Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over at least one source layer, and groups of memory opening fill structures vertically extending through the alternating stack. Each memory opening fill structure can include a vertical stack of memory elements and a vertical semiconductor channel. A plurality of source-side select gate electrodes can be laterally spaced apart by source-select-level dielectric isolation structures. Alternatively or additionally, the at least one source layer may include a plurality of source layers. A group of memory opening fill structures can be selected by selecting a source layer and/or by selecting a source-level electrically conductive layer.

Abstract: The memory device includes a controller that is configured to program the memory cells of a selected word line in a plurality of program-verify iterations. During a verify portion at least one of the program-verify iterations, the controller determines a threshold voltage of at least one memory cell relative to a first verify low voltage VL1, a second verify low voltage VL2, and a verify high voltage VH associated with a data state being programmed. The controller also maintains a count of program-verify iterations since the at least one memory cell passed a verify high voltage of a previously programmed data state or discharges a sense node through a channel including the at least one memory cell and compares a discharge time to predetermined sense times associated with the first and second verify low voltages and with the verify high voltage.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers through which memory opening fill structures vertically extend. The memory die includes at least three memory array regions interlaced with at least two contact regions, or at least three contact regions interlaced with at least two memory array regions in the same memory plane. A logic die including at least two word line driver regions can be bonded to the memory die. The interlacing of the contact regions and the memory array regions can reduce lateral offset of boundaries of the word line driver regions from boundaries of the contact regions.

Abstract: A memory apparatus and method of operation is provided. The apparatus includes memory cells each connected to one of a plurality of word lines. The memory cells are disposed in strings coupled to one of a plurality of bit lines and are configured to retain a threshold voltage corresponding to one of a plurality of data states. A control means is configured to read each of the memory cells in a read operation. For each one of the memory cells, the control means is also configured to offset at least one of a bit line settling time and a kick voltage during the read operation based on a probability of at least one neighboring one of the plurality of bit lines being coupled to the memory cells retaining the threshold voltage corresponding to a different one of the plurality of data states than the one of the memory cells.

Abstract: In a non-volatile memory system that performs programming of selected memory cells (in coordination with pre-charging and boosting of channels for unselected memory cells) and program-verify to determine whether the programming was successful, the system transitions from program-verify to the next dose of programming by concurrently lowering a voltage applied to a selected word line and voltages applied to word lines on a first side of the selected word line at the conclusion of program-verify. Subsequent to lowering the voltage applied to the selected word line, the system successively lowers voltages applied to groups of one or more word lines on a second side of the selected word line at the conclusion of program-verify beginning with a group of one or more word lines immediately adjacent the selected word line and progressing to other groups of one or more word lines disposed increasingly remote from the selected word line.

Abstract: The memory die that includes a plurality of memory blocks. Each memory block includes a plurality of memory cells that are configured to store three bits of data in each memory cell when the memory die is in a TLC operating mode. The memory die has a non-binary data capacity, which is a multiple of 683 Gb, when the memory die is operating in the TLC operating mode.

Abstract: An apparatus is provided that includes a block of memory cells and a control circuit coupled to the block of memory cells. The control circuit is configured to perform an erase operation on the block of memory cells by determining a first count of a number of times that the block of memory cells previously has been programmed and erased, determining a threshold number based on the first count, and determining whether the erase operation passed or failed based on the threshold number.

Abstract: A memory array is provided that includes a plurality of word lines and a plurality of bit lines, and a plurality of memory cells each including a corresponding magnetic memory element coupled in series with a corresponding selector element. Each memory cell is coupled between one of the word lines and one of the bit lines. Each memory cell has a half-pitch F, and comprises an area between 2F2 and 4F2.

Abstract: To save power during a read process, NAND strings of each sub-block of a block have independently controlled source side select lines connected to source side select gates and drain side select lines connected to drain side select gates so that NAND strings of unselected sub-blocks can float and not draw current. To prevent read disturb in NAND strings of unselected sub-blocks, after all word lines are raised to a pass gate voltage, unselected word lines nearby the selected word line are lowered to respective intermediate voltages while lowering the voltage on the selected word line in order to achieve a channel potential gradient in the floated NAND strings of the unselected sub-blocks that does not result in read disturb. Subsequently, the selected word line is raised to the appropriate read compare voltage so the selected memory cells can be sensed.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, memory opening fill structures including a respective vertical semiconductor channel and a respective vertical stack of memory elements extending through the alternating stack in a memory array region, via contact structures contacting the stepped surfaces of the electrically conductive layers at each step in a staircase region, and a vertical stack of access transistors located between the staircase region and the memory array region.

Abstract: A memory apparatus and method of operation are provided. The memory apparatus includes memory cells connected to word lines and disposed in memory holes organized in rows grouped in strings. The memory cells are configured to retain a threshold voltage. The rows include full circle rows and semi-circle rows in which the memory holes are partially cut by a slit half etch. The memory holes of the semi-circle rows are coupled semi-circle bit lines and the memory holes of the full circle rows are coupled to full circle bit lines. A control means is configured to erase the memory cells in an erase operation. During the erase operation, the control means creates a capacitive coupling between each of the semi-circle bit lines and at least one neighboring one of the full circle bit lines to increase a semi-circle erase voltage applied to each of the semi-circle bit lines.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers, memory openings vertically extending through the alternating stack, and memory opening fill structures located within the memory openings. Each of the electrically conductive layers includes a metallic fill material layer and a plurality of vertical tubular metallic liners laterally surrounding a respective one of the memory opening fill structures and located between the metallic fill material layer and a respective one of the memory opening fill structures. The tubular metallic liners may be formed by selective metal or metal oxide deposition, or by conversion of surface portions of the metallic fill material layers into metallic compound material portions by nitridation, oxidation, or incorporation of boron atoms.

Abstract: A memory device includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, a memory opening vertically extending through the alternating stack, and a memory opening fill structure located in the memory opening and including a vertical semiconductor channel and a memory material layer. A vertical stack of insulating material portions can be provided at levels of the insulating layers to provide a laterally-undulating profile to the memory material layer. Alternatively, a combination of inner insulating spacers and outer insulating spacers can be employed to provide a laterally-undulating profile to the memory material layer.

Abstract: A semiconductor structure includes at least two field effect transistors. A gate strip including a plurality of gate dielectrics and a gate electrode strip can be formed over a plurality of semiconductor active regions. Source/drain implantation is conducted using the gate strip as a mask. The gate strip is divided into gate electrodes after the implantation.

Abstract: To reduce spikes in the current used by a NAND memory die during a write operation using smart verify, different amounts of delay are introduced into the loops of the programing algorithm. Depending on the number of verify levels following a programming pulse, differing amounts of wait time are used before biasing a selected word line to the verify levels or levels. For example, if only a single verify level is used, a shorter delay is used than if two verify levels are used.

Abstract: A memory device with one or more planes having sub-blocks is disclosed. The memory device may further include a voltage switch transistor for each of sub-blocks. Additionally, the memory device may further include a row decoder for each of sub-blocks. As a result, an operation to two sub-blocks can be performed at different times. For example, using a row decoder and voltage switch transistor, a sub-block can be initially read, followed by a subsequent read of another sub-block using a separate row decoder and voltage switch transistor. By staggering the read operations through a time delay, the peak current Icc associated with the supply voltage can be reduced.

Abstract: Systems and methods are provided that combine a write duty cycle adjuster with write training to reduce detection and duty cycle errors in memory devices. Various embodiments herein perform write duty cycle adjuster operations to adjust a duty cycle of a clock signal that coordinates a data signal with a data operation on the memory device based on an error in the duty cycle, and performs write training operations to detect a skew between the data signal and the clock signal and adjust a sampling transition of the duty cycle of the clock signal to align with a valid data window of the data signal.

Abstract: A bonded assembly includes a first semiconductor die and a second semiconductor die that are bonded to each other by dielectric-to-dielectric bonding. First conductive via structures vertically extend through the second semiconductor die and a respective subset of the first dielectric material layers in the first semiconductor die, and contact a respective first metal interconnect structure in the first semiconductor die. Second conductive via structures vertically extend through a second substrate and a respective subset of the second dielectric material layers in the second semiconductor die, and contacting a respective second metal interconnect structure in the second semiconductor die. Redistribution metal interconnect structures located over a backside surface of the second substrate electrically connect the first conductive via structures and the second conductive via structures, and provide electrical interconnection between the first semiconductor die and the second semiconductor die.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, an array of memory opening fill structures located within an array of memory openings vertically extending through the alternating stack, and a drain-select-level isolation structure vertically extending through drain-select-level electrically conductive layers between two rows of memory opening fill structures. The drain-select-level isolation structure may comprise a low-k dielectric material or an air gap.

Abstract: Memory cell sensing by charge sharing between two sense nodes is disclosed. A first sense node and a second sense node are pre-charged and the second node is discharged initiating charge sharing between the first sense node and the second sense node that results in an improved sense margin. Sensing circuitry disclosed herein may include one or more pre-charge circuits, sense enable circuits, and charge-sharing circuits. The increased sense margin achieved by sensing circuitry disclosed herein provides better noise immunity and more accurate sensing results.