Abstract: A semiconductor device includes: first transmission wirings each transmitting a small-amplitude signal between one of a plurality of first drivers and one of a plurality of receivers; a second transmission wiring transmitting a reference signal connected to each of the plurality of receivers; and a second driver outputting the reference signal with an impedance higher than an impedance with which each of the first drivers outputs the small-amplitude signal. The second transmission wiring is arranged between first and second power supply wirings corresponding to first and second potentials of the small-amplitude signal. The first and second potentials are supplied to each of the first drivers. The plurality of first transmission wirings are arranged close to each other, without being sandwiched between the first and second power supply wirings.

Abstract: A wiring board of the present invention comprises a plurality of device formation areas each for mounting a semiconductor chip thereon, and two or more slits formed in an area which comes into contact with a molding die when the wiring board is placed in a cavity of the molding die for forming a sealant to collectively cover the plurality of device formation areas.

Abstract: A method of layout of pattern includes the following processes. A graphic data of a first wiring in a first area of a semiconductor wafer is extracted. The first area is a semiconductor chip forming area. The first area is surrounded by a scribed area of the semiconductor wafer. The first area includes a second area. The second area is bounded with the scribed area. The second area has a second distance from a boundary between the semiconductor chip forming area and the scribed area to an boundary between the first area and the second area. A first dummy pattern in the first area is laid out. The first dummy pattern has at least a first distance from the first wiring. A second dummy pattern in the second area is laid out. The second dummy pattern has at least the first distance from the first wiring. The second dummy pattern has at least a third distance from the first dummy pattern.

Abstract: A semiconductor device may include, but is not limited to: a semiconductor substrate; a bit line; and a contact portion. The semiconductor substrate has a first groove having at least first and second side surfaces facing each other. The bit line is positioned in the first groove. The bit line is insulated from the semiconductor substrate. The contact portion is positioned in the first groove. The contact portion is electrically connected to the bit line. The contact portion contacts the first side surface of the first groove. The contact portion is insulated from the second side surface of the first groove.

Abstract: A stacked semiconductor device is constructed by stacking in two levels: a lower semiconductor device having a wiring board, at least one semiconductor chip mounted on a first surface of the wiring board and having electrodes electrically connected to wiring by way of a connection means, an encapsulant composed of insulating plastic that covers the semiconductor chip and the connection means, a plurality of electrodes formed overlying the wiring of a second surface of the wiring board, and a plurality of linking interconnects each having a portion connected to the wiring of the first surface of the wiring board and another portion exposed on the surface of the encapsulant; and an upper semiconductor device in which each electrode overlies and is electrically connected to the exposed portions of each of the linking interconnects of the lower semiconductor device.

Abstract: A semiconductor device is disclosed, which comprises First and second inputs ports, first and second output nodes, and first and second transistors. The first transistor includes first and second diffusion regions defining a first channel region and a first gate electrode and connected to the first input port, the first diffusion region being connected to the first output node, the second diffusion region being disposed between the first diffusion region and the first input port and supplied with a first operating potential. The second transistor includes third and fourth diffusion regions defining a second channel region and a second gate electrode and connected to the second input port, the third diffusion region being supplied with the first operating potential, the fourth diffusion region being disposed between the third diffusion region and the second input port and connected to the second output node.

Abstract: A method of manufacturing a semiconductor device comprises: forming a processing target; forming a first supporter on the processing target; forming a first mask so as to contact one side surface of the first mask with a side surface of the first supporter; patterning the processing target using, as masks, the first mask and the first supporter; forming a second supporter so as to be contacted with a side surface of the processing target exposed in first processing step and the other side surface of the first mask; removing the first supporter; and patterning the processing target using, as masks, the first mask and the second supporter.

Abstract: A semiconductor device includes a delay circuit supplied with a first clock signal and a first phase determination signal and producing a second clock signal, the delay circuit controlling the second clock signal such that a delay in phase of the second clock signal to the first clock signal is increased when the first phase determination signal takes a first logic level and decreased when the first phase determination signal takes a second logic level, and a phase determining circuit supplied with the first clock signal and a third clock signal, which is produced in response to the second clock signal, and producing a second phase determination signal in response to a difference in phase between the first clock signal and the third clock signal.

Abstract: A method of forming a semiconductor device includes the following processes. A first pillar and a second pillar are formed on a semiconductor substrate. A semiconductor film is formed which includes first and second portions. The first portion is disposed over a side surface of the first pillar. The second portion is disposed over a side surface of the second pillar. The first and second portions are different from each other in at least one of impurity conductivity type and impurity concentration. A part of the semiconductor film is removed by etching back. The first and second portions are etched at first and second etching rates that are different from each other.

Abstract: A memory buffer mounted on a memory module includes a pre-launch function of advancing outputs of address/command signal and a post-launch function of delaying outputs of control signal. A time step increment for pre/post-launch time adjustment is set to be equal to or finer than tCK/32 where tCK is one clock cycle.

Abstract: A semiconductor device may include, but is not limited to: a semiconductor substrate having an element formation region and a dicing region; an element layer over the element formation region and the dicing region; and a multi-layered wiring structure over the dicing region. The multi-layered wiring structure extends upwardly from the element layer. The multi-layered wiring structure has a groove penetrating the multi-layered wiring structure.

Abstract: A semiconductor device includes a first circuit block connected between first and second power lines, a logic circuit that receives an output signal of the first circuit block that is connected between the first power line and a fourth power line or a third power line and the second power line, and a second circuit block that receives an output signal of the logic circuit that is connected between the third and fourth power lines. In an active state, a first potential is supplied and in a standby state, a second potential lower than the first potential is supplied between the first and second power lines. In any of the active state and the standby state, the first potential is supplied between the third and fourth power lines. With this configuration, speeding-up of a critical path can be realized while maintaining a subthreshold current low.

Abstract: A method of removing non-noble metal oxides from material (e.g., semiconductor material) used to make a microelectronic device includes providing the material comprising traces of the conducting non-noble metal oxides; applying a chemical mixture (or chemical solution) to the material; removing the traces of the non-noble metal oxides from the material; and removing the chemical mixture from the material. The non-noble metal oxides comprise MoOx, wherein x is a positive number between 0 and 3. The chemical solution comprises any one of HNO3-based chemicals, H2SO4-based chemicals, HCl-based chemicals, or NH4OH-based chemicals.

Abstract: A method of manufacturing a device includes: forming a fifth insulating film on a semiconductor substrate having a peripheral circuit region and a memory cell region in which a contact pad is formed; forming a second sacrifice film in the memory cell region in which the fifth insulating film is formed; forming, after the forming of the second sacrifice, a second insulating film in the peripheral circuit region on the semiconductor substrate to have a sidewall coming into contact with the second sacrifice film; forming a third insulating film to cover an upper surface of the second sacrifice film and an upper surface of the second insulating film; forming a hole penetrating through the third insulating film, the second sacrifice film and the fifth insulating film in the memory cell region; forming a lower electrode in the hole; and removing all of the second sacrifice film.

Abstract: To include a memory cell array that stores therein data in a reversible manner, an antifuse circuit that stores therein data in a nonvolatile manner, a sense amplifier array that temporarily holds data that is read from the memory cell array of data to be written in the memory cell array, and a control circuit that performs a control for writing the data held in the sense amplifier array in the antifuse circuit. According to the present invention, it is not required to provide any dedicated latch circuit for each antifuse element. Therefore, a writing process of writing data in the antifuse circuit can be performed at high speed without causing an increase of the chip dimension due to a dedicated latch circuit.

Abstract: A word driver drives a word line with a first power supply voltage and with a second power supply voltage which has a potential lower than the first power potential, respectively in a first time period and in a second time period following the first time period for activating the word line.

Abstract: A method for processing dielectric materials and electrodes to decrease leakage current is disclosed. The method includes a post dielectric anneal treatment in an oxidizing atmosphere to reduce the concentration of oxygen vacancies in the dielectric material. The method further includes a post metallization anneal treatment in an oxidizing atmosphere to reduce the concentration of interface states at the electrode/dielectric interface and to further reduce the concentration of oxygen vacancies in the dielectric material.

Abstract: A metal oxide bilayer second electrode for a MIM DRAM capacitor is formed wherein the layer of the electrode that is in contact with the dielectric layer (i.e. bottom layer) has a desired composition and crystal structure. An example is crystalline MoO2 if the dielectric layer is TiO2 in the rutile phase. The other component of the bilayer (i.e. top layer) is a sub-oxide of the same material as the bottom layer. The top layer serves to protect the bottom layer from oxidation during subsequent PMA or other DRAM fabrication steps by reacting with any oxygen species before they can reach the bottom layer of the bilayer second electrode.

Abstract: A semiconductor device is disclosed, which includes first and second power supply pads supplied with first and second power voltages, respectively, a first protection circuit coupled between the first and second power supply pads, and an internal circuit including a first power line and a plurality of transistors electrically coupled to the first power line. The first power line includes first and second portions, and the first portion is electrically connected to the first power supply pad. The device further includes a second protection circuit coupled between the second portion of the first power line and the second power supply pad.

Abstract: A system that includes a first semiconductor chip, a second semiconductor chip, and a controller chip. The first semiconductor chip includes a first terminal, a second terminal, a first circuit electrically coupled to the second terminal, a second circuit electrically coupled to the first terminal and the first circuit, and a third circuit electrically coupled to the second circuit. The second semiconductor chip includes a third terminal, a fourth terminal, a fourth circuit electrically coupled to the fourth terminal, a fifth circuit electrically coupled to the third terminal and the fourth circuit, and a sixth circuit electrically coupled to the fifth circuit.