Abstract: A process for forming vertical contacts in the manufacture of integrated circuits, and devices so manufactured. The process eliminates the need for precise mask alignment and allows the etch of the contact hole to be controlled independent of the etch of the interconnect trough. The process includes the steps of: forming an insulating layer on the surface of a substrate; forming an etch stop layer on the surface of the insulating layer; forming an opening in the etch stop layer; etching to a first depth through the opening in the etch stop layer and into the insulating layer to form an interconnect trough; forming a photoresist mask on the surface of the etch stop layer and in the trough; and continuing to etch through the insulating layer until reaching the surface of the substrate to form a contact hole. The above process may be repeated one or more times during the formation of multi-level metal integrated circuits.

Abstract: A method for depositing a rough polysilicon film on a substrate is disclosed. The method includes introducing the reactant gases argon and silane into a deposition chamber and enabling and disabling a plasma at various times during the deposition process.

Abstract: In accordance with the present invention, there is provided a method for fabricating a contact on an integrated circuit, such as a DRAM. The method includes the following steps. A gate stack is formed on the integrated circuit. A spacer is formed on sidewalls of the gate stack. An insulating film is formed on the integrated circuit. The insulating film is planarized. Finally, a gate contact opening is formed through the planarized insulating film. In one embodiment, the gate contact opening is formed by removing the insulator, spacer and insulating film by etching. In this embodiment, the insulator, spacer and insulating film are etched at substantially similar rates. As a result, the integrated circuit is tolerant of mask misalignments, and does not over-etch field oxide or create silicon nitride slivers. In another embodiment, the planarizing step is performed with chemical mechanical planarization to form a substantially flat topography on the surface of the integrated circuit.

Abstract: An automated bank teller machine (ATM) is provided which is characteristically easy to configure, regardless of whether a replenish-from-the-front (RFTF) configuration or a replenish-from-the-rear (RFTR) configuration is chosen. In particular, the ATM according to the present invention includes a security chest module, a top module, and an interface module. These components are common to both configurations can be built and stored in advance, and can be thereafter configured as desired. In another embodiment, an ATM is provided that permits more than one customer to use the ATM at the same time.

Abstract: Apparatus having titanium silicide and titanium formed by chemical vapor deposition (CVD) in a contact. The chemical vapor deposition includes forming titanium silicide and/or titanium by combining a titanium precursor in the presence of hydrogen, H2. The chemical vapor deposition may further include forming titanium silicide and/or titanium by combining titanium tetrachloride, TiCl4, in the presence of hydrogen. The chemical vapor deposition may further include forming titanium silicide and/or by combining tetradimethyl amino titanium, Ti(N(CH3)2)4, in the presence of hydrogen. For production of titanium silicide, reaction of the titanium precursor may occur with a silicon precursor or a silicon source occurring as part of the contact. Use of a silicon precursor reduces depletion of a silicon base layer in the contact.

Abstract: The present invention is an endpoint detector and a method for quickly and accurately measuring the change in thickness of a wafer in chemical-mechanical polishing processes. The endpoint detector has a reference platform, a measuring face, and a distance measuring device. The reference platform is positioned proximate to the wafer carrier, and the reference platform and measuring device are positioned apart from one another by a known, constant distance. The measuring face is fixedly positioned with respect to the wafer carrier at a location that allows the measuring device to engage the measuring face when the wafer is positioned on the reference platform. Each time the measuring device engages the measuring surface, it measures the displacement of the measuring face with respect to the measuring device. The displacement of the measuring face is proportional to the change in thickness of the wafer between measurements.

Abstract: A method of forming complementary type conductive regions on a substrate includes, a) providing a first etch stop layer over a substrate; b) etching a void through the first etch stop layer inwardly towards the substrate; c) providing a first conductive layer of a first conductive material over the first etch stop layer and into the void; d) removing the first conductive layer over the first etch stop layer to eliminate all first conductive material from atop the first etch stop layer, and leaving first conductive material in the void; e) removing the remaining first etch stop layer from the substrate thereby defining a remaining region of first conductive layer; f) providing a second conductive layer of a second conductive material over the substrate and remaining first conductive layer region; and g) removing the second conductive layer over the first conductive layer to eliminate all second conductive material from atop the first conductive layer, and leaving second conductive material atop the substrate w

Abstract: A method of hierarchical LDAP wildcard searching in an LDAP directory service having a relational database management system (DBMS) as a backing store. The relational database normally includes a forward index of the character strings in the database. The method begins by generating a reverse index of the character strings in the relational database. Depending on the position of one or more wildcards in the string, the forward index, the reverse index, or both indices, are used to generate the relational database query.

Abstract: A method and apparatus for URL alias mechanism is implemented. A user-defined alias is associated with a URL. Aliases and the URL to which each corresponds are contained in a file accessible by a web browser. In response to the entry of an alias during a browsing session, the web browser retrieves the associated URL from the alias file, and accesses the corresponding web page. The alias file may be generated in response to a preference selection in the web browser, and in response to the user selecting to edit the file.

Abstract: A vertical diode is provided having a diode opening extending through an insulation layer and contacting an active region on a silicon wafer. A titanium silicide layer covers the interior surface of the diode opening and contacts the active region. The diode opening is initially filled with an amorphous silicon plug that is doped during deposition and subsequently recrystallized to form large grain polysilicon. The silicon plug has a top portion that is heavily doped with a first type dopant and a bottom portion that is lightly doped with a second type dopant. The top portion is bounded by the bottom portion so as not to contact the titanium silicide layer. For one embodiment of the vertical diode, a programmable resistor contacts the top portion of the silicon plug and a metal line contacts the programmable resistor.

Abstract: A memory bar for use in high density memory modules. A memory bar comprises a substrate that provides a mounting for at least two IC chips, such that the substrate and associated IC chips may be mounted, for example, on one side of a memory module.

Abstract: A semiconductor processing method of forming a contact opening to a region adjacent a field isolation mass includes, a) forming a field isolation mass within a semiconductor substrate by a trench and refill technique, and a substrate masking layer over the substrate adjacent the field isolation mass, the field isolation mass being capped with an etch stop cap, the field isolation mass having a sidewall covered by the masking layer; b) removing the substrate masking layer away from the isolation mass to expose at least a portion of the isolation mass sidewall; c) forming an etch stop cover over the exposed isolation mass sidewall; d) forming an insulating layer over the isolation mass and substrate area adjacent the isolation mass; and e) etching a contact opening through the insulating layer to adjacent the isolation mass selectively relative to the isolation mass etch stop cap and cover. A semiconductor structure is also described.

Abstract: Text-to-speech based reminder system. One or more servers within a communication network include hardware and software which allows the system to direct the collection of data about reminder, the translation of the reminder from text-to-speech, and the forwarding of the reminder to a recipient via an appropriate delivery method. The invention makes use of delivery methods such as e-mail, voicemail, or an existing telephone connection to communicate the speech reminder to a recipient. The recipient need not view a display screen to understand the content of the reminder, and needs no locally installed reminder software.

Abstract: The invention encompasses a semiconductor processing method of depositing polysilicon. A substrate is provided. The substrate comprises a first material and a second material which join at a junction, and which are different from one another. The substrate is exposed to a SiH4-comprising source gas to form a nucleation layer consisting of Si. After the exposing, a polysilicon layer is chemical vapor deposited atop the nucleation layer.

Abstract: A method is provided for forming a contact in an integrated circuit by chemical vapor deposition (CVD). In one embodiment, a titanium precursor and a silicon precursor are contacted in the presence of hydrogen, to form titanium silicide. In another embodiment, a titanium precursor contacts silicon to form to form titanium silicide.

Abstract: Disclosed is a container capacitor structure and method of constructing it. An etch mask and etch are used to expose portions of an exterior surface of electrode ("bottom electrodes") of the container capacitor structure. The etch provides a recess between proximal pairs of container capacitor structures, which recess is available for forming additional capacitance. Accordingly, a capacitor dielectric and a top electrode are formed on and adjacent to, respectively, both an interior surface and portions of the exterior surface of the first electrode. Advantageously, surface area common to both the first electrode and second electrodes is increased over using only the interior surface, which provides additional capacitance without a decrease in spacing for clearing portions of the capacitor dielectric and the second electrode away from a contact hole location.

Abstract: An erosion gauge tool for measuring the erosion of a movable contact in a circuit breaker having a stationary contact and movable contact, both of which are sealed in a housing. The movable contact is coupled to a drive insulator. An erosion mark is etched on the housing adjacent to the drive insulator. The erosion gauge tool has a handle, a tab, and a pointer. The tab is adapted to rest on the drive insulator. The pointer is disposed adjacent to erosion mark when said tab is resting on said drive insulator. As the moveable contact erodes, the pointer moves closer to the erosion mark. The erosion gauge is sized to indicate when the moveable contact needs to be replaced, e.g. when the pointer is immediately adjacent to or above the erosion mark.

Abstract: An ovonic phase-change semiconductor memory device having a reduced area of contact between electrodes of chalcogenide memories, and methods of forming the same. Such memory devices are formed by forming a tip protruding from a lower surface of a lower electrode element. An insulative material is applied over the lower electrode such that an upper surface of the tip is exposed. A chalcogenide material and an upper electrode are either formed atop the tip, or the tip is etched into the insulative material and the chalcogenide material and upper electrode are deposited within the recess. This allows the memory cells to be made smaller and allows the overall power requirements for the memory cell to be minimized.

Abstract: A method of treating or preventing neoplastic disease and a method of preventing transformation of a normal cell into a tumor cell by mutated ras activities, utilizing a compound of formula I are disclose.

Abstract: The present invention is a process for providing a planarized transistor gate on a non-planar starting substrate, by depositing a layer of planarized conductive polysilicon material overlying neighboring field oxide isolation regions such that the height of the conductive polysilicon material extends above the topology topography of the field oxide isolation regions; depositing a layer of conductive silicide material superjacent and coextensive the conductive polysilicon material; and then patterning the planarized conductive polysilicon material and the conductive silicide material thereby forming the planarized transistor gate.