Exhaust ring for manufacturing semiconductors

- Tokyo Electron Limited
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Description

FIG. 1 is a front/top/right-side perspective view of an exhaust ring for manufacturing semiconductors showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right-side elevational view thereof, the left-side elevational view being a mirror image and, therefore, not shown;

FIG. 6 is a rear elevational view thereof;

FIG. 7 is a reference front elevational view;

FIG. 8 is a cross-sectional view taken along line 8—8 in FIG. 7;

FIG. 9 is an enlarged, partial, cross-sectional view taken along line 9—9 in FIG. 8; and,

FIG. 10 is an enlarged, partial, cross-sectional view taken along line 10—10 in FIG. 8.

The exhaust ring for manufacturing semiconductors is used in a vacuum vessel for manufacturing semiconductors.

Claims

We claim the ornamental design for exhaust ring for manufacturing semiconductors, as shown and described.

Referenced Cited
U.S. Patent Documents
5310453 May 10, 1994 Fukasawa et al.
D404370 January 19, 1999 Kimura
D404372 January 19, 1999 Ishii
6068441 May 30, 2000 Raaijmakers et al.
6155915 December 5, 2000 Raeder
20030017714 January 23, 2003 Taniyama et al.
20030124820 July 3, 2003 Johnsgard et al.
20040025788 February 12, 2004 Ogasawara et al.
20040056017 March 25, 2004 Renken
Patent History
Patent number: D494552
Type: Grant
Filed: Jun 12, 2003
Date of Patent: Aug 17, 2004
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Kazuyuki Tezuka (Nirasaki), Takashi Kitazawa (Nirasaki), Norihiko Amikura (Nirasaki), Hiroshi Koizumi (Nirasaki)
Primary Examiner: Prabhakar Deshmukh
Assistant Examiner: Selina Sikder
Attorney, Agent or Law Firm: Ladas & Parry
Application Number: 29/183,537
Classifications
Current U.S. Class: Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)
International Classification: 1303;