Plasma chamber liner

- APPLIED MATERIALS, INC.
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Description

FIG. 1 is a top isometric view of a plasma chamber liner showing my new design;

FIG. 2 is a bottom isometric view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a side elevational view thereof;

FIG. 6 is an opposite side elevational view thereof; and,

FIG. 7 is a front elevational view thereof, a rear elevational view being identical.

Claims

The ornamental design for a plasma chamber liner, as shown and described.

Referenced Cited
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Patent History
Patent number: D837754
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Jan 8, 2019
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Inventor: Eric Kihara Shono (San Mateo, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/602,217