Stereolithography Patents (Class 700/120)
  • Patent number: 11498283
    Abstract: A method for forming a part layer by layer using an additive manufacturing apparatus. The additive manufacturing apparatus includes a resin support, a stage, a measuring system, and an actuator configured to change the relative position of the stage and the resin support. The method includes the steps of: performing an additive manufacturing cycle including the following steps: depositing an uncured layer of resin; moving the stage to a target location; curing the uncured layer of resin; and moving the stage away from the target location; repeating the additive manufacturing cycle; performing a measuring process wherein the measuring process includes the following steps: using the measuring system to take a measurement indicative of an actual position of a structure; comparing the actual position of the structure to an expected position of the structure to determine an error; and using the error to modify the target location.
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: November 15, 2022
    Assignee: General Electric Company
    Inventors: Meredith Elissa Dubelman, Mary Kathryn Thompson, Christopher Barnhill, Xi Yang
  • Patent number: 11440098
    Abstract: A system for forming a three-dimensional (3D) article includes a powder dispenser, a fusing apparatus, and a controller. The plurality of energy beams include at least a first beam and a second beam. The controller is configured to operate the powder dispenser to dispense a layer of powder and to operate the fusing apparatus to selectively fuse the layer of powder. Operating the fusing apparatus includes operating the first beam to fuse a first hatch pattern over a first area of the layer of powder and operate at least the second beam to fuse a contour that bounds the hatch pattern. The contour is formed from N scans along the contour. N is an integer that is at least equal to one. N is determined by a lateral alignment uncertainty between at least two of the energy beams.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: September 13, 2022
    Assignee: LAYERWISE NV
    Inventors: Nachiketa Ray, Jan Plas
  • Patent number: 11351736
    Abstract: An NC device, which is a numerical control device, includes: a program analyzing unit that analyzes a machining program to obtain a movement path along which to move a supply position of a material on a workpiece; a storage temperature extracting unit that extracts, from data on surface temperature of the workpiece, storage temperature in an area including the movement path on the workpiece; a layering volume calculating unit that calculates a volume of a layer forming an object on the basis of a relation between the storage temperature and a volume of the material that solidifies at the storage temperature in a given time; and a layering shape changing unit that changes a shape of the layer on the basis of the volume of the layer.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: June 7, 2022
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Seiji Uozumi, Nobuhiro Shinohara, Daiji Morita, Nobuyuki Sumi
  • Patent number: 11348313
    Abstract: Examples of the present disclosure relate to a method for packing three dimensional (3D) models. The method comprises identifying a plurality of sections of each 3D model according to curvature profiles of the sections; associating a build material layer thickness to each section of the plurality of sections, whereby each associated build material layer thickness is one of a set of pre-established build material layer thicknesses; packing the plurality of 3D models according to each associated build material layer thickness, whereby packing comprises spatially arranging at least some 3D models in the 3D virtual build volume according to one or more criteria, such that at least some of the sections of different 3D models associated to a same build material layer thickness are arranged in a same region of the 3D virtual build volume.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: May 31, 2022
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Jordi Roca Vila, Sergio Gonzalez Martin, Quim Muntal Diaz
  • Patent number: 11292201
    Abstract: Systems and methods for designing and manufacturing an additive manufacturing (AM) model. A method includes computing a wedge plane and initial toolpath for an AMmodel based on a breaking angle. The method includes trimming an excess toolpath of the AM model using a breaking plane. The method includes building the toolpath along the normal of a first layer and trimming based on a next layer. The method includes building a next wedge of the toolpath in the direction of a wedge plane used to trim a previous wedge The method includes storing the toolpath.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: April 5, 2022
    Assignee: Siemens Industry Software Inc.
    Inventors: James Maynard, Michael Taesch, Timothy R. Fithian, William Vittitow, Mai-Anh T Bui, Ashish Joshi
  • Patent number: 11225026
    Abstract: A manufacturing system includes a printhead, at least one profilometer, and a control system. The printhead extrudes a material onto a substrate and forms a new bead during additive manufacturing of an in-work article. The profilometer moves with the printhead and measures an in-work cross-sectional profile of existing beads of the in-work article. The control system generates in-work profile data including the in-work cross-sectional profile at a plurality of in-work profile locations, and continuously compares the in-work profile data to reference profile data of a reference article. The reference profile data includes a reference cross-sectional profile at a plurality of reference profile locations. The control system adjusts, based on the profile comparison, one or more bead forming parameters and causes the printhead to form the new bead according to the bead forming parameters to reduce or prevent nonconformities associated with forming the new bead.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: January 18, 2022
    Assignee: The Boeing Company
    Inventors: Gary E. Georgeson, Bharath K. Kodumuru, Hong H. Tat, Edward J. Kang, Nathan J. Chapdelaine, Thomas A. Maeder
  • Patent number: 11123921
    Abstract: A method and system for in situ cross-linking of polymers, Bitumen, and other materials to produce arbitrary functional or ornamental three-dimensional features using electron beams provided by mobile accelerators comprises defining a desired pattern for imparting on a target area, mapping the target area, defining at least one discrete voxel in the target area according to the desired pattern to be imparted on the target area, assigning an irradiation value to each of the at least one discrete voxels, and delivering a dose of irradiation to each of the at least one discrete voxels according to the assigned irradiation value.
    Type: Grant
    Filed: November 2, 2018
    Date of Patent: September 21, 2021
    Assignee: FERMI RESEARCH ALLIANCE, LLC
    Inventors: Aaron Sauers, Robert Kephart
  • Patent number: 11097467
    Abstract: A stereolithographic 3D printer comprising a number of functional stations that are connected in an automated process so that they can perform the following functions simultaneously; a) the selective exposure of liquid photopolymer, b) the washing off of excess photopolymer, c) the post exposure of the built part (optionally under water) and optionally d) the load and unloading of the part.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: August 24, 2021
    Assignee: PhotoCentriC Limited
    Inventors: Paul Holt, David O'Brien, Ed Barlow
  • Patent number: 10906243
    Abstract: An additive lathe integrates the advantages of additive manufacturing (also called 3d printing) with the cylindrical motion of a lathe to reduce material waste, print times, and increase creative potential. A post-processing system allows for an improved surface finishing on parts. The additive lathe no longer prints in cartesian (X, Y, Z) coordinates as other 3D printers and instead prints using cylindrical (R, Theta, Z) coordinates. The traditional bed or build plate is replaced with a horizontal cylindrical starter bar, on which 3D printed material is deposited along and around the bar. Essentially, the additive lathe works like a conventional lathe, but in reverse. Instead of taking a cylinder and slowly removing material as the part spins, the additive lathe adds material along and around the bar iteratively building up the part. The finishing mechanism allows for the creation of a smooth outer finish on printed parts while still in the printer.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: February 2, 2021
    Inventor: Elizabeth Silvestro
  • Patent number: 10885668
    Abstract: A crossing point detector includes memory and a crossing point detection unit that reads out a square image from a captured image in the memory, and detects a crossing point of two boundary lines in a checker pattern depicted in the square image. The crossing point detection unit decides multiple parameters of a function model treating two-dimensional image coordinates as variables, the parameters optimizing an evaluation value based on a difference between corresponding pixel values represented by the function model and the square image, respectively, and computes the position of a crossing point of two straight lines expressed by the decided multiple parameters to thereby detect the crossing point with subpixel precision. The function model uses a curved surface that is at least first-order differentiable to express pixel values at respective positions in a two-dimensional coordinate system at the boundary between black and white regions.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: January 5, 2021
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Nobuhiko Wakai, Takeo Azuma, Kunio Nobori, Satoshi Sato, Ayako Maruyama
  • Patent number: 10850355
    Abstract: A severing device for mechanically severing metal-containing 3D objects from a base plate of a 3D printing apparatus is provided. The severing device has at least one first machining unit firmly connectable to the 3D printing apparatus with at least one machining tool which has a working zone which encompasses at least part of an area of the base plate.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: December 1, 2020
    Assignee: Ford Global Technologies, LLC
    Inventor: Bruno Alves
  • Patent number: 10730236
    Abstract: An additive manufacturing system is capable of extruding poly-fiber strand having a fiber core coated with a polymer with a high range of flexibility in positioning and orienting extruded fibers. Extruded fibers may be laid in a single direction, or may curve or turn to be laid in multiple directions. Structures of devices and components may be created using interconnected extruded strands having interstitial spaces between and around the strands. This structure may be infused with resin or polymer using a pressure or vacuum based infusion system. In this manner, durable polymeric objects can be created without requiring expensive molds. Other techniques are also possible, including varying the types of strands used in an object to create areas of the object that will preferentially twist or flex in certain ways or directions, as well as producing objects with zones having different types of resin or no resin.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: August 4, 2020
    Assignee: Ethicon LLC
    Inventors: Kevin L. Houser, Peyton L. Hopson, Vincent H. Barre
  • Patent number: 10690908
    Abstract: A head device of three-dimensional modeling equipment is disclosed which has unidirectionally rotating polygon mirrors, can perform biaxial scanning at a high speed due to a combination of the mirrors, can easily control timing and a modeling ray irradiation position, and can enhance modeling precision. A scanning method for a modeling plane using the same is also disclosed.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: June 23, 2020
    Assignee: Korea Institute of Industrial Technology
    Inventors: Seung Taek Kim, Moon Soo Park, Young June Cho, Deok Keun Lee, Jong Seok Kim, Hyung Tae Kim
  • Patent number: 10596802
    Abstract: Additive manufacturing systems (AMS) are disclosed. The AMS may include a movable build platform, and a calibration system operably connected to the build platform. The calibration system may include a reflective element operably coupled to the build platform, a first calibration model positioned above and vertically offset from the reflective element, and a first camera substantially aligned with the first calibration model. The first camera may be visually aligned with the reflective element to capture a first reflective image of the first calibration model as reflected by the reflective element. The calibration system may also include at least one computing device operably connected to the build platform and the first camera, and configured to calibrate the build platform by: adjusting an actual inclination of the build platform in response to determining the first reflective image differs from a predetermined image of the first calibration model.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: March 24, 2020
    Assignee: General Electric Company
    Inventors: Mikhail Pavlov, Donnell Eugene Crear, Felix Martin Gerhard Roerig, Dean Andrew Snelling, Jr.
  • Patent number: 10589382
    Abstract: A method for additive manufacturing an object is disclosed. The method includes, for a first portion of the object to be built in a first overlapping field region of a plurality of melting beams of a metal powder AM system, sequentially forming each layer of the first portion by: forming only a border section of the first portion of the object using a first melting beam of the plurality of melting beams in the first overlapping field region; and forming an internal section of the first portion of the object within the border section using at least one second, different melting beam from the first melting beam in the first overlapping field region. An entirety of an internal edge of the border section of the first portion of the object is overlapped with an entirety of an external edge of the internal section of the first portion of the object.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: March 17, 2020
    Assignee: General Electric Company
    Inventors: Felix Martin Gerhard Roerig, Juan Vicente Haro Gonzalez
  • Patent number: 10372871
    Abstract: An IC design layout is decomposed into multiple masks to produce an initial output. A post-decomposition optimization is performed. The post-decomposition optimization includes identifying hotspots in the multiple masks, clustering features that contribute to the hotspots into clusters, identifying ones of the clusters that can be relocated to a different mask to eliminate the hotspot, without violating design rules, as reversible clusters, ranking movement of the reversible clusters by comparing the reversible clusters, as potentially moved, to known manufacturability metrics, and moving the reversible clusters to different masks according to the priority established by the ranking, to produce a post-decomposition optimized tape-out. The IC devices are manufactured by applying the post-decomposition optimized tape-out to manufacturing equipment.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: August 6, 2019
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Lynn Tao-Ning Wang, Sriram Madhavan
  • Patent number: 9975322
    Abstract: A three-dimensional object printer enables production of cylindrically shaped objects. The printer includes a controller operatively connected to at least two printheads, at least one object treating device, and actuator that is operatively connected to a cylindrical member being supported by at least two supports. The controller is configured to operate the actuator to rotate the cylindrical member within the at least two supports, to operate the plurality of ejectors in each of the at least two printheads to form portions of layers on the rotating cylindrical member with the different materials supplied to the at least two printheads, and to operate the at least one object treating device to modify the layers formed on the rotating cylindrical member while the cylindrical member is rotating within the at least two supports.
    Type: Grant
    Filed: February 23, 2016
    Date of Patent: May 22, 2018
    Assignee: Xerox Corporation
    Inventors: Erwin Ruiz, Steven M. Russel, Paul M. Fromm, Jeffrey N. Swing
  • Patent number: 9796138
    Abstract: A method and a device for processing a light-polymerizable material (5, 55) for building up an object (27) in layers, using a lithography based generative manufacture having a construction platform (12) for building up the object (27), a projecting exposure unit (10, 60) that can be controlled for locally selected exposing of a surface on the construction platform (12, 62) to an intensity pattern having a prescribed shape, and a control unit (11, 61) prepared for polymerizing overlapping layers (28) on the construction platform (12, 62) in successive exposure steps, each having a prescribed geometry, by controlling the projecting exposure unit (10, 60), in order to thus successively build up the object (27) in the desired shape, said shape resulting from the sequence of layer geometries.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: October 24, 2017
    Assignees: Ivoclar Vivadent AG, Technische Universitat Wien
    Inventors: Robert Liska, Johannes Patzer, Jurgen Stampfl, Wolfgang Wachter, Christoph Appert
  • Patent number: 9530983
    Abstract: A sintering method includes defining a closed pattern having at least one arcuate section. A substance is applied on a substrate along the closed pattern and is sintered along the closed pattern in a first rectilinear direction. The sintering is finished in a second rectilinear direction along the closed pattern. A display device packaging method includes defining a closed pattern having at least one arcuate section. Frit is applied on a substrate of a display device along the closed pattern. A cover plate is provided on the substrate. The frit is sintered along the closed pattern. The sintering is finished in a second rectilinear direction. Then, the cover plate and the substrate of the display device are packaged.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: December 27, 2016
    Assignee: EverDisplay Optronics (Shanghai) Ltd.
    Inventors: Yanhu Li, Chih-Wei Wen
  • Patent number: 9355204
    Abstract: A method of decomposing a design layout for a double patterning process is provided. The method includes changing, by a computing system, a design layout of a first polygon type to a design layout of a curved polygon type; coloring the design layout of the curved polygon type; generating stitching shapes for preventing acute corners in stitching areas of the colored design layout of the curved polygon type; separating the design layout including the stitching shapes for preventing the acute corners into separated design layouts of curved polygon type according to colors; and changing the separated design layouts of the curved polygon type to design layouts of a second polygon type.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: May 31, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-Wook Seo, Jeong-Hoon Lee, Hye-Soo Shin
  • Patent number: 9031685
    Abstract: A method and apparatus for atomic layer deposition (ALD) is described. In one embodiment, an apparatus comprises a vacuum chamber body having a contiguous internal volume comprised of a first deposition region spaced-apart from a second deposition region, the chamber body having a feature operable to minimize intermixing of gases between the first and the second deposition regions, a first gas port formed in the chamber body and positioned to pulse gas preferentially to the first deposition region to enable a first deposition process to be performed in the first deposition region, and a second gas port formed in the chamber body and positioned to pulse gas preferentially to the second deposition region to enable a second deposition process to be performed in the second deposition region is provided.
    Type: Grant
    Filed: January 7, 2014
    Date of Patent: May 12, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Barry L. Chin, Alfred W. Mak, Lawrence C. Lei, Ming Xi, Hua Chung, Ken Kaung Lai, Jeong Soo Byun
  • Publication number: 20150123319
    Abstract: The invention is a method for producing a three-dimensional object in layers through stereolithography, comprising the following operations: moving a supporting surface (6a, 7a) near the bottom (2a) of a container (2) containing a liquid substance (3), so as to arrange it in a predefined operating position (17); selectively irradiating a layer (6) of liquid substance (3) with pre-defined radiation (4), in such a way as to solidify it against the supporting surface (6a, 7a). The approaching movement (11) comprises a plurality of approaching moves (12, 12a, 12b, 12c) having corresponding predefined lengths (13, 13a, 13b, 13c), spaced by corresponding intermediate stops (14, 14a, 14b) for corresponding predefined time intervals (15, 15a, 15b), the intermediate stops (14, 14a, 14b) being carried out when the supporting surface (6a, 7a) is at least partially immersed in the liquid substance (3).
    Type: Application
    Filed: July 15, 2013
    Publication date: May 7, 2015
    Inventors: Roberto Fortunato, Sergio Zenere
  • Publication number: 20150100149
    Abstract: A system and method for calibrating a laser scanning system is provided. Various embodiments involve the use of a calibration plate with reference markings which is positioned to receive a directed beam in a set of known laser scanner positions. The directed beam forms a laser spot on the calibration plate, and the laser spot is captured using an image acquisition assembly such as a digital camera along with a motorized mount. The movement of the image acquisition assembly may be coordinated with the movement of the laser scanner to track the laser spot across the plate. After photographing various positions, actual laser spot coordinates are deduced from their position relative to the known positions of the reference markings.
    Type: Application
    Filed: September 19, 2014
    Publication date: April 9, 2015
    Inventors: Sam COECK, Kurt RENAP
  • Patent number: 9003338
    Abstract: One or more techniques or systems for incorporating a common template into a system on chip (SOC) design are provided herein. For example, a common template mask set is generated based on a first set of polygon positions from a first vendor and a second set of polygon positions from a second vendor. A third party creates a third party SOC design using a set of design rules generated based on the common template mask set. The common template is fabricated based on the third party SOC design using the common template mask set. Because the common template is formed using the common template mask set and because the common template mask set is based on polygon positions from both the first vendor and the second vendor, a part can be connected to the SOC regardless of whether the part is sourced from the first vendor or the second vendor.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: April 7, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: William Wu Shen, Yun-Han Lee, Chin-Chou Liu, Hsien-Hsin Lee, Chung-Sheng Yuan, Chao-Yang Yeh, Wei-Cheng Wu, Ching-Fang Chen
  • Patent number: 9002496
    Abstract: Disclosed herein is a device adapted to make a solid object. The device has a surface rotatable around an axis of rotation, and an applicator adapted to apply over at least one portion of the surface a material used to make the solid object. The applicator and the surface are displaceable relative to each other in a direction transverse to the axis. Disclosed herein are also methods of determining instructions for the device.
    Type: Grant
    Filed: July 29, 2010
    Date of Patent: April 7, 2015
    Assignee: Zydex Pty Ltd
    Inventor: Justin Elsey
  • Patent number: 8977378
    Abstract: Disclosed are methods and systems for using hieroglyphs for communication in a rapid fabrication environment. The method includes receiving, by a control system for an articulated robotic arm, one or more images of a fabrication machine build space. The method includes identifying, by the control system, a hieroglyph present in the one or more images and translating the identified hieroglyph into one or more instructions for manipulation of the articulated robotic arm. The method includes causing the articulated robotic arm to carry out the instructions translated from the identified hieroglyph. Accordingly foreign objects are inserted into fabricated objects during an automated rapid fabrication process without extensive redesign of the rapid fabrication machine. In some implementations, an unmodified third-party stereolithographic rapid fabrication machine can be used.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: March 10, 2015
    Assignee: Northeastern University
    Inventors: Brian Weinberg, Constantinos Mavroidis
  • Patent number: 8972909
    Abstract: The present disclosure relates to a method of performing an optical proximity correction (OPC) procedure that provides for a high degree of freedom by using an approximation design layer. In some embodiments, the method is performed by forming an integrated chip (IC) design having an original design layer with one or more original design shapes. An approximation design layer, which is different from the original design layer, is generated from the original design layer. The approximation design layer is a design layer that has been adjusted to remove features that may cause optical proximity correction (OPC) problems. An optical proximity correction (OPC) procedure is then performed on the approximation design layer. By performing the OPC procedure on the approximation design layer rather than on the original design layer, characteristics of the OPC procedure can be improved.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: March 3, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Cheng Chang, Jau-Shian Liang, Wen-Chen Lu, Chin-Min Huang, Ming-Hui Chih, Cherng-Shyan Tsay, Chien-Wen Lai, Hua-Tai Lin
  • Patent number: 8966410
    Abstract: A method for fabricating a semiconductor layout includes providing a first layout having a plurality of line patterns and a second layout having a plurality of connection patterns, defining at least a first to-be-split pattern overlapping with the connection pattern among the line patterns, splitting the first to-be-split pattern at where the first to-be-split pattern overlapping with the connection pattern, decomposing the first layout to form a third layout and a fourth layout, and outputting the third layout and the further layout to a first mask and a second mask respectively.
    Type: Grant
    Filed: October 29, 2013
    Date of Patent: February 24, 2015
    Assignee: United Microelectronics Corp.
    Inventors: Chia-Wei Huang, Ming-Jui Chen, Chun-Hsien Huang
  • Publication number: 20150045934
    Abstract: Three-dimensional object bridge between virtual and physical worlds. A method, system, apparatus and/or computer-usable medium includes steps of selecting a three-dimensional item in a first state for subsequent rendering into a second state and rendering the three-dimensional item in the second state via the three-dimensional rendering apparatus. An additional step of locating a three-dimensional rendering apparatus for rendering the three-dimensional item in a second state can be included. The three-dimensional rendering apparatus can be configured as a kiosk (manned or unmanned), Internet-enabled vending machine, and the like. The first state can comprise a virtual state and the second state can comprise a physical state. Likewise, the first state can comprise a physical state and the second state can comprise a virtual state. Additionally, the three-dimensional item/object can be mapped in the first state for rendering in the second state.
    Type: Application
    Filed: August 7, 2013
    Publication date: February 12, 2015
    Inventors: Christopher Kallenbach, Luke Nihlen, Luis M. Ortiz
  • Publication number: 20150045935
    Abstract: Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.
    Type: Application
    Filed: October 28, 2014
    Publication date: February 12, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yu CAO, Wenjin SHAO, Ronaldus Johannes Gijsbertus GOOSSENS, Jun YE, James Patrick KOONMEN
  • Publication number: 20150019000
    Abstract: An image projection system projects a single image on an image projection region from a plurality of image projection sections and includes section that detects checker intersection coordinates in a corrected checkered sheet image, a section that calculates a first projective transformation matrix from the checker intersection coordinates, a section that generates first and second spatial code images, a section that acquires boundary lines in the first and second spatial code images, and acquires first intersection coordinates of the boundary lines, a section that calculates a second projective transformation matrix for projective transformation of the first intersection coordinates, transformed using the first projective transformation matrix, into second intersection coordinates distributed over an entire sub-region of the image projection region, and a section that transforms image data by using the second projective transformation matrix.
    Type: Application
    Filed: July 8, 2014
    Publication date: January 15, 2015
    Inventor: Yasutoshi NAKAMURA
  • Patent number: 8930859
    Abstract: Embodiments relate to a method of decomposing a layout of a semiconductor device. The method may include generating a pattern layout including first patterns and second patterns, generating an interference map for the pattern layout, the interference map including optical interference information regarding the first and second patterns, and decomposing the pattern layout into a first decomposition pattern layout including the first patterns, and a second decomposition pattern layout including the second patterns, based on the interference map. In the interference map, an influence of constructive interference on the first patterns may be greater than an influence of constructive interference on the second patterns.
    Type: Grant
    Filed: July 17, 2013
    Date of Patent: January 6, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Sung-Gon Jung
  • Publication number: 20140379114
    Abstract: A projection image correction system includes a section that detects intersection coordinates in a corrected sheet image, a section that calculates a first projective transformation matrix for transformation of the detected intersection coordinates into intersection coordinates stored in advance, a section that generates two spatial code images from the corrected positive and negative images of Gray code patterns, a section that acquires intersections of brightness profiles in the positive and negative images, a section that acquires coordinates of an intersection of boundary lines in the two spatial code images, a section that calculates a second projective transformation matrix by which transformation is performed so that the acquired intersection coordinates, transformed by the first projective transformation matrix, are distributed over the entire region, and a section that transforms, using the second projective transformation matrix, image data to be outputted to a projector.
    Type: Application
    Filed: June 24, 2014
    Publication date: December 25, 2014
    Inventor: Yasutoshi NAKAMURA
  • Patent number: 8918746
    Abstract: Methodologies and an apparatus enabling a selection of design rules to improve a density of features of an IC design are disclosed. Embodiments include: determining a feature overlapping a grating pattern of an IC design, the grating pattern including a plurality of grating structures; determining a shape of a cut pattern overlapping the grating pattern; and selecting one of a plurality of rules for the feature based on the determined shape.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: December 23, 2014
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Lei Yuan, Jongwook Kye, Harry J. Levinson
  • Patent number: 8893067
    Abstract: In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.
    Type: Grant
    Filed: August 20, 2013
    Date of Patent: November 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jun Ye, Yen-Wen Lu, Yu Cao, Luoqi Chen, Xun Chen
  • Patent number: 8880209
    Abstract: A 3D modeling apparatus includes: a support body which supports a modeled object formed by laminating a resin material that is cured by energy of an energy ray; an illumination mechanism which illuminates the resin material with the energy ray, on the basis of image data of laminated cross-sections which constitutes 3D data of an object to be modeled which is an object of modeling, in order to form the modeled object; and a supply mechanism which supplies a material that constitutes a part of the modeled object and is different from the resin material, to the resin material that is cured as being illuminated by the illumination mechanism, on the basis of the cross-section image data.
    Type: Grant
    Filed: October 13, 2011
    Date of Patent: November 4, 2014
    Assignee: Sony Corporation
    Inventor: Hiroyuki Yasukochi
  • Publication number: 20140316549
    Abstract: A three-dimensional object (1) made by way of a stereolithography process, includes a plurality of supports (3) that are connected to the body (2) of the object through joining elements (4) in each one of which it is possible to identify a shaped area (5), recessed with respect to the external surface of the joining element (4) and having the bottom corner (6) that delimits a pre-established fracture area (7) for the detachment of the support (3). Each one of the joining elements (4) includes a first body (8) projecting from the external surface that delimits the body (2) of the object and a second body (9) projecting from the support (3), the bodies (8) and (9) being connected to each other so as to define the shaped area (5) whose bottom corner (6) delimits the pre-established fracture area (7). Each one of the bodies (8, 9) has its convex curved external surface that constitutes part of the external surface of a sphere or an ellipsoid.
    Type: Application
    Filed: November 20, 2012
    Publication date: October 23, 2014
    Applicant: DWS, S.R.L.
    Inventor: Sergio Zenere
  • Patent number: 8862260
    Abstract: The invention relates to a process or device for the production of a three-dimensional object by layer-wise solidification of a material which is solidifiable under the application of electromagnetic irradiation by means of mask illumination, wherein the mask is produced using an image forming unit having a prescribed resolution, which is formed from a constant number of image forming elements (pixels) being discrete and being arranged in a spatially mutually fixed manner. For the improvement of the resolution along the outer and inner contours of the sectional areas of the object to be generated layer-wise in the sub-pixel range, a multiple illumination per layer is performed, which consists of a series of multiple images that are mutually shifted in the sub-pixel range in the image/construction plane, wherein a separate mask/bitmap is produced for each shifted image.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: October 14, 2014
    Assignee: Envisiontec GmbH
    Inventors: Alexandr Shkolnik, Hendrik John, Ali El-Siblani
  • Patent number: 8845949
    Abstract: The present invention relates to a new and improved stereolithography method and system for generating a three-dimensional object by forming successive, adjacent, cross-sectional laminae of that object, thereby providing an object being specially processed to reduce differential shrinkage.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: September 30, 2014
    Assignee: Materialise N.V.
    Inventor: Sam Coeck
  • Patent number: 8843859
    Abstract: The invention provides for the acceleration of a source mask optimization process. In some implementations, a layout design is analyzed by a pattern matching process, wherein sections of the layout design having similar patterns are identified and consolidated into pattern groups. Subsequently, sections of the layout design corresponding to the pattern groups may be analyzed to determine their compatibility with the optical lithographic process, and the compatibility of these sections may be classified based upon a “cost function.” With further implementations, the analyzed sections may be classified as printable or difficult to print, depending upon the particular lithographic system. The compatibility of various sections of a layout design may then be utilized to optimize the layout design during a lithographic friendly design process. For example, during the design phase, sections categorized as difficult to print may be flagged for further optimization, processing, or redesign.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: September 23, 2014
    Assignee: Mentor Graphics Corporation
    Inventors: Juan Andres Torres Robles, Oberdan Otto, Yuri Granik
  • Publication number: 20140277679
    Abstract: Disclosed are methods and systems for using hieroglyphs for communication in a rapid fabrication environment. The method includes receiving, by a control system for an articulated robotic arm, one or more images of a fabrication machine build space. The method includes identifying, by the control system, a hieroglyph present in the one or more images and translating the identified hieroglyph into one or more instructions for manipulation of the articulated robotic arm. The method includes causing the articulated robotic arm to carry out the instructions translated from the identified hieroglyph. Accordingly foreign objects are inserted into fabricated objects during an automated rapid fabrication process without extensive redesign of the rapid fabrication machine. In some implementations, an unmodified third-party stereolithographic rapid fabrication machine can be used.
    Type: Application
    Filed: March 14, 2014
    Publication date: September 18, 2014
    Applicant: Northeastern University
    Inventors: Brian Weinberg, Constantinos Mavroidis
  • Patent number: 8838263
    Abstract: The unique advantages of computer-controlled fabrication of a patient-specific orthotic device using an automated fabrication machine capable of following computer instructions to create 3D surface contours and new developments in non-invasive three-dimensional (3D) scanning have made it possible to acquire digital models of freeform surfaces such as the surface anatomy of the human body and to then fabricate such a patient-specific device with high precision. Such a patient-specific device brings significant improvement in patient-specific fit, comfort, and function of medical devices (and, in particular, to orthoses that require a close fit to the wearer's body to act effectively). The combination of these two technologies is ideally suited for the development of patient-specific orthotic devices. A patient specific ankle-foot orthotic device using this technology is disclosed. This exemplary device is used to help stabilize the ankle-foot region, for example, in patients with impaired gait.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: September 16, 2014
    Assignees: Spaulding Rehabilitation Hospital Corporation, Northeastern University, Technest Holding, Inc.
    Inventors: Mark L. Sivak, Richard G. Ranky, Joseph A. DiPisa, Alyssa Leigh Caddle, Kara Lyn Gilhooly, Lauren Chiara Govoni, Seth John Sivak, Michael Lancia, Paolo Bonato, Constantinos Mavroidis
  • Patent number: 8832611
    Abstract: Systems and methods for process aware metrology are provided. One method includes selecting nominal values and one or more different values of process parameters for one or more process steps used to form the structure on the wafer, simulating one or more characteristics of the structure that would be formed on the wafer using the nominal values, and determining parameterization of the optical model based on how the one or more characteristics of the structure vary between at least two of the nominal values and the one or more different values.
    Type: Grant
    Filed: June 17, 2013
    Date of Patent: September 9, 2014
    Assignee: KLA-Tencor Corp.
    Inventors: Xuefeng Liu, Yung-Ho Alex Chuang, John Fielden, Bin-Ming Benjamin Tsai, Jingjing Zhang
  • Patent number: 8806394
    Abstract: Described herein are methods for matching the characteristics of a lithographic projection apparatus to a reference lithographic projection apparatus, where the matching includes optimizing projection optics characteristics. The projection optics can be used to shape wavefront in the lithographic projection apparatus. According to the embodiments herein, the methods can be accelerated by using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).
    Type: Grant
    Filed: October 4, 2013
    Date of Patent: August 12, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Hanying Feng, Yu Cao, Jun Ye
  • Patent number: 8756536
    Abstract: The present invention provides a generation method of generating data for a mask pattern to be used for an exposure apparatus including a projection optical system for projecting a mask pattern including a main pattern and auxiliary pattern onto a substrate, including a step of setting a generation condition under which the auxiliary pattern is generated, and a step of determining whether a value of an evaluation function describing an index which indicates a quality of an image of the mask pattern calculated, wherein if it is determined that the value of the evaluation function falls outside a tolerance range, the generation condition is changed to set a new generation condition.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: June 17, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventor: Tadashi Arai
  • Patent number: 8738166
    Abstract: There is provided a method for manufacturing a three-dimensional shaped object. The method of the present invention comprises the repeated steps of: (i) forming a solidified layer by irradiating a predetermined portion of a powder layer on a base plate with a light beam, thereby allowing a sintering of the powder in the predetermined portion or a melting and subsequent solidification thereof; and (ii) forming another solidified layer by newly forming a powder layer on the resulting solidified layer, followed by the irradiation of a predetermined portion of the powder layer with the light beam; wherein the solidified layers are formed such that they have a high-density portion whose solidified density is 95 to 100% and a low-density portion whose solidified density is 0 to 95% (excluding 95%); and wherein the high-density portion is a portion of the three-dimensional shaped object, to which the force is applied when the three-dimensional shaped object is used.
    Type: Grant
    Filed: February 23, 2010
    Date of Patent: May 27, 2014
    Assignee: Panasonic Corporation
    Inventors: Satoshi Abe, Masataka Takenami, Isao Fuwa, Yoshikazu Higashi, Norio Yoshida
  • Patent number: 8713489
    Abstract: A parameter correction method includes: obtaining, from a variability-aware simulation, a simulation result value of a predetermined product performance for a reference candidate value set concerning statistics of predetermined product characteristics; calculating a likelihood by substituting the reference candidate value set, the obtained simulation result value, statistics of measurement values of the predetermined product characteristics and a measurement value of the predetermined product performance into a likelihood function that is defined from a probability density function for the statistics of the predetermined product characteristics and a probability density function for the predetermined product performance, and is a function to calculate a combined likelihood of the statistics of the predetermined product characteristics and the predetermined product performance; and searching for a reference candidate value set in case where the calculated likelihood becomes maximum, by carrying out the obtaini
    Type: Grant
    Filed: March 21, 2011
    Date of Patent: April 29, 2014
    Assignee: Fujitsu Limited
    Inventors: Hiroyuki Higuchi, Hidetoshi Matsuoka
  • Patent number: 8707221
    Abstract: Embodiments of the invention include systems and methods for automatically predicting production yield for a circuit assembly according to attributes of its components and defect data mapped thereto. Embodiments receive a proposed design specification for a circuit assembly, including bill of materials (BOM) and schematic data, at a yield prediction environment. The yield prediction environment maps a set of attributes to each component in the BOM and maps a set of possible defects to each component according to its attributes. Defects may be further mapped to a manufacturing process assigned to populate each component in the circuit assembly. The defects are associated with predicted frequencies of occurrence, which can be used to roll up a yield prediction for the circuit assembly. Embodiments further allow “what-if” analyses to be performed so that different yield prediction results can be compared according to different form factor options and/or different manufacturing process options.
    Type: Grant
    Filed: October 19, 2012
    Date of Patent: April 22, 2014
    Assignee: Flextronics AP, LLC
    Inventor: Michael Anthony Durkan
  • Patent number: 8707222
    Abstract: In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.
    Type: Grant
    Filed: November 27, 2012
    Date of Patent: April 22, 2014
    Assignee: Gauda, Inc.
    Inventors: P. Jeffrey Ungar, Ilhami H. Torunoglu
  • Patent number: 8703037
    Abstract: A solid imaging apparatus and method employing sub-pixel shifting in multiple exposures of the digitally light projected image of a cross-section of a three-dimensional object on a solidifiable liquid medium. The multiple exposures provide increased resolution, preserving image features in a three-dimensional object and smoothing out rough or uneven edges that would otherwise be occur using digital light projectors that are limited by the number of pixels in an image projected over the size of the image. Algorithms are used to select pixels to be illuminated within the boundary of each image projected in the cross-section being exposed.
    Type: Grant
    Filed: June 9, 2010
    Date of Patent: April 22, 2014
    Assignee: 3D Systems, Inc.
    Inventors: Charles W. Hull, Jouni P. Partanen, Charles R. Sperry, Patrick Dunne, Suzanne M. Scott, Dennis F. McNamara, Chris R. Manners