Plasma chamber liner
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Description
Claims
The ornamental design for a plasma chamber liner, as shown and described.
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Patent History
Patent number: D842259
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Mar 5, 2019
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventor: Eric Kihara Shono (San Mateo, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/602,207
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Mar 5, 2019
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventor: Eric Kihara Shono (San Mateo, CA)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/602,207
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)