Abstract: A method of creating photo mask data includes preparing design data of a photo mask, generating drawing data of the photo mask by using the design data, generating inspection control information configured to control inspection of defect on the photo mask by using the drawing data, and generating drawing and inspection data including the drawing data and the inspection control information by providing the drawing data with the inspection control information.

Abstract: A method for manufacturing a co-molded insert part for use in composite, plastic, or metal parts is disclosed. The method comprises the step of providing a three-dimensional molding insert produced by a layer additive manufacturing process. The method further comprises the step of applying a layer material in contact with at least a portion of the molding insert. The method further comprises the step of co-molding the layer material and the molding insert simultaneously to produce a co-molded insert part.

Abstract: A manufacturing method for producing ceramic item from a photocurable ceramic filled material by stereolithography. The method compensates for the anisotropic shrinkage of the item during firing to produce a dimensionally accurate item.

Abstract: Variations are characterized in feature dimensions of an integrated circuit that is to be fabricated in accordance with a design by a process that produces topographical variation in the integrated circuit, the variations in feature dimension being caused by the topographical variations. The process includes lithography or etch. Predicted characteristics are verified to conform to the design, the characteristics including feature dimensions or electrical characteristics. A process is selected for use in fabricating the integrated circuit based on the relative predicted variations. Chip-level features of a design of an integrated circuit are verified for manufacture within focus limitations of a lithographic tool. Whether a design of a level of an integrated circuit can be lithographically imaged in accordance with the design is predicted, and if it cannot be, the design or processing parameters are adjusted so that it can be.

Abstract: A method of manufacturing a rapid prototype overmold for locating a dental implant analog in a modified stone model for use in creating a tooth prosthesis is provided. An impression of a mouth having a first installation site that has a dental implant and a gingival healing abutment with at least one informational marker installed is taken. A stone model based on the impression is prepared. The model is scanned. A three-dimensional computer model of the installation site on a CAD program using data from the scan is created. The at least one informational marker is determined to gather information about the location of the dental implant. Abutment dimensional information based on the three-dimensional image and the at least one informational marker is developed. Overmold rapid prototype dimensional information based on the three-dimensional image is developed. The overmold rapid prototype adapted to fit over the modified stone model is fabricated.

Abstract: A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern is partitioning into subsets, which are distributed to processors. Then, a set of second mask patterns, each of which corresponds to one of the subsets, is determined. Moreover, at least one of the second set of mask patterns may be determined by: providing a first mask pattern that includes distinct types of regions corresponding to distinct types of regions of the photo-mask, calculating a gradient of a function, and determining a second mask pattern based, at least in part, on the gradient. Note that the function may depend on the first mask pattern and an estimate of a wafer pattern that results from the photolithographic process, and that the gradient may be calculated in accordance with a formula obtained by taking a derivative of the function.

Abstract: Solid imaging apparatus and methods for use are disclosed that reduce the amount of uncured solid imaging build material remaining on a completed build object following the completion of the solid imaging build process. The amount of uncured build material is reduced through the use of either an uncoating web that removes excess build material from the build object during the course of the building process or an ink jet source of build material that uses only as much build material as is necessary for the fabrication of the build part. Also disclosed is an imager assembly for use with such a solid imaging apparatus that incorporates two or more individual imagers in an array and accounts for variations in the intensity and alignment of adjacent imagers. The apparatus can be modified for semi-continuous operation and for integrating into a manufacturing operation, if desired.

Abstract: Provided is a volume element printing system for printing a three-dimensional object. The system includes a first printhead group having a plurality of first printheads configured to print a first voxel layer on a substrate, and at least one second printhead group having a plurality of second printheads downstream from the first group. The second printhead group is configured to print a subsequent voxel layer on at least part of the first layer, said second printheads being reconfigurable as backup printheads for the first printheads in case of failure. The system also includes an object insertion device configured to insert an object into a cavity defined by the voxel layers, and a conveyor configured to convey the substrate past the printhead groups. Also included is a control system configured to control and monitor the printhead groups, the object insertion device and the conveyor, and dynamically to reconfigure the second printheads if failure of a first printhead is detected.

Abstract: A system for implanting a temporary anchorage device in a jaw bone of a patient makes use of a digital representation of at least a portion of the patient's dental arch, including teeth and corresponding roots, in order to select a temporary anchorage device (TAD) implant site that does not interfere with a tooth root. A surgical guide relates the information from the digital representation to an actual location in the patient's jaw bone. The surgical guide is formed to fit over at least a portion of the occlusal, buccal, labial, and/or lingual surfaces of the dental arch proximate to the selected TAD implant site and includes a physical and/or visual marker that indicates the selected TAD implant site.

Abstract: The invention provides for a volume element (voxel) printing system for printing a three-dimensional object. The system includes a first printhead group having a plurality of first printheads configured to print a first voxel layer on a substrate, and at least one second printhead group having a plurality of second printheads downstream from the first group. The second group is configured to print a subsequent voxel layer on at least part of the first layer. The system also includes an object insertion device configured to insert objects into voids in the voxel layers, and a conveyor to operatively convey the substrate past the printhead groups. Also included is a control system to control and monitor the printhead groups, the object insertion device and the conveyor.

Abstract: In a mask data generation method, when auxiliary patterns are arranged with respect to a device pattern, an arrangement rule for a tip of the device pattern is designed to be different from that for other portions. For portions that are corrected to a large extent by an OPC process, such as the tip of the device pattern, an auxiliary pattern is spaced at an increased distance from the device pattern. Specifically, a distance at which an auxiliary pattern is spaced from the tip of the device pattern is set to be longer than a distance at which an auxiliary pattern is spaced from a long side of the device pattern.

Abstract: The cross-sectional shape data of a three-dimensional model is divided according to work small areas obtained by dividing a work entire area where optical shaping work is performed into a plurality of areas, and work small area data which is cross-sectional shape data corresponding to said work small areas is generated. Also, the work small area data is enlarged with offset width based on the contracting ratio of a light hardening resin, and areas, which are wider than the work small areas on the surface of the light hardening resin by the offset width, are subjected to one-shot exposure based on the enlarged work small area data to form a hardening layer for each of the work small areas. The present invention can be applied to, for example, an optical shaping apparatus.

Abstract: A prediction model for exposure dose is indicated by the following formula, E=E0+EC, wherein E represents an optimized exposure dose, E0 represents a preset exposure dose of a process control system, and EC represents an exposure dose compensation value, and EC=[(MTTdiff/X)/(CDmask/X)]×(ES/A?)×(Wlast+Wavg), wherein MTTdiff represents the differences between the MTT value of a previous lot and the MTT value of a next lot, CDmask represents the actual critical dimension of the mask, X represents the magnification of the mask, ES represents the actual exposure dose of a previous lot, A? represents an experimental value obtained from the results of different lots, Wlast represents the last batch of weights and Wavg represents an average weight, and CDmask, ES, A?, Wlast and Wavg are set parameters built into the process control system.

Abstract: A method for calculating area values of a pattern written by using a charged particle beam, includes virtually dividing a pattern into a plurality of mesh-like first square regions surrounded by first grids defined at intervals of a predetermined size, virtually dividing the pattern into a plurality of mesh-like second square regions surrounded by second grids defined at intervals of the predetermined size, wherein the second grids being positionally deviated from the first grids by a half of the predetermined size, distributing an area value of a sub-pattern in each of the second square regions to a plurality of apexes of each of the second square regions such that a center-of-gravity position of the sub-pattern does not change, wherein the sub-pattern being a part of the pattern, and outputting the distributed area values as area values, for correcting a proximity effect, defined at the center position of each of the first square regions.

Abstract: A semiconductor mask correcting device is provided with an image acquiring unit acquiring a mask image, an extraction unit extracting only a main pattern from the mask data, an inspection unit inspecting a defective portion by comparing the extracted main pattern with a main pattern which is obtained from the mask image after a drawing by matching to each other, and a correction unit correcting the defective portion specified by the inspection unit, wherein the extraction unit includes a recognition section recognizing the main pattern and the assist pattern as a figure, a specification section specifying the assist pattern from figures which is recognized on the basis of a predetermined condition, and a main pattern extracting section extracting as the main pattern a figure other than the assist pattern.

Abstract: A method for generating a simulated aerial image of a mask projected by an optical system includes determining a coherence characteristic of the optical system. A coherent decomposition of the optical system is computed based on the coherence characteristic. The decomposition includes a series of expansion functions having angular and radial components that are expressed as explicit functions. The expansion functions are convolved with a transmission function of the mask in order to generate the simulated aerial image.

Abstract: There is provided a system for fabricating at least a portion of a denture. The system includes a three-dimensional scanning device for scanning a surface of a denture template, and a computer-readable medium including a computer program for receiving data from the scanning device, creating a 3-dimensional model of the surface, and optionally modifying the 3-dimensional model and/or adding features to the 3-dimensional model. The system also includes a fabricator for creating the at least the portion of the denture, from a selected material, based on the 3-dimensional model. The fabricator may be a device including a lathe, or a rapid prototyping machine. There is also provided a method for fabricating at least a portion of a denture.

Abstract: A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and modifying the mold to compensate for the distortions. A contact lithography system includes a design subsystem configured to generate data describing a lithography pattern; an analysis subsystem configured to identify one or more distortions likely to occur when using a mold created from the data; and a mold modification subsystem configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem.

Abstract: The present invention is a method (10) for manufacturing a three-dimensional object. The method (10) includes receiving (14) digital information of the three-dimensional object over a communication line and building (30) the three-dimensional object based at least in part on the received digital information, where at least part of the three-dimensional object is built by rapid manufacturing, and where the three-dimensional object comprises an exterior surface. The method also includes vapor smoothing (32) at least a portion of the exterior surface of the three-dimensional object.

Abstract: The present invention relates to a method of designing an orthopedic implant in which a plurality of samples of the bone are selected and a CT scan of each of the samples of the bone is taken so that the data from the CT scan can be used to generate a 3D graphical solid body model of each of the sample of the bone. The 3D graphical models are placed into a category of one or more of average, small, and large, and the center of mass and an X, Y and Z plane for each model is determined. The 3D graphical models for one category is assembled and aligned at the center of mass to create a categorized composite 3D graphical solid body model of the bone. The categorized composite 3D graphical model is sectioned at a specified interval to create a lofted contoured surface of a selected thickness which is cut to create a categorized implant profile.

Abstract: A method is provided wherein a lithographic projection apparatus is used to print a series of test patterns on a test substrate to measure printed critical dimension as function of exposure dose setting and focus setting. A full-substrate analysis of measured critical dimension data is modeled by a response model of critical dimension. The response model includes an additive term which expresses a spatial variability of the response with respect to the surface of the test substrate. The method further includes fitting the model by fitting model parameters using measured critical dimension data, and controlling critical dimension using the fitted model.

Abstract: A method and system for a high-speed datapath for a high-performance pattern generator such as an analog SLM for generating the image is disclosed. The data path has provisions for completely independent parallel data flows giving true scalability to arbitrarily high throughput. In an exemplary embodiment areas on the SLM are assigned to specific rasterizing and fracturing processors. There is an overlap between fields for blending of the edges in the pattern and for computation of interaction between features in the pattern. The datapath has data integrity checks and a recovery mode when an error condition is raised, allowing it to recover from most errors without creating new errors.

Abstract: A method and apparatus for creating a print file for printing a 3-D print using a 3-D printing system is described, the 3-D print comprising a plurality of 3-D structures printed on a substrate, each 3-D print structure having a height with respect to the substrate. A two-dimensional source image is input comprising a plurality of image pixel areas. A filtered image is obtained by applying a topographic operator to the source image to generate for every image pixel a representation of a pixel height profile, the pixel height profile corresponding to cross-sections through a 3-D print structure which is to be formed by 3-D printing. Thereby definitions of a plurality of image layers are generated from the filtered image for printing using the 3-D printing system. The print file is output based on the plurality of image layers.

Abstract: A supply part for supplying resin, a smoothing part for smoothing the resin, and an objective lens for exposing the smoothed resin to light are provided in separate positions within substantially the same horizontal plane, and a modeling part is movable by a horizontal drive mechanism under the three above-mentioned components. For processing in the three above-mentioned components, the modeling part is moved to positions immediately under the three above-mentioned components in order by the horizontal drive mechanism. Thus, the modeling part is brought as close to the three above-mentioned components as possible for processing. The exposure is performed, with the objective lens fixed to a base body. Exposure light is focused onto a resin layer on a modeling base, and the light reflected from the resin layer is received by the objective lens, directed by a beam splitter toward an image surface optical system and received as an image by a CCD camera.

Abstract: A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.

Abstract: A method is provided for performing optical proximity correction (“OPC”) verification in which features of concern of a photomask are identified using data relating to shapes of the photomask, an aerial image to be obtained using the photomask, or a photoresist image to be obtained in a photoimageable layer using the photomask. A plurality of areas of the photomask, aerial image or photoresist image are identified which incorporate the identified features of concern, where the plurality of identified areas occupy substantially less area than the total area of the photomask that is occupied by features. Enhanced OPC verification limited to the plurality of identified areas is then performed to identify problems of at least one of the photomask, aerial image or photoresist image.

Abstract: A manufacturing method for producing ceramic item from a photocurable ceramic filled material by stereolithography. The method compensates for the anisotropic shrinkage of the item during firing to produce a dimensionally accurate item.

Abstract: A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).

Abstract: Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.

Abstract: Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.

Abstract: A method of manufacturing a mask includes designing a second mask data pattern for forming a first mask data pattern, creating a first emulation pattern, which is determined from the second mask data pattern, using a first emulation, creating a second emulation pattern, which is determined from the first emulation pattern, using a second emulation, comparing a pattern, in which the first and second emulation patterns overlap, with the first mask data pattern, and manufacturing a mask layer, which corresponds to the second mask data pattern, according to results of the comparison.

Abstract: The invention relates to a method for producing a three-dimensional object by solidification of a material solidifiable under the action of electromagnetic radiation by means of energy input via an imaging unit comprising a predetermined number of discrete imaging elements (pixels), The method comprises performing solidification with exposure using bitmap mask. The bitmap mask may be formed from a stack of bitmap data provided by an overlap analysis of a three-dimensional volume completely or partially enclosing a three-dimensional model of at least a part of the three-dimensional object to be produced. Alternatively, bitmap mask may be formed from a two-dimensional data set comprising overlap information. Solidification may be performing with exposure using bitmap mask generated “on the fly”. The invention is also directed to devices, and a computer and a data carrier useful for performing or executing the method.

Abstract: An improved method, system, and computer program product is disclosed for predicting the geometric model of transistors once manufacturing and lithographic process effects are taken into consideration. This provides a much more accurate approach for modeling transistors since it is the actual expected geometric shapes that are analyzed, rather than an idealized model of the layout that does not accurately correspond to the actual manufactured IC product. The expected geometric shape includes systematic variations, which can be determined based on the layout, and the expected random variations, which can be determined based on the lithographic process.

Abstract: The simulation method is for simulating a pattern to be transferred onto a photoresist film by exposure using a photomask with a main pattern 10 and an assist pattern 12 formed on. The simulation is made, using data given by adding a bias value to a design dimension of the assist pattern as data of a dimension of the assist pattern. The simulation is made, using data given by adding a bias value to a design dimension of the assist pattern as data of a dimension of the assist pattern. The simulation can be made with high accuracy, and the fitting error can be made very small.

Abstract: A computer is provided with polyhedron corners. The computer uses the polyhedron corners to automatically determine the corresponding polyhedron edges and polyhedron areas and thus a closed polyhedron. The polyhedron corresponds to the selected portion of a volume. Only this selected portion is evaluated by the computer and is represented, in particular, by an output medium.

Abstract: The use of smooth post-ECP topography (instead of final chip topography) as an objective during dummy filling enables a computationally efficient model-based dummy filling solution for copper while maintaining solution quality. A layout can be divided into tiles and the “case” of each tile identified. Exemplary cases can include conformal fill, over fill, super fill, or super/over fill (if the ECP model cannot distinguish between super and over fill cases). One or more undesired tile cases can be converted to a desired tile case. Then, a height difference between tiles can be minimized. Dummy features can be inserted in the layout to perform the conversion and to minimize the height difference between tiles. Minimizing the CMP-effective density difference between tiles with ECP considerations can be performed to further improve planarization.

Abstract: Optical proximity correction methods and apparatus are disclosed. A simulated geometry representing one or more printed features from a reticle is generated using an optical proximity correction (OPC) model that takes into account a reticle design and one or more parameters from a process window of a stepper. An error function is formed that measures a deviation between the simulated geometry and a desired design of the one or more printed features. The error function takes into account parameters (p0 . . . pJ) from across the process window in addition to, or in lieu of, a best focus and a best exposure for the stepper. The reticle design is adjusted in a way that reduces the deviation as measured by the error function, thereby producing an adjusted reticle design.

Abstract: The present invention is a system and method for specifying custom hair pieces using three-dimensional digital acquisition devices. The system and method described herein uses electronic data acquisition techniques to electronically model a customer's head and hair line characteristics and to electronically record specifications for a custom hair piece. The electronic data containing certain head shape data and hair piece specifications is then electronically transmitted to a hair piece manufacturer for completion of the hair piece.

Abstract: A method of correcting a mask pattern is described. A testing mask including a plurality of original patterns configured according to an original drawing data is provided. The original patterns in the testing mask are transferred to a photo-resistant layer to form a plurality of first post-development patterns and measure first dimensions of the first post-development patterns. A pattern shrink process is performed on the first post-development patterns to form a plurality of first post-shrink patterns and measure second dimensions of the first post-shrink patterns. The bias of each the first dimensions and the second dimensions are calculated. The original drawing data, the first sizes, the second sizes and the bias are collected to set a database. The data of the database is used to establish an optical proximity correction (OPC) model. According to the OPC model, an original drawing data is corrected to obtain a corrected drawing data.

Abstract: Provided is a method of fabricating a photo mask. The method includes preparing a model group including optical proximity correction (OPC) models and generating a preliminary mask layout using an integrated circuit (IC) layout. A contour image may be produced from the preliminary mask layout through a simulation using an optical model. Subsequently, the preliminary mask layout may be compared with the contour image and the comparison result may be analyzed to produce analysis data for providing criteria used in selecting an OPC model. An OPC model suitable for the preliminary mask layout may be selected from the model group based on the analysis data. An OPC process may be performed on the preliminary mask layout using the selected OPC model to generate a mask layout.

Abstract: Verifying a process margin for a mask pattern includes receiving the mask pattern for patterning features on a semiconductor wafer. The mask pattern is modified according to a wafer pattern model operable to estimate a wafer pattern resulting from the mask pattern. An intermediate stage model is selected to apply to a portion of the mask pattern, where the intermediate stage model is operable to estimate an intermediate stage of the wafer pattern. A process margin of the portion is verified by selecting a test of the intermediate stage model, and performing the test on the portion to verify the process margin of the portion.

Abstract: In an apparatus and a method of forming a photoresist pattern, a photoresist-coating section coats a substrate with a photoresist composition to form a photoresist film. A light is irradiated onto the photoresist film by using an exposure section, and a developing section develops the photoresist film. A residue-sensing section senses a residue of the developed photoresist film to generate information of the residue corresponding to the sensed residue. A residue-removing section sprays a solvent in a region of the residue corresponding to the information of the residue to dissolve the residue, and the residue-removing section absorbs the residue dissolved by the solvent. Therefore, the residue is effectively removed by spraying the solvent in the region of the residue and absorbing the residue dissolved by the solvent.

Abstract: A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.

Abstract: A method for generating test patterns utilized in manufacturing a semiconductor device includes creating mini-data concerning a partial area pattern used in designing the semiconductor device, subjecting the mini-data to data processing in accordance with a condition of a manufacturing process of the semiconductor device, thereby creating processed mini-data, extracting a marginless point in the processed mini-data where a process margin is less than a predetermined threshold in a manufacturing process of the semiconductor device, determining a class of the marginless point in accordance with a criticality and a category of the marginless point, determining a parameter and a range of the parameter used for the marginless point in accordance with the class of the marginless point, and generating a plurality of test patterns to which different values of the parameter are respectively applied within the range.

Abstract: A method of printing a three-dimensional object is provided. The method comprises providing a plurality of stationary printhead layer groups, each layer group comprising at least one printhead for printing a respective layer of the object; conveying a partially-formed object past the layer groups; and simultaneously printing material from at least one printhead in each layer group, such that a plurality of different layers are printed simultaneously by the layer groups.

Abstract: Disclosed is a method and a system for measuring customer delivery service. A projected customer delivery date is generated. At least one projected output volume is determined based on the projected customer delivery date. At least one actual output volume is determined, and an accuracy of the projected customer delivery date is determined based on the at least one projected output volume and the at least one actual output volume.

Abstract: A method of forming photo masks having rectangular patterns and a method for forming a semiconductor structure using the photo masks is provided. The method for forming the photo masks includes determining a minimum spacing and identifying vertical conductive feature patterns having a spacing less than the minimum spacing value. The method further includes determining a first direction to expand and a second direction to shrink, and checking against design rules to see if the design rules are violated for each of the vertical conductive feature patterns identified. If designed rules are not violated, the identified vertical conductive feature pattern is replaced with a revised vertical conductive feature pattern having a rectangular shape. The photo masks are then formed. The semiconductor structure can be formed using the photo masks.

Abstract: A hierarchical representation encapsulates the detailed internal composition of a sub-circuit using the notion of a cell definition (a CellDef). The CellDef serves as a natural unit for operational reuse. If the computation required for the analysis or manipulation (e.g. parasitic extraction, RET, design rule confirmation (DRC), or OPC) based on a CellDef or one cell instance can be applied, with no or minimal additional effort, to all or a significant subset of other instances of the cell, very substantial reduction in computational effort may be realized. Furthermore, a hierarchical representation also allows for the partitioning of the overall analysis/manipulation task into a collection of subtasks, e.g. one per CellDef. Multiple jobs may then be distributed across a large number of computational nodes on a network for concurrent execution. While this may not reduce the aggregate computational time, a major reduction in the overall turnaround time (TAT) is in itself extremely beneficial.

Abstract: The invention relates to a method for producing a three-dimensional object by solidification of a material solidifiable under the action of electromagnetic radiation by means of energy input via an imaging unit comprising a predetermined number of discrete imaging elements (pixels). The method comprises performing solidification with exposure using bitmap mask. The bitmap mask may be formed from a stack of bitmap data provided by an overlap analysis of a three-dimensional volume completely or partially enclosing a three-dimensional model of at least a part of the three-dimensional object to be produced. Alternatively, bitmap mask may be formed from a two-dimensional data set comprising overlap information. Solidification may be performing with exposure using bitmap mask generated “on the fly”. The invention is also directed to devices, and a computer and a data carrier useful for performing or executing the method.

Abstract: One embodiment of the present invention provides a system that identifies an area in a mask layout which is likely to cause manufacturing problems due to a missing or an improperly placed assist feature. During operation, the system receives an uncorrected or corrected mask layout. The system then dissects the mask layout into segments. Next, the system identifies a problem area associated with a segment using a process-sensitivity model which can be represented by a multidimensional function that captures process-sensitivity information. Note that identifying the problem area allows a new assist feature to be added or an existing assist feature to be adjusted, thereby improving the wafer manufacturability. Moreover, using the process-sensitivity model reduces the computational time required to identify the problem area.