Vapor Phase Deposition Patents (Class 977/891)
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Publication number: 20110045349Abstract: Methods and apparatus for forming energy storage devices are provided. In one embodiment a method of producing an energy storage device is provided. The method comprises positioning an anodic current collector into a processing region, depositing one or more three-dimensional electrodes separated by a finite distance on a surface of the anodic current collector such that portions of the surface of the anodic current collector remain exposed, depositing a conformal polymeric layer over the anodic current collector and the one or more three-dimensional electrodes using iCVD techniques comprising flowing a gaseous monomer into the processing region, flowing a gaseous initiator into the processing region through a heated filament to form a reactive gas mixture of the gaseous monomer and the gaseous initiator, wherein the heated filament is heated to a temperature between about 300° C. and about 600° C., and depositing a conformal layer of cathodic material over the conformal polymeric layer.Type: ApplicationFiled: August 18, 2010Publication date: February 24, 2011Applicant: APPLIED MATERIALS, INC.Inventors: Victor L. Pushparaj, Pravin K. Narwankar, Omkaram Nalamasu
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Publication number: 20110037976Abstract: Flexible SERS substrates, methods of making flexible SERS substrates, and methods of using flexible SERS substrates are disclosed.Type: ApplicationFiled: August 17, 2010Publication date: February 17, 2011Inventors: Yiping Zhao, HsiaoYun Chu
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Publication number: 20110038785Abstract: To efficiently and easily manufacture carbon nanotubes oriented in one direction. A method for manufacturing carbon nanotubes is characterized by including the steps of: bringing crystalline metal oxide particles into contact with a solution containing metal ions serving as a catalyst for forming carbon nanotubes, thereby attaching the catalyst to the surfaces of the metal oxide particles; subjecting the surfaces of the metal oxide particles to which the catalyst is attached to a CVD method or a combustion method, thereby forming carbon nanotubes on the surface of each of the metal oxide particles and resulting in producing metal oxide particles each supporting carbon nanotubes grown substantially perpendicularly to the surface of the metal oxide particle and in parallel with each other; and removing metal oxide particles from the metal oxide particles supporting carbon nanotubes.Type: ApplicationFiled: March 16, 2009Publication date: February 17, 2011Applicant: OTSUKA CHEMICAL CO., LTD.Inventors: Toshiki Goto, Masato Tani
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Publication number: 20110033661Abstract: Provided herein is a medical implant having a nanostructure on top of a microstructure and the methods of making and using the same.Type: ApplicationFiled: March 21, 2006Publication date: February 10, 2011Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventor: Takahiro Oawa
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Patent number: 7879308Abstract: A multi-wall carbon nanotube field emitter and method of producing the same is disclosed. The multi-wall carbon nanotube field emitter comprises a nanotube having a diameter between approximately 1 nanometer and approximately 100 nanometers with an integrally attached outer layer of graphitic material that is approximately 1 micrometer to approximately 10 micrometers in diameter attached to an etched tip of a wire. The tip of the wire is etched to form a tip and a slot is fabricated in the tip for alignment and attachment of the carbon nanotube. A focus ion beam is used to weld the nanotube to the tungsten tip for electron field emission applications.Type: GrantFiled: April 4, 2005Date of Patent: February 1, 2011Assignee: University of Central Florida Research Foundation, Inc.Inventors: Leo Chow, Guangyu Chai
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Publication number: 20110007477Abstract: A method of forming a well-anchored carbon nanotube (CNT) array, as well as thermal interfaces that make use of CNT arrays to provide very high thermal contact conductance. A thermal interface is formed between two bodies by depositing a continuous array of carbon nanotubes on a first of the bodies so that, on mating the bodies, the continuous array is between surface portions of the first and second bodies. The thermal interface preferably includes a multilayer anchoring structure that promotes anchoring of the continuous array of carbon nanotubes to the first body. The anchoring structure includes a titanium bond layer contacting the surface portion of the first body, and an outermost layer with nickel or iron catalytic particles from which the continuous array of carbon nanotubes are nucleated and grown. Additional thermal interface materials (TIM's) can be used in combination with the continuous array of carbon nanotubes.Type: ApplicationFiled: August 4, 2006Publication date: January 13, 2011Applicant: PURDUE RESEARCH FOUNDATIONInventors: Jun Xu, Timothy S. Fisher
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Patent number: 7857907Abstract: The present invention relates to a method for forming a layered structure with silicon nanocrystals. In one embodiment, the method comprises the steps of: (i) forming a first conductive layer on a substrate, (ii) forming a silicon-rich dielectric layer on the first conductive layer, and (iii) laser-annealing at least the silicon-rich dielectric layer to induce silicon-rich aggregation to form a plurality of silicon nanocrystals in the silicon-rich dielectric layer. The silicon-rich dielectric layer is one of a silicon-rich oxide film having a refractive index in the range of about 1.4 to 2.3, or a silicon-rich nitride film having a refractive index in the range of about 1.7 to 2.3. The layered structure with silicon nanocrystals in a silicon-rich dielectric layer is usable in a solar cell, a photodetector, a touch panel, a non-volatile memory device as storage node, and a liquid crystal display.Type: GrantFiled: January 25, 2007Date of Patent: December 28, 2010Assignee: AU Optronics CorporationInventors: An-Thung Cho, Chih-Wei Chao, Chia-Tien Peng, Wan-Yi Liu, Ming-Wei Sun
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Publication number: 20100320171Abstract: Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.Type: ApplicationFiled: December 16, 2008Publication date: December 23, 2010Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Samuel S. Mao, Costas P. Grigoropoulos, David Hwang, Andrew M. Minor
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Publication number: 20100316873Abstract: Tin powder is heated in a flowing stream of an inert gas, such as argon, containing a small concentration of carbon-containing gas, at a temperature to produce metal vapor. The tin deposits as liquid on a substrate, and reacts with the carbon-containing gas to form carbon nanotubes in the liquid tin. Upon cooling and solidification, a composite of tin nanowires bearing coatings of carbon nanotubes is formed.Type: ApplicationFiled: August 19, 2010Publication date: December 16, 2010Applicants: GM GLOBAL TECHNOLOGY OPERATIONS, INCInventors: Xueliang Sun, Ruying Li, Yuqin Zhou, Mei Cai, Hao Liu
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Publication number: 20100314353Abstract: In one preferred aspects, methods are provided to produce a three-dimensional feature, comprising: (a) providing a nano-manipulator device; (b) positioning an article with the nano-manipulator device; and (c) manipulating the article to produce the three-dimensional feature. The invention relates to production of nanoscale systems that can be tailored with specific physical and/or electrical characteristics or need to have these characteristics modified. Methods and apparatus are presented that can construct three-dimensional nanostructures and can also modify existing nanostructures in three dimensions.Type: ApplicationFiled: April 21, 2010Publication date: December 16, 2010Applicant: Nicholas AntoniouInventor: Nicholas Antoniou
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Patent number: 7850941Abstract: A method for forming an array of elongated nanostructures, includes in one embodiment, providing a substrate, providing a template having a plurality of pores on the substrate, and removing portions of the substrate under the plurality of pores of the template to form a plurality of cavities. A catalyst is provided in the plurality of cavities in the substrate, and the pores of the template are widened to expose the substrate around the catalyst so that the catalyst is spaced from the sides of the plurality of pores of the template. A plurality of elongated nanostructures is grown from the catalyst spaced from the sides of the pores of the template.Type: GrantFiled: October 20, 2006Date of Patent: December 14, 2010Assignee: General Electric CompanyInventors: Loucas Tsakalakos, Bastiaan A. Korevaar, Joleyn E. Balch, Jody A. Fronheiser, Reed R. Corderman, Fred Sharifi, Vidya Ramaswamy
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Publication number: 20100301306Abstract: Processes for forming quantum well structures which are characterized by controllable nitride content are provided, as well as superlattice structures, optical devices and optical communication systems based thereon.Type: ApplicationFiled: May 28, 2010Publication date: December 2, 2010Applicant: Technion Research & Development Foundation Ltd.Inventors: Asaf ALBO, Gad Bahir, Dan Fekete
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Publication number: 20100291297Abstract: This invention provides a method for forming a catalyst layer for carbon nanostructure growth, which can eliminate the influence of water in a liquid for catalyst layer formation, can grow homogeneous and highly oriented carbon nanostructures over the whole area of a substrate and can realize mass production of the carbon nanostructures, and a liquid for catalyst layer formation for use in the method, and a process for producing carbon nanostructures using the catalyst layer formed by the method. The catalyst layer for use in the production of CNTs is formed by preparing a catalyst metal salt solution of a catalyst metal-containing metal compound (a catalyst metal salt) dispersed or dissolved in a solvent having an ample wettability towards the substrate and coating the catalyst metal salt solution onto the substrate to a form a thin film. The thin film is then heat treated to form a catalyst layer.Type: ApplicationFiled: September 19, 2008Publication date: November 18, 2010Inventors: Takeshi Nagasaka, Masahiro Yamamura, Yoshito Watanabe, Masaki Kondo, Yoshikazu Nakayama
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Publication number: 20100285237Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, comprising introducing a first plurality of precursors to deposit a thin layer with the deposition process not self limiting, followed by introducing a second plurality of precursors for plasma treating the thin deposited layer. The plasma can be isotropic, anisotropic, or a combination of isotropic and anisotropic to optimize the effectiveness of the treatment of the thin deposited layers.Type: ApplicationFiled: May 19, 2010Publication date: November 11, 2010Applicant: TEGAL CORPORATIONInventors: Robert Anthony Ditizio, Tue Nguyen, Tai Dung Nguyen
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Patent number: 7820245Abstract: A method for synthesizing single-wall carbon nanotubes (SWNTs) generally includes the steps of: providing a substrate having an upper portion comprised of indium tin oxide; forming an aluminum layer on the upper portion of the substrate; forming a catalyst layer on the aluminum layer to obtain a treated substrate; annealing the treated substrate so as to transform the catalyst layer into a plurality of oxidized catalyst particles on the substrate; and growing a plurality of single-wall carbon nanotubes on the treated substrate using a chemical vapor deposition process.Type: GrantFiled: January 19, 2007Date of Patent: October 26, 2010Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.Inventors: Zhi Zheng, Yuan Yao, Liang Liu, Shou-Shan Fan
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Patent number: 7811883Abstract: A non-volatile memory transistor with a nanocrystal-containing floating gate formed by nanowires is disclosed. The nanocrystals are formed by the growth of short nanowires over a crystalline program oxide. As a result, the nanocrystals are single-crystals of uniform size and single-crystal orientation.Type: GrantFiled: May 15, 2008Date of Patent: October 12, 2010Assignee: International Business Machines CorporationInventor: Guy M. Cohen
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Publication number: 20100239850Abstract: A method for fabricating a composite material includes providing a free-standing carbon nanotube structure having a plurality of carbon nanotubes, introducing at least two reacting materials into the carbon nanotube structure to form a reacting layer, activating the reacting materials to grow a plurality of nanoparticles, wherein the nanoparticles are spaced from each other and coated on a surface of each of the carbon nanotubes of the carbon nanotube structure.Type: ApplicationFiled: November 25, 2009Publication date: September 23, 2010Applicants: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.Inventors: Jia-Ping Wang, Kai-Li Jiang, Qun-Qing Li, Shou-Shan Fan
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Publication number: 20100233355Abstract: An organo-optoelectronic nanowire is fabricated. It is made through a one-step unit operation under a low temperature. An organo-optoelectronic template is obtained for the fabrication, whose idea is a bio-inspired one. The nanowire obtained has a high efficiency and a high surface area; and, heat generated on operation is easily emitted. Thus, the present invention has a great potential for future use on optoelectronic devices.Type: ApplicationFiled: February 4, 2008Publication date: September 16, 2010Applicant: National Central UniversityInventors: Tu Lee, Ming-Shiou Lin
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Publication number: 20100215915Abstract: The synthesis of nanostructures uses a catalyst that may be in the form of a thin film layer on a substrate. Precursor compounds are selected for low boiling point or already exist in gaseous form. Nanostructures are capable of synthesis with a masked substrate to form patterned nanostructure growth. The techniques further include forming metal nanoparticles with sizes <10 nm and with a narrow size distribution. Metallic nanoparticles have been shown to possess enhanced catalytic properties. The process may include plasma enhanced chemical vapor deposition to deposit Ni, Pt, and/or Au nanoparticles onto the surfaces of SiO2, SiC, and GaN nanowires. A nanostructure sample can be coated with metallic nanoparticles in approximately 5-7 minutes. The size of the nanoparticles can be controlled through appropriate control of temperature and pressure during the process. The coated nanowires have application as gas and aqueous sensors and hydrogen storage.Type: ApplicationFiled: June 23, 2006Publication date: August 26, 2010Applicants: Washington State University, Idaho Research Foundation, Inc.Inventors: Grant Norton, David McIlroy
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Publication number: 20100209628Abstract: Photoinduced chemical vapor deposition was used to grow coatings on nanoparticles. Aerosolized nanoparticles were mixed with a vapor-phase coating reactant and introduced into a coating reactor, where the mixture was exposed to ultraviolet radiation. Tandem differential mobility analysis was used to determine coating thicknesses as a function of initial particle size.Type: ApplicationFiled: April 17, 2008Publication date: August 19, 2010Applicant: Regents of the University of MinnesotaInventors: Steven L. Girshick, Bin Zhang, Toshitaka Nakamura, Amane Mochizuki, Jeffrey Roberts, Ying-Chin Liao, Yuanqing He, Adam Boies
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Publication number: 20100209700Abstract: A method of producing compound nanorods and thin films under a controlled growth mode is described. The method involves ablating compound targets using an ultrafast pulsed laser and depositing the ablated materials onto a substrate. When producing compound nanorods, external catalysts such as pre-deposited metal nanoparticles are not involved. Instead, at the beginning of deposition, simply by varying the fluence at the focal spot on the target, a self-formed seed layer can be introduced for nanorods growth. This provides a simple method of producing high purity nanorods and controlling the growth mode. Three growth modes are covered by the present invention, including nanorod growth, thin film growth, and nano-porous film growth.Type: ApplicationFiled: May 4, 2010Publication date: August 19, 2010Applicant: IMRA AMERICA, INC.Inventors: Bing LIU, Zhengong HU, Yong CHE
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Patent number: 7776758Abstract: Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).Type: GrantFiled: July 28, 2006Date of Patent: August 17, 2010Assignee: Nanosys, Inc.Inventors: Xiangfeng Duan, Chao Liu
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Publication number: 20100193015Abstract: Disclosed are p-n zinc (Zn) oxide nanowires and a methods of manufacturing the same. A p-n Zn oxide nanowire includes a p-n junction structure in which phosphorus (P) is on a surface of a Zn oxide nanowire.Type: ApplicationFiled: January 13, 2010Publication date: August 5, 2010Inventors: Seung-nam Cha, Byong-gwon Song, Jae-eun Jang
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Method for producing functional nanocarbon and hydrogen by direct decomposition of lower hydrocarbon
Patent number: 7767182Abstract: In a reaction where a lower hydrocarbon is subjected to direct decomposition by using a catalyst to produce a functional nanocarbon and hydrogen, the lower hydrocarbon is subjected to the reaction in an coexistent gas comprising low concentration of oxidizing gas, reducing gas or a mixture thereof. The precursor of functional nanocarbon produced on the catalyst and amorphous carbon secondarily produced on the catalyst react with the coexistent gas so that being removed from the catalyst, making it possible to prevent the drop of conversion with time on stream due to the inhibition of the reaction by the precursor and by-product. In the case where the raw material of lower hydrocarbon is biogas, the coexistent gas can be easily contained in methane by lowering purification degree of methane.Type: GrantFiled: March 29, 2006Date of Patent: August 3, 2010Assignees: The Japan Steel Works, Ltd., National University Corporation Kitami Institute of Technology, Kajima CorporationInventors: Akio Tada, Satoru Nakamura, Hideaki Ito, Yoshitaka Togo, Kikuo Koseki, Hiroyuki Takasuna -
Patent number: 7754608Abstract: State-of-the-art synthesis of carbon nanostructures (25) by chemical vapor deposition involve heating a catalyst material to high temperatures up 700-1000° C. in a furnace and flowing hydrocarbon gases through the reactor over a period of time. In order to enable a self assembly of nanostructures (25) on microchips (10) without damaging the microchip (10) by high temperatures the proposed manufacturing method comprises: A layer (1) contains indentations (3) on which nanostructures (25) are to be integrated and the indentations (3) are heated up by a current (I) conducted to the layer (1) via contact pads (2).Type: GrantFiled: May 26, 2005Date of Patent: July 13, 2010Assignee: ETH ZürichInventors: Christofer Hierold, Christoph Stampfer, Alain Jungen
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Patent number: 7745315Abstract: A method for forming vertically oriented, crystallographically aligned nanowires (nanocolumns) using monolayer or submonolayer quantities of metal atoms to form uniformly sized metal islands that serve as catalysts for MOCVD growth of Group III nitride nanowires.Type: GrantFiled: October 3, 2007Date of Patent: June 29, 2010Assignee: Sandia CorporationInventors: George T. Wang, Qiming Li, J. Randall Creighton
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Publication number: 20100132883Abstract: An improved method of synthesizing nanotubes that avoids the slow process and the impurities or defects that are usually encountered with regard to as-grown carbon nanotubes. In a preferred embodiment, nanotubes are synthesized from nanotubes providing a novel catalyst-free growth method for direct growth of single- or multi-walled, metallic or semiconducting nanotubes.Type: ApplicationFiled: April 30, 2007Publication date: June 3, 2010Inventors: Peter J. Burke, Zhen Yu
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Publication number: 20100129623Abstract: Briefly, the present invention comprises a method of manufacturing a sensor surface structure suitable for but not limited to surface enhanced Raman spectroscopy. The method comprises providing (S1) a nano-structured array template, depositing (S2) a metal oxide on the template, preferably using atomic layer deposition (ALD), depositing (S4) metal nanoparticles on the metal oxide layer, either by electroless deposition or by ALD.Type: ApplicationFiled: October 3, 2007Publication date: May 27, 2010Inventors: Anders Johansson, Mårten Rooth, Mats Boman, Anders Hårsta, Jan-Otto Carlsson
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Publication number: 20100124622Abstract: The disclosure related to a method for making a nanowire structure. The method includes fabricating a free-standing carbon nanotube structure, introducing reacting materials into the carbon nanotube structure, and activating the reacting materials to grow a nanowire structure.Type: ApplicationFiled: October 23, 2009Publication date: May 20, 2010Applicants: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.Inventors: Jia-Ping Wang, Jia-Jia Wen, Qun-Feng Cheng, Kai-Li Jiang, Qun-Qing Li, Shou-Shan Fan
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Publication number: 20100117057Abstract: The invention relates to a nitride semiconductor LED using a hybrid buffer layer with a minimum lattice mismatch between the buffer layer and the nitride semiconductor and a fabrication method therefor. The fabrication method of a nitride semiconductor LED using a hybrid buffer layer comprises: a first step, in which an AlxGa1-xN (0?x<1) layer is formed over a semiconductor; a second step, in which a crystalline seed layer of a 3D structure and AlOyNz are formed over the substrate, the crystalline seed layer being formed by recrystallizing the substrate with the AlxGa1-xN (0?x<1) layer formed thereover and containing a substance with a general formula of AlxGa1-xN (0?x<1); and a third step, in which the substrate having gone through the second step is subject to heat treatment under NH3 gas atmosphere to form an AlN nano structure, thus forming over the substrate a hybrid buffer layer consisting of the 3D crystalline seed layer and the AlN nano structure.Type: ApplicationFiled: February 5, 2009Publication date: May 13, 2010Applicant: WOOREE LST CO., LTD.Inventors: Youngkyn Noh, Jae-Eung OH
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Publication number: 20100099319Abstract: A system for synthesizing nanostructures using chemical vapor deposition (CVD) is provided. The system includes a housing, a porous substrate within the housing, and on a downstream surface of the substrate, a plurality of catalyst particles from which nanostructures can be synthesized upon interaction with a reaction gas moving through the porous substrate. Electrodes may be provided to generate an electric field to support the nanostructures during growth. A method for synthesizing extended length nanostructures is also provided.Type: ApplicationFiled: September 24, 2009Publication date: April 22, 2010Inventors: David Lashmore, Joseph J. Brown, Robert C. Dean, Peter L. Antoinette
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Publication number: 20100098883Abstract: A method and apparatus for producing one-dimensional nanostructures are disclosed. The production of the nanostructures is carried out by disposing a vanadium containing target facing a substrate; irradiating the target with laser light; and depositing target sublimation materials to the substrate under pressure conditions so that a plasma, which is generated by the laser light irradiation including target sublimation materials and gas atmosphere, does not substantially reach the substrate.Type: ApplicationFiled: September 1, 2009Publication date: April 22, 2010Applicant: SONY CORPORATIONInventor: Daisuke Ito
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Patent number: 7696105Abstract: Disclosed herein is a method for producing catalyst-free single crystal silicon nanowires. According to the method, nanowires can be produced in a simple and economical manner without the use of any metal catalyst. In addition, impurities contained in a metal catalyst can be prevented from being introduced into the nanowires, contributing to an improvement in the electrical and optical properties of the nanowires. Also disclosed herein are nanowires produced by the method and nanodevice comprising the nanowires.Type: GrantFiled: May 28, 2008Date of Patent: April 13, 2010Assignee: Samsung Electronics Co., Ltd.Inventors: Eun Kyung Lee, Dongmock Whang, Byoung Lyong Choi, Byung Sung Kim
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Publication number: 20100084333Abstract: The present invention discloses a method for manufacturing ultra-thin reinforced membranes from a SOI wafer having a front side and a back side, the front side having an etch stop layer buried under a device layer, provided for by forming reinforcement bars by etching openings in the device layer down to the etch stop layer, filling the openings at least partially by deposition of a first filler, and then polishing the top surface to the silicon surface before depositing a membrane material.Type: ApplicationFiled: March 7, 2008Publication date: April 8, 2010Applicant: LIFECARE ASInventors: Arnold Hoogerwerf, Thomas Overstolz
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Patent number: 7687349Abstract: A technique to form metallic nanodots in a two-step process involving: (1) reacting a silicon-containing gas precursor (e.g., silane) to form silicon nuclei over a dielectric film layer; and (2) using a metal precursor to form metal nanodots where the metal nanodots use the silicon nuclei from step (1) as nucleation points. Thus, the original silicon nuclei are a core material for a later metallic encapsulation step. Metallic nanodots have applications in devices such as flash memory transistors.Type: GrantFiled: October 30, 2006Date of Patent: March 30, 2010Assignee: Atmel CorporationInventors: Romain Coppard, Sylvie Bodnar
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Publication number: 20100069233Abstract: Nanomaterials of the JT phase of the titanium oxide TiO2-x, where 0?x?1 having as a building block a crystalline structure with an orthorhombic symmetry and described by at least one of the space groups 59 Pmmn, 63 Amma, 71 Immm or 63 Bmmb. These nanomaterials are in the form of nanofibers, nanowires, nanorods, nanoscrolls and/or nanotubes. The nanomaterials are obtained from a hydrogen titanate and/or a mixed sodium and hydrogen titanate precursor compound that is isostructural to the JT crystalline structure. The titanates are the hydrogenated, the protonated, the hydrated and/or the alkalinized phases of the JT crystalline phase that are obtained from titanium compounds such as titanium oxide with an anatase crystalline structure, amorphous titanium oxide, and titanium oxide with a rutile crystalline structure, and/or directly from the rutile mineral and/or from ilmenite.Type: ApplicationFiled: November 23, 2009Publication date: March 18, 2010Applicant: INSTITUTO MEXICANO DEL PETROLEOInventors: Jose Antonio Toledo Antonio, Carlos Angeles Chavez, Maria Antonia Cortes Jacome, Fernando Alvarez Ramirez, Yosadara Ruiz Morales, Gerardo Ferrat Torres, Luis Francisco Flores Ortiz, Esteban Lopez Salinas, Marcelo Lozada y Cassou
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Publication number: 20100050872Abstract: The filter provided herein includes one or more nanofibers. In some examples of the filter, the nanofibers include one or more nanoparticles, in which the nanoparticles are at least partially surrounded by pockets.Type: ApplicationFiled: August 29, 2008Publication date: March 4, 2010Inventor: Kwangyeol LEE
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Patent number: 7670933Abstract: A method for growing high quality, nonpolar Group III nitrides using lateral growth from Group III nitride nanowires. The method of nanowire-templated lateral epitaxial growth (NTLEG) employs crystallographically aligned, substantially vertical Group III nitride nanowire arrays grown by metal-catalyzed metal-organic chemical vapor deposition (MOCVD) as templates for the lateral growth and coalescence of virtually crack-free Group III nitride films. This method requires no patterning or separate nitride growth step.Type: GrantFiled: October 3, 2007Date of Patent: March 2, 2010Assignee: Sandia CorporationInventors: George T. Wang, Qiming Li, J. Randall Creighton
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Patent number: 7666791Abstract: The present invention is directed to systems and methods for nanowire growth and harvesting. In an embodiment, methods for nanowire growth and doping are provided, including methods for epitaxial oriented nanowire growth using a combination of silicon precursors. In a further aspect of the invention, methods to improve nanowire quality through the use of sacrificial growth layers are provided. In another aspect of the invention, methods for transferring nanowires from one substrate to another substrate are provided.Type: GrantFiled: August 15, 2007Date of Patent: February 23, 2010Assignee: Nanosys, Inc.Inventors: Shahriar Mostarshed, Linda T. Romano
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Patent number: 7662706Abstract: A method of forming a nanostructure having the form of a tree, comprises a first stage and a second stage. The first stage includes providing one or more catalytic particles on a substrate surface, and growing a first nanowhisker via each catalytic particle. The second stage includes providing, on the periphery of each first nanowhisker, one or more second catalytic particles, and growing, from each second catalytic particle, a second nanowhisker extending transversely from the periphery of the respective first nanowhisker. Further stages may be included to grow one or more further nanowhiskers extending from the nanowhisker(s) of the preceding stage. Heterostructures may be created within the nanowhiskers. Such nanostructures may form the components of a solar cell array or a light emitting flat panel, where the nanowhiskers are formed of a photosensitive material.Type: GrantFiled: November 12, 2004Date of Patent: February 16, 2010Assignee: QuNano ABInventors: Lars Ivar Samuelson, Knut Wilfried Deppert
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Publication number: 20090320991Abstract: The invention relates to novel methods of incorporating nanotubes for use in micro- or nano-devices. The invention further relates to incorporating nanotubes in micro or nano-devices and particularly synthesizing or growing nanotubes directly in or on components of a micro- or nano-device. In a particular embodiment, the invention relates to methods of synthesizing or growing nanotubes in a gas chromatography column and their use in portable gas chromatography devices.Type: ApplicationFiled: September 30, 2005Publication date: December 31, 2009Inventors: Paul Boyle, David Ruiz-Alonso, Andrew Koehl, Martyn Rush, Russell Parris, Ashley Wilks
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Patent number: 7625469Abstract: A nanoelectrode array comprises a plurality of nanoelectrodes wherein the geometric dimensions of the electrode controls the electrochemical response, and the current density is independent of time. By combining a massive array of nanoelectrodes in parallel, the current signal can be amplified while still retaining the beneficial geometric advantages of nanoelectrodes. Such nanoelectrode arrays can be used in a sensor system for rapid, non-contaminating field analysis. For example, an array of suitably functionalized nanoelectrodes can be incorporated into a small, integrated sensor system that can identify many species rapidly and simultaneously under field conditions in high-resistivity water, without the need for chemical addition to increase conductivity.Type: GrantFiled: March 16, 2005Date of Patent: December 1, 2009Assignee: Sandia CorporationInventors: William G. Yelton, Michael P. Siegal
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Publication number: 20090263580Abstract: An apparatus for manufacturing a quantum-dot element is disclosed. The apparatus includes a reaction chamber for evaporating or sputtering at least one electrode layer or at least one buffer layer on the substrate. The substrate-supporting base is located inside the reaction chamber for fixing the substrate. The atomizer has a gas inlet and a sample inlet. More specifically, the gas inlet and the sample inlet feed the atomizer respectively with a gas and a precursor solution having a plurality of functionalized quantum dots, and thereby form a quantum-dot layer on the substrate. The apparatus of the present invention can form a quantum dot layer with uniformly distributed quantum dots and integrate the processes for forming a quantum-dot layer, a buffer layer, and an electrode layer together at the same chamber. Therefore, the quality of produced element can be substantially improved.Type: ApplicationFiled: June 30, 2009Publication date: October 22, 2009Applicant: Industrial Technology Research InstituteInventors: Hsueh-Shih CHEN, Dai-Luon Lo, Gwo-Yang Chang, Chien-Ming Chen
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Publication number: 20090197038Abstract: A carbon nanotube film structure includes at least one carbon nanotube film or at least two stacked carbon nanotube films. Each carbon nanotube film includes a plurality of ultralong carbon nanotubes parallel to the surface of the carbon nanotube film and parallel to each other. A length of the ultralong carbon nanotube is equal to or greater than 1 centimeter. The invention is also related to a method for making the above-described carbon nanotube film structure.Type: ApplicationFiled: October 1, 2008Publication date: August 6, 2009Applicants: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.Inventors: Xue-Shen Wang, Qun-Qing Li, Kai-Li Jiang, Shou-Shan Fan
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Patent number: 7569416Abstract: The present invention provides an apparatus and a method of fabricating the apparatus. The apparatus comprises a substrate having a planar surface and first and second electrodes located on the planar surface. The first electrode has a top surface and a lateral surface, and the lateral surface has an edge near or in contact with the substrate. An electrode insulating layer is located on the top surface and a self-assembled layer located on the lateral surface. The second electrode is in contact with both the self-assembled layer and the electrode insulating layer.Type: GrantFiled: June 16, 2006Date of Patent: August 4, 2009Assignees: Alcatel-Lucent USA Inc., Office of Technology Licensing & Intl PropertyInventors: Zhenan Bao, Jie Zheng, James C. Sturm, Troy Graves-Abe
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Publication number: 20090186214Abstract: A method of growing carbon nanomaterials such as carbon ?anotubes, carbon nanofibers, and carbon whiskers on a variety of substrates is provided which includes exposing at least a portion of the substrate surface to an oxidizing gas, followed by forming catalysts on the substrate surface, either by immersing the carbon substrate in a catalyst solution or by electrodeposition. The treated substrate is then subjected to chemical vapor deposition to facilitate the growth of carbon nanomaterials on the surface thereof. The carbon nanomaterials may be grown on a variety of substrates including carbon substrates, graphite, metal, metal alloys, intermetallic compounds, glass, fiberglass, and ceramic substrates.Type: ApplicationFiled: May 15, 2007Publication date: July 23, 2009Applicant: UNIVERSITY OF DAYTONInventors: Khalid Lafdi, Lingchuan Li
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Publication number: 20090136682Abstract: In a process for fabricating a nanopore device, at least one carbon nanotube catalyst region is formed on a structure. A plurality of nanopores is formed in the structure at a distance from the catalyst region that is no greater than about an expected length for a carbon nanotube synthesized from the catalyst region. Then at least one carbon nanotube is synthesized from the catalyst region. This fabrication sequence enables the in situ synthesis of carbon nanotubes at the site of nanopores, whereby one or more nanotubes articulate one or more nanopores without requiring manual positioning of the nanotubes.Type: ApplicationFiled: October 2, 2008Publication date: May 28, 2009Applicant: President and Fellows of Harvard CollegeInventors: Daniel Branton, Jene A. Golovchenko, Slaven Garaj, Dimitar M. Vlassarev, El-Hadi S. Sadki
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Publication number: 20090127540Abstract: The present invention is directed to systems and methods for nanowire growth. In an embodiment, methods for nanowire growth and doping are provided, including methods for epitaxial vertically oriented nanowire growth including providing a substrate material having one or more nucleating particles deposited thereon in a reaction chamber, introducing an etchant gas into the reaction chamber at a first temperature which gas aids in cleaning the surface of the substrate material, contacting the nucleating particles with at least a first precursor gas to initiate nanowire growth, and heating the alloy droplet to a second temperature, whereby nanowires are grown at the site of the nucleating particles. The etchant gas may also be introduced into the reaction chamber during growth of the wires to provide nanowires with low taper.Type: ApplicationFiled: November 6, 2007Publication date: May 21, 2009Applicant: NANOSYS, INC.Inventor: David Taylor
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Publication number: 20090117025Abstract: An apparatus for use with a reactor for synthesis of nanostructures is provided. The apparatus includes a chamber having one end in fluid communication with the reactor and defining a pathway along which a fluid mixture for the synthesis of nanostructures can be injected into the reactor. The apparatus also has a tube in fluid communication with an opposite of the chamber to impart a venturi effect in order to generate from the fluid mixture small droplets prior to introducing the fluid mixture into the chamber. A heating zone is situated downstream from the tube to provide a temperature range sufficient to permit the formation, from components within the fluid mixture, of catalyst particles upon which nanostructures can be generated. A mechanism is further provided at a distal end of the chamber to minimize turbulent flow as the fluid mixture exits the chamber, and to impart a substantially laminar flow thereto. A method for synthesis of nanostructures is also provided.Type: ApplicationFiled: June 16, 2008Publication date: May 7, 2009Inventors: David S. Lashmore, Jared Chaffee, Mark Schauer
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Patent number: 7528002Abstract: A method for forming a nanowhisker of, e.g., a III-V semiconductor material on a silicon substrate, comprises: preparing a surface of the silicon substrate with measures including passivating the substrate surface by HF etching, so that the substrate surface is essentially atomically flat. Catalytic particles on the substrate surface are deposited from an aerosol; the substrate is annealed; and gases for a MOVPE process are introduced into the atmosphere surrounding the substrate, so that nanowhiskers are grown by the VLS mechanism. In the grown nanowhisker, the crystal directions of the substrate are transferred to the epitaxial crystal planes at the base of the nanowhisker and adjacent the substrate surface.Type: GrantFiled: June 24, 2005Date of Patent: May 5, 2009Assignee: QuNano ABInventors: Lars Ivar Samuelson, Thomas M. I. Martensson