Cover of seal cap for reaction chamber of semiconductor

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Description

FIG. 1 is a front, top, left side perspective view of a cover of seal cap for reaction chamber of semiconductor showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 6.

Claims

The ornamental design for a cover of seal cap for reaction chamber of semiconductor, as shown and described.

Referenced Cited
U.S. Patent Documents
5789810 August 4, 1998 Gross
D642547 August 2, 2011 Untersee
D720309 December 30, 2014 Kaneko
D742339 November 3, 2015 Takagi
D748594 February 2, 2016 Takagi
D796458 September 5, 2017 Jang
D797067 September 12, 2017 Zhang
D813181 March 20, 2018 Okajima et al.
D840981 February 19, 2019 Forster
20170221790 August 3, 2017 Tomie
20170229360 August 10, 2017 Kothandapani
Foreign Patent Documents
1598442 February 2018 JP
Patent History
Patent number: D855027
Type: Grant
Filed: May 30, 2018
Date of Patent: Jul 30, 2019
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Yusaku Okajima (Tokyo), Shuhei Saido (Tokyo), Hidenari Yoshida (Tokyo)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/649,486