With Magnetic Field Patents (Class 315/111.41)
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Patent number: 7847485Abstract: A method and a device for artificially generating and showing an aurora and for generating and changing a true-to-life curtain-shaped discharge light emission by using a simple device. In a pressure-reduced chamber, two electrodes are arranged in the X direction and a third electrode is arranged in the Z direction in such a manner that the two electrodes oppose the third electrode and they are apart from each other. A coil generates a magnetic line of force in the Z direction.Type: GrantFiled: July 19, 2006Date of Patent: December 7, 2010Assignee: Iida Home Max Co., Ltd.Inventors: Kazuhiko Mori, Shigeyuki Minami, Yuuji Kurose, Ayumu Watanabe, Yasuhiro Ono, Hideyuki Saito
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Patent number: 7838853Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.Type: GrantFiled: December 14, 2006Date of Patent: November 23, 2010Assignee: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev
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Publication number: 20100253224Abstract: A method is provided for operating a processing system having a space therein arranged to receive a gas and an electromagnetic field generating portion operable to generate an electromagnetic field within the space. The method includes providing a gas into the space, and operating the electromagnetic field generating portion with a driving potential to generate an electromagnetic field within the space to transform at least a portion of the gas into plasma. The driving potential as a function of time is based on a first potential function portion and a second potential function portion. The first potential function portion comprises a first continuous periodic portion having a first amplitude and a first frequency. The second potential function portion comprises a second periodic portion having an maximum amplitude portion, and minimum amplitude portion and a duty cycle. The maximum amplitude portion is a higher amplitude than the minimum amplitude portion.Type: ApplicationFiled: November 19, 2009Publication date: October 7, 2010Inventors: Alexei Marakhtanov, Eric Hudson, Rajhinder Dhindsa, Andrew D. Bailey, III
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Patent number: 7808184Abstract: Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply generates a multi-stage voltage pulse that includes a low-power stage with a first peak voltage having a magnitude and a rise time that is sufficient to generate a weakly-ionized plasma from the feed gas. The multi-stage voltage pulse also includes a transient stage with a second peak voltage having a magnitude and a rise time that is sufficient to shift an electron energy distribution in the weakly-ionized plasma to higher energies that increase an ionization rate which results in a rapid increase in electron density and a formation of a strongly-ionized plasma.Type: GrantFiled: August 18, 2006Date of Patent: October 5, 2010Assignee: Zond, Inc.Inventor: Roman Chistyakov
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Patent number: 7808353Abstract: A coil system for a plasmoid thruster includes a bias coil, a drive coil and field coils. The bias and drive coils are interleaved with one another as they are helically wound about a conical region. A first field coil defines a first passage at one end of the conical region, and is connected in series with the bias coil. A second field coil defines a second passage at an opposing end of the conical region, and is connected in series with the bias coil.Type: GrantFiled: August 23, 2006Date of Patent: October 5, 2010Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Richard H. Eskridge, Michael H. Lee, Adam K. Martin, Peter J. Fimognari
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Patent number: 7807986Abstract: An ion implanter and method for adjusting the shape of an ion beam are disclosed. After an ion beam is outputted from an analyzer magnet unit, at least one set of bar magnets is used to adjust the shape of the ion beam when the ion beam passes through a space enclosed by the bar magnets. The set of bar magnets can apply a multi-stage magnetic field on the ion beam. Hence, different portions of the ion beam will have different deformations or alterations, because the multi-stage magnetic field will apply a non-uniform force to change the trajectory of ions. Moreover, each bar magnet of the set is powered by one and only one power source, such that the set of bar magnets essentially only can adjust the magnitude of the multi-stage magnetic field. Particular structures and techniques for achieving the multi-stage magnetic field are not limited.Type: GrantFiled: May 27, 2009Date of Patent: October 5, 2010Assignee: Advanced Ion Beam Technology, Inc.Inventors: Ko-Chuan Jen, York Yang, Zhimin Wan
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Publication number: 20100231130Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.Type: ApplicationFiled: February 25, 2010Publication date: September 16, 2010Applicant: ASML Netherlands B.V.Inventors: Dzmitry LABETSKI, Erik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Tom Van Zutphen
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Publication number: 20100232559Abstract: A neutron generating apparatus includes an ion generating device. The ion generating device includes an ion generating tube to which deuterium gas or tritium gas is supplied, a magnet arranged outside of the ion generating tube for generating a magnetic field in the ion generating tube, a plasma generating antenna arranged outside of the ion generating tube for generating an electric field in the ion generating tube, and an RF power source that supplies high frequency power to the plasma generating antenna. The RF power source supplies the high frequency power to the plasma generating antenna by controlling the pulse thereof so that an unsteady state of plasma is generated repetitively in the ion generating tube.Type: ApplicationFiled: June 7, 2007Publication date: September 16, 2010Applicants: MITSUBISHI HEAVY INDUSTRIES, LTD., NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITYInventors: Masayuki Takeishi, Masanori Shimazaki, Masahito Shima, Tadashi Hasegawa, Tetsuo Iguchi, Tatsuo Shoji, Kazuya Nishimura
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Publication number: 20100213851Abstract: An RF based, gridless improved plasma source and method of operating a plasma source comprising a RF coupler, a first stage with a helicon-like system, a ICH second stage, a ionization chamber, magnetic means which are strengthened on the downstream end of the first stage, to control the plasma flux, ionization fraction, spatial distribution.Type: ApplicationFiled: February 19, 2008Publication date: August 26, 2010Applicant: AD ASTRA ROCKET COMPANYInventor: Franklin Chang Diaz
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Patent number: 7759874Abstract: The present invention relates to an apparatus for carrying out a plasma chemical vapor deposition process by which one or more layers of doped or undoped silica can be deposited on the interior of an elongated glass substrate tube. The present invention further relates to a method for manufacturing an optical fiber using such an apparatus.Type: GrantFiled: June 14, 2007Date of Patent: July 20, 2010Assignee: Draka Comteq B.V.Inventors: Johannes Antoon Hartsuiker, Marco Korsten, Mattheus Jacobus Nicolaas Van Stralen, Rob Hubertus Matheus Deckers
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Patent number: 7755062Abstract: An ion source is to extract a ribbon-shaped ion beam longer in the Y direction in the Z direction and provided with a plasma generating chamber, a plasma electrode which is disposed near the end of the plasma generating chamber in the Z direction and has an ion extracting port extending in the Y direction, a plurality of cathodes for emitting electrons into the plasma generating chamber to generate a plasma and arranged in a plurality of stages along the Y direction, and a magnetic coil which generates magnetic fields along the Z direction in a domain containing the plurality of cathodes inside the plasma generating chamber.Type: GrantFiled: February 24, 2009Date of Patent: July 13, 2010Assignee: Nissin Ion Equipment Co., Ltd.Inventors: Takatoshi Yamashita, Tadashi Ikejiri
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Patent number: 7750575Abstract: The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.Type: GrantFiled: October 3, 2008Date of Patent: July 6, 2010Assignee: Zond, Inc.Inventor: Roman Chistyakov
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Patent number: 7728251Abstract: In a plasma processing apparatus, electromagnetic waves are radiated from slots of waveguides into a processing chamber via dielectric windows that are supported on beams, thereby generating a plasma. A substrate, which is an object of processing, is processed by the generated plasma. Dielectric plates are attached to those surfaces of the beams, which are opposed to the processing chamber. The thickness of each dielectric plate is set at ½ or more of the intra-dielectric wavelength of the electromagnetic waves. Using the plasma processing apparatus, a large-area processing can uniformly be performed.Type: GrantFiled: October 27, 2005Date of Patent: June 1, 2010Assignee: Sharp Kabushiki KaishaInventors: Tetsuya Ide, Atsushi Sasaki, Kazufumi Azuma, Yukihiko Nakata
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Patent number: 7719199Abstract: A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, plasma ions are magnetically confined in the FRC while plasma electrons are electrostatically confined in a deep energy well, created by tuning an externally applied magnetic field. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by the nuclear force, thus forming fusion products that emerge in the form of an annular beam. Energy is removed from the fusion product ions as they spiral past electrodes of an inverse cyclotron converter. Advantageously, the fusion fuel plasmas that can be used with the present confinement and energy conversion system include advanced (aneutronic) fuels.Type: GrantFiled: March 17, 2008Date of Patent: May 18, 2010Assignees: The Regents of the University of California, University of Florida Research FoundationInventors: Hendrik J. Monkhorst, Norman Rostoker
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Patent number: 7718978Abstract: An ion source is provided that can generate an ion beam in which the width is wide, the beam current is large, and the uniformity of the beam current distribution in the width direction is high, and that can prolong the lifetime of a cathode. The ion source 2a has: a plasma generating chamber 6 having an ion extraction port 8 extending in the X direction; a magnet 14 which generates a magnetic field 16 extending along the X direction, in the plasma generating chamber 6; indirectly-heated cathodes 20 which are placed respectively on the both sides of the plasma generating chamber 6 in the X direction, and which are used for generating a plasma i0 in the chamber 6, and increasing or decreasing the density of the whole of the plasma 10; and plural filament cathodes 32 which are juxtaposed in the X direction in the plasma generating chamber 6, and which are used for generating the plasma i0 in the chamber 6, and controlling the density distribution of the plasma 10.Type: GrantFiled: May 17, 2007Date of Patent: May 18, 2010Assignee: Nissin Ion Equipment Co., Ltd.Inventor: Takatoshi Yamashita
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Patent number: 7714240Abstract: A microfabricated vacuum switch is disclosed which includes a substrate upon which an anode, cathode and trigger electrode are located. A cover is sealed over the substrate under vacuum to complete the vacuum switch. In some embodiments of the present invention, a metal cover can be used in place of the trigger electrode on the substrate. Materials used for the vacuum switch are compatible with high vacuum, relatively high temperature processing. These materials include molybdenum, niobium, copper, tungsten, aluminum and alloys thereof for the anode and cathode. Carbon in the form of graphitic carbon, a diamond-like material, or carbon nanotubes can be used in the trigger electrode. Channels can be optionally formed in the substrate to mitigate against surface breakdown.Type: GrantFiled: September 21, 2005Date of Patent: May 11, 2010Assignee: Sandia CorporationInventors: Alexander W. Roesler, Joshua M. Schare, Kyle Bunch
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Publication number: 20100084980Abstract: Apparatus and method for improving the plasma uniformity in a plasma based system are described. The apparatus may include a plurality of electrical conductors, to which one or more types of electrical potentials may be applied. The conductors may be arranged in an array and may preferably be positioned near the plasma. By applying the bias voltages to the various electrically conductors, the plasma can be manipulated. For example, the conductors may extract or confine the electrons in the plasma, thereby locally adjusting the plasma density near the conductors. In the process, uniformity of the plasma density or ion concentration in the plasma may be improved. In a further embodiment, a magnetic field is included in the same direction as the electric field created by the bias voltage so as to better confine the charged particles.Type: ApplicationFiled: October 2, 2008Publication date: April 8, 2010Inventor: Bon-Woong Koo
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Publication number: 20100028238Abstract: The present invention provides novel plasma sources useful in the thin film coating arts and methods of using the same. More specifically, the present invention provides novel linear and two dimensional plasma sources that produce linear and two dimensional plasmas, respectively, that are useful for plasma-enhanced chemical vapor deposition. The present invention also provides methods of making thin film coatings and methods of increasing the coating efficiencies of such methods.Type: ApplicationFiled: August 4, 2009Publication date: February 4, 2010Applicant: AGC Flat Glass North America, Inc.Inventor: Peter MASCHWITZ
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Patent number: 7645999Abstract: An apparatus is provided for producing a plasma for a work surface, for example to deposit material thereon. The apparatus comprises an enclosure which contains an ionizable gas, a plurality of plasma excitation devices each of which is arranged to enable microwaves to travel from a first end thereof to a second end and radiate therefrom into the gas, and means for generating a magnetic field in the gas. A source of microwaves feeds microwaves to the first ends of the excitation devices. In use, regions exist within the said gas where the direction of the electric vector of the microwaves is non-parallel to the lines of the magnetic field, and the magnetic field has value B, and the microwaves have a frequency f such as to substantially satisfy the relationship: B=?mf D e where m and e are the mass and charge respectively of an electron.Type: GrantFiled: August 21, 2006Date of Patent: January 12, 2010Assignee: Dow Corning CorporationInventors: Pierre Descamps, Patrick Leempoel
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Patent number: 7638727Abstract: Methods and apparatus for plasma-assisted heat treatments are provided. The method can include initiating a heat treating plasma within a cavity (14) by subjecting a gas to electromagnetic radiation in the presence of a plasma catalyst (70), heating the object by exposing the object to the plasma, and maintaining exposure of the object to the plasma for a sufficient period to alter at least one material property of the object.Type: GrantFiled: May 7, 2003Date of Patent: December 29, 2009Assignee: BTU International Inc.Inventors: Satyendra Kumar, Devendra Kumar, Michael L. Dougherty
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Patent number: 7634042Abstract: A pulsed power system has an inductive energy storage circuit (42) including a current source (43) and a plasma opening switch (44). The plasma opening switch has a transmission line (51, 52) coupling the current source to a load (41). The plasma opening switch changes from a closed state to an open state when a plasma discharge (45) in the plasma opening switch is driven by magnetic force from a first region along the transmission line to a second region towards the load. Electrical conductors (47, 48) are arranged for providing a stabilizing magnetic field configuration in the first region to magnetically latch the plasma discharge in the first region during charging of the inductive energy storage circuit, and current flowing along the transmission line from the current source to the load tends to disrupt the stabilizing magnetic field configuration and unlatch the plasma discharge from the first region and drive the plasma discharge toward the second region.Type: GrantFiled: March 23, 2005Date of Patent: December 15, 2009Inventor: Richard Auchterlonie
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Patent number: 7633231Abstract: A device for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The device includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.Type: GrantFiled: February 27, 2008Date of Patent: December 15, 2009Assignee: Cold Plasma Medical Technologies, Inc.Inventor: Gregory A. Watson
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Patent number: 7626835Abstract: A plasma lighting system comprising a storage unit for storing duty ratios of first and second switching signals according to each material within a bulb by an experiment, a controlling unit for detecting an optimal duty ratio from the storage unit and outputting the first and second switching signals with the same phase corresponding to the detected duty ratio, and a converting unit for converting a direct current voltage into an alternating current voltage consisting of a positive square wave and a negative square wave according to the first and second switching signals, and a method for controlling the same.Type: GrantFiled: March 30, 2006Date of Patent: December 1, 2009Assignee: LG Electronics Inc.Inventors: Joon-Sik Choi, Yun-Chul Jung
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Patent number: 7622721Abstract: A focused ion source based on a Hall thruster with closed loop electron drift and a narrow acceleration zone is disclosed. The ion source of the invention has an ion focusing system consisting of two parts. The first part is a ballistic focusing system in which the aperture through which the beam exits the discharge channel is tilted. The second is a magnetic focusing system which focuses the ion beam exiting the discharge channel by canceling a divergent magnetic field present at the aperture through which the beam exits the discharge channel. The ion source of the invention also has an in-line hollow cathode capable of forming a self-sustaining discharge. The invention further reduces substrate contamination, while increasing the processing rate. Further the configuration disclosed allows the ion source to operate at lower operational gas pressures.Type: GrantFiled: February 9, 2007Date of Patent: November 24, 2009Inventors: Michael Gutkin, Alexander Bizyukov, Vladimir Sleptsov, Ivan Bizyukov, Konstantin Sereda
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Patent number: 7619224Abstract: A high-brightness, space-charge-dominated circular charged-particle beam system includes a flat circular emitter that emits charge particles to form a space-charge-dominated circular charged-particle beam. The space-charge-dominated circular charged-particle beam is emitted from the flat circular emitter with a uniform density and having a current emission being space-charge-limited, obeying the Child-Langmuir law. A diode includes at least one electrode at the flat circular emitter and at least one additional electrode that accelerates the charged particles. A beam tunnel is coupled electrically to at least one of the additional electrodes. An applied axisymmetric magnetic field focuses the space-charge-dominated circular charged-particle beam. A depressed collector collects the space-charge-dominated circular charged-particle beam.Type: GrantFiled: November 15, 2007Date of Patent: November 17, 2009Assignee: Massachusetts Institute of TechnologyInventors: Chiping Chen, Thomas M. Bemis, Ronak J. Bhatt, Jing Zhou
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Patent number: 7611603Abstract: There is provided a plasma processing apparatus which processes a substrate by generating plasma in a process vessel by supply of radio frequency power from a radio frequency power source to at least one of a pair of vertically opposed electrodes disposed in the process vessel, the apparatus including an impedance varying circuit which is connected to at least one of the pair of electrodes and in which an impedance varying part varying impedance on the electrode side of the plasma generated in the process vessel and a resistor are connected in series.Type: GrantFiled: March 27, 2007Date of Patent: November 3, 2009Assignee: Tokyo Electron LimitedInventor: Yohei Yamazawa
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Patent number: 7613271Abstract: A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatically in a deep energy well, created by tuning an externally applied magnetic field. The simultaneous electrostatic confinement of electrons and magnetic confinement of ions avoids anomalous transport and facilitates classical containment of both electrons and ions. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by nuclear force, thus releasing fusion energy. Moreover, the fusion fuel plasmas that can be used with the present confinement system and method are not limited to neutronic fuels only, but also advantageously include advanced fuels.Type: GrantFiled: February 16, 2007Date of Patent: November 3, 2009Assignee: The Regents of the University of CaliforniaInventors: Norman Rostoker, Michl Binderbauer, Eusebio Garate, Vitaly Bystritskii
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Patent number: 7604716Abstract: Methods and apparatus for generating a strongly-ionized plasma are described. An apparatus for generating a strongly-ionized plasma according to the present invention includes an anode and a cathode that is positioned adjacent to the anode to form a gap there between. An ionization source generates a weakly-ionized plasma proximate to the cathode. A power supply produces an electric field in the gap between the anode and the cathode. The electric field generates excited atoms in the weakly-ionized plasma and generates secondary electrons from the cathode. The secondary electrons ionize the excited atoms, thereby creating the strongly-ionized plasma.Type: GrantFiled: July 22, 2004Date of Patent: October 20, 2009Assignee: Zond, Inc.Inventor: Roman Chistyakov
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Patent number: 7602127Abstract: Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.Type: GrantFiled: April 18, 2005Date of Patent: October 13, 2009Assignee: MKS Instruments, Inc.Inventor: David J. Coumou
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Patent number: 7602111Abstract: A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a channel comprising an inner wall, an outer wall spaced apart from the inner wall by a distance for encircling the inner wall, and an end wall connected to an end of the inner wall and the outer wall to form an outlet port at the other ends of the walls; a gas supply portion to supply a gas to an inside of the channel; and a plasma generating and accelerating portion to supply ionization energy to the gas to generate a plasma beam and to accelerate the generated plasma beam toward the outlet port, wherein a coating layer comprising a first layer composed of a carbon nano tube is formed on at least one of the inner wall, the outer wall, and the end wall of the channel.Type: GrantFiled: April 19, 2006Date of Patent: October 13, 2009Assignee: Samsung Electronics Co., Ltd.Inventor: Won-tae Lee
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Patent number: 7598500Abstract: An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.Type: GrantFiled: September 19, 2006Date of Patent: October 6, 2009Assignee: Guardian Industries Corp.Inventors: Nestor P. Murphy, David E. Rock, Hugh A. Walton, Maximo Frati
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Patent number: 7589474Abstract: A closed drift ion source is disclosed. The ion source has an open end 1 and a central axis 150 around which are arranged outer magnetic pole piece 3, inner magnetic pole piece 5, anode 2, shield 6 and back magnetic shunt 17. In one embodiment the anode 2 and inner magnetic pole piece 5 are annular. Permanent magnets 7 are located behind the shield 6 and in contact with outer magnetic pole piece 3 and the back magnetic shunt 17. As a result the magnetic field lines pass through the magnetic pole pieces and a mirror magnetic field is set up in the discharge region between them. The inner magnetic pole piece 5 is hollow which facilitates production of the mirror magnetic field.Type: GrantFiled: December 6, 2006Date of Patent: September 15, 2009Assignee: City University of Hong KongInventors: Paul K. Chu, Deli Tang, Shihao Pu, Honghui Tong, Qingchuan Chen
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Patent number: 7579780Abstract: A power supply apparatus for controlling an ion accelerator includes a controller configured to adjust magnitude of ion acceleration in the ion accelerator. The controller controls an anode voltage applied to an anode electrode of the ion accelerator, a gas flow rate of gas flowing through a gas flow rate regulator of the ion accelerator, and magnetic flux density at an ion exit of the ion accelerator to satisfy a formula given as follows: 500 × 10 9 < ? · V a · Q d · S · B 2 where S is a sectional area of the ion exit [m2]; d is an ion accelerating region length [m]; ? is a magnetic flux bias ratio; Va is anode voltage [V]; Q is gas flow rate [sccm]; and B is magnetic flux density at the ion exit [T].Type: GrantFiled: October 2, 2007Date of Patent: August 25, 2009Assignee: Mitsubishi Electric CorporationInventors: Taichiro Tamida, Takafumi Nakagawa, Ikuro Suga, Hiroyuki Osuga, Toshiyuki Ozaki
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Patent number: 7571732Abstract: A method of maintaining a remote plasma unit for cleaning a semiconductor-processing apparatus includes: (i) detecting if the semiconductor-processing apparatus is in an idle state; (ii) if the idle state is detected, igniting the remote plasma unit for cleaning the semiconductor-processing apparatus after a lapse of a given time period; (iii) detecting if the remote plasma unit is ignited in step (ii); and (iv) if the remote plasma unit is not ignited in step (ii), retrying ignition of the remote plasma unit.Type: GrantFiled: March 28, 2006Date of Patent: August 11, 2009Assignee: ASM Japan K.K.Inventors: Masahiro Takizawa, Takashi Wada, Satoru Noguchi
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Patent number: 7569995Abstract: An apparatus and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatically in a deep energy well, created by tuning an externally applied magnetic field. The simultaneous electrostatic confinement of electrons and magnetic confinement of ions avoids anomalous transport and facilitates classical containment of both electrons and ions. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions ions are fused together by nuclear force, thus releasing fusion energy. Moreover, the fusion fuel plasmas that can be used with the present confinement system and method are not limited to neutronic fuels only, but also advantageously include advanced fuels.Type: GrantFiled: August 1, 2006Date of Patent: August 4, 2009Assignee: The Regents of the University of CaliforniaInventors: Norman Rostoker, Michl Binderbauer
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Patent number: 7569837Abstract: It is a technical challenge to provide a small-sized ion source excellent in operability.Type: GrantFiled: July 20, 2007Date of Patent: August 4, 2009Assignee: Kyoto Institute of TechnologyInventors: Nishino Shigehiro, Ono Ryoichi
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Patent number: 7566883Abstract: One or more thermal transfer sheets are easily removable and replaceable in an ion source. The ion source has a removable anode assembly, including the thermal transfer sheets, that is separable and from a base assembly to allow for ease of servicing consumable components of the anode assembly. The thermal transfer sheets may be interposed between the consumable components within the anode assembly. The thermal transfer sheets may be thermally conductive and either electrically insulating or conductive.Type: GrantFiled: January 12, 2007Date of Patent: July 28, 2009Assignee: Veeco Instruments, Inc.Inventors: David M. Burtner, Scott A. Townsend, Daniel E. Siegfried
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Patent number: 7527713Abstract: A quadruple electromagnetic coil array coaxially arranged in a rectangular array about a chamber axis outside the sidewalls of a plasma sputter reactor, preferably in back of an RF coil within the chamber. The coil currents can be separately controlled to produce different magnetic field distributions, for example, between a sputter deposition mode in which the sputter target is powered to sputter target material onto a wafer and a sputter etch mode in which the RF coil supports the gas sputtering the wafer. The coil array may include a tubular magnetic core, particularly useful for suppressing stray fields. A water cooling coil may be wrapped around the coil array to cool all the coils. The electromagnets can be powered in different relative polarities in a multi-step process.Type: GrantFiled: September 23, 2004Date of Patent: May 5, 2009Assignee: Applied Materials, Inc.Inventors: Tza-Jing Gung, Mark A. Perrin, Andrew Gillard
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Publication number: 20090091817Abstract: A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.Type: ApplicationFiled: October 8, 2007Publication date: April 9, 2009Inventors: Dean Jennings, Bruce E. Adams, Timothy N. Thomas, Stephen Moffatt
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Patent number: 7498587Abstract: An apparatus for generating plasma includes a cathode having an evaporable surface configured to emit a material comprising plasma and macroparticles; oppositely directed output apertures configured to direct the plasma; a filter configured to transmit at least some of the plasma to the output apertures while preventing transmission of at least some of the macroparticles, the filter comprising at least one deflection electrode disposed generally parallel to and facing at least a portion of the evaporable surface; a first element for generating a first magnetic field component having a first polarity between the cathode and the at least one deflection electrode; and a second element for generating a second magnetic field component having a second polarity at the evaporable surface of the cathode that is opposite that of the first polarity such that a low-field region is created between the evaporable surface and the at least one deflection electrode.Type: GrantFiled: May 1, 2006Date of Patent: March 3, 2009Assignee: Vapor Technologies, Inc.Inventor: Richard P. Welty
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Patent number: 7486758Abstract: A novel arrangement that combines in a single compact embodiment a plasma flow switch source of ultrahigh speed plasma and an electromagnetically-imploded cylindrical shell. The shell, known as a liner, forms the wall of a cavity that receives and stagnates the plasma flow. The plasma and the liner are connected electrically in series so that a single multi-megampere current serves both elements and operates from the same power source and switch. The operation is timed so that the plasma is injected into the cavity once the liner has attained sufficient implosion speed. The liner then continues to implode, reducing the cavity volume and compressing the plasma further to very high temperatures and densities, thereby creating a compact, intense pulsed neutron source generated by thermonuclear reactions in the compressed plasma. Such a neutron source has application for neutralizing bio/chemical warfare agents, radiography, and material processing.Type: GrantFiled: October 30, 2006Date of Patent: February 3, 2009Assignee: The United States of America as represented by the Secretary of the Air ForceInventor: Peter J. Turchi
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Patent number: 7477718Abstract: A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatically in a deep energy well, created by tuning an externally applied magnetic field. The simultaneous electrostatic confinement of electrons and magnetic confinement of ions avoids anomalous transport and facilitates classical containment of both electrons and ions. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by nuclear force, thus releasing fusion energy. Moreover, the fusion fuel plasmas that can be used with the present confinement system and method are not limited to neutronic fuels only, but also advantageously include advanced fuels.Type: GrantFiled: March 7, 2005Date of Patent: January 13, 2009Assignee: The Regents of the University of CaliforniaInventors: Norman Rostoker, Michl Binderbauer, Eusebio Garate, Vitaly Bystritskii
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Patent number: 7476869Abstract: A gas distributor is easily removable and replaceable in an ion source. The ion source has a removable anode assembly, including the gas distributor, that is separable and from a base assembly to allow for ease of servicing consumable components of the anode assembly. The gas distributor may be mounted to a thermal control plate in the anode assembly with several set screws. The gas distributor may be disk-shaped with counterbores in a surface to recess the heads of the set screws. Alternately, the gas distributor may be clamped or held in place by other structures or components of the ion source.Type: GrantFiled: January 12, 2007Date of Patent: January 13, 2009Assignee: Veeco Instruments, Inc.Inventors: David M. Burtner, Scott A. Townsend, Daniel E. Siegfried
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Patent number: 7459858Abstract: A Hall thruster with a shared magnetic structure including a plurality of plasma accelerators each including an anode and a discharge zone for providing plasma discharge. An electrical circuit having one or more cathodes connected to the plurality of plasma accelerators emits electrons that are attracted to the anode in each of the plasma accelerators. A shared magnetic circuit structure establishes a transverse magnetic field in each of the plurality of plasma accelerators that creates an impedance to the flow of electrons toward the anode in each of the plurality of plasma accelerators and enables ionization of a gas moving through one or more of the plurality of plasma accelerators. The impedance localizes an axial electric field in the plurality of plasma accelerators for accelerating ionized gas through the one or more of the plurality of plasma accelerators to create thrust.Type: GrantFiled: December 13, 2005Date of Patent: December 2, 2008Assignee: Busek Company, Inc.Inventors: Vladimir J. Hruby, Bruce Pote, Rachel A. Tedrake, Lawrence T. Byrne, James J. Szabo, Jr., Juraj Kolencik
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Patent number: 7459654Abstract: A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, plasma ions are magnetically confined in the FRC while plasma electrons are electrostatically confined in a deep energy well, created by tuning an externally applied magnetic field. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by the nuclear force, thus forming fusion products that emerge in the form of an annular beam. Energy is removed from the fusion product ions as they spiral past electrodes of an inverse cyclotron converter. Advantageously, the fusion fuel plasmas that can be used with the present confinement and energy conversion system include advanced (aneutronic) fuels.Type: GrantFiled: November 1, 2004Date of Patent: December 2, 2008Assignees: The Regents of the University of California, University of Florida Research FoundationInventors: Hendrik J. Monkhorst, Norman Rostoker
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Patent number: 7453074Abstract: An ion implanter includes an ion source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. An ion source includes a ionization chamber and an ionization chamber electrode defining an ionization chamber aperture, wherein the ionization chamber electrode includes a raised portion for generating substantially uniform electric fields in the region adjacent the ionization chamber electrode.Type: GrantFiled: December 6, 2005Date of Patent: November 18, 2008Assignee: Axcelis Technologies, Inc.Inventors: Edward C. Eisner, William DiVergilio
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Patent number: 7446479Abstract: The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.Type: GrantFiled: April 7, 2004Date of Patent: November 4, 2008Assignee: Zond, Inc.Inventor: Roman Chistyakov
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Patent number: 7439678Abstract: A system and method for containing plasma and forming a Field Reversed Configuration (FRC) magnetic topology are described in which plasma ions are contained magnetically in stable, non-adiabatic orbits in the FRC. Further, the electrons are contained electrostatically in a deep energy well, created by tuning an externally applied magnetic field. The simultaneous electrostatic confinement of electrons and magnetic confinement of ions avoids anomalous transport and facilitates classical containment of both electrons and ions. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by nuclear force, thus releasing fusion energy. Moreover, the fusion fuel plasmas that can be used with the present confinement system and method are not limited to neutronic fuels only, but also advantageously include advanced fuels.Type: GrantFiled: August 2, 2006Date of Patent: October 21, 2008Assignee: The Regents of the University of CaliforniaInventors: Norman Rostoker, Michl Binderbauer, Artan Qerushi, Hooshang Tahsiri
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Patent number: 7439521Abstract: An ion source has a removable anode assembly that is separable and from a base assembly to allow for ease of servicing the consumable components of the anode assembly. Such consumables may include a gas distributor, a thermal control plate, an anode, and one or more thermal transfer sheets interposed between other components. A pole piece and a cathode may also be part of the anode assembly. The anode assembly may be attached to the base assembly via the pole piece.Type: GrantFiled: January 12, 2007Date of Patent: October 21, 2008Assignee: Veeco Instruments, Inc.Inventors: David M. Burtner, Scott A. Townsend, Daniel E. Siegfried
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Publication number: 20080251502Abstract: A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, plasma ions are magnetically confined in the FRC while plasma electrons are electrostatically confined in a deep energy well, created by tuning an externally applied magnetic field. In this configuration, ions and electrons may have adequate density and temperature so that upon collisions they are fused together by the nuclear force, thus forming fusion products that emerge in the form of an annular beam. Energy is removed from the fusion product ions as they spiral past electrodes of an inverse cyclotron converter. Advantageously, the fusion fuel plasmas that can be used with the present confinement and energy conversion system include advanced (aneutronic) fuels.Type: ApplicationFiled: November 1, 2004Publication date: October 16, 2008Inventors: Hendrik J. Monkhorst, Norman Rostoker