Stereolithography Patents (Class 700/120)
  • Patent number: 6309581
    Abstract: A method for forming a three dimensional object, the method including the steps of generating a digital representation of the object, generating a digital representation of a build style lattice having a substantially uniform, conformal tetrahedron structure, overlaying the respective representations of the object and the build style, intersecting the overlaid representations to generate a digital representation of the object incorporating the build style; and fabricating the digital representation of the object incorporating the build style by solid free form fabrication.
    Type: Grant
    Filed: February 12, 1999
    Date of Patent: October 30, 2001
    Assignee: Milwaukee School of Engineering
    Inventor: Vito R. Gervasi
  • Publication number: 20010025203
    Abstract: A method for forming a three dimensional object, the method comprising the steps of generating a digital representation of the object, generating a digital representation of a build style lattice having a substantially uniform, conformal tetrahedron structure, overlaying the respective representations of the object and the build style, intersecting the overlaid representations to generate a digital representation of the object incorporating the build style; and fabricating the digital representation of the object incorporating the build style by solid free form fabrication.
    Type: Application
    Filed: April 24, 2001
    Publication date: September 27, 2001
    Applicant: The Milwaukee School of Engineering
    Inventor: Vito R. Gervasi
  • Patent number: 6272392
    Abstract: A method (250) of extracting effective imaging system aberrations from test data collected from test structures (220) constructed from a lithography system having an imaging system associated therewith includes inputting (264) experimental critical dimension data corresponding to fabricated features (220) on a substrate (212) to a neural network (208). The method (250) also includes inputting (266) nominal critical dimension data corresponding to the fabricated features on the substrate (212) to the neural network (208) and determining (268) the effective aberrations of the imaging system associated with the lithography system used to fabricate the features (220) using the neural network (208).
    Type: Grant
    Filed: December 4, 1998
    Date of Patent: August 7, 2001
    Assignee: Advanced Micro Devices, Inc.
    Inventor: Luigi Capodieci
  • Patent number: 6267919
    Abstract: A three-dimensional object is produced by sequentially laminating a plurality of layers. The method includes setting a plurality of coordinate points at a predetermined interval on a profile of a model section corresponding to a layer to be formed, obtaining information regarding distances between a plurality of the coordinate points, and scanning a photo-curing resin solution with light from a light source, in correspondence with a direction of a straight line passing through mated coordinate points giving a distance shorter than a maximum value among the distances between a plurality of the coordinate points.
    Type: Grant
    Filed: February 17, 1999
    Date of Patent: July 31, 2001
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Kazuhiko Tanaka, Mitsuo Uchiyama, Teishirou Shibazaki, Teruo Fukumura
  • Patent number: 6264873
    Abstract: An improved method for stereolithographically making an object by alternating the order in which similar sets of vectors are exposed over two or more layers. In another method, a pattern of tightly packed hexagonal tiles are drawn. Each tile is isolated from its neighboring tiles by specifying breaks of unexposed material between the tiles. Using an interrupted scan method, vectors are drawn with periodic breaks along their lengths. In another method, modulator and scanning techniques are used to reduce exposure problems associated with the acceleration and deceleration of the scanning system when jumping between vectors or changing scanning directions. In another method, a capability for automatically inserting vents an drains into a three-dimensional object representation is provided.
    Type: Grant
    Filed: September 24, 1999
    Date of Patent: July 24, 2001
    Assignee: 3D Systems, Inc.
    Inventors: John J. Gigl, Dennis R. Smalley, Jan Richter, Thomas H. Pang, Kerry J. Allen, Chris R. Manners, Paul F. Jacobs, Hop D. Hguyen, Charles W. Hull, Richard N. Leyden
  • Patent number: 6261506
    Abstract: A method and apparatus for building three-dimensional objects having an internal structure, wherein the structure is discontinuous and is composed from a plurality of patterns and bridging patterns formed on a plurality of levels, wherein a bridging level and pattern reside between previous and subsequent levels from which the bridging pattern obtains at least a portion of its pattern. A portion of the bridging pattern is obtained from the pattern on the previous level and a portion of the bridging pattern is obtained from the pattern on the subsequent level.
    Type: Grant
    Filed: November 13, 1998
    Date of Patent: July 17, 2001
    Assignee: 3D Systems, Inc.
    Inventors: Hop D. Nguyen, Jouni P. Partanen
  • Patent number: 6261507
    Abstract: An improved method for stereolithographically making an object by alternating the order in which similar sets of vectors are exposed over two or more layers. In another method, a pattern of tightly packed hexagonal tiles are drawn. Each tile is isolated from its neighboring tiles by specifying breaks of unexposed material between the tiles. Using an interrupted scan method, vectors are drawn with periodic breaks along their lengths. In another method, modulator and scanning techniques are used to reduce exposure problems associated with the acceleration and deceleration of the scanning system when jumping between vectors or changing scanning directions. In another method, a capability for automatically inserting vents an drains into a three-dimensional object representation is provided.
    Type: Grant
    Filed: September 24, 1999
    Date of Patent: July 17, 2001
    Assignee: 3D Systems, Inc.
    Inventors: John J. Gigl, Dennis R. Smalley, Thomas H. Pang, Kerry J. Allen, Paul F. Jacobs, Hop D. Nguyen, Charles W. Hull, Richard N. Leyden
  • Patent number: 6241934
    Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: June 5, 2001
    Assignee: 3D Systems, Inc.
    Inventors: Michael A. Everett, Ross D. Beers
  • Patent number: 6208907
    Abstract: A method and apparatus is provided for enabling the transformation of a domino circuit to a static circuit without requiring the re-design of the chip or integrated circuit mask set. The domino circuit masks may be designed to include additional unconnected devices as appropriate which may be added or connected into the circuit after chip design release by changing only interconnection masks. Spare devices can be added and selectively used to make a domino circuit metal-mask programmable into a logically equivalent static circuit. In a first exemplary method, extra devices are added to, and/or existing devices are re-wired in the domino circuitry to make a complementary equivalent static gate. In a second exemplary methodology, the domino circuit is converted into a pseudo-NMOS circuit using devices already available in the circuit and modifying the circuit connections thereto.
    Type: Grant
    Filed: January 30, 1998
    Date of Patent: March 27, 2001
    Assignee: International Business Machines Corporation
    Inventors: Christopher McCall Durham, Visweswara Rao Kodali, Douglas Ele Martin, Harsh Dev Sharma
  • Patent number: 6192510
    Abstract: A method of extracting data of at least one aperture mask pattern from design data which includes write-required patterns and repeating units, so that boundary lines of the at least one aperture mask pattern are different from boundary lines of the repeating unit on the design data and so that the at least one aperture mask pattern completely includes at least one of the write-required patterns without partially or incompletely including the write-required pattern.
    Type: Grant
    Filed: July 20, 1998
    Date of Patent: February 20, 2001
    Assignee: Nec Corporation
    Inventor: Yasuhisa Yamada
  • Patent number: 6189136
    Abstract: A method for integrating correction features onto selected design features of an integrated circuit mask. The method includes identifying a minimum dimension in the integrated circuit mask. The minimum dimension is configured to define transistor gate electrode features or any critical feature geometry. The method then includes removing feature geometries that are dimensionally larger than the minimum dimension. After the removing operation, correction features are integrated with selected ends of the transistor electrode features that have the minimum dimension to produce corrected transistor gate electrode features. Then, the method includes the operation of adding the corrected transistor gate electrode features to the removed feature geometries that are dimensionally larger than the minimum dimension to produce a corrected integrated circuit mask.
    Type: Grant
    Filed: July 20, 1998
    Date of Patent: February 13, 2001
    Assignee: Philips Electronics, North America Corp.
    Inventor: Subhas Bothra
  • Patent number: 6180050
    Abstract: The purpose of the invention is to provide a solid model creation apparatus that is small in size and inexpensive. A multiplicity of blue LEDs are prepared, optical fibers are connected thereto, and GRIN lenses are arranged at the ends of the tips of the respective optical fibers to constitute an exposing head 23. The exposing head 23 forms images of the end faces of the respective optical fibers in a photocurable resin exposure region 24 as light spots 55. The diameter of a light spot 55 is, for example, 0.5 mm, but the size of a pixel 71 within the exposure region 24 is much smaller; for example, 62.5&mgr;. The multiplicity of optical fibers at the exposing head 23 are arrayed in a matrix such that they are displaced in staggered fashion so that respective light spots 55 are lined up at the pitch 62.5&mgr; of the pixels 71 in the primary scan (Y-axis) direction.
    Type: Grant
    Filed: July 9, 1999
    Date of Patent: January 30, 2001
    Assignees: The Institute of Physical and Chemical Research, NTT Data Corporation
    Inventors: Mahito Arai, Toshiki Niino, Takeo Nakagawa
  • Patent number: 6179601
    Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making high resolution objects utilizing low resolution materials which are limited by their inability to reliably form coatings of a desired thickness. The formation of coatings of such materials is limited to a Minimum Recoating Depth (MRD), when formed over entirely solidified laminae, which is thicker than the desired layer thickness or object resolution. Data manipulation techniques result in layers of material (and laminae) of the object being categorized as non-consecutive primary layers (laminae) and secondary layers (laminae) positioned intermediate to the primary layers (laminae).
    Type: Grant
    Filed: May 10, 1999
    Date of Patent: January 30, 2001
    Assignee: 3D Systems, Inc.
    Inventors: Theodore R. Kruger, Chris R. Manners, Hop D. Nguyen
  • Patent number: 6180049
    Abstract: A solid freeform fabrication process and apparatus for making a three-dimensional object. The process includes the steps of (1) positioning a material deposition sub-system a selected distance from a target surface, (2) operating this sub-system to deposit materials onto the target surface by carrying out the sub-steps of (a) operating a multiple-channel fluid phase delivery device of the deposition sub-system for supplying multiple fluid compositions to a small region proximate the target surface and (b) operating a focused energy source to produce a phase change zone at this region, thereby inducing deposition of materials onto the target surface, and (3) during the material deposition process, moving the deposition sub-system and the target surface relative to one another in a plane defined by first and second directions and in a third direction orthogonal to this plane to form deposition materials into a three dimensional shape. These steps are preferably executed under the control of a computer system.
    Type: Grant
    Filed: June 28, 1999
    Date of Patent: January 30, 2001
    Assignee: Nanotek Instruments, Inc.
    Inventors: Bor Z. Jang, Junsheng Yang
  • Patent number: 6175953
    Abstract: The present invention is a method and apparatus for systematically applying proximity corrections to a mask pattern, wherein the pattern is divided into a grid of equally sized grid rectangles, an inner rectangle comprising a plurality of grid rectangles is formed, an outer rectangle comprising a second plurality of grid rectangles and the inner rectangle is formed and proximity correction is applied to the pattern contained within the inner rectangle as a function of the pattern contained within the outer rectangle.
    Type: Grant
    Filed: March 3, 1998
    Date of Patent: January 16, 2001
    Assignee: LSI Logic Corporation
    Inventors: Ranko Scepanovic, Dusan Petranovic, Edwin Jones, Richard Schinella, Nicholas F. Pasch, Mario Garza, Keith K. Chao, John V. Jensen, Nicholas K. Eib
  • Patent number: 6159411
    Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making three-dimensional objects with simplified correlation of building parameters with object data. Object data is preferably correlated to (1) object build parameters that are used in solidifying object portions of layers of the material, (2) recoating parameters that are used in forming layers of material that include object data, (3) support build parameters that are used in solidifying support portions of layers of the material, (4) recoating parameters that are used in forming layers of material that include support data but no object data, and (5) parameters for use in generating a support structure that will be used to support the object during its formation. A style file is identified with each set of parameters. An algorithm (i.e. style wizard) is used to select among a plurality of styles of each type.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: December 12, 2000
    Assignee: 3D Systems, Inc.
    Inventors: Rajeev B. Kulkarni, Chris R. Manners
  • Patent number: 6132667
    Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: October 17, 2000
    Assignee: 3D Systems, Inc.
    Inventors: Ross D. Beers, Michelle D. Guertin
  • Patent number: 6129884
    Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment, control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: October 10, 2000
    Assignee: 3D Systems, Inc.
    Inventors: Ross D. Beers, Arvind Chari, Jouni P. Partanen, Nansheng Tang
  • Patent number: 6131052
    Abstract: A semiconductor manufacturing system capable of reducing time required for manufacture of semiconductors with effective use of waiting time of lots in storage equipment is provided. While a lot including a plurality of semiconductor wafers are stored in storage equipment, the semiconductor wafers in the lot are subjected to non-processing steps carried out by non-processing apparatuses such as measuring apparatuses, inspecting apparatuses, and contaminant removing apparatuses.
    Type: Grant
    Filed: January 28, 1997
    Date of Patent: October 10, 2000
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Cozy Ban, Kiyoshi Demizu
  • Patent number: 6126884
    Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: October 3, 2000
    Assignee: 3D Systems, Inc.
    Inventors: Thomas A. Kerekes, Ross D. Beers
  • Patent number: 6103176
    Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making three-dimensional objects with enhanced control of coating parameters used when forming layers of liquid or other fluid-like material in preparation for forming laminae of the object. The each lamina of the object is treated as either a primary laminae or secondary laminae. Only minority portions of the secondary layers are solidified when their associated layers are formed. Primary laminae are solidified in majority portions, along with previously unsolidified portions of secondary lamina, when their associated layers are formed. Recoating parameters are supplied for groups of primary layers and secondary layers such that coating formation may be controlled differently for primary layers and for secondary layers. Coating control for secondary layers may be based on the position of individual secondary layers, or sets of secondary layers, relative to the primary layers.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: August 15, 2000
    Assignee: 3D Systems, Inc.
    Inventors: Hop D. Nguyen, Chris R. Manners
  • Patent number: 6048188
    Abstract: An improved stereolithography system for generating a three-dimensional object by creating a cross-sectional pattern of the object to formed at a selected surface of a fluid medium capable of altering its physical state in response to appropriate synergistic stimulation by impinging radiation, particle bombardment or chemical reaction, information defining the object being structurally specified to reduce curl, stress and distortion in the ultimately formed object, the successive adjacent laminae, representing corresponding successive adjacent cross-sections of the object, being automatically formed and integrated together to provide a step-wise laminar buildup of the desired object, whereby a three-dimensional object is formed and drawn from a substantially planar surface of the fluid medium during the forming process.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: April 11, 2000
    Assignee: 3D Systems, Inc.
    Inventors: Charles W. Hull, Stuart T. Spence, Charles W. Lewis, Wayne S. Vinson, Raymond S. Freed, Dennis R. Smalley
  • Patent number: 6029096
    Abstract: This invention relates to the stepwise layer-by-layer formation of a three-dimensional object through application of the principles of stereolithography and to the automatic detection of surface features of each layer of a three-dimensional object to manufacture parts more reliably, more accurately and more quickly. Automatic detection of trapped volume regions and size of solidified cross-sectional regions are disclosed. Automatic selection of recoating styles is made based on(1) the detected regions, (2) empirically or otherwise determined optimum recoating styles for different types of regions, and (3) a look-up table, other correlation system, or processor for associating recoating style information with laminae containing particular identified regions.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: February 22, 2000
    Assignee: 3D Systems, Inc.
    Inventors: Chris R. Manners, Dennis R. Smalley