Abstract: A method for implementing a self-aligned metal silicide gate is achieved by confining a metal within a recess overlying a channel and annealing to cause metal and its overlying silicon to interact to form the self-aligned metal silicide gate. A gate dielectric layer formed of oxynitride or a nitride/oxide stack is formed on the bottom and sidewalls of the recess prior to depositing the silicon. The metal is removed except for the portion of the metal in the recess. A planarization step is performed to remove the remaining unreacted silicon by chemical mechanical polishing until no silicon is detected.

Abstract: A data address prediction structure for a superscalar microprocessor is provided. The data address prediction structure predicts a data address that a group of instructions is going to access while that group of instructions is being fetched from the instruction cache. The data bytes associated with the predicted address are placed in a relatively small, fast buffer. The decode stages of instruction processing pipelines in the microprocessor access the buffer with addresses generated from the instructions, and if the associated data bytes are found in the buffer they are conveyed to the reservation station associated with the requesting decode stage. Therefore, the implicit memory read associated with an instruction is performed prior to the instruction arriving in a functional unit. The functional unit is occupied by the instruction for a fewer number of clock cycles, since it need not perform the implicit memory operation.

Abstract: A system for regulating an exposure condition determining process is provided. The system includes one or more light sources, each light source directing light to one or more gratings exposed on one or more portions of a wafer. Light reflected from the gratings is collected by a measuring system, which processes the collected light. Light passing through the gratings may similarly be collected by the measuring system, which processes the collected light. The collected light is analyzed to determine whether exposure conditions should be adapted prior to exposing a pattern on the wafer. The measuring system provides grating signature data to a processor that determines the acceptability of the exposure condition by comparing determined signatures to desired signatures. The system also includes an exposing system that can be controlled to change exposure conditions. The processor selectively controls the exposing system, via the exposer driving system, to adapt such exposure conditions.

Abstract: A method of forming narrow trenches in a layer of photoresist is disclosed. The method includes providing a photoresist layer and patterning the photoresist layer to form a plurality of apertures having sidewalls. The method can also include silylating the sidewalls of the apertures in the photoresist layer and reflowing the photoresist layer. The process can be utilized to form contacts having widths which are less than one lithographic feature wide.

Abstract: A method and system for providing an alignment mark for a thin layer in a semiconductor device is disclosed. The semiconductor device includes at least one alternative part having a first thickness greater than a second thickness of the thin layer. The method and system include providing the thin layer and providing the alignment mark for the thin layer in the at least one alternative part. The alignment mark has a depth that is greater than the second thickness of the thin layer. In one aspect, the method and system include providing a mask for the thin layer. The mask includes an alignment mark portion that covers the at least one alternative part and that is for providing the alignment mark. In this aspect, the method and system also include removing a portion of the at least one alternative part to provide the alignment mark in the at least one alternative part.

Abstract: A system and method detecting the presence of polysilicon stringers on a memory array using a polysilicon stringer monitor. The polysilicon stringer monitor includes a continuous type-2 layer of polysilicon forming a first row and a second row across the active region and covering the active region in-between the first and second rows. The polysilicon stringer monitor further includes a continuous type-1 layer of polysilicon extending under the first row, wherein the type-1 layer also covers the active area in-between the first and second rows as well as covers the active area under the second row.

Abstract: An indication is provided to a first integrated circuit that a wake-up event has occurred on an input terminal of a second integrated circuit where the first and second integrated circuit are coupled by a bus. The bus is initially in a reduced power consumption state. One of the signal lines of the bus is changed from a first voltage level to a second voltage level in response to a wake-up event recognized by the second integrated circuit. The bus is changed from the reduced power consumption state to a normal power consumption state in response to the at least one signal line being at the second voltage level.

Abstract: A method includes providing at least one wafer having a process layer formed thereon. A surface of the process layer is polished using a first polishing process that is comprised of a slurry and a first polishing pad. The slurry is removed from the surface of the process layer. The surface of the process layer is planarized using a substantially slurryless second polishing process that is comprised of a second polishing pad that is more abrasive than the first polishing pad. A system includes a polishing tool and a process controller. The polishing tool is adapted to receive at least one wafer having a process layer formed thereon. The polishing tool is a adapted to polish a surface of the process layer using a first polishing process that is comprised of a slurry and a first polishing pad and remove the slurry from the surface of the process layer.

Abstract: Conventional CMOS devices suffer from imbalance because the mobility of holes in the PMOS transistor is less than the mobility of electrons in the NMOS transistor. The use of strained silicon in the channels of CMOS devices further exacerbates the difference in electron and hole mobility, as strained silicon provides a greater increase in electron mobility than hole mobility. However, hole mobility is increased in the SiGe layer underlying the strained silicon layer. Therefore, a more evenly-balanced, high-speed CMOS device is formed by including strained silicon in the NMOS transistor and not in the PMOS transistor of a CMOS device.

Abstract: The invention provides a method of selecting an anti reflective layer thickness for patterning a thin film silicon gate layer over a high K dielectric layer. The method comprises selecting a trial anti reflective layer thickness. A first coherent illumination intensity reflected from an interface between the photoresist layer and the anti reflective layer is calculated at the lithography wavelength. A second coherent illumination intensity reflected from an interface between the anti reflective layer and the polysilicon layer is calculated at the lithography wavelength. And, a third coherent illumination intensity reflected from an interface between the polysilicon layer and the high K dielectric layer is calculated at the lithography wavelength. A total coherent illumination intensity that comprises the sum of the first coherent illumination intensity, the second coherent illumination intensity, and the third coherent illumination intensity is calculated and compared to a predetermined threshold.

Abstract: A semiconductor device is fabricated by providing a substrate, and providing a dielectric layer on the substrate. A polysilicon body is formed on the dielectric layer, and a metal layer is provided on the polysilicon body. A silicidation process is undertaken to silicidize substantially the entire polysilicon body to form a gate on the dielectric. In an alternative process, a cap layer is provided on the polysilicon body, which cap layer is removed prior to the silicidation process. The polysilicon body is doped with a chosen specie prior to the silicidation process, which dopant, during the silicidation process, is driven toward the dielectric layer to form a gate portion having a high concentration thereof adjacent the dielectric, the type and concentration of this specie being instrumental in determining the work function of the formed gate.

Abstract: Defect analysis of an integrated circuit die having an internal heat source is enhanced using a method and system that use the internal heat source to heat the die. According to an example embodiment of the present invention, a semiconductor die having a liquid crystal layer is analyzed by detecting a liquid crystal phase change caused by electrical operation of the die. A first circuit region is electrically operated and used as the primary heat source to generate sufficient heat at a second circuit region to effect a separately viewable phase change in an area of the liquid crystal layer corresponding to the second circuit region. The internal heat source is adapted to cause the liquid crystal phase change without necessarily heating the die with an external heat source. A detector is adapted and used to detect the liquid crystal phase change in the area corresponding to the second circuit region.

Abstract: An integrated circuit test system and method therefor is provided having a semiconductor substrate with an electrical ground and a source of electrical potential. A dielectric layer with first and second openings is formed on the semiconductor substrate. First and second barrier layers are deposited on the dielectric layer to line the openings. A first conductor core is deposited over the first barrier layer to fill the first opening and is connected to a source of electrical potential. A second conductor core is deposited over the second barrier layer to fill the second opening and is connected to the electrical ground. A current measuring device is provided to measure leakage current flow between the first and second conductor cores.

Abstract: A computer system includes a processor and a sequential access memory having a boot program stored therein. A boot loader includes a state machine which, in response to initialization of the computer system, controls the sequential access memory to read the boot program and then controls the processor to jump to the boot program in the sequential access memory. The first memory page of the boot program causes further boot code to be transferred to a Random Access Memory (RAM). The processor then jumps to the code in the RAM, which causes the remainder of the boot code to be transferred from the sequential access memory to the RAM and executed.

Abstract: The electromigration resistance of capped Cu or Cu alloy interconnects is significantly improved by pumping out the deposition chamber after treating the exposed planarized surface of the Cu or Cu alloy with an ammonia-containing plasma, introducing NH3 and N2 into the deposition chamber, and then ramping up the introduction of SiH4 prior to initiating deposition of a silicon nitride capping layer. Embodiments include ramping up the introduction of SiH4 in two stages prior to initiating plasma enhanced chemical vapor deposition of the silicon nitride capping layer.

Abstract: A control sequencer circuit issues a sequence of commands to logic devices synchronized to a response by a slave device to a command by a master device. In one instance, the control sequencer circuit is statically adjusted to the timing semantics of the acknowledgment signal of the slave device. The control sequencer circuit includes an event detector, a static sliding window, and a sequencer stage. The event detector receives an acknowledgment signal and a requester ID from a slave device and determines if it is the proper recipient. The static sliding window synchronizes the command sequence to the response by the slave device and adjusts for the timing semantics of the acknowledgment signal of the slave device. The control sequencer stage successively outputs active signals at each clock cycle, thereby generating the command sequence.

Abstract: The disclosure relates to a system for and a method of forming a local interconnect in an integrated circuit using microcontact printing. An exemplary method of the disclosure can include applying an active agent to a stamp, stamping the stamp on a portion of an integrated circuit wafer to form an aperture in a layer of material on the integrated circuit wafer, and providing a conductive material in the aperture formed by the stamp. The stamp preferably has a wedge-shaped extrusion with a length corresponding to a length of an interconnect to be formed in the portion of the integrated circuit wafer. The conductive material in the aperture defines the interconnect. In one example, the interconnect can be as narrow as 20 to 50 nanometers (nm).

Abstract: A composite layer comprising a non-homogenous layer is etched by continuously varying a process parameter, such as the amount of reactive agent in an etchant mixture. Embodiments include etching a silicon oxide film having a varying concentration of carbon through the film with an etchant mixture containing a fluorinated organic, oxygen and an inert gas and continuously increasing and/or decreasing the amount of oxygen in the etchant mixture during etching through the silicon oxide film.

Abstract: A test circuit includes a wafer, an insulative layer formed on the wafer, and a plurality of test structures formed in the insulative layer. Each of the test structures comprises a first comb having a first plurality of fingers and a second comb having a second plurality of fingers. The first and second pluralities of fingers are interleaved to define a finger spacing between the first and second pluralities of fingers. The finger spacing in a first one of the test structures being different than the finger spacing in a second one of the test structures. A method for characterizing damage in a semiconductor device includes providing a wafer having an insulative layer and a plurality of test structures formed in the insulative layer. The test structures have different geometries. An electrical characteristic of first and second test structures of the plurality of test structures is determined. The electrical characteristics of the first and second test structures is compared.

Abstract: A reduction in wafer processing cycle time is achieved by conducting wafer verification and slot randomization of a set of wafers as the wafers are moved through a singular processing location. In an example embodiment, a method of processing a set of wafers in a wafer processing system includes providing each of the wafers with a scribe code thereon. Each of the wafers is presented to a first processing location with the processing location having at least one processing chamber. The scribe code on each wafer is then read as the wafer is being placed into the processing chamber. Each wafer is processed and the set of wafers is slot randomized as they are removed from the first processing location and placed into a wafer cassette. An important advantage of the present invention is the reduced cycle times and reduced capital investment that this method and system bring to wafer processing.