Processes Patents (Class 556/466)
  • Patent number: 6984747
    Abstract: The invention relates to a method for preparing silanes comprising styryl groups, said silanes being represented by the general formula (I): (St)bSiR?aR4?a?b with improved yields through a reaction with magnesium in a solvent mixture comprising from 30:70 to 70:30 (v/v) of diethyl ether and tetrahydrofuran.
    Type: Grant
    Filed: December 6, 2002
    Date of Patent: January 10, 2006
    Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung e.V.
    Inventors: Stéphane Jacob, Lothar Fröhlich, Konrad Olma, Michael Popall, Frank Kahlenberg
  • Patent number: 6939984
    Abstract: The invention provides a continuous process for preparing alkylchlorosilanes from the residues of direct synthesis of alkylchlorosilanes which comprise liquid constituents with a boiling point of at least 70° C. at 1013 hPa and may also contain solids, with hydrogen chloride, by passing the residues at a temperature not above 200° C. and hydrogen chloride at a temperature higher than the latter into a reactor so that the resultant reaction temperature is from 400° C. to 800° C.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: September 6, 2005
    Assignee: Wacker-Chemie GmbH
    Inventor: Herbert Straussberger
  • Patent number: 6927270
    Abstract: Efficient processes have been developed for the cost effective functionalization of polyhedral oligomeric silsesquioxane-silanols (POSS-Silanols) and for the manufacture of polyfunctional polyhedral oligomeric silsesquioxanes. The processes utilize the action of bases or acids on silane coupling agents. The preferred process utilizes base to promote the silylation of POSS-Silanols of the formula [(RSiO1.5)n(R(HO)SiO1.0)m]?# with silane coupling agents to form POSS species with functionalized incompletely condensed nanostructures [(RSiO1.5)n(R(YSiR2O)SiO1.0)m]?# or functionalized completely condensed nanostructures [(RSiO1.5)n(YSiO1.5)1]?#. The process can alternately be conducted with acids. A second process utilizes base to alkylate POSS-Silanols with functionalized alkyl halides. A third related process utilizes base to react with silane coupling agents to form polyfunctional, fully condensed POSS species of formula [(YSiO1.5)n]?#. This process can also alternately be conducted under acidic conditions.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: August 9, 2005
    Assignee: Hybrid Plastics LLP
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zhong An, Qibo Liu, Timothy S. Haddad
  • Patent number: 6872845
    Abstract: A haloorganoalkoxysilane is prepared by reacting an olefinic halide with an alkoxysilane in which the alkoxy group(s) contain at least two carbon atoms in a reaction medium to which has been added a catalytically effective amount of ruthenium-containing catalyst and a reaction-promoting effective amount of an electron-donating aromatic compound promoter. The process can be used to prepare, inter alia, chloropropyltriethoxysilane, which is a key intermediate in the manufacture of silane coupling agents.
    Type: Grant
    Filed: March 3, 2003
    Date of Patent: March 29, 2005
    Assignee: General Electric Company
    Inventors: Mark D. Westmeyer, Michael R. Powell, Frank D. Mendicino
  • Patent number: 6828404
    Abstract: A process for the preparation of an alkoxysilyl siloxane substituted with at least one epoxy, vinyl ether, 1-propenyl ether, acrylate or methacrylate group comprises selectively reacting a hydrosilane compound with a compound containing a vinyl or allyl group and a epoxy, vinyl ether, 1-propenyl ether, acrylate or methacrylate group, or a compound containing at least one vinyl or allyl group and at least one dialkoxysilyl or trialkoxysilyl group, to form at least one monohydrosiloxane. The monohydrosiloxane is further reacted to form an ambifunctional alkoxysilyl siloxane.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: December 7, 2004
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Publication number: 20040220420
    Abstract: A silane or siloxane containing at least one organic group is prepared by a hydrosilylation reaction between a silane or siloxane (A) containing at least one Si—H group and an allyl compound (B) in the presence of a noble metal catalyst. The silane or siloxane (A) and the allyl compound (B) are fed continuously through a reaction zone which is maintained at a temperature in the range 115-200° C. and which is provided with heat exchanger means to dissipate the heat from the exothermic hydrosilylation reaction. The residence time of (A) and (B) in the reaction zone is less than 20 minutes.
    Type: Application
    Filed: January 20, 2004
    Publication date: November 4, 2004
    Inventors: Stephen Westall, Avril Surgenor, Timothy Bunce
  • Publication number: 20040220421
    Abstract: The present invention relates to a method for removing impurities from elemental silicon-containing residues from the processes of producing organochlorosilane and chlorosilane. The residues are subjected to magnetic seperation to provide a relative pure non-magnetic fraction having an increased silicon content and a relatively impure magnetic fraction having a lower silicon content than the non-magnetic fraction.
    Type: Application
    Filed: March 30, 2004
    Publication date: November 4, 2004
    Inventors: Harry Morten Rong, Havard Sorheim, Harald Arnljot Oye
  • Publication number: 20040210076
    Abstract: The present invention relates to process wherein (+)-2-carene epoxide is coupled with a compound X-Y that contains nucleophilic and electrophilic moieties, to produce a compound of formula (5). The reaction mixture consists essentially of a source of (+)-2-carene epoxide, compound X-Y, optionally an inert solvent and optionally a pH buffer. No acid catalyst is used in the process.
    Type: Application
    Filed: June 7, 2004
    Publication date: October 21, 2004
    Inventors: Michael Casner, Theodore Maurice Resnick, Lee Jonathan Silverberg
  • Publication number: 20040176627
    Abstract: A haloorganoalkoxysilane is prepared by reacting an olefinic halide with an alkoxysilane in which the alkoxy group(s) contain at least two carbon atoms in a reaction medium to which has been added a catalytically effective amount of ruthenium-containing catalyst and a reaction-promoting effective amount of an electron-donating aromatic compound promoter. The process can be used to prepare, inter alia, chloropropyltriethoxysilane, which is a key intermediate in the manufacture of silane coupling agents.
    Type: Application
    Filed: March 3, 2003
    Publication date: September 9, 2004
    Applicant: CROMPTON CORPORATION
    Inventors: Mark D. Westmeyer, Michael R. Powell, Frank D. Mendicino
  • Publication number: 20040176628
    Abstract: A process for the purification of a silicone oil or fluid using neat supercritical carbon dioxide or a supercritical carbon dioxide mixture extraction to produce vitreoretinal silicone tamponades. The subject process is an economical, highly effective, reproducible, contaminant-free method by which unreacted relatively low molecular weight cyclic siloxanes and oligomers are removed from relatively high molecular weight silicone oil or fluid.
    Type: Application
    Filed: March 16, 2004
    Publication date: September 9, 2004
    Inventors: Jay F. Kunzler, Joseph C. Salamone, Dharmendra Jani, Erik M. Indra
  • Patent number: 6774255
    Abstract: A monohydroxysilane polysulfide of the formula: in which the radicals R, which may be identical or different, are hydrocarbon groups preferably comprising from 1 to 15 carbon atoms; the radicals R′, which may be identical or different, are divalent linking groups preferably comprising from 1 to 18 carbon atoms; x is greater than or equal to 2. This hydroxysilane is in particular a bis-(propyidimethylsilanol) polysulfide. A process for obtaining such a hydroxysilane by alcoholysis and/or hydrolysis of a halogenated organosilane, followed by a sulfuration stage. Use of this hydroxysilane as a coupling agent.
    Type: Grant
    Filed: April 10, 2003
    Date of Patent: August 10, 2004
    Assignee: Michelin Recherche et Technique, S.A.
    Inventors: Jean-Claude Tardivat, Laure Belin, Christiane Blanchard
  • Patent number: 6774202
    Abstract: Provided are polyorganosilsesquioxane and process for preparing the same. The polyorganosilsesquioxane is obtained by various methods including polymerization of an organosilanetriol as starting materials. The polyorganosilsesquioxane has convenience in handling and controlling the rate of polymerization, and structure of highly regular form, and be imparted high functionality and various characteristics as compared to a conventional polyorganosilsesquioxane.
    Type: Grant
    Filed: August 19, 2002
    Date of Patent: August 10, 2004
    Assignee: Intersilicone, Ltd.
    Inventor: Eung-Chan Lee
  • Publication number: 20040138476
    Abstract: The present invention relates to a process for preparing compounds of the formula (I), 1
    Type: Application
    Filed: October 16, 2003
    Publication date: July 15, 2004
    Inventors: Stephan Kirchmeyer, Sergei Ponomarenko
  • Publication number: 20040097747
    Abstract: The invention concerns a method for preparing functionalised silicone oils with controlled viscosity by hydrosilylation of polyorganohydrogenosiloxanes with synthons, identical or different, containing at least a hydrocarbon cycle wherein is included an oxygen atom, said reaction being carried out in the presence of a catalytic metal complex.
    Type: Application
    Filed: July 23, 2003
    Publication date: May 20, 2004
    Inventor: Sebastien Sterin
  • Patent number: 6737118
    Abstract: Silica-based low dielectric constant materials having three-dimensional network structures containing siloxane backbones which comprise SiO4 tetrahedron structural units, as well as their production and use. The materials can be applied as interlayer dielectrics for semiconductor elements and the like.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: May 18, 2004
    Assignee: Nippon Steel Corporation
    Inventors: Noriko Yamada, Toru Takahashi, Tadashi Sakon, Yoichi Matsuzaki, Atsushi Nogami, Shingo Katayama, Ikuko Shiina
  • Patent number: 6737538
    Abstract: An unpurified silicone oil is treated with fibrous activated carbon, yielding a silicone oil of high purity, which will find use in the electric and electronic industry and as cosmetics.
    Type: Grant
    Filed: May 13, 2003
    Date of Patent: May 18, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Nakayama, Masao Maruyama, Hiromi Nakabayashi, Susumu Ueno
  • Publication number: 20040059161
    Abstract: Disclosed is a process for reducing fluoride content in a process utilizing a fluorophosphite-containing transition metal catalyst.
    Type: Application
    Filed: September 16, 2002
    Publication date: March 25, 2004
    Inventors: Ginette Struck Tolleson, Thomas Allen Puckette
  • Publication number: 20040054211
    Abstract: Described is a process for reducing the fluoride content of products prepared in a process utilizing a fluorophosphite-containing transition metal complex catalyst, involving contacting the products with an adsorbent.
    Type: Application
    Filed: September 16, 2002
    Publication date: March 18, 2004
    Inventors: Ginette Struck Tolleson, Thomas Allen Puckette
  • Patent number: 6667411
    Abstract: A method for the preparation of organooxysilanes containing at least one silicon-carbon bond is provided which comprises reacting at least one tetraorganooxysilane with at least one transition metal organo compound.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: December 23, 2003
    Assignee: General Electric Company
    Inventor: Florian Johannes Schattenmann
  • Patent number: 6660875
    Abstract: A method of removing inorganic contamination from dielectric condensate precursor fluids and silicate esters, such as tetraethylorthosilicate (TEOS), methyltriethoxyorthosilicate (MTEOS), hydrogen silsesquioxane (HSQ), methyl silsesquioxane (MSQ), polyarylene ether, benzocyclobutene (BCB), or OSG, includes obtaining a commercial grade fluid having up to 10,000 ppb individual metallic contaminants; converting the sodium form of one or more macroporous ion exchange resin beds to a hydrogen form; converting the chloride form of one or more macroporous ion exchange resin beds to a hydroxide form; drying the macroporous ion exchange resin beds to remove substantially all water from the ion exchange resin beds; passing fluids through the ion exchange resin beds one or more times by recirculating all or a portion of the fluid to obtain a purified fluid having less than 1 ppb of individual metallic contaminants, less than 10 ppb of boron contaminants, and less than 1 ppb of chloride contaminants; and collecting the p
    Type: Grant
    Filed: June 8, 1999
    Date of Patent: December 9, 2003
    Assignee: PPT Technologies, LLC
    Inventor: William H. Mullee
  • Patent number: 6610705
    Abstract: The invention relates to novel diaryl naphthyl methane compounds having general formula I as shown herein below, and said compounds useful in the treatment of esterogen related disease or syndrome, Pharmaceutical compositions comprising said novel methane derivatives, process for the preparation of the novel methane derivatives and methods for the treatment of esterogen related diseases or syndrome.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: August 26, 2003
    Assignee: Council of Scientific and Industrial Research
    Inventors: Neeta Srivastava, Arvinder Grover
  • Patent number: 6610871
    Abstract: An allylic compound is reacted with an organozinc compound Zn(R6)2 to eliminate a group (the leaving group) from the allylic compound and to add a group from the organozinc compound to it in the presence of a copper salt catalyst and a chiral organic ligand for the copper. A novel ferrocenyl compound and a novel copper complex of the ferrocenyl compound and copper are also described.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: August 26, 2003
    Assignee: Avecia Limited
    Inventors: Frank Duebner, Paul Knochel
  • Patent number: 6605683
    Abstract: A process for producing a solution of a silicone oligomer which comprises adding to an alkoxysilane, as a self-catalyst, a solution comprising a silicon compound which is soluble in hydrophilic solvents and has an average structural unit represented by R1nSiOx/2(OH)y(OR2)z, wherein R1 represents an alkyl group having 1 to 3 carbon atoms, vinyl group or phenyl group, a plurality of R1 may represent a same group or different groups, R2 represents an alkyl group having 1 to 3 carbon atoms, a plurality of R2 may represent a same group or different groups and n, x, y and z represent numbers satisfying relations: 0≦n<3, 0<x<4, y>0, z≧0 and y+z=4−n−x, and hydrolyzing and polycondensing the alkoxysilane; and a film of an organopolysiloxane formed from the solution of a silicone oligomer.
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: August 12, 2003
    Assignee: Nihon Yamamura Glass Co., LTD
    Inventor: Zuyi Zhang
  • Publication number: 20030139621
    Abstract: The invention relates to a method for preparing silanes comprising styryl groups, said silanes being represented by the general formula (I):
    Type: Application
    Filed: December 6, 2002
    Publication date: July 24, 2003
    Applicant: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung e.V.
    Inventors: Stephane Jacob, Lothar Frohlich, Konrad Olma, Michael Popall, Frank Kahlenberg
  • Publication number: 20030109732
    Abstract: Alkene-platinum-silyl complexes described by formula (COD)Pt(SiR13−n)2Yn are claimed, where each R1 is independently selected from organic groups, halo atoms, and siloxy groups, each Y is an independently selected divalent bridging group between the silicon atoms bonded to platinum, n is 0, 1, 2, or 3, and COD is 1,5-cyclooctadiene.
    Type: Application
    Filed: December 7, 2001
    Publication date: June 12, 2003
    Inventors: Aroop Kumar Roy, Richard Bruce Taylor
  • Patent number: 6541650
    Abstract: A process for preparing silanes of the formula 1: RaSiHbCl4-a-b  (1) where R is methyl or ethyl, a is 0, 1, 2 or 3 and b is 0 or 1, from hydrogen chloride gas and reactants selected from among a) silicon metal, b) disilanes and oligosilanes whose radicals are selected from among H, R and Cl,  and mixtures thereof, wherein the hydrogen chloride gas is prepared from H2 and Cl2 in a concerted process.
    Type: Grant
    Filed: May 3, 2002
    Date of Patent: April 1, 2003
    Assignee: Wacker-Chemie GmbH
    Inventors: Willi Streckel, Wilfried Kalchauer, Herbert Straussberger
  • Patent number: 6531620
    Abstract: The invention relates to cyclic silazanes of the formula II in which R is a divalent, Si—C and C—N-bound, optionally cyano- or halogen-substituted C3-C15-hydrocarbon radical, in which one or more, non-adjacent methylene units may be replaced by —O—, —CO—, —COO—, —OCO—, —OCOO—, —S— or —NRX— groups and in which one or more non-adjacent methine units may be replaced by —N═, —N═N— or —P═ groups, where at least 3 and at most 6 atoms are arranged between the silicon atom and the nitrogen atom of the ring, RX is hydrogen or an optionally halogen-substituted C1-C10-hydrocarbon radical, and R2 is a hydrogen atom or a monovalent, optionally cyano- or halogen-substituted, Si-C- bound C1-C20-hydrocarbon radical or C1-C20-hydrocarbonoxy radical, in each of which one or more non-adjacent methylene units may be replaced by —O—, —CO—, —COO&mda
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: March 11, 2003
    Assignee: Consortium fur Elecktrochemische Industrie GmbH
    Inventors: Leonhard Brader, Oliver Schäfer, Andreas Bauer, Volker Frey, Bernd Pachaly
  • Patent number: 6524715
    Abstract: A thin film forming chemical absorption material including at least a functional group of the formula CF3—CF2—CH2—O—(benzene)—CH=CH—C(O)—(benzene)— and a —SiX group (X represents halogen) as an end group bonded by siloxane bond. The chemical absorption material can form a monomolecular thin-film having photosensitive groups that are transparent and stable in a visible light region and cause photochemical reaction in an ultraviolet region. A liquid crystal alignment film includes an aggregation of adsorption molecules chemically absorbed directly on a surface with electrodes or chemically adsorbed indirectly thereon through another material layer having a characteristic group the formula above and a —O—Si bond group at a molecular end group.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: February 25, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ootake, Kazufumi Ogawa, Takaiki Nomura, Takako Takebe
  • Patent number: 6498264
    Abstract: Silyl (meth)acrylate compounds each having attached to a silicon atom one very bulky tertiary hydrocarbon group and two branched hydrocarbon groups each having a hydrocarbon group at &agr;- or &bgr;-position or two cyclic hydrocarbon groups are very stable to hydrolysis and are useful raw materials from which hydrolyzable, self-erodible polymers for ship bottom paints are prepared.
    Type: Grant
    Filed: March 5, 2002
    Date of Patent: December 24, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota, Yasufumi Kubota
  • Publication number: 20020172766
    Abstract: A CVD process for producing low-dielectric constant, SiOC thin films using organosilicon precursor compositions having at least one alkyl group and at least one cleavable organic functional group that when activated rearranges and cleaves as a highly volatile liquid or gaseous by-product. In a first step, a dense SiOC thin film is CVD deposited from the organosilicon precursor having at least one alkyl group and at least one cleavable organic functional group, having retained therein at least a portion of the alkyl and cleavable organic functional groups. In a second step, the dense SiOC thin film is post annealed to effectively remove the volatile liquid or gaseous by-products, resulting in a porous low-dielectric constant SiOC thin film. The porous, low dielectric constant, SiOC thin films are useful as insulating layers in microelectronic device structures. Preferred porous, low-dielectric SiOC thin films are produced using di(formato)dimethylsilane as the organosilicon precursor.
    Type: Application
    Filed: March 17, 2001
    Publication date: November 21, 2002
    Inventors: Ravi K. Laxman, Chongying Xu, Thomas H. Baum
  • Patent number: 6458984
    Abstract: A method of purifying tetraethylorthosilicate (TEOS) to remove boron impurities therefrom, and a related method of analyzing TEOS to determine concentration of boron impurities therein.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: October 1, 2002
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Thomas H. Baum, Chongying Xu, Frank R. Hedges, David Daniel Bernhard, Brian L. Benac, Scott L. Battle, John M. Lansdown
  • Publication number: 20020123640
    Abstract: A process is disclosed for the continuous transesterification of alkoxysilanes wherein an alkoxysilane is transformed to a different alkoxysilane in the presence of a catalyst and at least one alcohol that provides the different alkoxy group.
    Type: Application
    Filed: February 25, 2002
    Publication date: September 5, 2002
    Applicant: CROMPTON CORPORATION
    Inventors: Mark P. Bowman, Thomas E. Childress, Frank D. Mendicino, R. Ingrid Warren
  • Patent number: 6437167
    Abstract: The present invention describes new chiral stationary phases and optically active compounds therein contained. The optically active compounds contained in the stationary phases are represented by the formula of structure (I), containing at least one asymmetric carbon atom, and a substituent acting as a spacer. The stationary phases of the present invention are useful in the preparation of chromatographic columns useful for the separation of enantiomers.
    Type: Grant
    Filed: December 8, 2000
    Date of Patent: August 20, 2002
    Assignee: Societa' Cooperative Centro Ricerche Polytech A Responsabilitia' Limitata
    Inventors: Vitomir Sunjic, Darko Kontrec, Vladimir Vinkovic
  • Patent number: 6433205
    Abstract: Magnetic separators are used for treating silicon-containing materials from chlorosilane reactors to remove magnetically influenced components in the silicon-containing materials. The removal of such impurities allows for enhanced reactivity of the silicon-containing materials in processes wherein the silicon-containing materials are raw materials for the production of silicon based compounds, such as, for example, basic alkylhalosilanes such as dimethyldichlorosilane, methyldichlorosilane, and other chlorosilanes such as trichlorosilane, which chlorosilanes are useful in the preparation of valuable silicon-containing products.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: August 13, 2002
    Assignees: Dow Corning Corporation, Dow Corning Toray Silicone Company, Limited
    Inventors: Jonathan Ashley Brinson, John Eric Herman, David William Snodgrass, Hidehiko Hosokawa
  • Patent number: 6410770
    Abstract: This invention includes a process for producing an alkylsilane, comprising reducing an alkoxysilane in the presence of an alkali metal hydride in the presence of a high boiling solvent. The alkylsilane has a boiling point lower than the boiling point of the solvent, which is typically diglyme. This invention also includes a chloride-free alkylsilane formed from the reduction of an alkoxysilane in the presence of an alkali metal hydride. The alkylsilane produced according to the process of the present invention may be useful in microelectronic applications, such as in the production of chloride-free low dielectric constant materials which may be produced by the chemical vapor deposition of such silanes.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: June 25, 2002
    Assignee: Gelest, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Gerald Larson
  • Patent number: 6410746
    Abstract: Compounds having the formula: are disclosed. M1 and M2 are the same or different and are transition metal atoms or ions; Z2 and Z3, independently, are the atoms necessary to complete a 3-12 membered heterocyclic ring; Z1 is an alkylene or arylene group; Q1 and Q2 are the same or different and are electron withdrawing groups; L1 and L3, taken together, represent —O—CR13—O—; L2 and L4, taken together, represent —O—CR14—O—; and R13 and R14 are the same or different and are selected from the group consisting of alkyl groups and aryl groups or R13 and R14 represent alkylene or arylene groups that are directly or indirectly bonded to one another. Methods for making such compounds are also disclosed, as are intermediates which can be used in their preparation. Also disclosed are methods for carrying out C—H insertion reactions using bis-transition metal catalysts, such as the above compounds.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: June 25, 2002
    Assignee: Research Foundation of State University of New York, The
    Inventor: Huw M. L. Davies
  • Patent number: 6410769
    Abstract: An organosilane preparation, comprising a mixture of one or more organosilanes and one or more fillers, has a fines content of less than 2%.
    Type: Grant
    Filed: November 20, 2000
    Date of Patent: June 25, 2002
    Assignee: Degussa Muls AG
    Inventors: Kurt Eichenauer, Holger Pitsch, Michael Klose, Conny Vogler, Jan Kopietz, Helmut Kriesch
  • Patent number: 6403818
    Abstract: The invention provides a process for producing an &agr;-hydroxy-carbonyl compound or an &agr;-protected hydroxy-carbonyl compound by reacting a carbonyl compound (I) with a compound (II) and a compound (III). The compounds (I), (II) and (III) are defined below. R1, R2, R3 and R4 are an organic group. PG is a protective group for hydroxy group. Y is R4N, S or O. The product is useful in pharmacology.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: June 11, 2002
    Assignee: Eisai Co., Ltd.
    Inventor: Hisao Nemoto
  • Patent number: 6399733
    Abstract: A process for preparing a highly pure silicone ladder polymer of the general formula (1): wherein R1 and R2 represent F, H, a lower alkyl group, an alkenyl group, an aryl group, a lower fluorinated alkyl group, a fluorinated alkenyl group or a fluorinated aryl group; R3, R4, R5 and R6 each represents H, a lower alkyl group or a lower fluorinated alkyl group; and n represents an integer of 5 to 10000, which comprises: (a) a step of obtaining a prepolymer in which at least one organosilane compound is dissolved in an organic solvent and hydrolyzed with ultrapure water; (b) a step of washing the obtained prepolymer with ultrapure water; and, (c) a step of dissolving the washed prepolymer in an organic solvent and heating without a catalyst.
    Type: Grant
    Filed: October 11, 2000
    Date of Patent: June 4, 2002
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Shigeyuki Yamamoto, Naoki Yasuda, Motohisa Taguchi
  • Patent number: 6395858
    Abstract: The present invention relates to mixtures of catenate and cyclic siloxane oligomers of the formulae I and II where the substituents R consist of (i) aminopropyl-functional groups of the formula —(CH2)3—NH2 or —(CH2)3—NHR′ or —(CH2)3—NH(CH2)2—NH2 or —(CH2)3—NH(CH2)2—NH(CH2)2—NH2,in which R′ is a linear, branched or cyclic alkyl group of 1 to 18 carbon atoms or an aryl group of 6 to 12 carbon atoms, and (ii) methoxy, ethoxy, 2-methoxyethoxy and/or propoxy groups, and (iii) if desired, alkyl, alkenyl, isoalkyl or cycloalkyl groups of 1 to 18 carbon atoms and/or aryl groups of 6 to 12 carbon atoms, and where not more than one aminopropyl-functional group is attached to one silicon atom and the degree of oligomerization of compounds of the formula I is within the range 2<m<30 and that of compounds of the formula II is 3≦n≦30 and the quotient of the molar proportion of Si/alkoxy group is ≧0.5.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: May 28, 2002
    Assignee: Degussa AG
    Inventors: Helmut Mack, Dieter Barfurth, Roland Edelmann, Albert-Johannes Frings, Michael Horn, Peter Jenkner, Ralf Laven, Jaroslaw Monkiewicz, Burkhard Standke
  • Patent number: 6380406
    Abstract: A process for forming an olefin epoxidation catalyst is described. The process comprises reacting a tert-alkyl trihydroxysilane with a titanium complex such that the ratio of Si:Ti is 7. The catalyst is very active and selective in olefin epoxidation.
    Type: Grant
    Filed: August 4, 2000
    Date of Patent: April 30, 2002
    Assignee: Arco Chemical Technology, L.P.
    Inventor: Kevin M. Carroll
  • Publication number: 20020035286
    Abstract: A bissilylnorbornane compound is prepared by reacting 2,5-norbornadiene with a hydrogenchlorosilane in the presence of a mixture of a palladium compound and a phosphite or a palladium complex having a phosphite ligand as a catalyst. The bissilylnorbornane compound can be produced in high yields while suppressing formation of by-product nortricyclene.
    Type: Application
    Filed: August 24, 2001
    Publication date: March 21, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota, Mikio Endo
  • Patent number: 6358574
    Abstract: Crosslinkable LC organosiloxanes exhibiting excellent UV stability, contain units of the general formula 1 [RbMescSiO(4−b−c)/2]  (1) in which R are C1-C4-alkyl radicals, Mes is at least one group of the general formula 2 and, if desired, of the general formula 3, b has the value 0, 1 or 2, and c has the value 0, 1, 2, 3 or 4, with the proviso that the sum of the values of b and c is a maximum of 4, where the Mes groups of the general formulae 2 and 3 exhibit the following structure: —(CH2)p—(O)q—A—[B—A]r—E—F—VN  (2) —(CH2)m—(O)n—(A)t—Q—X  (3) in which A, B, Q, X, E, F, VN, m, p, n, q, t and r have the meanings given in claim 1, with the proviso that the LC organosiloxanes do not constitute a phenyl ester derivative of an aliphatic, aromatic or heteroaromatic carboxylic acids.
    Type: Grant
    Filed: December 6, 1999
    Date of Patent: March 19, 2002
    Assignee: Consortium fur Elektrochemische Industrie GmbH
    Inventors: Norman Häberle, Jürgen Küpfer, Horst Leigeber
  • Patent number: 6359159
    Abstract: Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: March 19, 2002
    Assignee: Research Foundation of State University of New York
    Inventors: John T. Welch, Paul J. Toscano, Rolf Claessen, Andrei Kornilov, Kulbinder Kumar Banger
  • Patent number: 6353073
    Abstract: The present invention provides near quantitative yields of greater than about 95% isomeric purity of poly(3-aminopropylmethylsiloxane)-poly(dimethylsiloxane) copolymers of the general formulae: Me3Si(H2NCH2CH2CH2MeSiO)w(Me2SiO)xOSiMe3 (H2NCH2CH2CH2MeSiO)y(Me2SiO)z wherein Me is methyl, w may range from 1 to about 100, x may range from 1 to about 100, y may range from 1 to about 6, z may range from 1 to about 6 and y+z may range from 3 to about 7.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: March 5, 2002
    Assignee: Archimica (Florida), Inc.
    Inventors: Timothy N. Biggs, Benigno A. Janeiro
  • Publication number: 20020022735
    Abstract: In a process for preparing trialkoxysilanes by reaction of silicon metal with an alcohol in an inert solvent in the presence of a copper catalyst, the copper catalyst used is a copper salt whose anion contains at least one nonhydrolyzable fluorine atom, or a mixture thereof with other salts.
    Type: Application
    Filed: July 11, 2001
    Publication date: February 21, 2002
    Inventor: Alexandra Brand
  • Publication number: 20020019551
    Abstract: This invention discloses a process for making dilithium initiators in high purity. This process can be conducted in the absence of amines which is desirable since amines can act as modifiers for anionic polymerizations. The dilithium compounds made are highly desirable because they are soluble in aromatic solvents. The present invention more specifically discloses a process for synthesizing a dilithium initiator which comprises reacting diisopropenylbenzene with a tertiary alkyl lithium compound in an aromatic solvent at a temperature which is within the range of about 0° C. to about 100° C. The present invention further discloses a process for synthesizing m-di-(1-methyl-3,3-dimethylbutyllithio) benzene which comprises reacting diisopropenylbenzene with tertiary-butyllithium in an aromatic solvent at a temperature which is within the range of about 0° C. to about 100° C.
    Type: Application
    Filed: May 25, 2001
    Publication date: February 14, 2002
    Inventors: Adel Farhan Halasa, Wen-Liang Hsu
  • Publication number: 20020010354
    Abstract: Trialkoxysilanes are prepared by reacting silicon metal with an alcohol in an inert solvent in the presence of a copper catalyst by a process in which the copper catalyst contains copper(II) oxide having a BET surface area of ≧10 m2/g. Furthermore, this copper catalyst is used for the preparation of trialkoxysilanes by reacting silicon metal with an alcohol.
    Type: Application
    Filed: May 21, 2001
    Publication date: January 24, 2002
    Inventor: Alexandra Brand
  • Patent number: 6340768
    Abstract: Volatile metal complexes with &agr;-sila-&bgr;-diketonate ligands containing haloalkyl, and particularly, perfluoroalkyl, substitutents are useful as metal precursors for chemical vapor deposition processes and as nanostructured materials containing fluorous domains.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: January 22, 2002
    Assignee: Research Foundation of State University of New York
    Inventors: John T. Welch, Kulbinder Kumar Banger, Seiichiro Higashiya, Silvana C. Ngo
  • Patent number: 6340734
    Abstract: Novel silsesquioxane polymers are formed by methods which avoid the use of BBr3. The novel silsesquioxane polymers are especially useful in negative photoresist compositions and photolithographic processes. Alternatively, improved silsesquioxane polymer-containing negative photoresist compositions are obtained by using a polymer component containing a blend of silsesquioxane polymer and non-silsesquioxane polymer. The photoresist compositions provide improved dissolution characteristics enabling the use of 0.26N TMAH developer. The photoresist compositions also provide improved thermal characteristics enabling use of higher processing temperatures. The photoresist compositions are especially useful in a multilayer photolithographic processes and are capable of producing high resolution.
    Type: Grant
    Filed: December 7, 1999
    Date of Patent: January 22, 2002
    Assignee: International Business Machines Corporation
    Inventors: Qinghuang Lin, Marie Angelopoulos, Ahmad D. Katnani, Ratnam Sooriyakumaran