Abstract: A semiconductor device has memory cell portions and compensation capacitance portions on a single substrate. The memory cell portion and the compensation capacitance portion have mutually different planar surface areas. The memory cell portion and the compensation capacitance portion include capacitance plate electrodes of the same structure. The capacitance plate electrode has a laminated structure including a boron-doped silicon germanium film and a metal film.

Abstract: A controller, includes a plurality of external terminals configured to supply a command and an address to a semiconductor memory device, communicate a data with the semiconductor memory device, and communicate a strobe signal related to the data, at least one external terminal among the plurality of external terminals being configured to be capable of supplying an information specifying a length of a preamble of the strobe signal before the semiconductor memory device communicates the data.

Abstract: A semiconductor device of the present invention includes: transistor Tr1 arranged on a semiconductor substrate; transistor Tr2 arranged such that a carrier drift direction thereof viewed on the semiconductor substrate is identical to a carrier drift direction of transistor Tr1; diffusion layer 51c connecting diffusion layers 51a and 51b on carrier supply sides of transistors Tr1 and Tr2; and contact plug 61 that is connected to a surface of diffusion layers 51a and 51b on the carrier supply sides of transistors Tr1 and Tr2 or that is connected to a surface of diffusion layer 51c connecting the diffusion layers to each other, and that supplies diffusion layers 51a and 51b with electricity.

Abstract: A semiconductor memory device includes data input/output terminals (DQ0 to DQ31), a memory cell array 122, and a data latch circuit 111 for temporarily latching data captured from the data input/output terminals and writing the data in the memory cell array with a delay in a normal write operation. The device also includes a test mode in which the data latch circuit latches data read to the data input/output terminals in a read operation and writes previously latched data in the memory cell array without newly latching data from the data input/output terminals in a write operation.

Abstract: A device includes a first region including a plurality of first memory elements and a plurality of first vertical transistors, the first vertical transistors comprising a plurality of first selective transistors and a first switching transistor, each of the first selective transistors including an upper electrode coupled to a corresponding one of the first memory elements and a lower electrode, the first switching transistor including an upper electrode and a lower electrode coupled in common to the lower electrodes of the first selective transistors through a first signal line, a second region arranged to make a first line with the first region in a first direction and including a plurality of second memory elements and a plurality of second vertical transistors, the second vertical transistors comprising a plurality of second selective transistors and a second switching transistor, and a third region sandwiched between the first and the second regions.

Abstract: A semiconductor device includes a plurality of MOS transistors and wiring connected to a source electrode or a drain electrode of the plurality of MOS transistors and, the wiring being provided in the same layer as the source electrode and the drain electrode in a substrate, or in a position deeper than a surface of the substrate.

Abstract: FLASH memory device contains at least one memory stack. The stack of transistors includes a first (or source) selector transistor, a second (or drain) selector transistor, and a plurality memory cell transistors connected in series therebetween. During an erase operation, each of the first and second selector transistors has a bias applied that releases the select transistors from an electrically floating state together with biasing each of the memory cell transistors.

Abstract: To provide a counter circuit capable of accurately counting a high-frequency signal in which hazard or the like is easily generated. There are provided: a frequency dividing circuit that generates first and second frequency dividing clocks, which differ in phase to each other, based on a clock signal; a first counter that counts the first frequency dividing clock; a second counter that synchronizes with the second frequency dividing clock to fetch a count value of the first counter; and a selection circuit that exclusively selects count values of the first and second counters. According to the present invention, a relation of the count values between the first and second counters is kept always constant, and thus, even when hazard occurs, the count values are only made to jump and the count values do not fluctuate.

Abstract: For example, a semiconductor device includes a first latency counter, which selects whether to give an odd-cycle latency to an internal command signal; and a second latency counter, which gives a latency to an internal command signal at intervals of two cycles. The latency counters are connected in series. Since the number of bits in control information, which is used to set a latency, is smaller than the types of settable latency as a result, it is possible to reduce wiring density.

Abstract: A method of manufacturing a semiconductor device includes: supplying a supercritical fluid mixed with an under-fill material to a stacked unit, which has a plurality of stacked semiconductor chips; and filling the under-fill material in the space between the plurality of the semiconductor chips, by heating the stacked unit placed in the inside of the high-pressure vessel and curing the under-fill material flowing in the space between the plurality of the semiconductor chips by a polymerization reaction, while the supercritical fluid is being supplied.

Abstract: A semiconductor chip 109 is mounted on a substrate 100, first wire group 120 and a second wire group 118 having a wire length shorter than the first wire group are provided so as to connect the substrate 100 and the semiconductor chip 109 to each other, and a sealing resin 307 is injected from the first wire group 120 toward the second wire group 118 so as to form a sealer 401 covering the semiconductor chip 109, the first wire group 120, and the second wire group 118.

Abstract: A metal oxide first electrode material for a MIM DRAM capacitor is formed wherein the first and/or second electrode materials or structures contain layers having one or more dopants up to a total doping concentration that will not prevent the electrode materials from crystallizing during a subsequent anneal step. Advantageously, the electrode doped with one or more of the dopants has a work function greater than about 5.0 eV. Advantageously, the electrode doped with one or more of the dopants has a resistivity less than about 1000 ?? cm. Advantageously, the electrode materials are conductive molybdenum oxide.

Abstract: A device that includes a first semiconductor chip and a second semiconductor chip. The first semiconductor chip includes a first terminal, a second terminal, a first circuit electrically coupled to the second terminal, a second circuit electrically coupled to the first terminal and the first circuit, and a third circuit electrically coupled to the second circuit. The second semiconductor chip includes a third terminal, a fourth terminal, a fourth circuit electrically coupled to the fourth terminal, a fifth circuit electrically coupled to the third terminal and the fourth circuit, and a sixth circuit electrically coupled to the fifth circuit.

Abstract: A semiconductor device includes a substrate including first and second surfaces, a first insulating film including third and fourth surfaces, the fourth surface being in contact with the first surface, and an electrode elongated to penetrate the substrate and the first insulating film, the electrode including a first portion and a second portion. The first portion includes first and second end parts and a center part sandwiched between the first and second end part. The first and second end parts of the first portion are smaller in diameter than at least a portion of the center part of the first portion. The second portion is located between the first portion and the third surface, and includes a third end part exposed from the third surface and a fourth end part connected to the first end part of the first portion.

Abstract: A semiconductor device includes: first and second circuit cell arrays extending in first direction; first and second power supply lines each extending in first direction and arranged over first circuit cell array, first power supply line being supplied with first power source voltage; third power supply line extending in first direction separately from second power supply line, arranged over second circuit cell array, and supplied with second power source voltage; first transistor coupled between second and third power supply lines; and first circuit arranged on first circuit cell array and operating on first and second power source voltages supplied from first and second power supply lines, respectively.

Abstract: A device featuring a substrate configured to include an upper surface and an opposing lower surface and, in parallel, a first and an opposing second peripheral edge, the first peripheral edge being smaller in length than the second peripheral edge, one or more semiconductor chip mounted over the upper surface of the substrate, a control semiconductor chip mounted over the upper surface of the substrate, a sealing resin covering the memory and control chips, and a plurality of external terminals provided over the lower surface of the substrate, the external terminals being arranged in a line along the first peripheral edge. The external terminals are used to fit the device to an electronic apparatus. The device may be a memory card having a stacked arrangement of two or more memory chips, and with the control chip being apart from or included in the stacked arrangement.

Abstract: Semiconductor device comprises a memory cell region, a peripheral region, and first wiring. The memory cell region includes a first isolation region, and a first active region provided so as to be divided off by the first isolation region. The peripheral region includes a second isolation region, and a second active region divided off by the first and second isolation regions and protruding from the upper surface of an insulating film located in the first and second isolation regions. The first wiring is buried in portions of a semiconductor substrate within the memory cell region and the peripheral region, so as to extend over the first and second active regions in a first direction. The first-direction width of the second active region is constant.

Abstract: A method for forming a capacitor stack is described. In some embodiments of the present invention, a first dielectric material is formed above a first electrode material. The first electrode material is rigid and has good mechanical strength and serves as a robust frame for the capacitor stack. The first dielectric material is sufficiently thin (<m) or highly doped so that it remains amorphous after subsequent anneal treatments. A second dielectric material is formed above the first dielectric material. The second dielectric material is sufficiently thick (>3 nm) or lightly doped or non-doped so that it crystallizes after subsequent anneal treatments. A second electrode material is formed adjacent to the second dielectric material. The second electrode material has a high work function and a crystal structure that serves to promote the formation of the high k-value crystal structure of the second dielectric material.

Abstract: A semiconductor device includes a first circuit node supplied with a first signal changing between first and second logic levels, a second circuit node supplied with a second signal changing between the first and second logic levels, a third circuit node, a first transistor having a gate electrically connected to the first circuit node and a source-drain path electrically connected between the second and third circuit nodes, the first transistor being rendered conductive when the first signal is at the second logic level, a fourth circuit node supplied with a voltage level being close to or the same as the second logic level, and a second transistor having a gate electrically connected to the first circuit node and a source-drain path electrically connected between the third and fourth circuit nodes, the second transistor being rendered conductive when the first signal is at the first logic level.

Abstract: Disclosed herein is a semiconductor device comprising a memory cell, a local bit line coupled to the memory cell, a global bit line provided correspondingly to the local bit line, and a bit line control circuit coupled between the local bit line and the global bit line. The bit line control circuit includes a restoring circuit that is activated in a refresh mode to refresh data of the memory cell while being in electrical isolation from the global bit line.