Co-fired hermetically sealed feedthrough with alumina substrate and platinum filled via for an active implantable medical device
A co-fired hermetically sealed feedthrough is attachable to an active implantable medical device. The feedthrough comprises an alumina dielectric substrate comprising at least 96 or 99% alumina. A via hole is disposed through the alumina dielectric substrate from a body fluid side to a device side. A substantially closed pore, fritless and substantially pure platinum fill is disposed within the via hole forming a platinum filled via electrically conductive between the body fluid side and the device side. A hermetic seal is between the platinum fill and the alumina dielectric substrate, wherein the hermetic seal comprises a tortuous and mutually conformal interface between the alumina dielectric substrate and the platinum fill.
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This non-provisional patent application claims priority from U.S. Application Ser. Nos. 61/587,029, filed on Jan. 16, 2012; 61/587,287, filed on Jan. 17, 2012; and 61/587,373, filed on Jan. 17, 2012.
FIELD OF THE INVENTIONThe present invention generally relates to implantable medical devices and hermetic terminal subassemblies. More particularly, the present invention relates to a hermetic terminal subassembly utilizing a co-fired essentially pure platinum filled via along with novel ways of making electrical connections on the body fluid and device side of the active implantable medical device (AIMD) housing.
BACKGROUND OF THE INVENTIONA wide assortment of active implantable medical devices (AIMD) are presently known and in commercial use. Such devices include cardiac pacemakers, cardiac defibrillators, cardioverters, neurostimulators, and other devices for delivering and/or receiving electrical signals to/from a portion of the body. Sensing and/or stimulating leads extend from the associated implantable medical device to a distal tip electrode or electrodes in contact with body tissue.
The hermetic terminal or feedthrough of these implantable devices is considered critical. Hermetic terminals or feedthroughs are generally well-known in the art for connecting electrical signals through the housing or case of an AIMD. For example, in implantable medical devices such as cardiac pacemakers, implantable cardioverter defibrillators, and the like, a hermetic terminal comprises one or more conductive terminal pins supported by an insulative structure for feedthrough passage from the exterior to the interior of an AIMD electromagnetic shield housing. Hermetic terminals or feedthroughs for AIMDs must be biocompatible as well as resistant to degradation under applied bias current or voltage. Hermeticity of the feedthrough is imparted by judicious material selection and carefully prescribed manufacturing processing. Sustainable hermeticity of the feedthrough over the lifetime of these implantable devices is critical because the hermetic terminal intentionally isolates the internal circuitry and components of the device from the external environment to which the component is exposed. In particular, the hermetic terminal isolates the internal circuitry, connections, power sources and other components in the device from ingress of body fluids. Ingress of body fluids into an implantable medical device is known to be a contributing factor to device malfunction and may contribute to the compromise or failure of electrical circuitry, connections, power sources and other components within an implantable medical device that are necessary for consistent and reliable device therapy delivery to a patient. Furthermore, ingress of body fluids may compromise an implantable medical device's functionality which may constitute electrical shorting, element or joint corrosion, metal migration or other such harmful consequences affecting consistent and reliable device therapy delivery.
In addition to concerns relative to sustained terminal or feedthrough hermeticity, other potentially compromising conditions must be addressed, particularly when a hermetic terminal or feedthrough is incorporated within an implantable medical device. For example, the hermetic terminal or feedthrough pins are typically connected to one or more lead-wires of implantable therapy delivery leads. These implantable therapy delivery leads can effectively act as antennas of electromagnetic interference (EMI) signals. Therefore, when these electromagnetic signals enter within the interior space of a hermetic implantable medical device, facilitated by the therapy delivery leads, they can negatively impact the intended function of the medical device and as a result, negatively impact therapy delivery intended for a patient by that device. EMI engineers commonly refer to this as the “genie in the bottle” effect. In other words, once the genie (i.e., EMI) is inside the hermetic device, it can wreak havoc with electronic circuit functions by cross-coupling and re-radiating within the device.
Another particularly problematic condition associated with implanted therapy delivery leads occurs when a patient is in an MRI environment. In this case, the electrical currents imposed on the implanted therapy delivery leads can cause the leads to heat to the point where tissue damage is likely. Moreover, the electrical currents developed in these implanted therapy delivery leads during an MRI procedure can disrupt or damage the sensitive electronics within the implantable medical device.
Therefore, materials selection and fabrication processing parameters are of utmost importance in creating a hermetic terminal (or feedthrough) or a structure embodying a hermetic terminal (or feedthrough), that can survive anticipated and possibly catastrophically damaging environmental conditions and that can be practically and cost effectively manufactured.
Hermetic terminals or feedthrough assemblies utilizing ceramic dielectric materials may fail in a brittle manner. A brittle failure typically occurs when the ceramic structure is deformed elastically up to an intolerable stress, at which point the ceramic fails catastrophically. Virtually all brittle failures occur by crack propagation in a tensile stress field. Even microcracking caused by sufficiently high tensile stress concentrations may result in a catastrophic failure including loss of hermeticity identified as critical in hermetic terminals for implantable medical devices. Loss of hermeticity may be a result of design aspects such as a sharp corner which creates a stress riser, mating materials with a difference of coefficient of thermal expansions (CTE) that generate tensile stresses that ultimately result in loss of hermeticity of the feedthrough or interconnect structure.
In the specific case of hermetic terminal or feedthrough designs, a tensile stress limit for a given ceramic based hermetic design structure cannot be specified because failure stress in these structures is not a constant. As indicated above, variables affecting stress levels include the design itself, the materials selection, symmetry of the feedthrough, and the bonding characteristics of mating surfaces within the feedthrough. Hence, length, width and height of the overall ceramic structure matters as do the number, spacing, length and diameter of the vias in that structure. The selection of the mating materials, that is, the material that fills the vias and the material that forms the base ceramic, are important. Finally, the fabrication processing parameters, particularly at binder burnout, sintering and cool down, make a difference. When high reliability is required in an application such as indicated with hermetic terminals or feedthroughs for AIMDs, to provide ensurance for a very low probability of failure it is necessary to design a hermetic terminal assembly or feedthrough structure so that stresses imparted by design, materials and/or processing are limited to a smaller level of an average possible failure stress. Further, to provide ensurance for a very low probability of failure in a critical ceramic based assembly or subassembly having sustainable hermetic requirements, it is also necessary to design structures embodying a hermetic terminal or feedthrough such that stresses in the final assembly or subassembly are limited to a smaller level of an average possible failure stress for the entire assembly or subassembly. In hermetic terminals and structures comprising hermetic terminals for AIMDs wherein the demand for biocompatibility exists, this task becomes even more difficult.
The most critical feature of a feedthrough design or any terminal subassembly is the metal/ceramic interface within the feedthrough that establishes the hermetic seal. The present invention therefore, provides a hermetic feedthrough comprising a monolithic alumina insulator substrate within which a platinum conductive pathway or via resides. More specifically, the present invention provides a hermetic feedthrough in which the hermetic seal is created through the intimate bonding of the platinum metal residing within the alumina substrate.
A traditional ceramic-to-metal hermetic terminal is an assembly of three components: metal leadwires that conduct electrical current, a ceramic insulator, and a metal housing, which is referred to as the flange or the ferrule. Brazed joints hermetically seal the metal leadwires and the flange or ferrule to the ceramic insulator. For a braze-bonded joint, the braze material is generally intended to deform in a ductile manner in order to compensate for perturbations that stress the bond between the mating materials as the braze material may provide ductile strain relief when the thermal expansion mismatch between the ceramic and metal is large. Thus, mating materials with large mismatches in CTE can be coupled through braze materials whose high creep rate and low yield strength reduce the stresses generated by the differential contraction existing between these mating materials.
Thermal expansion of metal is generally considerably greater than those of ceramics. Hence, successfully creating a hermetic structure, and one that can sustain its hermeticity in service, is challenging due to the level of residual stresses in the final structure. Specifically, thermal expansion mismatch results in stresses acting along the ceramic/metal interface that tend to separate the ceramic from the metal and so the bond developed between the ceramic and the metal must be of sufficient strength to withstand these stresses, otherwise adherence failure, that is, loss of hermeticity, will occur. One method for limiting these stresses is to select combinations of materials whose thermal contractions after bonding are matched.
In making the selection for a CTE match, it is important to note that very few pairs of materials have essentially identical thermal expansion curves. Generally, the metal component is selected first based on electrical and thermal conductivity, thermal expansion, ability to be welded or soldered, mechanical strength, and chemical resistance or biocompatibility requirements; the ceramic is then selected based primarily on electrical resistivity, dielectric strength, low gas permeability, environmental stability, and thermal expansion characteristics. In the specific case of selecting platinum wire, often the ceramic formulation is modified in order to match its CTE to that of the platinum wire. In yet a more specific case of selecting platinum paste, the platinum paste formulation may be modified as well. If the mating materials are alumina of at least 96% purity and essentially pure platinum paste, then matching CTE is not possible. Thus, for AIMD's, consistently achieving hermetic terminal structures that are capable of sustaining hermeticity throughout the application's service life has proven challenging.
Producing a stress-free structure often not only involves bonding a pair of materials but also achieving that bond at a very specific temperature so that their contractions on cooling to room temperature are essentially the same even though the contraction curves may not coincide. Since this often is a significant challenge, hermetic terminals are produced by metalizing the alumina and using a brazing material to form the bond at some other temperature than an intersection of the CTE curves. (NOTE: Forming a bond between two materials that become rigid at the intersection of the two CTE curves makes it possible to produce a structure that is stress free at room temperature, unless the two CTE curves separate substantially from each other from the intersection point and room temperature.) The deformation of the braze material by time-independent plastic flow or creep relaxation limits the stresses generated in the ceramic. Given this, the impact of the rate of cooling on the final stress level of a structure must also be considered. In some cases, residual stresses are generated deliberately to provide protective compressive stresses in the ceramic part and in the bond interface. Usually this is accomplished by selecting components with different CTEs. Another way is to control the shrinkage of one material over its mating material. In either case, it is important to minimize stress levels such that the interface on which hermeticity depends is well within the stress level at which failure might occur.
In an embodiment, the present invention is directed to mating bound particulate high purity alumina of at least 96% and particles of essentially pure platinum metal that are suspended within a mixture of solvents and binders, i.e. a platinum paste. This combination of materials does not use a braze material to buffer the CTE mismatch between these two materials. Further, since the intent of this invention is to provide hermetic terminals and subassemblies comprising hermetic terminals for AIMDs, the present invention does not consider modifications to the alumina formulation or the platinum paste in an attempt to match their CTEs. Rather, this invention discloses sustainable hermetic terminals and structures embodying these hermetic terminals. This is achieved by adjusting platinum paste solids loading, prescribing via packing, prescribing binder burnout, sintering and cool down parameters, such that shrinkage of the alumina is greater than the shrinkage of the platinum fill in the via and an intimate and tortuous (a mutually conformal) interface is created that may be either a direct bond between the alumina and platinum materials that is hermetic. Alternatively, or that may develop an amorphous interfacial layer that is not susceptible to erosion by body fluids and can tolerate stress levels without losing hermeticity.
Regarding EMI, a terminal or feedthrough capacitor EMI filter may be disposed at, near or within a hermetic terminal or feedthrough resulting in a feedthrough filter capacitor which diverts high frequency electrical signals from lead conductors to the housing or case of an AIMD. Many different insulator structures and related mounting methods are known in the art for use of feedthrough capacitor EMI filters in AIMDs, wherein the insulative structure also provides a hermetic terminal or feedthrough to prevent entry of body fluids into the housing of an AIMD. In the prior art devices, the hermetic terminal subassembly has been combined in various ways with a ceramic feedthrough filter EMI capacitor to decouple interference signals to the housing of the medical device.
In a typical prior art unipolar construction (as described in U.S. Pat. No. 5,333,095 and herein incorporated by reference), a round/discoidal (or rectangular) ceramic feedthrough EMI filter capacitor is combined with a hermetic terminal pin assembly to suppress and decouple undesired interference or noise transmission along a terminal pin. The feedthrough capacitor is coaxial having two sets of electrode plates embedded in spaced relation within an insulative dielectric substrate or base, formed typically as a ceramic monolithic structure. One set of the electrode plates are electrically connected at an inner diameter cylindrical surface of the coaxial capacitor structure to the conductive terminal pin utilized to pass the desired electrical signal or signals. The other or second set of electrode plates are coupled at an outer diameter surface of the round/discoidal capacitor to a cylindrical ferrule of conductive material, wherein the ferrule is electrically connected in turn to the conductive housing of the electronic device. The number and dielectric thickness spacing of the electrode plate sets varies in accordance with the capacitance value and the voltage rating of the coaxial capacitor. The outer feedthrough capacitor electrode plate sets (or “ground” plates) are coupled in parallel together by a metalized layer which is either fired, sputtered or plated onto the ceramic capacitor. This metalized band, in turn, is coupled to the ferrule by conductive adhesive, soldering, brazing, welding, or the like. The inner feedthrough capacitor electrode plate sets (or “active” plates) are coupled in parallel together by a metalized layer which is either glass frit fired or plated onto the ceramic capacitor. This metalized band, in turn, is mechanically and electrically coupled to the lead wire(s) by conductive adhesive, soldering, or the like. In operation, the coaxial capacitor permits passage of relatively low frequency biologic signals along the terminal pin, while shielding and decoupling/attenuating undesired interference signals of typically high frequency to the AIMD conductive housing. Feedthrough capacitors of this general type are available in unipolar (one), bipolar (two), tripolar (three), quadpolar (four), pentapolar (five), hexpolar (6) and additional lead configurations. The feedthrough capacitors (in both discoidal and rectangular configurations) of this general type are commonly employed in implantable cardiac pacemakers and defibrillators and the like, wherein the pacemaker housing is constructed from a biocompatible metal such as titanium alloy, which is electrically and mechanically coupled to the ferrule of the hermetic terminal pin assembly which is in turn electrically coupled to the coaxial feedthrough filter capacitor. As a result, the filter capacitor and terminal pin assembly prevents entrance of interference signals to the interior of the pacemaker housing, wherein such interference signals could otherwise adversely affect the desired cardiac pacing or defibrillation function.
Regarding MRI related issues, bandstop filters, such as those described in U.S. Pat. No. 6,008,980, which is herein incorporated by reference, reduce or eliminate the transmission of damaging frequencies along the leads while allowing the desired biologic frequencies to pass efficiently through.
Referring once again to feedthrough capacitor EMI filter assemblies, although these assemblies as described earlier have performed in a generally satisfactory manner, and not-withstanding that the associated manufacturing and assembly costs are unacceptably high in that the choice of the dielectric material for the capacitor has significant impacts on cost and final performance of the feedthrough filter capacitor, alumina ceramic has not been used in the past as the dielectric material for AIMD feedthrough capacitors. Alumina ceramic is structurally strong and biocompatible with body fluids but has a dielectric constant around 6 (less than 10). There are other more effective dielectric materials available for use in feedthrough filter capacitor designs. Relatively high dielectric constant materials (for example, barium titanate with a dielectric constant of over 2,000) are traditionally used to manufacture AIMD feedthrough capacitors for integrated ceramic capacitors and hermetic seals resulting in more effective capacitor designs. Yet ceramic dielectric materials such as barium titanate are not as strong as the alumina ceramic typically used to manufacture the hermetic seal subassembly in the prior art. Barium titanate is also not biocompatible with body fluids. Direct assembly of the ceramic capacitor can result in intolerable stress levels to the capacitor due to the mismatch in thermal coefficients of expansion between the titanium pacemaker housing (or other metallic structures) and the capacitor dielectric. Hence, particular care must be used to avoid cracking of the capacitor element. Accordingly, the use of dielectric materials with a low dielectric constant and a relatively high modulus of toughness are desirable yet still difficult to achieve for capacitance-efficient designs.
Therefore, it is very common in the prior art to construct a hermetic terminal subassembly with a feedthrough capacitor attached near the inside of the AIMD housing on the device side. The feedthrough capacitor does not have to be made from biocompatible materials because it is located on the device side inside the AIMD housing. The hermetic terminal subassembly allows leadwires to hermetically pass through the insulator in non-conductive relation with the ferrule or the AIMD housing. The leadwires also pass through the feedthrough capacitor to the inside of the AIMD housing. These leadwires are typically continuous and must be biocompatible and non-toxic. Generally, these leadwires are constructed of platinum or platinum-iridium, palladium or palladium-iridium, niobium or the like. Platinum-iridium is an ideal choice because it is biocompatible, non-toxic and is also mechanically very strong. The iridium is added to enhance material stiffness and to enable the hermetic terminal subassembly leadwire to sustain bending stresses. An issue with the use of platinum for leadwires is that platinum has become extremely expensive and may be subject to premature fracture under rigorous processing such as ultrasonic cleaning or application use/misuse, possibly unintentional damaging forces resulting from Twiddler's Syndrome.
Accordingly, what is needed is a filtered structure like a hermetic terminal or feedthrough, any subassembly made using same and any feedthrough filter EMI capacitor assembly which minimizes intolerable stress levels, allows use of preferred materials for AIMDS and eliminates high-priced, platinum, platinum-iridium or equivalent noble metal hermetic terminal subassembly leadwires. Also, what is needed is an efficient, simple and robust way to connect the leadwires in a header block to the novel hermetic terminal subassembly. Correspondingly, it is also needed to make a similar efficient, simple and robust electrical connection between the electronics on the device side of the AIMD to the feedthrough capacitor and hermetic terminal subassembly. The present invention fulfills these needs and provides other related advantages.
SUMMARY OF THE INVENTIONIn an exemplary embodiment of the present invention, a co-fired hermetically sealed feedthrough may be attachable to an active implantable medical device. The feedthrough includes an alumina dielectric substrate comprising at least 96% alumina. A via hole is disposed through the alumina dielectric substrate from a body fluid side to a device side. A substantially closed pore, fritless and substantially pure platinum fill is disposed within the via hole forming a platinum filled via electrically conductive between the body fluid side and the device side. A hermetic seal exists between the platinum fill and the alumina dielectric substrate, wherein the hermetic seal minimizes damaging tensile stresses and, optimally, may comprise a mutually conformal interface (or tortuous, intimate knitline) between the alumina dielectric substrate and the platinum fill.
In another exemplary embodiment, the alumina dielectric substrate may include at least 99% alumina. The platinum fill and the alumina dielectric substrate may form a knitline comprising a glass that is at least about 60% silica.
In another exemplary embodiment, the hermetic seal may comprise a leak rate no greater than 1×10−7 standard cubic centimeters helium per second (std cc He/sec). Alternatively, the hermetic seal may comprise a leak rate no greater than 1×10−8 std cc He/sec. Alternatively, the hermetic seal may comprise a leak rate no greater than 1×10−9 std cc He/sec. Alternatively, the hermetic seal may comprise a leak rate no greater than 1×10−10 std cc He/sec. Alternatively, the hermetic seal may comprise a leak rate no greater than 1×10−11 std cc He/sec. Alternatively, the hermetic seal may comprise a leak rate no greater than 1×10−12 std cc He/sec.
In another exemplary embodiment a shrink rate during an elevated temperature sintering of the alumina dielectric substrate in a green state may be greater than the shrink rate of the platinum fill in the green state.
In another exemplary embodiment the platinum filled via may comprise a larger cross sectional area at either a first via end exposed to the body fluid side or a second via end exposed to the device side as compared to a smaller cross sectional area of the platinum filled via between the first and second via ends.
In another exemplary embodiment an electrically conductive cap or protrusion may be co-fired to the platinum fill on the body fluid side. The cap or protrusion may comprise a biocompatible material. The cap or protrusion may comprise platinum or titanium.
In another exemplary embodiment an adhesion metallization may be disposed on an outside circumferential surface of the alumina dielectric substrate. A wetting metallization may be disposed on the adhesion metallization. A ferrule may be disposed around the alumina dielectric substrate. A braze may hermetically seal the alumina dielectric substrate to the ferrule. The braze may comprise gold. The hermetic seal braze between the alumina dielectric substrate and the ferrule may comprises a leak rate no greater than 1×10−7, 1×10−8, 1×10−9, 1×10−10, 1×10−11, or 1×10−12 std cc He/sec. The ferrule may comprise titanium. The adhesion metallization may comprise titanium. The wetting metallization comprises niobium or molybdenum.
In another exemplary embodiment the alumina dielectric substrate may comprise a castellation recess disposed on the device side. A monolithic chip capacitor may be disposed within the castellation recess, the monolithic chip capacitor comprising an active electrode plate set disposed parallel to a ground electrode plate set. The active electrode plate set may be electrically coupled to the platinum fill by a first circuit trace disposed within the alumina dielectric substrate, and wherein the ground electrode plate set may be electrically coupled to the adhesion metallization by a second circuit trace disposed within the alumina dielectric substrate.
In another exemplary embodiment a feedthrough capacitor may be attached to the alumina dielectric substrate. An insulative washer may be disposed between the alumina dielectric substrate and the feedthrough capacitor. The feedthrough capacitor may comprises a second dielectric substrate, a conductive capacitor via hole disposed through the second dielectric substrate, a set of active electrode plates disposed within the second dielectric substrate and electrically coupled to the conductive capacitor via hole, an outside feedthrough capacitor metallization disposed on an outside of the feedthrough capacitor, and a set of ground plates disposed within the second dielectric substrate and electrically coupled to the outside feedthrough capacitor metallization. The outside feedthrough capacitor metallization may be electrically coupled to a ferrule.
In another exemplary embodiment a ball grid solder joint or braze may be between the conductive capacitor via hole and the platinum fill. The conductive capacitor via hole may be unfilled. A device side wire may be disposed within the conductive capacitor via hole and electrically coupled to the platinum fill and set of active electrode plates by the ball grid solder joint or braze.
In another exemplary embodiment a grounded via hole may be disposed through the alumina dielectric substrate from the body fluid side to the device side including a substantially closed pore, fritless and substantially pure grounded platinum fill disposed within the grounded via hole forming a platinum filled grounded via electrically conductive between the body fluid side and the device side. A set of feedthrough ground plates may be disposed within the alumina dielectric substrate electrically coupled to the grounded platinum fill and the ferrule and in non-conductive relation to the platinum filled via.
In another exemplary embodiment a feedthrough capacitor may be attached to the alumina dielectric substrate. The feedthrough capacitor may comprise a second dielectric substrate, a conductive capacitor via hole disposed through the second dielectric substrate, a set of active electrode plates disposed within the second dielectric substrate and electrically coupled to the conductive capacitor via hole, a conductive grounded via hole disposed through the second dielectric substrate, and a set of ground plates disposed within the second dielectric substrate and electrically coupled to the conductive grounded via hole.
In another exemplary embodiment the conductive capacitor via hole and conductive grounded via hole may be unfilled. The leadwire may be connectable at a first end to an AIMD electronic circuit and at its second end disposed within and electrically coupled to the conductive capacitor via hole. A ground leadwire may be connectable at a first end to an AIMD electronic circuit and at its second end disposed within and electrically coupled to the conductive grounded via hole.
In another exemplary embodiment a hermetically sealed braze may be between the wetting metallization and an active implantable medical device housing.
In another exemplary embodiment the via hole may comprise a plurality of via holes, the platinum fill may comprise a plurality of platinum fills, the grounded via hole may comprise a plurality of grounded via holes, and the grounded platinum fill may comprise a plurality of grounded platinum fills. The plurality of via holes and plurality of platinum fills may comprise at least two cross sectional areas. The plurality of grounded via holes and plurality of grounded platinum fills may comprise at least two cross sectional areas.
In another exemplary embodiment a conductive leadwire may be disposed within the platinum fill on the body fluid side. The conductive leadwire may comprise platinum, platinum-iridium, palladium, palladium-iridium, niobium or other like noble, biocompatible and biostable material. The conductive leadwire and platinum fill may be co-fired.
In another exemplary embodiment a crimp post may be disposed within the platinum fill on the body fluid side. A double-sided crimp post may be disposed through the platinum fill comprising a first crimp post end on the body fluid side and a second crimp post end on the device side.
In an exemplary embodiment of the present invention, a co-fired hermetically sealed feedthrough is attachable to an active implantable medical device. An alumina dielectric substrate may comprise at least 96 percent alumina. A staggerless (absent conductive catch pads for ensuring uninterrupted electrical conductivity) via hole may be disposed through the alumina dielectric substrate from a body fluid side to a device side. A substantially closed pore, fritless and substantially pure platinum fill may be disposed within the via hole forming a platinum filled via electrically conductive between the body fluid side and the device side. A hermetic seal may be between the platinum fill and the alumina dielectric substrate, wherein the hermetic seal is fundamentally matched or compressive (devoid of excessive tensile stresses) and may comprise a mutually conformal interface (or tortuous, intimate knitline) between the alumina dielectric substrate and the platinum fill and wherein the hermetic seal comprises a leak rate no greater than 1×10−7 std cc He/sec.
In an exemplary embodiment of the present invention, a co-fired hermetically sealed feedthrough is attachable to an active implantable medical device. An alumina dielectric substrate comprises at least 96% alumina. A staggerless via hole is disposed through the alumina dielectric substrate from a body fluid side to a device side. A substantially closed pore, fritless and substantially pure platinum fill is disposed within the via hole forming a platinum filled via electrically conductive between the body fluid side and the device side. A first hermetic seal is between the platinum fill and the alumina dielectric substrate wherein the hermetic seal comprises a leak rate no greater than 1×10-7 std cc He/sec. A staggerless grounded via hole is disposed through the alumina dielectric substrate from the body fluid side to the device side. A substantially closed pore, fritless and substantially pure grounded platinum fill is disposed within the grounded via hole forming a grounded platinum filled via electrically conductive between the body fluid side and the device side. A second hermetic seal is between the grounded platinum fill and the alumina dielectric substrate wherein the second hermetic seal comprises a leak rate no greater than 1×10-7 std cc He/sec. A plurality of grounded electrode plates are electrically coupled to the grounded platinum filled via and in non-conductive relation to the platinum filled via. An outer metallization is disposed on alumina dielectric substrate and electrically connected to the plurality of grounded electrode plates.
In an exemplary embodiment of the present invention, a method of manufacturing a hermetically sealed feedthrough includes forming a dielectric substrate comprising at least 96% alumina, forming at least one staggerless via hole through the dielectric substrate, filling the at least one via hole with a conductive fill, the conductive fill including a platinum powder and an inactive organic binder, solvent, and/or plasticizer, placing the dielectric substrate and conductive fill into an air filled heating chamber and heating the assembly to a monolithic structure. The platinum fill and the dielectric substrate may form a knitline comprising a glass that is at least about 60% silica.
In another exemplary embodiment, the forming of the alumina dielectric substrate may comprise laminating a plurality of alumina dielectric sheets. The forming of the alumina dielectric substrate may comprise pressing an alumina powder. A shrink rate during the heating of the alumina dielectric substrate in a green state may be greater than a shrink rate of the platinum fill in the green state.
In an exemplary embodiment of the present invention, a co-fired hermetically sealed feedthrough is attachable to an active implantable medical device. An alumina dielectric substrate comprises at least 96% alumina substantially free of sintering additives and glasses. A conductive metallization is disposed through the alumina dielectric substrate from a body fluid side to a device side, wherein the metallization comprises a substantially closed pore, fritless and substantially pure platinum fill. A hermetic seal is between the conductive metallization and the alumina dielectric substrate, wherein the hermetic seal is fundamentally matched or compressive and may comprise a mutually conformal interface (or tortuous, intimate knitline) between the alumina dielectric substrate and the metallization, the hermetic seal comprising a leak rate no greater than 1×10−7 std cc He/sec. The knitline between the alumina dielectric substrate and the metallization may comprise a glass that is at least about 60% silica.
In an embodiment, a feedthrough capacitor may be attached to the dielectric substrate, the feedthrough capacitor comprising a capacitor dielectric substrate, an unfilled via hole including an inner metallization, a set of active electrode plates electrically coupled to the inner metallization, an outer metallization disposed on an outside of the feedthrough capacitor, and a set of ground electrode plates electrically coupled to the outer metallization. A conductive leadwire is disposed within the unfilled via hole. A solder joint is electrically connecting the conductive fill, the capacitor inner metallization, the set of active electrode plates and the leadwire.
In another exemplary embodiment a hermetic seal may be between the via hole and the conductive fill. The hermetic seal may comprise a leak rate no greater than 1×10−7 std cc He/sec. The dielectric substrate may comprise at least 96% alumina. The conductive fill may comprise a substantially closed pore and fritless platinum fill. The hermetic seal is fundamentally matched or compressive and may comprise a mutually conformal interface (or tortuous, intimate knitline) between the alumina dielectric substrate and the platinum fill. The platinum fill and the alumina dielectric substrate may form a knitline comprising a glass that is at least about 60% silica.
In another exemplary embodiment the outer metallization may comprise an adhesion metallization disposed on an outside circumferential surface of the dielectric substrate. The outer metallization may comprise a wetting metallization disposed on the adhesion metallization. A ferrule may be disposed around the dielectric substrate. A gold braze may hermetically seal the dielectric substrate to the ferrule. The gold braze hermetic seal between the dielectric substrate and the ferrule may comprise a leak rate no greater than 1×10−7 std cc He/sec. An insulative washer may be disposed between the dielectric substrate and the feedthrough capacitor. The capacitor outer metallization may be electrically coupled to the ferrule. The via hole may comprise a staggered via hole.
In an exemplary embodiment of the present invention, a co-soldered hermetic feedthrough, feedthrough capacitor, and leadwire assembly comprises a dielectric substrate. At least one via hole is disposed through the dielectric substrate from a body fluid side to a device side. A conductive fill is disposed within the at least one via hole forming a hermetic seal and electrically conductive between the body fluid side and the device side. At least one grounded via hole is disposed through the dielectric substrate from the body fluid side to the device side. A conductive grounded fill is disposed within the at least one grounded via hole and electrically conductive between the body fluid side and the device side. A set of feedthrough ground plates are electrically coupled to the conductive grounded fill and in non-conductive relation to the conductive fill. An internally grounded feedthrough capacitor is attached to the dielectric substrate, the feedthrough capacitor comprising a capacitor dielectric substrate, an unfilled via hole including a first inner metallization, a set of active electrode plates electrically coupled to the first inner metallization, an unfilled grounded via hole including a second inner metallization, a set of ground electrode plates electrically coupled to the second inner metallization. At least one conductive leadwire is disposed within the unfilled via hole of the feedthrough capacitor. At least one conductive grounded leadwire is disposed within the unfilled grounded via hole of the feedthrough capacitor. A co-solder joint is electrically connecting the conductive fill, the set of capacitor active electrode plates and the at least one conductive leadwire. A second co-solder joint is electrically connecting the conductive grounded fill, the set of capacitor ground electrode plates and the at least one conductive ground wire.
In another exemplary embodiment the first and second co-solder joints may be simultaneously formed. A first hermetic seal may be between the at least one via hole and the conductive fill. A second hermetic seal may be between the at least one grounded via hole and the conductive ground fill. The first and second hermetic seals comprise a leak rate no greater than 1×10−7, 1×10−8, 1×10−9, 1×10−10, 1×10−11 or 1×10−12 std cc He/sec.
In another exemplary embodiment an adhesion metallization may be disposed on an outside circumferential surface of the dielectric substrate. A wetting metallization may be disposed on the adhesion metallization. A ferrule may be disposed around the dielectric substrate. A ferrule braze may be hermetically sealing the dielectric substrate to the ferrule. The hermetic seal of the ferrule braze may comprise a leak rate no greater than 1×10−7 std cc He/sec. The dielectric substrate may comprise at least 90% alumina up to at least 99.999% alumina. In a preferred embodiment, the dielectric substrate may comprise at least 92% alumina. In another preferred embodiment, the dielectric substrate may comprise at least 94% alumina. In yet another preferred embodiment, the dielectric substrate may comprise at least 96% alumina.
In another exemplary embodiment the alumina dielectric substrate may be substantially free of sintering additives and glasses. The conductive fill and conductive grounded fill may comprise a substantially closed pore and fritless platinum fill. The first and second hermetic seal each are fundamentally matched or compressive and may comprise a mutually conformal interface (or tortuous, intimate knitline) between the alumina dielectric substrate and the platinum fills. The knitline may comprise a glass that is at least about 60% silica. A third hermetic seal may be formed between the wetting metallization and an active implantable medical device housing.
In an exemplary embodiment of the present invention, an elevated feedthrough attachable to a top or a side of an active implantable medical device comprises a conductive ferrule. A dielectric substrate is defined as comprising a body fluid side and a device side disposed within the conductive ferrule and comprising a body fluid side elevated portion generally raised above the conductive ferrule. At least one via hole is disposed through the dielectric substrate from the body fluid side to the device side. A conductive fill is disposed within the at least one via hole and electrically conductive between the body fluid side and the device side. A leadwire connection feature is on the body fluid side electrically coupled to the conductive fill and disposed adjacent to the elevated portion of the dielectric substrate.
In another exemplary embodiment the leadwire connection feature may comprise a wire bond pad. The wire bond pad may be substantially L-shaped. A conductive leadwire may be electrically coupled to the leadwire connection feature. The conductive leadwire may comprise a round wire, an oval wire, a ribbon wire, a braided wire, a stranded wire or a coiled wire. The L-shape may comprise a curve. The wire bond pad may comprise a stamped and bent wire bond pad. A portion of the wire bond pad may be co-fired within the conductive fill. A braze preform may be electrically coupling the leadwire connection feature to the conductive fill. A laser weld may be electrically coupling the leadwire connection feature to the conductive fill. The elevated portion of the dielectric substrate may comprise at least one castellation recess and the wire bond pad is at least partially disposed within the at least one castellation recess. The leadwire connection feature may comprise leadwire insertion hole and a laser weld access hole. The leadwire connection feature may comprise a leadwire insertion hole and a side accessed set screw. The at least one via hole may be partially unfilled and the leadwire connection feature may comprise an insertable contact spring configured to be located within the at least one partially unfilled via hole and electrically coupled to the conductive fill. A circuit trace may be disposed within the dielectric substrate electrically coupling the conductive fill and the leadwire connection feature. The at least one via hole may comprise at least one staggered via hole. A header block may be associated with the elevated feedthrough, wherein the header block comprises an access aperture corresponding to a location adjacent to the leadwire connection feature.
In an exemplary embodiment of the present invention, an elevated feedthrough attachable to a top or a side of an active implantable medical device comprises a conductive ferrule, a dielectric substrate defined as comprising a body fluid side and a device side disposed within the conductive ferrule and comprising a body fluid side elevated portion generally raised above the conductive ferrule, at least one via hole disposed through the dielectric substrate from the body fluid side to the device side, a conductive fill disposed within the at least one via hole and electrically conductive between the body fluid side and the device side, at least one leadwire connection feature on the body fluid side electrically coupled to the conductive fill and disposed adjacent to the elevated portion of the dielectric substrate, and a header block associated with the elevated feedthrough, wherein the header block comprises an access aperture corresponding to a location adjacent to the leadwire connection feature.
In an exemplary embodiment of the present invention, an elevated wire bond pad feedthrough attachable to an active implantable medical device comprises a conductive ferrule, a dielectric substrate defined as comprising a body fluid side and a device side disposed within the conductive ferrule, at least one via hole disposed through the dielectric substrate from the body fluid side to the device side, a conductive fill disposed within the at least one via hole and electrically conductive between the body fluid side and the device side, a leadwire connection feature on the body fluid side electrically coupled and co-fired within the conductive fill and protruding above the dielectric substrate comprising a side-accessible wire bond pad.
In another exemplary embodiment a support recess may be adjacent to and behind the side-accessible wire bond pad configured to abut a support on an associated header block. A header block associated with the feedthrough may comprises an access aperture corresponding to a location adjacent to the side-accessible wire bond pad. A slot may be disposed within the side-accessible wire bond pad.
In an exemplary embodiment of the present invention an elevated feedthrough attachable to an active implantable medical device comprises a conductive ferrule, a dielectric substrate defined as comprising a body fluid side and a device side disposed within the conductive ferrule and comprising an elevated portion generally raised above the conductive ferrule, at least one first metallization disposed through the dielectric substrate from the device side and stopping before exiting the body fluid side, at least one leadwire connection feature on the body fluid side electrically coupled to the at least one first metallization and disposed adjacent to the elevated portion of the dielectric substrate, and at least one circuit trace disposed within the dielectric substrate electrically connecting the at least one leadwire connection feature and the at least one first metallization.
In another exemplary embodiment, the dielectric substrate may comprise a second elevated portion generally raised above the elevated portion. At least one second metallization may be disposed through the dielectric substrate from the device side and stopping before exiting the body fluid side. At least one second leadwire connection feature on the body fluid side may be electrically coupled to the at least one second metallization and disposed adjacent to the second elevated portion of the dielectric substrate. At least one second circuit trace may be disposed within the dielectric substrate electrically connecting the at least one second leadwire connection feature and the at least one second metallization. The dielectric substrate may comprise a plurality of raised elevated portions generally raised above the first and second elevated portions.
In an exemplary embodiment of the present invention a header attachable to an active implantable medical device comprises a biocompatible header block, a leadwire disposed within the header, a leadwire port connectable to an implantable lead and electrically coupled to the leadwire, and a feedthrough connection feature coupled to the leadwire comprising a moveably biased electrical connector configured to abut a metallization of a hermetic feedthrough for the active implantable medical device.
In another exemplary embodiment, the biased electrical connector may comprise a compression spring biasing a moveable plunger, a cantilevered beam or a flexure.
Other features and advantages of the present invention will become apparent from the following more detailed description, when taken in conjunction with the accompanying drawings, which illustrate, by way of example, the principles of the invention.
The accompanying drawings illustrate the invention. In such drawings:
As used herein, the term “lead” refers to an implantable lead containing a lead body and one or more internal lead conductors. A “lead conductor” refers to the conductor that is inside of an implanted lead body. As used herein, the term “leadwire” refers to wiring that is either inside of the active implantable medical device (AIMD) housing or inside of the AIMD header block assembly or both. As used herein, the term header block is the biocompatible material that attaches between the AIMD housing and the lead. The term header block connector assembly refers to the header block including the connector ports for the leads and the wiring connecting the lead connector ports to the hermetic terminal subassemblies which allow electrical connections to hermetically pass inside the device housing. It is also understood by those skilled in the art that the present invention can be applicable to active implantable medical devices that do not have a header block or header block connector assemblies such as pulse generators.
The ferrule 122 of the hermetic terminal subassembly 116 is generally mechanically and hermetically attached to the AIMD housing 102 by laser welding 128 processes or the like. Attached directly on or adjacent to the hermetic terminal subassembly 116 is a feedthrough capacitor 124 which is used to decouple unwanted electromagnetic interference (EMI) signals that may couple to the implanted leads 110 and 110′. The feedthrough capacitor filter prevents such undesirable EMI signals from entering into the interior of the pacemaker housing 102. It is particularly adverse for high frequency EMI signals to enter into the inside of the AIMD housing 102 because once high frequency noise is inside, it can cross-couple or re-radiate to sensitive pacemaker circuits thereby disrupting proper operation of the device. For example, it has been documented in numerous technical papers that EMI can be falsely interpreted by a cardiac pacemaker as a normal heartbeat. Modern pacemakers are demand-type devices to save battery energy. That is, in the presence of a normal heartbeat, they will turn off to save battery energy. If EMI is improperly sensed as a cardiac signal, and the device turns off (inhibits) this becomes immediately life-threatening to a pacemaker dependent patient as, in this particular case, the patient's heart will not function without the pacemaker. In this particular case, the patient's heart stops beating altogether because the pacemaker has stopped providing the electrical pulses the heart needs to pump blood and sustain life. Once the leadwires 118a, 118b, 118c and 118d pass through the feedthrough capacitor, the high frequency electromagnetic noise has been largely eliminated and therefore the signals coming to the circuit board 126 will be relatively clean and be comprised primarily of low frequency biologic signals and/or pacing pulses.
The feedthrough capacitor 124 is generally bonded at or adjacent to the hermetic terminal assembly 116. The reason for this is it is very important to intercept and decouple electromagnetic signals before they can enter into the interior space of the AIMD housing. EMI engineers call this the “genie in the bottle” effect. In other words, once the genie (i.e., EMI) is inside the AIMD housing 102, it can wreak havoc with electronic circuit functions by cross-coupling and re-radiating all over and anywhere within the bottle (i.e., the pulse generator). Consequently, it is very important that the feedthrough capacitor filter element be disposed at the point of leadwire ingress/egress where it can attenuate and/or filter high frequency electromagnetic noise before it becomes detrimental to the intended therapy delivery of the AIMD, and potentially life threatening to the patient. Accordingly, the feedthrough capacitor 124 has an electrical connection 146 between the capacitor electrode plate metallization 130 and terminal pin 118. There is a similar electrical connection 148 made between the capacitor outside diameter metallization 132 and the ferrule 122 of the hermetic seal housing. In this particular connection, an added performance reliability benefit is realized. In general, making an electrical connection 148 directly to a titanium surface is contraindicated. This is because titanium forms oxides which tend to be resistive, particularly at high frequency. By way of the present invention, connection is always made to a non-oxidized surface, such as the gold braze or a gold bond pad 140. In the case of the latter, one is referred to U.S. Pat. No. 6,765,779, which illustrates such gold bond pad connections, the contents of which are herein incorporated by reference. The ferrule 122 of the hermetic terminal subassembly is generally laser welded 128 to the titanium housing 102 of the AIMD. The housing 102 forms a complete and hermetically sealed chamber, but also forms an overall electromagnetic shield. This is also known as an equipotential surface or ground. The ground symbol 144 illustrated in
An issue with the use of platinum for hermetic terminal subassembly leadwires 118a-d is that platinum has become extremely expensive and may be subject to premature fracture under rigorous processing such as ultrasonic cleaning or application use/misuse, possibly unintentional damaging forces resulting from Twiddler's Syndrome. Accordingly, what is needed is a filtered structure like a feedthrough-feedthrough capacitor assembly 116, 124 which eliminates these high-priced, platinum, platinum-iridium or equivalent noble metal hermetic terminal subassembly leadwires 118. For additional examples of hermetic terminal subassemblies with feedthrough capacitors that employ leadwires 118, one is referred to U.S. Pat. Nos. 5,333,095, 5,896,267, 5,751,539, 5,905,627, 5,959,829, 5,973,906, 6,008,980, 6,159,560, 6,275,379, 6,456,481, 6,529,103, 6,566,978, 6,567,259, 6,643,903, 6,765,779, 6,765,780, 6,888,715, 6,985,347, 6,987,660, 6,999,818, 7,012,192, 7,035,076, 7,038,900, 7,113,387, 7,136,273, 7,199,995. 7,310,216, 7,327,553, 7,489,495, 7,535,693, 7,551,963, 7,623,335, 7,797,048, 7,957,806, 8,095,224, 8,179,658 the contents of all of which are incorporated herein by reference.
As discussed earlier, for ceramic based hermetic terminals or feedthroughs, the most critical feature in its design is the metal/ceramic interface. Also as indicated above, one method for limiting residual stress is to select combinations of materials whose thermal contractions after bonding are matched. Alternatively, materials with different CTEs can be coupled through braze materials whose high creep rate and low yield strength reduce the stresses generated by the differential contraction. Given the challenge associated with CTE matching, it is the intent of the present invention to deliberately generate hermetic structures with residual stress levels such that either matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created, thereby creating a hermetic seal. As given above, usually this is accomplished by selecting components with different CTEs, however, the intent of the present invention is to deliberately create the desired level of residual stresses by judiciously selecting the ceramic and via fill materials and prescribing a firing process that results in the ceramic material shrinking more than that of the via fill material. Additionally, the intent of the present invention is to deliberately create a mutually conformal interface (tortuous, intimate knitline) between the ceramic and the via fill materials. Further, the intent of the present invention is to also deliberately create an interface bond between the ceramic and the via fill material that is tolerant of stress and of CTE mismatch between the ceramic and the via fill materials and is not susceptible to erosion by body fluids so as to achieve sustainable hermeticity over service life. The term “knitline” is defined herein as the interfacial boundary between the alumina and the platinum. The knitline may form a meandering or undulating path that provides sufficient tortuousity such that it inhibits crack initiation, and more importantly, crack propagation, and additionally, because of the intimacy of the knitline, impairs leakage of fluids. As used herein, the word tortuous or tortuousity refers to the roughened, complex, or undulating knitline that is formed at the interfacial boundary between the alumina and the platinum. This tortuous interface is characterized by hills and valleys which is topographically three dimensional and forms a very strong and reliable hermetic bond.
In part, the critical aspect of the metal/ceramic interface is related to the intimacy and tortuousity of the knitline formed when the metal surface mates with the ceramic surface (i.e., post sintering, the metal surface should mirror the image of the ceramic surface and intimately, or tightly, mate with each other), the type of bond between the ceramic and the metal (certain glass phased interfaces are contraindicated due to their susceptibility to erosion by body fluids, and hence, subsequent separation and loss of hermeticity at these interfaces), and the sensitivity of the bond strength to a tensile stress field (residual stresses in the final structure should be sufficiently less than the possible failure stresses of the structure). Any broken symmetry, aberrant dimensionality due to poor process control, unfavorable design aspect ratios, design aspects wherein intolerable stress concentrations or fields develop, atomic relaxation is inhibited and intermixing of atoms at their boundaries that can substantially negatively modify the deformational tolerance of the final structure must be considered when creating interfaces between ceramic oxides and conductive metal vias within those ceramic oxides to preserve intentional immediate and sustainable functional behavior such as hermeticity.
There are a number of patents that disclose alternatives for platinum leadwires 118 in hermetic terminal subassemblies. Among these are a few that discuss hermetic terminals manufactured by a co-fire process and based on an alumina ceramic with platinum paste filled vias. Some of the more prominent concepts are disclosed in U.S. Pat. Nos. 5,782,891 to Hassler et al., 6,146,743 to Haq et al., 6,414,835 to Wolf et al., 8,000,804 to Wessendorf et al., 8,043,454 to Jiang et al., and US Published Applications 2007/0236861 to Burdon et al., 2007/00609969 to Burdon at al., 2011/0102967 to Munns et al., and 2011/0248184 to Shah. None of the prior art concepts, however, including the prominent concepts noted above, teaches a structure that has a mutually conformal interface, also called a tortuous, intimate knitline, that results in sustainable hermeticity for an AIMD. Further, none of the prior art, including the prominent concepts noted above, teach a structure, or the manufacture of such a structure, having residual stress levels such that either matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via at the bonding interface are created.
Briefly discussing each of the prominent concepts provided above, U.S. Pat. No. 5,782,891 to Hassler et al. is directed to an implantable ceramic enclosure which has a hermetically sealed substrate through which vias pass. While Hassler teaches a ceramic substrate feedthrough co-fired with metallic conductive interconnects, these interconnects are either staggered or are straight with a broad conductor (see Hassler FIG. 8). It is the staggering of the vias alone or in conjunction with a broad conductor that imparts hermeticity of the vias in this structure, and not a mutually conformal interface or tortuous, intimate knitline for a single straight via. Additionally, Hassler teaches selection of materials to avoid shrinkage mismatch and not structures wherein shrinkage of the ceramic is greater than shrinkage of the filled via material. Further Hassler does not teach a terminal or feedthrough having residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
U.S. Pat. No. 6,146,743 to Haq et al. teaches hermetically sealed multilayer substrates with vias. One is directed to Haq FIG. 16, which has been reproduced herein as
U.S. Pat. No. 6,414,835 to Wolf et al. discloses “hermetically sealing the common substrate edge to the ferrule inner wall within the centrally disposed ferrule opening and electrically coupling the plurality of substrate ground paths to the ferrule”, and claims a “plurality of substrate conductive paths extending through the co-fired metal-ceramic substrate between the internally and externally facing layer surfaces and electrically isolated from one another further comprise a plurality of electrically conductive vias extending through via holes of the plurality of layer thicknesses and a plurality of electrically conductive traces formed on certain of the internally or externally facing layer surfaces such that the conductive traces join the conductive vias to form each substrate conductive path.” FIG. 5 of Wolf et al. illustrates this as staggered vias. Further the vias in FIG. 5 of Wolf are subsequently covered with biocompatible end caps 70 and biocompatible gold brazes 80 on the body fluid side. It is the staggering of the vias in conjunction with the end caps that imparts hermeticity of the vias in this structure, and not a mutually conformal interface or tortuous, intimate knitline for a single straight via. Wolf teaches trimming laminated ceramic layers to account for shrinkage and also compression of the co-fired substrate by the ferrule. Wolf, however, does not teach structures wherein shrinkage of the ceramic is greater than shrinkage of the filled via material. Further Wolf does not teach a terminal or feedthrough having residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
U.S. Pat. No. 8,000,804 to Wessendorf et al. illustrates an electrode array for a neurostimulator. The Wessendorf patent teaches “a plurality of electrodes arranged in a two-dimensional array and extending through the ceramic base between the first and second major surfaces; a ceramic lid having a plurality of electrical connections extending therethrough, with the ceramic lid being attachable to the ceramic base to form a hermetically-sealed interior region; and an electronic circuit (e.g. a demultiplexer circuit) located within the hermetically-sealed interior region.” Hermeticity in this case is imparted by “a two-part ceramic package which can be hermetically sealed” and not by a mutually conformal interface or tortuous, intimate knitline for each single straight via. Wessendorf teaches matching CTEs for ceramic and via fill materials, however, Wessendorf does not teach structures wherein shrinkage of the ceramic is greater than shrinkage of the filled via material. Further Wessendorf does not teach a terminal or feedthrough having residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
U.S. Pat. No. 8,043,454 to Jiang et al. describes a method of making a hermetic via in a ceramic substrate that is composed of a noble metal powder in a glass-free paste that contains alumina and a mixture of niobium pentoxide. The addition of the niobium pentoxide to the pre-sintered paste prevents shrinkage of the paste during thermal processing and binds to both the ceramic and the noble metal particulates in the via, thus maintaining a hermetic seal around the via. Hence, hermeticity in this case is imparted by niobium pentoxide and not a mutually conformal interface or tortuous, intimate knitline for a single straight via. Jiang teaches avoiding CTE mismatches for feedthroughs and compression seals formed by metal tubing on ceramic insulators, however, Jiang does not teach structures wherein shrinkage of the ceramic is greater than shrinkage of the filled via material. Further Jiang does not teach a terminal or feedthrough having residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
U.S. Patent Publications 2007/0236861 and 2007/0060969 both to Burdon et al. disclose hermetic interconnects for implantable medical devices. One embodiment includes a conductive material introduced to a via in a single layer. Also disclosed are alumina ceramic with vias in which the conductive material may be platinum. Both publications discuss terminal assemblies comprising staggered vias only. Hermeticity in these structures is imparted by the staggered vias and not by a mutually conformal interface or tortuous, intimate knitline for a single straight via. Neither application teaches structures wherein shrinkage of the ceramic is greater than shrinkage of the filled via material. Further neither application discusses or teaches a terminal or feedthrough having residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
U.S. Patent Publication 2011/0102967 to Munn et al. discloses a multilayered feedthrough for an implantable medical device that includes a substrate having a first edge, a second edge, and a substrate length. A plurality of traces is formed on the substrate and extends along the substrate length. The plurality of traces extends to the first and second edges of the substrate. An insulator layer is formed on the substrate and the plurality of traces. A ground plane layer is formed on the insulator layer. Munn FIG. 7 shows the individual vias of this structured captive within these substrates which in turn imparts hermeticity to this structure and not by a mutually conformal interface or tortuous, intimate knitline for a single straight via. Munn does not discuss or teach structures wherein shrinkage of the ceramic is greater than shrinkage of the filled via material. Further Munn does not discuss or teach a terminal or feedthrough having residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
U.S. Patent Publication 2011/0248184 by Shah reveals a sensor substrate with via holes. At least one of the via holes is hermetically sealed with an optically transmissive material and not by a mutually conformal interface or tortuous, intimate knitline for a single straight via. Shah does not discuss or teach structures wherein shrinkage of the ceramic is greater than shrinkage of the filled via material. Further Shah does not discuss or teach a terminal or feedthrough having residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
In summary, none of the prior art concepts teach a structure that has a mutually conformal interface or tortuous, intimate knitline that results in sustainable hermeticity for an AIMD, has higher shrinkage of the ceramic than of via fill material, or possesses residual stress levels such that matched hermetic structures or structures that have protectively compressive stresses from the ceramic part to the filled via material at the bonding interface are created.
It is understood that “vias” are defined as holes, apertures, conduits, or voids created in either insulators or capacitors. A via can also be filled with a conductive material or bore-coated with a conductive material such that the inside surface is metalized and conductively coated. A via in a capacitor will generally be referred to as a capacitor via. A via in an insulator will generally be referred to as an insulator via. Accordingly, the terms filled or bore-coated can also be applied to either capacitor vias or insulator vias.
In addition, latent hermetic failures in device feedthrough terminals have been known to occur due to susceptibility of the glass phased interface between these mating materials to erosion by body fluids. This outcome is particularly prevalent for interfaces comprising silicate glasses that are often a result of the additives to ceramic slurries forming the tapes and via fill materials that are used to build multilayer ceramic feedthrough structures. Dissolution of silicate glasses is composition dependent. In particular, erosion of silicate glasses in the body typically occurs when the silica content is lower than about 60%. Silica glasses, as suggested by the name, are based on a tetrahedral network of atoms comprising silicon and oxygen covalently bonded to each other. Heat treatment during the assembly process of the feedthrough structure provides the means by which other elements, such as alkali and/or alkaline ions, can be introduced into the silica atomic network. When the glass composition formed at the interface is more than 60% silica, the atomic network within the glass structure typically becomes resistant to reaction with body fluids due to the dense nature of the atomic network structure. However, when the glass composition formed at the interface is less than about 60%, the glass structure is more susceptible to atomic structural degradation.
Degradation is generally due to the disruption of the silica atomic network within the glass structure by other elements, such as alkali and/or alkaline ions, introduced during binder bake out and sintering. These other elements are typically introduced into the feedthrough structure from additives used within the green alumina tape or the via fill materials, such as the platinum paste, or both. For example, if the additives in either material make available alkali-metal atoms for exchange with silicon atoms within the silica atomic network, and if the result is an interface having a silica weight percent below about 60%, then rapid ion exchange of the alkali-metal cations with hydrogen ions from body fluid typically occurs. This results in the formation of functional hydroxyl, or —OH, groups that are highly reactive in the body, breaking down and weakening the atomic network structure of the glass phased interface thus increasing the likelihood of a breach in the hermeticity of the feedthrough terminal. Hence, hermetic structures created by mating alumina and platinum are not obvious and any inherency in the bond developed between these two materials does not necessarily result in a biocompatible final structure that can sustain hermeticity over the service life of an AIMD.
Once again referring to U.S. Pat. No. 8,043,454 of Jiang et al., in sharp contrast to the present invention, Jiang adds between 1-10 percent by weight of niobium pentoxide. Another way to look at this is in the present invention, organic binders and solvents are used as opposed to inorganic additives. Referring once again to
In the present invention, a post sintered essentially high purity alumina substrate 188 with one or more via holes 186 that pass from an outside surface of the alumina substrate 188 to an inside surface of the alumina substrate 188 is provided wherein, the via holes 186 comprise a non-toxic and biocompatible post sintered essentially pure platinum fill. There are several differences between the present invention and the prior art in addition to those specifically discussed in the brief overview of specific art cited. In the prior art, typically various additives are used to modify the alumina ceramic and/or the platinum paste. In the prior art, at times, it is not even a pure platinum paste that is used (see Wessendorf column 5, line 29), but rather one containing other refractory type materials, such as tungsten or the like. These additives are used to match the CTE during fabrication. In other words, these prior art systems go to a lot of effort to match the ceramic and metal parts of the system so that cracking or loss of hermeticity between the alumina substrate 188 and via 186 does not occur over time. Additionally, much of the prior art processes lay down a thin layer of ceramic tape, then use thick-film screen printing or other methods to deposit circuit traces and filler for the previously fabricated via holes 180. These fillers include tungsten inks and the like. Then, these individual layers are dried, stacked up and pressed (laminated) into a bar. There are often registration errors and stair-stepping is visible in the cross-sections of such vias 180.
In the present invention, via holes are not formed in individual tape layers before stack-up. Instead, the alumina ceramic slurry can be thick-cast into tape and then laid down in layers or it may be injected, molded, powder pressed or the like to form a single monolithic structure. In this state, the alumina ceramic is still in the green and very pliable due to the organic binders and solvents that have been temporarily added to the system. It is at this point that via holes 186 are drilled therethrough from the outer surface (body fluid side) to an inner surface (AIMD electronic side) of the alumina substrate 188. Because the holes are drilled after formation of the pre-sintered ceramic substrate 188, there is no requirement for registration with the consequential “stair-stepping” (due to misregistration) that is visible in cross sections of some prior art structures, for example those described in the Second Sight patents.
After via holes are formed, the pure platinum paste composition is injected under pressure or via vacuum into the via holes 186. The pressure or vacuum is carefully controlled in the present invention so that the platinum paste is driven intimately along the surface of the inside of the via such that the paste conforms to and creates a mirror image of the inner surface of the via in the alumina ceramic and, in so doing, interconnect with the already tortuous members prevalent in ceramic/particulate formation. A mutually conforming interface 191 is thereby formed between the platinum fill and the inside diameter of the via hole in the ceramic. Drilling is a preferred method of forming the via hole, but these via holes may also be formed by punching, laser drilling, water cutting or any other equivalent process.
As used herein, the term “essentially high purity alumina” means alumina ceramic with the chemical formula Al2O3. “Essentially pure” means that the post-sintered ceramic is at least 96% alumina. In a preferred embodiment, the post-sintered ceramic is at least 99% high purity alumina. Prior to sintering, the alumina may be a paste, a slurry or green state, and can contain organic solvents and binders. Once these organic solvents and binders are baked out, the alumina is sintered becoming essentially high purity alumina. Similarly, prior to sintering, the platinum paste also contains binders and solvents. The drilled vias of the ceramic insulator are filled with the platinum paste. It is after the binders and solvents are baked out at elevated temperature and then sintered that they are substantially removed and an essentially pure platinum via hole is created.
One is referred to
The present invention centers around three enabling areas: (1) via packing with a high solids loading in the paste, (2) compression by the ceramic of the metal paste during binder bake out and sintering, and (3) a controlled cool down rate in combination with interfacial bonding sufficient to tolerate coefficient of thermal expansion (CTE) mismatch.
Metal/ceramic compatibility is an important factor in manufacturing hermetic terminals. The difference in CTEs of the metal and ceramic is recognized as a major parameter in predicting compatibility. The thermal expansion of metal is generally considerably greater than those of ceramics. For example, at a bakeout temperature of 500° C., the CTE of alumina is 7.8×10−6/K and of platinum is 9.6×10−6/K. Historically, CTE differences within 0.5 to 1.0×10−6/K between the mating metal and ceramic materials are adequate to sustain hermetic bonding between these materials. However, it is believed differences beyond these limits provided at the bake out temperature for the alumina/platinum pair may produce sufficient tensile stresses at the interface during cool down to cause spontaneous bonding failure. Hence, given the significant difference in CTEs, even at a relatively low temperature of 500° C., achieving a hermetic seal between the platinum metal and alumina ceramic would not be expected if the difference in CTE between the sintered alumina and the platinum metal exceeds 0.5 to 1.0×10−6/K. Rather, the present invention achieves a hermetic feedthrough structure through the controlled fabrication process parameters of the platinum metal particle solids loading within the paste, controlled packing of the platinum paste within the via, and the controlled shrinkage of the alumina substrate and platinum via paste through a prescribed co-fire heating profile.
In addition, a highly irregular surface at the material interface between the alumina substrate and the platinum metal particles within the via provides a mechanical contribution to adherence and robustness of the hermetic seal. A surface roughness produced by drill bits, sandblasting, gritblasting or chemical etching of the metal substrate can increase the surface area and, in so doing, provide for a stronger mechanical attachment along the mutually conformal interface. Applying this concept to the alumina/platinum interface therein provides for another novel aspect of the present invention. Examples of sandblasting and gritblasting media include sand, sodium bicarbonate, walnut shells, alumina particles or other equivalent media.
In the present invention, to achieve sustainable hermeticity, the following is required. Because the CTE of platinum is sufficiently higher than the CTE of alumina, it is not theoretically possible for alumina to provide compressive forces on a platinum body in a via. Hence, to overcome the CTE differences between these two materials, the platinum body in the via must be formed using a paste, a slurry or the like, having a minimum of 80% solids loading. In a preferred embodiment, the solids loading of the platinum particles within the paste is 90%. In a more preferred embodiment, the solids loading of the platinum particles within the paste is 95%. In addition, the via must be packed with the platinum paste to occupy at least 90% of the available space within each via opening. In a preferred embodiment, the platinum paste is packed within the via opening to occupy 95% of the space. In a more preferred embodiment, the platinum paste is packed to occupy 99% of the via opening. The shrinkage of the alumina must be no greater than 20% of that of the platinum fill in the via. In a preferred embodiment, shrinkage is 14%. In a more preferred embodiment, shrinkage is 16%.
Furthermore, the assembly is exposed to a controlled co-firing heating profile in ambient air that comprises a binder bakeout portion, a sintering portion and a cool down portion.
In an embodiment, the binder bakeout portion is performed at a temperature of between 400° C. to 700° C. for a minimum of 4 hours. A preferred binder bakeout is at a temperature of between 550° C. to 650° C. A more preferred binder bakeout is at a temperature of between 500° C. to 600° C. The sintering profile portion is preferably performed at a temperature ranging from 1,400° C. to 1,900° C. for up to 6 hours. A preferred sintering profile has a temperature between 1,500° C. to 1,800° C. A more preferred sintering temperature is between 1,600° C. to 1,700° C. The cool down portion occurs either by turning off the heating chamber and allowing the chamber to equalize to room temperature or, preferably by setting the cool down portion at a rate of up to 5° C./min from the hold temperature cooled down to about 1,000° C. At 1,000° C., the chamber is allowed to naturally equalize to room temperature. A more preferred cool down is at a rate of 1° C./min from the hold temperature to about 1,000° C. and then allowing the heating chamber to naturally equalize to room temperature. In so doing, the desired outcome of achieving a robust hermetic seal is achieved between the mating materials of the alumina and platinum. It is noted that these materials have a CTE mismatch beyond the limits heretofor recognized as adequate for sustained bonding.
During processing of the platinum fill densities and additionally during the densification phase, compression is imparted by the alumina around the platinum within the via due to the shrinkage of the alumina being greater than that of the platinum. Furthermore, the platinum is sufficiently malleable at this phase to favorably deform by the compressive forces being applied by the alumina. The combination of the platinum solids loading, the platinum packing in the via and the shrinkage of the alumina being greater than the platinum fill results in the platinum taking the shape of the mating alumina surface. The amount of platinum solids loading, its packing percentage within the via and the malleability of the platinum material all contribute to formation of a hermetic seal between the platinum and alumina. In addition, the compressive forces that result from the greater shrinkage of the alumina substrate than that of the platinum within the via limit expansion of the platinum and force the platinum to deform such that it forms a hermetic seal. Thus an interface between the alumina and platinum materials that conforms to the respective interface surfaces and results in a nearly exact mirror image of the interfacing surfaces is formed, thereby creating a hermetic bond therebetween. This mutually conformal interface is critical, particularly as researchers studying bonding between alumina and platinum believe that any strength in the bonding between the alumina and platinum is physical.
As noted earlier, strong bonding between the alumina and the platinum is the most important factor in achieving sustainable hermeticity in feedthrough terminals for AIMDs. The inventors have learned that the co-fire parameters used to form the hermetic terminals of the present invention provide unanticipated, but novel benefit of leveraging the catalytic nature of platinum, that is, platinum's affinity for certain elements, which enables either direct bonding or formation of an interfacial layer between the two materials. Analysis of the interface between the alumina and the platinum of this invention disclosed not only the creation of an intimate knitline, but, in the case of the interfacial layer, a hermetic structure that exhibits an amorphous layer at the knitline comprising the elements platinum, aluminum, carbon and oxygen that appears to impart resistance to erosion by body fluids. Both these bonding mechanisms, direct bonding and an amorphous interfacial layer, offer additional tolerance to the CTE mismatch between these two materials.
Referring back to
Another important feature of the present invention is closed cell porosity 190 as shown in
It has been demonstrated that in a normal patient environment, a patient can be exposed to EMI. This EMI can take many forms, such as that from cellular telephones, airport radars, microwave ovens, and the like. A new international standard ISO 14117 has evolved, which includes tests standards to which cardiac pacemakers and implantable defibrillators must be exposed in order to be qualified by the FDA. There are similar specifications for cochlear implants and neurostimulators. Accordingly, it is important to provide EMI filtering at the point of lead conductor ingress into the interior of the AIMD. It is best to decouple high frequency interference before it gets inside of the AIMD housing 102. Once inside an AIMD housing 102, as illustrated in
Referring to
In comparison to the prior art leadwires 118 previously illustrated in
Referring once again to
Referring once again to
Although several embodiments have been described in detail for purposes of illustration, various modifications may be made to each without departing from the scope and spirit of the invention. Accordingly, the invention is not to be limited, except as by the appended claims.
Claims
1. A hermetically sealed feedthrough that is attachable to an active implantable medical device (AIMD), the feedthrough comprising:
- a) an electrically conductive ferrule comprising a ferrule sidewall defining a ferrule opening extending to a ferrule body fluid end surface and to a ferrule device side end surface, wherein, when the ferrule is attached to an opening in a housing of an AIMD, the ferrule body fluid end surface and the ferrule device side end surface reside outside the AIMD and inside the AIMD, respectively;
- b) an alumina substrate comprised of at least 96% alumina and having a thickness extending from to a substrate body fluid side and to a substrate device side, wherein the alumina substrate resides in the ferrule opening where the alumina substrate is hermetically sealed to the ferrule;
- b) a c) an active via hole disposed extending through the alumina substrate from to the substrate body fluid side and to the substrate device side, wherein a counter-bore in the substrate is aligned with the active via hole and has a depth that extends from the substrate body fluid side part-way into the substrate thickness;
- c) d) a substantially closed pore and substantially pure closed-pore platinum fill disposed within that is hermetically sealed to the alumina substrate in the active via hole and, the substantially closed-pore platinum extending between to the counter-bore at the substrate body fluid side and to or adjacent to the substrate device side of the alumina substrate; and
- d) a hermetic seal between the platinum fill and the alumina substrate,
- e) an electrically conductive bond pad comprising a pad portion and a post, wherein the pad portion at least partially resides in the counter-bore on the substrate body fluid side with the post extending into the substantially closed-pore platinum in the active via hole, and
- f) wherein the platinum fill forms a tortuous and mutually conformal knitline or interface between the alumina substrate and the platinum fill pad portion of the bond pad has an uninterrupted upper surface of a width that is greater than a diameter of the via hole, and
- g) wherein the combined length of the pad portion and the post of the bond pad is less than the substrate thickness.
2. The feedthrough of claim 1, wherein the alumina substrate comprises at least 99% alumina.
3. The feedthrough of claim 1, wherein there is a tortuous and mutually conformal knitline between the alumina substrate and the platinum fill and wherein the knitline comprises a glass that is at least about 60% silica.
4. The feedthrough of claim 1, wherein the hermetic seal has a leak rate at least no greater than 1×10−7 std cc He/sec.
5. The feedthrough of claim 1, wherein an inherent shrink rate during a heat treatment of the alumina dielectric substrate in a substrate green state is greater than that of the substantially closed-pore platinum fill in the a platinum green state.
6. The feedthrough of claim 1, wherein the substantially closed-pore platinum fill is characterized as having been formed from a platinum paste that prior to bake out bake-out and sintering had a platinum metal content of at least 80%.
7. The feedthrough of claim 1, wherein the substantially closed-pore platinum fill is characterized as having been formed from a platinum paste that prior to bake out bake-out and sintering had a platinum metal content of about 95%.
8. The feedthrough of claim 1, wherein the substantially closed-pore platinum fill is characterized as having been packed into the active via hole prior to bake out bake-out and sintering to occupy at least 90% of the available space in the active via hole.
9. The feedthrough of claim 1, wherein the substantially closed-pore platinum fill is characterized as having been packed into the active via hole prior to bake out bake-out and sintering to occupy about 99% of the available space in the active via hole.
10. The feedthrough of claim 1, wherein, as a result of having been subjected to a bake-out and sintering, the alumina dielectric substrate is characterized as having shrunk from a substrate green state by about 20% to about 14% more than the substantially closed-pore platinum fill shrinks from a platinum green state as a result of having been subjected to bake out and sintering.
11. The feedthrough of claim 1, wherein, as a result of having been subjected to bake-out and sintering, the alumina dielectric substrate is characterized as having shrunk from a substrate green state by about 16% more than the substantially closed-pore platinum fill shrinks from a platinum green state as a result of having been subjected to bake out and sintering.
12. The feedthrough of claim 1, wherein a difference in a first coefficient of thermal expansion (CTE) of the alumina dielectric substrate and a second CTE of the substantially closed-pore platinum fill is from about 0.5×10−6/K to about 1.0×10−6/K.
13. The feedthrough of claim 1, wherein the platinum filled active via hole comprises a larger cross sectional cross-sectional area at either both a first active via end exposed to at the substrate body fluid side or and at a second active via end exposed to at the substrate device side as compared to a smaller cross sectional cross-sectional area of the platinum filled that portion of the active via hole that resides between the first and second active via ends.
14. The feedthrough of claim 1 including an electrically conductive cap or protrusion co-fired to the platinum fill on the body fluid side.
15. The feedthrough of claim 14 1, wherein the cap or protrusion bond pad comprises platinum or titanium.
16. The feedthrough of claim 1, including an adhesion metallization disposed on an outside outer circumferential surface of the alumina substrate and a wetting metallization disposed on the adhesion metallization.
17. The feedthrough of claim 16 including a wetting metallization disposed on the adhesion metallization.
18. The feedthrough of claim 17 including a ferrule disposed around the alumina substrate 16, wherein a gold braze hermetically seals the ferrule to the adhesion and wetting metallizations disposed on the alumina substrate.
19. The feedthrough of claim 18 including a gold braze hermetically sealing the alumina substrate to the ferrule.
20. The feedthrough of claim 19 18, wherein the braze between the alumina substrate and the ferrule has a leak rate at least no greater than 1×10−7 cc He/sec.
21. The feedthrough of claim 20 1, wherein the ferrule comprises titanium.
22. The feedthrough of claim 16, wherein the adhesion metallization comprises titanium and the wetting metallization comprises niobium or molybdenum.
23. The feedthrough of claim 17 wherein the wetting metallization comprises niobium or molybdenum.
24. The feedthrough of claim 1, wherein the alumina dielectric substrate comprises a castellation recess disposed on the substrate device side, and wherein a monolithic chip capacitor is disposed within the castellation recess, the monolithic chip capacitor comprising an active electrode plate set disposed parallel to a ground electrode plate set, the active electrode plate set being electrically connected to the substantially closed-pore platinum disposed in the active via hole by a first circuit trace disposed within the alumina substrate, and the ground electrode plate set being electrically connected to an outer metallization disposed on the alumina substrate by a second circuit trace disposed within the alumina substrate.
25. The feedthrough of claim 24 including a monolithic chip capacitor disposed within the castellation recess, the monolithic chip capacitor comprising an active electrode plate set disposed parallel to a ground electrode plate set.
26. The feedthrough of claim 25 wherein the active electrode plate set is electrically coupled to the platinum fill by a first circuit trace disposed within the alumina substrate, and wherein the ground electrode plate set is electrically coupled to the adhesion metallization by a second circuit trace disposed within the alumina substrate.
27. The feedthrough of claim 1, including a feedthrough capacitor attached to the alumina dielectric substrate.
28. The feedthrough of claim 27, including wherein an insulative washer is disposed between the alumina substrate and the feedthrough capacitor.
29. The feedthrough of claim 27, wherein the feedthrough capacitor comprises a second dielectric substrate, a conductive capacitor via hole disposed through the second dielectric substrate, a set of active electrode plates disposed within the second dielectric substrate and being electrically coupled to the conductive capacitor via hole, an outside outer feedthrough capacitor metallization disposed on an outside outer surface of the feedthrough capacitor, and a set of ground electrode plates disposed within the second dielectric substrate and being electrically coupled to the outside feedthrough capacitor metallization.
30. The feedthrough of claim 29, wherein the set of ground electrode plates and the outside outer feedthrough capacitor metallization are electrically coupled to a ferrule.
31. The feedthrough of claim 29, including a ball grid solder joint or braze electrically coupling the set of active electrode plates to the conductive capacitor via hole and to the substantially closed-pore platinum fill in the active via hole extending through the alumina substrate of the feedthrough.
32. The feedthrough of claim 31, including a substrate device side wire disposed within the conductive feedthrough capacitor via hole and being electrically coupled to the substantially closed-pore platinum fill in the active via hole extending through the alumina substrate of the feedthrough and also being electrically coupled to the set of active electrode plates of the feedthrough capacitor by the ball grid solder joint or braze.
33. The feedthrough of claim 1, including at least one grounded ground via hole disposed through the alumina substrate from, the ground via hole extending to the substrate body fluid side and to the substrate device side, wherein a substantially pure grounded ground platinum fill is disposed within the at least one grounded ground via hole, thereby forming a platinum filled grounded ground via hole that is an electrically conductive between path to the substrate body fluid side and to the substrate device side.
34. The feedthrough of claim 33, including a set of feedthrough ground plates disposed within the alumina substrate, the feedthrough ground plate being electrically coupled to the ground platinum filled grounded in the ground via hole and to the ferrule and, wherein the ground platinum in the ground via hole is in a non-conductive relation to with the substantially closed-pore platinum filled in the active via hole.
35. The feedthrough of claim 34, including an internally grounded feedthrough capacitor disposed adjacent to the alumina dielectric substrate.
36. The feedthrough of claim 35, wherein the internally grounded feedthrough capacitor comprises a second dielectric substrate, at least one conductive capacitor via hole disposed extending through the second dielectric substrate, a set of active electrode plates disposed within the second dielectric substrate and being electrically coupled to the at least one conductive capacitor via hole, a conductive grounded ground via hole disposed extending through the second dielectric substrate, and a set of ground electrode plates disposed within the second dielectric substrate and being electrically coupled to the conductive grounded ground platinum disposed within the at least one ground via hole in the second dielectric substrate, and wherein the internally grounded feedthrough capacitor does not have an external metallization on an outer surface of the second dielectric substrate and the set of ground electrode plates do not extend to the outer surface of the second dielectric substrate.
37. The feedthrough of claim 36, including a leadwire comprising a leadwire first end spaced from a leadwire second end, wherein the leadwire first end is connectable at a first end to an AIMD electronic circuit, and at its wherein the leadwire second end is disposed within and electrically coupled to the at least one conductive capacitor via and hole extending through the second dielectric substrate of the feedthrough capacitor where the leadwire second end is conductively connected to the set of active electrode plates disposed within the second dielectric substrate.
38. The feedthrough of claim 37, including a ground leadwire connectable at a comprising a ground leadwire first end spaced from a ground leadwire second end, wherein the ground leadwire first end is connectable to an AIMD electronic circuit, and at its wherein the ground leadwire second end is disposed within and electrically coupled to the feedthrough capacitor conductive grounded ground via and hole extending through the second dielectric substrate of the feedthrough capacitor where the ground leadwire second end is conductively connected to the set of ground electrode plates disposed within the second dielectric substrate.
39. The feedthrough of claim 17 including a hermetically sealed braze between the wetting metallization and an active implantable medical device housing.
40. The feedthrough of claim 33, wherein the at least one grounded ground via hole extending through the alumina substrate and the ground platinum fill disposed within the at least one ground via hole comprise at least two cross sectional areas.
41. The feedthrough of claim 1 including, wherein the bond pad comprises a conductive leadwire disposed within the substantially closed-pore platinum fill on in the active via hole adjacent to at least the substrate body fluid side.
42. The feedthrough of claim 41, wherein the conductive leadwire comprises platinum.
43. The feedthrough of claim 41, wherein the conductive leadwire and the substantially closed-pore platinum fill are characterized as having been co-fired.
44. The feedthrough of claim 1 including a crimp post disposed within the platinum fill on the body fluid side.
45. The feedthrough of claim 1 including a double-sided crimp post disposed through the platinum fill, wherein the double-sided crimp post comprises a first crimp post end on the body fluid side and a second crimp post end on the device side.
46. The feedthrough of claim 1, wherein a resistance of the substantially closed-pore platinum fill from disposed within the active via hole and extending to the substrate body fluid side and to the substrate device side is less than about 0.5 ohms.
47. The feedthrough of claim 1, wherein a resistance of the substantially closed-pore platinum fill from disposed within the active via hole and extending to the substrate body fluid side and to the substrate device side is less than about 0.3 ohms.
48. The feedthrough of claim 1, wherein a resistance of the substantially closed-pore platinum fill from disposed within the active via hole and extending to the substrate body fluid side and to the substrate device side is less than about 10 milliohms.
49. A hermetically sealed feedthrough that is attachable to an active implantable medical device (AIMD), the feedthrough comprising:
- a) an electrically conductive ferrule comprising a ferrule sidewall defining a ferrule opening extending to a ferrule body fluid end surface and to a ferrule device side end surface, wherein, when the ferrule is attached to an opening in a housing of an AIMD, the ferrule body fluid end surface and the ferrule device side end surface reside outside the AIMD and inside the AIMD, respectively;
- b) an alumina substrate comprised of at least 96% alumina and having a thickness extending from to a substrate body fluid side and to a substrate device side, wherein the alumina substrate resides in the ferrule opening where the alumina substrate is hermetically sealed to the ferrule;
- b) c) a via hole disposed through the alumina substrate from, the via hole extending to the substrate body fluid side and to the substrate device side, wherein a counter-bore in the substrate is aligned with the via hole and has a depth that extends from the substrate body fluid side part-way into the substrate thickness;
- c) d) a substantially closed pore and substantially pure closed-pore platinum fill disposed within in the via hole and extending between to the counter-bore at the substrate body fluid side and to or adjacent to the substrate device side of the alumina substrate; and
- d) a hermetic seal between the platinum fill and e) wherein the platinum in the via hole is hermetically sealed to the alumina substrate, and
- e) f) wherein the hermetic seal has a leak rate that is no greater than 1×10−7 std cc He/sec,; and
- f) g) an electrically conductive bond pad comprising a pad portion and a post, wherein the pad portion resides in the counter-bore with the post extending into the platinum in the via hole, and
- h) wherein the platinum fill forms a tortuous and mutually conformal knitline or interface between the alumina substrate and the platinum fill pad portion of the bond pad has an uninterrupted upper surface of a width that is greater than a diameter of the via hole, and
- i) wherein the combined length of the pad portion and the post of the bond pad is less than the substrate thickness.
50. The feedthrough of claim 49 wherein the knitline comprises a glass that is at least about 60% silica.
51. The feedthrough of claim 49, wherein an inherent shrink rate during a heat treatment of the alumina substrate in a substrate green state is equal to or up to 20% greater than an inherent co-fired shrink rate of the substantially closed-pore platinum fill in a platinum green state.
52. A hermetically sealed feedthrough that is attachable to an active implantable medical device (AIMD), the feedthrough comprising:
- a) an electrically conductive ferrule comprising a ferrule sidewall defining a ferrule opening extending to a ferrule body fluid end surface and to a ferrule device side end surface, wherein, when the ferrule is attached to an opening in a housing of an AIMD, the ferrule body fluid end surface and the ferrule device side end surface reside outside the AIMD and inside the AIMD, respectively;
- b) an alumina substrate comprised of at least 96% alumina and having a thickness extending from to a substrate body fluid side and to a substrate device side, wherein the alumina substrate resides in the ferrule opening where the alumina substrate is hermetically sealed to the ferrule;
- b) a c) an active via hole disposed through the alumina substrate from, the active via hole extending to the substrate body fluid side and to the substrate device side;
- c) d) a first substantially closed pore and substantially pure closed-pore platinum fill disposed within in the active via hole and, the substantially closed-pore platinum extending between to the substrate body fluid side and to or adjacent to the substrate device side of the alumina substrate, wherein the first substantially closed-pore platinum fill forms a tortuous and mutually conformal knitline or interface between in the active via hole forms a first hermetic seal with the alumina substrate and the platinum fill; at a first tortuous and mutually conformal knitline, and
- d) a hermetic seal between the first platinum fill and the alumina substrate, e) wherein the first hermetic seal has a leak rate that is no greater than 1×10−7 std cc He/sec;
- e) f) a grounded ground via hole disposed extending through the alumina substrate from to the substrate body fluid side and to the substrate device side;
- f) g) a second substantially closed pore closed-pore platinum fill disposed within in the grounded ground via hole and extending between to the substrate body fluid side and to or adjacent to the substrate device side of the alumina substrate;, wherein the second substantially closed-pore platinum in the ground via hole forms a second hermetic seal with the alumina substrate at a second tortuous and mutually conformal knitline, and
- g) a second hermetic seal between the second platinum fill and the alumina substrate, h) wherein the second hermetic seal has a leak rate that is no greater than 1×10−7 std cc He/sec;
- h) i) at least one grounded ground electrode plate that is electrically coupled to the second grounded substantially closed-pore platinum filled disposed within the ground via and hole, but is in a non-conductive relation to with the first substantially closed-pore platinum filled disposed within the active via hole; and
- i) j) an outer metallization disposed on the alumina dielectric substrate and being electrically connected to the plurality of grounded at least one ground electrode plates plate,
- k) wherein at least one of the active via hole and the ground via hole has a counter-bore aligned with the via hole, the counter-bore having a depth that extends from the substrate body fluid side part-way into the substrate thickness; and
- l) an electrically conductive bond pad comprising a pad portion and a post, wherein the pad portion resides in the counter-bore with the post extending into the first and second substantially closed-pore platinum in the respective at least one of the active via hole and the ground via hole, and
- m) wherein the pad portion of the bond pad has an uninterrupted upper surface of a width that is greater than a diameter of the via hold, and
- n) wherein the combined length of the pad portion and the post of the bond pad is less than the substrate thickness.
53. The feedthrough of claim 52, wherein the knitline first and second knitlines formed by the respective first and second substantially closed-pore platinum fill and the alumina dielectric substrate comprises each comprise a glass that is at least about 60% silica.
54. The feedthrough of claim 52, wherein an inherent shrink rate during a heat treatment of the alumina substrate in a substrate green state is greater than a shrink rate of the first and second substantially closed-pore platinum fills in a their respective platinum green state states.
55. A hermetically sealed feedthrough that is attachable to an active implantable medical device, the feedthrough comprising:
- a) an electrically conductive ferrule comprising a ferrule sidewall defining a ferrule opening extending to a ferrule body fluid end surface and to a ferrule device side end surface, wherein, when the ferrule is attached to an opening in a housing of an AIMD, the ferrule body fluid end surface and the ferrule device side end surface reside outside the AIMD and inside the AIMD, respectively;
- b) an alumina substrate comprised of at least 96% alumina and having a thickness extending to a substrate first side and to a substrate second side, wherein the alumina substrate resides in the ferrule opening where the alumina substrate is hermetically sealed to the ferrule;
- c) an active via hole extending through the alumina substrate to the substrate first side and to the substrate second side, wherein a counter-bore in the substrate is aligned with the active via hole and has a depth that extends from the substrate first side part-way into the substrate thickness;
- d) a substantially closed-pore platinum that is hermetically sealed to the alumina substrate in the active via hole, the substantially closed-pore platinum extending to the counter-bore at the substrate first side and to or adjacent to the substrate second side; and
- e) an electrically conductive bond pad comprising a pad portion and a post, wherein the pad portion resides in the counter-bore with the post extending into the substantially closed-pore platinum in the active via hole, and
- f) wherein the pad portion of the bond pad has an uninterrupted upper surface of a width that is greater than a diameter of the via hole, and
- g) wherein the combined length of the pad portion and the post of the bond pad is less than the substrate thickness.
56. The feedthrough of claim 55, wherein the pad portion of the bond pad has a height that is greater than the depth of the counter-bore so that part of the pad portion extends outwardly beyond the substrate body fluid side bordering the counter-bore.
57. The feedthrough of claim 55, wherein the hermetic seal has a leak rate at least no greater than 1×10−7 std cc He/sec.
58. The feedthrough of claim 55, wherein the substantially closed-pore platinum resides in the counter-bore contacting the pad portion of the bond pad.
59. A hermetically sealed feedthrough that is attachable to an active implantable medical device, the feedthrough comprising:
- a) an electrically conductive ferrule comprising a ferrule sidewall defining a ferrule opening extending to a ferrule body fluid end surface and to a ferrule device side end surface, wherein, when the ferrule is attached to an opening in a housing of an AIMD, the ferrule body fluid end surface and the ferrule device side end surface reside outside the AIMD and inside the AIMD, respectively;
- b) an alumina substrate comprised of at least 96% alumina and having a thickness extending to a substrate first side and to a substrate second side, wherein the alumina substrate resides in the ferrule opening where the alumina substrate is hermetically sealed to the ferrule;
- c) an active via hole extending through the alumina substrate to the substrate first side and to the substrate second side, wherein a counter-bore in the substrate is aligned with the active via hole and has a depth that extends from the substrate first side part-way into the substrate thickness;
- d) a substantially closed-pore platinum that is hermetically sealed to the alumina substrate in the active via hole, the substantially closed-pore platinum extending to the counter-bore at the substrate first side and to or adjacent to the substrate second side; and
- e) an electrically conductive leadwire connection feature extending to a leadwire connection feature first portion having a leadwire connection feature first end and to a leadwire connection feature second portion, wherein the leadwire connection feature first portion is seated on the substrate first side in the counter-bore with the leadwire connection feature first end residing adjacent to the substrate first side, and wherein the leadwire connection feature second portion extends into the substantially closed-pore platinum in the active via hole, and
- f) wherein the leadwire connection feature first portion has an uninterrupted upper surface of a width that is greater than a diameter of the via hole, and
- g) wherein the combined length of the leadwire connection feature first and second portions is less than the substrate thickness.
60. The feedthrough of claim 59, wherein the leadwire connection feature first end is substantially flush with the substrate first side bordering the counter-bore.
61. The feedthrough of claim 59, wherein the leadwire connection feature first end is proud of the substrate first side bordering the counter-bore.
62. The feedthrough of claim 59, wherein the leadwire connection feature first portion has a larger cross-section perpendicular to a longitudinal axis of the leadwire connection feature than the leadwire connection feature second portion.
63. The feedthrough of claim 59, wherein the leadwire connection feature is selected from the group consisting of a wire, a bond pad having a rounded nail head, and a bond pad having a flat nail head.
64. A feedthrough insulator substrate assembly, comprising:
- a) an insulator substrate having a thickness extending to a substrate body fluid side and to a substrate device side, wherein the insulator substrate resides in the ferrule opening where the substrate is hermetically sealed to the ferrule;
- b) an active via hole extending through the insulator substrate to the substrate body fluid side and to the substrate device side, wherein a counter-bore in the substrate is aligned with the active via hole and has a depth that extends from the substrate body fluid side part-way into the substrate thickness;
- c) a substantially closed-pore platinum that is hermetically sealed to the insulator substrate in the active via hole, the substantially closed-pore platinum extending to the counter-bore at the substrate body fluid side and to or adjacent to the substrate device side; and
- d) an electrically conductive bond pad comprising a pad portion and a post, wherein the pad portion resides in the counter-bore, seated on the substrate body fluid side with the post extending into the substantially closed-pore platinum in the active via hole, and wherein the pad portion of the bond pad has a height that is greater than the depth of the counter-bore so that part of the pad portion in the counter-bore extends outwardly beyond the substrate body fluid side bordering the counter-bore, and wherein the substantially closed-pore platinum resides in the counter-bore contacting the pad portion of the bond pad, and
- e) wherein the pad portion of the bond pad has an uninterrupted upper surface of a width that is greater than a diameter of the via hole, and
- f) wherein the combined length of the pad portion and the post of the bond pad is less than the substrate thickness.
65. The feedthrough of claim 64, wherein the bond pad is selected from the group consisting of a wire providing the pad portion and the post, a nail having a rounded nail head, and a nail having a flat nail head.
66. The feedthrough of claim 1, wherein the bond pad is selected from the group consisting of a wire providing the pad portion and the post, a nail having a rounded nail head, and a nail having a flat nail head.
67. The feedthrough of claim 49, wherein the bond pad is selected from the group consisting of a wire providing the pad portion and the post, a nail having a rounded nail head, and a nail having a flat nail head.
68. The feedthrough of claim 52, wherein the bond pad is selected from the group consisting of a wire providing the pad portion and the post, a nail having a rounded nail head, and a nail having a flat nail head.
69. The feedthrough of claim 55, wherein the bond pad is selected from the group consisting of a wire providing the pad portion and the post, a nail having a rounded nail head, and a nail having a flat nail head.
70. The feedthrough of claim 1, wherein the pad portion of the bond pad has a height that is greater than the depth of the counter-bore so that part of the pad portion extends outwardly beyond the substrate body fluid side bordering the counter-bore.
71. The feedthrough of claim 1, wherein the substantially closed-pore platinum resides in the counter-bore contacting the pad portion of the bond pad.
72. The feedthrough of claim 1, wherein the pad portion of the bond pad resides in the counter-bore, seated on the substrate body fluid side with the post extending into the substantially closed-pore platinum in the active via hole.
73. The feedthrough of claim 1, wherein the uninterrupted upper surface of the pad portion of the bond pad is either flush or proud of the substrate body fluid side surrounding the counterbore.
74. A hermetically sealed feedthrough that is attachable to an active implantable medical device (AIMD), the feedthrough comprising:
- a) an electrically conductive ferrule comprising a ferrule sidewall defining a ferrule opening extending to a ferrule body fluid end surface and to a ferrule device side end surface, wherein, when the ferrule is attached to an opening in a housing of an AIMD, the ferrule body fluid end surface and the ferrule device side end surface reside outside the AIMD and inside the AIMD, respectively;
- b) an alumina substrate comprised of at least 96% alumina and having a thickness extending to a substrate body fluid side and to a substrate device side, wherein the alumina substrate resides in the ferrule opening where the alumina substrate is hermetically sealed to the ferrule;
- c) an active via hole extending through the alumina substrate to the substrate body fluid side and to the substrate device side;
- d) a substantially closed-pore platinum that is hermetically sealed to the alumina substrate in the active via hole, the substantially closed-pore platinum extending to or adjacent to the substrate body fluid side and to or adjacent to the substrate device side; and
- e) an electrically conductive double-sided crimp post disposed through the substantially closed-pore platinum in the active via hole, the double-sided crimp post comprising a crimp post first end adjacent to the substrate body fluid side and a crimp post second end adjacent to the substrate device side.
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Type: Grant
Filed: Feb 5, 2016
Date of Patent: Oct 1, 2019
Assignee: Greatbatch Ltd. (Clarence, NY)
Inventors: Xiaohong Tang (Williamsville, NY), William C. Thiebolt (Tonawanda, NY), Christine A. Frysz (Orchard Park, NY), Keith W. Seitz (Clarence Center, NY), Robert A. Stevenson (Canyon Country, CA), Richard L. Brendel (Carson City, NV), Thomas Marzano (East Amherst, NY), Jason Woods (Carson City, NV), Dominck J. Frustaci (Williamsville, NY), Steven W. Winn (Lancaster, NY)
Primary Examiner: Minh Nguyen
Application Number: 15/016,368
International Classification: H02G 3/18 (20060101); A61N 1/05 (20060101); A61N 1/375 (20060101); H01G 4/30 (20060101); H01G 4/35 (20060101); C22C 29/12 (20060101); H01G 2/10 (20060101); H01G 4/40 (20060101); H01G 4/12 (20060101); H01R 43/00 (20060101); H02G 3/22 (20060101); A61N 1/08 (20060101); H01G 4/005 (20060101); B23K 35/30 (20060101); A61N 1/372 (20060101);
