Abstract: A manufacturing method of an HEMT includes: forming a heterostructure; forming a first gate layer of intrinsic semiconductor material on the heterostructure; forming a second gate layer, containing dopant impurities of a P type, on the first gate layer; removing first portions of the second gate layer so that second portions, not removed, of the second gate layer form a doped gate region; and carrying out a thermal annealing of the doped gate region so as to cause a diffusion of said dopant impurities of the P type in the first gate layer and in the heterostructure, with a concentration, in the heterostructure, that decreases as the lateral distance from the doped gate region increases.

Abstract: A semiconductor structure includes a substrate, a first electrode over the substrate, a second electrode over the first electrode, and a first insulating layer between the first electrode and the second electrode. The first insulating layer has a first portion and a second portion coupled to the first portion, the second portion of the first insulating layer is in contact with the second electrode, the first portion is separated from the second electrode by the second portion. A thickness of the second portion is greater than a thickness of the first portion.

Abstract: The present disclosure provides an integrated circuit structure with dielectric isolation structure for reducing capacitive coupling and crosstalk between conductive features and a method for preparing the same. The integrated circuit structure includes a plurality of conductive structures disposed over a substrate; a plurality of dielectric structures disposed over the conductive structures; an inter-layer dielectric (ILD) layer disposed over sidewalls of the dielectric structures and sidewalls of the conductive structures, wherein the ILD layer, the dielectric structure and the conductive structure form an air spacer therebetween; and a dielectric isolation structure including a liner layer enclosing an air gap in the ILD layer.

Abstract: A transistor includes a trench formed in a semiconductor substrate. A conductive spacer is formed in the trench and offset from a first sidewall of the trench. A dielectric material is formed in the trench and surrounds the conductive spacer. A drift region is formed in the semiconductor substrate adjacent to the first sidewall and a first portion of a second sidewall of the trench. A drain region is formed in the drift region adjacent to a second portion of the second sidewall. A first gate region overlaps a portion of the drift region and is formed separate from the conductive spacer.

Abstract: A semiconductor device including: a semiconductor substrate including an active region; a plurality of conductive structures formed over the semiconductor substrate; an isolation layer filling a space between the conductive structures and having an opening that exposes the active region between the conductive structures; a pad formed in a bottom portion of the opening and in contact with the active region; a plug liner formed conformally over a sidewall of the opening and exposing the pad; and a contact plug formed over the pad inside the opening.

Abstract: A semiconductor package includes a conductive pad, a semiconductor die with an aluminum bond pad over a dielectric layer of the semiconductor die, a gold bump on the aluminum bond pad, a first intermetallic layer of gold and aluminum between the aluminum bond pad and the gold bump, a copper ball bond on the gold bump, a second intermetallic layer of copper and gold between the copper ball bond and the gold bump, a copper wire extending from the copper ball bond to the conductive pad, a stitch bond between the copper wire and the conductive pad.

Abstract: There is provided a semiconductor device in which the inter-wiring capacitance of wiring lines provided in any layout is further reduced. A semiconductor device (1) including: a first inter-wiring insulating layer (120) that is provided on a substrate (100) and includes a recess on a side opposite to the substrate; a first wiring layer (130) that is provided inside the recess in the first inter-wiring insulating layer; a sealing film (140) that is provided along an uneven shape of the first wiring layer and the first inter-wiring insulating layer; a second inter-wiring insulating layer (220) that is provided on the first inter-wiring insulating layer to cover the recess; and a gap (150) that is provided between the second inter-wiring insulating layer and the first wiring layer and the first inter-wiring insulating layer. The second inter-wiring insulating layer has a planarized surface that is opposed to the recess.

Abstract: An MOSFET manufacturing method, comprising: etching an oxide layer and a silicon nitride layer on a first conductivity type well region, and forming an opening exposing the first conductivity type well region; etching the first conductivity type well region to form a first trench; depositing a medium oxide layer and performing back etching; etching the first conductivity type well region to form a second trench that is connected to the first trench, and forming a grid on an inner wall of the second trench, forming a second conductivity type well region in the first conductivity type well region at the bottom of the second trench, and forming a source in the second conductivity type well region; and removing the oxide layer and the silicon nitride layer, and forming a drain at the first conductivity type well region outside of the trench.

Abstract: Various embodiments of a die carrier package and a method of forming such package are disclosed. The package includes one or more dies disposed within a cavity of a carrier substrate, where a first die contact of one or more of the dies is electrically connected to a first die pad disposed on a recessed surface of the cavity, and a second die contact of one or more of the dies is electrically connected to a second die pad also disposed on the recessed surface. The first and second die pads are electrically connected to first and second package contacts respectively. The first and second package contacts are disposed on a first major surface of the carrier substrate adjacent the cavity.

Abstract: A semiconductor device package and a method for manufacturing the semiconductor device package are provided. The semiconductor device package includes a carrier, an electronic component, a first encapsulant and a conductive via. The carrier has a first surface and a second surface opposite to the first surface. The semiconductor device is mounted at the second surface of the carrier. The first encapsulant encapsulates the first surface of the carrier and has a surface facing away from the first surface of the carrier. The conductive via extends from the surface of the first encapsulant into the carrier.

Abstract: The present application provides a semiconductor device with an air gate spacer for reducing parasitic capacitance and a method for manufacturing the semiconductor device. The semiconductor device includes a stacking structure, a first sidewall spacer and a second sidewall spacer. The stacking structure stands on a semiconductor substrate. The first and second sidewall spacers cover a sidewall of the stacking structure. An air gap is sealed between the first and second sidewall spacers. A top end of the air gap is substantially aligned with top ends of the first and second sidewall spacers. A top portion of the air gap is tapered toward a top end of the air gap.

Abstract: In some embodiments, the present disclosure relates to method of forming an integrated chip. The method includes forming a bottom electrode structure over one or more interconnect layers disposed within one or more stacked inter-level dielectric (ILD) layers over a substrate. The bottom electrode structure has an upper surface having a noble metal. A diffusion barrier film is formed over the bottom electrode structure. A data storage film is formed onto the diffusion barrier film, and a top electrode structure is over the data storage film. The top electrode structure, the data storage film, the diffusion barrier film, and the bottom electrode structure are patterned to define a memory device.

Abstract: Embodiments of the present disclosure provide a packaging method, an electronic device, and a packaging apparatus. The packaging method includes: providing a first substrate and a second substrate; and cell-assembling the first substrate and the second substrate to sandwich a filling glue between the first substrate and the second substrate to form a packaging structure, the filling glue is mixed with electrophoretic liquid encapsulated by a capsule, and the electrophoretic liquid includes an electrophoretic particle; in a process of cell-assembling the first substrate and the second substrate, applying an electric field to control the electrophoretic particle to move directionally to deform the capsule.

Abstract: A semiconductor device includes a support body including a mount region, a semiconductor chip disposed on the mount region with a predetermined distance therebetween, a bump disposed between the support body and the semiconductor chip, a wall portion disposed between the support body and the semiconductor chip along a part of an outer edge of the semiconductor chip, and an underfill resin layer disposed between the support body and the semiconductor chip. The underfill resin layer covers an outer side surface of the wall portion.

Abstract: A high-voltage transistor device includes a semiconductor substrate, an isolation structure, a gate dielectric layer, a gate, a source region and a drain region. The semiconductor substrate has a plurality of grooves extending downward from a surface of the semiconductor substrate to form a sawtooth sectional profile. The isolation structure is disposed on the outside of the plurality of grooves, and extends from the surface downwards into the semiconductor substrate to define a high-voltage area. The gate dielectric layer is disposed on the high-voltage area and partially filled in the plurality of grooves. The gate is disposed on the gate dielectric layer. The source region and the drain region are respectively disposed in the semiconductor substrate and isolated from each other.

Abstract: A semiconductor device includes a first substrate, circuit devices disposed on the first substrate, a first interconnection structure electrically connected to the circuit devices, a second substrate disposed on an upper portion of the first interconnection structure, gate electrodes spaced apart from each other and stacked on the second substrate in a direction perpendicular to an upper surface of the second substrate, and channel structures penetrating the gate electrodes, extending perpendicularly to the second substrate, and including a channel layer. The semiconductor device also includes a ground interconnection structure connecting the first substrate and the second substrate, and including an upper via integrated with the second substrate and extending from a lower surface of the second substrate towards the first substrate.

Abstract: Semiconductor devices and methods which utilize a passivation dopant to passivate a gate dielectric layer are provided. The passivation dopant is introduced to the gate dielectric layer through a work function layer using a process such as a soaking method. The passivation dopant is an atom which may help to passivate electrical trapping defects, such as fluorine.

Abstract: A semiconductor device according to the present embodiment comprises a first metallic line. The first metallic line is provided above a substrate and extends in a first direction with a first width. At least one second metallic line is connected to the first metallic line and extends in a second direction from the first metallic line with a second width that is smaller than the first width. A dummy metallic line is arranged adjacently to the at least one second metallic line, connected to the first metallic line, and extends in the second direction from the first metallic line. The dummy metallic line is not electrically connected to lines other than the first metallic line.

Abstract: A semiconductor device includes a first interlayer insulating film disposed on a substrate and having a first trench. A first lower conductive pattern fills the first trench and includes first and second valley areas that are spaced apart from each other in a first direction parallel to an upper surface of the substrate. The first and second valley areas are recessed toward the substrate. A second interlayer insulating film is disposed on the first interlayer insulating film and includes a second trench that exposes at least a portion of the first lower conductive pattern. An upper conductive pattern fills the second trench and includes an upper barrier film and an upper filling film disposed on the upper barrier film. The upper conductive pattern at least partially fills the first valley area.

Abstract: A semiconductor device includes a chip carrier, a first semiconductor chip arranged on the chip carrier, the first semiconductor chip being located in a first electrical potential domain when the semiconductor device is operated, a second semiconductor chip arranged on the chip carrier, the second semiconductor chip being located in a second electrical potential domain different from the first electrical potential domain when the semiconductor device is operated, and an electrically insulating structure arranged between the first semiconductor chip and the second semiconductor chip, which is designed to galvanically isolate the first semiconductor chip and the second semiconductor chip from each other.