Abstract: Methods for designing semiconductor components, for fabricating semiconductor components, and corresponding semiconductor components are provided. In this case, capacitance structures are either coupled to a supply network or used for rectifying design violations.

Abstract: One aspect of the disclosure relates to an interposer. The interposer may include: a first dielectric layer extending from a substrate in a direction away from a front side of the substrate; a back-end-of-the-line (BEOL) region extending from the substrate in a direction away from the back side of the substrate; a deep trench (DT) capacitor within the substrate and extending toward a back side of the substrate, the DT capacitor having a first portion within the substrate and a second portion within the first dielectric layer; and a through silicon via (TSV) adjacent to the DT capacitor and extending through the first dielectric layer, the substrate, and the BEOL region.

Abstract: Various embodiments include methods and integrated circuit structures. In some cases, a method of forming an integrated circuit structure can include: forming an opening in a low-k dielectric layer; filling the opening with a high-k dielectric material; patterning the low-k dielectric layer outside of the opening and the high-k dielectric layer to form an interconnect opening within the low-k dielectric layer and a capacitor opening within the high-k dielectric layer; and filling the interconnect opening and the capacitor opening with a metal to form an interconnect in the low-k dielectric layer and a capacitor in the high-k dielectric layer.

Abstract: Some embodiments include an assembly having a first wiring level with a plurality of first shield lines and first signal lines. The first shield lines and first signal lines have first segments extending along a first direction and second segments extending along the first direction and laterally offset from the first segments. The assembly includes a second wiring level below the first wiring level and having a plurality of second shield lines and second signal lines. The second shield lines and second signal lines have third segments extending along the first direction and fourth segments extending along the first direction and laterally offset from the third segments. The fourth segments of the second shield lines extend to under the first segments of the first shield lines and are electrically coupled to the first segments of the first shield lines through vertical interconnects.

Abstract: Techniques relate to forming a gate metal via. A gate contact has a bottom part in a first layer. A cap layer is formed on the gate contact and first layer. The gate contact is formed on top of the gate. A second layer is formed on the cap layer. The second layer and cap layer are recessed to remove a portion of the cap layer from a top part and upper sidewall parts of the gate contact. A third layer is formed on the second layer, cap layer, and gate contact. The third layer is etched through to form a gate trench over the gate contact to be around the upper sidewall parts of the gate contact. The gate trench is an opening that stops on the cap layer. Gate metal via is formed on top of the gate contact and around upper sidewall parts of the gate contact.

Abstract: A semiconductor device according to this embodiment includes a semiconductor layer, a plurality of diffusion layers in the semiconductor layer, a gate insulating film, a gate electrode, first contacts, and second contacts. The gate insulating film is on the semiconductor layer between the plurality of diffusion layers. The gate electrode is on the gate insulating film. The first contacts include silicide layers of the same material which are on the gate electrode and the diffusion layers respectively, and first metal layers on the silicide layers. The second contacts are on the first contacts.

Abstract: An integrated circuit includes at least one first conductive feature and at least one second conductive feature. The second conductive feature has at least one extension portion, and the extension portion of the second conductive feature is protruded from the projection of the first conductive feature on the second conductive feature. The integrated circuit further includes at least one third conductive feature, and at least one first conductive via electrically connecting the third conductive feature and the extension portion of the second conductive feature.

Abstract: Interconnect structures are provided that include an intermetallic compound as either a cap or liner material. The intermetallic compound is a thermal reaction product of a metal or metal alloy of an interconnect metallic region with a metal of either a metal cap or a metal layer. In some embodiments, the metal cap may include a metal nitride and thus a nitride-containing intermetallic compound can be formed. The formation of the intermetallic compound can improve the electromigration resistance of the interconnect structures and widen the process window for fabricating interconnect structures.

Abstract: A metallization scheme for vertical field effect transistors (FETs) is provided. By forming lower-level local interconnects connecting source regions located at bottom portions of semiconductor fins, and upper-level interconnects connecting adjacent metal gates located along sidewalls of channel regions of the semiconductor fins, electrical connections to the source regions and the metal gates can be provided through the lower-level local interconnects and the upper-level local interconnects, respectively. As a result, gate, source and drain contact structures are formed on the same side of vertical FETs.

Abstract: A method of forming a package assembly includes forming a first dielectric layer over a carrier substrate; forming a conductive through-via over the first dielectric layer; treating the conductive through-via with a first chemical, thereby roughening surfaces of the conductive through-via; and molding a device die and the conductive through-via in a molding material.

Abstract: A leakage laser beam detecting method includes a coating step of coating the lower surface of a wafer with an oil marker, thereafter, a press-bonding step of press-bonding an adhesive tape to the lower surface of the wafer, thereafter, a modified layer forming step of applying a laser beam having a wavelength that can be transmitted through the wafer to the wafer from the upper surface thereof while making the laser beam be focused at a focused point within the wafer thereby to form modified layers in the wafer, thereafter, a peeling step of peeling off the press-bonded adhesive tape, and a leakage laser beam detecting step of detecting areas of the lower surface where the oil marker has been removed when the press-bonded adhesive tape is peeled off as areas marked by leakage laser beams.

Abstract: A wiring board includes a first insulating layer made of a single layer of non-photosensitive resin including a reinforcing member, a center position of the reinforcing member being positioned on a side toward a first surface with respect to a center of the first insulating layer in a thickness direction; a layered structure of a wiring layer and an insulating layer, stacked on the first surface of the first insulating layer; a through wiring provided to penetrate the first insulating layer, the through wiring and the first insulating layer forming a first concave portion at a second surface of the first insulating layer, in which the second end surface of the through wiring is exposed; and a pad for external connection formed at the second surface of the first insulating layer at a position corresponding to the through wiring and having a second concave portion.

Abstract: A power module includes a power semiconductor element, an interconnection material, a circuit board, an external terminal, a joining material, and a sealing resin. A clearance portion is continuously formed between the sealing resin and each of an end surface of the joining material and a surface of the interconnection material so as to extend from the end surface of the joining material to the surface of the interconnection material, the end surface of the joining material being located between the power semiconductor element and the interconnection material, the surface of the interconnection material being located between the end surface and a predetermined position of the interconnection material separated by a distance from the end surface.

Abstract: A technique for making high performance low noise amplifiers, low cost high performance RF, microwave circuits and other devices by using a minimum of costly high performance semiconductors is described. By combining a single discrete portion of an expensive semiconductor with a less expensive GaAs carrier, MMIC devices with improved performance over their discrete counterparts are achieved.

Abstract: Provided is a semiconductor device including a substrate, a pad, a protective layer, a plurality of convex patterns, a redistribution layer (RDL), and a bump. The pad is disposed on the substrate. The protective layer is disposed on the substrate. The protective layer has a first opening exposing a portion of a surface of the pad. The convex patterns are disposed on the protective layer. The RDL is disposed on the convex patterns. The RDL extends from the pad to the convex patterns. The bump is disposed on the convex patterns.

Abstract: Methods of forming connectors and packaged semiconductor devices are disclosed. In some embodiments, a connector is formed by forming a first photoresist layer over an interconnect structure, and patterning the first photoresist layer. The patterned first photoresist layer is used to form a first opening in an interconnect structure. The patterned first photoresist is removed, and a second photoresist layer is formed over the interconnect structure and in the first opening. The second photoresist layer is patterned to form a second opening over the interconnect structure in the first opening. The second opening is narrower than the first opening. At least one metal layer is plated through the patterned second photoresist layer to form the connector.

Abstract: The present technology is directed to manufacturing collars for under-bump metal (UBM) structures for die-to-die and/or package-to-package interconnects and associated systems. A semiconductor die includes a semiconductor material having solid-state components and an interconnect extending at least partially through the semiconductor material. An under-bump metal (UBM) structure is formed over the semiconductor material and is electrically coupled to corresponding interconnects. A collar surrounds at least a portion of the side surface of the UBM structure, and a solder material is disposed over the top surface of the UBM structure.

Abstract: A semiconductor device includes a first die, a second die bonding to the first die thereby forming a bonding interface, and a pad of the first die and exposed from a polymeric layer of the first die. The semiconductor device further has a conductive material on the pad and extended from the pad in a direction parallel to a stacking direction of the first die and the second die. In the semiconductor device, the conductive material extended to a top surface, which is vertically higher than a backside of the second die, wherein the backside is a surface opposite to the bonding interface.

Abstract: A bonding structure and a method for bonding components, wherein the bonding structure includes a nanoparticle preform. In accordance with embodiments, the nanoparticle preform is placed on a substrate and a workpiece is placed on the nanoparticle preform.

Abstract: A anisotropic conductive film includes: an electrically insulating adhesive layer; electrically conductive particles disposed in lattice form in the electrically insulating adhesive layer; a reference electrically conductive particle defined, an electrically conductive particle closest to the reference electrically conductive particle defined as a first electrically conductive particle, an electrically conductive particle equally close or next closest to the reference electrically conductive particle regarding the first electrically conductive particle defined as a second electrically conductive particle. The second electrically conductive particle absent from lattice form axis including the reference electrically conductive particle and first electrically conductive particle.

Abstract: A wafer laminate has an adhesive layer (2) sandwiched between a support (1) and a wafer (3), with a circuit-forming surface of the wafer facing the adhesive layer. The adhesive layer (2) includes a light-shielding resin layer (2a), an epoxy-containing siloxane skeleton resin layer (2b), and a non-silicone thermoplastic resin layer (2c).

Abstract: A semiconductor device includes a substrate, a semiconductor die, and an antistatic die attach material between the substrate and the semiconductor die. The antistatic die attach material includes a mixture of a nonconductive adhesive material and carbon black or graphite. In one example, the antistatic die attach material has a resistivity between 101 ?·cm and 1010 ?·cm.

Abstract: Methods, systems, and apparatuses for preventing corrosion between dissimilar bonded metals. The method includes providing a wafer having a plurality of circuits, each of the plurality of circuits having a plurality of bond pads including a first metal; applying a coating onto at least the plurality of bond pads; etching a hole in the coating on each of the plurality of bond pads to provide an exposed portion of the plurality of bond pads; dicing the wafer to separate each of the plurality of circuits; die bonding each of the plurality of circuits to a respective packaging substrate; and performing a bonding process to bond a second, dissimilar metal to the exposed portion of each of the plurality of bond pads such that the second, dissimilar metal encloses the hole in the coating of each of the plurality of bond pads, thereby enclosing the exposed portion.

Abstract: A removal apparatus for a semiconductor chip may include a stage configured to support a board on which the semiconductor chip is mounted by bumps, a laser configured to irradiate a laser beam into the board over an area larger than the semiconductor chip, and a picker configured to cause the laser beam to penetrate the semiconductor chip locally and to separate the semiconductor chip from the board. A method of removing a semiconductor chip from a board may include loading the board, on which the semiconductor chip is mounted by bumps, on a stage; irradiating a laser beam into the semiconductor chip to melt the bumps and to separate the semiconductor chip from the board; continuously irradiating the laser beam into the board on which solder pillars, that are residues of the bumps, remain to melt the solder pillars; and removing the solder pillars.

Abstract: A method for mounting components on a substrate is provided. The method includes providing a positioning plate which has a plurality of through holes. The method further includes supplying components each having a longitudinal portion on the positioning plate. The method also includes performing a component alignment process to put the longitudinal portions of the components in the through holes. In addition, the method includes connecting a substrate to the components which have their longitudinal portions in the through holes and removing the positioning plate.

Abstract: An apparatus for bonding a semiconductor chip to a package substrate, the apparatus comprising: a die-bonding unit configured to attach the semiconductor chip to the package substrate; a load-measuring unit installed at the die-bonding unit, the load-measuring unit including a panel having a plurality of regions and a plurality of load-measuring members with at least one load-measuring member arranged in each of the regions of the panel to measure load values applied to each of the regions; and a controller configured to determine a load and a flatness of the semiconductor chip based on the load values measured by the load-measuring members.

Abstract: Devices and methods for processing singulated radio-frequency (RF) units. In some embodiments, a device for processing singulated RF packages can include a plate having a plurality of apertures. Each aperture can be dimensioned to receive and position a singulated RF package to thereby facilitate processing of the singulated RF packages positioned in their respective apertures. In some embodiments, such a device can be utilized to batch process high volume of RF packages as if the RF packages are still in a panel format.

Abstract: Apparatuses and methods are provided for scalable memory. An example apparatus comprises a logic component, a plurality of memory components adjacent to and coupled to one another and the logic component, a plurality of memory component programmable delay lines (PDLs), of the plurality of memory component PDLs associated with a respective one of the plurality of memory components, and a logic component programmable delay line (LPDL) coupled to the logic component and each of the plurality of memory component PDLs.

Abstract: Systems and methods are described for improved heat dissipation of the stacked semiconductor dies by including metallic thermal pads between the dies in the stack. In one embodiment, the thermal pads may be in direct contact with the semiconductor dies. Heat dissipation of the semiconductor die stack can be improved by a relatively high thermal conductivity of the thermal pads that directly contact the adjacent silicon dies in the stack without the intervening layers of the low thermal conductivity materials (e.g., passivation materials). In some embodiments, the manufacturing yield of the stack can be improved by having generally coplanar top surfaces of the thermal pads and under-bump metallization (UBM) structures.

Abstract: A compound light-emitting diode (LED) device includes a semiconductor substrate having an active electronic circuit formed in or on the semiconductor substrate. Two or more electrically conductive circuit connection pads are formed in or on the semiconductor substrate and are electrically connected to the active electronic circuit. One or more micro-transfer printed LEDs each have at least two LED electrodes or connection pads and a fractured LED tether. An adhesive layer is disposed between the semiconductor substrate and each LED to adhere the semiconductor substrate to the LED. Two or more electrical conductors electrically connect one of the electrodes or LED connection pads to one of the circuit connection pads.

Abstract: A multi-color inorganic light-emitting diode (iLED) display includes a display substrate with a common voltage signal and a common ground signal and a plurality of multi-color pixels. In certain embodiments, each multi-color pixel includes a first color sub-pixel including two or more first iLEDs, a second color sub-pixel including one or more second iLEDs, and a third color sub-pixel including one or more third iLEDs. The two or more first iLEDs are serially connected between the common voltage signal and the common ground signal, the one or more second iLEDs are serially connected between the common voltage signal and the common ground signal, and the one or more third iLEDs are serially connected between the common voltage signal and the common ground signal.

Abstract: In order to form, in a wide band gap semiconductor device, a high field resistant sealing material having a large end portion film thickness, said high field resistant sealing material corresponding to a reduced termination region having a high field intensity, and to improve accuracy and shorten time of manufacturing steps, this semiconductor device is configured as follows. At least a part of a cross-section of a high field resistant sealing material formed close to a termination region at the periphery of a semiconductor chip has a perpendicular shape at a chip outer peripheral end portion, said shape having, on the chip inner end side, a film thickness that is reduced toward the inner side. In a semiconductor device manufacturing method for providing such semiconductor device, the high field resistant sealing material is formed in a semiconductor wafer state, then, heat treatment is performed, and after dicing is performed, a chip is mounted.

Abstract: In an aspect of the disclosure, a MOS device for reducing routing congestion caused by using split n-well cells in a merged n-well circuit block is provided. The MOS device may include a first set of cells adjacent to each other in a first direction. The MOS device may include a second set of cells adjacent to each other in the first direction and adjacent to the first set of cells in a second direction. The second set of cells each may include a first n-well, a second n-well, and a third n-well separated from each other. The MOS device may include an interconnect extending in the first direction in the second set of cells. The interconnect may provide a voltage source to the first n-well of each of the second set of cells.

Abstract: An integrated circuit includes at least one cell. The at least one cell includes a cell region defined by a cell boundary; a power line structure extending in a first direction parallel to and along the cell boundary and including a first power line extending in the first direction along the cell boundary, a plurality of metal islands spaced apart from one another over the first power line in the first direction, and a second power line extending in the first direction over the plurality of metal islands; and a signal line structure disposed in the cell region at the same level as the first power line and the plurality of metal islands. Separation distances between each of the plurality of metal islands and a part of the signal line structure at the same level as the plurality of metal islands are equal to or greater than a critical separation distance.

Abstract: In an aspect of the disclosure, a MOS device for using bulk cross-coupled thin-oxide decoupling capacitor is provided. The MOS device may include a pMOS transistor and an nMOS transistor. The MOS device may include a first set of transistor body connections adjacent the pMOS transistor and the nMOS transistor. The first set of transistor body connections may couple a first voltage source to the pMOS transistor body. The first set of transistor body connections may further couple a second voltage source to the nMOS transistor body. The MOS device may include a second set of transistor body connections adjacent the pMOS transistor and the nMOS transistor. The second set of transistor body connections may couple the nMOS transistor gate to the pMOS transistor body. The second set of transistor body connections may further couple the pMOS transistor gate to the nMOS transistor body.

Abstract: A device is disclosed that includes a first transistor, a second transistor, and a first PODE device. The second transistor is electrically coupled to the first transistor. The first PODE device is adjacent to a drain/source region of the second transistor. A control end of the first PODE device is electrically coupled to a drain/source end of the second transistor.

Abstract: An ESD protection device includes a substrate structure having a substrate, first and second fins, and first and second doped regions having different conductivity types. The first doped region includes a first portion of the substrate and a first region of the first fin, the second doped region includes a second portion of the substrate, a second region of the first fin adjacent to the first region and the second fin. The ESD device also includes a first gate structure on a surface portion of the first region and a surface portion of the second region of the first fin and including, from bottom to top, an interface layer on the surface portion of the first region and the surface portion of the second region of the first fin, a spacer, a high-k dielectric layer, a first work-function adjusting layer, a second work-function adjusting layer, and a gate.

Abstract: A method of concurrently forming source/drain contacts (CAs) and gate contacts (CBs) and device are provided. Embodiments include forming metal gates (PC) and source/drain (S/D) regions over a substrate; forming an ILD over the PCs and S/D regions; forming a mask over the ILD; concurrently patterning the mask for formation of CAs adjacent a first portion of each PC and CBs over a second portion of the PCs; etching through the mask, forming trenches extending through the ILD down to a nitride capping layer formed over each PC and a trench silicide (TS) contact formed over each S/D region; selectively growing a metal capping layer over the TS contacts formed over the S/D regions; removing the nitride capping layer from the second portion of each PC; and metal filling the trenches, forming the CAs and CBs.

Abstract: A method includes forming a gate, a first dielectric layer, a first contact structure, and a second contact structure over a substrate. The first contact structure and the second contact structure are over a source region and a drain region respectively. The first dielectric layer surrounds the gate, the first contact structure, and the second contact structure. The method includes forming a second dielectric layer over the first dielectric layer. The second dielectric layer has an opening exposing the gate, the first contact structure, and the second contact structure. A conductive layer is formed in the opening to electrically connect the gate to the first contact structure and the second contact structure.

Abstract: A FinFET device structure is provided. The FinFET device structure includes a fin structure formed over a substrate and an isolation structure formed over the substrate. The FinFET device structure includes a first gate structure and a second gate structure formed over the fin structure. The first gate structure has a first top width in a direction that is parallel to the fin structure, the second gate structure has a second top width in a direction that is parallel to the fin structure, and the first top width is greater than the second top width.

Abstract: A method of forming a semiconductor device that includes forming a trench adjacent to a gate structure to expose a contact surface of one of a source region and a drain region. A sacrificial spacer may be formed on a sidewall of the trench and on a sidewall of the gate structure. A metal contact may then be formed in the trench to at least one of the source region and the drain region. The metal contact has a base width that is less than an upper surface width of the metal contact. The sacrificial spacer may be removed, and a substantially conformal dielectric material layer can be formed on sidewalls of the metal contact and the gate structure. Portions of the conformally dielectric material layer contact one another at a pinch off region to form an air gap between the metal contact and the gate structure.

Abstract: A method includes providing a semiconductor structure including an active region having a first doped region, a first contact member on the first doped region, first and second gates on opposite sides of the first contact member, an interlayer dielectric layer surrounding the first and second gates and the first contact member. The method also includes forming a first insulator layer having first and second contact holes, forming a second insulator layer on sidewalls of the first and second contact holes, filling the first and second contact holes with a first conductive material to form first and second contacts to the first and second gates, forming a third insulator layer on the first and second contacts, selectively etching the first insulator layer to form a third contact hole, and filling the third contact hole with a second conductive material to form a third contact to the first contact member.

Abstract: A method of forming a fin field effect transistor (finFET), including forming a temporary gate structure having a sacrificial gate layer and a dummy gate layer on the sacrificial gate layer, forming a gate spacer layer on each sidewall of the temporary gate structure, forming a source/drain spacer layer on the outward-facing sidewall of each gate spacer layer, removing the dummy gate layer to expose the sacrificial gate layer, removing the sacrificial gate layer to form a plurality of recessed cavities, and forming a gate structure, where the gate structure occupies at least a portion of the plurality of recessed cavities.

Abstract: A method for manufacturing a semiconductor device includes forming one or more fins extending in a first direction over a substrate. The one or more fins include a first region along the first direction and second regions on both sides of the first region along the first direction. A dopant is implanted in the first region of the fins but not in the second regions. A gate structure overlies the first region of the fins and source/drains are formed on the second regions of the fins.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to segmented or cut finFET structures and methods of manufacture. The structure includes at least one logic finFET device having a fin of a first length, and at least one memory finFET device having a fin of a second length. The second length is shorter than the first length.

Abstract: Complementary metal oxide semiconductor (CMOS) devices employing plasma-doped source/drain structures and related methods are disclosed. In certain aspects, a source and drain of a CMOS device are formed at end portions of a channel structure by plasma doping end portions of the channel structure above solid state solubility of the channel structure, and annealing the end portions for liquid phase epitaxy and activation (e.g., superactivation). In this manner, the source and drain can be integrally formed in the end portions of the channel structure to provide coextensive surface area contact between the source and drain and the channel structure for lower channel contact resistance. This is opposed to forming the source/drain using epitaxial growth that provides an overgrowth beyond the end portion surface area of the channel structure to reduce channel contact resistance, which may short adjacent channels structures.

Abstract: The present disclosure provides a semiconductor device and a manufacturing method therefor.

Abstract: A semiconductor device including a first fin active area substantially parallel to a second fin active area, a first source/drain in the first fin active area, a second source/drain in the second fin active area, a first contact plug on the first source/drain, and a second contact plug on the second source/drain. The center of the second contact plug is offset from the center of the second source/drain.

Abstract: A vertical thyristor memory array including: a vertical thyristor memory cell, the vertical thyristor memory cell including: a p+ anode; an n-base located below the p+ anode; a p-base located below the n-base; a n+ cathode located below the p-base; an isolation trench located around the vertical thyristor memory cell; an assist gate located in the isolation trench adjacent the n-base wherein an entire vertical height of the assist gate is positioned within an entire vertical height of the n-base.

Abstract: A semiconductor device includes a lower electrode on a substrate, a capacitor dielectric layer on the lower electrode, and an upper electrode on the capacitor dielectric layer. The capacitor dielectric layer includes a base layer on the lower electrode and a dielectric particle layer in at least a portion of the base layer. The base layer includes a first dielectric material, and the dielectric particle layer extends at least partially continuously along a thickness direction of the capacitor dielectric layer and includes a second dielectric material different from the first dielectric material.