MICROSTRUCTURE SYNTHESIS BY FLOW LITHOGRAPHY AND POLYMERIZATION
In a method for synthesizing polymeric microstructures, a monomer stream is flowed, at a selected flow rate, through a fluidic channel. At least one shaped pulse of illumination is projected to the monomer stream, defining in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream by the illumination pulse. An article of manufacture includes a non-spheroidal polymeric microstructure that has a plurality of distinct material regions.
Latest MASSACHUSETTS INSTITUTE OF TECHNOLOGY Patents:
- ENGINEERED DCAS9 WITH REDUCED TOXICITY AND ITS USE IN GENETIC CIRCUITS
- LUNG PROTEASE NANOSENSORS AND USES THEREOF
- METHODS FOR ANALYZING T CELL RECEPTORS AND B CELL RECEPTORS
- System, method, and apparatus for reducing power dissipation of sensor data for bit-serial communication
- Multifocal imaging systems and method
This application claims the benefit of U.S. Provisional Application No. 60/730,052, filed Oct. 25, 2005, the entirety of which is hereby incorporated by reference.
This application claims benefit as a Divisional Continuation of application Ser. No. 11/586,197, filed Oct. 25, 2006 under 35 U.S.C. §121.STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH
This invention was made with Government support under Contract No. CTS-0304128 awarded by NSF. The Government has certain rights in the invention.BACKGROUND OF INVENTION
This invention relates generally to polymer materials, and more particularly relates to techniques for synthesizing polymeric microstructures.
Polymeric microstructures are important for a wide range of applications, including MEMS, biomaterials, drug delivery, self-assembly, and other applications. The ability to controllably synthesize such microstructures, herein defined as structures having features in the size range of about 10 nm to about 1000 μm, is increasingly significant for enabling applications such as paints, rheological fluids, catalysis, diagnostics, and photonic materials. Monodisperse polymeric microstructures, herein defined as having a microstructure size distribution where >90% of the distribution lies within 5% of the median microstructure size, are particularly desirable as they can exhibit a constant and predictable response to external fields and can self-assemble in a predictable manner.
Conventionally, polymer microstructure synthesis is carried out by a batch process such as photolithography, stamping, or emulsion polymerization, or by an emulsion-based microfluidic technique such as flow-through microfluidic synthesis. Although these techniques have provided significant advances in microstructure synthesis, it is found in general that each limits microstructure composition and/or geometry. For example, photolithographic techniques generally limit the microstructure material to that which is compatible with a photolithographic process, e.g., requiring a photoresist as the structural material. Historically, the synthesis of polymeric microstructures with microfluidics has focused almost exclusively on spheroidal microstructures, in part because the minimization of microstructure interfacial energy leads to the formation of spheres or deformations of spheres such as rods, ellipsoids or discs, or cylinders.
In addition to these limitations in polymeric microstructure composition and geometry, conventional polymeric microstructure synthesis generally requires isotropic structural arrangements of materials. Further, the through-put of such processes is typically limited by a requirement for making one structure at a time or a limited photo-mask-defined, field of structures at a time. These limitations in polymeric microstructure synthesis through-put, microstructure geometry, morphology, and functionality have restricted the ability to address the growing number of critical applications for which polymeric microstructures could be well suited.SUMMARY OF THE INVENTION
The invention overcomes the limitations of conventional polymeric microstructure synthesis to provide lithographic-based microfluidic microstructure synthesis techniques that can continuously synthesize polymeric microstructures of varied complex shapes and chemistries. In one example polymeric microstructure synthesis method of the invention, a monomer stream is flowed at a selected flow rate through a fluidic channel; and at least one shaped pulse of illumination is projected to the monomer stream. This illumination projection defines in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream by the illumination pulse.
In a further example synthesis process provided by the invention, a monomer stream is flowed at a selected flow rate, through a fluidic channel and illumination is projected to the monomer stream to polymerize at least one microstructure in the monomer stream by the illumination. At least one polymerization termination species is provided, at internal walls of the fluidic channel, which terminates at the channel walls active polymerization sites at which polymerization could occur during polymerization of the microstructure. This quenches polymerization at those sites and preserves a non-polymerized volume of the monomer stream adjacent to the channel walls.
This high-throughput technique enables superior control over microstructure geometry, shape, composition, and anisotropy. Non-spheroidal polymeric microstructures each having a plurality of distinct material regions can be synthesized by the technique, as can planar polymeric microstructures each having a plurality of distinct material regions. Other features and advantages of the invention will be apparent from the following description and accompanying figures, and from the claims.
The monomer stream 15 can include a range of constituents, as explained in detail below. At least one of the constituents is provided as a liquid-phase monomer that can be polymerized by a selected polymerization process, e.g., photo-polymerization, thermal polymerization, or other process. In the example system of
At one or more points along the microfluidic device is provided stimulation for enabling the formation and polymerization of microstructures in the monomer stream. For the example of
The polymerizing radiation is shaped in correspondence with desired polymeric microstructure shapes. For example, interposed between the illumination source and the microfluidic device can be provided one or more lithographic masks or other lithographic system for shaping the illumination. In the example of
A lens system 22 can be interposed between the lithographic mask and the microfluidic device if desired for controlling magnification, focus, or other aspect of the illumination 17 directed through the mask. The illumination exits the lens system and is directed to the microfluidic device. In accordance with the invention, the illumination is temporally controlled to provide pulses of illumination of a selected duration. A shutter 23 or other mechanism for controlling the duration of illumination is preferably provided in a suitable configuration with the lens system 22 and illumination source 16. The duration of each illumination pulse is set based on the flow rate of the monomer stream, the polymerizing characteristics of the monomers in the stream, and the desired shape of a microstructure. As explained in detail below, the flow rate of the monomer stream is also controlled, and can be stopped, in coordination with the temporal control of the illumination. The illumination pulses can be provided as a sequence of pulses, each of a selected duration, or as a single long-duration pulse, as-prescribed for a given application.
Referring also to
Referring now back to
As stated above, flow of the monomer stream can be controlled in a coordinated manner with the illumination exposure to in turn control characteristics of the microstructure polymerization. The flow rate and exposure duration are preferably together selected such that there is sufficient dwell time of a given volume of the monomer stream at the site of illumination exposure for substantially full polymerization of mask-defined microstructures in the stream. If desired, the monomer stream flow can be substantially stopped in coordination with illumination pulse exposure. With continuous monomer stream flow, a high synthesis through-put, e.g., 100 microstructures per second, can be achieved. Such can further be enhanced with the inclusion of multiple illumination points along the length of the microfluidic device, in the manner described above, and by increasing the illumination area and the corresponding number of microstructure shapes projected to the increased area.
As shown in
The synthesized microstructures can be rinsed in the reservoir or, e.g., pipetted into another container for rinsing. For example, the monomer stream including the microstructure population can be pipetted from the reservoir into an eppendorf tube, suspended in a buffer with a surfactant to prohibit agglomeration, and centrifuged to retrieve the microstructure population from the monomer stream. The microstructure population can then be employed for a selected application.
The ability of the monomer stream to conduct the polymerized microstructures through and out of the microfluidic device is enabled in accordance with the invention by preserving a non-polymerized volume of the stream at the location of the walls of the microfluidic device as well by the unpolymerized stream volume between microstructures, at locations that were masked from the polymerizing illumination. Preservation of a non-polymerized volume of the stream at the location of the device walls prohibits polymerization from extending to the walls of the device and inhibits adhesion of polymerized microstructures to the device walls. In general, in accordance with the invention, this is achieved by providing at the internal faces of the microfluidic device walls a species that can participate in a polymerization termination step; i.e., a species that can react to terminate active polymerization sites at which polymerization could occur, such that polymerization is quenched at those sites near to the device walls.
The selected polymerization termination species can be provided at the internal walls of the microfluidic device in any convenient manner suited for a given application. For example, the polymerization termination species can be directed to pass through the hollow cross-sectional channel of the microfluidic device at the walls of the device, as described in more detail below. Alternatively, the polymerization termination species can be provided by diffusion of the species through the microfluidic device walls from the ambient to the internal wall faces. For many applications, this arrangement can be particularly convenient and elegantly simple to implement; all that is required is that the microfluidic device be provided as a material that is sufficiently porous to enable diffusion of the selected termination species while sufficiently solid to contain the monomer stream in the device.
In one example of polymerization termination species diffusion through the microfluidic device walls, the termination species is specified as ambient oxygen and the monomer to be polymerized is specified as a free-radical-polymerization monomer, e.g., the PEG-DA monomer described above, with the 2-hydroxy-2-methyl-1-phenyl-propan-1-one photoinitiator described above. The microfluidic device is here formed of PDMS, as described above, which is porous to oxygen, or is formed of another suitable oxygen-permeable material, such as Mylar, polyurethane, polyethelene, polychlorophene, mercapto ester-based resins, e.g., Norland 60, from Norland Optical Products, Inc., New Brunswick, N.J., porous Tygon® tubing from Saint-Gobain Performance Plastics, Mickleton, N.J., or other material.
When a PEG-DA-based monomer stream passing through the PDMS device is exposed to a pulse of UV illumination, the 2-hydroxy-2-methyl-1-phenyl-propan-1-one photoinitiator forms free radicals, some of which are passed to the PEG-DA monomer for initiating polymerization of the PEG-DA monomer. Oxygen diffusing through the PDMS walls of the microfluidic device reacts with these free radicals to terminate the molecular free-radical sites, both on the initiator species and on the monomer. The free-radical sites are thereby converted to chain-terminating peroxide radicals. Polymer chain growth is then inhibited, or quenched, at the converted sites.
Near to the internal faces of the PDMS device walls, this polymerization termination process continues as oxygen is consumed in the chain-terminating conversion of free-radical sites in the monomer stream near to the device walls, causing more oxygen to diffuse through the device walls. This results in the formation of a thin un-crosslinked, non-polymerized lubricating monomer layer at the microfluidic device walls. The lubricating monomer layer provides a volume of continuous-phase monomer stream through which polymerized microstructures can advect and prohibits adhesion of the microstructures to the device walls.
With this oxygen-aided polymerization inhibition technique, the invention provides a discovery that free-radical polymerization termination, which is typically considered to be a hindrance for most applications, can be exploited and controllably enforced to enable polymerization directly in a continuous phase monomer stream with polymerization inhibited at edges of the monomer stream and non-polymerized monomer preserved for transporting polymerized microstructures dispersed in the monomer steam. The example oxygen-based termination process is applicable to any free-radical polymerization system. For example, monomers such as 1,1,1-tri(methyl propane triacrylate), 1,6-hexanediol diacrylate, and poly(ethylene glycol) dimethacrylate, among others, as identified in detail below, can be employed, with photoinitiators such as DMPA or IRGACURE 184 (1-Hydroxy-cyclohexyl-phenyl-ketone), from Ciba Specialty Chemicals, Tarrytown, N.Y.
The thickness of the non-polymerized lubricating monomer layer at the microfluidic device walls is set by the concentration of species in the monomer stream for which free radicals are generated by the lithographic illumination, by the local intensity of the illumination, and by the degree of terminating species, e.g., oxygen flux, through the device walls. In addition, it is to be recognized that each polymerization chemistry is characterized by distinctive reaction kinetics that adjust free radical concentration in a monomer stream. Thus, for many applications, empirical analysis can be preferred to determine process parameters that provide a sufficient lubricating monomer layer. For many applications, a lubricating layer thickness of between about 1 μm and about 5 μm is sufficient to prohibit microstructure adhesion to walls as the microstructures are carried out of the microfluidic device.
The polymerization termination process of the invention can be implemented with a range of polymer chemistries and terminating species. For example, free-radical terminating species such as HQ (hydroquinone) or MEHQ (monomethyl ether hydroquinone) and suitably permeable device materials can be used to terminate free-radical species in the microstructure polymerization process. In addition, a range of free-radical polymerization-initiating species can be employed in a polymerization that is not necessarily photo-initiated. For example, thermally-activated free-radical initiators, e.g. 2,2′-Azobis(2-methylpropionitrile), can be used with an appropriate heat source, e.g. laser illumination or patterned conducting electrodes, to create free-radicals for free-radical-based polymerization; oxygen or other terminating species being employed to prohibit polymerization at the microfluidic device walls.
The process is further not limited to free-radical termination. For example, given the photoresist SU-8, which is based on EPON SU-8 epoxy from Shell Chemical, NY, N.Y., as a polymerizing species in the monomer stream, termination of SU-8 polymerization at the microfluidic device sidewalls can be implemented with a selected base species, such as 3-ethylamine, 3-octylamine, or other suitable base that quenches SU-8 polymerization. The selected base species can be provided to the monomer stream at internal faces of the microfluidic device sidewalls by diffusion through the sidewalls, given a suitable porosity in the sidewalls. For example, a device of PDMS or other suitable porous material can be employed for diffusing a liquid base or other liquid species through the device. Here the device can be initially saturated with the selected liquid species, with the liquid continuously supplied to the outer surface of the device, e.g., in a bath arrangement, to replenish the liquid as it is consumed within the microfluidic device.
Given an arrangement in which a terminating species is supplied to internal faces of the microfluidic device walls by diffusion through the walls, the material of the microfluidic device is preferably sufficiently permeable to the terminating species of interest. For example, for the terminating species oxygen, the device walls preferably have an O2 gas permeability of at least about 10 barrer. For the terminating species of a selected liquid, the device walls preferably have a liquid permeability of about 10 barrer.
The microfluidic device can be polymeric, as in the example materials described above, or can be non-polymeric. For example, glass microfluidic device walls, with suitable nano-scale holes for permeability of a selected terminating species, can be employed. Microfluidic device walls can also be provided as, e.g., track-etched membranes, and other structures, including, e.g., porous silica substrates or other inorganic structures, such as glass slides. It is not required that all walls be permeable, but it is preferred that those walls exposed to a polymerizing agent, such as illumination, be permeable to a selected terminating species for enabling termination of polymerization at those walls. Of course, as explained above, the one or more walls through which illumination is directed to a monomer stream are preferably substantially transparent to the illumination wavelength, and illumination can be directed through multiple device walls for inducing polymerization termination at those walls.
In accordance with the invention, a terminating species can also be introduced into the monomer stream flow channel along with the monomer stream instead of diffusing into the channel through the microfluidic device walls. In one example arrangement of such, an annular sheath flow of fluid containing a selected terminating species is provided at the microfluidic device channel inlet to enclose an inner cylindrical flow of the monomer stream. In another example arrangement, two fluids with different wetting properties are introduced at a Y-junction input to the channel, in a manner discussed in more detail below, such that the fluids flow parallel to each other. Process conditions can here be tuned such that the fluid containing the terminating species preferentially wets the surface walls of the device, leading to an enveloping of the monomer stream species to be polymerized.
Referring now also to
Referring now to
As shown in
As shown in
Now referring to
The shapes and feature geometries of
The correspondence between a mask shape and a resulting microstructure geometry is in part based on the lens system employed to implement the projection lithography of the single-step lithography-polymerization process. For many applications, it can be convenient to employ as the lens system an inverted microscope objective. In this example, the mask features' sizes are reduced by a factor that is dictated by the characteristics of the microscope objective and the other lenses in the system. Typically an additional lens is in the optical path between the field-stop slider and the objective of a microscope lens system. Then, for example, given a ×20 objective, a 7.8 times feature reduction results due to a 2.57× lens between the objective and the field-stop slider. In this case, a 350 μm-square mask feature results in synthesis of microstructure cuboids, i.e., rectangular parallelepiped objects, having 45 μm-long sides in the x-y plane, as defined in
The height of a microstructure in the z plane, as defined in
For many applications, the fundamental limitations of a projection lithographic technique like that of the example described above are set by the optical resolution and depth of field of the lens objective employed. The resolution of an objective herein is meant to refer to the smallest distinguishable feature that can be discerned, and the depth of field is herein meant to refer to the length over which a beam of light emanating from an objective can be considered to have a constant diameter. In the projection lithography technique of the invention, optical resolution limits the minimum feature size that can be synthesized, and the depth of field restricts the length over which the sidewalls of a polymerized microstructure will be straight. An increase in optical resolution decreases the depth of field. In addition, the minimum feature size that can be printed on a transparency mask contributes to feature size limitations.
If a suitable transparency mask can be produced for a given application, no lens system need be employed in the projection lithography process. In the absence of a lens objective, illumination passes through a mask and is directed to a monomer stream in a microfluidic device without any reduction in feature size. The mask features are then identically reproduced in the polymerizing monomer stream.
The invention is not limited to a particular type of mask, and any suitable mask or illumination arrangement that enables the simultaneous shape-definition and polymerization of polymeric microstructures in a monomer stream can be employed. Apertures, ink masks, metallic masks such as chrome masks, photographic film, dynamic masks such as the digital micromirror devices described above, and other such masks and techniques can be employed. In general, all that is required is an ability to project or direct illumination toward a monomer stream in a microfluidic device.
Multiphoton illumination and multiple-beam lithographic techniques can also be employed, e.g., to produce three-dimensional microstructure features.
The cross-sectional geometry of the microfluidic device employed in the synthesis process of the invention can also be tailored to customize microstructure geometry.
Referring now to the example of
The height of a microfluidic device cross section, in combination with the feature size of a projection mask, sets the exposure time required to fully polymerize microstructures in the photosensitive monomer example of
An increase in required polymerization duration in turn places a constraint on the maximum allowable velocity of a continuously-flowing monomer stream passing through a microfluidic device, to avoid unintended shape deformation of polymerized microstructures in the stream. In accordance with the invention, it can be preferred to specify a microstructure feature size tolerance and based on that tolerance and the polymerization duration required for the microfluidic device dimensions and the mask feature size, to determine a monomer stream flow rate that accommodates the specified microstructure feature size tolerance. The flow rate of the monomer stream can be controlled by, e.g., syringe pump operation, capillary action, pressure, electrokinetic force, or other selected operation.
As described above, stop flow lithography can be employed as an alternative to continuous flow lithography in accordance with the invention with a monomer stream in a microfluidic device like that of
For many applications, the stop flow lithography technique can provide synthesized polymeric microstructure feature resolution that is improved over that of continuous flow lithography. The stop flow lithography technique can also achieve a microstructure synthesis through-put that is increased over that of continuous flow lithography because a higher average monomer stream flow rate can be employed, considering that the microstructure flushing step can be carried out at a high flow rate. Continuous flow lithography is in general mechanistically simpler than stop flow lithography and thereby can be preferred for applications in which the distinct advantages of stop flow lithography are not required. Stop flow lithography can be preferred to continuous flow lithography for applications employed to produce high-fidelity microstructures with small features, e.g., ˜10 μm or less, or when it is desired to produce sharp interfaces between adjacent chemistries in a microstructure, as described below. The interface between two miscible streams is sharper for smaller residence times during which molecular species can diffuse between the adjacent streams. In a stop-flow lithography setup, one can polymerize immediately after stopping two rapidly-flowing streams to minimize the residence time and increase the sharpness of the interfaces.
A light source, e.g., a UV light source 156 is provided for projection lithography. A shutter 158 or other control mechanism is provided for controlling duration of the illumination and a mask 160 or other system is aligned with a microfluidic device 162 in the manner described above, and a microscope objective 164 or other lens system is provided, if desired, for reducing the illumination feature size. A computer 166 or other processing device or system is provided for synchronously controlling the shutter 158 and the valve 154 such that the monomer stream flow through the microfluidic device is coordinated to stop and start in unison with illumination of the monomer stream.
The valve and shutter can be controlled by way of, e.g., serial RS 232 connections, USB connections, through a data acquisition board, or other suitable connection, with suitable control software, such as LabVIEW, National Instruments Corp, Austin, Tex. Alternatively, a computer-controlled pressure transducer can be employed to adjust the monomer stream pressure between a specified flowing pressure and zero pressure of stopped flow. The pressure source can be provided as any suitable gas pressure source that can supply between, e.g., about 0-30 psi. The 3-way valve or the pressure transducer is connected to the microfluidic device through suitable tubing, e.g., through 1/32″ diameter Tygon® tubing that is fitted to the device by, e.g., a 10 μl pipette tip. In one example scenario, the pipette tip is filled with a volume of monomer stream and inserted in the microfluidic device for initiating monomer flow through the device. A compressed gas head can then be employed to drive the flow by attaching the tubing through which the air flows to the pipette tip.
While the system 150 of
Turning now to specific features of the polymer chemistry employed for microstructure synthesis processes of the invention, the processes can be conducted with any polymerizable liquid-phase monomer in which microstructure shapes can be defined and polymerized in a single lithography-polymerization step. Preferably the selected monomer also is characterized by a polymerization reaction that can be terminated with a termination species. The terminating species, lithographic illumination, and monomer constituents are therefore selected in cooperation to enable all such functionality of the process of the invention.
As explained above, one particularly well-suited class of polymers is that class of polymerizable monomers that undergo free-radical-initiated polymerization, e.g., by UV illumination, visible light illumination, thermal initiation, or other initiating radiation or agent. Such monomer systems preferably include one or more unsaturated (double bond) species that undergo free-radical-initiated polymer chain extension. Examples of such monomers include acrylates, multi-acrylates, methacrylates, multi-methacrylates, vinyls, and any blends thereof.
Table I below is a non-exhaustive listing of a range of monomers that can be employed for polymeric microstructure synthesis in accordance with the invention.
For those monomers that are photo-polymerizable, a photoinitiator species is included in the monomer stream to enable the polymerization process. Effectively any chemical that can produce free-radicals in the fluidic monomer stream as a result of illumination absorption can be employed as the photoinitiator species. There are in general two classes of photoinitiators. In the first class, the chemical undergoes unimolecular bond cleavage to yield free radicals. Examples of such photoinitiators include Benzoin Ethers, Benzil ketals, a-Dialkoxy-acetophenones, a-Amino-alkylphenones, and Acylphosphine oxides. The second class of photoinitiators is characterized by a bimolecular reaction where the photoinitiator reacts with a coinitiator to form free radicals. Examples of such are Benzophenones/amines, Thioxanthones/amines, and Titanocenes (vis light).
Table II below is a non-exhaustive listing of a range of photoinitiators that can be employed with a photo-polymerizable monomer for polymeric microstructure synthesis in accordance with the invention.
In accordance with the invention, the monomer stream in which polymeric microstructures are to be synthesized can incorporate diverse functional moieties that produce selected microstructure functionality, for addressing microstructure applications in, e.g., ambient sensing, self-assembly, rheology, biosensing, drug delivery, and other applications. The moieties can be chemically attached in the microstructure, e.g., by covalent incorporation, or can be physically attached or entrapped in the microstructure. Covalently-incorporated moieties can be provided as monomers, in the monomer stream, that are polymerized by the lithography-polymerization step of the microstructure synthesis. Monomers can be included which alone or in combination with copolymerized species in a synthesized polymeric microstructure provide a selected functionality.
For example, a monomer species can be included in the monomer stream for synthesizing temperature-sensitive polymer microstructures. The monomer N-isopropylacrylamide, or other suitable monomer, can here be employed. A monomer species can be included in the monomer stream for synthesizing pH-responsive polymer microstructures; monomers such as acrylic acid, methacrylic acid, or other suitable species can here be employed. A monomer species can further be included in the monomer stream for synthesizing photosensitive polymer microstructures; a copolymer of Azobenzene, N,N-Dimethylacrylamide, or other suitable monomer can here be employed. A monomer species can be included in the monomer stream to synthesize antigen-responsive polymer microstructures. Here, goat anti-rabbit IgG coupled with N-succinimidylacrylate, or other suitable monomer, can be employed. With these examples, it is demonstrated that a wide range of functionality can be imparted to the synthesized microstructures by the inclusion of selected monomer species.
Further in accordance with the invention, biodegradable monomers, as well as modified biological material, can be included in the monomer stream. For example, DNA or RNA can be included in the monomer stream. Such can be custom-synthesized or obtained commercially. Polypeptides, antibodies, enzymes, or other such species can also be included in the monomer stream. Each selected species can be modified as-desired to enable covalent incorporation in a polymeric microstructure matrix as the microstructure is polymerized. Fluorophores and chromophores, such as fluorescein diacrylate and rhodamine methacrylate, or other molecules or parts of a larger molecule that can be excited by light to emit fluorescence or selectively absorb light at particular wavelengths, can further be included in the monomer stream.
Further in accordance with the invention, selected entities can be provided in a monomer stream to be physically entrapped in the polymeric matrix of a polymer microstructure as the microstructure is polymerized by the lithography-polymerization step of the invention. For example, particles such as quantum dots, emulsified liquid droplets, gas bubbles, electrically conductive and metallic particle species, gold or silver filings or particles, magnetically-sensitive particle species, such as nanometer-sized magnetite or maghemite particles, carbon nanotubes, three-dimensional micromachined or microfabricated structures of microelectronic or other materials, and other species, can be included. If necessary or desirable, these can be physically or chemically linked to one or more of the monomers provided in the monomer stream. Further, liquid crystals, viruses, whole cells or cellular components, such as mitochondria, proteins, enzymes, nucleic acids, and other such species, can be included in the monomer stream for entrapment in a polymeric microstructure matrix. Various porogens can be added to the monomer stream to control the porosity of the resulting polymeric microstructures, such as surfactants, gas bubbles or dissolvable microparticles, or nanoparticles such as PMMA nanoparticles.
The selected one or more species to be added to a monomer for incorporation during the polymeric microstructure synthesis can be mixed with a monomer by, e.g., vortex mixing, sonication, or other selected technique. Additionally, surfactants can be included with a monomer to stabilize porogens, moieties, or other added entities from agglomeration. Some species added to a monomer can produce a dispersed phase of particles in the continuous-phase of the fluidic monomers in a monomer stream. In accordance with the invention, such a dispersed phase does not constitute that phase which is polymerized to produce microstructures. As explained above, the continuous phase of the monomer stream is that which is polymerized, with a dispersed phase, if such is not covalently bonded in the microstructure matrix, being entrapped in the resulting synthesized polymeric microstructure shapes. The dispersed phase does not in general set the shape or geometry of the synthesized polymeric microstructure shapes; it is the lithographic mask shapes imposed on the polymerizing continuous phase that set microstructure shape.
In accordance with the invention, polymeric microstructures can be controllably synthesized to include two or more functionalities and/or chemistries in an anisotropic arrangement across the plane of a microstructure.
To synthesize microstructures from the two adjacent monomer streams, a selected mask shape, e.g., the ring shape 240 in
In the example of
A number of microfluidic devices were fabricated by first patterning a silicon substrate with photoresist, SU-8, from Microchem, Newton, Mass., to define a mold structure corresponding to a rectangular microfluidic device cross section as in
For carrying out the lithography-polymerization operations of the invention with the microfluidic devices, a selected one of the devices was mounted on an inverted microscope, the Axiovert 200 inverted microscope, from Carl Zeiss MicroImaging, Inc., Thornwood, N.Y. A charge-coupled device camera (CCD), the Hitachi KP-M1A monochrome CCD camera, Hitachi America, Ltd., Tarrytown, N.Y., was positioned to acquire images during the microfluidic operations. NIH Image software was employed to capture and process the CCD images.
Dark-field transparency photomasks of selected microstructure shapes were designed in software with a design tool, AutoCAD® 2005, Autodesk, Inc., San Rafael, Calif., and printed by high-resolution printer by CAD Art Services, Poway, Calif. The resulting transparency mask was inserted into the field stop of the microscope. A source of UV illumination was provided by a 100 W OSRAM HBO® mercury short arc lamp, from OSRAM Sylvania, Danvers, Mass. A filter set, 11000v2: UV, from Chroma Technology Corp, Rockingham Vt., allowing wide UV excitation, was employed to enable selection of a desired illumination wavelength of 365 nm. An electro-programmable shutter system, UniBlitz® VS25, Vincent Ass., Rochester, N.Y., was driven by a computer-controlled shutter driver controller, VMM-D1, Vincent Ass., Rochester, N.Y., to produce specified pulses of UV light.
A monomer solution of poly(ethylene glycol)(400) diacrylate (PEG-DA), Polysciences, Warrington, Pa., was employed including a photoinitiator of 5% (v/v) DAROCUR® 1173, Ciba Specialty Chemicals, Tarrytown, N.Y. The viscosity of the PEG-DA was reported by the supplier to be 57 cP at 25° C. Additional monomer solutions of trimethylpropane triacrylate, 1,6-hexanediol diacrylate, and tri(propylene glycol) diacrylate were also prepared. A selected one of the solutions was loaded into a syringe pump, KDS 100 single-syringe infusion pump, from kdScientific, Holliston, Mass., for delivery through a selected one of the microfluidic devices.
Pulses of UV light were directed through the transparency mask and the microfluidic device to a monomer solution passing through the microfluidic device. As polymeric microstructures were synthesized by the pulses in the monomer stream, the microstructures were carried through the device in an un-polymerized volume of monomer resulting from oxidation-induced polymerization inhibition at the device walls. The monomer-microstructure solution was collected in a reservoir positioned at the output of the device's rectangular channel. The microstructures in the solution were collected by centrifuge, washed, and then re-suspended three times in ethanol to dissolve any unpolymerized monomer remaining on the microstructures. The microstructures were then washed three times in water and then suspended in water.
Four different microscope objectives were employed in separate microstructure synthesis processes, namely, 20×, 40×, 63×, and 100× objectives. Table III below provides the actual magnification, theoretical resolution, practical resolution, and depth of field for each of the objectives.
The actual magnification factor is the ratio by which a mask shape size was reduced when projected to the monomer stream in a microfluidic device. This is different from the magnification of the objective because of an additional 2.57× lens in the optical path between the field-stop slider and the objective. The theoretic resolution was calculated using Rayleigh's formula,
where λ is the 365 nm wavelength of illumination employed and NA is the numerical aperture of the objective. The practical resolution is the size to which a 10 μm mask feature was reduced using the different objectives. The depth of field was calculated using an equation provided by the lens manufacturer, where
This demonstrates that higher magnification objectives provide greater resolution but lower depth of field.
Analysis of the CCD images of the lithography-polymerization process determined that the microstructures were rapidly formed, in less than about 0.1 s, due to rapid polymerization kinetics of the selected monomers. Oxygen-aided polymerization inhibition near the PDMS surfaces allowed microstructure flow within an unpolymerized monomer stream through the complete length of the device. Triangles, squares, hexagons, posts, and other microstructure geometries like that of
Square polymeric microstructures were synthesized in the manner of Example I with square mask features ranging in edge length from 10 μm to 500 μm. The microstructure synthesis was duplicated for a 20× objective and a 40× objective. The three microfluidic devices described in Example I were employed, having channel heights of 10 μm, 20 μm, and 40 μm. The PEG-DA and DAROCUR® 1173 photoinitiator monomer stream of Example I was employed in the microfluidic devices, with the steam flow stopped during the lithography-polymerization step, in the stop flow process described above. The resulting microstructures were collected and analyzed as in Example I.
The microstructure analysis was conducted to determine the smallest mask feature that could be polymerized at a given exposure time in the channels of varying height.
One of the microfluidic devices of Example I having a cross section channel height of 38 μm (intended as 40 μm) was adapted by replacing the PDMS-coated glass slide with an uncoated glass slide, and polymeric microstructure synthesis was carried out with the monomer as in Example I. It was found that the synthesized microstructures stuck to the glass plate. This result is recognized to be due to the absence of the oxygen inhibition effect enabled by the PDMS coating in Example I, thereby allowing the synthesized microstructures to polymerize all the way to the glass surface.
Polymeric microstructures were synthesized in the manner of Example I with a PDMS-coated glass slide device and with an uncoated glass slide device, both having a cross-sectional channel height of 38 μm. An exposure time, texp, of 0.1 s, a 360 μm square mask shape, and a 20× objective were employed with each of the two devices.
Microstructures synthesized with the two microfluidic devices were collected as in Example I above and analyzed. Microstructures synthesized with the uncoated glass slide device were characterized by a height of 35.5 μm. Microstructures synthesized with the PDMS-coated glass slide device were characterized by a height of 33 μm. Given that an oxygen-aided inhibition layer was formed during synthesis with the coated glass slide device, it was determined that the thickness of the unpolymerized lubricating layer was 2.5 μm at both the top and bottom walls of the device.
This experiment was repeated for rectangular microfluidic device channel heights of 10 μm, 40 μm and 75 μm. For all channel heights, a polymerization inhibition layer thickness of 2.5 μm was measured. This result demonstrates that the inhibition layer thickness is independent of the cross-sectional height of the microfluidic device.Example IV
A transparency mask was produced as in Example I having features of differing sizes ranging from 10 μm to 500 μm. A fluorescein solution was employed as a monomer stream and the lithography-polymerization process of Example I was conducted. Microstructures synthesized by the process were collected and analyzed in the manner of Example I.
It was found that the light passing through the transparency mask in the field-stop plane of the microscope objective had a feature size-dependent intensity below a critical feature size of 250 μm. Above this critical feature size, the light intensity was equal through any mask feature dimensions and led to the polymerization of all such features in equal exposure durations. Below this critical size, the beam intensity was found to decrease with the size of the feature. This measured variation in intensity is recognized to be caused by clipping of the light passing through the mask, resulting from the increasing divergence of the light beam as the size of the aperture was decreased.Example V
The lithography-polymerization process of Example I was conducted with the microfluidic devices having rectangular channel heights of 10 μm, 20 μm, and 40 μm, and employing the 20× objective and the PEG-DA and photoinitiator monomer stream. Four different polymerization processes were carried out, with the velocity of the monomer stream varied between about 100 μm/s and about 1700 μm/s between the processes. Polymerized microstructures synthesized by the processes were collected and analyzed as in Example I.
The lithography-polymerization process of Example I was conducted with a two-port flow structure fabricated in the manner of the one-port structure of Example I, but here employing a Y-shaped geometry like that of
The lithography-polymerization process of Example VI, with the experimental conditions of Example I, was conducted with two-port PDMS Y-shaped microfluidic devices having a rectangular cross sectional channel width of 200 μm and 300 μm, and a height of 30 μm. A reservoir was cut in each of the PDMS microfluidic devices to collect the synthesized microstructures. The shutter control was set to provide a lithographic exposure time of 0.03 s; with a pause of 5 s between successive exposures.
Amphiphilic polymeric microstructures were synthesized with a hydrophobic phase monomer stream consisting of a 5% (v/v) DAROCUR® 1173, photoinitiator in tri(methylpropane) triacrylate, (TMPTA) Polysciences Inc., Warrington, Pa. A hydrophilic phase monomer stream was provided consisting of 5% (v/v) solutions of the DAROCUR® 1173 photoinitiator in 65% aqueous solution of poly(ethylene glycol)(600) (PEG-DA). Because TMPTA is insoluble in water, the two monomer streams were immiscible. Both PEG-DA and TMPTA are reported by the supplier to have viscosities of 90 cP and 106 cP, respectively, at 25° C.
The two monomer streams were controlled with a syringe pump to a flow velocity between about 100 and about 300 μm/s, constraining the flow regime to one in which parallel co-flow of the two streams was enforced. Because the two monomer streams were immiscible, they cooed all the way to the exit of the microfluidic device. This led to a segregation of the two phases all along the interface and was convenient for the formation of large numbers of microstructures where diffusive mixing might otherwise have constrained the region available for polymerization.
Transparency masks were produced in the manner of Example I with microstructure wedge shapes that fall in the spectrum of shapes between triangles and rectangles. Such are the two-dimensional analogs of amphiphilic molecules as represented by objects in the spectrum of shapes between a cone and a cylinder, where the body of the object represents the hydrophobic tail and the hydrophilic heat is represented by a circular face. This spectrum of shapes is used to show the effect of geometry on packing.
The microstructures were collected in unpolymerized monomer in the manner described above and then dispersed in ethanol in order to avoid clustering. Because both the hydrophilic and hydrophobic polymeric precursors were completely soluble in ethanol, there was no preferential alignment of the microstructures in the ethanol. But the hydrophilic portion of each microstructure was found to swell to a greater extent in ethanol, leading to a slight distortion in the original shape. When dry, the hydrophilic portion of each microstructure was found to shrink in comparison to the hydrophobic phase.
The sizes of the synthesized microstructures were estimated as they were being formed by capturing images of the flowing microstructures a low camera exposure time of 1/10000 s. Statistics were estimated on a 100 consecutive microstructures formed at an exposure time of 0.03 s. A comprehensive analysis of particle monodispersity was performed by measuring the distribution of the five different length variables of the microstructure wedge shape, w1, w2, w3, h1 and h2 as given in
An inspection of the cross section of one of the wedge microstructures indicated that the interface between the hydrophilic portion and the hydrophobic portion of the microstructure was characterized by a finite curvature, as in
Using simple geometry, the radius of curvature, R, at the interface can be given as R=H/2 cos β, where H is the height of the microfluidic device cross section. For the experimental parameters given above, a predicted radius of 17.4 μm was determined this was found to match well with the experimentally determined value of 16±1.5 μm. This demonstrates that the interfacial properties of the two monomer streams can be used to tune the curvature of the interface between the two microstructure sections.
The extent of cross-linking of the particles in the two different phases was characterized by measuring the percentage of double bonds converted using FTIR spectroscopy performed on a Nikolet spectrometer, from Thermo Electron Corp., Waltham, Mass., by measuring the decrease in terminal C═C stretch at 1635 cm−1 in a thin film of cross-linked polymer. To perform FTIR, individual samples of either the hydrophilic or the hydrophobic monomer were prepared by loading the respective oligomer into a channel with the same dimensions as the microfluidic device used and then given exposure doses of 0.03 s, as with the synthesized microstructures, and 120 s, for fully cross-linked. Strips of polymer film were formed that were used for FTIR measurements. Contact angle and surface tension measurements were performed using a DSA 10 tensiometer, from Druss USA, Matthews, N.C.
Like amphiphilic molecules, microstructures possessing both hydrophilic and hydrophobic sections exhibit a tendency to orient themselves in order to minimize their surface energy. While thermal energy alone is insufficient to enable these microstructure to explore their energy landscape, external energy provided by, e.g., agitation was employed to aid the microstructures to find their energy minima and self-assemble. The wedge-shaped amphiphilic microstructures were isolated and induced, using agitation, to assemble either in a pure aqueous phase or at the interface of w/o or o/w emulsions. The results showed that the particles have a strong tendency to orient themselves in order to minimize their surface energy.
This method of immiscible microstructure synthesis is of sufficient generality to enable synthesis of a wide range of non-spherical particles with such chemical anisotropy; e.g., amphiphilic particles with a rod-like hydrophobic tail and a disk-shaped hydrophilic head can be synthesized. Such a library of particles can be useful when studying the effect of geometry and chemical anisotropy on meso-scale self assembly and rheology. In addition, structures with more complicated motifs like w-o-w can also be formed quite easily.
With these examples and the description above, it is demonstrated that the invention provides lithographic-based microfluidic methodology that can be employed to continuously or near-continuously synthesize polymeric microstructures of varied complex shapes, chemistries, and functionalities with an elegant dual lithography-polymerization step. The morphology and chemistry of the microstructures that are synthesized can be independently controlled to produce large numbers of uniquely shaped, functionalized polymeric microstructures for applications including drug delivery, biosensing, microactuation, and fundamental studies on self-assembly and rheology, among others. The high-through-put of the synthesis processes of the invention enables the practical achievement of polymeric microstructure synthesis on a scale that is required for many of these applications.
It is recognized, of course, that those skilled in the art may make various modifications and additions to the embodiments described above without departing from the spirit and scope of the present contribution to the art. Accordingly, it is to be understood that the protection sought to be afforded hereby should be deemed to extend to the subject matter claims and all equivalents thereof fairly within the scope of the invention.
1. A non-spheroidal polymeric microstructure having a plurality of distinct material regions.
2. The polymeric microstructure of claim 1 provided in a population of monodisperse non-spheroidal polymeric microstructures.
3. A planar polymeric microstructure having a plurality of distinct material regions.
4. The polymeric microstructure of claim 3 wherein the polymeric microstructure is characterized by an anisotropic material composition.
5. The polymeric microstructure of claim 3 wherein at least two of the distinct regions are of a distinct polymeric composition.
6. The polymeric microstructure of claim 3 wherein at least one of the distinct regions includes a porogen.
7. The polymeric microstructure of claim 3 wherein at least one of the distinct regions includes a covalently bonded moiety.
8. The polymeric microstructure of claim 3 wherein at least one of the distinct regions is hydrophobic and at least one of the distinct regions is hydrophilic.
9. The polymeric microstructure of claim 3 further comprising three-dimensional features.
10. The polymeric microstructure of claim 3 further comprising two-dimensional extruded features.
11. The polymeric microstructure of claim 3 further comprising at least one straight edge.
12. The polymeric microstructure of claim 11 further comprising a plurality of straight edges.
13. The polymeric microstructure of claim 3 further comprising at least one rounded feature.
14. The polymeric microstructure of claim 3 wherein the microstructure is hollow.
15. The polymeric microstructure of claim 3 wherein the microstructure is cylindrical.
16. The polymeric microstructure of claim 3 wherein the microstructure is non-continuous across a plane of the microstructure.
17. The polymeric microstructure of claim 16 wherein apertures in the microstructure result in the non-continuity of the microstructure.
18. The polymeric microstructure of claim 17 wherein at least one aperture is straight-edged.
19. The polymeric microstructure of claim 17 wherein at least one aperture is rounded.
20. The polymeric microstructure of claim 3 wherein the microstructure is characterized by a sensitivity to temperature.
21. The polymeric microstructure of claim 3 wherein the microstructure is characterized by a sensitivity to pH.
22. The polymeric microstructure of claim 3 wherein the microstructure is characterized by a sensitivity to illumination.
23. The polymeric microstructure of claim 3 wherein the microstructure is characterized by a responsiveness to at least one antigen.
24. The polymeric microstructure of claim 3 wherein the microstructure is biodegradable.
25. The polymeric microstructure of claim 3 wherein the microstructure includes biological material.
26. The polymeric microstructure of claim 25 wherein the biological material comprises DNA.
27. The polymeric microstructure of claim 25 wherein the biological material comprises RNA.
28. The polymeric microstructure of claim 25 wherein the biological material comprises a polypeptide.
29. The polymeric microstructure of claim 25 wherein the biological material comprises an enzyme.
30. The polymeric microstructure of claim 25 wherein the biological material comprises an antibody.
31. The polymeric microstructure of claim 25 wherein the biological material comprises at least a portion of a cell.
32. The polymeric microstructure of claim 25 wherein the biological material comprises mitochondria.
33. The polymeric microstructure of claim 3 wherein the microstructure includes a fluorophore.
34. The polymeric microstructure of claim 3 wherein the microstructure includes a chromophore.
35. The polymeric microstructure of claim 3 wherein the microstructure includes a porogen.
36. The polymeric microstructure of claim 3 wherein the microstructure includes particles.
37. The polymeric microstructure of 3 wherein the microstructure includes quantum dots.
38. The polymeric microstructure of claim 3 wherein the microstructure includes carbon nanotubes.
39. The polymeric microstructure of claim 3 wherein the microstructure includes emulsified liquid droplets.
40. The polymeric microstructure of claim 3 wherein the microstructure includes gas bubbles.
41. The polymeric microstructure of claim 3 wherein the microstructure includes electrically conducting particles.
42. The polymeric microstructure of claim 3 wherein the microstructure includes magnetizable particles.
43. The polymeric microstructure of claim 3 wherein the microstructure includes three-dimensional structures.
44. The polymeric microstructure of claim 3 wherein the microstructure includes liquid crystals.
45. The polymeric microstructure of claim 3 wherein the microstructure comprises a microstructure chain in which microstructures are linked to the chain by an overlapping polymerized region.
46. The polymeric microstructure of claim 3 provided in a population of monodisperse polymeric microstructures.
Filed: Mar 15, 2010
Publication Date: Jul 8, 2010
Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY (Cambridge, MA)
Inventors: Patrick S. DOYLE (Boston, MA), Daniel C. PREGIBON (Cambridge, MA), Dhananjay DENDUKURI (Begumpet)
Application Number: 12/724,099
International Classification: C08F 118/02 (20060101); C08J 9/00 (20060101); B32B 3/10 (20060101); A61K 31/7088 (20060101); A61K 38/02 (20060101); A61K 38/43 (20060101); A61K 39/395 (20060101); A61K 35/12 (20060101); H01B 1/00 (20060101); H01F 1/00 (20060101); C09K 19/52 (20060101);