Plasma source liner

- Applied Materials, Inc.
Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is an isometric top view of a plasma source liner.

FIG. 2 is an isometric bottom view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a side elevational view thereof, the other side elevational view being identical.

FIG. 6 is an end elevational view thereof, the other side elevational view being identical.

FIG. 7 is a cross-sectional view thereof taken along lines 7-7 of FIG. 3; and,

FIG. 8 is a cross-sectional view thereof taken along lines 8-8 of FIG. 5.

The oblique hatching shown in FIGS. 7 and 8 represents a refractory material.

Claims

The ornamental design for a plasma source liner, as shown and described.

Referenced Cited
U.S. Patent Documents
D799439 October 10, 2017 Hayashiguchi
D802790 November 14, 2017 Tauchi
D804436 December 5, 2017 Tauchi
D818447 May 22, 2018 Shono
D818968 May 29, 2018 Barth
D837754 January 8, 2019 Shono
D838681 January 22, 2019 Shono
D840365 February 12, 2019 Ichino
D842259 March 5, 2019 Shono
20040166612 August 26, 2004 Maydan
20180347045 December 6, 2018 Olsen
Other references
  • Search Report for Taiwan Design Application No. 106306308 dated Jun. 6, 2018.
Patent History
Patent number: D882536
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Apr 28, 2020
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventor: Eric Kihara Shono (San Mateo, CA)
Primary Examiner: Samantha Q Lawrence
Application Number: 29/602,230