Abstract: A memory formation method includes: providing a substrate; forming a first mask layer on the substrate, in the first mask layer there being formed a plurality of parallel-arranged strip-shaped patterns positioned above the array area, and an end of each of the strip-shaped patterns being connected to the first mask layer on the peripheral area of the substrate; forming a second mask layer on the first mask layer, in the second mask layer there being formed a plurality of first patterns; and etching layer by layer by using the second mask layer and the first mask layer as masks to transfer the strip-shaped patterns and the first patterns into the substrate to form the discrete active areas arranged in an array.

Abstract: A method and device for power supply mapping detection, and medium include the following operations. A voltage value of a power supply signal is obtained according to the power supply signal currently received by a function module; it is detected whether the voltage value of the power supply signal matches a standard voltage value corresponding to the function module; and responsive to the voltage value of the power supply signal not matching the standard voltage value corresponding to the function module, it is determined that a connection error occurs in a power supply connection of the function module.

Abstract: A signal width repair circuit and method, and an electronic device are provided. The signal width repair circuit includes: a delay unit, configured to receive an input signal, and delay the input signal for a preset duration to obtain a delayed signal, the input signal being a low-level signal; a signal reconstruction unit, configured to receive the input signal and the delayed signal, and repair the input signal and the delayed signal to obtain a repaired signal; and a signal selection unit, configured to receive the input signal and the repaired signal and select one of the input signal and the repaired signal for output, to obtain a target signal that has a width satisfying a preset width, the preset duration being equal to or greater than a duration with the preset width.

Abstract: A manufacturing method for memory includes: providing a substrate, and forming a first isolation layer and discrete bit lines on the substrate; removing part of the first isolation layer by a thickness to form discrete first trenches; forming word lines filling the first trenches, wherein the word lines each has a first side wall and a second side wall opposite to each other; forming discrete through holes each being between adjacent word lines; forming a first dielectric layer on surface of exposed first side wall, and forming a second dielectric layer on surface of exposed second side wall; and forming an active layer filling the through holes.

Abstract: A method for refreshing row hammer includes the following operations. A row hammer refresh instruction for a target word line is determined. According to the row hammer refresh instruction, a preset row hammer refresh signal is set to a valid state. The valid state of the preset row hammer refresh signal indicates that the row hammer refresh instruction is performed in a first refresh period. In response to detecting that the row hammer refresh instruction is not completed within the first refresh period, the valid state of the preset row hammer refresh signal will be continued to a next refresh period of the first refresh period.

Abstract: A semiconductor structure and a manufacturing method thereof are provided. The manufacturing method of the semiconductor structure includes: providing a substrate; forming on an upper surface of the substrate first patterns each including a first main body and a first flank wall covering a sidewall of the first main body; forming a filling layer which covers the first flank wall and fills a gap between adjacent first patterns; and etching a top of each of the first patterns to obtain second main bodies, second flank walls and protrusions located on upper surfaces of the second flank walls, the second flank wall covering a sidewall of the second main body, and a top of the protrusion being at least higher than a top of the second main body.

Abstract: The present disclosure relates to the technical field of semiconductors, and provides a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a substrate, an NMOS transistor, and a PMOS transistor. The NMOS transistor includes a first dielectric layer, a first work function layer, and a first conductive layer that are stacked in sequence. The PMOS transistor includes a second dielectric layer, a second work function layer, and a second conductive layer that are stacked in sequence.

Abstract: A control amplifying circuit includes a power supply output circuit, an isolation control circuit and an amplifying circuit. The power supply output circuit is configured to receive a power supply switching signal, and select one preset voltage value from at least two preset voltage values according to the power supply switching signal to output as a preset power supply signal. The isolation control circuit is configured to receive a control command signal and the preset power supply signal, and generate an isolation control signal according to the control command signal. The amplifying circuit is configured to receive the isolation control signal and a signal to be processed, and amplify the signal to be processed based on the isolation control signal to obtain a target amplified signal.

Abstract: A method for manufacturing a semiconductor structure includes: providing a base; forming multiple discrete first mask layers on the base; forming multiple sidewall layers, in which each sidewall layer is configured to encircle one of the first mask layers, and each sidewall layer is connected to closest sidewall layers, the side walls, away from the first mask layers, of multiple connected sidewall layers define initial first vias and each of the initial first vias is provided with chamfers; removing the first mask layers, and each sidewall layer defines a second via; after removing the first mask layers, forming repair layers which are located on the side walls, away from the second vias, of the sidewall layers and fill the chamfers of the initial first vias to form first vias; and etching the base along the first vias and the second vias to form capacitor holes on the base.

Abstract: The present disclosure provides a sense amplifier, a memory, and a method for controlling a sense amplifier, relating to the technical field of semiconductor memories. The sense amplifier comprises: an amplification module; and an offset voltage storage unit electrically connected to the amplification module; wherein, in an offset cancellation stage of the sense amplifier, the sense amplifier is configured to comprise a current mirror structure to store an offset voltage of the amplification module in an offset voltage storage unit. The present disclosure can realize the offset cancellation of the sense amplifier.

Abstract: Provided are a differential signal skew calibration circuit and a semiconductor memory. The differential signal skew calibration circuit may acquire a phase relationship of a differential signals through a phase detection circuit. A phase adjustment control circuit may generate a phase calibration control instruction according to the phase relationship of the differential signals to control a phase calibration circuit to calibrate a phase skew of the input differential signals.

Abstract: A memory system includes: a plurality of memory chips, wherein each of the memory chips has a parameter used to characterize a process corner of the memory chip; and a controller, wherein the controller is configured to: obtain the parameter of each of the memory chips, and adjust, based on the parameter, a delay of a read command sent to the memory chip corresponding to the parameter.

Abstract: The present application relates to a fabrication method for a double-sided capacitor. The fabrication method for the double-sided capacitor includes the following steps: providing a substrate; forming a stack structure on the substrate; forming a capacitor hole in a direction perpendicular to the substrate to penetrate the stack structure, wherein the stack structure includes sacrificial layers and supporting layers alternately stacked; forming an auxiliary layer to cover the sidewall of the capacitor hole; forming a first electrode layer to cover the surface of the auxiliary layer; removing a part of the supporting layer on the top of the stack structure; removing the sacrificial layers and the auxiliary layer simultaneously along the opening; and forming a dielectric layer covering the surface of the first electrode layer and a second electrode layer covering the surface of the dielectric layer, wherein the gap is at least filled with the dielectric layer.

Abstract: The present disclosure relates to a memory structure and a forming method thereof. The present disclosure can improve the integration density of the memory structure. The memory structure includes: a plurality of vertical transistors, where the vertical transistors include silicon pillars; a plurality of the silicon pillars are arranged in m rows and n columns; the rows extend in a first direction and the columns extend in a second direction; m bit lines extending in the first direction and electrically connected to drains of all the vertical transistors in the same row, where the drains are located below the silicon pillars; and n word lines extending in the second direction, located in the middle of the silicon pillars, and serving as gates of all the vertical transistors in the same column, where the first direction and the second direction form a non-right angle.

Abstract: A semiconductor device includes: a doped well region of a first conductive type; M semiconductor components, the M semiconductor components being provided in the doped well region of the first conductive type and being arranged in the doped well region of the first conductive type in a first direction, M being a positive integer, each semiconductor component including a first doped region of a second conductive type and a doped region of a first conductive type, and the doped region of the first conductive type surrounding the first doped region of the second conductive type; and second doped regions of a second conductive type, the second doped regions of the second conductive type being provided on at least one side of the M semiconductor components in the first direction.

Abstract: Embodiments of the present disclosure relate to the field of semiconductor technology, and provide an anti-fuse memory and a control method thereof. The anti-fuse memory is configured to generate a programming pulse signal based on a row strobe signal, a word line of the anti-fuse memory array is configured to receive the row strobe signal, and the anti-fuse memory array is programmed in response to the programming pulse signal. The embodiments of the present disclosure are at least advantageous to improving accuracy of reading data from the anti-fuse memory array and improving yield of the anti-fuse memory.

Abstract: A fabrication method of a semiconductor device comprises the steps of: providing a substrate, which is divided into several chip areas; forming a protective layer on the substrate, the protective layer covers the scribe lines and the chip areas; exposing and developing the protective layer to form a plurality of grooves in the protective layer over the chip areas, and the depth of the grooves is smaller than the initial thickness of the protective layer.

Abstract: A method for forming a semiconductor structure includes: providing a substrate, a sacrificial layer and active layer on sacrificial layer being formed on the substrate; etching the active layer and sacrificial layer up to a surface of the substrate to form a plurality of active lines arranged in parallel and extending along first direction; filling an opening located between two adjacent ones of active lines to form a first isolating layer; etching an end of active lines to form an opening hole; removing sacrificial layer along opening hole, to form a gap between a bottom of the active lines and substrate; filling a conductive material in the gap to form a bit line extending along first direction; patterning the active lines to form a plurality of separate active pillars arrayed along first direction and second direction; and forming semiconductor pillars on top surfaces of respective ones of the active pillars.

Abstract: A semiconductor structure, a preparation method of the same, and a semiconductor device are provided. The semiconductor structure includes a substrate, including an active area. A first electrode layer is arranged on the substrate and electrically connected to the active area. The first electrode layer extends in a direction perpendicular to the substrate. A dielectric layer is arranged on a surface of the first electrode layer. A second electrode layer is arranged on a surface of the dielectric layer. Each of the surface of the first electrode layer and the surface of the dielectric layer are provided with an uneven structure.

Abstract: A refresh control method includes: generating a first random number; and preforming, in response to execution times of a regular refresh operation reaching the first random number after execution of a previous row hammer refresh operation, a new row hammer refresh operation.