Field Effect Transistors (fets) With Nanowire- Or Nanotube-channel Region Patents (Class 977/938)
  • Publication number: 20120168722
    Abstract: Graphene electronic devices may include a gate electrode on a substrate, a first gate insulating film covering the gate electrode, a plurality of graphene channel layers on the substrate, a second gate insulating film between the plurality of graphene channel layers, and a source electrode and a drain electrode connected to both edges of each of the plurality of graphene channel layers.
    Type: Application
    Filed: September 6, 2011
    Publication date: July 5, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyun-jong Chung, Jae-hong Lee, Jae-ho Lee, Hyung-cheol Shin, Sun-ae Seo, Sung-hoon Lee, Jin-seong Heo, Hee-jun Yang
  • Patent number: 8212237
    Abstract: The present invention provides a nanostructured memory device comprising at least one semiconductor nanowire (3) forming a current transport channel, one or more shell layers (4) arranged around at least a portion of the nanowire (3), and nano-sized charge trapping centers (10) embedded in said one or more shell layers (4), and one or more gate electrodes (14) arranged around at least a respective portion of said one or more shell layers (4). Preferably said one or more shell layers (4) are made of a wide band gap material or an insulator. The charge trapping centers (10) may be charged/written by using said one or more gate electrodes (14) and a change in an amount of charge stored in one or more of the charge trapping centers (10) alters the conductivity of the nanowire (3).
    Type: Grant
    Filed: July 2, 2009
    Date of Patent: July 3, 2012
    Assignee: QuNano AB
    Inventors: Lars Samuelson, Claes Thelander, Jonas Ohlsson, Anders Mikkelsen
  • Publication number: 20120153262
    Abstract: A process for forming a functionalized sensor for sensing a molecule of interest includes providing at least one single or multi-wall carbon nanotube having a first and a second electrode in contact therewith on a substrate; providing a third electrode including a decorating material on the substrate a predetermined distance from the at least one single or multi-wall carbon nanotube having a first and a second electrode in contact therewith, wherein the decorating material has a bonding affinity for a bioreceptors that react with the molecule of interest; and applying a voltage to the third electrode, causing the decorating material to form nanoparticles of the decorating material on the at least one single or multi-wall carbon nanotube.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 21, 2012
    Inventors: Makarand Paranjape, Jianyun Zhou
  • Publication number: 20120145999
    Abstract: Provided are semiconductor devices and methods of manufacturing the same. The semiconductor device includes a substrate including a first top surface, a second top surface lower in level than the first top surface, and a first perpendicular surface disposed between the first and second top surfaces, a first source/drain region formed under the first top surface, a first nanowire extended from the first perpendicular surface in one direction and being spaced apart from the second top surface, a second nanowire extended from a side surface of the first nanowire in the one direction, being spaced apart from the second top surface, and including a second source/drain region, a gate electrode on the first nanowire, and a dielectric layer between the first nanowire and the gate electrode.
    Type: Application
    Filed: July 29, 2011
    Publication date: June 14, 2012
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Dongwoo Suh, Sung Bock Kim, Hojun Ryu
  • Publication number: 20120146001
    Abstract: A carbon-based field effect transistor (FET) includes a substrate; a carbon layer located on the substrate, the carbon layer comprising a channel region, and source and drain regions located on either side of the channel region; a gate electrode located on the channel region in the carbon layer, the gate electrode comprising a first dielectric layer, a gate metal layer located on the first dielectric layer, and a nitride layer located on the gate metal layer; and a spacer comprising a second dielectric layer located adjacent to the gate electrode, wherein the spacer is not located on the carbon layer.
    Type: Application
    Filed: February 22, 2012
    Publication date: June 14, 2012
    Applicant: International Business Machines Corporation
    Inventors: Zhihong Chen, Dechao Guo, Shu-Jen Han, Kai Zhao
  • Publication number: 20120132886
    Abstract: A field effect transistor device includes: a reservoir bifurcated by a membrane of three layers: two electrically insulating layers; and an electrically conductive gate between the two insulating layers. The gate has a surface charge polarity different from at least one of the insulating layers. A nanochannel runs through the membrane, connecting both parts of the reservoir. The device further includes: an ionic solution filling the reservoir and the nanochannel; a drain electrode; a source electrode; and voltages applied to the electrodes (a voltage between the source and drain electrodes and a voltage on the gate) for turning on an ionic current through the ionic channel wherein the voltage on the gate gates the transportation of ions through the ionic channel.
    Type: Application
    Filed: February 3, 2012
    Publication date: May 31, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Hongbo Peng, Stanislav Polonsky, Stephen Rossnagel, Gustavo Alejandro Stolovitzky
  • Publication number: 20120132898
    Abstract: The present invention relates to compositions comprising functionalized or un-functionalized multi cyclic hydrocarbons and functional organic compounds, which can be used in different electronic devices. The invention further relates to an electronic device comprising one or more organic functional layers, wherein at least one of the layers comprises at least one functionalized or un-functionalized multi cyclic hydrocarbon. Another embodiment of the present invention relates to a formulation comprising functionalized or un-functionalized multi cyclic hydrocarbons, from which a thin layer comprising at least one functionalized or un-functionalized multi cyclic hydrocarbon can be formed.
    Type: Application
    Filed: July 7, 2010
    Publication date: May 31, 2012
    Applicant: Merck Patent GmbH
    Inventors: Junyou Pan, Thomas Eberle, Herwig Buchholz
  • Publication number: 20120112167
    Abstract: One example of the present invention is a nanoscale electronic device comprising a first conductive electrode, a second conductive electrode, and an anisotropic dielectric material layered between the first and second electrodes having a permittivity in a direction approximately that of the shortest distance between the first and second electrodes less than the permittivity in other directions within the anisotropic dielectric material. Additional examples of the present invention include integrated circuits that contain multiple nanoscale electronic devices that each includes an anisotropic dielectric material layered between first and second electrodes having a permittivity in a direction approximately that of the shortest distance between the first and second electrodes less than the permittivity in other directions within the anisotropic dielectric material.
    Type: Application
    Filed: November 9, 2010
    Publication date: May 10, 2012
    Inventors: Gilberto Medairos Ribeiro, Philip J. Kuekes, Alexandre M. Bratkovski, Janice H. Nickel
  • Publication number: 20120115296
    Abstract: A tunnel field effect transistor (TFET) is disclosed. In one aspect, the transistor comprises a gate that does not align with a drain, and only overlap with the source extending at least up to the interface of the source-channel region and optionally overlaps with part of the channel. Due to the shorter gate, the total gate capacitance is reduced, which is directly reflected in an improved switching speed of the device. In addition to the advantage of an improved switching speed, the transistor also has a processing advantage (no alignment of the gate with the drain is necessary), as well as a performance improvement (the ambipolar behavior of the TFET is reduced).
    Type: Application
    Filed: January 19, 2012
    Publication date: May 10, 2012
    Applicants: Katholieke Universiteit Leuven, K.U. Leuven R&D, IMEC
    Inventors: William G. Vandenderghe, Anne S. Verhulst
  • Publication number: 20120104361
    Abstract: A transistor includes a substrate, a source electrode, a drain electrode and a nanowire-layer. The source electrode, the drain electrode and the nanowires-layer are formed on the substrate. The source electrode includes a plurality of first pointed portions, and the drain electrode includes a plurality of second pointed portions each aligned with a corresponding first pointed portions. The nanowire-layer is interconnected between the first pointed portions and the second pointed portions.
    Type: Application
    Filed: December 17, 2010
    Publication date: May 3, 2012
    Applicant: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventor: CHIA-LING HSU
  • Publication number: 20120105046
    Abstract: Current mirrors have been used in analog electronics with both CMOS and bipolar transistors for many years. Conventional current minor designs, though, may not be suitable for emerging technology transistors, such as graphene transistors, carbon nanotube (CNT) transistors, or other ambipolar transistors. Here, a current minor has been provided that uses ambipolar transistors, which accounts for the more unusual I-V (drain current to gate-source voltage) characteristics of ambipolar transistors.
    Type: Application
    Filed: October 28, 2010
    Publication date: May 3, 2012
    Applicant: Texas Instruments Incorporated
    Inventors: Andrew Marshall, Ashesh Parikh
  • Patent number: 8168495
    Abstract: A technique of the invention reduces significantly the distance between the gate and single-walled carbon nanotubes to improve performance and efficiency of a carbon nanotube transistor device. Without using a porous template structure, single-walled carbon nanotubes are grown perpendicularly to a substrate between a base metal layer and a middle mesh layer. The nanotubes are insulated with a thin insulator and then gate regions are formed.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: May 1, 2012
    Assignee: Etamota Corporation
    Inventors: Brian Y. Lim, Jon W. Lai
  • Publication number: 20120074386
    Abstract: Techniques are disclosed for forming a non-planar quantum well structure. In particular, the quantum well structure can be implemented with group IV or III-V semiconductor materials and includes a fin structure. In one example case, a non-planar quantum well device is provided, which includes a quantum well structure having a substrate (e.g. SiGe or GaAs buffer on silicon), a IV or III-V material barrier layer (e.g., SiGe or GaAs or AlGaAs), and a quantum well layer. A fin structure is formed in the quantum well structure, and an interfacial layer provided over the fin structure. A gate metal can be deposited across the fin structure. Drain/source regions can be formed at respective ends of the fin structure.
    Type: Application
    Filed: September 24, 2010
    Publication date: March 29, 2012
    Inventors: Willy Rachmady, Ravi Pillarisetty, Van H. Le, Robert Chau
  • Publication number: 20120073992
    Abstract: Disclosed are a biosensor, a method of producing the same, and a method of detecting a biomaterial through the biosensor. The biosensor includes a substrate, an insulating layer, source and drain electrodes formed on the insulating layer, a middle-discontinuous channel provided between the source and drain electrodes, and a detection area on which a detection target material is to be fixed, covering the middle-discontinuous channel.
    Type: Application
    Filed: September 24, 2010
    Publication date: March 29, 2012
    Inventors: Jae-Ho Kim, Sung-Wook Choi, Jae-Hyeok Lee, Gwang Hyeon Nam
  • Patent number: 8143658
    Abstract: The present invention relates to a nanostructured device for charge storage. In particular the invention relates to a charge storage device that can be used for memory applications. According to the invention the device comprise a first nanowire with a first wrap gate arranged around a portion of its length, and a charge storing terminal connected to one end, and a second nanowire with a second wrap gate arranged around a portion of its length. The charge storing terminal is connected to the second wrap gate, whereby a charge stored on the charge storing terminal can affect a current in the second nanowire. The current can be related to written (charged) or unwritten (no charge) state, and hence a memory function is established.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: March 27, 2012
    Assignee: QuNano AB
    Inventors: Lars Samuelson, Claes Thelander
  • Patent number: 8143616
    Abstract: A structure includes a surface and a non-equilibrium two-dimensional semiconductor micro structure on the surface.
    Type: Grant
    Filed: April 20, 2009
    Date of Patent: March 27, 2012
    Assignees: Oregon State University, Hewlett Packard Development Company, L.P.
    Inventors: Gregory S. Herman, Peter Mardilovich, Chinmay Betrabet, Chih-hung Chang, Yu-jen Chang, Doo-Hyoung Lee, Mark W. Hoskins
  • Patent number: 8143703
    Abstract: Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).
    Type: Grant
    Filed: November 5, 2008
    Date of Patent: March 27, 2012
    Assignee: Nanosys, Inc.
    Inventors: David L. Heald, Karen Chu Cruden, Xiangfeng Duan, Chao Liu, J. Wallace Parce
  • Patent number: 8143113
    Abstract: A method for forming a nanowire tunnel field effect transistor device includes forming a nanowire connected to a first pad region and a second pad region, the nanowire including a core portion and a dielectric layer, forming a gate structure on the dielectric layer of the nanowire, forming a first protective spacer on portions of the nanowire, implanting ions in a first portion of the exposed nanowire and the first pad region, implanting in the dielectric layer of a second portion of the exposed nanowire and the second pad region, removing the dielectric layer from the second pad region and the second portion, removing the core portion of the second portion of the exposed nanowire to form a cavity, and epitaxially growing a doped semiconductor material in the cavity to connect the exposed cross sections of the nanowire to the second pad region.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: March 27, 2012
    Assignee: International Business Machines Corporation
    Inventors: Sarunya Bangsaruntip, Josephine B. Chang, Isaac Lauer, Jeffrey W. Sleight
  • Patent number: 8138491
    Abstract: A self-aligned carbon-nanotube field effect transistor semiconductor device comprises a carbon-nanotube deposited on a substrate, a source and a drain formed at a first end and a second end of the carbon-nanotube, respectively, and a gate formed substantially over a portion of the carbon-nanotube, separated from the carbon-nanotube by a dielectric film.
    Type: Grant
    Filed: August 20, 2009
    Date of Patent: March 20, 2012
    Assignee: International Business Machines Corporation
    Inventors: Joerg Appenzeller, Phaedon Avouris, Kevin K. Chan, Philip G. Collins, Richard Martel, Hon-Sum Philip Wong
  • Patent number: 8134142
    Abstract: The invention suggests a transistor (21) comprising a source (24) and a drain (29) as well as a barrier region (27) located between the source and the drain. The barrier region is separated from the source and the drain by intrinsic or lowly doped regions (26, 28) of a semiconductor material. Potential barriers are formed at the interfaces of the barrier region and the intrinsic or lowly doped regions. A gate electrode (32) is provided in the vicinity of the potential barriers such that the effective height and/or width of the potential barriers can be modulated by applying an appropriate voltage to the gate electrode.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: March 13, 2012
    Assignee: NXP B.V.
    Inventors: Godefridus Hurkx, Prabhat Agarwal
  • Patent number: 8130569
    Abstract: A device for storing data using nanoparticle shuttle memory having a nanotube. The nanotube has a first end and a second end. A first electrode is electrically connected to the first end of the nanotube. A second electrode is electrically connected to the second end of the nanotube. The nanotube has an enclosed nanoparticle shuttle. A switched voltage source is electrically connected to the first electrode and the second electrode, whereby a voltage may be controllably applied across the nanotube. A resistance meter is also connected to the first electrode and the second electrode, whereby the electrical resistance across the nanotube can be determined.
    Type: Grant
    Filed: April 27, 2010
    Date of Patent: March 6, 2012
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventor: Alex Karlwalter Zettl
  • Patent number: 8124961
    Abstract: A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the nanowire channel, the oxide channel areas insulating at least one portion of the nanowire channel, a quantum dot in the portion of the nanowire channel insulated by the plurality of oxide channel areas, and a gate electrode surrounding the quantum dot.
    Type: Grant
    Filed: June 3, 2011
    Date of Patent: February 28, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Dae Suk, Kyoung-Hwan Yeo, Ming Li, Yun-Young Yeoh
  • Patent number: 8124518
    Abstract: Nanowire devices comprising core-shell or segmented nanowires are provided. In these nanowire devices, strain can be used as a tool to form metallic portions in nanowires made from compound semiconductor materials, and/or to create nanowires in which embedded quantum dots experience negative hydrostatic pressure or high positive hydrostatic pressure, whereby a phase transitions may occur, and/or to create exciton crystals.
    Type: Grant
    Filed: May 9, 2011
    Date of Patent: February 28, 2012
    Assignee: University of Iowa Research Foundation
    Inventors: Craig Pryor, Mats-Erik Pistol
  • Patent number: 8120015
    Abstract: A resonant structure is provided, including a first terminal, a second terminal which faces the first terminal, a wire unit which connects the first terminal and the second terminal, a third terminal which is spaced apart at a certain distance from the wire unit and which resonates the wire unit, and a potential barrier unit which is formed on the wire unit and which provides a negative resistance component. Accordingly, transduction efficiency can be enhanced.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: February 21, 2012
    Assignees: Samsung Electronics Co., Ltd., Korea University Industrial and Academic Collaboration Foundation
    Inventors: Yun-Kwon Park, Sung-Woo Hwang, Jea-Shik Shin, Byeoung-Ju Ha, Jae-Sung Rieh, In-Sang Song, Yong-Kyu Kim, Byeong-Kwon Ju, Hee-Tae Kim
  • Publication number: 20120038409
    Abstract: An apparatus including a first electrode; a second electrode; a nano-scale channel between the first electrode and the second electrode wherein the nano-scale channel has a first state in which an electrical impedance of the nano-scale channel is relatively high and a second state in which the electrical impedance of the nano-scale channel is relatively low; dielectric adjacent the nano-scale channel; and a gate electrode adjacent the dielectric configured to control a threshold number of quanta of stimulus, wherein the nano-scale channel is configured to switch between the first state and the second state in response to an application of a quantum of stimulus above the threshold number of quanta of stimulus.
    Type: Application
    Filed: August 13, 2010
    Publication date: February 16, 2012
    Inventors: Alan COLLI, Richard White
  • Publication number: 20120037880
    Abstract: A method for forming a nanowire field effect transistor (FET) device includes forming a nanowire over a semiconductor substrate, forming a gate stack around a portion of the nanowire, forming a capping layer on the gate stack, forming a spacer adjacent to sidewalls of the gate stack and around portions of nanowire extending from the gate stack, forming a hardmask layer on the capping layer and the first spacer, forming a metallic layer over the exposed portions of the device, depositing a conductive material over the metallic layer, removing the hardmask layer from the gate stack, and removing portions of the conductive material to define a source region contact and a drain region contact.
    Type: Application
    Filed: August 16, 2010
    Publication date: February 16, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Sarunya Bangsaruntip, Guy M. Cohen, Shreesh Narasimha, Jeffrey W. Sleight
  • Patent number: 8110410
    Abstract: A field effect transistor device includes: a reservoir bifurcated by a membrane of three layers: two electrically insulating layers; and an electrically conductive gate between the two insulating layers. The gate has a surface charge polarity different from at least one of the insulating layers. A nanochannel runs through the membrane, connecting both parts of the reservoir. The device further includes: an ionic solution filling the reservoir and the nanochannel; a drain electrode; a source electrode; and voltages applied to the electrodes (a voltage between the source and drain electrodes and a voltage on the gate) for turning on an ionic current through the ionic channel wherein the voltage on the gate gates the transportation of ions through the ionic channel.
    Type: Grant
    Filed: June 29, 2009
    Date of Patent: February 7, 2012
    Assignee: International Business Machines Corporation
    Inventors: Hongbo Peng, Stanislav Polonsky, Stephen M. Rossnagel, Gustavo Alejandro Stolovitzky
  • Publication number: 20120028820
    Abstract: The present invention provides devices, methods and systems to selectively detect the binding of a molecular species to a biomolecule. In its olfactory sensing application, the hybrid sensor arrays of the present invention provide a high dimensional signature of odorants present that is also readily reversible, together enabling the identification and localization of a source analyte in the presence of the background odorant landscape inherent in a real-world setting.
    Type: Application
    Filed: December 28, 2010
    Publication date: February 2, 2012
    Applicant: Nanosense Inc.
    Inventors: Paul A. Rhodes, Samuel M. Khamis
  • Patent number: 8106430
    Abstract: The invented ink-jet printing method for the construction of thin film transistors using all SWNTs on flexible plastic films is a new process. This method is more practical than all of existing printing methods in the construction TFT and RFID tags because SWNTs have superior properties of both electrical and mechanical over organic conducting oligomers and polymers which are often used for TFT. Furthermore, this method can be applied on thin films such as paper and plastic films while silicon based techniques cannot be used on such flexible films. These are superior to the traditional conducting polymers used in printable devices since they need no dopant and they are more stable. They could be used in conjunction with conducting polymers, or as stand-alone inks.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: January 31, 2012
    Assignee: William Marsh Rice University
    Inventors: Gyou-Jin Cho, Min Hun Jung, Jared L. Hudson, James M. Tour
  • Patent number: 8101953
    Abstract: A thin film transistor includes a source electrode, a drain electrode, a semiconducting layer, and a gate electrode. The drain electrode is spaced from the source electrode. The semiconducting layer is connected to the source electrode and the drain electrode. The gate electrode is insulated from the source electrode, the drain electrode, and the semiconducting layer by an insulating layer. The semiconducting layer includes at least two stacked carbon nanotube films. Each carbon nanotube film includes an amount of carbon nanotubes. At least a part of the carbon nanotubes of each carbon nanotube film are aligned along a direction from the source electrode to the drain electrode.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: January 24, 2012
    Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.
    Inventors: Kai-Li Jiang, Qun-Qing Li, Shou-Shan Fan
  • Publication number: 20120015467
    Abstract: A biosensor using a nanodot and a method of manufacturing the same are provided. A silicon nanowire can be formed by a CMOS process to reduce manufacturing costs. In addition, an electrically charged nanodot is coupled to a target molecule to be detected, in order to readily change conductivity of the silicon nanowire, thereby making it possible to implement a biosensor capable of providing good sensitivity and being manufactured at a low cost.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 19, 2012
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Tae Youb KIM, Chil Seong AH, Chang Geun AHN, Han Young YU, Jong Heon YANG, Moon Gyu JANG
  • Patent number: 8093474
    Abstract: A nanostructure includes a nanowire having metallic spheres formed therein, the spheres being characterized as having at least one of about a uniform diameter and about a uniform spacing there between. A nanostructure in another embodiment includes a substrate having an area with a nanofeature; and a nanowire extending from the nanofeature, the nanowire having metallic spheres formed therein, the spheres being characterized as having at least one of about a uniform diameter and about a uniform spacing there between. A method for forming a nanostructure is also presented. A method for reading and writing data is also presented. A method for preparing nanoparticles is also presented.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: January 10, 2012
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Saleem Zaidi, Joseph W. Tringe, Ganesh Vanamu, Rajiv Prinja
  • Patent number: 8088674
    Abstract: Electrodes made from metallic material are formed on a layer of dielectric material. A bottom layer of at least one of the electrodes constitutes a catalyst material in direct contact with the layer of dielectric material. Nanowires are grown by means of the catalyst, between the electrodes, parallel to the layer of dielectric material. The nanowires connecting the two electrodes are then made from single-crystal semi-conductor material and in contact with the layer of dielectric material.
    Type: Grant
    Filed: November 27, 2008
    Date of Patent: January 3, 2012
    Assignees: Commissariat a l'Energie Atomique, Centre National de al Recherche Scientifique
    Inventors: Thomas Ernst, Thierry Baron, Pierre Ferret, Pascal Gentile, Bassem Salem
  • Patent number: 8084308
    Abstract: Nanowire-based devices are provided. In one aspect, a field-effect transistor (FET) inverter is provided. The FET inverter includes a plurality of device layers oriented vertically in a stack, each device layer having a source region, a drain region and a plurality of nanowire channels connecting the source region and the drain region, wherein the source and drain regions of one or more of the device layers are doped with an n-type dopant and the source and drain regions of one or more other of the device layers are doped with a p-type dopant; a gate common to each of the device layers surrounding the nanowire channels; a first contact to the source regions of the one or more device layers doped with an n-type dopant; a second contact to the source regions of the one or more device layers doped with a p-type dopant; and a third contact common to the drain regions of each of the device layers. Techniques for fabricating a FET inverter are also provided.
    Type: Grant
    Filed: May 21, 2009
    Date of Patent: December 27, 2011
    Assignee: International Business Machines Corporation
    Inventors: Josephine Chang, Paul Chang, Michael A. Guillorn, Jeffrey Sleight
  • Patent number: 8080314
    Abstract: Methods and articles providing for precise aligning, positioning, shaping, and linking of nanotubes and carbon nanotubes. An article comprising: a solid surface comprising at least two different surface regions including: a first surface region which comprises an outer boundary and which is adapted for carbon nanotube adsorption, and a second surface region which is adapted for preventing carbon nanotube adsorption, the second region forming an interface with the outer boundary of the first region, at least one carbon nanotube which is at least partially selectively adsorbed at the interface. The shape and size of the patterns on the surface and the length of the carbon nanotube can be controlled to provide for selective interfacial adsorption.
    Type: Grant
    Filed: May 6, 2011
    Date of Patent: December 20, 2011
    Assignee: Northwestern University
    Inventors: Chad A. Mirkin, Yuhuang Wang, Daniel Maspoch
  • Patent number: 8076701
    Abstract: A method of making nanostructures using a self-assembled monolayer of organic spheres is disclosed. The nanostructures include bowl-shaped structures and patterned elongated nanostructures. A bowl-shaped nanostructure with a nanorod grown from a conductive substrate through the bowl-shaped nanostructure may be configured as a field emitter or a vertical field effect transistor. A method of separating nanoparticles of a desired size employs an array of bowl-shaped structures.
    Type: Grant
    Filed: February 8, 2008
    Date of Patent: December 13, 2011
    Assignee: Georgia Tech Research Corporation
    Inventors: Zhong L. Wang, Christopher J. Summers, Xudong Wang, Elton D Graugnard, Jeffrey King
  • Patent number: 8063451
    Abstract: Our invention discloses a self-aligned-gate structure for nano FET and its fabrication method. One dimension semiconductor material is used as conductive channel, whose two terminals are source and drain electrodes. Gate dielectric grown by ALD covers the area between source electrode and drain electrode, opposite sidewalls of source electrode and drain electrode, and part of upper source electrode and drain electrode. Gate electrode is deposited on gate dielectric by evaporation or sputtering. Total thickness of gate dielectric and electrode must less than source electrode or drain electrode. Gate electrode between source electrode and drain electrode is electrically separated from source and drain electrode by gate dielectric. The fabrication process of this self-aligned structure is simple, stable, and has high degree of freedom.
    Type: Grant
    Filed: October 1, 2009
    Date of Patent: November 22, 2011
    Assignee: Peking University
    Inventors: Zhiyong Zhang, Lianmao Peng, Sheng Wang, Xuelei Liang, Qing Chen
  • Patent number: 8063455
    Abstract: A multi-terminal electromechanical nanoscopic switching device which may be used as a memory device, a pass gate, a transmission gate, or a multiplexer, among other things.
    Type: Grant
    Filed: November 22, 2005
    Date of Patent: November 22, 2011
    Assignee: Agate Logic, Inc.
    Inventors: Louis Charles Kordus, II, Colin Neal Murphy, Malcolm John Wing
  • Publication number: 20110278544
    Abstract: A method of modifying a wafer having a semiconductor disposed on an insulator is provided and includes forming pairs of semiconductor pads connected via respective nanowire channels at each of first and second regions with different initial semiconductor thicknesses and reshaping the nanowire channels into nanowires to each have a respective differing thickness reflective of the different initial semiconductor thicknesses.
    Type: Application
    Filed: May 12, 2010
    Publication date: November 17, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Sarunya Bangsaruntip, Guy M. Cohen, Jeffrey W. Sleight
  • Publication number: 20110278543
    Abstract: A method of modifying a wafer having semiconductor disposed on an insulator is provided and includes establishing first and second regions of the wafer with different initial semiconductor thicknesses, forming pairs of semiconductor pads connected via respective nanowire channels at each of the first and second regions and reshaping the nanowire channels into nanowires each having a respective differing thickness reflective of the different initial semiconductor thicknesses at each of the first and second regions.
    Type: Application
    Filed: May 12, 2010
    Publication date: November 17, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Sarunya Bangsaruntip, Guy M. Cohen, Amlan Majumdar, Jeffrey W. Sleight
  • Patent number: 8058673
    Abstract: A biosensor using a nanodot and a method of manufacturing the same are provided. A silicon nanowire can be formed by a CMOS process to reduce manufacturing costs. In addition, an electrically charged nanodot is coupled to a target molecule to be detected, in order to readily change conductivity of the silicon nanowire, thereby making it possible to implement a biosensor capable of providing good sensitivity and being manufactured at a low cost.
    Type: Grant
    Filed: September 29, 2008
    Date of Patent: November 15, 2011
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Tae Youb Kim, Chil Seong Ah, Chang Geun Ahn, Han Young Yu, Jong Heon Yang, Moon Gyu Jang
  • Patent number: 8053291
    Abstract: A method for making a thin film transistor, the method includes the steps of: providing a plurality of carbon nanotubes and an insulating substrate; flocculating the carbon nanotubes to acquire a carbon nanotube structure, applying the carbon nanotube structure on the insulating substrate; forming a source electrode, a drain electrode, and a gate electrode; and covering the carbon nanotube structure with an insulating layer. The source electrode and the drain electrode are connected to the carbon nanotube structure, the gate electrode is electrically insulated from the carbon nanotube structure by the insulating layer.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: November 8, 2011
    Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.
    Inventors: Chang-Hong Liu, Kai-Li Jiang, Qun-Qing Li, Shou-Shan Fan
  • Patent number: 8049203
    Abstract: The present invention relates to semiconductor devices comprising semiconductor nanoelements. In particular the invention relates to devices having a volume element having a larger diameter than the nanoelement arranged in epitaxial connection to the nanoelement. The volume element is being doped in order to provide a high charge carrier injection into the nanoelement and a low access resistance in an electrical connection. The nanoelement may be upstanding from a semiconductor substrate. A concentric layer of low resistivity material forms on the volume element forms a contact.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: November 1, 2011
    Assignee: QuNano AB
    Inventors: Lars Ivar Samuelson, Patrik Svensson, Jonas Ohlsson, Truls Lowgren
  • Publication number: 20110260775
    Abstract: A nanoscale variable resistor including a metal nanowire as an active element, a dielectric, and a gate. By selective application of a gate voltage, stochastic transitions between different conducting states, and even length, of the nanowire can be induced and with a switching time as fast as picoseconds. With an appropriate choice of dielectric, the transconductance of the device, which may also be considered an “electromechanical transistor,” is shown to significantly exceed the conductance quantum G0=2e2/h.
    Type: Application
    Filed: June 25, 2008
    Publication date: October 27, 2011
    Inventors: Jerome Alexandre Bürki, Charles Allen Stafford, Daniel L. Stein
  • Publication number: 20110253981
    Abstract: The present disclosure provides a method for manufacturing at least one nanowire Tunnel Field Effect Transistor (TFET) semiconductor device. The method comprises providing a stack comprising a layer of channel material with on top thereof a layer of sacrificial material, removing material from the stack so as to form at least one nanowire from the layer of channel material and the layer of sacrificial material, and replacing the sacrificial material in the at least one nanowire by heterojunction material. A method according to embodiments of the present disclosure is advantageous as it enables easy manufacturing of complementary TFETs.
    Type: Application
    Filed: April 8, 2011
    Publication date: October 20, 2011
    Applicants: Katholieke Universiteit Leuven, K.U. LEUVEN R&D, IMEC
    Inventors: Rita Rooyackers, Daniele Leonelli, Anne Vandooren, Anne S. Verhulst, Roger Loo, Stefan De Gendt
  • Publication number: 20110253217
    Abstract: Disclosed are methods of using magnetic or electric fields to align magnetically responsive nanoparticles in a polymeric matrix, which has not yet been completely solidified. The nanoparticles are preferably magnetically doped, then blended with photovoltaic polymer material to form devices. The methods provided are particularly useful for the formation of solar cell devices. The devices include nanostructured electron-conducting channels arranged approximately parallel to one another, where the channels comprise magnetically doped materials, as well as photovoltaic materials interspersed with the nanostructured electron-conducting channels. The method provides a way to control the morphology of blended photovoltaic devices, which will improve efficiencies. In addition, the new method provides a way to control the growth of novel, cheap, solar cells, which can in turn lead to enhanced performance.
    Type: Application
    Filed: September 28, 2009
    Publication date: October 20, 2011
    Inventors: Jeffrey C. Grossman, Alexander K. Zettl
  • Publication number: 20110253980
    Abstract: Electronic devices having carbon-based materials and techniques for making contact to carbon-based materials in electronic devices are provided. In one aspect, a device is provided having a carbon-based material; and at least one electrical contact to the carbon-based material comprising a metal silicide, germanide or germanosilicide. The carbon-based material can include graphene or carbon nano-tubes. The device can further include a segregation region, having an impurity, separating the carbon-based material from the metal silicide, germanide or germanosilicide, wherein the impurity has a work function that is different from a work function of the metal silicide, germanide or germanosilicide. A method for fabricating the device is also provided.
    Type: Application
    Filed: April 19, 2010
    Publication date: October 20, 2011
    Applicant: International Business Machines Corporation
    Inventors: Josephine B. Chang, Christian Lavoie, Zhen Zhang
  • Publication number: 20110253982
    Abstract: Embodiments of the invention provide a method for direct heteroepitaxial growth of vertical III-V semiconductor nanowires on a silicon substrate. The silicon substrate is etched to substantially completely remove native oxide. It is promptly placed in a reaction chamber. The substrate is heated and maintained at a growth temperature. Group III-V precursors are flowed for a growth time. Preferred embodiment vertical Group III-V nanowires on silicon have a core-shell structure, which provides a radial homojunction or heterojunction. A doped nanowire core is surrounded by a shell with complementary doping. Such can provide high optical absorption due to the long optical path in the axial direction of the vertical nanowires, while reducing considerably the distance over which carriers must diffuse before being collected in the radial direction. Alloy composition can also be varied. Radial and axial homojunctions and heterojunctions can be realized. Embodiments provide for flexible Group III-V nanowire structures.
    Type: Application
    Filed: October 28, 2009
    Publication date: October 20, 2011
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Deli Wang, Cesare Soci, Xinyu Bao, Wei Wei, Yi Jing, Ke Sun
  • Publication number: 20110248243
    Abstract: Methods and devices for manufacturing carbon nanotube based field effect transistors are disclosed including providing a substrate; printing a gate electrode layer onto the substrate and sintering and/or UV curing; printing a gate isolation layer onto the gate electrode and air drying and/or UV curing; printing one or more carbon nanotube channel layers onto the gate isolation layer, wherein each carbon nanotube channel layer is air dried prior to subsequent printings; and printing a source and drain electrode layer onto the one or more carbon nanotube channel layers and sintering and/or UV curing. Other embodiments are described and claimed.
    Type: Application
    Filed: November 30, 2009
    Publication date: October 13, 2011
    Applicant: Omega Optics, Inc.
    Inventors: Yihong Chen, Ray T. Chen
  • Patent number: 8034676
    Abstract: A plurality of origin patterns (3) containing a metal catalyst are formed over a semiconductor substrate (1). Next, an insulating film (4) covering the origin patterns (3) is formed. Next, a trench allowing at the both ends thereof the side faces of the origin patterns (3) to expose is formed. Thereafter, a wiring is formed by allowing carbon nanotubes (5) having a conductive chirality to grow in the trench. Thereafter, an insulating film covering the carbon nanotubes (5) is formed.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: October 11, 2011
    Assignee: Fujitsu Semiconductor Limited
    Inventor: Yoichi Okita