Abstract: A method and apparatus provide for automatically cleaning and decontaminating medical instruments. The method comprising the steps of: a) placing the medical instruments into a container after their use in a medical procedure; b) closing the container to seal the instruments inside whereby to prevent personnel contact with the instruments and any contaminants which might be thereon; c) inserting the sealed container into a washer/decontaminator and sealing the washer/decontaminator; d) the washer/decontaminator automatically opening the container and applying a washing fluid thereto to wash the instruments within the container; and e) the washer/decontaminator automatically applying a disinfectant to the container to disinfect the instruments whereby to allow safe handling thereof by personnel.

Abstract: The invention refers to a device (1) and method for sterilizing partly formed packages (6) in a packaging machine. The device (1) comprises an inner chamber (2) and an outer chamber (3), the inner chamber (2) being provided with a sterilization unit (5). Further, it comprises a carrier unit (10), comprising a separating member (11) and a package carrying member (12), which is being adapted to rotate between a first position in which the package carrying member (12) is located in the outer chamber (3), and in which the separating member (11) separates the inner chamber (2) from the outer chamber (3), and a second position in which the carrier unit (10) has rotated a package (6) into the inner chamber (2) and in which the separating member (11) separates the inner chamber (2) from the outer chamber (3).

Abstract: A method for removing scum in a tub of an electronically controlled drum washing machine. The method includes alternately rotating a drum following a main washing cycle and pumping liquid out of the drum, pumping a liquid out of the drum for between 30 seconds to 15 minutes following a main washing cycle and pumping liquid out of the drum, regulating a level of water following a main washing cycle and pumping liquid out of the drum by: introducing a quantity of water into the drum which is sufficient to cover all water channels, and rinsing over a short period of time t2. The method further including pumping liquid out of the drum while the drum is moved at a low rotational speed following a main washing cycle and pumping liquid out of the drum.

Abstract: A reservoir cleaning, treating and/or stimulation system allows the operator to control the speed and pressure of delivery of the treating fluid into the reservoir and remove or dissolve sediment particles settled in the reservoir or the reservoir formation. The system uses a thermal heater capable of heating the treating fluid from ambient temperature to about 400 degrees Fahrenheit. A charge pump mounted on an intake side of the heater forces the treating fluid through the heater, while the treating fluid passes through the tubing of the heater. The heated treating fluid is channeled to a discharge pump on an outlet side of the heater, where the treating fluid is pressurized to a value sufficient to overcome the pressure existing within the reservoir and cause displacement or dissolution of the sediment in the reservoir. A flow meter mounted between the heater and the charge pump regulates the volume of the treating fluid being admitted into the heater.

Abstract: According to one embodiment of the present invention, a method of cleaning one or more fluid plenums of an electrode assembly is provided. According to the method, a plurality of fluid ports in communication with the fluid plenum are isolated and differentiated into respective sets of plenum input ports and plenum output ports. The input and output ports are engaged with respective cleaning fluid couplings. A cleaning fluid is directed through the fluid plenum by creating a fluid pressure differential ?P=PIN?POUT across the plenum input and output ports. The pressure differential ?P is large enough to force cleaning fluid from the cleaning fluid supply duct to the cleaning fluid waste duct through the fluid plenum. Additional embodiments are disclosed and claimed.

Abstract: Chlorofluorocarbon replacement solvents include a main component (first solvent) and a property-modification component (second solvent). The resulting solvent mixtures meet or exceed the solvency, flammability, and compatibility requirements for CFC's while providing similar or improved environmental and toxicological properties. These solvent mixtures can be used in conjunction with refrigeration or heat pumps, electronics, implantable prosthetic devices, oxygen systems, and optical equipment.

Abstract: A rotary atomizer component, such as for a steering air ring or bell cup for a rotary atomizer with at least one steering air jet for delivering steering air (or controlled air) and a rotary bearing shaft where, in axial direction between the bell cup and the steering air jet, a circumferential annular gap is located. A shaft cover in form of a bushing covers the bearing shaft, when mounted, at least partially in the annular gap area between the bell cup and the steering air jet. In addition, the annular gap space between the front surface of the bearing unit and the internal surface facing it axially or any other front element of the atomizer is sealed in a radial way internally against the externally accessible area of the shaft. The sealing element provided for this purpose is located along the internal circumference of the air-steering rings or front element and able to be attached to the front surface of the bearing unit in a way that it is elastically deformable.

Abstract: The present invention is directed to a composition, and a process employing same, for descaling, cleaning and inhibiting the corrosion of process equipment made of steel by including an inhibitory effective amount of acridine orange in the composition.

Abstract: A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.

Abstract: Methods and apparatus for cleaning undesired substances from a surface in a semiconductor processing chamber. An cleaning gas mixture is formed onsite and stored in a buffer tank for a time, prior to its introduction into a semiconductor processing chamber, to remove an undesired substance from a surface in the chamber. The undesired substance is removed without the generation of a plasma in the chamber, and at a temperature of less than 300° C.

Abstract: A nozzle for cleaning a gas turbine unit during operation. The invention further relates to a method for washing a gas turbine unit during operation. The nozzle is arranged to atomize a wash liquid in the air stream in an air intake of the gas turbine unit and comprises a nozzle body comprising an intake end for intake of said wash liquid and outlet end for exit of said wash liquid. The nozzle further comprises a number of orifices that are connected to the outlet end and respective orifice is arranged at a suitable distance from a centre axis of said nozzle body, whereby the local density of the injected wash liquid in a desired area can be increased with preserved droplet size and thereby the efficiency of the cleaning process can be significantly improved at the same time as the risk for damaging the components in the gas turbine unit is significantly reduced.

Abstract: Provided is a maintenance liquid for inkjet printers, which comprises at least one of glycol ethers and glycol esters represented by the following general formulas (1) to (3), and 45 to 10 mg/L of dissolved oxygen: R1CO(OR2)xOR3??General formula (1) R4CO(OR5)YOCOR6??General formula (2) R7(OR8)ZOR9??General formula (3) wherein R2, R5, and R8 each independently represent an ethylene group or a propylene group, R1, R3, R4, and R6 each independently represent an alkyl group having 1 to 4 carbon atoms, R7 and R9 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and X, Y, and Z each independently represent an integer of 1 to 4.

Abstract: The disclosure provides mixed acid solutions for cleaning a vessel, such as a vessel used for growing a GaAs crystal, comprising nitric acid, hydrofluoric acid and water. Further, the disclosure also provides exemplary methods for cleaning a vessel for growing a GaAs crystal, by: a) immersing the vessel in a mixed acid solution; b) immersing the vessel in an ammonia solution; c) cleansing the vessel with a surfactant solution under supersonic vibration; and d) cleansing the vessel with deionized water under supersonic vibration.

Abstract: A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.

Abstract: The invention relates to an apparatus and a method to clean enclosed spaces. The apparatus consists of an inlet-pipe (1) for cleaning-medium, equipped with thread (10) on outside where a vertical displacement nut (12) is located, which moves vertically when the drive-shaft (6), which is directly connected to a cleaning-medium distributor (18) and, indirectly to a shielding-pipe (8) and nozzle-arms (15, 21), is rotated by a motor (3). The upper nozzle-arms (21) and the vertical displacement nut (12) are interconnected through vertical displacement arms (14) so that the nozzle-arms move vertically and circularly in concert with the vertical displacement nut (12) when the motor rotates the drive-shaft (6). The method relates to cleaning of various enclosed spaces with different cleaning media and is effective for cleaning enclosed spaces such as storage tanks.

Abstract: The present invention related to a method for treating a surface with a gel, as well as to a treatment gel. The treatment may be a decontamination, etching or surface degreasing treatment, for example. The method comprises in this order, the following steps: applying the treatment gel on the surface to be treated, maintaining the treatment gel on the surface to be treated at a temperature and relative humidity such that the gel dries by breaking up and that it has the time to treat the surface before forming a dry and solid residue, and removing the dry and solid residue from the treated surface by suction or brushing. The gel comprises a viscosing agent, a treatment agent and optional an oxidizing agent.

Abstract: The present invention relates to a method for treating a surface with a gel, as well as to a treatment gel. The treatment may be a decontamination, etching or surface degreasing treatment, for example. The method comprises in this order, the following steps: applying the treatment gel on the surface to be treated, maintaining the treatment gel on the surface to be treated at a temperature and relative humidity such that the gel dries by breaking up and that it has the time to treat the surface before forming a dry and solid residue, and removing the dry and solid residue from the treated surface by suction or brushing. The gel comprises a viscosing agent, a treatment agent and optionally an oxidizing agent.

Abstract: A ready mix truck wash system includes at least one spray arch fluidly connected to a pump, a motor, and controls. The spray arch has a plurality of pipes and spray nozzles configured to spray pressurized fluid onto a ready mix truck. In one embodiment, the ready mix truck is washed in multiple stages.

Abstract: A method for using an engineered fluid in a manner that reduces or minimizes waste includes applying the engineered fluid to a container having a settled component of a stored fluid, retrieving the applied engineered fluid and at least a portion of the settled component from the container, and using the applied engineered fluid at least once in the same manner as the stored fluid was used. In certain applications, the applied engineered fluid may be put to a different use. The engineered fluid may be processed prior to use.

Abstract: The present invention relates to a method for dispensing of a microbiologically sensitive fluid, in particular low acid food fluid, in a hygienic manner so as to avoid micro-organism growth in the line dispensing the fluid as well as in any mechanical components of a dispensing unit that may enter into contact with the fluid. The invention hygienically supplies microbiologically sensitive fluid from a removable container that has a terminal connecting portion to a dispensing unit. The unit includes a coupling mechanism adapted to connect the terminal connecting portion and a component for delivering a cleaning or rinsing fluid within the terminal connecting portion. Thus, during cleaning or rinsing, the cleaning or rinsing fluid can be discharged within the terminal connecting portion up to a closing point of the container assembly, thus demarcating a closing point, downstream of which is a part that is maintained clean, and upstream of which is a part of the container that is maintained sterile.

Abstract: A by-product (e.g., RuF5) that is produced in the process of cleaning may cover a cleaning subject film and may obstruct the progress of the cleaning. To suppress an accumulation of the by-product, a cleaning operation is divided into plural operations, performing vacuum evacuation between the divided operations to evaporate the by-product and expose a new surface of the cleaning subject film between each supply of cleaning gas.

Abstract: A method and apparatus for treating a mating portion of a fiber optic connector for reducing an insertion force for the mating portion includes providing a mating portion of a fiber optic connector and treating the mating portion of the fiber optic connector by applying a cleaning and/or lubricating solution thereto to reduce the insertion force of the mating portion.

Abstract: The invention is directed to an arrangement of two conduits, wherein the conduits are positioned parallel with respect to each other and wherein each conduit is provided with means suitable to remove solids from its surface and positioned along the length of one of the two sides of the conduit, wherein the means are one or more pairs of oppositely oriented nozzles, each nozzle having an outflow opening for gas directed, along the surface of the conduit, towards the outflow opening of the other nozzle of said pair, wherein the pairs of oppositely oriented nozzles of one conduit are arranged in a staggered configuration relative to the pairs of oppositely oriented nozzles of the other conduit.

Abstract: A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.

Abstract: A cleaning method is provided to clean processing chambers of a substrate processing apparatus for transferring substrates included in each of lots to the processing chambers on a lot basis and processing the substrates in the processing chambers simultaneously. The cleaning method includes checking whether a lot is switched to another lot to which different cleaning conditions are applied prior to the processing in the processing chambers, performing a cleaning process on the processing chambers under cleaning conditions of a previous lot by transferring cleaning substrates into the processing chambers when it is determined that a lot is switched to another lot to which different cleaning conditions are applied, and omitting the cleaning process of the processing chambers when it is determined that a lot is switched to another lot to which the same cleaning conditions are applied.

Abstract: In a substrate processing apparatus configured to perform a predetermined process on a target substrate accommodated in a process chamber, the process chamber is cleaned by alternately performing an operation of generating plasma of a gas containing oxygen within the process chamber, and an operation of generating plasma of a gas containing nitrogen within the process chamber.

Abstract: The main surface of a quartz component is divided by an offset into a first region having a larger height around an inner perimeter and a second region adjacent to the outer perimeter of the first region. Repeated restoration of a damaged component by forming a bulge on the first region and machining the bulge to make a flat surface while maintaining the offset enables long term use of the component.

Abstract: A method for cleaning a steam generator may include supplying water to the steam generator and boiling the water in the steam generator to separate and expel at least some deposits in the steam generator.

Abstract: In a process chamber of a substrate processing apparatus, such as an RTP apparatus, a carrier is placed and configured to carry out a contaminant that has been attached to it. In this state, a cleaning gas containing N2 and O2 is introduced into the process chamber, and cleaning is performed under conditions including a pressure of 133.3 Pa or less and a temperature of 700° C. to 1,100° C. This cleaning is repeatedly performed by sequentially replacing a plurality of carriers.

Abstract: The method for cleaning chemical process and hydrocarbon processing apparatuses is performed by establishing a closed flow circulation loop, under specific operating conditions and in the presence of hydrocarbon-based fluids. The cleaning method is monitored by performing chemical/physical analysis. After cleaning the apparatus(es) can be immediately inserted back into the process. An optional degassing step can also be performed, in case the apparatus(es) has to be disassembled for inspection of maintenance.

Abstract: Disclosed is a substrate treatment method intended for a substrate having, on its surface, a composite product of an inorganic material containing silicon oxide and an organic material containing carbon and fluorine. The method comprises: an ultraviolet ray treatment step for irradiating the surface of the substrate with ultraviolet ray to remove a part of the organic material; a hydrogen fluoride processing step which is conducted after the ultraviolet ray processing step and which is for supplying a steam of hydrogen fluoride onto the surface of the substrate to remove at least a part of the inorganic material; and a heating processing step which is conducted after the ultraviolet ray processing step and which is for heating the substrate to cause the shrinkage of a part of the organic material that remains unremoved.

Abstract: An aseptic beverage bottle filling plant with a clean room arrangement enclosing the aseptic beverage bottle filling plant and a method of operating same, and an aseptic container filling plant with a clean room arrangement enclosing the aseptic container filling plant, and a method of operating same. The abstract of the disclosure is submitted herewith as required by 37 C.F.R. §1.72(b). As stated in 37 C.F.R. §1.72(b): A brief abstract of the technical disclosure in the specification must commence on a separate sheet, preferably following the claims, under the heading “Abstract of the Disclosure.” The purpose of the abstract is to enable the Patent and Trademark Office and the public generally to determine quickly from a cursory inspection the nature and gist of the technical disclosure. The abstract shall not be used for interpreting the scope of the claims.

Abstract: A sealed storage vessel containing volatile organic vapor over a bottom sludge layer is cleaned by (a) determining the level of free oil in the vessel and then using (b) either a two-stage or one-stage treatment regime, adding a cleaning agent thereto. If the free oil is greater than 2 volume percent the two-stage regime is used where an oil release agent is initially mixed with the sludge to separate the oil from solids in the sludge. The separated oil floats on the surface of water and is removed without substantially exposing the vessel's interior to the atmosphere, leaving within the vessel a mixture of water, solids, and trace amounts of hydrocarbons. Next, a predetermined amount of an emulsifying agent is added to substantially emulsify the trace hydrocarbons, so the level of volatile organic compounds remaining in the interior of the vessel is no greater than 5,000 ppmv, measured as methane, at least one hour after adding the emulsifying agent.

Abstract: Embodiments of the invention relate to an industrial cleaning system and related methods. The system and methods utilize propelled media to clean equipment and facilities.

Abstract: To provide a method of cleaning a film forming apparatus capable of uniformly removing a deposit containing tantalum nitride, titanium nitride, tantalum, or titanium adhering to a wall of a processing chamber of the film forming apparatus at a high etching rate without use of plasma. A method of cleaning a film forming apparatus for removing a deposit containing tantalum nitride, titanium nitride, tantalum, or titanium deposited on a processing chamber of the film forming apparatus after it is used for forming a thin film made of tantalum nitride, titanium nitride, tantalum, or titanium, the cleaning method comprising: a step of supplying process gas containing fluorine gas into the processing chamber of the film forming apparatus; and a step of heating the processing chamber.

Abstract: The present invention relates to vacuum processing systems in which process gases are introduced in a process chamber and are exhausted through a vacuum processing system exhaust path. Deposits made by the exhausted gas are reduced or eliminated by introducing a reactive gas upstream of the device affected by deposits. The amount of introduced reactive gas is controlled by measuring gas phase concentrations of exhausted gas components upstream and downstream of the affected device, and, from those measurements, determining whether the components are being consumed in deposits on the affected device.

Abstract: A barbecue smoker includes a doorless and lidless cabinet including at least four drawer receiving openings. A first drawer for holding food to be cooked is provided in the first opening. A second drawer for holding a pan of water or seasonings is provided in a second opening. A third drawer for holding fuel for heating the smoker is provided in a third opening. A fourth drawer for receiving and holding ashes produced by the fuel is provided in a fourth opening. All of the drawers include a rear cap to seal a cooking compartment in the cabinet when the drawers are fully open.

Abstract: A device for supplying milk from a storage tank to a dispensing element, having a supply line with an inlet end which is detachably connected to the storage tank, to improve the cleaning of such a device. A cleaning device is provided for the supply line, the cleaning device containing a hot water and/or water vapor outlet having a connection device for the detachable connection of the inlet end of the supply line.

Abstract: A cleaning method of a semiconductor manufacturing apparatus begins by introducing film forming gas include reaction gas not forming a film by itself to reaction chamber to form the film on a semiconductor substrate, decreasing pressure of the reaction chamber, solidifying or liquefying the reaction gas to form particles by using small-particles in the reaction chamber as cores, and exhausting the particles from the reaction chamber. Using this method, foreign small-particles can easily be removed from the apparatus and suppress any possible contamination of semiconductor substrates to be processed.

Abstract: An oral feeding bottle includes a feed container with an open end and surfaces adapted to come into contact with a liquid feed in the container, a teat releasably connected to the open end and adapted to contact both the liquid feed and a person or animal feeding from the bottle, and a cap with two modes of operation, where in the first mode, the teat is connected to the container and the cap is adapted to fit over, enclose the teat, and be releaseably connected to the feed container, and where in the second mode, the cap includes a means for stowing the teat in a non-dispensing position spaced from the container, where the teat and the surfaces that contact the liquid feed are in fluid communication so that the teat and the feed container are sterilized with a fluid sterilizing medium disposed in the container.

Abstract: Disclosed herein is a method of removing a fungus in a washing machine. The method includes determining whether a fungus removal mode is selected, and executing the fungus removal mode if the fungus removal mode is selected.

Abstract: A method of cleaning a wafer after an etching process is provided. A substrate having an etching stop layer, a dielectric layer, a patterned metal hard mask sequentially formed thereon is provided. Using the patterned metal hard mask, an opening is defined in the dielectric layer. The opening exposes a portion of the etching stop layer. A dry etching process is performed in the environment of helium to remove the etching stop layer exposed by the opening. A dry cleaning process is performed on the wafer surface using a mixture of nitrogen and hydrogen as the reactive gases. A wet cleaning process is performed on the wafer surface using a cleaning solution containing a trace amount of hydrofluoric acid.

Abstract: The invention relates to a holder for an active ingredient comprising a fixing portion for mechanical fixing under a toilet bowl rim, and a receiving portion joined to the fixing portion for receiving an active ingredient. One problem of such known holders is that they are troublesome to fix to the toilet bowl and to remove again therefrom. This disadvantage is overcome according to the invention by at least parts of the fixing portion being formed from a biodegradable, preferably water-soluble material.

Abstract: A method and system for cleaning containers being transposed through a container cleaning line, including an open-ended housing, a predetermined container flow path defined by the line of moving containers traversing the enclosure defined by the housing longitudinally, a first set of ionizing air nozzles mounted within the housing for directing ionized compressed air toward the containers in the container flow path, with at least one of the nozzles directing air flow into an open side of each container as it passes the nozzle and a second set of high velocity air nozzles mounted within the housing for directing high velocity compressed air toward the container flow path, the second set of high velocity nozzles being disposed along a direction essentially parallel to the container flow path with at least one of the nozzles flows directing high velocity air flow into the open side of each container as it passes the nozzle. Nozzle guards are provided to prevent contact between the containers and the nozzles.

Abstract: The invention provides probe washing cups and methods. A probe washing cup has a washing well and a waste cup. A drying section is disposed between an open end of the probe washing cup and an inlet plane of the washing well. The drying section has a channel that is aligned with the washing well. The channel has an opening for receiving the probe therethrough.

Abstract: An assembly for cleaning a bore that contains a body and a cleaning material located over the body. At least one resilient cleaning material is located between the body and the cleaning material. When the assembly is inserted into a bore, the resilient material extends outwardly towards to the bore, thus insuring contact of the cleaning material with the bore.

Abstract: A method for cleaning a work string which may have been used to inject drilling muds, cement slurries, cement displacement materials and the like into a well where the work strong may contain drilling mud residues, cement slurry residues, cement slurry displacement materials, pipe thread lubricants, pipe dope and the like, as well as corrosion on the inside of the work string by injecting a dispersion slug into and recovering the dispersion slug from the work string.

Abstract: A method of restoring the electrical efficiency of channel and pressure pour furnaces includes plunging a fluxing material with a specially designed plunging lance. The plunging lance chamber containing the fluxing material is 24 to 32 inches in length, 3 inches in diameter and has a capacity to hold 5 to 7.5 pounds of flux briquettes. The plunging chamber has holes drilled along the length of the body. The fluxing material contains by weight from 8.0 to 28.7% CaCO3 (calcium carbonate or limestone), from 0 to 18.5% MgCO3 (magnesium carbonate), from 3.6 to 18.0% Al2O3 (alumina) from 1.4 to 7.1% SiO2 (silica), in the form of a complex aluminosilicate, and from 19.4 to 46.4% Na2O (sodium oxide), in the form of soda ash (sodium carbonate). The total level of sodium ranges from 23 to 26% and up to 10% sodium fluoride or sodium chloride may be substituted for soda ash.

Abstract: An apparatus for cleaning and decontaminating an air distribution system includes a sources separately containing a first fluid and a second fluid, a pressurizing system for separately pressurizing the first and second fluids, a distribution subsystem for separately conveying the first and second fluids to a plurality of injectors that convert the first and second fluids into a foam-like substance before injecting the foam-like substance into the air distribution system. The apparatus includes a control system for controlling the pressure and flow rate of the first and second fluids, and a system for removing the foam-like substance from the air distribution system after the foam-like substance has cleaned and decontaminated the air distribution system. A method for cleaning and decontaminating an air distribution system is also disclosed.

Abstract: A method of using a film formation apparatus for a semiconductor process includes processing by a cleaning gas a by-product film deposited on an inner surface of a reaction chamber of the film formation apparatus. This step is arranged to supply the cleaning gas into the reaction chamber, and set an interior of the reaction chamber at a first temperature and a first pressure. The by-product film mainly contains a high-dielectric-constant material. The cleaning gas contains chlorine without containing fluorine. The first temperature and the first pressure are set to activate chlorine in the cleaning gas.