Plasma source liner
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Description
The oblique hatching shown in
Claims
The ornamental design for a plasma source liner, as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
D799439 | October 10, 2017 | Hayashiguchi |
D802790 | November 14, 2017 | Tauchi |
D804436 | December 5, 2017 | Tauchi |
D818447 | May 22, 2018 | Shono |
D818968 | May 29, 2018 | Barth |
D837754 | January 8, 2019 | Shono |
D838681 | January 22, 2019 | Shono |
D840365 | February 12, 2019 | Ichino |
D842259 | March 5, 2019 | Shono |
20040166612 | August 26, 2004 | Maydan |
20180347045 | December 6, 2018 | Olsen |
- Search Report for Taiwan Design Application No. 106306308 dated Jun. 6, 2018.
Patent History
Patent number: D882536
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Apr 28, 2020
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventor: Eric Kihara Shono (San Mateo, CA)
Primary Examiner: Samantha Q Lawrence
Application Number: 29/602,230
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Apr 28, 2020
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventor: Eric Kihara Shono (San Mateo, CA)
Primary Examiner: Samantha Q Lawrence
Application Number: 29/602,230
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)