Abstract: A method, apparatus and computer program product are provided in order to dynamically select a network configuration that results in reduced power consumption by the mobile terminal. In this regard, a method is provided that includes characterizing an upcoming communication, wherein the characterization comprises at least one of transmission or reception. The method further includes determining a proposed network configuration based on a determined power consumption level of one or more network configurations available in a geographical area and the characterization of the upcoming communication. The method also includes causing the preferred configuration to be transmitted to a network entity.

Abstract: The present invention provides a technique capable of attaining an improvement in current detection accuracy in a trench gate type power MISFET equipped with a current detection circuit. Inactive cells are disposed so as to surround the periphery of a sense cell. That is, the inactive cell is provided between the sense cell and an active cell. All of the sense cell, active cell and inactive cells are respectively formed of a trench gate type power MISFET equipped with a dummy gate electrode. At this time, the depth of each trench extends through a channel forming region and is formed up to the deep inside (the neighborhood of a boundary with a semiconductor substrate) of an n-type epitaxial layer. Further, a p-type semiconductor region is provided at a lower portion of each trench. The p-type semiconductor region is formed so as to contact the semiconductor substrate.

Abstract: A modem is provided for a wireless device that is capable of providing service for at least two SIMs. The modem has at least a first set of modem components and a second set of modem components. The modem selectively reconfigures the arrangement of the plural sets of modem components. In a first configuration, the first set of modem components provides wireless connection service for a first SIM of the wireless device and the second set of modem components provides wireless connection service for a second SIM of the wireless device. This allows active wireless connections to be made on behalf of both SIMs simultaneously by the sets of modem components. In a second configuration, the first set of modem components and the second set of modem components provide wireless connection service for the first SIM.

Abstract: To provide a semiconductor device provided with an element isolation structure capable of hindering an adverse effect on electric characteristics of a semiconductor element, and a method of manufacturing the same. The thickness of a first silicon oxide film left in a shallow trench isolation having a relatively narrow width is thinner than the first silicon oxide film left in a shallow trench isolation having a relatively wide width. A second silicon oxide film (an upper layer) having a relatively high compressive stress by an HDP-CVD method is more thickly laminated over the first silicon oxide film in a lower layer by a thinned thickness of the first silicon oxide film. The compressive stress of an element isolation oxide film finally formed in a shallow trench isolation having a relatively narrow width is more enhanced.

Abstract: The reliability of a semiconductor device is improved. A package of a semiconductor device internally includes a first semiconductor chip and a second semiconductor chip in which power MOS•FETs are formed and a third semiconductor chip in which a control circuit controlling the first and second semiconductor chips is formed. The first to third semiconductor chips are mounted on die pads respectively. Source electrode bonding pads of the first semiconductor chip on a high side are electrically connected with a first die pad of the die pads via a metal plate. On a top surface of the die pad 7D2, a plated layer formed in a region where the second semiconductor chip is mounted, and another plated layer formed in a region where the metal plate is joined are provided and the plated layers are separated each other with a region where no plated layer is formed in between.

Abstract: To provide: a technique capable of suppressing a titanium nitride film that is exposed at the side surface of an opening from turning into a titanium oxide film even when water permeates the opening over a pad from outside a semiconductor device and thus improving the reliability of the semiconductor device; and a technique capable of suppressing a crack from occurring in a surface protective film of a pad and improving the reliability of a semiconductor device. An opening is formed so that the diameter of the opening is smaller than the diameter of another opening and the opening is included in the other opening. Due to this, it is possible to cover the side surface of an antireflection film that is exposed at the side surface of the other opening with a surface protective film in which the opening is formed. As a result of this, it is possible to form a pad without exposing the side surface of the antireflection film.

Abstract: According to an embodiment of the invention, an apparatus is provided which includes a microprocessor, and a built-in temperature sensor configured to measure a temperature of the microprocessor as a reference temperature. The apparatus further includes external temperature sensors, where at least one of the external temperature sensors is configured to measure the temperature of the microprocessor. The microprocessor is configured to make an external temperature calibration using the reference temperature measured by the built-in temperature monitor. Each of the external temperature sensors is configured to monitor temperature information of a component and provide the temperature information to the microprocessor.

Abstract: An improvement is achieved in the manufacturing yield of a semiconductor device including a plurality of field effect transistors having different characteristics over the same substrate. By combining anisotropic dry etching with isotropic wet etching or isotropic dry etching, three types of sidewalls having different sidewall lengths are formed. By reducing the number of anisotropic dry etching steps, in a third n-type MISFET region and a third p-type MISFET region where layout densities are high, it is possible to prevent a semiconductor substrate from being partially cut between n-type gate electrodes adjacent to each other, between the n-type gate electrode and a p-type gate electrode adjacent to each other, and the p-type gate electrodes adjacent to each other.

Abstract: A semiconductor device which combines reliability and the guarantee of electrical characteristics is provided. A power MOSFET and a protection circuit formed over the same semiconductor substrate are provided. The power MOSFET is a trench gate vertical type P-channel MOSFET and the conduction type of the gate electrode is assumed to be P-type. The protection circuit includes a planar gate horizontal type offset P-channel MOSFET and the conduction type of the gate electrode is assumed to be N-type. These gate electrode and gate electrode are formed in separate steps.

Abstract: By considering a Deep Nwell diffusing into a Pwell region, accuracy of a substrate parasitic-resistance extraction is improved. A well region of a semiconductor integrated circuit where a Pwell and a Deep Nwell are formed in a substrate is divided into two or more meshes each including two or more resistor segments and a substrate noise is analyzed based thereon. In this regard, parallel components of resistors coupling the Pwell with the substrate are deleted in accordance with a state of the Deep Nwell diffusing into the Pwell region, so that an arithmetic processing unit executes a process for expressing a rise in the resistance value. By deleting the parallel components of the resistors coupling the Pwell with the substrate, the rise in the resistance value caused by the Deep Nwell can be reflected in the substrate parasitic-resistance extraction. Therefore, the accuracy of the substrate parasitic-resistance extraction can be improved.

Abstract: A semiconductor device includes a transistor having a gate electrode, a first electrode, and a second electrode and first and second protection circuits each having one end commonly connected to the gate electrode and the other end connected to the first and second electrodes, respectively. The first and second protection circuits are formed in first and second polysilicon layers, respectively, formed separately on a single field insulating film.

Abstract: In a QFN that includes a die pad, a semiconductor chip mounted on the die pad, a plurality of leads arranged around the semiconductor chip, a plurality of wires that electrically connect the plurality of electrode pads of the semiconductor chip with the plurality of leads, respectively, and a sealing member sealing the semiconductor chip and the plurality of wires, first and second step portions are formed at shifted positions on the left and right sides of each of the leads to make the positions of the first and second step portions shifted between the adjacent leads. As a result, the gap between the leads is narrowed, thereby achieving the miniaturization or the increase in the number of pins of the QFN.

Abstract: A semiconductor integrated circuit according to one aspect of the present invention may includes a plurality of driving circuits to drive a respective plurality of word lines with either a first voltage supplied from a first power supply or a second voltage supplied from a second power supply in accordance with a control signal, and a plurality of gate transistors in each of which a gate is connected to one of the plurality of word lines, and a connection state between a storage node and a bit line is changed based on the voltage provided to the word line connected to the gate. In the semiconductor integrated circuit, a gate oxide film of each of the plurality of gate transistors is thinner than a gate oxide film of each of transistors constituting the plurality of driving circuits.

Abstract: To reduce current noise by reducing the current peak value and the current rise slope, a data driver includes a delay unit and a plurality of output circuits. The delay unit sequentially delays a control signal and outputs delay control signals. The output circuits start outputting in response to the delay control signals. The delay unit generates the delay control signals to be output to the output circuits.

Abstract: A semiconductor device having a structure in which the structure is laminated in many stages is made thin. A reforming area is formed by irradiating a laser beam, where a condensing point is put together with the inside of the semiconductor substrate of a semiconductor wafer. Then, after applying the binding material of liquid state to the back surface of a semiconductor wafer by a spin coating method, this is dried and a solid-like adhesive layer is formed. Then, a semiconductor wafer is divided into each semiconductor chip by making the above-mentioned reforming area into a division origin. By pasting up this semiconductor chip on the main surface of the other semiconductor chip by the adhesive layer of the back surface, a semiconductor device having a structure in which the semiconductor device is laminated in many stages is manufactured.

Abstract: A charge storage layer interposed between a memory gate electrode and a semiconductor substrate is formed shorter than a gate length of the memory gate electrode or a length of insulating films so as to make the overlapping amount of the charge storage layer and a source region to be less than 40 nm. Therefore, in the write state, since the movement in the transverse direction of the electrons and the holes locally existing in the charge storage layer decreases, the variation of the threshold voltage when holding a high temperature can be reduced. In addition, the effective channel length is made to be 30 nm or less so as to reduce an apparent amount of holes so that coupling of the electrons with the holes in the charge storage layer decreases; therefore, the variation of the threshold voltage when holding at room temperature can be reduced.

Abstract: To provide a technique adopting a TSV technique, capable of improving manufacturing yield and reliability of semiconductor devices. By partitioning a connection pad-forming region into a plurality of regions and by forming, respectively, connection pads 17 having a relatively small planar area, spaced apart from an adjacent connection pad 17 in each of partitioned regions, dishing generated in the connection pad 17 is lightened. In addition, by not forming a through hole 23 for forming a through electrode 27 in an interlayer insulating film 9 covering a semiconductor element, intrusion of H2O, a metal ion such as Na+ or K+, etc. into an element-forming region from the through hole, via the interlayer insulating film is prevented.

Abstract: To provide a semiconductor device and a method of manufacturing the same capable of suppressing, when a plurality of MIS transistors having different absolute values of threshold voltage is used, the reduction of the drive current of a MIS transistor having a greater absolute value of threshold voltage. The threshold voltage of a second nMIS transistor is greater than the threshold voltage of a first nMIS transistor and the sum of the concentration of lanthanum atom and the concentration of magnesium atom in a second nMIS high-k film included in the second nMIS transistor is lower than the sum of the concentration of lanthanum atom and the concentration of magnesium atom in a first nMIS high-k film included in the first nMIS transistor.

Abstract: The present invention introduces a method for saving power in battery limited devices. The invention handles profile properties, which may e.g. be User Interface activity, Bluetooth connection success, email fetch success or WLAN connection success. A value of the property is saved into a memory, e.g. once an hour for the whole calendar week, thus forming a trend value which is regularly updated. Certain behavior patterns may then be seen. When changes in the trend occur with different users or as differences compared to a usual behavior in a calendar week, for instance, the characteristics of the device are altered accordingly in order to minimize power usage.

Abstract: Efficient reduction in power consumption is achieved by combinational implementation of a power cutoff circuit technique using power supply switch control and a DVFS technique for low power consumption. A power supply switch section fed with power supply voltage, a circuit block in which a power cutoff is performed by the power supply switch section, and a level shifter are formed in a DEEP-NWELL region formed over a semiconductor substrate. Another power supply switch section fed with another power supply voltage, a circuit block in which a power cutoff is performed by the power supply switch section, and a level shifter are formed in another DEEP-NWELL region formed over the semiconductor substrate. In this arrangement, there arises no possibility of short-circuiting between different power supplies via each DEEP-NWELL region formed over the semiconductor substrate.