Abstract: A method for sawing a semiconductor wafer is provided. The method includes sawing the semiconductor wafer with a first dicing blade to form a first opening. The semiconductor wafer includes a dicing tape and a substrate attached to the dicing tape. The first opening is formed in the upper portion of the substrate. The method also includes sawing the semiconductor wafer with a second dicing blade from the first opening to form a second opening under the first opening and in the middle portion of the substrate. The method further includes sawing the semiconductor wafer with a third dicing blade from the second opening to form a third opening under the second opening and penetrating the lower portion of the substrate, so that the semiconductor wafer is divided into two dies. The first dicing blade, the second dicing blade, and the third dicing blade have different widths.

Abstract: In a method of manufacturing a semiconductor device, a sacrificial gate structure including sacrificial gate electrode is formed over a substrate. A first dielectric layer is formed over the sacrificial gate structure. A second dielectric layer is formed over the first dielectric layer. The second and first dielectric layers are planarized and recessed, and an upper portion of the sacrificial gate structure is exposed. A third dielectric layer is formed over the exposed sacrificial gate structure and over the first dielectric layer. A fourth dielectric layer is formed over the third dielectric layer. The fourth and third dielectric layers are planarized, and the sacrificial gate electrode is exposed and part of the third dielectric layer remains on the recessed first dielectric layer. The recessing the first dielectric layer comprises a first etching operation and a second etching operation using a different etching as from the first etching operation.

Abstract: A semiconductor device includes a bottom electrode, a top electrode, a sidewall spacer, and a data storage element. The sidewall spacer is disposed aside the top electrode. The data storage element is located between the bottom electrode and the top electrode, and includes a ferroelectric material. The data storage element has a peripheral region which is disposed beneath the sidewall spacer and which has at least 60% of ferroelectric phase. A method for manufacturing the semiconductor device and a method for transforming a non-ferroelectric phase of a ferroelectric material to a ferroelectric phase are also disclosed.

Abstract: A power module, a manufacturing method, and a mold are disclosed. The power module includes a circuit substrate, a terminal assembly, and a package body. A surface of the circuit substrate is provided with at least one semiconductor component, each terminal assembly includes a terminal rack and a terminal inserted onto the terminal rack, and each terminal rack is disposed on the surface of the circuit substrate and has an insert surface and provided for passing each terminal through the insert surface into the terminal rack for combination. The package body is installed on the circuit substrate to package the semiconductor component and has an external surface substantially aligned with the insert surface of each terminal rack, or the insert surface protruding from the external surface, to make each terminal protrude out from the package body.

Abstract: An integrated circuit layout includes an upper active region comprising a first edge and a second edge extending along a first direction and respectively adjacent to an upper cell boundary by a distance D3 and a distance D4. A first gate line is disposed on the upper active region, extends along a second direction, and protrudes from the first edge by a length L3. A second gate line is disposed on the upper active region, extends along the second direction, and protrudes from the second edge by a length L4. Two dummy gate lines respectively extend along the second direction and are disposed at two sides of the upper active region and away from the upper cell boundary by a distance S. The first direction and the second direction are perpendicular. The distances D3, D4, S and the lengths L3 and L4 have the relationships: L3?D3?S, L4?D4?S, and D3?D4.

Abstract: A nitride-based semiconductor device includes a first and a second nitride-based semiconductor layers, a source electrode, a gate electrode, and a drain structure. The drain structure includes a first doped nitride-based semiconductor layer, an ohmic contact electrode, and a conductive layer. The first doped nitride-based semiconductor layer is in contact with the second nitride-based semiconductor layer to form a first contact interface. The ohmic contact electrode is in contact with the second nitride-based semiconductor layer to form a second contact interface. The conductive layer includes metal and in contact with the second nitride-based semiconductor layer to form a metal-semiconductor junction therebetween. The conductive layer is connected to the first doped nitride-based semiconductor layer and the ohmic contact electrode, and the ohmic contact interface is farther away from the gate electrode than the first contact interface and the second contact interface.

Abstract: A sampling device is provided, including: a syringe barrel having an opening and a holding portion; a plunger body having a protruding wall and disposed in the syringe barrel through the opening, where the protruding wall has a first recessed portion; a spring disposed around the plunger body; and a fastening assembly having an engaging structure for engaging the fastening assembly with the holding portion, a groove rail for receiving the protruding wall of the plunger body and a fastening portion for limiting displacement of the plunger body. A semi-automatic sample feeding device is further provided and includes the sampling device and a flow control device, and a test paper detection system is also provided and includes the semi-automatic sample feeding device and a test paper device. The test paper detection system is able to stably introduce samples, suitable for large-volume samples, which meets the needs of point-of-care applications.

Abstract: A method, for making a semiconductor device, includes forming a first fin over a substrate. The method includes forming a dummy gate stack on the first fin. The method includes forming a first gate spacer along a side of the dummy gate stack. The first gate spacer includes a first dielectric material. The method includes forming a second gate spacer along a side of the first gate spacer. The second gate spacer includes a semiconductor material. The method includes forming a source/drain region in the first fin adjacent the second gate spacer. The method includes removing at least a portion of the second gate spacer to form a void extending between the first gate spacer and the source/drain region.

Abstract: An image arrangement method and an image processing system are disclosed. In the method, a video stream is decoded into one or more frames of image. The image is buffered in a message queue. The message queue is defined as a first topic. The image in the message queue is transmitted according to a subscribed target of the first topic. Accordingly, the computation burden may be reduced, and the operation efficiency of multiple models may be improved.

Abstract: A method for efficiently waking up ferroelectric memory is provided. A wafer is formed with a plurality of first signal lines, a plurality of second signal lines, a plurality of third signal lines, and a plurality of ferroelectric memory cells that constitute a ferroelectric memory array. Each of the ferroelectric memory cells is electrically connected to one of the first signal lines, one of the second signal lines and one of the third signal lines. Voltage signals are simultaneously applied to the first signal lines, the second signal lines and the third signal lines to induce occurrence of a wake-up effect in the ferroelectric memory cells.

Abstract: A method for forming a semiconductor device structure is provided. The method includes providing a substrate and an insulating layer over the substrate. The method includes depositing a gate dielectric layer over the insulating layer and in the wide trench and the narrow trench using an atomic layer deposition process. The method includes forming a gate electrode layer over the gate dielectric layer. The method includes removing the gate dielectric layer and the gate electrode layer outside of the wide trench and the narrow trench.

Abstract: An optical module includes a housing, a plurality of active optical components and a path changer component. The housing has an airtight chamber. The active optical components are provided in the airtight chamber. The path changer component is provided in the airtight chamber, and the path changer component is configured to change an optical path of at least one of the active optical components.

Abstract: A wrench includes a function end having an extension portion extending therefrom. Two arms extend from the function end and toward a direction opposite to the extension portion. A space is formed between the two arms and the extension portion. An engaging portion is formed to the distal end of the extension portion for receiving a hand tool. A rotary head is pivotably located in the space of the function end by two bolts respectively extending through the two arms and connected to the rotary head. The rotary head includes an outer part and a control unit which is located in a through hole defined through the outer ring. The control unit includes a control part and a driving part respectively located on two opposite end of the rotary head. The control part is rotated to control the direction that the driving part rotates.

Abstract: A power conversion circuit, a power conversion system, a power source and a method and a device of controlling the same are provided. The power conversion circuit includes an AC/DC rectifier circuit, a DC/DC conversion circuit and an energy storing circuit coupled between the AC/DC rectifier circuit and the DC/DC conversion circuit. The energy storing circuit includes a first capacitor, a second capacitor and a switch. The first capacitor and the second capacitor are coupled in series. The switch is coupled in parallel with the second capacitor. The switch is configured to turn on when the output voltage of the AC/DC rectifier circuit is smaller than or equal to a threshold value; and turn off when the output voltage of the AC/DC rectifier circuit is larger than the threshold value, wherein the threshold value is smaller than or equal to the rated voltage of the first capacitor.

Abstract: To reduce the occurrence of current alarms in a semiconductor etching or deposition process, a controller determines an offset in relative positions of a cover ring and a shield over a wafer within a vacuum chamber. The controller provides a position alarm and/or adjusts the position of the cover ring or shield when the offset is greater than a predetermined value or outside a range of acceptable values.

Abstract: In an embodiment, a workstation includes: a processing chamber configured to process a workpiece; a load port configured to interface with an environment external to the workstation; a robotic arm configured to transfer the workpiece between the load port and the processing chamber; and a defect sensor configured to detect a defect along a surface of the workpiece when transferred between the load port and the processing chamber.

Abstract: Systems and methods for detecting cracks in a surface by analyzing a video, including an full-HD video, of the surface. The video contains successive frames, wherein individual frames of overlapping consecutive pairs of the successive frames have overlapping areas and a crack that appears in a first individual frame of a consecutive pair of the successive frames also appears in at least a second individual frame of the consecutive pair. A fully convolutional network (FCN) architecture implemented on a processing device is then used to analyze at least some of the individual frames of the video to generate crack score maps for the individual frames, and a parametric data fusion scheme implemented on a processing device is used to fuse crack scores of the crack score maps of the individual frames to identify cracks in the individual frames.

Abstract: An integrated circuit device has an RRAM cell that includes a top electrode, an RRAM dielectric layer, and a bottom electrode having a surface that interfaces with the RRAM dielectric layer. Oxides of the bottom electrode are substantially absent from the bottom electrode surface. The bottom electrode has a higher density in a zone adjacent the surface as compared to a bulk region of the bottom electrode. The surface has a roughness Ra of 2 nm or less. A process for forming the surface includes chemical mechanical polishing followed by hydrofluoric acid etching followed by argon ion bombardment. An array of RRAM cells formed by this process is superior in terms of narrow distribution and high separation between low and high resistance states.

Abstract: A flash memory and an erase method thereof are provided. The flash memory includes at least a memory array and a memory control circuit. The memory control circuit biases plural word lines, a common source line and a global bit line included in the memory array to erase plural memory cells in the flash memory. The method comprises grouping the plural word lines into plural word line groups according to erase depths corresponding to each word line; generating an erase voltage and plural multiple-step word line erase voltages; applying the erase voltage from at least one of the common source line and the global bit line; and during a period when the erase voltage is applied, the plural multiple-step word line erase voltages is respectively applied to the plural word line groups, wherein the plural multiple-step word line erase voltages is one-by-one corresponding to the plural word line groups.

Abstract: Methods for programming memory cells of a resistive memory device include applying a voltage pulse sequence to a memory cell to set a logic state of the memory cell. An initial set sequence of voltage pulses may be applied to the memory cell, followed by a reform voltage pulse having an amplitude greater than the amplitudes of the initial set sequence, and within ±5% of the amplitude of a voltage pulse used in an initial forming process. Additional voltage pulses having amplitudes that are less than the amplitude of the reform voltage pulse may be subsequently applied. By applying a reform voltage pulse in the middle of, or at the end of, a memory set sequence including multiple voltage pulses, a resistive memory device may have a larger memory window and improved data retention relative to resistive memory devices programmed using conventional programming methods.