Abstract: A scanning probe microscope and method for using the same are disclosed. The scanning probe microscope includes a probe, an electromechanical actuator that moves the sample relative to the probe, an external interface, and a controller. The probe has a tip that moves in response to an interaction between the tip and a local characteristic of a sample. The external interface provides a connection between the scanning probe microscope and a device external to the scanning probe microscope. The controller records scanning probe microscope data measurements, each scanning probe microscope data measurement including a location of the probe in the three dimensions and a label that uniquely identifies that measurement and allows that measurement to be correlated with data generated by a device that is external to the scanning probe microscope. The unique label could include the time at which the data measurement was made.

Abstract: A method and system for identifying and classifying non-uniformities on the surface of a semiconductor or in a semiconductor. The method and system involves scanning the wafer surface with a non-vibrating contact potential difference sensor to detect the locations of non-uniformities, extracting features characteristic of the non-uniformities, and applying a set of rules to these features to classify the type of each non-uniformity.

Abstract: The true roughness of highly granular perpendicular media is measured by forming an inverse replica of the surface of the media. The invention enables AFM measurements of granular media valley depth to more consistently predict the corrosion performance of the media. A liquid resist is used to first replicate the media topography and form the inverse replica. The narrow valleys in the original media are precisely modeled as sharp peaks on the replica. The height of the peaks are readily measured with an AFM tip. The resulting image is a negative of the original surface.

Abstract: A method, a system and a computer readable medium for dynamic mode AFM amplitude versus distance curve acquisition. In an embodiment, a constant force feedback mechanism is enabled prior to the first time an AFM probe tip contacts a sample. The feedback mechanism setpoint is iteratively reduced while at least phase and amplitude of the probe tip are recorded as a function of the relative z-height of a cantilever coupled to the probe tip. The feedback mechanism setpoint may be repeatedly swept between upper and lower bounds to average out drift between the cantilever and sample. Upon detecting a threshold, an absolute tip-to-sample distance is determined and correlated to the relative z-heights. The amplitude and phase data recorded prior to tip-sample contact is then determined as a function of absolute tip-to-sample distance.

Abstract: A form measuring instrument measures a form of a surface of an object to be measured using a contact to follow the surface. A pseudo-measurement point acquirer acquires positional coordinates of the reference point of the contact as pseudo-measurement points when the contact touches the object at a plurality of locations. A normal vector generator estimates a surface or line along the pseudo-measurement points from the pseudo-measurement points to calculate normal vectors extending from the pseudo-measurement points to the surface or line. A contact model locator locates contact models which specify the surface form of the contact so as to coincide the pseudo-measurement points with reference points of the contact models and so as to coincide attitudes of the contact on measurement with attitudes of the contact models. A measurement point calculator calculates cross points as measurement points, at which the normal vectors cross the surfaces of the located contact models.

Abstract: A measuring device with a daisy type cantilever wheel enabling easier setting of a measuring head and modification head by rotating the daisy type cantilever wheel, enabling modification, adhesion of a sample, and application of a force to a sample specimen by using centrifugal force, and also enabling an easier measurement of a variation of characteristic vibration frequency and vibration amplitude of a cantilever array is provided.

Abstract: An SPM sensor (1) for a scanning probe microscope with a cantilever (3), a holding element (2) at one end of the cantilever (3) and a sensor tip (4) at the other end of the cantilever (3) and to a method for producing sensors of this type. The electron beam induced deposition (EBID or, shorter, EBD) structure (5) is anchored directly in the substrate of the sensor tip (4). The anchoring of the EBD structure (5) takes place with positive and nonpositive engagement in a hole (6) in the sensor tip (4), which is created by material removal in the substrate of the sensor tip (4). The method comprises the creation of the EBD structure by particle beam induced material deposition in the hole of the sensor tip.

Abstract: A measuring instrument comprising a stylus displaced following a work, the instrument further comprises a corrector for correcting a displacement in the translation axis direction value according to a height detection axis direction value of the stylus position in a plane specified by the height detection axis and the translation axis, the corrector comprising a calibration measuring device that obtains the calibration measurement data including the displacement information of the translation axis direction value corresponding to the height detection axis direction value of the stylus by moving the stylus; a correction parameter setting device that determines a correction parameter best suited for correcting the measurement error due to the vertical movement error of the stylus based on the displacement information of the stylus; and a measurement data correcting device that corrects a measurement data by using the correction parameter.

Abstract: A device such as a sensor for use in an atomic force microscope. The device comprises a first oscillator, a second oscillator, a pair of first co-axial members interconnecting the first and second oscillators for torsionally suspending the first oscillator, a support structure, and a pair of second co-axial members whose axis is orthogonal to an axis of the first co-axial members and which interconnect the second oscillator and the support structure for torsionally suspending the second oscillator.

Abstract: A quantum beam aided atomic force microscopy and quantum beam aided atomic force microscope that can simultaneously perform atomic-level configuration observation and elemental analysis with the use of an atomic force microscope and further can effect analysis of the chemical state of sample surface and that as being operable in liquids, can realize the elemental analysis and chemical state analysis of biosamples with an atomic-level resolving power. Accordingly, atoms of sample surface are irradiated with quantum beams, such as charged particles, electrons and photons, having a given electron transition energy characteristic of element, and any change in interaction force between the atoms of sample surface having been irradiated with quantum beams and the distal end of the probe is detected.

Abstract: In accordance with the invention, resonant quantum tunneling microscopy allows surface imaging while allowing characterization of physical properties associated with the surface.

Abstract: Roughness is added to the surface of a bluff body in a relative motion with respect to a fluid. The amount, size, and distribution of roughness on the body surface is controlled passively or actively to modify the flow around the body and subsequently the Vortex Induced Forces and Motion (VIFM). The added roughness, when designed and implemented appropriately, affects in a predetermined way the boundary layer, the separation of the boundary layer, the level of turbulence, the wake, the drag and lift forces, and consequently the Vortex Induced Motion (VIM), and the fluid-structure interaction. The goal of surface roughness control is to increase Vortex Induced Forces and Motion. Enhancement is needed in such applications as harnessing of clean and renewable energy from ocean/river currents using the ocean energy converter VIVACE (Vortex Induced Vibration for Aquatic Clean Energy).

Abstract: Roughness is added to the surface of a bluff body in a relative motion with respect to a fluid. The amount, size, and distribution of roughness on the body surface is controlled passively or actively to modify the flow around the body and subsequently the Vortex Induced Forces and Motion (VIFM). The added roughness, when designed and implemented appropriately, affects in a predetermined way the boundary layer, the separation of the boundary layer, the level of turbulence, the wake, the drag and lift forces, and consequently the Vortex Induced Motion (VIM), and the fluid-structure interaction. The goal of surface roughness control is to decrease/suppress Vortex Induced Forces and Motion. Suppression is required when fluid-structure interaction becomes destructive as in VIM of flexible cylinders or rigid cylinders on elastic support, such as underwater pipelines, marine risers, tubes in heat exchangers, nuclear fuel rods, cooling towers, SPAR offshore platforms.

Abstract: By forming an appropriate material layer, such as a metal-containing material, on a appropriate substrate and patterning the material layer to obtain a cantilever portion and a tip portion, a specifically designed nano-probe may be provided. In some illustrative aspects, additionally, a three-dimensional template structure may be provided prior to the deposition of the probe material, thereby enabling the definition of sophisticated tip portions on the basis of lithography, wherein, alternatively or additionally, other material removal processes with high spatial resolution, such as FIB techniques, may be used for defining nano-probes, which may be used for electric interaction, highly resolved temperature measurements and the like. Thus, sophisticated measurement techniques may be established for advanced thermal scanning, strain measurement techniques and the like, in which a thermal and/or electrical interaction with the surface under consideration is required.

Abstract: A high-resolution scanning probe microscope using a coherent dual-tip probe comprises two single-atom protrusions on a single crystal metal wire. As the dual-tip probe scans across the surface of a sample material under an electrical bias, an interferenced electron wave function formed by two protruding atoms interacts with electron wave functions of the sample surface. Such an interferenced wave function has a distinctive pattern of electron wave density as high as four times that of a single-atom tip. A more distinctive microscopic image of the sample surface is therefore generated. The resolution of the dual-tip scanning probe microscopic image is also higher than that obtained by a single-tip probe because the interferenced electron wave function provides a confined and densely distributed interactive region.

Abstract: A scanning probe microscope and method for using the same are disclosed. The scanning probe microscope includes a probe, an electro-mechanical actuator, and a controller. The probe has a tip that moves in response to an interaction between the tip and a local characteristic of a sample. The electro-mechanical actuator moves the sample relative to the probe tip in three dimensions. The controller maintains the probe tip in a fixed relationship with respect to the sample in one of the dimensions, and causes the electro-mechanical actuator to move the sample relative to the probe tip in the other two of the dimensions along a smooth path to generate an image of an object in the sample in an area sampled along the smooth path.

Abstract: A probe array for includes a handle, a first probe and a second probe. The first probe has a first shank, connected to the handle, and a first tip; and the second probe has a second shank, connected to the handle, and second tip. The first tip contains a different material from the second tip. The probe array may be used to write on a surface by contacting the first tip with a surface, where a first ink is on the first tip. This writing method may further include lifting the first tip from the surface and contacting the second tip with the surface.

Abstract: Measuring surface profiles of structures on integrated circuits is difficult when feature sizes are less than 100 nanometers. Atomic force microscopy provides surface profile measurement capability on flat horizontal surfaces, but has difficulty with three-dimensional structures such as MOS transistor gates, contact and via holes, interconnect trenches and photoresist patterns. An atomic force microscopy probe with two atomically sharp tips configured to facilitate measurements of three-dimensional structures is disclosed. A method of making such measurements using the disclosed probe and a method of fabricating an IC encompassing the method are also claimed.

Abstract: A cantilever for near field optical microscopes is equipped with a probe in the vicinity of a free end thereof. The probe includes a thin film portion constituted by at least one layer of thin film that serves as the surface of the probe, and an inner bulk portion which is covered by the thin film portion. The outermost layer of the thin film portion is a thin dielectric film, and a metal portion is provided toward the interior of the probe from the thin dielectric film.

Abstract: Highly efficient and highly sensitive sensors of small size are provided in desired position, desired shape and size for a micro structure that causes elastic deformation at least a part thereof. Moreover, utilizing the sensors allows facilitating to assemble and adjust the components, miniaturizing and simplifying the detection circuit, and measuring a local displacement of a fine part of the micro structure. A micro structure is a cantilever in which a beam part causes elastic deformation. This cantilever includes a sensor detecting elastic deformation of a beam part by tunneling effect.

Abstract: In the present invention, through a provision of a relay stand including a first relaying point, a second relaying point and a plurality of work mounting bases, a discharge/feed process of works between the relay stand and the work feed container and the work accommodation container is performed at the first relaying point and a load/unload process of works between the relay stand and the plurality of work inspection machines is performed at the second relaying point.

Abstract: In one general aspect, a method of processing surface profile measurements includes obtaining a calibration image, the calibration image including one or more surface profile measurements at one or more discrete points on a surface, performing calibration processing on the surface profile measurements, performing data processing on the surface profile measurements, and providing data output based upon the calibration processing and the data processing.

Abstract: Apparatus and techniques are provided for modifying and measuring surfaces of diamond workpieces and other workpieces with nanoscale precision. The apparatus and techniques exploit scanning probe microscopy (SPM) and atomic force microscopy (AFM) at a wide range of operating temperatures. In some embodiments, the SPM/AFM apparatus also includes an interferometric microscope and/or acoustic-wave microscope for making high-precision measurements of workpiece surfaces.

Abstract: A scanning probe microscope and method of operation for monitoring and assessing proper tracking between the tip and sample, as well as automating at least some aspects of AFM setup previously done manually. Preferably, local slopes corresponding to the acquired data are compared to determine a tracking metric that is self-normalizing.

Abstract: Provided are a scanning probe microscope (SPM) that prevents a distortion of an image caused by alignment errors of scanners and a method of measuring a sample using the same. The scanning probe microscope comprises a probe; a first scanner changing a position of the probe along a straight line; a second scanner changing a position of a sample in a plane; and an adjusting device adjusting a position of the second scanner or the first scanner so that the straight line where the position of the probe is changed using the first scanner is perpendicular to the plane in which the position of the sample is changed using the second scanner.

Abstract: Methods and apparatus for automatically determining a feedback setpoint for use in operating an atomic force microscope (AFM) are provided. The setpoint may be determined by modulating a feedback setpoint while monitoring for a change in a detector signal. In an effort to avoid tip damage and remain in non-contact, attractive mode during use, a setpoint just above a setpoint corresponding to a detected change in a parameter of the detector signal, such as an abrupt change in phase, may be used to operate the AFM.

Abstract: A method of assessing the degradation of an oxide-forming coating on a component after a period of operational use of the component, said degradation of the coating being caused by depletion of the oxide-forming element within a remnant coating layer due to inter-diffusion of said element between the remnant coating and both an outer oxide layer and an inner, secondary diffusion layer, wherein a depletion parameter indicative of the depletion of the oxide-forming element in the remnant coating layer varies as a function of the surface roughness of the coated component, the method comprising the steps of: carrying out a non-destructive, quantitative measurement of the surface roughness of the component after said period of operational use; and, based on an estimation of the functional relationship between the surface roughness and the depletion parameter, using the result of said measurement of surface roughness to quantitatively assess the degradation of the coating.

Abstract: The following invention pertains to the introduction of a gas (or fluid) around a SPM probe or nanotool™ to control chemical activity e.g. oxygen to promote oxidation, argon to inhibit oxidation or clean dry air (CDA) to inhibit moisture to control static charging due to the action of the probe or nanotools and to provide vacuum at and around the tip and substrate area. The invention can also produce electrical current for use with active electronic devices on, in or near the body of the device. In addition by use of a fluid like water, certain oils, and other liquids in conjunction with specific tip structure either electric discharge machining can be used at the tip area on the tip itself (in conjunction with a form structure on the work piece) or on a work piece beneath the tip to shape, polish and remove material at very small scales (10 microns to 1 nm or less).

Abstract: A scanning probe microscope in which the probe is oscillated at a frequency lower than its resonant frequency, a force sensor that is sensitive to the bending of the cantilever and minimally sensitive to the oscillation is used to measure tip-sample interaction force. The sensor signal is then converted to a force gradient signal by electronics. The gradient signal is kept constant by a feedback mechanism as the tip is scanned across the surface of a sample, and force and topographical information are mapped.

Abstract: In a tapping mode Atomic Force Microscope (AFM) system, a probe is excited at an excitation frequency other than the probe's first natural frequency to produce a response signal manifesting a grazing bifurcation between “non-collision” and “collision” states of the AFM system, so that an additional characteristic frequency component is generated in the “collision” state. The magnitude of the additional characteristic frequency component is monitored in real time, and the probe-sample separation is adjusted to maintain the monitored magnitude at an optimal value to operate the AFM system at near-grazing conditions.

Abstract: One inventive aspect is related to an atomic force microscopy probe. The probe comprises a tip configuration with two probe tips on one cantilever arm. The probe tips are electrically isolated from each other and of approximately the same height with respect to the cantilever arm. The outer surface of the tip configuration has the shape of a body with a base plane and an apex. The body is divided into two sub-parts by a gap located approximately symmetrically with respect to the apex and approximately perpendicular to the base plane. Another inventive aspect related to methods for producing such an AFM probe.

Abstract: A bimorphic structure responsive to changes in an environmental condition, sensor structures incorporating one or more of such bimorphic structures, and a method of forming such bimorphic structures. The sensor structure has an electrically-conductive first contact on a substrate, and a bimorph beam anchored to the substrate so that a portion thereof is suspended above the first contact. The bimorph beam has a multilayer structure that includes first and second layers, with the second layer between the first layer and the substrate. A portion of the first layer projects through an opening in the second layer toward the first contact so as to define an electrically-conductive second contact located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate.

Abstract: A method of fabricating a nanoscale cantilever probe. In one embodiment, the method includes the steps of forming a cantilever having a tip vertically extending from an end portion of the cantilever, where the tip has an apex portion having a size in a range of about 1-1000 nm, and selectively doping the cantilever with a dopant to define a first doping region in the tip and a second doping region in the rest of the cantilever, where the dopant concentration of the first doping region is substantially lower than that of the second doping region.

Abstract: A scanning probe microscope for measuring a surface profile of a sample by bringing a probe into close proximity to or contact with the surface of the sample and scanning the sample surface includes: a sample stage movable in at least one axis direction; the probe which is brought into close proximity to or contact with the surface of the sample mounted on the sample stage and scans the sample surface; a probe-driving unit for moving the probe three-dimensionally; a probe deflection detector for detecting a deflection of the probe; and an observation optical system which has an objective lens and observes the probe disposed on substantially the optical axis of the objective lens, and the sample. The probe-driving unit is disposed with three sets of paired drive sources arranged essentially with symmetry with respect to the optical axis of the objective lens.

Abstract: An apparatus measures a surface position of an object. The apparatus includes an array of members, each of which comprises a probe for an atomic force from the object and is configured to move in accordance with the atomic force, an optical system configured to project a measurement light onto each of the array of members and to receive the measurement light reflected off each of the array of members, and a detector configured to detect the measurement light directed through the optical system with respect to each of the array of members.

Abstract: A surface texture measuring device comprises a display control unit operative to display a drawing symbol entry screen having entry areas of drawing symbols. An entry acceptance unit is provided to accept the input of the drawing symbol into the entry area provided in the drawing symbol entry screen. An arithmetic unit is provided to calculate surface texture information that indicates a surface texture of an object to be measured, from the measurement result of surface displacements of the object, based on the drawing symbol accepted at the entry acceptance unit.

Abstract: A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material.

Abstract: Provided is a photomask defect correction method including: an observing step of scanning plurality of lines one after another while controlling a distance between the probe tip and a surface (2a) of the substrate so that displacement of the probe becomes constant to recognize a shape of the defect portion (5) through AFM observation; and a processing step of scanning a plurality of lines one after another while pressing the probe tip to the recognized defect portion with a predetermined force to subject the defect portion to cutting and removing processing, in which, at the observing step, the scanning for every one line is set in a parallel direction (C direction) to an edge (3a) of a mask pattern (3), and the scanning of the plurality of lines is performed one after another from the mask pattern side towards a tip side (D direction) of the defect portion.

Abstract: [Object of the Invention] To provide a probe 1 for use in a cantilever 2 of an scanning probe microscope (SPM) manufacturable in a simple manufacturing process and usable while allowing full use of the properties of single-crystalline material and a cantilever 2 using that probe. [Solution] A probe 1 disposed at the tip of beam part 2a of a cantilever 2 used for an SPM, wherein the probe 1 comprises a needle-like part 1a having a length of not less than 10 ?m or and a flat plate part 1b having a face contacting a beam part of the cantilever, the needle-like part 1a and the flat plate part 1b are integrally formed with a single-crystalline material, and at least one side face of the flat plate part 1b contains a flat surface 1c in order to indicate the crystal orientation of the single-crystalline material.

Abstract: In a probe apparatus that intermittently irradiates a sample with excitation light to observe the sample while subjecting a cantilever including a probe arranged to face a surface of the sample to self-excited vibration at a predetermined frequency, the sample is irradiated with the excitation light at a predetermined timing when a distance between the probe and the sample is not greater than a predetermined distance.

Abstract: The invention relates to a sensor for the quantitative measurement of the feel of a surface, comprising a prehensile envelope, a hollow contact body for bringing into contact with the surface on a sensing zone, first acoustic detection elements to detect noises emitted by the hollow body on contact with the sensing zone, second mechanical detection elements embodied for measurement of the normal pressure or the normal pressure and the rubbing force exerted by the surface on the hollow body. The above is of application in the measurement of the triboacoustic properties of the skin or phanera, textiles, leather, plastic materials or any other material for which the an appreciation of the feel thereof is important.

Abstract: A method of producing a probe device for a metrology instrument such as an AFM includes providing a substrate having front and back surfaces and then forming an array of tip height structures on the first surface of the substrate, the structures having varying depths corresponding to selectable tip heights. The back surface of the substrate is etched until a thickness of the substrate substantially corresponds to a selected tip height, preferably by monitoring this etch visually and/or monitoring the etch rate. The tips are patterned from the front side of the wafer relative to fixed ends of the cantilevers, and then etched using an anisotropic etch. As a result, probe devices having sharp tips and short cantilevers exhibit fundamental resonant frequencies greater than 700 kHz or more.

Abstract: A method of assessing the surface roughness of an object includes directing gas supplied at a constant pressure through a control orifice and subsequently to a measurement nozzle adjacent to and spaced from a surface of the object, with subsequent escape of the gas to the atmosphere. The object is moved past the measurement nozzle and the resultant back pressure of the gas upstream of the measurement nozzle and downstream of the control nozzle is measured to provide a back pressure signal. The frequency content of the back pressure signal is examined to thereby obtain an assessment of the surface roughness of the object.

Abstract: The present invention provides microcoaxial probes fabricated from semiconductor heterostructures that include strained semiconductor bilayers. The microcoaxial probes are well suited for use as scanning probes in scanning probe microscopy, including scanning tunneling microscopy (STM), atomic force microscopy (AFM), scanning microwave microscopy, or a combination thereof.

Abstract: A miniaturized spring element is intended to be particularly suitable for use as a beam probe or cantilever for detecting atomic or molecular forces, in particular in an atomic force microscope, and, to this end, is intended to make it possible to detect its deflection in a particularly reliable manner and with high resolution. For this purpose, the spring element contains a basic body which is formed from a matrix containing embedded nanoparticles or defects. The spring element is produced using the principle of local deposition with focused energetic particles or electromagnetic waves or by pyrolytically induced deposition.

Abstract: A surface-roughness/contour measuring apparatus (1) comprises: a stylus orientation changing part (9) by which a rotatable support part (62, 64, 71a, 71b) for supporting a cantilever (7) in such a manner as to be rotatable on a rotational axis extending in a direction perpendicular to the longitudinal direction of the cantilever (7) is rotated about the longitudinal direction of the cantilever (7), thereby changing the orientation of a stylus (11) provided at a forward end of the cantilever (7); and a balancing member (63) which balances the weight of the cantilever (7) about the rotational axis in order to eliminate the effect of the gravitational force acting on the cantilever (7) rotating with the rotation of the rotatable support part (62, 64, 71a, 71b).

Abstract: A tubular piezoelectric device which is cylindrically shaped and has cutouts in one end portion. The one end portion of the piezoelectric device is mounted to a mount stage made of a material that has a different coefficient of thermal expansion from the material of the piezoelectric device. Electrodes are mounted on the piezoelectric body. The micromotion device produces micromotions of the other end portion of the piezoelectric body. The cutouts produce elastic deformation which absorbs differences in the amount of deformation between the piezoelectric body and the mount stage caused by temperature variations.

Abstract: A method of operating a probe based instrument includes a light source that generates and directs a beam of light towards a probe of the instrument to detect a property of probe deflection. The method automatically adjusts the position of the light beam on the probe based on movement of the probe by a Z actuator so as to eliminate apparent parasitic deflection of the probe. A light source assembly for detecting deflection of a probe preferably includes a base, a tip/tilt stage mounted on the base and a light source supported by the tip/tilt stage. The tip/tilt stage includes at least one electrically actuated fine adjustment actuator that controls the tip/tilt stage, preferably independently of movement of the AFM scanner used to move the probe.

Abstract: Apparatus and techniques for extracting information carried in higher eigenmodes or harmonics of an oscillating cantilever or other oscillating sensors in atomic force microscopy and related MEMs work are described. Similar apparatus and techniques for extracting information using contact resonance with multiple excitation signals are also described.

Abstract: A texture measuring apparatus that measures surface information of an object includes: a probe coming into contact with the object while moving on a surface of the object; a first sensor unit, provided at the probe, for detecting a force acting on the probe in a direction perpendicular to a lengthwise direction of the probe; and a second sensor unit, provided at the rear of the probe, for detecting a force acting on the probe in the lengthwise direction of the probe. The apparatus further includes a third sensor unit, provided between the first sensor unit and the second sensor unit, for detecting variations in the forces acting on the probe.