ratio has specific values and the intrinsic viscosity values are higher than 3.Type: GrantFiled: April 22, 1997Date of Patent: December 18, 2001Assignee: Basell Technology Company bvInventors: Maurizio Galimberti, Enrico Albizzati
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Patent number: 6331602Abstract: This invention relates to a monomer shown by the general formula [1] (wherein X′ is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer. The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.Type: GrantFiled: September 6, 2000Date of Patent: December 18, 2001Assignee: Wako Pure Chemical Industries, Ltd.Inventor: Motoshige Sumino
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Patent number: 6319998Abstract: This invention relates to a method of making polymer blends using series reactors and a metallocene catalyst. Monomers used by the invention are ethylene, a higher alpha-olefin (propylene most preferred), and optionally, a non-conjugated diene (ethylidene norbornene, i.e., ENB, most preferred). More specifically, this invention relates to making blends of EP (ethylene-propylene) copolymers in which the blend components differ in any of the following characteristics: 1) composition 2) molecular weight, and 3) crystallinity. We use the terminology EP copolymer to also include terpolymers that contain varying amounts of non-conjugated diene. Such terpolymers are commonly known as EPDM.Type: GrantFiled: March 1, 1999Date of Patent: November 20, 2001Assignee: Exxon Mobil Chemical Patents Inc.Inventors: Charles C. Cozewith, Sudhin Datta, Bruce A. Harrington, Bernard J. Folie, John F. Walzer, Jr., Donna J. Crowther
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Publication number: 20010041779Abstract: The present invention relates to a process for manufacturing polyethylene with a functional end group in the presence of metallocene catalyst and more particularly, to the process for manufacturing polyethylene with a functional end group in such a manner that a highly reactive functional group of alkyl-aluminum is easily introduced to the end of polymer via a selective chain transfer reaction in the presence of (1) metallocene catalyst represented by the following formula 1 and (2) a cocatalyst containing alkyl-aluminum compound as active ingredient.Type: ApplicationFiled: June 28, 1999Publication date: November 15, 2001Inventors: DONG GEUN SHIN, DOO JIN BYUN, SANG YOUL KIM
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Patent number: 6316560Abstract: The invention relates to a method for producing a cycloolefin copolymer by polymerization of 0.1-99.0 wt %, with respect to the total amount of monomers, of at least one polycyclic, 0-99.9 wt. %, with respect to the total amount of monomers, of at least one moncyclic olefin, and 0.1-99.9 wt. %, with respect to the total amount of monomers, of at least one acyclic 1-olefin, in the presence of a catalyst system consisting of at least one cocatalyst and at least one metallocene.Type: GrantFiled: July 29, 1999Date of Patent: November 13, 2001Assignee: Ticona GmbHInventors: Alexandra Jacobs, Gerhard Fink, Dieter Ruchatz
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Publication number: 20010038968Abstract: A photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units, a resist composition containing the photosensitive polymer and a preparation method thereof, wherein the photosensitive polymer is represented by the following formula: 1Type: ApplicationFiled: December 8, 2000Publication date: November 8, 2001Applicant: Samsung Electronics Co., Ltd.Inventors: Hyun-woo Kim, Si-hyueng Lee, Ki-young Kwon, Dong-won Jung, Sang-jun Choi, Sang-gyun Woo
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Patent number: 6313252Abstract: Novel substantially random functionalized interpolymers and processes for making them are disclosed. The novel interpolymers include those prepared from ethylene and vinyl aromatic monomers such as ethylene-styrene interpolymers which are then functionalized with a variety of electrophilic and nucleophilic reagents.Type: GrantFiled: February 4, 1999Date of Patent: November 6, 2001Assignee: The Dow Chemical CompanyInventors: Ray E. Drumright, Robert H. Terbrueggen, Kenneth A. Burdett, Francis J. Timmers, Stephen F. Hahn
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Patent number: 6313250Abstract: The invention relates to polyfunctionally reactive polymeric substances which contain at least two structural units of the general formulae (I) and/or (II) in the molecule and whose polymer backbone linkages are C—C bonds, ether bonds, urethane bonds, amide bonds, ketone bonds or combinations thereof. The substances are useful as binders for various applications.Type: GrantFiled: April 6, 1999Date of Patent: November 6, 2001Assignee: BASF AktiengesellshaftInventors: Rainer Blum, Lukas Haeussling, Wolfgang Reich
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Publication number: 20010036599Abstract: A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: 1Type: ApplicationFiled: April 16, 2001Publication date: November 1, 2001Applicant: Matsushita Electric Industrial Co., Ltd.Inventors: Takahiro Matsuo, Masayuki Endo, Masamitsu Shiri, Masahiro Tsunooka
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Patent number: 6306556Abstract: A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: wherein R1 indicates a hydrogen atom or an alkyl group; R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; R4 indicates a hydrogen atom or an alkyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.Type: GrantFiled: April 18, 2000Date of Patent: October 23, 2001Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Takahiro Matsuo, Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka
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Publication number: 20010029288Abstract: Disclosed herein are an olefin copolymer having a functional group, which comprises a structural unit (a) derived from ethylene, a structural unit (b) derived from an &agr;-olefin having 3 to 12 carbon atoms, and a structural unit (c) represented by the following general formula (1), and has an intrinsic viscosity |&eegr;| of 0.1 to 10 dl/g as measured in decalin at 135° C.Type: ApplicationFiled: December 18, 2000Publication date: October 11, 2001Applicant: JSR CorporationInventors: Noboru Oshima, Youichirou Maruyama, Katsutoshi Sawada, Syouei Tsuji
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Patent number: 6300451Abstract: Copolymers, and processes to make them, are provided which are derived from monomers comprising: a) one mono-olefin having a single Ziegler-Natta polymerizable bond; b) a second monomer having at least one Ziegler-Natta polymerizable bond; c) a third monomer having at least two Ziegler-Natta polymerizable bonds such monomer being: i) straight-chained and of less than six or at least seven carbon atoms; ii) other than straight chained; or iii) combinations thereof, such copolymer having: c) at least about one carbon-carbon unsaturated bond per number average molecule; d) viscous energy of activation (Ea) at least 1 kcal/mol greater than a copolymer having a linear backbone derived from same monomers, but excluding species having at least two Ziegler-Natta polymerizable bonds; e) crystallinity level of about 10% to about 50%; and f) Mz/Mw at least about 1.7. Such copolymers show enhanced melt processability and other attributes during end-product fabrication.Type: GrantFiled: October 24, 1994Date of Patent: October 9, 2001Assignee: Exxon Chemical Patents Inc.Inventors: Aspy Keki Mehta, Charles Stan Speed, Jo Ann Marie Canich, Norbert Baron, Bernard Jean Folie, Makoto Sugawara, Akihira Watanabe, Howard Curtis Welborn, Jr.
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Patent number: 6294616Abstract: Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.Type: GrantFiled: May 25, 1995Date of Patent: September 25, 2001Assignee: B. F. Goodrich CompanyInventors: Larry F. Rhodes, Brian L. Goodall, Rolf Mülhaupt, Robert A. Shick, George M. Benedikt, Sai Kumar Jayaraman, Lynn M. Soby, Lester H. McIntosh, III
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Patent number: 6291129Abstract: A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3 (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.Type: GrantFiled: August 28, 1998Date of Patent: September 18, 2001Assignee: Kabushiki Kaisha ToshibaInventors: Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Shuji Hayase, Yoshihiko Nakano, Makoto Nakase
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Patent number: 6287747Abstract: A photosensitive polymer represented by the following formula, and a resist composition including (a) a photosensitive polymer represented by the following formula: where R1 is a C7 to C20 alicyclic aliphatic hydrocarbon, R2 and R4 independently represent C1 to C7 alicyclic aliphatic hydrocarbon, R3 and R5 independently represent hydrogen or methyl group, R6 is hydrogen or 2-hydroxyethyl group, p/(p+q+r+s) is from 0.1 to about 0.5, q/(p+q+r+s) is from 0.1 to about 0.5, r/(p+q+r+s) is from 0.0 to about 0.5, and s/(p+q+r+s) is from 0.01 to about 0.5, and (b) a photoacid generator (PAG), are disclosed.Type: GrantFiled: December 17, 1999Date of Patent: September 11, 2001Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Dong-won Jung, Si-hyeung Lee
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Patent number: 6281316Abstract: A polymer of the invention comprising the comonomers ethylene, one or more alpha-olefins having 3 to 20 carbon atoms, and one or more cyclic dienes having up to 30 carbon atoms, said polymer having a density of at least 0.890 gram per cubic centimeter; long chain branching; a plurality of double bonds; an Mw/Mn ratio ratio (PDI) of at least 2.5; a flow activation energy of greater than about 6.5 kcal/mol; and a Relaxation Spectrum Index (RSI), PDI, and Melt Index (MI), such that RSI·MIa>2.7 and RSI·MIa·PDIb is in the range of about 0.8 to about 60, when a and b are about 0.6 and minus 1.2, respectively.Type: GrantFiled: March 22, 1999Date of Patent: August 28, 2001Assignee: Union Carbide Chemicals & Plastics Technology CorporationInventors: Scott Hanley Wasserman, James LaMonte Adams, Tong Chen, George Norris Foster, Laurence Herbert Gross, Day-Chyuan Lee, Walter Thomas Reichle, Robert Harold Vogel
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Patent number: 6271412Abstract: This invention provides a compound of the formula (I): wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. The compound of formula (I) can be polymerized or copolymerized to form a photosensitive polymer or copolymer.Type: GrantFiled: June 30, 2000Date of Patent: August 7, 2001Assignee: Everlight USA, Inc.Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin
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Patent number: 6262211Abstract: Describes a polymerizable organic composition comprising a polyol(allyl carbonate), e.g., diethylene glycol bis(allyl carbonate), and from 0.1 percent to 10 percent by weight, based on the total weight of the composition, of an allyl ester terminated nonaromatic polyester, e.g., diallyl 4-methyl-1,2-cyclohexanedicarboxylate oligomer with 1,4-butane diol. Polymerizates prepared from polymerizable organic compositions of the present invention have a refractive index of less than 1.53, e.g., from 1.49 to 1.50, and are substantially free of defects due to tinting failure.Type: GrantFiled: June 19, 2000Date of Patent: July 17, 2001Assignee: PPG Industries Ohio, Inc.Inventors: Charles C. Clontz, Noriyuki Someki, Robert A. Smith, Michael O. Okoroafor
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Patent number: 6262194Abstract: The invention relates to the production of homopolymers, co-copolymers or block copolymers from cycloolefinic monomer units characterized in that polymerization occurs in the presence of a catalyst of general formula (I), and optionally in the presence of an additive, wherein the substituents and indices have the following meaning: M is a metal from group VIII B of the periodic table of elements; E1, E2 are independently from each other an element from group V A of the periodic table of elements; Z is a bridging structural unit; Ar stands for annelated aryl units independent of each other; L1, L2 stands for formally uncharged Lewis base ligands; X means monovalent or bivalent anions; k means 1 or 2; l, m, n represent 1 or 2, whereby m×n=1.Type: GrantFiled: October 6, 1999Date of Patent: July 17, 2001Assignee: BASF AktiengesellschaftInventors: Michael Geprägs, Joachim Queisser, Bernhard Rieger, Adnan S. Abu-Surrah
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Publication number: 20010006988Abstract: A process for the preparation of polymers containing double bonds by ruthenium carbene catalysis is carried out, where a ring-opening polymerization of monomers of the Formula (I) occurs 1Type: ApplicationFiled: December 22, 2000Publication date: July 5, 2001Applicant: CREAVIS Gesellschaft fuer Technologie und Innovation mbHInventors: Adolf Kuhnle, Mark Duda
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Patent number: 6254956Abstract: A floor, wall or ceiling covering which comprises one or more substantially random interpolymers prepared by polymerizing one or more &agr;-olefin monomers with one or more vinylidene aromatic monomers and/or one or more hindered aliphatic or cycloaliphatic vinylidene monomers, and optionally with other polymerizable ethylenically unsaturated monomer(s). The floor, wall or ceiling covering has a good balance of properties, such as sufficient flexibility and conformability to uneven or contoured surfaces for efficient application to floors, walls, or ceilings, sufficient scratch resistance, sufficient indentation resistance, indentation recovery and/or sufficient abrasion resistance.Type: GrantFiled: March 2, 1999Date of Patent: July 3, 2001Assignee: The Dow Chemical CompanyInventors: Jerker B. I. Kjellqvist, Stephen R. Betso, Ronald Wevers, Johan A. Thoen, John O. Bieser
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Patent number: 6248847Abstract: The present invention relates to a copolymer resin for ultra-shortwave light source such as KrF or ArF, process for preparation thereof, and photoresist comprising the same resin. The copolymer resin according to the present invention is easily prepared by conventional radical polymerization due to the introduction of norbonyl(meth)acrylate unit to a structure of copolymer for photoresist. The resin has high transparency at 193 nm wavelength, provides increased etching resistance and enhanced adhesive strength due to a hydrophilic functional group in the norbonyl group, and shows excellent resolution of 0.15 &mgr;m in practical experiment of patterning.Type: GrantFiled: December 10, 1998Date of Patent: June 19, 2001Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Patent number: 6187882Abstract: The invention relates to a process for the polymerization of olefins, which comprises polymerizing an olefin or mixture thereof in presence of a solvent, a supported metallocene and an aluminoxane as cocatalyst in a hydrocarbon medium, at a temperature in the range of 50 to 150° C., at a pressure ranging between 1 to 20 bar, for a period of 10 minutes to 10 hours, scavenging the reaction mixture by addition of an organoaluminum compound to remove the last traces of impurities of solvent, separating the polymer by conventional methods like precipitating, filtering, washing the polymer with an organic solvent, drying the polymer to remove the solvent to obtain the product.Type: GrantFiled: May 14, 1997Date of Patent: February 13, 2001Assignee: Council of Scientific & Industrial ResearchInventors: Soumen Sensarma, Swaminathan Sivaram
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Patent number: 6160068Abstract: This invention relates to a monomer shown by the general formula [1] ##STR1## (wherein X' is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer.The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.Type: GrantFiled: November 18, 1998Date of Patent: December 12, 2000Assignee: Wako Pure Chemical Industries, Ltd.Inventor: Motoshige Sumino
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Patent number: 6153663Abstract: A cross-linkage polymeric casting composition including an effective amount of a divinyl ester monomer of a bicyclic or polycyclic compound, and optionally, a minor amount of a di- or polythio compound. The specification and claims include allylic ethers withing the definition of divinyl ester, for example bisphenol fluorene diglycidyl allylic ether and bisphenol S diallyl ether.Type: GrantFiled: March 31, 1999Date of Patent: November 28, 2000Assignee: Sola International Holding, Ltd.Inventors: Fang Chen, Huan Kiak Toh
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Patent number: 6077920Abstract: The present invention provides a process and apparatus for feeding powders such as fine, cohesive, or powdery particulate materials from a low pressure system to a high pressure system. In a preferred embodiment a process and apparatus of pressurizing and feeding carbon black fluff to a polymerization reactor is provided particularly a gas phase fluidized polymerization reactor to provide for a close-coupling of a carbon black reactor to a polymerization reactor.Type: GrantFiled: November 12, 1997Date of Patent: June 20, 2000Assignee: Union Carbide Chemicals & Plastics Technology CorporationInventors: Duan-Fan Wang, Robert Lorenz Boysen, Leonard Sebastian Scarola, Gary Harry Williams
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Patent number: 6072014Abstract: A process is provided for preparing polymer compositions which are multimodal in nature. The process involves contacting, under polymerization conditions, a selected addition polymerizable monomer with a metallocene catalyst having two or more distinct and chemically different active sites, and a catalyst activator.Type: GrantFiled: August 11, 1999Date of Patent: June 6, 2000Assignee: SRI InternationalInventor: Robert B. Wilson, Jr.
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Patent number: 6063886Abstract: Disclosed is a cycloolefin copolymer which is obtained from (A) a straight-chain or branched .alpha.-olefin of 2 to 20 carbon atoms, (B) a specific cycloolefin and (C) an aromatic vinyl compound and has an intrinsic viscosity [.eta.] of 0.1 to 10 dl/g, wherein the content of constituent units derived from the cycloolefin (B) and the content of constituent units derived from the aromatic vinyl compound (C) satisfy a specific relation. The cycloolefin copolymer has high heat resistance, low moisture absorption and small birefringence.Type: GrantFiled: April 14, 1998Date of Patent: May 16, 2000Assignees: Mitsui Chemicals, Hoechst AktiengesellschaftInventors: Masayoshi Yamaguchi, Kazuyuki Takimoto
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Patent number: 6060570Abstract: A process for the preparation of an addition product of a linear telechelic difunctional unsaturated polymer containing terminal functional reactive groups other than vinyl groups, involves simultaneously reacting at least one cyclic olefin of from about 4 to 30 carbon atoms, at least one difunctional acyclic olefin of up to about 30 carbon atoms, and at least one reactant YZ in the presence of at least one olefin metathesis catalyst to prepare an addition product of a linear difunctional unsaturated polymer, wherein YZ is capable of adding to a carbon--carbon double bond under ROMP reaction conditions.Type: GrantFiled: August 7, 1997Date of Patent: May 9, 2000Assignee: BP Amoco CorporationInventors: Philip O. Nubel, Howard B. Yokelson, William H. Frye, Tsuei-Yun Lynch, Larry C. Satek, George A. McConaghy
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Patent number: 6054543Abstract: Amorphous and impact resistant co/ter-polymer made from olefins and aryl-substituted cyclic monomers by polymerizing using a catalyst, wherein the substituent is a phenyl- or indanyl-group and the catalyst is a metallocene-catalyst. Preferably said aryl-substituted cyclic monomer is phenyl-norbomene (5-phenyl-bicylo-2,2,1-hept-2-ene) or indanyl-norbomene (1,4-methano-1,4,4a,9a-tetrahydrofluorence).Type: GrantFiled: June 26, 1998Date of Patent: April 25, 2000Assignee: Optatech CorporationInventors: Christer Hans Bergstrom, Jukka Seppala, Juhana Ruotoistenmaki, Tapio Hase, Sari Paavola, Lars-Olof Pietila, Lisbeth Ahjopalo