Abstract: A method for making a single molecule receptor in a nanopore structure includes depositing a material by a physical vapor deposition (PVD) technique onto a selected interior surface of a nanochannel and functionalizing a surface of the material with a chemical compound having at least two functional groups. The material forms a patch having a diameter of about 3 to about 10,000 nanometers (nm). Also disclosed are embodiments of a nanopore structure including a single molecule receptor.

Abstract: A method for making multiple single molecule receptors in a nanopore structure includes depositing a first material and a second material by a physical vapor deposition (PVD) technique onto different selected interior surfaces of a nanochannel and functionalizing a surface of the first material, the second material, or both the first and second materials with a chemical compound having at least two functional groups. The first and second materials can be the same or different and form patches having diameters of about 1 to about 100 nanometers (nm). Also disclosed are embodiments of a nanopore structure including multiple single molecule receptors.

Abstract: An oxide sintered body including indium element (In), gallium element (Ga) and tin element (Sn) in atomic ratios represented by the following formulas (1) to (3): 0.10?In/(In+Ga+Sn)?0.60??(1) 0.10?Ga/(In+Ga+Sn)?0.55??(2) 0.0001<Sn/(In+Ga+Sn)?0.60??(3).

Abstract: A method of making a laser water transfer printing film contains steps of: providing a substrate material; coating a release layer on one side surface of the PET film by ways of a first coating apparatus; semi-solidifying a lacquer by using a heat solidifying apparatus; printing an ink layer on the lacquer by ways of a printing device; implanting a message layer on the ink layer by means of an implanting device; embossing geometric patterns on the message layer by using a rolling device; plating the metal layer on the embossed patterns; coating a PVA solution on the metal layer by ways of a second coating device and drying the PVA solution by means of a drying device; separating the PET film from the PVA film by using a releasing device and then rolling the PET film which has separated from the PVA film.

Abstract: A method of epitaxially growing a final film using a crystalline substrate wherein the final film cannot be grown directly on the substrate surface is disclosed. The method includes forming a transition layer on the upper surface of the substrate. The transition layer has a lattice spacing that varies between its lower and upper surfaces. The lattice spacing at the lower surface matches the lattice spacing of the substrate to within a first lattice mismatch of 7%. The lattice spacing at the upper surface matches the lattice spacing of the final film to within a second lattice mismatch of 7%. The method also includes forming the final film on the upper surface of the transition layer.

Abstract: A a titanium alloy can be applied on a substrate by one of melting, welding, and depositing said titanium alloy on said substrate and solidifying said deposited or molten titanium alloy. Further, 0.01-0.4 weight % Boron can be added to said titanium alloy before or during said melting, welding or depositing said titanium alloy on said substrate.

Abstract: Compounds having the formula LiaEC1M1bM2cOx, wherein “a” ranges from about 0.5 to about 3; b+c ranges from about 0.1 to about 1; c/(b+c) ranges from about 0.1 to about 0.9; and wherein x is about 0.1 to about 50, are disclosed. Methods of making these compounds as well as their use in thin film materials and electrochromic devices are also disclosed.

Abstract: An aspect of the present invention relates to a press-molding glass material, which comprises a core part comprised of optical glass and a silicon oxide film of less than 15 nm in thickness covering at least a portion of the core part, the portion being to be an optically functional surface, as well as has a surface free energy as measured by a three-liquid method of equal to or lower than 75 mJ/m2. A further aspect of the present invention relates to a method of manufacturing a press-molding glass material comprising a core part comprised of optical glass and a silicon oxide film covering at least a portion of the core part to be an optically functional surface.

Abstract: This invention provides a sputtering method which can generate an electric discharge under practical conditions and maintain the pressure in a plasma space uniform, and a sputtering apparatus used for the same. The sputtering method includes a first gas introduction step (step S403) of introducing a process gas from a first gas introduction port formed in a sputtering space defined by a deposition shield plate, a substrate holder, and the target which are disposed in a process chamber, a voltage application step (step S407) of applying a voltage to the target after the first gas introduction step, and a second gas introduction step (step S405) of introducing a process gas from a second gas introduction port formed outside the sputtering space.

Abstract: Provided is a method for producing a high-quality boron nitride film grown by using a borazine oligomer as a precursor through a metal catalyst effect. The method solves the problems, such as control of a gaseous precursor and vapor pressure control, occurring in CVD(Chemical vapor deposition) according to the related art, and a high-quality hexagonal boron nitride film is obtained through a simple process at low cost. In addition, the hexagonal boron nitride film may be coated onto various structures and materials. Further, selective coating is allowed so as to carry out coating in a predetermined area and scale-up is also allowed. Therefore, the method may be useful for coating applications of composite materials and various materials.

Abstract: An anode in which an anode active material layer is arranged on an anode current collector. The anode active material layer includes anode active material particles made of an anode active material including at least one of silicon and tin as an element. An oxide-containing film including an oxide of at least one kind selected from the group consisting of silicon, germanium and tin is formed in a region in contact with an electrolytic solution of the surface of each anode active material particle by a liquid-phase method such as a liquid-phase deposition method. The region in contact with the electrolytic solution of the surface of each anode active material particle is covered with the oxide-containing film, to thereby improve the chemical stability of the anode and the charge-discharge efficiency. The thickness of the oxide-containing film is preferably within a range from 0.1 nm to 500 nm both inclusive.

Abstract: The present invention provides a plasma processing apparatus capable of bringing plasma close to a processing target and separating the plasma from the processing target. The plasma processing apparatus 1 according to the present invention has a chamber internally having a holding space 2a in which a processing target object 5 is held, and a plasma space 2b in which plasma is to be formed, a plasma gun 3 for emitting electrons into the plasma space 2b to form the plasma, and at least one pair of position-adjustable opposed magnets 4 for forming a magnetic flux passing across the chamber 2, between the holding space 2a and the plasma space 2b.

Abstract: The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods, which gives mixed crystal layers which are as free as possible of macroparticles (droplets) and which have a proportion as high as possible of a desired crystalline phase and which are highly crystalline, it is proposed according to the invention that deposition of the mixed crystal layer is effected with simultaneous application of i) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering and ii) arc vapour deposition.

Abstract: A method of making a coated article includes providing a substrate; forming a nickel layer on the substrate by magnetron sputtering; forming a titanium layer on the nickel layer by magnetron sputtering; and applying a thermal oxidative treatment to the nickel and titanium layered substrate to form a catalyst layer and a self-cleaning layer. The self-cleaning layer includes metallic titanium, metallic nickel, nickel oxide and titanium dioxide.

Abstract: A touch panel has an active area and a non-active area disposed at an outer side of the active area defined therein. The touch panel includes a support member and a conductive layer formed on the support member and including an electrode part in the active area to sense touch and a wiring part disposed in the non-active area to be connected to the electrode part. In the non-active area, the wiring part is disposed on the support member and the electrode part is partially disposed on the wiring part.

Abstract: The present invention provides a reactive sputtering method and a reactive sputtering apparatus which suppress a film quality change caused by a temperature variation in continuous substrate processing. An embodiment of the present invention performs reactive sputtering while adjusting a flow rate of reactive gas according to the temperature of a constituent member facing a sputtering space. Specifically, a temperature sensor is provided on a shield and the flow rate is adjusted according to the temperature. Thereby, even when a degassing amount of a film adhering to the shield changes, a partial pressure of reactive gas can be set to a predetermined value. For a resistance change layer constituting a ReRAM, a perovskite material such as PrCaMn03 (PCMO), LaSrMnO3 (LSMO), and GdBaCoxOy (GBCO), a two-element type transition metal oxide material which has a composition shifted from a stoichiometric one, such as nickel oxide (NiO), vanadium oxide (V2O5), and the like are used.

Abstract: A coating method, coated article and coating are provided. The coated article includes a low temperature component, and a graphene coating formed from a graphene derivative applied over the low temperature component. The coating method includes providing a graphene derivative, providing a low temperature component, applying the graphene derivative over the low temperature component, and forming a graphene coating. The graphene coating reduces corrosion and fouling of the low temperature component. The coating includes a graphene derivative, and modified functional groups on the graphene derivative. The modified functional groups increase adherence of the coating on application to a low temperature component.

Abstract: The invention relates to a target which is embodied as a material source for a depositing method from the gas phase, comprising a front side and a rear side, characterized in that a self-adhesive carbon film is applied to the rear side. Said target can be embodied as a material source for a sputtering method and/or for an arc evaporation method. A particular advantage is that the target is used in a coating source with indirect cooling, the self-adhesive carbon film being in contact with the surface of the membrane which is part of a cooling channel.

Abstract: A method for a forming three dimensional circuit is provided. A plastic base is provided. A metal layer is bonded on the plastic base by a metal coating process. The thickness of the metal layer is thickened by an electroplating process. The metal layer is trimmed to form a circuit pattern thereon by a laser engraving process, whereby, the working-hours can be reduced and the cost of material can also be reduced when the three dimensional circuit is manufactured.

Abstract: A thin film encapsulation layer manufacturing apparatus is provided that may include a transfer chamber, a sputtering chamber, a monomer deposition chamber, a chemical vapor deposition (CVD) chamber, and an atomic layer deposition (ALD) chamber. The transfer chamber may be connected to each of the other chambers, and may be configured to align a substrate. Each of the other chambers may be configured to receive from and transfer to the transfer chamber a substrate. The sputtering chamber may be configured to form a first inorganic layer on the substrate by a sputtering process. The monomer deposition chamber may be configured to deposit a first organic layer on the first inorganic layer. The CVD chamber may be configured to form a second inorganic layer on the first organic layer. The ALD chamber may be configured to form a third inorganic layer on the second inorganic layer.

Abstract: The present invention relates to a coating, a substrate, a method for coating a body and a method for producing the body substrate, such as a dental or a bone implant. The coating has a high degree of mechanical stability and comprises elements, such as Sr based compounds, which optimize the tissue response to the implanted body thus stimulating healing, bone or tissue growth in the vicinity of the implant. An implant coated with this coating has the ability of sustained release of strontium in a non-toxic concentration of strontium in the vicinity of the implant.

Abstract: The invention relates to a method for producing carbon electrodes by deposition on a substrate, to produce a fuel cell. The method comprises the steps of alternately and/or simultaneously depositing porous carbon and a catalyst onto the substrate by plasma spaying in a vacuum chamber. The catalyst is used to accelerate at least one of the chemical reactions that takes place in the fuel cell. The thickness of each layer of porous carbon is chosen so that the catalyst deposited on this carbon layer is distributed essentially throughout this layer, thereby by providing a layer of catalyzed carbon. The total thickness of catalyzed carbon in the electrode is less than 2 micrometers, and preferably equal to no more than 1 micrometer.

Abstract: The present invention relates generally to methods for producing metallic products comprising a substrate and a metallic, external coating. In preferred embodiments, the metallic products are jewelry articles.

Abstract: A method of protecting a magnetic information storage medium is described. The method includes fabricating a film over a surface of the magnetic information storage medium. The film includes an amorphous, uniform, homogeneous solid solution of carbon, hydrogen, silicon, and oxygen. A magnetic storage medium with such a protective film is described.

Abstract: A method for preparing scandium-doped hafnium oxide film includes preparing a hafnium target having scandium granules distributed on a peripheral surface thereof; and proceeding a sputtering process to form a scandium-doped hafnium oxide film on a substrate, wherein the scandium doping of the scandium-doped hafnium oxide film is in the range of 3-13%. Such scandium-doped hafnium oxide film is able to be used as an oxide layer in semiconductor element which effectively suppresses the current leakage and reduces the dimension of the semiconductor element.

Abstract: A catalyst-layer-supporting substrate comprising a substrate supporting a catalyst layer; wherein the catalyst layer comprises two or more porous catalyst metal particle layers that are superposed alternately with (i) two or more intersticed layers comprising at least one element selected from the group consisting of Mn, Fe, Co, Ni, Zn, Sn, Al, and Cu; or (ii) two or more fibrous carbon layers having interstices among fibers of the fibrous carbon. A method for forming a catalyst-layer-supporting structure that comprises porous catalyst metal particle by removing a pore-forming metal from a mixture layer containing a pore-forming metal and a catalyst metal.

Abstract: A method for manufacturing a magnetic recording medium is provided. An orientation control layer is deposited on a non-magnetic substrate to control an orientation of a layer located directly thereon, and a perpendicular magnetic layer whose easy axis of magnetization is mainly oriented perpendicular to the non-magnetic substrate is deposited thereon. In depositing the orientation control layer, a first granular structure layer containing Ru or a material mainly made of Ru and a first oxide having a melting point of 1000 degrees C. or lower are deposited by sputtering. In depositing the perpendicular magnetic layer, a second granular structure layer containing magnetic particles and a second oxide having a melting point of 1000 degrees C. or lower are deposited by sputtering, and the magnetic particles are grown so as to form a columnar crystal continuing in a thickness direction. The columnar crystal includes crystal grains constituting the orientation control layer.

Abstract: A method for forming an oxide semiconductor film including the steps of making an ion collide with a target containing a crystalline In—Ga—Zn oxide to separate a sputtered particle including a flat-plate In—Ga—Zn oxide particle, and depositing it over a substrate while keeping crystallinity. The method is performed in a deposition chamber including the target and the substrate. In the case where the pressure in the deposition chamber is p and the distance between the target and the substrate is d, the product of the pressure p and the distance d is greater than or equal to 0.096 Pa·m when the atomic ratio of Zn to In in the target is less than or equal to 1; the product of the pressure p and the distance d is less than 0.096 Pa·m when the atomic ratio of Zn to In in the target is greater than or equal to 1.

Abstract: A process for producing a corrugated electrode for use in an electroactive polymer cartridge is disclosed. A laminated web comprising a support sheet laminated to a dielectric elastomer film is positioned. The support sheet defines areas exposing portions of the dielectric elastomer film. A force is applied to the positioned laminated web to stretch the laminated support sheet-dielectric elastomer film web in a direction that is orthogonal to a plane defined by the web. An electrically conductive material is applied to the laminated support sheet-dielectric elastomer film web while the laminated support sheet-dielectric elastomer film web is in a stretched state. The laminated support sheet-dielectric elastomer film web is relaxed to form the corrugated electrode on the dielectric elastomer film portion of the web.

Abstract: A high-temperature insulation assembly for use in high-temperature electrical machines and a method for forming a high-temperature insulation assembly for insulating conducting material in a high-temperature electrical machine. The assembly includes a polymeric film and at least one ceramic coating disposed on the polymeric film. The polymeric film is disposed over conductive wiring or used as a conductor winding insulator for phase separation and slot liner.

Abstract: To improve the single crystallinity of a stacked film in which a ZrO2 film and a Y2O3 film are stacked or a YSZ film. A crystal film includes a Zr film and a stacked film in which a ZrO2 film and a Y2O3 film formed on the Zr film are stacked, and has a peak half-value width when the stacked film is evaluated by X-ray diffraction being 0.05° to 2.0°.

Abstract: The present invention relates to a method for preparing a hydrogen separation membrane capable of preventing the plating of Pd inside a porous support and a porous shielding layer when a separation membrane is prepared; a hydrogen separation membrane prepared therefrom; and a use thereof. In addition, the present invention relates to a device for preparing a hydrogen separation membrane; and a method for preparing a hydrogen separation membrane using the device, and in particular, relates to a device for preparing a hydrogen separation membrane capable of stably growing a Pd-containing separation membrane for hydrogen gas separation as a plating solution grows from the upper surface of a porous support to a uniform thickness by simply shielding the lower surface of the porous support when a hydrogen separation membrane is prepared using an electroless plating method.

Abstract: This invention relates to a coated article including a low-emissivity (low-E) coating. In certain example embodiments, the low-E coating is provided on a substrate (e.g., glass substrate) and includes at least first and second infrared (IR) reflecting layers (e.g., silver based layers) that are spaced apart by contact layers (e.g., NiCr based layers) and a dielectric layer of or including a material such as silicon nitride. In certain example embodiments, the coated article has a low visible transmission (e.g., no greater than 50%, more preferably no greater than about 40%, and most preferably no greater than about 39%).

Abstract: The present invention provides a low-friction coating layer for vehicle components comprising: a Ti layer on a surface of a base material; a TiN layer on the Ti layer surface; a TiAgN layer on the TiN layer surface; and an Ag layer transferred on the TiAgN layer surface, and a method for producing the same.

Abstract: A method and apparatus for forming a solar cell can include a heater apparatus having one or more heater elements in a deposition processing system, a front cover covering the one or more heater elements from a front side, and a back metal reflector mating with the front cover on a back side and enclosing the one or more heater elements. The method can include disposing a plurality of substrates about a plurality of surfaces of a substrate apparatus that is operatively coupled to sequentially feed a substrate within a vacuum chamber, forming an absorber layer over a surface of each one of the plurality of substrates and heating the surface of each one of the plurality of substrates with the heater apparatus as described above.

Abstract: The present invention provides a monolithic integrated lattice mismatched crystal template and a preparation method thereof by using low-viscosity material, the preparation method for the crystal template includes: providing a first crystal layer with a first lattice constant; growing a buffer layer on the first crystal layer; below the melting point of the buffer layer, growing a second crystal layer and a template layer by sequentially performing the growth process of a second crystal layer and the growth process of a first template layer on the buffer layer, or growing a template layer by directly performing a first template layer growth process on the buffer layer; melting and converting the buffer layer to an amorphous state, performing a second template layer growth process on the template layer grown by the first template layer growth process at the growth temperature above the glass transition temperature of the buffer layer, sequentially growing a template layer until the lattice of the template laye

Abstract: A sputtering device includes: a vacuum chamber; a vacuum pump for evacuating the vacuum chamber; a supply roll for supplying a long film; a storage roll for storing the long film; a film depositing roll that is provided in the vacuum chamber and conveys the long film along a surface thereof; a target facing the film depositing roll; a gas pipe for supplying a gas into the vacuum chamber; a plurality of guide rolls for guiding the long film; a plurality of guide roll shafts provided at each of both ends of the plurality of guide rolls; a plurality of bearings for supporting the guide roll shafts; and a plurality of insulators configured to insulate the guide roll shafts and the bearings from each other, wherein contact surfaces of the guide rolls with the long film are kept at a floating potential.

Abstract: A self-aligned tunable metamaterial is formed as a wire mesh. Self-aligned channel grids are formed in layers in a silicon substrate using deep trench formation and a high-temperature anneal. Vertical wells at the channels may also be etched. This may result in a three-dimensional mesh grid of metal and other material. In another embodiment, metallic beads are deposited at each intersection of the mesh grid, the grid is encased in a rigid medium, and the mesh grid is removed to form an artificial nanocrystal.

Abstract: Disclosed are a method for forming a thermal barrier layer for a metallic component, which method involves forming a ceramic coat in which at least in part aluminum oxide and titanium oxide are disposed, the aluminum oxide and the titanium oxide being introduced by infiltration of aluminum-containing and titanium-containing particles or substances or by physical vapor deposition.

Abstract: The present invention relates to the method for manufacturing high quality graphene by heating carbon-based self-assembly monolayers, comprising the steps of: forming carbon source layers which are convertible into the graphene layer on the substrate; forming a metal catalyst layer on the carbon source layer; converting the carbon source layers into the graphene layer by heating the first part of the substrate using a local heating source, wherein the carbon source layers and the metal catalyst layers are formed; converting the carbon source layers into graphene by moving the local heating source and then heating the second part which is different from the first part; and removing the metal catalyst layer. The present invention also provides a substrate comprising a graphene layer manufactured by the above method and provides applications in semiconductor devices and electronic materials using the substrate.

Abstract: Provided is low emissivity glass including a low emissivity layer containing electrically conductive metal; and a composite metal oxide formed on one or both sides of the low emissivity layer and expressed by a following chemical formula 1: TiCeOx??(1) wherein Ti is titanium element, Ce is cerium element, and Ox is oxide. Since the dielectric layer which serves as protecting low emissivity layer of low emissivity glass and reducing emissivity contains the composite metal oxide expressed by the above chemical formula 1, visible light transmissivity can be greatly increased with excellent low emissivity.

Abstract: The present invention relates generally to methods for producing a coated jewelry article or a coated component of a jewelry article, comprising a jewelry article or a component of a jewelry article, a first metallic coating, and a second metallic coating.

Abstract: In a Ti—Ni alloy thin film, Ti and Ni are mixed and deposited on a base material by putting a Ti target and an Ni target at a predetermined distance from each other in a co-sputtering apparatus and simultaneously sputtering the targets by applying different voltages. A method of fabricating a Ti—Ni alloy thin film using co-sputtering includes a target preparing step that prepares a Ti target, a Ni target and a base material, a target disposing step that puts the Ti target and the Ni target at a predetermined distance from each other in a co-sputtering apparatus, an apparatus setting step that sets work conditions of the co-sputtering apparatus, and a thin film depositing step that forms a Ti—Ni alloy thin film with Ti and Ni mixed on the base material by operating the co-sputtering apparatus.

Abstract: A positive electrode active material for nonaqueous electrolyte secondary batteries includes a coating layer containing at least nickel (Ni) and/or manganese (Mn) on the surface of a complex oxide particle containing lithium (Li) and cobalt (Co), wherein a binding energy value obtained by analysis of a surface state by an ESCA surface analysis on the surface of the coating layer is 642.0 eV or more and not more than 642.5 eV in an Mn2p3 peak, and a peak interval of Co—Mn is 137.6 eV or more and not more than 138.0 eV.

Abstract: An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.

Abstract: The present invention provides an electrode for water-splitting reaction that is capable of increasing conductive path between a photocatalyst layer and a current collecting layer without inhibiting light absorption by photocatalyst, which comprises: a photocatalyst layer 10; a current collecting layer 30; and a contact layer 20 that contains semiconductor or good conductor and is provided between the photocatalyst layer 10 and the current collecting layer 30, wherein the contact layer 20 is provided along the surface shape of the photocatalyst layer 10 at the current collecting layer 30 side of the photocatalyst layer 10.

Abstract: An insertable into a human body article is coated with a coating of electret structure. The coating has an integral surface which blankets an entire surface of the article.

Abstract: Provided is a device capable of suitably forming a film on a glass film. A film forming device (1) includes a heating roll (20) and a film forming unit (30). The heating roll (20) has a surface onto which a glass film (10) is to be fed. The heating roll (20) is configured to heat the glass film (10). The film forming unit (30) is configured to form a film on the glass film (10). The heating roll (20) includes a cylindrical body (21) and a heater (22). The cylindrical body (21) is made of glass or ceramic. The cylindrical body (21) is rotatably provided. The heater (22) is disposed in an interior of the cylindrical body (21). The heater (22) is configured to heat the cylindrical body (21).

Abstract: A method for producing a metal film of a touch panel provided by the present invention has the steps of: preparing a base plate; coating a mask on the surface of the base plate; using a sputtering process to sputter a metal material on the part of the base plate where is not covered by the mask; removing the mask so as to form a metal film and a hollow area; and using a laser engraving process to remove an over coating area that is produced by the metal film or the hollow area so as to produce the metal film.

Abstract: A method for coating a surface of a structural component includes applying at least one ink to the surface of the structural component via an inkjet process. The at least one ink applied is irradiated with UV radiation so as to cure the at least one ink and to form an ink-containing layer. At least one metal layer is applied to the ink-containing layer via a PVD procedure. At least one clear lacquer is applied to the at least one metal layer. The at least one clear lacquer is cured so as to form a clear lacquer layer.