Quality Control Patents (Class 702/84)
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Publication number: 20100004772Abstract: Material management systems and methods include material storage vessels with information (e.g., electronic information) storage. Information may be communicated from a storage device to a process tool controller and employed to set or adjust a process tool operating parameter. Material information may be determined by remote analysis and subsequently communicated to an electronic information storage device of a vessel containing such material. Location and movement of material storage vessels within a customer facility may be automatically tracked, with further transfer of material-specific information. Product information may be associatively stored with material-specific information utilized in product manufacture.Type: ApplicationFiled: July 10, 2007Publication date: January 7, 2010Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Scott Elfstrom, Kathleen L. Hanson, Steven E. Haumersen, Thomas D. Johnson, Clari Nolet, William Smeaton
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Patent number: 7638001Abstract: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.Type: GrantFiled: May 6, 2005Date of Patent: December 29, 2009Assignee: Kabushiki Kaisha ToshibaInventor: Daisuke Kawamura
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Methods for predicting dimensional stability of a wood product based on differential characteristics
Patent number: 7630847Abstract: Methods are provided for predicting warp of a wood product given its differential characteristics, such as, for example, curvature. The methods may involve measuring at least one original warp profile for each of one or more first wood products; measuring one or more inputs on the one or more first wood products; converting the warp profile, for each of the one or more first wood products, into a differential characteristic profile; developing a prediction algorithm based on the one or more inputs and the differential characteristic profile; measuring one or more inputs of the given wood product; inputting the one or more inputs of the given wood product into the prediction algorithm; and determining a differential characteristic profile for the given wood product based on the prediction algorithm.Type: GrantFiled: March 26, 2007Date of Patent: December 8, 2009Assignee: Weyerhaeuser NR CompanyInventors: John E Jones, III, Mark A Stanish -
Publication number: 20090299670Abstract: A process control device includes: a determination unit reading device data generated by sensors provided at a process device and determining whether the process device is in a normal state or not; a correction value calculation unit calculating a correction value of a recipe by using measurement data generated by a measuring device provided at a succeeding stage of the process device and the device data when the determination unit determines that the process device is in the normal state, and calculating a correction value of the recipe by using the measurement data when the determination unit determines that the process device is not in the normal state; and a recipe correction unit correcting the recipe to be supplied to the process device based on the correction value outputted by the correction value calculation unit and transmitting the recipe to the process device.Type: ApplicationFiled: June 2, 2009Publication date: December 3, 2009Applicant: Sony CorporationInventors: Toshiya Hirai, Minkyu Sohn
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Publication number: 20090299669Abstract: A method of yield management for semiconductor manufacture and an apparatus thereof are provided. The method includes the following steps. Defect data of a layer of a semiconductor wafer is obtained, wherein the defect data includes sizes and locations of defects with respect to the layer. A layout with respect to the layer is obtained. And a critical area analysis is performed in parallel for the layer by a plurality of processing devices according to the defect data and the layout to determine locations of defects falling into a critical area of the layer among the locations of the defects.Type: ApplicationFiled: December 18, 2008Publication date: December 3, 2009Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANYInventors: I-Yun Leu, Wen-Ju Yang, Jen-Kuei Wu, Yun-Yong Shen, Huan-Yung Chang
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Patent number: 7620513Abstract: In order to easily and efficiently carry out various characteristic evaluations of optical fibers which have been laid down, a table file which is for carrying out association of optical fibers serving as measuring objects with measured data when the optical fibers have been measured, based on optical fiber management information provided in advance of undertaking a cable laying/maintenance construction, such as various types of information on the optical fibers serving as measuring objects, and information on a construction site, and the like, is created at an external terminal. An OTDR measures the optical fibers serving as measuring objects based on the table file created at the external terminal, and stores measured result data in which the measured optical fibers and measured data of the optical fibers have been associated with one another, and edited result data expressing edited contents when the table file and the measured result data have been edited.Type: GrantFiled: October 31, 2006Date of Patent: November 17, 2009Assignee: Anritsu CorporationInventors: Norio Nakayama, Yasuhiro Miyake, Yoshifumi Imazu, Shigeo Hori, Keita Masuhara
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Publication number: 20090281755Abstract: In operation to obtain an optimal observation condition in a review system, the number of trial reviews can be reduced to improve efficiency of the operation. For a defect review conducted by the review system, a recipe parameter management system stores, as recipe parameter setting history in a recipe parameter setting history DB, recipe parameter setting values of recipe parameters set when the defect review is conducted, the number of trial reviews carried out until the recipe parameter setting values are set, and defect images obtained when the defect review is conducted. The apparatus displays, on a terminal, histograms and the numbers of trial reviews generated based on the recipe parameter setting history data stored in the recipe parameter setting history DB. Hence, the operator can easily obtain data regarding the recipe parameter setting in the past.Type: ApplicationFiled: April 27, 2009Publication date: November 12, 2009Inventor: Tomohiro Funakoshi
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Patent number: 7616927Abstract: One or more median filter circuits are used to filter radio link control measurements corresponding to one or more radio link parameters of interest, such as received signal quality or round trip delay measurements, such as might be used by a base station to trigger mobile station handoff. As such measurements are particularly susceptible to measurement outliers arising from rapid but short-lived changes in radio link propagation paths, for example, the application of median filtering to such measurements is particularly advantageous. That is, by operation of median filtering, which is a non-linear filtering process, outliers in a stream of control measurements, such as are caused by instantaneous changes in channel fading or other propagation phenomena, are discarded rather than averaged in with the other measurements. Non-linear filtering as implemented by exemplary median filtering does not impair or otherwise limit the bandwidth of the underlying control measurements.Type: GrantFiled: April 27, 2004Date of Patent: November 10, 2009Assignee: Telefonaktiebolaget LM Ericsson (publ)Inventor: Lloyd Richard Rochester, III
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Patent number: 7599755Abstract: A computer readable medium comprising instructions which when executed by a computer system causes the computer to implement a method for creating a dynamic value network map of a process flow is provided. For a plurality of processed objects, the method identifies corresponding value stream metrics and triggers a state engine to simulate the process flow. The state engine is configured to manage all operations rules related to the value network map. The method dynamically updates the value stream metrics during the simulation of the value network map.Type: GrantFiled: December 5, 2005Date of Patent: October 6, 2009Inventor: Hosni (I) Adra
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Publication number: 20090228217Abstract: A recipe server executes an inspection region setup process for designating the inspection region of the object of inspection as the initial setting of a recipe; the recipe server executes optical condition setup process for setting an optical condition for the image pickup; a substrate inspection apparatus executes an image obtainment process for obtaining image data by picking up the image of the inspection object using a tentative recipe including the inspection region and optical condition which are designated by the recipe server; the recipe server executes a recipe tuning process for generating an adjusted recipe by tuning the tentative recipe using image data obtained by the substrate inspection apparatus; and the substrate inspection apparatus execute an inspection process for inspecting the inspection object on the basis of the adjusted recipe tuned by the recipe server.Type: ApplicationFiled: March 5, 2009Publication date: September 10, 2009Inventor: Tetsuya FUKUSHIMA
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Publication number: 20090210183Abstract: Methods, apparatus, and systems for computing, analyzing, and improving integrated circuit yield and quality are disclosed herein. For example, in one exemplary method disclosed herein, information is received from processing test responses of integrated circuits designed for functional use in electronic devices. In this embodiment, the information is indicative of integrated circuit failures observed during testing of the integrated circuits and of possible yield limiting factors causing the integrated circuit failures. Probabilities that one or more of the possible yield limiting factors in the integrated circuits actually caused the integrated circuit failures are determined by statistically analyzing the received information. The probabilities that one or more possible yield limiting factors actually caused the integrated circuit failures are reported.Type: ApplicationFiled: March 31, 2009Publication date: August 20, 2009Inventors: Janusz Rajski, Gang Chen, Martin Keim, Nagesh Tamarapalli, Manish Sharma, Huaxing Tang
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Patent number: 7574308Abstract: A system, method and computer product track a stent characteristic during a coating process. For example, a method comprises receiving an implantable medical device from a coating apparatus, after the coating apparatus has applied a coating to the implantable medical device; measuring a characteristic of the implantable medical device with the coating; determining if the characteristic of the implantable medical device with the coating is within selected parameters; and generating feedback to the coating apparatus based on the determining, the feedback informing the coating apparatus to adjust a variable for future coatings, if so determined.Type: GrantFiled: September 8, 2005Date of Patent: August 11, 2009Assignee: Advanced Cardiovascular Systems, Inc.Inventor: Thomas David Esbeck
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Publication number: 20090198465Abstract: A manufacturing quality control system for monitoring the proximity of a workpiece to a machine tool is disclosed. The system includes a proximity sensor attached to the machine tool for deriving a first distance measurement based upon the distance between the workpiece and the machine tool. A wireless transmitter generates a radio frequency signal including the first distance measurement. A remote data processing device communicates with the wireless transmitter to retrieve the first distance measurement and display various derivations of sensor data.Type: ApplicationFiled: January 31, 2008Publication date: August 6, 2009Inventors: Doug Dean Decker, Timothy Jackson Shinbara, Joseph Paul Wardell
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Patent number: 7571074Abstract: A method for facilitating an ODP (optical digital profile) measurement of a semiconductor wafer. The method includes obtaining real time wafer characteristic data for a measurement site on the wafer and detecting a measured diffraction signal from a structure within the measurement site of the wafer. The measured diffraction signal is matched with a simulated diffraction signal stored in a wafer characteristic dependent profile library. A hypothetical profile structure associated with the simulated diffraction signal in the wafer characteristic dependent profile library is then identified. The real time wafer characteristic data is used to facilitate at least one of the matching and identifying. The real time wafer characteristic data may be real time wafer thickness data.Type: GrantFiled: January 30, 2007Date of Patent: August 4, 2009Assignee: Tokyo Electron LimitedInventors: Merritt Funk, Sachin Deshpande, Kevin Lally
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Patent number: 7565273Abstract: The invention concerns a method and system for determining the age of an object such as a product containing volatile components, comprising: measuring a first strength of a first scent with a first electronic sensor, the decay rate constant of the first scent being known; measuring simultaneously a second strength of a second scent with a second electronic sensor, the decay rate constant of the second scent being known; calculating a current scent ratio (?) of the two scent strengths; and determining the age of the object from a reference time for which a reference scent ratio (?0) of the scent strengths has been registered.Type: GrantFiled: January 27, 2004Date of Patent: July 21, 2009Assignee: Accenture Global Services GmbHInventor: Roland Hengerer
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Patent number: 7558683Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.Type: GrantFiled: October 19, 2007Date of Patent: July 7, 2009Assignee: Hitachi, Ltd.Inventors: Takanori Ninomiya, Seiji Isogai, Shigeru Matsui, Toshiei Kurosaki
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Patent number: 7542880Abstract: A method for estimating a state associated with a process includes receiving a state observation associated with the process. The state observation has an associated process time. A weighting factor to discount the state observation is generated based on the process time. A state estimate is generated based on the discounted state observation. A system includes a process tool, a metrology tool, and a process controller. The process tool is operable to perform a process in accordance with an operating recipe. The metrology tool is operable to generate a state observation associated with the process. The process controller is operable to receive the state observation, the state observation having an associated process time, generate a weighting factor to discount the state observation based on the process time, generate a state estimate based on the discounted state observation, and determine at least one parameter of the operating recipe based on the state estimate.Type: GrantFiled: April 6, 2006Date of Patent: June 2, 2009Assignee: Advanced Micro Devices, Inc.Inventors: Richard P. Good, Kevin A. Chamness, Uwe Schulze
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Patent number: 7539586Abstract: A measuring instrument comprising a stylus displaced following a work, the instrument further comprises a corrector for correcting a displacement in the translation axis direction value according to a height detection axis direction value of the stylus position in a plane specified by the height detection axis and the translation axis, the corrector comprising a calibration measuring device that obtains the calibration measurement data including the displacement information of the translation axis direction value corresponding to the height detection axis direction value of the stylus by moving the stylus; a correction parameter setting device that determines a correction parameter best suited for correcting the measurement error due to the vertical movement error of the stylus based on the displacement information of the stylus; and a measurement data correcting device that corrects a measurement data by using the correction parameter.Type: GrantFiled: May 7, 2007Date of Patent: May 26, 2009Assignee: Mitutoyo CorporationInventors: Tomonori Goto, Soichi Kadowaki
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Patent number: 7532990Abstract: In an exemplary embodiment of the present invention, a method for operation of a printing press includes the steps of generating unique individual signature identification information, tracking printing press operation information and associating the printing press operation information with the unique signature identification information. For use in a printing press arrangement, a system for tracking printing press operation, including: a plurality of sensors arranged in a preselected configuration in the printing press arrangement to sense preselected Printing press operation information; and a press control and tracking controller coupled to each of the plurality of sensors, the press control and tracking controller arranged and configured to receive inputs from the plurality of sensors to generate unique individual signature identification information, track printing press operation information and associate the printing press operation information with the unique signature identification information.Type: GrantFiled: October 4, 2005Date of Patent: May 12, 2009Assignee: Goss International Americas, Inc.Inventors: Michael Raymond Rancourt, Howie Hoff
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Patent number: 7526394Abstract: Non-intrusive speech quality assessment method and apparatus for: storing a sequence of intercepted packets associated with a call, each packet containing speech data, and an indication of a transmission time of the packet; storing with each intercepted packet an indication of an intercept time of the packet; extracting a set of parameters from the sequence of packets; and generating an estimated mean opinion score in dependence upon the set of parameters. The extracting step comprises the sub steps of: generating a jitter parameter for each packet of the sequence of stored packets; and generating a consecutive positive jitter parameter for the stored packet.Type: GrantFiled: January 15, 2004Date of Patent: April 28, 2009Assignee: Psytechnics LimitedInventors: Richard Reynolds, Simon Broom, Paul Barrett
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Patent number: 7520188Abstract: A method is provided for controlling the quality of a fiberglass mat. The method includes the steps of dyeing a test specimen of the fiberglass mat, scanning the test specimen with an optical detector to collect color data and comparing the color data to a predetermined standard to determine if the fiberglass mat is within the desired product specification.Type: GrantFiled: May 24, 2007Date of Patent: April 21, 2009Assignee: OCV Intellectual Capital, LLCInventors: John M. Calicott, Donald E. Wise, Jr.
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Patent number: 7519492Abstract: The present invention provides an apparatus and method for automated quality control of a substance comprising a compartment wherein a substance is located, a monitoring device coupled to the compartment and configured to monitor at least one quality control parameter prior to an end-use of the substance, and a processor coupled to the monitoring device, wherein the monitoring device is configured to communicate data to the processor for comparing at least one quality control parameter to an end-use value, and wherein the processor is further configured to control the release of the substance from the compartment to its end-use.Type: GrantFiled: May 2, 2007Date of Patent: April 14, 2009Assignee: General Electric CompanyInventors: Peter Miller, Jan Henrik Ardenkjaer-Larsen, Martin John Bradney, Andrew Michael Leach, Per Christian Sontum, Eric John Telfeyan, David Brandon Whitt, Jan Wolber
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Patent number: 7516042Abstract: Various technologies and techniques are disclosed for performing load tests based upon user pace. A load test application is provided. Load test settings are received from a user that includes a test mix based upon user pace. A test start interval is calculated using the text mix. A load test is performed based upon the text mix. For example, the tests are executed at a pace that is based upon the test start interval for the particular user profile that the test is contained within.Type: GrantFiled: January 11, 2007Date of Patent: April 7, 2009Assignee: Microsoft CorporationInventors: Ed Glas, Bill Barnett
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System and Method for Integrating the Internal and External Quality Control Programs of a Laboratory
Publication number: 20090076755Abstract: A system and method that enables a laboratory to integrate its internal and external quality control programs to thereby control the quality of its laboratory testing services. The system comprises a storage device and a processor operable to maintain in the storage device a database identifying a plurality of laboratory tests and the corresponding internal laboratory statistical data, group statistical summary data and control rules. The processor is also operable to calculate a control range for a specified laboratory test by applying the group statistical summary data (and, in some cases, the internal laboratory statistical data) to the control rule corresponding to the specified laboratory test. Preferably, the processor is also operable to receive a test result from a laboratory instrument, and determine whether the test result falls within the calculated control range for the specified laboratory test. Various exemplary embodiments of the system and associated method are provided.Type: ApplicationFiled: November 18, 2008Publication date: March 19, 2009Inventor: John Yundt-Pacheco -
Patent number: 7502658Abstract: An exemplary method for performing fabrication sequence analysis, the method comprising, defining a process group, wherein a process group includes fabrication processes in a fabrication sequence, determining fabrication process paths in the process group to define independent variables, wherein a process path is a plurality of fabrication equipment used to fabricate a particular semiconductor device in the fabrication sequence, receiving a dependent variable for the fabrication sequence, performing analysis of variance to calculate a p-value for the process group, determining whether the p-value is lower than a threshold value, identifying a poor process path responsive to determining that the p-value is lower than a threshold value, and outputting the identified poor process path.Type: GrantFiled: February 19, 2008Date of Patent: March 10, 2009Assignee: International Business Machines CorporationInventors: Steven G. Barbee, Jeong W. Nam, Viorel Ontalus, Yuusheng Song
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Patent number: 7484357Abstract: An apparatus, system, and method are disclosed for determining the reliability of an estimate such as particulate accumulation on a diesel particulate filter, weighing the estimate according to a function of its reliability, weighing a prediction of particulate accumulation on the filter according to a function of the estimate's reliability, and combining the weighted estimate and weighted prediction to determine a combined particulate load estimate. The degree of reliability can be expressed as a trust factor, and a function of the trust factor can be used in a low-pass filter of the estimate. The trust factor value depends on filter air flow and particulate distribution in one embodiment. Regeneration of the particulate filter may be initiated depending on the value of the combined particulate load estimate.Type: GrantFiled: September 15, 2005Date of Patent: February 3, 2009Assignee: Cummins, IncInventors: Thomas A. Dollmeyer, Patrick J. Shook, J. Steve Wills, Joan Wills
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Publication number: 20090018788Abstract: A method of monitoring and controlling a manufacturing process is described. The value of a process variable is measured and treated. A measurement-based value is normalized using a normalization parameter associated with the process variable. Instances in which the normalized value fails to satisfy an acceptance criterion are identified so that, for example, corrective actions can be taken or the quality of the manufactured product can be diagnosed.Type: ApplicationFiled: January 7, 2008Publication date: January 15, 2009Inventors: Eric Nouali, Maxim Zagrebnov
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Publication number: 20080319694Abstract: Methods of monitoring an acceptance criteria of vaccine manufacturing processes are disclosed herein. Consequently, the methods and systems provide a means to perform high-quality manufacturing on an integrated level whereby vaccine manufacturers can achieve data and product integrity and ultimately minimize cost.Type: ApplicationFiled: July 30, 2008Publication date: December 25, 2008Inventor: Shane M. Popp
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Patent number: 7469170Abstract: Method, device and computer program for implementing a safety analysis in systems, in particular in a motor vehicle, the systems or the at least one system having multiple components linked by communication relationships, the components and their communication relationships forming a functional structure of the systems or the at least one system, errors being determined as a function of the functional structure, and these error dependencies being analyzed with respect to the functional structure.Type: GrantFiled: February 6, 2003Date of Patent: December 23, 2008Assignee: Robert Bosch GmbHInventors: Pio Torre Flores, Andreas Lapp, Wolfgang Laengst
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Patent number: 7469192Abstract: A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers.Type: GrantFiled: July 11, 2006Date of Patent: December 23, 2008Assignee: Tokyo Electron Ltd.Inventors: Tri Thanh Khuong, Junwei Bao, Jeffrey A. Chard, Wei Liu, Ying Zhu, Sachin Deshpande, Pranav Sheth, Hong Qiu
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System and method for integrating the internal and external quality control programs of a laboratory
Patent number: 7467054Abstract: A system and method that enables a laboratory to integrate its internal and external quality control programs to thereby control the quality of its laboratory testing services. The system comprises a storage device and a processor operable to maintain in the storage device a database identifying a plurality of laboratory tests and the corresponding internal laboratory statistical data, group statistical summary data and control rules. The processor is also operable to calculate a control range for a specified laboratory test by applying the group statistical summary data (and, in some cases, the internal laboratory statistical data) to the control rule corresponding to the specified laboratory test. Preferably, the processor is also operable to receive a test result from a laboratory instrument, and determine whether the test result falls within the calculated control range for the specified laboratory test. Various exemplary embodiments of the system and associated method are provided.Type: GrantFiled: May 2, 2003Date of Patent: December 16, 2008Assignee: Bio-Rad Laboratories, Inc.Inventor: John Yundt-Pacheco -
Patent number: 7460968Abstract: The present invention provides a method and apparatus for selecting wafers for sampling. The method includes determining a plurality of sampling rules associated with at least one of a plurality of wafers and selecting at least one wafer for sampling based on the plurality of sampling rules.Type: GrantFiled: September 30, 2005Date of Patent: December 2, 2008Assignee: Advanced Micro Devices, Inc.Inventors: Richard P. Good, Matthew A. Purdy
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Patent number: 7457679Abstract: A computer based proactive process control technique used to predict the capability of a manufacturing process. A solid model of statistical process control is created by a computer program to simulate the Bell Curve of the data or the data with in +/?3 standard deviation. With product knowledge and process knowledge, it is possible to setup and control the manufacturing process to yield a desired level. The computer program operates within a communication media network. Suppliers and manufactures through their main servers are connected to floor computers, which are data input and output computers. All the servers are connected to the main server of a prime contractor. Manufacturing data from the supplier's field computers goes to their respective servers, and that data in turn goes to the main server of the prime contractor. From the prime contractor server, the data can be retrieved through computers that are data reviewing stations.Type: GrantFiled: May 19, 2005Date of Patent: November 25, 2008Inventor: Bob Matthew
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Publication number: 20080288198Abstract: A statistical performance evaluation system for a thermodynamic device and process uses the achievable performance derived from statistics and real-time data for the device or process to evaluate the current performance of the device or process, and to adjust the operations of the device or process accordingly, or provide feedback to an operator or other monitoring system for taking corrective actions to obtain performance approaching the optimum achievable performance. The achievable performance of the device or process is derived from data collected during operational periods when the best achievable performance is anticipated, such as after maintenance is performed, and supersedes the ideal or design performance specified by the manufacturer, which typically does not represent the actual operating conditions in the field, as the basis for evaluating the real-time performance of the device.Type: ApplicationFiled: March 12, 2008Publication date: November 20, 2008Applicant: EMERSON PROCESS MANAGEMENT POWER & WATER SOLUTIONS, INC.Inventors: Peter N. Francino, Xu Cheng, Frederick C. Huff
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Patent number: 7452733Abstract: Semiconductor dice are electrically tested prior to final assembly. Dice failing the test are identified and not packaged. However, “good dice” (i.e., those dice that passed testing) in proximity to the failed dice frequently fail prematurely in the field. Therefore, in one embodiment, a method to identify those dice having a probability for early failure includes identifying a core die and a die cluster, adding the core die and at least one additional die from the die cluster to a weighted character map, and assigning a weighting value to each of the dice added to the weighted character map. At least one tier of buffer dice is then added to the weighted character map adjacent to each die on the weighted character map. Both the dice from the die cluster and the tier of buffer dice are marked, thereby preventing those dice from being packaged and consequently, shipped to customers.Type: GrantFiled: June 13, 2006Date of Patent: November 18, 2008Assignee: Atmel CorporationInventors: Paul I. Suciu, Kristopher R. Marcus, Charles B. Friedberg
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Publication number: 20080275659Abstract: The present invention provides an apparatus and method for automated quality control of a substance comprising a compartment wherein a substance is located, a monitoring device coupled to the compartment and configured to monitor at least one quality control parameter prior to an end-use of the substance, and a processor coupled to the monitoring device, wherein the monitoring device is configured to communicate data to the processor for comparing at least one quality control parameter to an end-use value, and wherein the processor is further configured to control the release of the substance from the compartment to its end-use.Type: ApplicationFiled: May 2, 2007Publication date: November 6, 2008Applicant: GENERAL ELECTRIC COMPANYInventors: Peter Miller, Jan Henrik Ardenkjaer-Larsen, Martin John Bradney, Andrew Michael Leach, Per Christian Sontum, Eric John Telfeyan, David Brandon Whitt, Jan Wolber
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Publication number: 20080249729Abstract: A computer-implemented system performs analysis on a construction material mixture includes accessing a server located on a wide-area-network; sending information collected from the material mixture to the server; applying one or more test methodologies to the collected information; generating one or more reports from the test methodologies; and sending the one or more reports to a project manager.Type: ApplicationFiled: September 8, 2006Publication date: October 9, 2008Inventors: David Frederick Martinez, Elias George Eldahdah
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Publication number: 20080249730Abstract: The present invention is related to a system for determining characteristics of a material. The system comprises means for sending and measuring microwave radiation, whereby the microwave radiation is used for determining the characteristics of the material 90. The invention is also related to such a method.Type: ApplicationFiled: February 24, 2006Publication date: October 9, 2008Applicant: Kambo Skans ABInventors: Erling Svensson, Harald Merkel
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Publication number: 20080215276Abstract: A method and system for controlling an overlay shift on an integrated circuit is disclosed. The method and system comprises utilizing a scanning electron microscope (SEM) to measure the overlay shift between a first mask and a second mask of the circuit after a second mask and comparing the overlay shift to information about the integrated circuit in a database. The method and system includes providing a control mechanism to analyze the overlay shift and feed forward to the fabrication process before a third mask for error correction. A system and method in accordance with the present invention advantageously utilizes a scanning electron microscope (SEM) image overlay measurement after the fabrication process such as etching and chemical mechanical polishing (CMP).Type: ApplicationFiled: December 5, 2007Publication date: September 4, 2008Applicant: Hermes Microvision, Inc.Inventors: Wei Fang, Jack Y. Jau, Hong Xiao
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Publication number: 20080215275Abstract: A registration detection system realizes both substrate-by-substrate correction and highly accurate correction of an exposure process.Type: ApplicationFiled: October 17, 2005Publication date: September 4, 2008Applicant: NIKON CORPORATIONInventor: Makoto Takagi
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Publication number: 20080215277Abstract: An assembly line for manufacturing filter canisters is disclosed. The method for assembling filter canisters provides a unique serial number for each canister and a database that associates the component lot numbers, activated charcoal weight, and quality assurance test results with the serial number for the filter canister. The manufacturing method can be adapted for assembly of canisters with activated charcoal and an aerosol HEPA filter, canisters with activated charcoal only, and canisters with an aerosol HEPA filter only. Some embodiments can also enable different testing conditions and specifications, activated charcoal loading requirements, labeling specifications, and packaging requirements.Type: ApplicationFiled: January 22, 2008Publication date: September 4, 2008Applicant: TVI CorporationInventors: Peter J. Cooper, Stephen Kubicsko, Greg A. Tilley
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Patent number: 7421358Abstract: By performing a contingency-based correlation test of measurement data, such as defect data, with respect to electrical test data after progressively filtering the measurement data, an enhanced analysis of process flow characteristics may be accomplished. Consequently, an efficient yield loss estimation may be performed.Type: GrantFiled: October 10, 2006Date of Patent: September 2, 2008Assignee: Advanced Micro Devices, Inc.Inventor: Garry Tuohy
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Patent number: 7409306Abstract: A system and method for determining the early life reliability of an electronic component, including classifying the electronic component based on an initial determination of a number of fatal defects, and estimating a probability of latent defects present in the electronic component based on that classification with the aim of optimizing test costs and product quality.Type: GrantFiled: March 6, 2007Date of Patent: August 5, 2008Assignee: Auburn UniversityInventors: Adit D. Singh, Thomas S. Barnett
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Publication number: 20080183411Abstract: A method for facilitating an ODP measurement of a semiconductor wafer. The method includes obtaining real time wafer characteristic data for a measurement site on said wafer and detecting a measured diffraction signal from a structure within the measurement site of the wafer. The measured diffraction signal is matched with a simulated diffraction signal stored in a wafer characteristic dependent profile library. A hypothetical profile structure associated with the simulated diffraction signal in the wafer characteristic dependent profile library is then identified. The real time wafer characteristic data is used to facilitate at least one of the matching and identifying. The real time wafer characteristic data may be real time wafer thickness data.Type: ApplicationFiled: January 30, 2007Publication date: July 31, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Merritt Funk, Sachin Deshpande, Kevin Lally
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Patent number: 7401004Abstract: A system for reviewing defects includes an analysis module configured to analyze defect information of a plurality of intermediate products, the defect information including information of an amount of defects classified by sizes of the defects existing in each of the intermediate products; a failure magnitude calculation module configured to calculate a systematic failure magnitude of the intermediate products caused by fabrication procedure of the intermediate products; a classification module configured to classify a calculated result of the systematic failure magnitude; and a review target selection module configured to select intermediate products becoming review targets.Type: GrantFiled: March 6, 2006Date of Patent: July 15, 2008Assignee: Kabushiki Kaisha ToshibaInventor: Yoshiyuki Sato
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Publication number: 20080162066Abstract: A method and system for identifying a defect or contamination on a surface of a sample. The system operates by detecting changes in work function across a surface via both vCPD and nvCPD. It utilizes a non-vibrating contact potential difference (nvCPD) sensor for imaging work function variations over an entire sample. The data is differential in that it represents changes in the work function (or geometry or surface voltage) across the surface of a sample. A vCPD probe is used to determine absolute CPD data for specific points on the surface of the sample. The combination of vibrating and non-vibrating CPD measurement modes allows the rapid imaging of whole-sample uniformity, and the ability to detect the absolute work function at one or more points.Type: ApplicationFiled: February 25, 2008Publication date: July 3, 2008Inventors: M. Brandon STEELE, Jeffrey Alan Hawthorne
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Patent number: 7386420Abstract: A data analysis method for an integrated circuit process is described, for analyzing the results of at least an in-line quality test, a product test and a yield test done to the products of the IC process. The products are divided into a normal group and an abnormal group based on the result of the in-line quality test, and are divided into a qualified group and an unqualified group based on the result of the yield test. A categorization step is performed to define the intersection of the unqualified group and the normal group as a first problematic group and to define the intersection of the unqualified group and the abnormal group as a second problematic group. By analyzing one or both of the two problematic groups, the major yield killer can be identified so that process modification can be made accordingly to improve the yield.Type: GrantFiled: June 2, 2006Date of Patent: June 10, 2008Assignee: United Microelectronics Corp.Inventors: Guohai Zhang, Kay-Ming Lee, Lu-Ying Du, Jui-Chun Kuo
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Publication number: 20080125995Abstract: There are disclosed systems, computer program products, and method for monitoring electrostatic discharge (ESD) fault conditions and controlling manufacturing processes on an assembly line. In an embodiment, each ESD monitored station in an assembly line is provided with at least one ESD management device (e.g. an ESD monitoring device or ESD protection device). Predetermined ESD fault conditions may be used to automatically stop a manufacturing process at an ESD monitored station. Upon occurrence of an ESD fault condition an ESD fault notification message may be sent identifying the ESD monitored station, the nature of the ESD fault condition, and whether the manufacturing process at the ESD monitored station is stopped. The ESD fault notification message may be sent to a mobile communications device, for example, and the manufacturing process at the ESD monitored device may be controlled based on a reply received from the mobile communications device.Type: ApplicationFiled: February 5, 2008Publication date: May 29, 2008Inventor: Roger ENTA
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Patent number: 7379847Abstract: The above and other needs are met by an inspection system having a sensor array that is connected to a high speed network connection, and is adapted to provide image data in regard to images of a substrate. A process node is also connected to the high speed network connection, and is adapted to received the image data over the high speed network connection and to analyze the image data to detect anomalies in the images. In this manner, commercially available hardware can be used to construct the inspection system, which thus overcomes many of the problems with expensive, unreliable, and inflexible prior art inspection systems.Type: GrantFiled: October 18, 2004Date of Patent: May 27, 2008Assignee: KLA-Tencor CorporationInventors: Joseph M. Blecher, Carl E. Hess
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Publication number: 20080114559Abstract: A quality control method using a plurality of analyzers and a control device connected to the analyzers via a network, the method comprising: (a) measuring quality control samples by the analyzers; (b) collecting a plurality of quality control data obtained by measuring the quality control samples; (c) implementing a quality control by the control device based on the collected quality control data; (d) obtaining uncertainty of measurement of analyzer based on uncertainty of analyzer calibration and the quality control data; (e) outputting a result of the quality control; and (f) outputting the uncertainty of measurement is disclosed. A quality control system and an analyzer are also disclosed.Type: ApplicationFiled: September 21, 2007Publication date: May 15, 2008Inventors: Tadayuki Yamaguchi, Atsushi Shirakami, Etsuro Shinkai, Yasuhiro Ochi