Patents Assigned to Renesas Electronics Corporation
  • Patent number: 11604484
    Abstract: An electronic system device comprises a power generation device generating a power supply voltage, a substrate bias generation circuit connected to the power generation device, a memory circuit, a monitor circuit, and a capacitor connected to the substrate bias generation circuit via a switch. The substrate bias generation circuit generates a substrate bias voltage from the power supply voltage and supplies charges based on the substrate bias voltage to the capacitor while the switch is ON-state. While the switch is OFF-state, the capacitor stores the accumulated charges based on the substrate bias voltage. While the switch is ON-state, the substrate bias generation circuit adds based on the substrate bias voltage to charge that was held, and states the back bias voltage. The substrate bias generation circuit supplies the back bias voltage to memory circuit.
    Type: Grant
    Filed: October 12, 2020
    Date of Patent: March 14, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Akira Tanabe, Kazuya Uejima
  • Patent number: 11599631
    Abstract: A semiconductor device and the like for maintaining a required function while suppressing unauthorized accesses are provided. The semiconductor device 100 includes a main control device 110 and a sub-control device 120. The main control device 110 includes a main memory 112 for storing main programs for receiving external signals, and a trigger signal output circuit 115 for outputting a trigger signal when an abnormal signal process differs from preset signal processing is performed. The sub-control device 120 is coupled to the main control device 110, and includes a trigger signal obtaining circuit 121 for obtaining a trigger signal, and a sub-program outputting circuit 123 for outputting a sub-program to the main control device 110 based on the obtained trigger signal.
    Type: Grant
    Filed: September 20, 2019
    Date of Patent: March 7, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Kazuki Onda, Masamitsu Muratani, Hiroshi Yagi
  • Patent number: 11600522
    Abstract: For simplifying the dual-damascene formation steps of a multilevel Cu interconnect, a formation step of an antireflective film below a photoresist film is omitted. Described specifically, an interlayer insulating film is dry etched with a photoresist film formed thereover as a mask, and interconnect trenches are formed by terminating etching at the surface of a stopper film formed in the interlayer insulating film. The stopper film is made of an SiCN film having a low optical reflectance, thereby causing it to serve as an antireflective film when the photoresist film is exposed.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: March 7, 2023
    Assignee: Renesas Electronics Corporation
    Inventors: Katsuhiko Hotta, Kyoko Sasahara
  • Publication number: 20230065925
    Abstract: A semiconductor substrate has a surface and a convex portion projecting upward from the surface. An n-type drift region has a portion located in the convex portion. The n?-type drain region has a higher n-type impurity concentration than the n-type drift region, and is arranged in the convex portion and on the n-type drift region such that the n?-type drain region and a gate electrode sandwich the n-type drift region in plan view.
    Type: Application
    Filed: July 19, 2022
    Publication date: March 2, 2023
    Applicant: Renesas Electronics Corporation.
    Inventors: Makoto KOSHIMIZU, Yasutaka NAKASHIBA, Tohru KAWAI
  • Patent number: 11594489
    Abstract: An interlayer insulating film has via holes. A sidewall conductive layer is arranged along a sidewall surface of one via hole and contains one or more kinds selected from a group including tungsten, titanium, titanium nitride, tantalum and molybdenum. A second metal wiring layer is embedded in one via hole and contains aluminum. A plug layer is embedded in the other via hole and contains one or more kinds selected from the group including tungsten, titanium, titanium nitride, tantalum and molybdenum.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: February 28, 2023
    Assignee: Renesas Electronics Corporation
    Inventors: Toshikazu Hanawa, Kazuhide Fukaya, Makoto Koshimizu
  • Publication number: 20230056809
    Abstract: An upper surface of a plug (PL1) is formed so as to be higher than an upper surface of an interlayer insulating film (PIL) by forming the interlayer insulating film (PIL) on a semiconductor substrate (1S), completing a CMP method for forming the plug (PL1) inside the interlayer insulating film (PIL), and then, making the upper surface of the interlayer insulating film (PIL) to recede. In this manner, reliability of connection between the plug (PL1) and a wiring (W1) in a vertical direction can be ensured. Also, the wiring (W1) can be formed so as not to be embedded inside the interlayer insulating film (PIL), or a formed amount by the embedding can be reduced.
    Type: Application
    Filed: October 28, 2022
    Publication date: February 23, 2023
    Applicant: Renesas Electronics Corporation
    Inventor: Takeshi Kawamura
  • Patent number: 11580043
    Abstract: The master interface generates copy data by copying the first data, and generates an error detection code based on the copy data. The protocol conversion unit generates the second data by converting the first data from the first protocol to the second protocol. The slave interface detects errors in the copy data based on the error detection code. The slave interface also generates the first verification data by performing a conversion from one of the first protocol or the second protocol to the other for one of the second data or copy data. In addition, the slave interface compares the second verification data with the first verification data, using the other of the second data or copy as the second verification data.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: February 14, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Sho Yamanaka, Toshiyuki Hiraki
  • Patent number: 11573134
    Abstract: A semiconductor device includes a first temperature sensor module, a second temperature sensor module, a first temperature controller, and a second temperature controller. The first temperature sensor module includes a bandgap reference circuit that outputs a plurality of divided voltages, and a first conversion circuit that performs analog-to-digital conversion processing on one of the plurality of divided voltages to generate a first digital value. The second temperature sensor module includes a second conversion circuit that performs analog-to-digital conversion processing on the one of the plurality of divided voltages to generate a second digital value. The first temperature sensor controller converts the first digital value to a first temperature. The second temperature sensor controller converts the second digital value to a second temperature.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: February 7, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Tadashi Kameyama, Masanori Ikeda
  • Patent number: 11575319
    Abstract: A DC-DC converter includes a high-side switch coupled between a first power supply and an output terminal, a low-side switch coupled between a second power supply and the output terminal, an inductor coupled to the output terminal, and a reverse current monitoring circuit that determines that a reverse current from the inductor to the output terminal occurs when the output terminal becomes a high voltage during a state in which the high-side switch and the low-side switch are in a dead time.
    Type: Grant
    Filed: December 30, 2020
    Date of Patent: February 7, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Masayuki Ida, Yasuhiko Kokami, Hideyuki Tajima, Hiroyuki Inoue, Noboru Inomata
  • Patent number: 11568908
    Abstract: A semiconductor device includes a memory array arranged in a matrix, a plurality of word lines provided corresponding to memory cell rows, a word driver for driving one of the plurality of word lines, a plurality of row select lines connected to the word driver, and a row decoder for outputting a row select signal to the plurality of row select lines based on input row address information. According to the embodiment, the semiconductor device can detect a failure of the address decoder in a simple method.
    Type: Grant
    Filed: January 26, 2021
    Date of Patent: January 31, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Shunya Nagata, Yoshikazu Saito, Takeshi Hashizume
  • Patent number: 11568226
    Abstract: A processing system includes a receiving circuit 1 for receiving an input signal from an externally connected sensor, an expected signal generating circuit 4 for automatically generating a teaching signal for use in the learning circuit 5, a learning circuit 5 for calculating a weight value, a bias value, and the like of the neural network model to form an expected signal from the teaching signal generated by the expected signal generating circuit 4 and the signal from the receiving circuit 1, an inference circuit 2 for performing signal processing based on a learned model of the neural network model generated by the learning circuit 5, and a validity verification circuit 3? for performing similarity calculation between an output signal of the inference circuit 2 and an expected signal for comparison.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: January 31, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventor: Yasushi Wakayama
  • Patent number: 11569867
    Abstract: The power line communication device detects inverter noise from the voltage waveforms of the power line, and executes the output of the transmission signal in a period in which it is determined that the signal amplitude of the transmission signal in the transmission processing unit exceeds a predetermined value from the output amplitude of the inverter noise, and stops the output of the transmission signal in other periods.
    Type: Grant
    Filed: September 14, 2021
    Date of Patent: January 31, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Kosuke Shibuya, Yoshitaka Shibuya
  • Publication number: 20230022468
    Abstract: An image sensor including an ADC circuit receiving pixel data to be supplied in parallel from the a pixel array, outputting a reference signal in accordance with a digital code, comparing the reference signal and the pixel data, and outputting the digital code at which the reference signal and the pixel data have a predetermined relation, the ADC circuit including a ramp-signal generating circuit outputting a ramp signal having a gradient with respect to change of the digital code, the gradient being different between when the digital code is in a first range and when the digital code is in a second range different from the first range and an attenuator receiving the ramp signal to be supplied and outputting the reference signal having a gradient being the same between when the digital code is in the first range and when the digital code is in the second range.
    Type: Application
    Filed: June 27, 2022
    Publication date: January 26, 2023
    Applicant: Renesas Electronics Corporation.
    Inventor: Fukashi MORISHITA
  • Patent number: 11562897
    Abstract: A wafer having a semiconductor substrate including a peripheral region and a central region, an insulating layer and a semiconductor layer is prepared first. Next, a plurality of trenches penetrating through the semiconductor layer and the insulating layer and reaching an inside of the semiconductor substrate are formed. Next, an inside of each of the plurality of trenches is filled with an insulating film, so that a plurality of element isolating portions is formed. Next, in the central region, the semiconductor layer exposed from a resist pattern is removed. The end portion closest to the outer edge of the semiconductor substrate among ends of the resist pattern used for removing the semiconductor layer in the central region is formed so as to be positioned closer to the outer edge of the semiconductor substrate than a position of the end portion closest to the outer edge of the semiconductor substrate among ends of the resist pattern used for forming the trenches.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: January 24, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventor: Hideki Makiyama
  • Patent number: 11562175
    Abstract: An abnormality detection apparatus including a feature extraction circuit configured to extract a feature point and a feature value of a first image, and a feature point and a feature value of a second image, a flow calculation circuit configured to calculate, based on the feature value of the first image, a first abnormality detection circuit configured to detect an abnormality in the first image based on a first optical flow, and to detect an abnormality in the second image based on a third optical flow, and a second abnormality detection circuit configured to detect an abnormality in the first or second image based on a result of a comparison between the second optical flow and a fourth optical flow.
    Type: Grant
    Filed: May 26, 2020
    Date of Patent: January 24, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Yuki Kajiwara, Kosuke Miyagawa, Masaki Nishibu, Kentaro Sasahara
  • Patent number: 11562774
    Abstract: The semiconductor device 1 comprises a processor 2, a memory connected to the processor and a control circuit, and comprises an active operation mode and a standby operation mode. The memory comprises a normal mode and a RS mode lower power consumption than the normal mode. The memory comprises SRAMs 7_0 to 7_5 which includes a mode terminal RS_T supplied with mode instruction signals RS1_0 to RS1_5 specifying the normal mode or the RS mode, respectively. The control circuit supplies the mode instruction signals specifying the normal mode to the mode terminal of the SRAMs 7_0 to 7_2 in transition period which the semiconductor device transitions from the standby operation mode to the active operation mode. And the control circuit supplies the mode instruction signals specifying the normal mode to the mode terminal of the SRAMs 7_3 to 7_5 after transition to the active operation mode.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: January 24, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Koichi Tanigawa, Takayoshi Shiraishi
  • Patent number: 11562957
    Abstract: A semiconductor device has a first area in which first and third semiconductor elements are formed, a second area in which second and fourth semiconductor elements are formed, and a third area located between the first and second areas. On the first to fourth semiconductor elements, a multilayer wiring layer including first and second inductors is formed. A through hole penetrating the semiconductor substrate is formed in the third area, and a first element isolation portion protruding from a front surface side of the semiconductor substrate toward a back surface side of the semiconductor substrate is formed in the through hole. Further, on the back surface side of the semiconductor substrate, the semiconductor substrate in the first area is mounted on the first die pad, and the semiconductor substrate in the second area is mounted on the second die pad.
    Type: Grant
    Filed: March 3, 2021
    Date of Patent: January 24, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Shinichi Kuwabara, Yasutaka Nakashiba
  • Patent number: 11563020
    Abstract: A method for manufacturing a semiconductor device to provide a Metal Insulator Semiconductor Field Effect Transistor (MISFET) in a first region of a semiconductor substrate includes forming a first gate insulating film on the semiconductor substrate in the first region, forming a first gate electrode containing silicon on the first gate insulating film, forming first impurity regions inside the semiconductor substrate so as to sandwich the first gate electrode in the first region, the first impurity regions configuring a part of a first source region and a part of a first drain region, forming a first silicide layer on the first impurity region, forming a first insulating film on the semiconductor substrate so as to cover the first gate electrode and the first silicide layer, polishing the first insulating film so as to expose the first gate electrode, and forming a second silicide layer on the first gate electrode.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: January 24, 2023
    Assignee: Renesas Electronics Corporation
    Inventor: Tadashi Yamaguchi
  • Patent number: 11563111
    Abstract: A trench is formed by removing a portion of each of the charge accumulation film and the insulating film located between the control gate electrode and the memory gate electrode. The insulating film is formed in the trench so that the upper surface of each of the insulating film and the charge accumulation film is covered with the insulating film. When exposing the upper surface of the control gate electrode and the memory gate electrode, the upper surface of each of the insulating film and the charge accumulation film is not exposed.
    Type: Grant
    Filed: July 14, 2020
    Date of Patent: January 24, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventor: Atsushi Amo
  • Patent number: 11557370
    Abstract: A semiconductor device includes an external terminal, an input buffer having an input terminal connected to the external terminal, a voltage generating circuit configured to generate a test voltage supplied to the input terminal, and a control circuit configured to determine whether the input buffer is deteriorated based on the test voltage supplied to the input terminal and an output level of the input buffer responding to the test voltage.
    Type: Grant
    Filed: April 9, 2021
    Date of Patent: January 17, 2023
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Daisuke Katagiri, Terunori Kubo, Hirotsugu Nakamura