Electrode plate for a plasma processing apparatus

- Tokyo Electron Limited
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Description

FIG. 1 is a front view of an electrode plate for a plasma processing apparatus showing our new design, the rear view being identical;

FIG. 2 is a right side view thereof, the left side view being identical;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is an enlarged view of a portion of the electrode plate for a plasma processing apparatus of FIG. 1 taken along line 1-1 and line 2-2 of FIG. 3;

FIG. 6 is an enlarged cross sectional view thereof, taken along line 3-3 of FIG. 5; and,

FIG. 7 is a perspective view of the electrode plate for a plasma processing apparatus of FIG. 1.

The features shown only in broken lines depict environmental subject matter only and form no part of the claimed design.

Claims

The ornamental design for an electrode plate for a plasma processing apparatus, as shown and described.

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Other references
  • Taiwanese Office Action, Application No. 101301746, dated Oct. 24, 2012.
Patent History
Patent number: D699199
Type: Grant
Filed: Mar 29, 2012
Date of Patent: Feb 11, 2014
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Yusei Kuwabara (Miyagi), Keiichi Nagakubo (Nirasaki)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/417,062