Gas nozzle for substrate processing apparatus

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Description

FIG. 1 is a front, bottom and left side perspective view of an gas nozzle for substrate processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is an enlarged front view take along line 8-8 in FIG. 2 thereof;

FIG. 9 is a cross-sectional view take along line 9-9 in FIG. 8; and,

FIG. 10 is a cross-sectional view take along line 10-10 in FIG. 9.

The broken lines in FIG. 2 designating the enlarged view form no part of the claimed design.

Claims

We claim the ornamental design for an gas nozzle for substrate processing apparatus, as shown (and described).

Referenced Cited
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D847301 April 30, 2019 Yoshida
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Foreign Patent Documents
1589673 October 2017 JP
Patent History
Patent number: D889596
Type: Grant
Filed: May 25, 2018
Date of Patent: Jul 7, 2020
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Yusaku Okajima (Tokyo), Toru Kagaya (Tokyo), Hiroaki Hiramatsu (Tokyo), Shinya Ebata (Tokyo)
Primary Examiner: Derrick E Holland
Assistant Examiner: Andrew Kerr
Application Number: 29/649,036