Exhaust ring for manufacturing semiconductors
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FIG. 1 is a front/top/right-side perspective view of an exhaust ring for manufacturing semiconductors showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right-side elevational view thereof, the left-side elevational view being a mirror image and, therefore, not shown;
FIG. 6 is a rear elevational view thereof;
FIG. 7 is a reference front elevational view;
FIG. 8 is a cross-sectional view taken along line 8—8 in FIG. 7;
FIG. 9 is an enlarged, partial, cross-sectional view taken along line 9—9 in FIG. 8; and,
FIG. 10 is an enlarged, partial, cross-sectional view taken along line 10—10 in FIG. 8.
The exhaust ring for manufacturing semiconductors is used in a vacuum vessel for manufacturing semiconductors.
Claims
We claim the ornamental design for exhaust ring for manufacturing semiconductors, as shown and described.
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Type: Grant
Filed: Jun 12, 2003
Date of Patent: Aug 17, 2004
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Kazuyuki Tezuka (Nirasaki), Takashi Kitazawa (Nirasaki), Norihiko Amikura (Nirasaki), Hiroshi Koizumi (Nirasaki)
Primary Examiner: Prabhakar Deshmukh
Assistant Examiner: Selina Sikder
Attorney, Agent or Law Firm: Ladas & Parry
Application Number: 29/183,537
International Classification: 1303;