Roughness Patents (Class 73/105)
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Publication number: 20080154521Abstract: A scanning probe microscope's probe tip dimensions as they exist or existed for a certain data or measurement are inferred based on probe activity taking place since a probe characterization procedure was performed. The inferred probe tip dimensions can be used to correct nanoscale measurements taken by the probe to account for changes in the probe's geometry such as wear.Type: ApplicationFiled: December 22, 2006Publication date: June 26, 2008Inventors: Tianming Bao, Hao-Chih Liu, Gregory A. Dahlen, Rohit Jain
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Patent number: 7391022Abstract: A scanning probe microscope (SPM) is provided capable of a narrow to a wide range observation according to observed targets or purposes without replacing a scanner while maintaining a high resolution. The SPM is provided with a probe-side scanner 10 and a sample-side scanner 11. The probe-side scanner 10 is to move the probe 13 in X-, Y-, Z-axis directions, and the sample-side scanner 11 is to move the sample 12 in the X-, Y-, Z-axis directions. A scanner with a small maximum scan range is used as the probe-side scanner 10; a scanner with a large maximum scan range is used as the sample-side scanner 11; and both can be switched between each scanner for use according to the observed targets or purposes. Alternatively, the probe-side scanner 10 is used for scanning in a narrow range, and the sample-side scanner 11 is used to move the field of view.Type: GrantFiled: March 2, 2006Date of Patent: June 24, 2008Assignee: Shimadzu CorporationInventor: Masahiro Ohta
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Publication number: 20080141764Abstract: When a characterization of a tip of a diamond stylus for working is needed, the tip of the diamond stylus for working used is observed by a high resolution scanning electron microscope of a high acceleration voltage under a steam atmosphere. When the tip of the diamond stylus for working is worn or when a shape of the tip of the stylus needs to be changed, the tip of the diamond stylus for working is worked by selectively irradiating an electron beam only to a necessary region by increasing an amount of steam and an amount of a current of the electron beam. When a working chip is strongly adhered to the diamond stylus for working and needs to be removed, the electron beam is selectively irradiated only to the working chip adhered to the tip of the diamond stylus for working to be removed under a xenon fluoride atmosphere.Type: ApplicationFiled: December 6, 2007Publication date: June 19, 2008Inventor: Osamu Takaoka
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Patent number: 7387017Abstract: A digital system for controlling the quality factor in a resonant device. The resonant device can be any mechanically driven resonant device, but more particularly can be a device that includes a cantilever within its system, such as an atomic force microscope. The quality factor can be digitally controlled to avoid noise effect in the analog components. One of the controls can use a direct digital synthesizer implemented in a way that provides access to the output of the phase accumulator. That output drives a lookup table to produce a cosine or sine output wave. The output is also formed into a second number that drives a second lookup table to create an adjustment factor. The adjusted digital signal then drives a DA converter which produces an output drive for the cantilever.Type: GrantFiled: January 10, 2007Date of Patent: June 17, 2008Assignee: Asylum Research CorporationInventors: Dan Bocek, Jason Cleveland
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Patent number: 7387016Abstract: An atomic force microscope and method of energy dissipation imaging using such atomic force microscope. The atomic force microscope has a cantilever equipped with a probe for making contact with a sample, a vibrating unit for vibrating the cantilever, a vibration control unit for controlling the vibrating unit based on a preset value of amplitude, a vibration detector for detecting the amplitude of the vibration of the cantilever, and an imaging unit for creating an energy dissipation image based on the vibration of the cantilever. Error information based on the difference between the value of amplitude detected by the amplitude detection unit and the preset value of amplitude is fed back to the vibrating unit. Thus, the vibrating unit vibrates the cantilever to drive it into resonance. The imaging unit creates an energy dissipation image based on the difference information.Type: GrantFiled: March 14, 2006Date of Patent: June 17, 2008Assignee: JEOL Ltd.Inventor: Keiichi Nakamoto
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Publication number: 20080127722Abstract: A method and apparatus for its practice are provided of differentiating at least one component of a heterogeneous sample from other component(s) using harmonic resonance imaging and of obtaining information regarding the sample from the differentiation. In a preferred embodiment, an image is created of a property of a harmonic or a combination of a harmonics producing a response having a contrast factor between the sample's constituent components. The desired harmonic(s) can be identified either in a preliminary data acquisition procedure on the sample or, if the sample's constituent components are known in advance, predetermined. The desired harnonic(s) may be identified directly by the user or automatically through, e.g., pattern recognition. A compositional map may then be generated and displayed and/or additional information about the sample may be obtained.Type: ApplicationFiled: November 30, 2006Publication date: June 5, 2008Inventors: Chanmin Su, Craig Prater, Gregory F. Meyers, Bryant R. LaFreniere
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Patent number: 7381950Abstract: A method comprising characterizing the dimensions of structures on a semiconductor device having dimensions less than approximately 100 nanometers (nm) using one of scanning probe microscopy (SPM) or profilometry.Type: GrantFiled: September 29, 2004Date of Patent: June 3, 2008Assignee: Texas Instruments IncorporatedInventors: Duncan M. Rogers, Vladimir A. Ukraintsev
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Publication number: 20080121030Abstract: In a roughness scanner comprising a scanning arm with a scanning needle mounted at one end thereof, a skid carrier having an end supporting a skid with the scanning arm extending along the skid carrier in spaced relationship therefrom, the skid has at one side a guide plate including an opening through which the scanning needle extends and a space formed above the guide plate which space is open at least at one side thereof down to the guide plate, so that any liquid collected by the needle and moving upward into the space above the guide plate can flow again out of that space.Type: ApplicationFiled: January 22, 2008Publication date: May 29, 2008Inventors: Peggy Dorrer, Josef Ludwig, Rainer Ziegenbein
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Publication number: 20080121028Abstract: A scanning probe microscopy (SPM) inspection and/or modification system which uses SPM technology and techniques. The system includes various types of microstructured SPM probes for inspection and/or modification of the object. The components of the SPM system include microstructured calibration structures. A probe may be defective because of wear or because of fabrication errors. Various types of reference measurements of the calibration structure are made with the probe or vice versa to calibrate it. The components of the SPM system further include one or more tip machining structures. At these structures, material of the tips of the SPM probes may be machined by abrasively lapping and chemically lapping the material of the tip with the tip machining structures.Type: ApplicationFiled: August 20, 2007Publication date: May 29, 2008Applicant: General Nanotechnology LLCInventor: Victor B. Kley
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Publication number: 20080121029Abstract: A cantilever having a support portion, a lever portion extended from the support portion, and a probe portion formed in the vicinity of a free end of the lever portion, in which a carbon nano-tube controlled in direction is attached to the probe portion in a manner jutting out from a terminal end portion of the probe portion.Type: ApplicationFiled: January 14, 2008Publication date: May 29, 2008Applicant: OLYMPUS CORPORATIONInventors: Masashi Kitazawa, Junpei Yoneyama
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Patent number: 7373807Abstract: A drive unit is provided that is capable of providing a high-accuracy measurement operation while suppressing a posture change of a detector even if the detector is moved. The drive unit includes a cross section of horizontally-oriented-U-shape guide rail provided to a frame, and the outside to be parallel to the movement direction of a roughness detector; a slider formed to be able to freely slide along the guide rail, and configures a frame being rectangular in cross section to include a detector therein; biasing member that biases the slider against the guide rail; and drive device that moves the slider along the guide rail. The drive unit is configured to include a motor, a ball screw axis to be driven by the motor, and a nut member that is screwed to the ball screw axis, and is coupled to the slider. The ball screw axis is disposed in the vicinity of the substantial center of sliding surfaces of the slider.Type: GrantFiled: February 23, 2006Date of Patent: May 20, 2008Assignee: Mitutoyo CorporationInventor: Nobuyuki Hama
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Patent number: 7375322Abstract: To prevent an influence from effecting on an oscillating state of a cantilever by firmly fixing a main body portion, there is provided a cantilever holder for attachably and detachably fixing a cantilever which is provided with a stylus at a front end thereof and a base end side of which is supported by a main body portion in a single-supported state, the cantilever holder including a base member having a mounting portion for mounting the main body portion in a state of being positioned at a predetermined position, a holding member made to be able to be brought into contact with at least a surface of the main body portion in a state of mounting the main body portion on the mounting portion and extended in a direction substantially orthogonal to a longitudinal direction (axis line A direction) of the cantilever, and pressing means for pressing both ends of the holding member to the base member by a predetermined pressure, fixing the main body portion to the mounting portion by way of the holding member and capType: GrantFiled: March 14, 2006Date of Patent: May 20, 2008Assignee: SII NanoTechnology Inc.Inventors: Itaru Kitajima, Masatsugu Shigeno
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Patent number: 7375324Abstract: An improved method for rapidly and accurately modifying small structures, including structures on a micron or nanometer scale, suitable for the repair of defects in lithographic photo-masks and semiconductors on a nano-scopic level. Features or samples repaired may be conductive or non-conductive. A single instrument can be employed to both observe the surface of the mask or wafer, and to effectuate the repair of conductive and non-conductive features thereon. Using a Stylus-Nano-Profilometer probe, rapid lateral strokes across the sample surface in a definable pattern at known high applied pressure are used to effectuate defect repair. The tip of the probe can also be dithered rapidly in a pattern or used as to create a jackhammer effect to more effectively remove material from the sample surface.Type: GrantFiled: April 13, 2005Date of Patent: May 20, 2008Assignee: Fei CompanyInventors: Robert Linder, Eric Kneedler
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Patent number: 7373808Abstract: A method and ultrasonic meter system for determining pipe roughness. At least some of the illustrative embodiments are ultrasonic meters comprising a spool piece that couples within a flow of fluids, and a first transducer pair mechanically mounted to the spool piece and acoustically coupled to the flow of fluids (wherein the first transducer pair comprises an upstream transducer and a downstream transducer in operational relationship to the upstream transducer and defines a first chord there between). The ultrasonic meter is configured to determine diagnostic data based on acoustic signals transmitted between the first transducer pair (wherein the diagnostic data comprises an asymmetry of the flow of fluids in the spool piece, a cross flow of the flow of fluids in the spool piece, and a profile factor of the flow of fluids in the spool piece).Type: GrantFiled: May 8, 2006Date of Patent: May 20, 2008Assignee: Daniel Measurement and Control, Inc.Inventors: Klaus J Zanker, John R Lansing
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Patent number: 7373806Abstract: A scanning probe microscope has a probe tip for undergoing a scanning operation to scan a sample surface in X- and Y-directions parallel to the sample surface and for undergoing movement in a Z-direction vertical to the sample surface. A vibration unit vibrates the probe tip at a vibration frequency that resonates with of forcedly vibrates the probe tip. An observation unit collects observational data from the sample surface when the probe tip is in proximity or contact with the sample surface. A detection unit detects a variation in the state of vibration of the probe tip when the probe tip is in proximity or contact with the sample surface during a scanning operation.Type: GrantFiled: August 24, 2004Date of Patent: May 20, 2008Assignee: SII NanoTechnology Inc.Inventors: Itaru Kitajima, Kazutoshi Watanabe, Shigeru Wakiyama, Masatoshi Yasutake, Akira Inoue
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Publication number: 20080110248Abstract: A scanning probe microscope scans the surface of a sample while making a cantilever to which an exploratory needle is attached oscillate near its resonance point, and collects information on the surface of the sample based on the change of oscillation due to the interaction between the surface of the sample and the exploratory needle. The scanning probe microscope includes a plurality of oscillators attached to the cantilever for oscillating the cantilever, and an oscillator drive device connected to the oscillators for selectively applying an alternating voltage for excitation to the plurality of oscillators.Type: ApplicationFiled: October 25, 2007Publication date: May 15, 2008Applicant: SHIMADZU CORPORATIONInventors: Takeshi Ito, Masahiro Ota
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Patent number: 7370515Abstract: Probes for use in a scanning probe microscope and methods of manufacturing such probes. Each probe includes a probe tip having a substantially vertical sidewall formed by an anisotropic etching process and a flared post underlying the probe tip that is formed by an etching process that is not anisotropic. A source gas comprising a bromine-containing gas and an oxygen-containing gas is used to etch the probe tip and flared post of the probe in a batch process. The probe tips may be qualified using any suitable criterion for use by a customer in an atomic force microscope without individual inspection.Type: GrantFiled: June 21, 2004Date of Patent: May 13, 2008Assignee: Veeco Instruments Inc.Inventors: Nihat Okulan, Ami Chand
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Patent number: 7372028Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges.Type: GrantFiled: May 8, 2006Date of Patent: May 13, 2008Assignee: Hitachi, Ltd.Inventors: Makoto Ezumi, Yoichi Ose, Akira Ikegami, Hideo Todokoro, Tatsuaki Ishijima, Takahiro Sato, Ritsuo Fukaya, Kazunari Asao
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Publication number: 20080105042Abstract: Massive parallel printing of structures and nanostructures at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The array is designed so only tips touch the surface. This can be accomplished by long tips and bent cantilevers and alignment. An article comprising: a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers, wherein each of the cantilevers comprise tips at the cantilever end away from the base, wherein the number of cantilevers is greater than 250, and wherein the tips have an apex height relative to the cantilever of at least four microns, and a support for the array. Combinatorial arrays and bioarrays can be prepared. The arrays can be manufactured by micromachining methods.Type: ApplicationFiled: March 23, 2007Publication date: May 8, 2008Inventors: Chad A. Mirkin, Khalid Salaita, Yuhuang Wang, Joseph S. Fragala, Raymond R. Shile
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Patent number: 7368712Abstract: A Y-shaped carbon nanotube atomic force microscope probe tip and methods comprise a shaft portion; a pair of angled arms extending from a same end of the shaft portion, wherein the shaft portion and the pair of angled arms comprise a chemically modified carbon nanotube, and wherein the chemically modified carbon nanotube is modified with any of an amine, carboxyl, fluorine, and metallic component. Preferably, each of the pair of angled arms comprises a length of at least 200 nm and a diameter between 10 and 200 nm. Moreover, the chemically modified carbon nanotube is preferably adapted to allow differentiation between substrate materials to be probed. Additionally, the chemically modified carbon nanotube is preferably adapted to allow fluorine gas to flow through the chemically modified carbon nanotube onto a substrate to be characterized. Furthermore, the chemically modified carbon nanotube is preferably adapted to chemically react with a substrate surface to be characterized.Type: GrantFiled: December 6, 2005Date of Patent: May 6, 2008Assignee: International Business Machines CorporationInventors: Carol A. Boye, Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, Charles W. Koburger, III
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Patent number: 7367242Abstract: An active micro-force sensor is provided for use on a micromanipulation device. The active micro-force sensor includes a cantilever structure having an actuator layer of piezoelectric material and a sensing layer of piezoelectric material bonded together. When an external force is exerted on the sensor, the sensor deforms and an applied force signal is recorded by the sensing layer. The applied force signal is then fed back to the actuating layer of the sensor via a servoed transfer function or servo controller, so that a counteracting deformation can be generated by the bending moment from the servoed actuating layer to quickly balance the deformation caused by the external micro-force.Type: GrantFiled: February 27, 2006Date of Patent: May 6, 2008Assignee: Board of Trustees operating Michigan State UniversityInventors: Ning Xi, Yantao Shen
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Publication number: 20080098804Abstract: In accordance with the invention, rapid surface seeks to the measurement surface by a scanning probe microscope are enabled by using an actuator coupled to a position sensor.Type: ApplicationFiled: October 27, 2006Publication date: May 1, 2008Inventor: Daniel Y. Abramovitch
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Publication number: 20080098805Abstract: An atomic force microscopy (AFM) nanoprobe comprising a nanocone base and a nanoprobe tip wherein the length to base diameter aspect ratio is at least 3 or more. The AFM nanoprobe tip structure comprises an orientation-controlled (vertical or inclined), high-aspect-ratio nanocone structure without catalyst particles, with a tip radius of curvature of at most 20 nm.Type: ApplicationFiled: September 29, 2005Publication date: May 1, 2008Inventors: Sungho Jin, Ratneshwar Lal
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Patent number: 7360405Abstract: An approach to determine cantilever movement is presented. An observer based state estimation and statistical signal detection and estimation techniques are applied to Atomic Force Microscopes. A first mode approximation model of the cantilever is considered and an observer is designed to estimate the dynamic states. The cantilever-sample interaction is modeled as an impulsive force applied to the cantilever in order to detect the presence of sample. A generalized likelihood ratio test is performed to obtain the decision rule and the maximum likelihood estimation of the unknown arrival time of the sample profile and unknown magnitude of it. The use of the transient data results in sample detection at least ten times faster than using the steady state characteristics.Type: GrantFiled: May 31, 2006Date of Patent: April 22, 2008Assignee: Iowa State University Research Foundation, Inc.Inventors: Murti V. Salapaka, Abu Sebastian, Deepak Ranjan Sahoo
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Patent number: 7360404Abstract: A method for examining a surface of a sample is described using an atomic force scanning microscope (AFM) comprising a cantilever with a longitudinal extension along which a measuring tip is disposed, which is selectively arranged relative to the sample surface by a means for driving and whose spatial position is detected using a sensor unit. Vibration excitation is conducted at excitation amplitudes which produce inside the cantilever torsional amplitudes with maximum values which form a largely (substantively) constant plateau value despite increasing excitation amplitudes and the resonance spectra, in a range of maximum values of the torsional amplitudes, a widening of the resonance spectrum which is determinable by a plateau width. The resonance spectra, preferably the plateau value, the plateau width and/or the gradient of the respective resonance spectra are used for examining the sample.Type: GrantFiled: August 14, 2003Date of Patent: April 22, 2008Assignee: Fraunhofer-Gesellschaft zur Förderung der Angelwandten Forschung E.V.Inventors: Michael Reinstadtler, Ute Rabe, Walter Arnold
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Patent number: 7361310Abstract: The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.Type: GrantFiled: December 2, 2002Date of Patent: April 22, 2008Assignee: Northwestern UniversityInventors: Chad A. Mirkin, Linette Demers, David S. Ginger
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Patent number: 7363181Abstract: A surface texture measuring instrument is provided that is capable of performing a correction operation depending on the rotation angle position of a detector even when the detector is rotated for measurement.Type: GrantFiled: February 23, 2006Date of Patent: April 22, 2008Assignee: Mitutoyo CorporationInventors: Minoru Katayama, Takafumi Kano
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Publication number: 20080087077Abstract: A method and apparatus of scanning a sample with a scanning probe microscope including scanning a surface of the sample according to at least one scan parameter to obtain data corresponding to the surface, and substantially automatically identifying a transition in the surface. Based on the identified transition, the sample is re-scanned. Preferably, the resultant data is amended with data obtained by re-scanning the transition.Type: ApplicationFiled: October 17, 2006Publication date: April 17, 2008Inventor: Paul L. Mininni
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Patent number: 7357022Abstract: A method and a surface evenness measuring roller for determining surface evenness measurement errors in steel and metal band comprising at least one measuring head having part measuring heads which part measuring heads are integrated respectively offset by 180° into the roller mantel and supported on two force transmitters and are further separated from the roller mantle by means of a circumferential motion gap and are braced with respect to one another by means of at least one tie rod wherein in the course of a measurement of the band tensile stress distribution over the whole band width the band with band is subject to tension over its whole band width wraps around the surface evenness measuring roller with a predetermined arc of contact and thereby exerts pressing forces onto the surface evenness measuring roller from which pressing forces can be determined the band tension distribution.Type: GrantFiled: February 14, 2005Date of Patent: April 15, 2008Assignee: BWG Bergwerk-und Walzwerk-Maschinenbau GmbHInventor: Andreas Noe
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Patent number: 7357018Abstract: A measurement inside a specimen is performed by providing a nanoscale FET probe comprising a cantilever element and a nanowire extending from the cantilever element. The nanowire is electrically connected to the cantilever element at at least one of the ends of the nanowire. The nanowire is coated along at least part of the length thereof with molecules of a capture agent. The cantilever element is moved to insert the nanowire onto the specimen. An electrical property of the nanoscale FET probe is monitored to detect binding events between the capture agent molecules and an analyte of interest inside the specimen.Type: GrantFiled: February 10, 2006Date of Patent: April 15, 2008Assignee: Agilent Technologies, Inc.Inventors: Bo U Curry, Sungsoo Yi
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Patent number: 7355176Abstract: A method of forming a protection layer on a specimen for TEM inspection and a method of forming a specimen for TEM inspection are provided. The method of forming a protection layer on a specimen for TEM inspection generally comprises coating a wafer slice comprising an inspection point with a protection material and compressing the protection material to the wafer slice. The method of forming a specimen for TEM inspection generally comprises cutting a wafer slice comprising an inspection point from a wafer, forming a protection layer on the wafer slice, forming a first preliminary specimen by cutting the wafer slice, forming a second preliminary specimen by grinding the first preliminary specimen, and forming a TEM specimen by etching portions of the second preliminary specimen.Type: GrantFiled: September 8, 2005Date of Patent: April 8, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Hang-Ja Kim, Eun-Kyoung Jung
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Publication number: 20080078239Abstract: A semiconductor probe having a wedge shape resistive tip and a method of fabricating the semiconductor probe is provided. The semiconductor probe includes a resistive tip that is doped with a first impurity, has a resistance region doped with a low concentration of a second impurity having an opposite polarity to the first impurity, and has first and second semiconductor electrode regions doped with a high concentration of the second impurity on both side slopes of the resistive tip.Type: ApplicationFiled: May 18, 2007Publication date: April 3, 2008Applicant: SAMSUNG ELECTRONICS CO., LTDInventors: Hyoung-soo KO, Ju-hwan JUNG, Seung-bum HONG, Hong-sik PARK, Chul-min PARK
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Patent number: 7350404Abstract: The probe tip movement control method of the scanning probe microscope is used for a scanning probe microscope provided with a cantilever 21 having a probe tip 20 facing a sample 12. The atomic force occurring between the probe tip and sample is measured when the probe tip scans the surface of the sample. X-, Y-, and Z-fine movement mechanisms 23, 29, and 30 are used to relatively change the positions of the probe tip and sample. It is possible to maintain a high measurement accuracy and enable scan movement of a probe tip on a sample surface by simple control when measuring a part having a gradient in measurement of an uneven shape on a sample surface.Type: GrantFiled: August 27, 2004Date of Patent: April 1, 2008Assignee: Hitachi Kenki Fine Tech Co., Ltd.Inventors: Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Yasushi Minomoto, Shigeru Miwa, Ken Murayama, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto
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Publication number: 20080072665Abstract: The invention relates to a device for scanning probe microscopy, said device comprising a scanning microscopy measuring device provided with a measuring probe for scanning microscopy measurements and a sample carrier for receiving a sample to be measured by scanning microscopy; a control device which is connected to the scanning microscopy measuring device in such a way that it is integrated into the system, and is designed in such a way as to automatically control the measuring device in order to perform a scanning microscopy measurement according to pre-defined control parameters; and/or an evaluation device that is connected to the scanning microscopy measuring device in such a way that it is integrated into the system, and is designed in such a way as to automatically evaluate measurements according to pre-defined evaluation parameters.Type: ApplicationFiled: September 30, 2005Publication date: March 27, 2008Applicant: NAMBITION GMBHInventors: Jens Struckmeier, Karl Schlagenhauf
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Patent number: 7347084Abstract: The roughness measuring instrument (1) has a receiving device (2) for a feeder device (3), which serves to drag a roughness sensor (4) over a workpiece surface. The receiving device (2) carries a testing standard (24) with a testing face (25) within range of the roughness sensor (4). Preferably, the testing standard (24) is located in a pocket affixed to the receiving device (2), and this pocket is embodied in the wall of a bore for receiving the feeder device (3). Its testing face (25) is thus located inside the receiving device (2) in a way that is protected against becoming soiled and damaged yet is readily accessible.Type: GrantFiled: July 12, 2004Date of Patent: March 25, 2008Assignee: Carl Mahr Holding GmbHInventors: Jürgen Tölzer, Reinhard Willig
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Patent number: 7347085Abstract: A nanoscale displacement detector includes a cantilever integrated with an optical resonator, referred to herein as a “microresonator.” The microresonator and cantilever are configured such that displacement of the cantilever relative to the microresonator causes a change in the resonant frequency of the microresonator. The change in the resonant frequency of the microresonator is used to monitor cantilever displacement. In an embodiment, the microresonator includes a cavity that faces the cantilever and the cantilever includes a protrusion that faces the microresonator and is aligned with the cavity.Type: GrantFiled: November 16, 2005Date of Patent: March 25, 2008Assignee: Agilent Technologies, Inc.Inventor: Robert C. Taber
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Patent number: 7344908Abstract: The present invention relates to an AFM (atomic force microscope) cantilever including a field effect transistor (FET) and a method for manufacturing the same; and, more particularly, to a method for manufacturing an AFM cantilever including an FET formed by a photolithography process, wherein an effective channel length of the FET is a nano-scale. Therefore, The present invention can easily implement a simulation for manufacturing the AFM cantilever including the FET by accurately controlling the effective channel length. And also, the present invention can manufacture the AFM cantilever including the FET having the effective channel ranging several tens to several hundreds nanometers by applying the low price photolithography device, thereby enhancing an accuracy and yield of the manufacturing process and drastically reducing process costs.Type: GrantFiled: December 21, 2006Date of Patent: March 18, 2008Assignee: Korea Electronics Technology InstituteInventors: Moon Suhk Suh, Jin-Koog Shin, Churl Seung Lee, Kyoung IL Lee
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Publication number: 20080060426Abstract: In one embodiment, an atomic force microscope comprises a frame, a beam coupled to the frame at a first end and a second end, a probe mounted to the beam, means for inducing relative motion between the beam and an underlying surface, and means for detecting a characteristic of the beam.Type: ApplicationFiled: September 8, 2006Publication date: March 13, 2008Inventors: Christoper F. Bevis, Marco Tortonese
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Publication number: 20080061798Abstract: The present invention provides microcoaxial probes fabricated from semiconductor heterostructures that include strained semiconductor bilayers. The microcoaxial probes are well suited for use as scanning probes in scanning probe microscopy, including scanning tunneling microscopy (STM), atomic force microscopy (AFM), scanning microwave microscopy, or a combination thereof.Type: ApplicationFiled: September 11, 2006Publication date: March 13, 2008Inventor: Robert H. Blick
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Patent number: 7340944Abstract: A device having an oscillator such as a sensor for use in an atomic force microscope. A pair of co-axial members interconnect support structure and the oscillator for torsionally suspending the oscillator. The co-axial members are portions of a layer of silicon nitride or other material that is connected to the oscillator and support structure, which are composed of silicon or other material. A process for making a device which includes an oscillator, which includes depositing on silicon or other first material a layer of silicon nitride or other second material, forming in the first material a support structure and the oscillator, including applying an etchant which is selective for the first material to etch all the way through the first material and leave the second material substantially unetched to thereby form the at least one flexible hinge of the second material.Type: GrantFiled: August 18, 2006Date of Patent: March 11, 2008Inventors: Arthur Beyder, Frederick Sachs
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Patent number: 7337656Abstract: In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever 1 formed with a plurality of electrodes 3 using lithographic techniques, and forming microscopic electrodes 6 minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever 1 using a focused charged particle beam or using CVD.Type: GrantFiled: September 20, 2005Date of Patent: March 4, 2008Assignee: SII NanoTechnology Inc.Inventors: Yoshiharu Shirakawabe, Hiroshi Takahashi, Tadashi Arai
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Publication number: 20080048114Abstract: To be able to measure a value with regard to a dissipation, or a value in proportion to a dissipation energy without making a premise by being brought into a steady state. Exciting means 12 for carrying out an excitation by following a resonance frequency of a cantilever 2, a displacement detector 10 for detecting a displacement of a stylus at a tip of the cantilever 2, an amplitude detector 20 for successively providing an amplitude from a signal from the displacement detector 10, a difference value detector 21 for providing a time difference value of the amplitude, a divider 22 for providing a value of a quotient between the time difference values, a logarithmic converter 23 for providing a logarithmic value of the value of the quotient, and a second divider 24 for providing a value with regard to a dissipation by calculating a value constituted by dividing the logarithmic value by a difference time period are provided.Type: ApplicationFiled: August 7, 2007Publication date: February 28, 2008Inventor: Norio Ookubo
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Publication number: 20080047335Abstract: A measuring apparatus comprising: a reference member held in fixed position and orientation with respect to a workpiece during measurement; a stylus for scanning a surface of the workpiece while being displaced upward and downward in accordance with unevenness of the surface of the workpiece; a displacement gauge for measuring a displacement of a specific part of the stylus relative to the reference member; and a scanner for causing the stylus to scan the workpiece along the surface; wherein the fixed position and orientation of the reference member with respect to the workpiece are not changed even during the operation of the scanner; the up-and-down displacement of the specific part of the stylus is measured relative to the reference member; a fine shape of the workpiece is detected in accordance with the measured displacement of the specific part of the stylus.Type: ApplicationFiled: August 22, 2007Publication date: February 28, 2008Applicant: MITUTOYO CORPORATIONInventors: Kazuhiko Kawasaki, Satoshi Koga, Yoshimasa Suzuki
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Patent number: 7334459Abstract: An atomic force microscope includes a tip (12). The tip is shifted to determine a height of a surface interval (44) of an object, wherein the surface interval is substantially sloped at an angle above the horizontal and defines a point (42a). The atomic force microscope includes a light source (31) and an analyzer (33). The light source applies a number of light beams focused onto the point of the surface interval, and the applied light beams are reflected by the surface interval. The analyzer analyzes the reflected light beams in order to determine the angle above the horizontal.Type: GrantFiled: May 31, 2005Date of Patent: February 26, 2008Assignee: Hon Hai Precision Industry Co., Ltd.Inventor: Ga-Lane Chen
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Patent number: 7334460Abstract: A method and apparatus for manipulating the surface of a sample including a cantilever, a first tip mounted on the cantilever, and a second tip mounted on the cantilever, the first and the second tip being configured to combine to form an imaging probe and to separate to form a manipulation probe. The first and second tips are configured to form a first position characterized in that the tips combine to form an imaging tip and the first and the second tip are configured to form a second position characterized in that the tips separate to manipulate particles on a surface of a sample. The tips can be configured to form the first position when a voltage is applied across the tips, and preferable extend downwardly from the cantilever substantially perpendicular thereto.Type: GrantFiled: May 9, 2006Date of Patent: February 26, 2008Assignee: Veeco Instruments, Inc.Inventors: Ami Chand, Kevin J. Kjoller, Kenneth L. Babcock, Michael K. Harris
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Patent number: 7335280Abstract: A method in the measurement of the flatness of the flow surface of a headbox of a paper machine is disclosed. The flatness is determined by placing a measuring tool on the flat surface formed by the flow surface and measuring the position of the measuring tool at each point. A measuring sensor is arranged in the measuring tool, in order to determine the distance between the measuring tool and the flat surface. In addition, the dimensions provided by the measuring sensors are read and the position of the measuring tool and the dimensions from the measuring sensors are combined, in order to determine the values of the measured points. The invention also relates to equipment in the measurement of the flatness of the flow surface of the headbox of a paper machine.Type: GrantFiled: August 23, 2004Date of Patent: February 26, 2008Assignee: Metso Paper, Inc.Inventors: Petri Lampi, Jukka Sallinen
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Patent number: 7325445Abstract: A surface roughness measuring apparatus (11) has a probe (27, 41) with a smooth surface region (31, 43) contoured to conform to a surface (33) the roughness of which is to be measured, and an aperture (25, 49) located generally centrally of the smooth surface region of the probe. Illustratively, the workpiece surface is a generally flat annular surface portion of a disk brake rotor (35). The test probe surface is juxtaposed with the workpiece surface and a fluid pressure modifying mechanism such as an air vacuum pump (15) and driving motor (17), which are coupled to the probe aperture, are energized to induce a fluid pressure differential between the aperture and peripheral portions of the surface region. A fluid parameter monitoring device such as air flow meter (23) or air pressure meter (19) measures a fluid response to the induced fluid pressure differential and the roughness is inferred from the measured fluid behavior.Type: GrantFiled: November 3, 2004Date of Patent: February 5, 2008Assignee: Robert Bosch GmbHInventor: James Darwin Bowman
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Publication number: 20080022759Abstract: A system and method for measuring sample material properties by coherently averaging cantilever free-decay signals in a scanning probe microscope is described.Type: ApplicationFiled: July 25, 2006Publication date: January 31, 2008Inventors: Chanmin Su, Jian Shi
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Patent number: 7323699Abstract: A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material.Type: GrantFiled: February 2, 2005Date of Patent: January 29, 2008Assignee: Rave, LLCInventors: Barry F. Hopkins, David J. Ray, Jeffrey E. LeClaire, Roy White
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Patent number: 7323684Abstract: In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.Type: GrantFiled: May 23, 2006Date of Patent: January 29, 2008Assignee: Hitachi, Ltd.Inventors: Masahiro Watanabe, Toshihiko Nakata