Abstract: The present invention provides an evaluation aid which can be used as a phantom (imitation lesion) when a digital X-ray dynamic image thereof is taken and then evaluation is carried out through the digital X-ray dynamic image, and especially an evaluation aid which can be used for evaluating image qualities of a digital X-ray dynamic image for X-ray absorption parts having different X-ray absorption ratios, and an evaluation device provided with such an evaluation aid.

Abstract: There is disclosed a method of fabricating a smaller-sized multipole lens having polar elements that can be formed with high accuracy. The method starts with forming a first member (10) having a first yoke (14) formed integrally with first polar elements (12). A second member (20) having a second yoke (24) formed integrally with second polar elements (22) is formed. The first yoke (14) is made to overlap with the second yoke (24). The first member (10) and the second member (20) are held.

Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.

Abstract: There is provided a repair apparatus including a gas field ion source which includes an ion generation section including a sharpened tip, a cooling unit which cools the tip, an ion beam column which forms a focused ion beam by focusing ions of a gas generated in the gas field ion source, a sample stage which moves while a sample to be irradiated with the focused ion beam is placed thereon, a sample chamber which accommodates at least the sample stage therein, and a control unit which repairs a mask or a mold for nano-imprint lithography, which is the sample, with the focused ion beam formed by the ion beam column. The gas field ion source generates nitrogen ions as the ions, and the tip is constituted by an iridium single crystal capable of generating the ions.

Abstract: Apparatus for generating ultraviolet light and methods of operating an ultraviolet light source. The apparatus may include a microwave chamber (16) enclosing an interior space, a light source (10) with a lamp head (28) coupled to the microwave chamber (16), an ultraviolet (UV) transmissive member (88) positioned above the lamp face (32) and below the interior space to define a plenum (116) therebetween, and an exhaust system (100) coupled in fluid communication with the plenum. The lamp head (28) has a lamp face (32) through which ultraviolet light (34) and cooling air (30) are emitted. The UV transmissive member (88) is configured to transmit the ultraviolet light (34) into the interior space and to divert the cooling air (30) from the interior space. The exhaust system (100) configured to exhaust the cooling air (30) from the plenum (116).

Abstract: A plasma light source apparatus is provided. The plasma light source apparatus includes a chamber, a laser generating part, and a curved mirror. The chamber includes a plasma source gas for generating laser induced plasma. The laser generating part is spaced apart from the chamber and generates a hollow laser beam. The curved mirror is disposed between the chamber and the laser generating part. The curved mirror is configured to reflect and to condense the generated hollow laser beam into the chamber to generate the laser induced plasma in the chamber, and to reflect light emitted from the generated laser induced plasma.

Abstract: An extreme ultraviolet light system includes a target material delivery system configured to produce a target material; and a beam delivery system that is configured to receive an amplified light beam emitted from a drive laser system and to direct the amplified light beam toward a target location that receives the target material. The beam delivery system includes a final focus assembly that focuses the amplified light beam at a focal location to enable interaction between the amplified light beam and the target material to cause the target material to be converted into a plasma that emits extreme ultraviolet light. The final focus assembly includes at least one transmissive optical element having at least one curved surface through which the amplified light beam travels; and at least one reflective optical element having at least one curved surface on which the amplified light beam is reflected.

Abstract: A method and an apparatus for planning a treatment beam aimed at at least one target region are provided. Planning parameters having associated predetermined parameter values are for performing a treatment that is to be applied with the treatment beam. The method includes defining a first predetermined parameter value of the planning parameters that is suitable for the irradiation of a treatment region that includes at least one target region. The method also includes ascertaining, based on the first predetermined parameter value, a first probability distribution in relation to an optimizable variable that is prespecified based on deviations to be expected when carrying out the irradiation.

Abstract: A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.

Abstract: A droplet generation system for use with a laser produced plasma (LPP) extreme ultraviolet (EUV) source plasma chamber is described. During EUV generation, oscillations can occur as a function of droplet time-of-flight within the plasma chamber. To reduce these oscillations, a droplet controller adjusts the rate at which droplets are generated which, in turn, dictates the droplet time-of-flight. The droplets are a result of coalescence of generated microdroplets such that the rate at which the droplets are generated is dictated by a frequency of a signal used to generate the microdroplets. This adjustment can be a modulation of a baseline droplet frequency. In some instances, the modulation function may be a sinusoid or implemented as a pseudo-random switch.

Abstract: A particle beam device, in particular an electron beam device, is provided having a beam generator for generating a primary particle beam, an objective lens for focusing the primary particle beam onto an object, and a detector for detecting particles emitted by the object. The objective lens has at least one magnetic unit, with the magnetic unit generating at least one first crossover and at least one second crossover. The first crossover is arranged in the objective lens or in a region between the objective lens and the object. The second crossover is arranged at the object. The device permits the examination of the object using particles which have a low energy, with good imaging properties. A method for operating the particle beam device is also provided.

Abstract: The present invention is related to an UV LED curing apparatus, and more particularly, to an UV LED curing apparatus with improved housing and switch controller. The light reflective inner casing is preferably provided as an effective UV light reflector and as a supporting substrate of the UV LED light source while being capable of transmitting heat from the UV LED light source away for further heat dissipation to the ambient by the outer casing. The outer casing is detachably attached to the inner casing and allows a greater user interaction for decorative and entertainment purposes while also being a protective and heat dissipation means.

Abstract: Imaging methods, apparatus and systems are provided for using different irradiation frequencies to generate a composite three-dimensional image. One exemplary method for imaging a semiconductor device involves irradiating the semiconductor device with a first frequency of electromagnetic radiation, obtaining a first radiation response from the semiconductor device in response to the first frequency of electromagnetic radiation, irradiating the semiconductor device with a second frequency of electromagnetic radiation, obtaining a second radiation response from the semiconductor device in response to the second frequency of electromagnetic radiation, and generating a composite image of the semiconductor device based at least in part on the first radiation response and the second radiation response.

Abstract: According to one embodiments, an ion source connected with a vacuum-exhausted downstream apparatus is provided. The ion source includes a vacuum chamber which is vacuum-exhausted, a target which is set in the vacuum chamber and generates ions by irradiation of a laser beam, a transportation unit which transports the ions generated by the target to the downstream apparatus, and a vacuum sealing unit which seals the transportation unit so as to separate vacuum-conditions of the vacuum chamber side and the downstream apparatus side before exchanging the target set in the vacuum chamber.

Abstract: The invention provides methods and apparatus for enhanced PCI and dual-use radiation imaging systems. In one implementation high resolution storage phosphor plate radiation detector (an area detector) is employed for conventional attenuation radiation imaging and/or PCI (including conventional PCI and coded aperture PCI). Slit and slot scan implementations for dual-use systems are introduced. Dedicated single and dual-use slit and slot scan system for conventional attenuation imaging and PCI are described that employ face-on or edge-on detectors. Slit and slot scan systems that employ area detectors are described. Edge-on, structured cell detector designs are described. Applications of edge-on structured cell detectors for CT, Nuclear Medicine, PET, and probe detectors are described.

Abstract: A transmissive lens in a charged particle beam column for detecting X-rays and light is provided. The final lens may include elements that are transmissive for X-rays for EDS imaging and analysis or elements that are transmissive for light for cathodoluminescent (CL) imaging and analysis. The final lens may be constructed and arranged to include elements that are transmissive for both X-rays and light for combined EDS and CL imaging and analysis.

Abstract: The application relates to a method for determining beam parameters of a charge carrier beam, a measuring device, and a charge carrier beam device. The charge carrier beam (4) from a charge carrier beam device (1) is guided, by means of a beam deflection unit (3), over a slit aperture arrangement which is provided in an aperture device (7) and which has one or more slit apertures (8). Measurement plane coordinates of the beam components that penetrate the slit aperture arrangement are determined. On the basis of the measurement plane coordinates, the aperture device automatically moves in such a way that a measuring aperture (9) arranged in the aperture device moves over a predefined measurement reference point. The beam parameter is measured by the measuring aperture. In a measuring device (5) suitable for carrying out said method, the slit aperture arrangement has at least two non-parallel slit aperture sections (12, 13, 15, 16) which can be part of a single continuous slit aperture.

Abstract: A target supply device may include a reservoir configured to hold a target material in its interior in liquid form, a vibrating element configured to apply vibrations to the reservoir, a target sensor configured to detect droplets of the target material outputted from the reservoir, a control unit configured to set parameters based on a result of the detection performed by the target sensor, a function generator configured to generate an electrical signal having a waveform based on the parameters, and a power source configured to apply a driving voltage to the vibrating element in accordance with the electrical signal.

Abstract: A charged particle beam apparatus including a column irradiating a sample with a charged particle beam, a detector detecting a secondary particle emitted from the sample, an image data generating section generating image data indicating two-dimensional distribution of an amount of the secondary particle detected by the detector, and a controller that respectively sets first and second position adjustment irradiation frames for first and second beam condition on a surface of the sample in the image data, form a first and second irradiation traces by respectively irradiating the first and second position adjustment irradiation frames with the charged particle beams of the first and second beam conditions, correct a position of the second processing irradiation frame, based on a position displacement amount between a predetermined position of the first irradiation trace and a predetermined position of the second irradiation trace.

Abstract: A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.