Abstract: In this method for manufacturing a semiconductor element, a modified layer produced by subjecting a substrate (70) to mechanical polishing is removed by heating the substrate (70) under Si vapor pressure. An epitaxial layer formation step, an ion implantation step, an ion activation step, and a second removal step are then performed. In the second removal step, macro-step bunching and insufficient ion-implanted portions of the surface of the substrate (70) performed the ion activation step are removed by heating the substrate (70) under Si vapor pressure. After that, an electrode formation step in which electrodes are formed on the substrate (70) is performed.

Abstract: An imaging device having pixels, each pixel including: a photoelectric conversion unit including a first electrode, a second electrode, a photoelectric conversion layer between the first and second electrodes, and a hole-blocking layer between the first electrode and the photoelectric conversion layer. The photoelectric conversion unit is applied with a voltage between the first electrode and the second electrode. The photoelectric conversion unit has a characteristic, responsive to the voltage within a range from a first voltage to a second voltage, showing that a density of current passing between the first electrode and the second electrode when light is incident on the photoelectric conversion layer becomes substantially equal to that when no light is incident on the photoelectric conversion layer. The range from the first voltage to the second voltage includes 0V, and a difference between the first voltage and the second voltage is 0.5 V or more.

Abstract: A method of fabricating a vertical fin field effect transistor with a merged top source/drain, including, forming a source/drain layer at the surface of a substrate, forming a plurality of vertical fins on the source/drain layer; forming protective spacers on each of the plurality of vertical fins, forming a sacrificial plug between two protective spacers, forming a filler layer on the protective spacers not in contact with the sacrificial plug, and selectively removing the sacrificial plug to form an isolation region trench between the two protective spacers.

Abstract: Several embodiments of semiconductor systems and associated methods of color corrections are disclosed herein. In one embodiment, a method for producing a light emitting diode (LED) includes forming an (LED) on a substrate, measuring a base emission characteristic of the formed LED, and selecting a phosphor based on the measured base emission characteristic of the formed LED such that a combined emission from the LED and the phosphor at least approximates white light. The method further includes introducing the selected phosphor onto the LED via, for example, inkjet printing.

Abstract: A method for the etching of deep, high-aspect ratio features into silicon carbide (SiC), gallium nitride (GaN) and similar materials using an Inductively-Coupled Plasma (ICP) etch process technology is described. This technology can also be used to etch features in silicon carbide and gallium nitride having near vertical sidewalls. The disclosed method has application in the fabrication of electronics, microelectronics, power electronics, Monolithic Microwave Integrated Circuits (MMICs), high-voltage electronics, high-temperature electronics, high-power electronics, Light-Emitting Diodes (LEDs), Micro-Electro-Mechanical Systems (MEMS), micro-mechanical devices, microelectronic devices and systems, nanotechnology devices and systems, Nano-Electro-Mechanical Systems (NEMS), photonic devices, and any devices and/or structures made from silicon carbide and/or gallium nitride.

Abstract: A semiconductor device includes a composite chip mounted over a wiring substrate, the composite chip including a first area, a second area that is provided independently from the first area, and a third area including a first material between the first and second areas. The first area includes a first circuit formed in the first area, and the second area includes a second circuit formed in the second area. The first area is spaced apart from the second area by the first material.

Abstract: A method to fabricate a non-planar memory device including forming a multi-layer silicon nitride structure substantially perpendicular to a top surface of the substrate. There may be multiple non-stoichiometric silicon nitride layers, each including a different or same silicon richness value from one another.

Abstract: The invention relates to a method to reduce the contact resistance of ohmic contact in group III-nitride high-electron mobility transistor (HEMT). A heavily n-type doped nitride layer with modulation doping is epitaxially grown on selected contact regions for use as ohmic contact layer. The method for producing the n++ ohmic contact layer includes at least the following: deposition of nitride HEMT epitaxial structure on substrates (such as SiC, silicon, sapphire, GaN etc), deposition in-situ or ex-situ mask for selective growth of n-contact, selective etching to create of openings within the mask layer, deposition of modulation doped n++ nitride ohmic contact layer followed by ohmic metal deposition. The modulation doping involves alternating epitaxy of high and low doped nitride layers with common n-type dopant such as Ge, Si etc. The modulation doping significantly increases the range of n-type doping without detrimental effect on the material quality of the contact layer.

Abstract: Methods of forming a semiconductor package. Implementations include providing a leadframe, coupling a semiconductor die or an electronic component to the leadframe, and encapsulating at least a portion of the semiconductor die or the electronic component using a mold compound leaving two or more leads of the leadframe exposed. The method may also include coating the two or more leads of the leadframe with an electrically conductive layer. The method may include fully electrically and physically singulating one or more tie bars between two or more leads of the leadframe, a lead of the two or more leads and a leadframe flag, or any combination thereof. The method may also include singulating the leadframe to form one or more semiconductor packages.

Abstract: A method for the etching of deep, high-aspect ratio features into silicon carbide (SiC), gallium nitride (GaN) and similar materials using an Inductively-Coupled Plasma (ICP) etch process technology is described. This technology can also be used to etch features in silicon carbide and gallium nitride having near vertical sidewalls. The disclosed method has application in the fabrication of electronics, microelectronics, power electronics, Monolithic Microwave Integrated Circuits (MMICs), high-voltage electronics, high-temperature electronics, high-power electronics, Light-Emitting Diodes (LEDs), Micro-Electro-Mechanical Systems (MEMS), micro-mechanical devices, microelectronic devices and systems, nanotechnology devices and systems, Nano-Electro-Mechanical Systems (NEMS), photonic devices, and any devices and/or structures made from silicon carbide and/or gallium nitride.

Abstract: A time-of-flight pixel array comprises multiple pixel cells. The pixel cell comprises a light collection region, a light shielded region, and a deep trench isolation (DTI) structure that encircles the light collection region to prevent light from entering the light shielded region. Photogate in the light collection region is disposed above a photodiode to accumulate the photo-generated electrical charges. A doped region disposed near the photogate collects the attracted charges. The doped region extends to the light shielded region and transfers the collected charges to a floating diffusion through a shutter transistor also in the light shielded region. DTI or similar structures are deployed to the entire pixel array to prevent light from exchanging between different light collection regions and light from entering the light shielded regions of all pixel cells. Interference between the shielded regions of different pixel cells is also minimized.

Abstract: Some embodiments include a method in which a first semiconductor wafer and a second semiconductor wafer are bonded with each other. The first semiconductor wafer includes a memory cell array, and the second semiconductor wafer includes a circuit to access the memory cell array. After the bonding, contacts are formed to be associated with the first semiconductor wafer. The contacts are for electrical connections between the first and second semiconductor wafers. The contacts are linked with reference positions, with each of the contacts being linked with an associated one of the reference positions. Each of the contacts is shifted from its associated one of the reference positions to absorb a bonding alignment error between the first and second semiconductor wafers.

Abstract: A 3D semiconductor device, the device including: a first level including a single crystal layer, a first metal layer, a second metal layer above the first metal layer, and a third metal layer above the second metal layer, where the second metal layer is significantly thicker than either the third metal layer or the first metal layer, where the third metal layer is precisely aligned to the first metal layer with less than 20 nm misalignment; a second level including a first array of first memory cells, each of the first memory cells include first transistors; a third level including a second array of second memory cells, each of the second memory cells include second transistors, where the second level is above the third level, where the second transistors are self-aligned to the first transistors, being processed following the same lithography step; and periphery circuits connected by the second metal to control the memory cells, where the periphery circuits are either underneath or atop the memory cells.

Abstract: A panel is provided, including a first conductive pattern and a second conductive pattern. The first conductive pattern includes a first portion and a second portion; the second conductive pattern connects the first portion to the second portion, and an insulation pattern substantially covering a side surface of the second conductive pattern. The insulation pattern is formed by thermally treating a mask pattern of an insulation material. A horizontal distance between an outer side surface of the insulation pattern and an inner side surface adjacent to the second conductive pattern is less than 3 micrometers.

Abstract: A method for forming a semiconductor device structure is provided. The method includes depositing a gate dielectric layer over a substrate. The substrate has a base portion and a first fin portion over the base portion, and the gate dielectric layer is over the first fin portion. The method includes forming a gate electrode layer over the gate dielectric layer. The gate electrode layer includes fluorine. The method includes annealing the gate electrode layer and the gate dielectric layer so that fluorine from the gate electrode layer diffuses into the gate dielectric layer.

Abstract: A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.

Abstract: Integrated circuits and methods for overlap measure are provided. In an embodiment, an integrated circuit includes a plurality of functional cells including at least one gap disposed adjacent to at least one functional cell of the plurality of functional cells and a first overlay test pattern cell disposed within the at least one gap, wherein the first overlay test pattern cell includes a first number of patterns disposed along a first direction at a first pitch. The first pitch is smaller than a smallest wavelength on a full spectrum of humanly visible lights.

Abstract: A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors and at least one metal layer, where the at least one metal layer interconnecting the first transistors; a plurality of first logic gates including the at least one metal layer interconnecting the first transistors; a plurality of second transistors atop the at least one metal layer; a plurality of third transistors atop the second transistors; a top metal layer atop the third transistors; and a memory array including wordlines, where the memory array includes at least four rows by four columns of memory mini arrays, where each of the mini arrays includes at least four rows by four columns of memory cells, and where each of the memory cells includes at least one of the second transistors or at least one of the third transistors.

Abstract: A semiconductor device includes a semiconductor element, an internal electrode connected to the semiconductor element, a sealing resin covering the semiconductor element and a portion of the internal electrode, and an external electrode exposed from the sealing resin and connected to the internal electrode. The internal electrode includes a wiring layer and a columnar portion, where the wiring layer has a wiring layer front surface facing the back surface of the semiconductor element and a wiring layer back surface facing opposite from the wiring layer front surface in the thickness direction. The columnar portion protrudes in the thickness direction from the wiring layer front surface. The columnar portion has an exposed side surface facing in a direction perpendicular to the thickness direction. The external electrode includes a first cover portion covering the exposed side surface.

Abstract: An embodiment relates to a n-type planar gate DMOSFET comprising a Silicon Carbide (SiC) substrate. The SiC substrate includes a N+ substrate, a N? drift layer, a P-well region and a first N+ source region within each P-well region. A second N+ source region is formed between the P-well region and a source metal via a silicide layer. During third quadrant operation of the DMOSFET, the second N+ source region starts depleting when a source terminal is positively biased with respect to a drain terminal. The second N+ source region impacts turn-on voltage of body diode regions of the DMOSFET by establishing short-circuitry between the P-well region and the source metal when the second N+ source region is completely depleted.