Abstract: The invention relates to methods and compositions for removing metal oxide soils from surfaces. The compositions include an anionic surfactant and a pH adjuster at an acidic pH. In one embodiment, the invention relates to a method of removing a metal oxide soil from a surface by (1) applying a use composition to the surface, the use composition having a pH adjuster in an amount sufficient to provide a use pH at or below 7, an anionic surfactant in an amount to remove a portion of the metal oxide soil, and a carrier, (2) removing the metal oxide soil from the surface with the use composition, and (3) rinsing the surface to remove the use composition and the metal oxide soil.

Abstract: A process is proposed for cleaning an apparatus to remove deposits from a process for the recovery of purified N-methylpyrrolidone (NMP) by evaporating NMP from a contaminated NMP stream which is obtained in a process for the extractive separation of acetylene from the reaction mixture of a partial oxidation of hydrocarbons after expulsion of the acetylene as a gas, wherein hot water is passed into the apparatus and is stirred.

Abstract: A toilet bowl cleaning unit disposed to intercept an intermittent flow of water from each flush of the water from a water line to a toilet bowl comprising a mounting device for installation in the flow of water, and a water-soluble compound positioned on the mounting device to intercept a substantial portion of the water as it is flushed from the water line to the toilet bowl, said water-soluble compound thereby being released into the toiled bowl with the water from each flush to inhibit formation of mineral deposits on the surfaces of the toilet bowl and/or drainage pipes.

Abstract: A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing precision components using VOC exempt solvents that is as effective as prior art VOC solvent based systems while subsequently allowing for recovery and reuse of a VOC exempt solvent.

Abstract: A method for producing a ceramic honeycomb structure comprising the steps of machining end surfaces of an unsintered or sintered ceramic honeycomb structure, and ejecting a gas from a slit-like orifice moving relative to an opposing end surface without contact, thereby removing dust and/or cut pieces from end surface portions.

Abstract: A paint gun cleaning apparatus is provided that prevents the collection of overspray on the discharge end of the paint gun. The cleaning apparatus includes a drum that defines an aperture for insertion of at least the discharge end of a paint gun. The apparatus also includes a fin assembly inside of the drum for directing paint and solvent discharged from the paint gun away from the paint gun. A splash cone also helps direct discharge away from the center of the drum, laterally toward the fin assembly. The apparatus also includes a source of suction for drawing material discharged from the paint gun away from the discharge end of the paint gun. By preventing the collection of overspray it is not necessary for an operator to wipe the gun clean.

Abstract: Devices for dispensing toilet treatment tablets into toilet bowls when a button is actuated are disclosed. In one version, the device includes: (i) a toilet cover; (ii) a dispenser mounted to the cover; (iii) a plurality of solid tablets stored in the dispenser so as to be dispensable therefrom, wherein at least one of the tablets includes a toilet treatment chemical; and (iv) an actuator for moving a tablet from a ready position of the dispenser to a release position. In another version, the invention provides a handheld device including a body having a cover and a hollow wall connected to the cover. The cover and the wall define an interior space in the body, and the cover includes a dispensing slot. The device also includes a removable tablet holder suitable for holding a plurality of solid tablets. A tablet retainer of the tablet holder is located within the cover when the tablet holder is installed within the body. The tablet retainer retains a tablet in a ready position for dispensing.

Abstract: A process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber. According to one embodiment the process comprises performing a substrate processing operation on the substrate within the substrate processing chamber and then transferring the substrate out of the substrate processing chamber; flowing a first etchant gas into a remote plasma source, forming reactive species from the etchant gas and transporting the reactive species into the substrate processing chamber to remove a first portion of the unwanted deposition build-up; and thereafter, flowing a second etchant gas into the substrate processing chamber and forming a plasma within the substrate processing chamber from the second gas in order to remove a second portion of the unwanted deposition build-up.

Abstract: An apparatus for cleaning and decontaminating an air distribution system includes a sources separately containing a first fluid and a second fluid, a pressurizing system for separately pressurizing the first and second fluids, a distribution subsystem for separately conveying the first and second fluids to a plurality of injectors that convert the first and second fluids into a foam-like substance before injecting the foam-like substance into the air distribution system. The apparatus includes a control system for controlling the pressure and flow rate of the first and second fluids, and a system for removing the foam-like substance from the air distribution system after the foam-like substance has cleaned and decontaminated the air distribution system. A method for cleaning and decontaminating an air distribution system is also disclosed.

Abstract: A method for controlling a program-controlled water-bearing domestic cleaning appliance, especially a washing machine, which comprises a program control device that controls a water supply and outlet device, a heater and/or a drive device. For the purpose of cleaning, the structural components that come into contact with water during proper operation of the device, the so-called self-cleaning, the program control device controls water supply, discharge, water level, the speed of the driving motor and/or the duration of the drive control within at least one program section and/or the duration of at least one program section in such a manner that all structural components to be cleaned are wetted with water or the cleaning solution. This kind of self-cleaning should especially be carried out when the domestic cleaning appliance is put into operation for the first time. The invention is further characterized in that the program control device automatically recognizes the initial putting into operation.

Abstract: A fluid handling device with an anisotropic wetting surface including a substrate with a multiplicity of asymmetric substantially uniformly shaped asperities thereon. Each asperity has a first asperity rise angle and a second asperity rise angle relative to the substrate. The asperities are structured to present a desired retentive force ratio (f1/f2) greater or less than unity caused by asymmetry between the first asperity rise angle and the second asperity rise angle according to the formula: f3/f2=sin(?3+½??0)/sin(?2+½??0).

Abstract: A method of cleaning a reaction chamber using a substrate having a metal catalyst thereon is disclosed. The method includes preparing a substrate having a catalyst layer to activate a cleaning gas. The substrate is introduced into the reaction chamber. Next, a cleaning gas is introduced into the reaction chamber. Contaminations in the reaction chamber are exhausted. The substrate having a metal catalyst layer is also disclosed.

Abstract: The device according to the invention for cleaning a powder coating booth has a mobile frame, which can be moved along the insides of the booth. The frame includes suction nozzles for sucking off powder residues from the insides of the booth.

Abstract: A method of determining an endpoint of a process by measuring a thickness of a layer, the layer being deposited on the surface by a prior process is disclosed. The method includes providing a sensor that is coplanar with the surface, wherein the sensor is configured to measure the thickness. The method also includes exposing the plasma chamber to a plasma, wherein the thickness is changed by the exposing, and determining the thickness as a function of time. The method further includes ascertaining a steady state condition in the thickness, the steady state condition being characterized by a substantially stable measurement of the thickness, a start of the steady state condition representing the endpoint.

Abstract: A method and system utilizing a mobile cleaning unit for providing cleaning of heat exchanger tube bundles. The mobile cleaning unit utilizes a pressurized seal positioned about top door of the cleaning enclosure to provide a fluid and vapor lock of the cleaning enclosure. An oxygen purging system of the cleaning enclosure, the cleaning fluid reservoir, and the control panels provides additional safety. The mobile cleaning unit can use cleaning fluid produced at the facility site and return the cleaning fluid to the facility site for reprocessing after the heat exchanger tube bundles are cleaned.

Abstract: A composition comprising a polypropylene glycol, a polyethylene glycol ester, an amine, and optionally an alcohol. The composition can be used as a purge solution to clean paint equipment.

Abstract: In a parallel flat plate type plasma CVD apparatus, plasma damage of constituent parts in a reaction chamber due to irregularity of dry cleaning in the reaction chamber is reduced and the cost is lowered. In the parallel flat plate type plasma CVD apparatus in which high frequency voltages of pulse waves having mutually inverted waveforms are applied to an upper electrode and a lower electrode, and the inversion interval of the pulse wave can be arbitrarily changed, the interior of the reaction chamber is dry cleaned.

Abstract: Impurities can be eluted simultaneously from a plurality of local areas of a surface layer of a semiconductor substrate. A supporting unit supports the substrate, and a sample plate is disposed on the surface of the substrate. The sample plate has a plurality of holes that expose the local areas of the surface of the substrate. Eluant is provided onto the local areas of the surface layer of the substrate through the holes in the sample plate. The impurities are thus dissolved by the eluant to produce a sample. A nozzle transfers the sample from the local areas of the surface of the substrate to a plurality of sample cups. Therefore, samples from the surface layer of the substrate may be produced in a short amount of time.

Abstract: Chlorofluorocarbon replacement solvents include a main component (first solvent) and a property-modification component (second solvent). The resulting solvent mixtures meet or exceed the solvency, flammability, and compatibility requirements for CFC's while providing similar or improved environmental and toxicological properties. These solvent mixtures can be used in conjunction with refrigeration or heat pumps, electronics, implantable prosthetic devices, oxygen systems, and optical equipment.

Abstract: An apparatus for cleaning a continuous emissions monitor system that is in fluid communication with a flue stack conducting exhaust gas from a combustion source. The apparatus comprises a housing and a probe mounted in the housing. The probe is tubular and in fluid communication with the flue stack to acquire a sample of gas from the flue stack. The probe tends to have deposits from the exhaust gas accumulate on the inner walls of the probe. A device imparts cleaning energy to the probe for dislodging accumulated deposits from the inner walls of the probe.

Abstract: A washing device for recyclable container comprises a base from which perpendicularly extends a stand. A hose connected to a faucet. The hose connects to a connector. A sub hose connects the connector to a spray tube base from which integrally extends the spray tube. A sliding arm is rotationally connected to the spray tube base. The sliding arm extends from the stand so as to interface between the spray tube base and the stand. The spray tube is terminated at its upper end by a nozzle from which emerges water. A valve actuator located on the spray tube base is actuated by way of a stem extending therefrom. The valve actuator is mechanically connected to a valve.

Abstract: A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing gases which react with the carbon containing films to form volatile carbon containing compounds.

Abstract: After semiconductor wafers are loaded into a reaction vessel, and ruthenium (Ru) film or ruthenium oxide film is formed, the interior of the reaction vessel is efficiently cleaned without contaminating the wafers. The interior of the reaction vessel is heated to a temperature of above 850° C. while the pressure inside the reaction vessel is reduced to, e.g., 133 pa (1 Torr)-13.3 Kpa (100 Torr), and oxygen gas is fed into the reaction vessel at a flow rate of, e.g., above 1.5 Lm, whereby the ruthenium film or the ruthenium oxide film formed inside the reaction vessel is cleaned off. In place of oxygen gas, active oxygen, such as O3, O* and OH*, etc. may be used.

Abstract: A cap is provided for preventing clogging of a spray nozzle on a container. Structurally, the cap includes a hollow, truncated cone-shaped member with first and second ends. At its first end, the cap defines an orifice dimensioned to selectively receive the spray nozzle to create a fluid-tight seal with the container. At its second end, the cap defines a periphery. Further, the cap includes a panel that has a flat surface bounded by a perimeter that is interconnected to the periphery by an intermediate section. As a result, the cone-shaped member, intermediate section and panel form a fluid chamber. Fluid is positioned in the chamber for movement between a first location where the spray nozzle is submerged and a second location where the fluid is held at a distance from the spray nozzle for removal of the cap from the spray nozzle.

Abstract: This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum device and hose are configured to provide constant suction to the ion implanter. A dry ice blaster having a dry ice dispensing hose is configured to supply dry ice. A sealing plate is adapted to attach to an access section of a processing region of the ion implanter. The sealing plate has a first opening configured to receive the contaminant removing hose and the dry ice dispensing hose.

Abstract: A CVD apparatus comprising an optical unit detecting the mass of contaminants adhering to an inner surface of a CVD reactor by irradiating an inner surface of the reactor with light having monochromaticity through an optical window provided on an inner wall of the reactor and receiving its reflected light is provided.

Abstract: A cleaning method for a combustor comprises positioning a spray portion of a nozzle through an igniter plug boss and spraying an acid solution inside the combustion chamber. The acid solution impinges the inner liner and the outer liner, dissolving contaminant deposits inside the effusion holes. The nozzle can have a second spray portion outside the combustion chamber to provide acid solution to the radially outward surface of the outer liner. After cleaning, distilled water is sprayed through the nozzle to remove the acid solution residue from the combustor. The used acid solution and distilled water can be collected, filtered and pumped through the nozzle to provide a recirculating cleaning/rinsing system.

Abstract: A plasma treatment apparatus has a reaction vessel (11) provided with a top electrode (13) and a bottom electrode (14), and the first electrode is supplied with a VHF band high frequency power from a VHF band high frequency power source (32), while the bottom electrode on which a substrate (12) is loaded and is moved by a vertical movement mechanism. The plasma treatment system has a controller (36) which, at the time of a cleaning process after forming a film on the substrate (12), controls a vertical movement mechanism to move the bottom electrode to narrow the gap between the top electrode and bottom electrode and form a narrow space and starts cleaning by a predetermined high density plasma in that narrow space. In the cleaning process, step cleaning is performed. Due to this, the efficiency of utilization of the cleaning gas is increased, the amount of exhaust gas is cut, and the cleaning speed is raised. Further, the amount of the process gas used is cut and the process cost is reduced.

Abstract: The present disclosure provides a method of cleaning a semiconductor substrate after a DRIE etch process, wherein residue from the DRIE process is removed without damaging the substrate. The process may include contacting the micro-fluid ejection head with an aqueous solution of TMAH, stripping a photoresist etch mask from the micro-fluid ejection head, and dissolving a passivating coating from the substrate. Then the substrate may be contacted with an acidic solution. The method may further include rinsing and drying the substrate.

Abstract: Provided are a simple and inexpensive cleaning apparatus and a method for cleaning capable of effectively cleaning the outer wall surface of a pipette. A pipette to be cleaned is positioned in a concave portion of the cleaning apparatus, and a cleaning liquid passed through inside of the pipette strikes an inner circumferential surface of the concave portion and bounces therefrom to splash against the outer wall surface of the pipette, thereby cleaning the outer surface. With above arrangement, without using an ejection apparatus of cleaning water, effect equivalent to that with the ejection apparatus can be attained. Furthermore, both the inner wall surface and the outer wall surface of the pipette can be cleaned by a single operation using the same cleaning water, thereby attaining easy internal cleaning work and short cleaning time.

Abstract: A method and system for passivating a processing chamber is provided, whereby the processing chamber is exposed to one or more cycles of citric acid, or nitric acid. The processing chamber is fabricated, for example, from stainless steel. Each cycle may be performed at a pressure greater than atmospheric pressure, or a temperature greater than 20 degrees centigrade, or both.

Abstract: The present invention relates to a technique for cleaning a thin film forming apparatus. In a typical embodiment, deposits originating from process gases for forming a thin film and deposited on the inner surface of a reaction tube are removed by etching by supplying a cleaning gas into the reaction tube while heating the interior of the reaction tube at a predetermined temperature. The inner surface of the reaction tube roughened by etching is subjected to a planarizing step. The planarizing step is performed by supplying a gas containing hydrogen fluoride into the reaction tube while keeping the interior of the reaction tube 2 at a low temperature, such as a room temperature. The planarizing step is effective in preventing the reduction of deposition rate in a thin film forming process.

Abstract: A cleaning device and a cleaning method for a container capable of continuously performing a cleaning treatment, and a tank. The cleaning device includes a jetting member which jets a fluid in the container; a movement unit which relatively moves the jetting member along an axial direction of the container with respect to the container so that the jetting member is inserted into the container from a mouth part of the container; and a switching unit which switches the jetting member from one function to another function. The switching unit switches a nozzle for a cleaning liquid, a nozzle for blowing and a nozzle for drying in order.

Abstract: This invention provides methods and systems for flushing, washing, and priming microscale devices for reuse. Washing and priming methods include flowing solutions from a manifold to flush wells and microchannels of a microfluidic chip. Systems include manifolds adapted to seal and flow solutions or gasses into chip wells. Devices include microfluidic devices with data storage modules to track the reprocessing status of the microscale devices.

Abstract: Cracks are conventionally difficult to clean which often leads to damage to other regions of the component for cleaning. According to the invention, a plasma cleaning method is used, whereby a pressure and/or a separation of an electrode to the component are varied, in order to achieve a plasma cleaning in the crack.

Abstract: A hole cleaning apparatus includes a handle, mandrel, spool holder, cleaning material, and cutting edge. The handle having a first end and a second end. The handle having a bore extending from the first end to the second end. The mandrel having a first end and a second end mounted to the first end of the handle. The mandrel having a central bore that extends therethrough. The spool holder connected to the second end of the handle. The cleaning material attached to the spool holder. The cutting edge is disposed on the mandrel. The cleaning material extends from the spool holder through the bore of the handle and through the central bore of the mandrel.

Abstract: A coke removal system removes coke deposits from the walls of a high temperature passage in which hydrocarbon fuel is present. The system includes a carbon-steam gasification catalyst and a water source. The carbon-steam gasification catalyst is applied to the walls of the high temperature passage. The water reacts with the coke deposits on the walls of the high temperature passage to remove the coke deposits from the walls of the high temperature passage by carbon-steam gasification in the presence of the carbon-steam gasification catalyst.

Abstract: A method and control system for treating a hafnium-based dielectric processing system in which a system component of the processing system is exposed to a chlorine-containing gas. A residual hafnium by-product remaining in the processing system after a hafnium removal process is reacted with a chlorine-containing etchant derived from the chlorine-containing gas. A chlorinated hafnium product is volatilized for exhaustion from the processing system. The control system can utilize a computer readable medium to introduce a chlorine-containing gas to the processing system, to adjust at least one of a temperature and a pressure in the processing system to produce from the chlorine-containing gas a chlorine-containing etchant for dissolution of a residual hafnium by-product remaining in the processing system after a hafnium silicate, hafnium oxide, or hafnium oxynitride removal process, and to exhaust a chlorinated hafnium product from the processing system.

Abstract: A cooking apparatus and a method of controlling steam cleaning thereof realize optimal cleaning performance by maintaining an internal temperature of a cooking chamber at a temperature suitable for steam condensation at the time of cleaning the inside of the cooking chamber using steam. The cooking apparatus includes a cooking chamber, a steam supplying unit to supply steam into the cooking chamber, a temperature sensing unit to sense an internal temperature of the cooking chamber, and a control unit to compare the sensed internal temperature with a reference temperature and operate the steam supplying unit if the internal temperature of the cooking chamber is less than the reference temperature.

Abstract: A dishwasher and a method of controlling a dishwasher are provided. The method includes heating wash fluid in a washing tub when no dishes are loaded in the washing tub, and sterilizing the washing tub by spraying the heated wash fluid into the washing tub with the use of a wash fluid spray device. Therefore, it is possible to remove wash fluid and impurities remaining in the washing tub and to prevent an offensive odor from being emitted from the washing tub.

Abstract: A method and apparatus that reduces the time required to clean a processing chamber employing a reactive plasma cleaning process. A plasma is formed in an Astron fluorine source generator from a flow of substantially pure inert-source gas. After formation of the plasma, a flow of a fluorine source gas is introduced therein such that the fluorine source flow accelerates at a rate no greater than 1.67 standard cubic centimeters per second2 (scc/s2). In this fashion, the plasma contains a plurality of radicals and dissociated inert-source gas atoms, defining a cleaning mixture. The ratio of inert-source gas to fluorine source is greater than 1:1.

Abstract: A method and apparatus for on-line wash-down of a heat sink media bed in a regenerative heat exchanger of a regenerative fume incinerator is disclosed. When a heat sink media bed requires cleaning, the selected regenerative heat exchanger is cooled while the remaining regenerative heat exchangers are operated in their normal mode of operation. When the selected media bed reaches a temperature which is less than the thermal-shock temperature of the media material, a cleaning fluid is sprayed on the media surfaces through spray-pipes which are installed within the media bed. After the media surfaces are washed down, the selected regenerative heat-exchanger is reverted back to its normal mode of operation. The regenerative heat exchanger can also be automatically burnt-out of deposited gasifiable matter prior to the wash-down. Random or sequential burn-out and wash-down of the regenerative heat-exchangers can be performed.

Abstract: By constructing tank cleaning equipment according to the invention such that it comprises a cleaning jetting part (7, 9) as well as a suction part (4), the equipment can work with the same cleaning medium which is recirculated. This saves supply of fresh cleaning medium, and since used medium is thus not discharged, it is not necessary to establish deposit facilities to avoid pollution. Furthermore, this equipment according to the invention may advantageously be used for keeping so-called drilling mud in a mixed and thus ready-to-use state, even when left to stand for an extended period of time in a tank. The nozzle jets (10) thus keep the mud in the tank in a constantly mixed state, and the mud can therefore be sucked through the suction pipe (20) for pumping in the drill pipe, it being ensured that the mud is homogeneous and has a suitable viscosity.

Abstract: A method for cleaning a tube-shaped chamber after performing at least one deposition process includes equipping a tube-shaped cleaner into a loading chamber, loading the tube-shaped cleaner into the tube-shaped chamber and injecting a cleaning gas, and cleaning the tube-shaped chamber using the tube-shaped cleaner.

Abstract: Device for cleaning a gas turbine engine (2), and in particular an engine of turbofan type. The present invention further relates to a method for cleaning such a engine. The device comprises a plurality of nozzles (31, 33, 35) arranged to atomize cleaning liquid in the air stream in an air inlet (20) of the engine (2) up-stream of a fan (25) of the engine (2). According to the invention a first nozzle (31) is arranged at a position such that the cleaning liquid emanating from the first nozzle (31) impinges the surfaces of the blades (40) substantially on the pressure side (53); a second nozzle (35) is arranged at a position such that the cleaning liquid emanating from the second nozzle (35) impinges the surfaces of the blades (40) substantially on the suction side (54); and a third nozzle (33) is arranged at a position such that the cleaning liquid emanating from the third nozzle (33) passes substantially between the blades (40) and enters an inlet (23) of the core engine (203).

Abstract: Tool for treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like. The invention provides an approach for rapid, efficient rinsing of wetted surface(s), and is particularly advantageous when used to rinse the lower surface of moveable barrier structures such as a barrier plate that overlies a workpiece being treated in such a manner to define a tapering flow channel over the workpiece. Rather than spray rinsing liquid onto the surface in a manner that generates undue splashing, droplet, or mist generation, the liquid is flowingly dispensed, preferably under laminar flow conditions, onto a surface that is in fluid communication with the surface to be rinsed. A smooth, uniform wetting and sheeting action results to accomplish rinsing with a significantly reduced risk of generating particle contamination.

Abstract: A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending throughout entire circumference. When the cap is put on the container body, the elastic member is interposed at a joint portion between the cap and the container body to hermetically seal the container.

Abstract: A working mechanism for a medical manipulator and a cleaning method therefor are provided. A working unit of a medical manipulator is equipped with a hollow connecting shaft, wires of a motive force transmitting member disposed in the connecting shaft, and a distal end working unit disposed on one end of the connecting shaft and which is moved by the wires. A cover covers at least a portion of the distal end working unit. A gap is provided between the cover and the connecting shaft, with oblong holes being disposed laterally on right and left sides of the cover. A cleaning agent is made to flow through the holes and the gap and/or a brush may be inserted through the holes and the gap for cleaning the distal end working unit.

Abstract: A produce washer includes a holder to position a single piece of produce and a nozzle disposed at a horizontal distance adjacent to the holder. When the produce is a cored lettuce head, the cored lettuce head is positioned in the holder with the cored portion facing the nozzle disposed across the horizontal distance. When the cored lettuce head is positioned in the holder, the nozzle directs a stream of cleansing liquid across the horizontal distance into the cored portion.

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).