Roughness Patents (Class 73/105)
  • Publication number: 20090007645
    Abstract: The invention is direct to a piezoelectric microcantilever for static contact and dynamic noncontact atomic force microscopy which may be carried out in solution. The piezoelectric microcantilever, which includes a piezoelectric layer and a non-piezoelectric layer is capable of self actuation and detection. The piezoelectric layer may be constructed from a lead magnesium niobate-lead titanate (Pb(Mg1/3Nb2/3)O3)0.65—(PbTiO3)0.35(PMN0.65-PT0.35)(PMN-PT), zirconate titanate (PZT)/SiO2 or from any lead-free piezoelectric materials such as doped sodium-potassium niobate-lithium niobate. The piezoelectric layers of the microcantilevers may have dielectric constants of from 1600-3000 and thicknesses below 10 ?m. Also disclosed are methods for fabricating microcantilever sensors and methods for atomic force microscopy employing the microcantilevers.
    Type: Application
    Filed: November 28, 2007
    Publication date: January 8, 2009
    Applicant: DREXEL UNIVERSITY
    Inventors: WAN Y. SHIH, WEI-HENG SHIH, ZUYAN SHEN, QING ZHU
  • Patent number: 7473894
    Abstract: The invention relates to an apparatus and a method for a scanning probe microscope, comprising a measuring assembly which includes a lateral shifting unit to displace a probe in a plane, a vertical shifting unit to displace the probe in a direction perpendicular to the plane, and a specimen support to receive a specimen. A condenser light path is formed through the measuring assembly so that the specimen support is located in the area of an end of the condenser light path.
    Type: Grant
    Filed: March 20, 2006
    Date of Patent: January 6, 2009
    Assignee: JPK Instruments AG
    Inventors: Detlef Knebel, Torsten Jähnke, Olaf Sünwoldt
  • Patent number: 7472579
    Abstract: An apparatus and method for precisely detecting very small distances between a measurement probe and a surface, and more particularly to a proximity sensor using a constant liquid flow and sensing a liquid mass flow rate within a bridge to detect very small distances. Within the apparatus the use of a flow restrictor and/or snubber made of porous material and/or a liquid mass flow rate controller enables detection of very small distances in the nanometer to sub-nanometer range. A further embodiment wherein a measurement channel of a proximity sensor is connected to multiple measurement branches.
    Type: Grant
    Filed: February 24, 2006
    Date of Patent: January 6, 2009
    Assignee: ASML Holding N.V.
    Inventor: Kevin J. Violette
  • Patent number: 7472585
    Abstract: In accordance with the invention, rapid surface seeks to the measurement surface by a scanning probe microscope are enabled by using an actuator coupled to a position sensor.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: January 6, 2009
    Assignee: Agilent Technologies, Inc.
    Inventor: Daniel Y Abramovitch
  • Patent number: 7473887
    Abstract: A scanning probe microscope detects or induces changes in a probe-sample interaction. In imaging mode, the probe 54 is brought into a contact distance of the sample 12 and the strength of the interaction measured as the probe 54 and sample surface are scanned relative to each other. Image collection is rapidly performed by carrying out a relative translation of the sample 12 and probe 54 whilst one or other is oscillated at or near its resonant frequency. In a preferred embodiment the interaction is monitored by means of capacitance developed at an interface between a metallic probe and the sample. In lithographic mode, an atomic force microscope is adapted to write information to a sample surface.
    Type: Grant
    Filed: July 2, 2003
    Date of Patent: January 6, 2009
    Assignee: University of Bristol of Senate House
    Inventors: Mervyn John Miles, Andrew David Laver Humphris, Jamie Kayne Hobbs
  • Publication number: 20090000364
    Abstract: Probe-based methods are provided for formation of one or more nano-sized or micro-sized elongated structures such as wires or tubes. The structures extend at least partially upwards from the surface of a substrate, and may extend fully upward from the substrate surface. The structures are formed via a localized electrodeposition technique. The electrodeposition technique of the invention can also be used to make modified scanning probe microscopy probes having an elongated nanostructure at the tip or conductive nanoprobes. Apparatus suitable for use with the electrodeposition technique are also provided.
    Type: Application
    Filed: February 20, 2008
    Publication date: January 1, 2009
    Inventor: Min-Feng Yu
  • Publication number: 20090000363
    Abstract: Disclosed herein are surface force microscope probes comprising living cells adhered thereto, as well as methods of making same. Also disclosed is a system for high throughput screening of nanostructures having biological relevance through use of surface force microscope probes comprising living cells. Further disclosed are methods of screening for biointeractive nanostructures.
    Type: Application
    Filed: March 23, 2006
    Publication date: January 1, 2009
    Inventors: Scott C. Brown, Brij M. Moudgil, Yakov I. Rabinovich, Veena B. Antony, Mohammed A. Katnal
  • Publication number: 20090000365
    Abstract: AFM tweezers includes: a first probe that comprises a triangular prism member having a ridge, a tip of which is usable as a probe tip in a scanning probe microscope; a second probe that comprises a triangular prism member provided so as to open/close with respect to the first probe. The first probe and the second probe are juxtaposed such that a predetermined peripheral surface of the triangular prism member of the first probe and a predetermined peripheral surface of the triangular prism member of the second probe face substantially in parallel to each other, and the first probe formed of a notch that prevents interference with a sample when the sample is scanned by the tip of the ridge.
    Type: Application
    Filed: June 20, 2008
    Publication date: January 1, 2009
    Applicants: AOI Electronics Co., Ltd., SII Nano Technology Inc.
    Inventors: Tatsuya KOBAYASHI, Masato SUZUKI, Masatoshi YASUTAKE, Takeshi UMEMOTO
  • Publication number: 20090000362
    Abstract: A nanotweezer (1) according to the present invention includes: a supporting member (25); an observation probe (10) that projects out from the supporting member (25), and is used when observing a surface of a specimen; a movable arm (20) that is arranged next to the observation probe (10) projecting out from the supporting member (25), and makes closed or opened between the observation probe (10) and the movable arm (20) to hold or release the specimen held between the observation probe (10) and the movable arm (20); and a drive mechanism that drives the movable arm (20) so as to make closed or opened between the observation probe (10) and the movable arm (20), and the supporting member (25), the observation probe (10) and the movable arm (20) are each formed by processing a semiconductor wafer (30) through a photolithography process.
    Type: Application
    Filed: November 22, 2005
    Publication date: January 1, 2009
    Applicants: NATIONAL UNIVERSITY CORPORATION KAGAWA UNIVERSITY, AOI ELECTRONICS CO., LTD.
    Inventors: Gen Hashiguchi, Maho Hosogi, Takashi Konno
  • Publication number: 20080314131
    Abstract: There is provided a sample manipulating apparatus 1 which is an apparatus of manipulating a sample S mounted on a substrate surface 2a, in which at least a position data and a shape data are acquired by observing the sample S, thereafter, a tweezers 4 is positioned by moving means 5 such that the sample S is positioned between an observing probe 15 and a grasping probe 16 based on the two data, after the positioning, a height of the tweezers 4 is set to a position of being remote from the substrate surface 2a by a constant distance by moving means 5 while monitoring a result of measurement by displacement measuring means 7, thereafter, the grasping probe 16 is moved to a side of the observing probe 15 while monitoring the result of measurement by the displacement measuring means 7 at the set height and the sample S is grasped while detecting a grasping start point.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 25, 2008
    Applicant: SII Nano Technology, Inc.
    Inventors: Masatoshi Yasutake, Takeshi Umemoto, Masafumi Watanabe
  • Publication number: 20080316904
    Abstract: The present invention relates to a method of reducing the wear of a tip of a probe when the tip is in contact with a surface of a substrate and when the probe is mounted on a support structure. A method is provided where a load force is applied to the probe, thereby causing the tip to be maintained substantially in contact with the substrate surface and a modulation step where the e magnitude of the load force is modulated at a modulation frequency. The modulation frequency is selected to be greater than a fundamental vibration frequency of the support structure on which the probe is mounted.
    Type: Application
    Filed: May 7, 2008
    Publication date: December 25, 2008
    Inventors: Urs T. Duerig, Bernd W. Gotsmann, Armin W. Knoll, Mark Alfred Lantz
  • Patent number: 7467542
    Abstract: In accordance with one aspect of the present invention, a cantilever of a probe-based instrument is deflected by directing a beam of ultrasonic acoustic energy at the cantilever to apply acoustic radiation pressure to the cantilever. The energy is generated by an acoustic actuator. The transmitted beam preferably is focused using a cylindrical lens, providing a beam tightly focused in one dimension and unfocused in a second dimension. In accordance with another aspect of the present invention, a power source such as an RF signal generator is operated so as to spread the spectrum of acoustic radiation on a time scale that is short or comparable to the acoustic roundtrip time. Such a design diminishing the resonance effects and sensitivity to spacing between the cantilever and the acoustic source.
    Type: Grant
    Filed: September 28, 2005
    Date of Patent: December 23, 2008
    Assignee: Palo Alto Research Center Incorporated
    Inventor: Scott A. Elrod
  • Publication number: 20080307864
    Abstract: Provided is an atomic force microscope capable of increasing the phase detection speed of a cantilever vibration. The cantilever (5) is excited and the cantilever (5) and a sample are relatively scanned. Displacement of the cantilever (5) is detected by a sensor. An oscillator (27) generates an excitation signal of the cantilever (5) and generates a reference wave signal having a frequency based on the excitation signal and a fixed phase. According to vibration of the cantilever (5), a trigger pulse generation circuit (41) generates a trigger pulse signal having a pulse position changing in accordance with the vibration of the cantilever (5). According to the reference wave signal and the trigger pulse signal, a phase signal generation circuit (43) generates a signal corresponding to the level of the reference wave signal at the pulse position as a phase signal of vibration of the cantilever (5). As the reference wave signal, a saw tooth wave is used.
    Type: Application
    Filed: December 12, 2006
    Publication date: December 18, 2008
    Applicant: National University Corporation Kanazawa University
    Inventors: Takayuki Uchihashi, Toshio Ando, Hayato Yamashita
  • Publication number: 20080307866
    Abstract: Small tweezers having a pair of arms openable and closable is moved closer to a sample and grips a particle attached on a surface of the sample and carries it onto an adhesion member to attach it thereto. The small tweezers are opened to release the particle and brought away from the adhesion member to leave the particle on the adhesion member. A particle removing device includes small tweezers having a pair of arms openable and closable; an opening/closing driving unit that drives the arm or arms to open/close the small tweezers; a stage mounting an adhesion member that attaches thereto a particle to withdraw the particle; and a moving mechanism that moves the small tweezers between the sample and the adhesion member mounted on the stage. Also, an atomic force microscope and a charged ion beam apparatus that include the particle removing device are disclosed.
    Type: Application
    Filed: June 13, 2008
    Publication date: December 18, 2008
    Applicants: AOI Electronics Co., Ltd., SII Nano Technology Inc.
    Inventors: Hayashi Hiroki, Konno Takashi, Iwasaki Kouji, Yasutake Masatoshi, Tashiro Junichi
  • Publication number: 20080307865
    Abstract: In accordance with an embodiment of the invention, there is a force sensor for a probe based instrument. The force sensor can comprise a detection surface and a flexible mechanical structure disposed a first distance above the detection surface so as to form a gap between the flexible mechanical structure and the detection surface, wherein the flexible mechanical structure is configured to deflect upon exposure to an external force, thereby changing the first distance over a selected portion of the gap, the change in distance at the selected portion orienting a probe tip of the force sensor for multi-directional measurement.
    Type: Application
    Filed: June 10, 2008
    Publication date: December 18, 2008
    Applicant: GEORGIA TECH RESEARCH CORPORATION
    Inventor: Fahrettin L. Degertekin
  • Patent number: 7464584
    Abstract: A semiconductor probe and a method of writing and reading information using the same. The semiconductor probe includes a cantilever and a tip formed on an end portion of the cantilever to write or read information on or from a ferroelectric medium on a surface of which an electrode is formed. The tip includes a resistive region lightly doped with semiconductor impurities and a conductive region heavily doped with the semiconductor impurities. The cantilever includes an electrostatic force generation electrode formed on a bottom surface facing the medium. A contact force between the tip and the medium is adjusted by selectively applying a voltage between the electrode formed on the ferroelectric medium and the electrostatic force generation electrode.
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: December 16, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hong-sik Park, Ju-hwan Jung, Hyoung-soo Ko, Seung-bum Hong
  • Patent number: 7464583
    Abstract: Apparatuses and methods for using proximal probes. A method includes measuring motion of an oscillating probe, producing a signal indicative of motion of the oscillating probe, and filtering the signal indicative of motion of the oscillating probe. In one embodiment, filtering includes performing signal decomposition to produce a filtered signal. In another form, filtering includes performing a Fourier transform, comb filtering in the frequency domain, and performing an inverse Fourier transform to produce a filtered signal. In another embodiment, filtering includes amplifying specific frequencies of the signal indicative of motion of the oscillating probe. Apparatuses according to the present invention are also provided.
    Type: Grant
    Filed: June 9, 2006
    Date of Patent: December 16, 2008
    Assignee: Carnegie Mellon University
    Inventors: Tomasz P. Kowalewski, Justin Allen Legleiter
  • Patent number: 7462270
    Abstract: The various embodiments discloses a cantilever probe comprising a first electrode and a second electrode engaged to a substrate and a branched cantilever wherein the cantilever comprises a nanostruture. Furthermore, the probe comprises a first arm of the cantilever engaged to the first electrode and a second arm of the cantilever engaged to the second electrode. Additionally, the cantilever probe comprises an electrical circuit coupled to the cantilever wherein the electrical circuit is capable of measuring a change in piezoresistance of the cantilever resulting from an atomic force and/or a magnetic force applied to the cantilever. Additionally, the invention discloses a method of performing atomic force microscopy, magnetic force microscopy, or magnetic resonance force microscopy. The nanostructures may comprise carbon or non-carbon materials. Additionally, the nanostructures may include nanotubes, nanowire, nanofibers and various other types of nanostructures.
    Type: Grant
    Filed: May 7, 2007
    Date of Patent: December 9, 2008
    Assignee: The Trustees of Boston College
    Inventor: Michael J. Naughton
  • Patent number: 7461543
    Abstract: A method, system and unit for determining alignment in a layered device such as a semiconductor device includes providing a first layer having detectable surface and subsurface material properties and positioning a patterned photoresist layer over the first layer, patterned photoresist layer having detectable surface and subsurface material properties. The layers are imaged with a FIRAT probe to detect the material properties, and the detectable material properties are compared for mapping an alignment of the compared detectable material properties. The first layer may be a substrate or have a previously processed layer formed thereon. A surface topography may be included over the substrate and an etchable layer formed over the substrate or first layer. The FIRAT probe may be a single tip probe or a dual tip probe.
    Type: Grant
    Filed: October 11, 2006
    Date of Patent: December 9, 2008
    Assignee: Georgia Tech Research Corporation
    Inventor: Fahrettin Levent Degertekin
  • Publication number: 20080295570
    Abstract: There is provided a scanning probe microscope employing a positioning apparatus M1 including a unit to be driven in XY direction having a substantially square form in plane geometry at the center of the plane in the XY directions and having a first elastic support that bends in the X-axis direction at least on one side of the square form and a second elastic support that bends in the Y-axis direction at least on one side orthogonal to the side and a support unit that supports a stage unit 1 in the XY directions such that the facing surface can face in parallel against the facing surface of the unit to be driven in the XY directions. The positioning apparatus has a space of a predetermined thickness between the surface corresponding to the unit to be driven in the XY directions at least and the facing surface of the support unit that faces against it, and the space is filled with a viscosity agent.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 4, 2008
    Applicant: SII Nano Technology, Inc.
    Inventors: Masafumi Watanabe, Masatoshi Yusutake
  • Publication number: 20080295584
    Abstract: A scanning probe microscope and methodology called resonant difference-frequency atomic force ultrasonic microscopy (RDF-AFUM), employs an ultrasonic wave launched from the bottom of a sample while the cantilever of an atomic force microscope, driven at a frequency differing from the ultrasonic frequency by one of the contact resonance frequencies of the cantilever, engages the sample top surface. The nonlinear mixing of the oscillating cantilever and the ultrasonic wave in the region defined by the cantilever tip-sample surface interaction force generates difference-frequency oscillations at the cantilever contact resonance. The resonance-enhanced difference-frequency signals are used to create images of nanoscale near-surface and subsurface features.
    Type: Application
    Filed: August 24, 2007
    Publication date: December 4, 2008
    Applicant: Administrator of the National Aeronautics and Space Administration
    Inventors: John H. Cantrell, Sean Cantrell
  • Publication number: 20080295585
    Abstract: A tweezer-equipped scanning probe microscope comprises a first arm with a probing portion, a second arm that moves along an opening direction or a closing direction relative to the first arm, an electrostatic actuator that drives the second arm along the opening direction or the closing direction based upon an opening/closing drive voltage applied thereto, an amplifier that induces self-oscillation in the electrostatic actuator by using an electrically equivalent circuit accompanying the electrostatic actuator as a feedback circuit and causes the second arm to vibrate through the self-oscillation, and a vibration state detection unit that detects a change of vibration state of the second arm as the second arm contacts an object.
    Type: Application
    Filed: May 30, 2008
    Publication date: December 4, 2008
    Applicants: AOI Electronics Co., Ltd., SII Nano Technology Inc.
    Inventors: Takashi Konno, Masatoshi Yasutake
  • Publication number: 20080295583
    Abstract: The invention relates to a dynamic-mode surface (12) scanning method in which a cantilever (10) provided with a probe (18) is non-positively coupled to the surface and is made to oscillate in a resonant fashion using positive feedback, wherein the resonant oscillation contains at least one higher harmonic whose frequency represents an integer multiple of the basic resonance frequency of the cantilever which is force-coupled to the surface. According to the invention, the amplitude or the phases of the at least one higher harmonic oscillation is determined as a control variable in order to regulate the distance between the probe (18) and the surface (14).
    Type: Application
    Filed: April 14, 2005
    Publication date: December 4, 2008
    Inventor: Fran Josef Giessibl
  • Publication number: 20080295571
    Abstract: A form measuring mechanism 100 which measures a form of an object 102 to be measured by bringing a probe 124 into direct contact with the object 102, includes a plurality of reference spheres 130a and 130b for calibrating the form of the probe 124, a judging means 154 for judging form abnormal values common in position and size to each other and form abnormal values not common to each other obtained by measuring the reference spheres 130a and 130b, and a notifying means 156 for notifying at least anyone of a contamination or dust adhering state of the probe 124 judged from the common form abnormal values and a worn state and contamination or dust adhering states of the reference spheres 130a and 130b judged from the form abnormal values not common to each other.
    Type: Application
    Filed: May 21, 2008
    Publication date: December 4, 2008
    Applicant: MITUTOYO CORPORATION
    Inventors: Yasuhiro Takahama, Masaoki Yamagata
  • Patent number: 7458254
    Abstract: There are provided an apparatus for evaluating a piezoelectric film, which contains: a detection unit containing a pair of probes, each probe containing a cantilever and a probe tip; and an evaluation unit, wherein the detection unit is configured to respectively place the probe tips on both surfaces of a sample comprising a piezoelectric film so as to detect a displacement magnitude of the pair of probes, and the evaluation unit is configured to evaluate either or both a deformation and a displacement of the piezoelectric film based upon the detected displacement magnitude of the pair of probes, and a method for evaluating a piezoelectric film by using the apparatus for evaluating a piezoelectric film.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: December 2, 2008
    Assignee: Fujitsu Limited
    Inventors: Toshihisa Anazawa, Mineharu Tsukada
  • Publication number: 20080289404
    Abstract: A molecule measuring apparatus capable of controlling the drawing directions of molecules always in a uniaxial direction in a measurement performed by extending and retracting the molecules on a substrate. In the apparatus, a cantilever (200) lifts one end of a molecule (900) on the substrate (100), and a control section controls the peeling point of the molecules, which is a boundary between the portion of the molecule (900) in contact with the substrate (100) and the portion of the molecule (900) separated from the substrate (100) by the lifting, and the position of the cantilever (200) so that the peeling point and the position of the cantilever (200) are positioned vertical to the substrate (100).
    Type: Application
    Filed: July 8, 2005
    Publication date: November 27, 2008
    Inventors: Takaharu Okajima, Hiroshi Tokumoto
  • Patent number: 7456400
    Abstract: A scanning probe microscope has a probe needle and a control section that controls relative scanning movement between the probe needle and a surface of a sample in at least one direction parallel to the sample surface and controls relative movement between the probe needle and the sample surface in a direction perpendicular to the sample surface. A vibration source vibrates the probe needle at a vibrating frequency relative to the sample surface. An approach/separation drive section causes the probe needle to relatively approach to and separate from the sample surface at a predetermined distance while the probe needle is vibrated at the vibrating frequency relative to the sample surface by the vibration source. A detection section detects a rate of change in a vibration state of the probe needle in accordance with a distance between the probe needle and the sample surface.
    Type: Grant
    Filed: September 26, 2005
    Date of Patent: November 25, 2008
    Assignee: Seiko Instruments Inc.
    Inventors: Masatsugu Shigeno, Yoshiharu Shirakawabe, Amiko Nihei, Osamu Matsuzawa, Naoya Watanabe, Akira Inoue
  • Patent number: 7456698
    Abstract: A mechanical self-reciprocating oscillator and mechanism and method for establishing and maintaining regular back and forth movement of a micromachined device without the aid of any electronic components are provided. The fully mechanical micromachined oscillator and mechanism are driven using only a DC power source on at least one substrate such as a semiconductor chip. The oscillator and mechanism preferably include an electrothermal actuator, that, when actuated, opens a switch to cut off supply current to the actuator. Two versions of the oscillator and mechanism are provided using distinct hysteresis mechanisms, one structural and the other thermal.
    Type: Grant
    Filed: January 20, 2005
    Date of Patent: November 25, 2008
    Assignee: The Regents of the University of Michigan
    Inventors: Yogesh B. Gianchandani, Kabir Udeshi
  • Publication number: 20080282819
    Abstract: A probe assembly for an instrument and a method of manufacture includes a substrate and a cantilever having a length that is independent of typical alignment error during fabrication. In one embodiment, the probe assembly includes a buffer section interposed between the substrate and the cantilever. The cantilever extends from the buffer section and a portion of the buffer section extends beyond an edge of the substrate. The portion of the buffer section is more stiff than the cantilever. The corresponding method of producing the probe assembly facilitates batch fabrication without compromising probe performance.
    Type: Application
    Filed: May 19, 2008
    Publication date: November 20, 2008
    Inventors: Kevin J. Kjoller, Ami Chand, Nihat Okulan
  • Publication number: 20080283755
    Abstract: An AFM based technique has been demonstrated for performing highly localized IR spectroscopy on a sample surface. Such a technique implemented in a commercially viable analytical instrument would be extremely useful. Various aspects of the experimental set-up have to be changed to create a commercial version. The invention addresses many of these issues thereby producing a version of the analytical technique that cab be made generally available to the scientific community.
    Type: Application
    Filed: May 15, 2007
    Publication date: November 20, 2008
    Inventors: A. Dazzi Dazzi, Rui Prazeres, Mike Reading, Kevin Kjoller
  • Patent number: 7451637
    Abstract: A method of evaluating contact characteristics of an object having a roughness includes setting geometric shape data for the roughness; creating a roughness model and a structure model that comes in contact with the roughness, based on the geometric shape data set; making the roughness model and the structure model come in contact with each other; acquiring a physical amount occurring at least one of a contact region of the roughness model and a contact region of the structure model; and obtaining an evaluation value for evaluating a real contact state in the contact region between the roughness model and the structure model, from the physical amount acquired.
    Type: Grant
    Filed: July 5, 2005
    Date of Patent: November 18, 2008
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventors: Masatoshi Kuwajima, Toshihiko Okano
  • Patent number: 7451638
    Abstract: A harmonic cantilever for use in an atomic force microscope includes a cantilever arm and a probe tip. The cantilever arm has a shape selected to tune the fundamental resonance frequency or a resonance frequency of a selected higher order mode so that the fundamental and higher-order resonance frequencies have an integer ratio or near integer ratio. In one embodiment, the cantilever arm can be shaped to tune the fundamental resonance frequency. Alternately, the cantilever arm can include a geometric feature for tuning the resonance frequency of the fundamental mode or the selected higher order mode. An imaging method using the harmonic cantilever is disclosed whereby signals at the higher harmonics are measured to determine the material properties of a sample. In other embodiment, a cantilever includes a probe tip positioned at a location of minimum displacement of unwanted harmonics for suppressing signals associated with the unwanted harmonics.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: November 18, 2008
    Assignee: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Ozgur Sahin, Abdullah Atalar, Calvin F. Quate, Olav Solgaard
  • Publication number: 20080277582
    Abstract: A method of operating a metrology instrument includes generating relative motion between a probe and a sample at a scan frequency using an actuator. The method also includes detecting motion of the actuator using a position sensor that exhibits noise in the detected motion, and controlling the position of the actuator using a feedback loop and a feed forward algorithm. In this embodiment, the controlling step attenuates noise in the actuator position compared to noise exhibited by the position sensor over the scan bandwidth. Scan frequencies up to a third of the first scanner resonance frequency or greater than 300 Hz are possible.
    Type: Application
    Filed: May 7, 2007
    Publication date: November 13, 2008
    Inventors: Jian Shi, Chanmin Su, Craig Prater, Ji Ma
  • Publication number: 20080276695
    Abstract: A method, and corresponding apparatus, of imaging sub-surface features at a plurality of locations on a sample includes coupling an ultrasonic wave into a sample at a first lateral position. The method then measures the amplitude and phase of ultrasonic energy near the sample with a tip of an atomic force microscope. Next, the method couples an ultrasonic wave into a sample at a second lateral position and the measuring step is repeated for the second lateral position. Overall, the present system and methods achieve high resolution sub-surface mapping of a wide range of samples, including silicon wafers. It is notable that when imaging wafers, backside contamination is minimized.
    Type: Application
    Filed: May 12, 2008
    Publication date: November 13, 2008
    Applicant: VEECO INSTRUMENTS INC.
    Inventors: Craig Prater, Chanmin Su
  • Publication number: 20080276696
    Abstract: A topographic profile of a structure is generated using atomic force microscopy. The structure is scanned such that an area of interest of the structure is scanned at a higher resolution than portions of the structure outside of the area of interest. An profile of the structure is then generated based on the scan. To correct skew and tilt of the profile, a first feature of the profile is aligned with a first axis of a coordinate system. The profile is then manipulated to align a second feature of the profile with a second axis of the coordinate system.
    Type: Application
    Filed: July 25, 2008
    Publication date: November 13, 2008
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: Lin Zhou, Huiwen Liu, Dale Egbert, Jonathan A. Nelson, Jianxin Zhu
  • Publication number: 20080271522
    Abstract: A method and apparatus for analysis of a sample. The method includes an accessing operation for accessing a region of the sample via a tip of at least one probe mounted on a cantilever. A removing operation removes a sample material from the region that is accessed by the tip of the at least one probe mounted on the cantilever. A sensing operation senses a parameter associated to the removal of the sample material in the removing operation. The accessing, removing, and sensing operations are repeated to facilitate removal of at least one layer of the sample.
    Type: Application
    Filed: June 12, 2008
    Publication date: November 6, 2008
    Inventor: Gerd K. Binnig
  • Patent number: 7446324
    Abstract: The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air.
    Type: Grant
    Filed: September 28, 2004
    Date of Patent: November 4, 2008
    Assignee: Northwestern University
    Inventors: Chad A. Mirkin, Richard Piner, Seunghun Hong
  • Patent number: 7444857
    Abstract: A method and apparatus for scanning multiple scanning probe microscopes in close proximity, to scan overlapping scan areas at the same time while avoiding collision employs a control system providing drive signals to a first Atomic Force Microscope (AFM) and calculated drive signals to additional AFMs based on the first drive signals and the relative position of the additional AFMs to the first AFM for consistent spaced motion. Scanning and Failure Analysis (FA) probing of multiple feature of interest using multiple APMs allows for reduced time for locating FA features to set up measurements.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: November 4, 2008
    Assignee: Multiprobe, Inc.
    Inventors: Casey Patrick Hare, Andrew Norman Erickson
  • Patent number: 7444856
    Abstract: Sensors and systems for electrical, electrochemical, or topographical analysis, as well as methods of fabricating these sensors are provided. The sensors include a cantilever and one or more probes, each of which has an electrode at its tip. The tips of the probes are sharp, with a radius of curvature of less than about 50 nm. In addition, the probes have a high aspect ratio of more than about 19:1. The sensors are suitable for both Atomic Force Microscopy and Scanning Electrochemical Microscopy.
    Type: Grant
    Filed: September 22, 2005
    Date of Patent: November 4, 2008
    Assignee: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Friedrich B. Prinz, Ye Tao, Rainer J. Fasching, Ralph S. Greco, Kyle Hammerick, Robert Lane Smith
  • Publication number: 20080266575
    Abstract: This invention addresses a contact mode hybrid scanning system (HSS), which can be used for measuring topography. The system consists of a cantilever or a cantilever array, a scanning stage, a light source, and instrumentation to synchronize and control the individual components. Detection of the cantilever's movement is achieved by directly measuring the change in disposition of the cantilever including its height, rotation at one or more points on the cantilever thereby providing a partial three-dimensional reconstruction without the need for actuating the cantilever. This is achieved by employing a displacement meter such as a triangulation meter or a confocal meter.
    Type: Application
    Filed: April 16, 2008
    Publication date: October 30, 2008
    Inventors: Angelo Gaitas, Yogash B. Gianchandani
  • Patent number: 7442926
    Abstract: The present invention relates to a nano tip and a fabrication method of the nano tip that is generally usable in mechanical, physical, and electrical devices for detecting surface signals or chemical signals, or is usable for a source scanning energy beam. The fabrication method of a nano tip according to the present invention includes providing a supporting holder that is fixed at one end thereof to a mechanical or electrical device, bonding a carbon nanotube to the free end of the supporting holder, and modifying the property or the shape of the carbon nanotube by scanning an energy beam thereto. The nano tip, having improved stiffness and perpendicularity, is fabricated by adjusting the length, the diameter, and the shape of the end of the carbon nanotube tip attached with carbon nanotubes by means of the energy beam so that the nano tip may stably and repeatedly reproduce information of a sample and may minimize a deviation between the tips.
    Type: Grant
    Filed: August 21, 2006
    Date of Patent: October 28, 2008
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Chang-Soo Han, June-Ki Park
  • Patent number: 7442925
    Abstract: The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method using a scanning probe which works a sample by performing the relative scanning of a probe supported on a cantilever on the sample at a predetermined scanning speed. The working method can work the object to be worked while forcibly and relatively vibrating the probe in the direction orthogonal to or parallel to a working surface of the sample at low frequency of 100 to 1000 Hz.
    Type: Grant
    Filed: March 4, 2006
    Date of Patent: October 28, 2008
    Assignee: SII Nanotechnology Inc.
    Inventors: Masatoshi Yasutake, Takuya Nakaue, Kazutoshi Watanabe, Osamu Takaoka, Atsushi Uemoto, Naoya Watanabe, Yoshiteru Shikakura
  • Patent number: 7441447
    Abstract: In accordance with an embodiment of the invention, there is a force sensor for a probe based instrument. The force sensor can comprise a detection surface and a flexible mechanical structure disposed a first distance above the detection surface so as to form a gap between the flexible mechanical structure and the detection surface, wherein the flexible mechanical structure is configured to deflect upon exposure to an external force, thereby changing the first distance.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: October 28, 2008
    Assignee: Georgia Tech Research Corporation
    Inventors: Fahrettin L. Degertekin, Abidin G. Onaran, Mujdat Balantekin
  • Patent number: 7441444
    Abstract: The invention provides high performance cantilevers with optimal combinations of high resonant frequency and low force constant. In one aspect, AFM cantilevers with spring constants in the range 1-10?6 N/m with (fundamental) resonant frequencies in aqueous solutions of 0.1-100 MHz are provided. A high performance cantilever may be made by focused ion beam milling or electron deposition. The high performance cantilevers allow faster scanning, increase the temporal resolution of force measurement, improve measurement sensitivity by reducing cantilever noise, and improve sensitivity by reducing cantilever spring constant.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: October 28, 2008
    Assignee: The Johns Hopkins University
    Inventor: Jan H. Hoh
  • Patent number: 7441446
    Abstract: By digitizing the UFM signal without using a lock-in amplifier, substantially all of the information initially contained in the UFM output signal may be maintained and may then be used for further data processing. Consequently, any type of model or evaluation algorithm may be used without being restricted to a very narrow bandwidth, as is the case in lock-in based techniques. The digitizing is performed on a real-time basis, wherein a complete UFM curve is digitized and stored for each scan position. In this way, quantitative meaningful values for specific surface-related characteristics with a nanometer resolution may be obtained.
    Type: Grant
    Filed: May 25, 2008
    Date of Patent: October 28, 2008
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Dmytro Chumakov, Holm Geisler, Ehrenfried Zschech
  • Patent number: 7441445
    Abstract: To measure surface information and physical information of a sample with high accuracy by promoting linearity in Z direction by nullifying cross talk in XY directions as less as possible, there is provided a surface information measuring apparatus including a probe having a stylus, a Z actuator fixed with the probe for being elongated and contracted in Z direction orthogonal to a sample surface B when applied with a voltage, an applicator for applying the voltage to the Z actuator, and a controller for controlling to operate the applicator, in which the Z actuator includes a piezoelectric member capable of being elongated and contracted in Z direction and a plurality of divided electrodes provided to be respectively electrically independent from each other in a state of being divided by at least 3 or more in a peripheral direction at an inner peripheral face or an outer peripheral face of the piezoelectric member for applying voltages to elongate and contract the piezoelectric member within ranges of contact
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: October 28, 2008
    Assignee: SII Nanotechnology Inc.
    Inventor: Hiroyoshi Yamamoto
  • Publication number: 20080262751
    Abstract: Evaluating irregularities in surfaces of objects such as semiconductor wafers using a thickness profile of a surface section and analyzing the profile to obtain information of an irregularity start position, magnitude, and span along with surface slope and height information.
    Type: Application
    Filed: April 23, 2007
    Publication date: October 23, 2008
    Inventors: Rabi Fettig, Jaydeep Kumar Sinha
  • Publication number: 20080257024
    Abstract: The invention provides a scanning probe microscope capable of performing highly accurate three-dimensional profile measurement in a state in which no sliding of the probe or deformation of the sample substantially occurs.
    Type: Application
    Filed: April 8, 2008
    Publication date: October 23, 2008
    Inventors: Masahiro WATANABE, Shuichi Baba, Toshihiko Nakata
  • Publication number: 20080257022
    Abstract: A scanner which includes a gradient index lens for passing and focusing beams from a radiation emitter to a cantilevered member reflective surface of a probe and from the reflective surface to a radiation detector. The lens also serves as a mechanical support for attachment of the radiation emitter and the radiation detector and is also attached to a support for the cantilevered member. The resulting fixed positions of the radiation emitter and the radiation detector relative to the reflective cantilevered member surface allows the scanner to be compact and factory focally alignable.
    Type: Application
    Filed: April 23, 2007
    Publication date: October 23, 2008
    Inventor: Frederick Sachs
  • Publication number: 20080257023
    Abstract: A method for scanning a surface of a workpiece 1 at a constant scanning speed /va/ using a scanning probe 2 mounted on a support 3 on a coordinate measuring machine (CMM) 4. The CMM contains a first set of drive means (6, 7, 8) to move the support according to three linear axis (x,y,z), and the support 3 contains a second set of drive means (14, 17) for actuating the movement of the scanning probe 2 with two degrees of freedom relative to said support 3. The method involves control means 33 coupled to the sets of drive means (6, 14, 17), and memory means for storing theoretical profiles and coordinates of the surface to scan.
    Type: Application
    Filed: March 21, 2008
    Publication date: October 23, 2008
    Applicant: Hexagon Metrology AB
    Inventors: Pascal Jordil, Bo Pettersson, Siercks Knut, William Wilcox