Gas-separating plate for reactor for manufacturing semiconductor
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Description
Claims
The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.
Referenced Cited
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Patent History
Patent number: D654882
Type: Grant
Filed: Apr 13, 2011
Date of Patent: Feb 28, 2012
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventors: Manabu Honma (Oshu), Katsuyuki Hishiya (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/389,555
Type: Grant
Filed: Apr 13, 2011
Date of Patent: Feb 28, 2012
Assignee: Tokyo Electron Limited (Minato-Ku)
Inventors: Manabu Honma (Oshu), Katsuyuki Hishiya (Oshu)
Primary Examiner: Selina Sikder
Attorney: Burr & Brown
Application Number: 29/389,555
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)