Electrode cover for a plasma processing apparatus
Latest Hitachi High-Technologies Corporation Patents:
Description
Claims
The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.
Referenced Cited
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Patent History
Patent number: D770992
Type: Grant
Filed: Oct 30, 2015
Date of Patent: Nov 8, 2016
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Susumu Tauchi (Tokyo), Takashi Uemura (Tokyo), Kohei Sato (Tokyo)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/544,070
Type: Grant
Filed: Oct 30, 2015
Date of Patent: Nov 8, 2016
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Susumu Tauchi (Tokyo), Takashi Uemura (Tokyo), Kohei Sato (Tokyo)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/544,070
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)