Abstract: An apparatus relating generally to a substrate is disclosed. In this apparatus, a post extends from the substrate. The post includes a conductor member. An upper portion of the post extends above an upper surface of the substrate. An exterior surface of the post associated with the upper portion is in contact with a dielectric layer. The dielectric layer is disposed on the upper surface of the substrate and adjacent to the post to provide a dielectric collar for the post. An exterior surface of the dielectric collar is in contact with a conductor layer. The conductor layer is disposed adjacent to the dielectric collar to provide a metal collar for the post, where a top surface of each of the conductor member, the dielectric collar and the metal collar have formed thereon a bond structure for interconnection of the metal collar and the conductor member.

Abstract: The present disclosure relates to a method for bonding semiconductor components. A semiconductor component comprising microbumps on a planar bonding surface is prepared for bonding by applying a photosensitive polymer layer on the bonding surface. The average thickness of the initial polymer layer in between the microbumps is similar to the average height of the microbumps. In a lithography process, the polymer is removed from the upper surface of the microbumps and from areas around the microbumps. The polymer is heated to a temperature at which the polymer flows, resulting in a polymer layer that closely adjoins the microbumps, without exceeding the microbump height. The closely adjoining polymer layer may have a degree of planarity substantially similar to a planarized layer.

Abstract: A semiconductor chip includes a chip body and a plurality of solder-including electrodes provided on an element-formation surface of the chip body. A packaging substrate includes a substrate body, and a plurality of wirings and a solder resist layer that are provided on a front surface of the substrate body. The plurality of solder-including electrodes include a plurality of first electrodes and a plurality of second electrodes. The plurality of first electrodes supply a first electric potential, and the plurality of second electrodes supply a second electric potential different from the first electric potential. The plurality of first electrodes and the plurality of second electrodes are disposed alternately in both a row direction and a column direction, in a central part of the chip body. The plurality of wirings include a plurality of first wirings and a plurality of second wirings.

Abstract: A semiconductor device has a carrier with an adhesive layer formed over the carrier. Alignment marks are provided for picking and placing the electrical component on the carrier or adhesive layer. An electrical component is disposed on the adhesive layer by pressing terminals of the electrical component into the adhesive layer. The electrical component can be a semiconductor die, discrete component, electronic module, and semiconductor package. A leadframe is disposed over the adhesive layer. A shielding layer is formed over the electrical component. An encapsulant is deposited over the electrical component. The carrier and adhesive layer are removed so that the terminals of the electrical component extend out from the encapsulant for electrical interconnect. A substrate includes a plurality of conductive traces. The semiconductor device is disposed on the substrate with the terminals of the electrical component in contact with the conductive traces.

Abstract: A method to fabricate a reconstructed panel based fan-out wafer level package is described. A reconstructed wafer panel is provided comprising a plurality of individual dies encapsulated in a first molding compound. Interconnected metal redistribution layers (RDL) separated by PSV layers are formed on top surfaces of the plurality of individual dies. Thereafter, the reconstructed wafer panel is cut into a plurality of rectangular strips. Thereafter, backend processing is performed on each of the plurality of rectangular strips.

Abstract: A semiconductor package includes a second leadframe assembly stacked above a first leadframe assembly, each leadframe assembly including a die pad, a plurality of leads and a semiconductor die attached to the die pad and electrically connected to the leads. A spacer separates the leadframe assemblies from one another. A single mold compound embeds part of the first leadframe assembly, part of the second leadframe assembly and the spacer. A portion of the leads of both leadframe assemblies are uncovered by the mold compound to form terminals of the semiconductor package. A side of both die pads is uncovered by the mold compound.

Abstract: An electronic package includes an adhesion layer between a first substrate and a second substrate. The adhesion layer is patterned to define openings aligned with through-substrate interconnects and corresponding bond pads. A conductive plane is formed between the first substrate and the second substrate, adjacent to the adhesion layer.

Abstract: A semiconductor memory device includes a substrate that has a first main surface and a second main surface opposite to the first main surface, a first semiconductor chip which is mounted on the first main surface and includes a first register, a plurality of first input/output (IO) terminals, and a first circuit connected between the first IO terminals and the first register, and a second semiconductor chip which is mounted on the second main surface and includes a second register, a plurality of second input/output (IO) terminals, and a second circuit connected between the second IO terminals and the second register. The second circuit is connected to the second IO terminals through input lines and to the second register through output lines, and is configured to change a connection path between the input lines and the output lines in response to a connection change command.

Abstract: A multi-chip stack can include a first semiconductor device disposed between a plurality of electrical connections and the second semiconductor device. The first semiconductor device can include a first through via and a first electrostatic discharge (ESD) protection circuit connected to a first one of the electrical connections. The first ESD Protection circuit can have a first ESD protection structure. The first through via provides an electrical connection through the first semiconductor device from a first surface to an opposite surface of the first semiconductor device and between the first one of the plurality of electrical connections and a first terminal of the first circuit. The first terminal of the first circuit can be free of an electrical connection to an ESD protection circuit having the first ESD protection structure formed on the second semiconductor device.

Abstract: It is an object to provide a pressure-contact power semiconductor device and a power semiconductor core module which are capable of properly reducing their sizes. Each power semiconductor core module includes the following: a plurality of power semiconductor chips including a plurality of self-turn-off semiconductor elements and a plurality of diodes adjacent to each other in plan view; and a plurality of first springs disposed between an upper metal plate and a conductive cover plate. The plurality of self-turn-off semiconductor elements of each power semiconductor core module are arranged along any one of an L-shaped line, a cross-shaped line, and a T-shaped line in plan view.

Abstract: A light emitting diode package including a housing, a first light emitting diode chip and a second light emitting diode chip disposed in the housing, and a wavelength conversion part including a phosphor configured to absorb light emitted from the first light emitting diode chip and emit light having a different wavelength than the light emitted from the first light emitting diode chip, in which the light emitted from the first light emitting diode chip has a shorter wavelength than light emitted from the second light emitting diode chip, and the phosphor has a fluorescence intensity of 10 or less at a peak wavelength of light emitted from the second light emitting diode chip, with reference to a maximum fluorescence intensity of 100 at a wavelength of 425 nm to 475 nm on an excitation spectrum of the second light emitting diode chip.

Abstract: Solid-state transducer (“SST”) dies and SST arrays having electrical cross-connections are disclosed herein. An array of SST dies in accordance with a particular embodiment can include a first terminal, a second terminal and a plurality of SST dies coupled between the first and second terminals with at least a pair of the SST dies being coupled in parallel. The plurality of SST dies can individually include a plurality of junctions coupled in series with an interconnection between each individual junction. Additionally, the individual SST dies can have a cross-connection contact coupled to the interconnection. In one embodiment, the array can further include a cross-connection between the cross-connection contacts on the pair of the SST dies.

Abstract: A multi-layer semiconductor device includes at least a first semiconductor structure and a second semiconductor structure, each having first and second opposing surfaces. The second semiconductor structure includes a first section and a second section, the second section including a device layer and an insulating layer. The second semiconductor structure also includes one or more conductive structures and one or more interconnect pads. Select ones of the interconnect pads are electrically coupled to select ones of the conductive structures. The multi-layer semiconductor device additionally includes one or more interconnect structures disposed between and coupled to select portions of second surfaces of each of the first and second semiconductor structures. A corresponding method for fabricating a multi-layer semiconductor device is also provided.

Abstract: Optoelectronic devices and method of forming the same include an optoelectronic component in a substrate layer. An integrated circuit chip is positioned on the substrate layer. A lens is positioned on the substrate layer directly above the optoelectronic component and above at least part of the integrated circuit chip. The lens has a cut-out portion that accommodates the integrated circuit chip.

Abstract: An optical package structure of a mobile communication device includes a board, electrodes formed on the board, a light emitter and an IC chip both disposed on the board, and a light permeable package body encapsulating the light emitter and the IC chip. The electrodes are respectively arranged on a lower edge portion and two lateral edge portions of the board, and the number of the electrodes on the lower edge portion is larger than that on any of the two lateral edge portions. The light emitter is electrically coupled to at least one of the electrodes. The IC chip includes a light sensor corresponding in position to the light emitter and connecting pads electrically coupled to the electrodes. A distance from the light sensor to the upper edge portion is less than that to the lower edge portion, and is equal to or less than 250 ?m.

Abstract: A stacked semiconductor package includes a first semiconductor chip having a first active surface over which first bonding pads including peripheral bonding pads and central bonding pads are arranged, a first encapsulation member, two second semiconductor chips having second active surfaces over which second bonding pads are arranged at one side peripheries and disposed to be separated from each other such that the second active surfaces face the first active surface and the second bonding pads overlap with the peripheral bonding pads, first coupling members interposed between the peripheral bonding pads and the second bonding pads, a second encapsulation member formed over second side surfaces of the second semiconductor chips including a region between the second semiconductor chips, and a mold via formed through a portion of the second encapsulation member in the region between the second semiconductor chips and coupled with the central bonding pads.

Abstract: A computer-implemented method of manufacturing an integrated circuit includes placing a plurality of standard cells that define the integrated circuit, selecting a timing critical path from among a plurality of timing paths included in the placed standard cells, and selecting at least one net from among a plurality of nets included in the timing critical path as at least one timing critical net. The method further includes pre-routing the at least one timing critical net with an air-gap layer, routing unselected nets, generating a layout using the pre-routed at least one timing critical net and the routed unselected nets, and manufacturing the integrated circuit based on the layout.

Abstract: An optoelectronic semiconductor chip is disclosed. In an embodiment the optoelectronic semiconductor chip includes a first semiconductor layer sequence having a plurality of microdiodes, and a second semiconductor layer sequence having an active region. The first semiconductor layer sequence and the second semiconductor layer sequence are based on a nitride compound semiconductor material, the first semiconductor layer sequence is before the first semiconductor layer sequence in the direction of growth, and the microdiodes form an ESD protection for the active region.

Abstract: The present disclosure provides a diode structure and an electrostatic discharge (ESD) protection circuit including the same. The diode structure includes a P-type substrate. The diode structure further includes a plurality of wavy N-doping regions formed on the P-type substrate. Each of the wavy N-doping regions extends in a first direction and has an N-doping width in a second direction perpendicular to the first direction. The diode structure further includes a plurality of wavy P-doping regions formed on the P-type substrate. Each of the wavy P-doping regions extends in the first direction and has a P-doping width in the second direction. The N-doping widths are essentially identical at different positions along the first direction, and the P-doping widths are essentially identical at different positions along the first direction.

Abstract: A protection circuit may include a first power line and a second power line, a plurality of high voltage interconnections, a plurality of low voltage interconnections, first and second pickup active regions, a high voltage protection transistor, and a low voltage protection transistor. The first power line and the second power line extending in parallel to each other while facing each other, and a plurality of high voltage interconnections are coupled to the first power line and extend toward the second power line while being spaced apart from each other. The plurality of low voltage interconnections are coupled to the second power line and extend toward the first power line while being spaced apart from each other. The first pickup active region extends across the plurality of high voltage interconnections and the second pickup active region extends across the plurality of low voltage interconnections.

Abstract: A semiconductor device includes a semiconductor body having a first surface and a second surface opposite to the first surface. A first isolation layer is provided over the first surface of the semiconductor body. The semiconductor device further includes an electrostatic discharge protection structure over the first isolation layer. The electrostatic discharge protection structure has a first terminal region of a first conductivity type and a second terminal region of a second conductivity type opposite to the first conductivity type.

Abstract: A semiconductor device 100 includes a semiconductor element 12 having an electrode on a front surface, a wire 15 bonded to the electrode of the semiconductor element 12, a resin layer 22b covering a bonding portion of the wire 15 on the front surface of the semiconductor element 12, and a gel filler material 23 that seals the semiconductor element 12, the wire 15, and the resin layer 22b. By protecting the bonding portion of the wire 15 with the resin layer 22b, degradation of the wire 15 is ameliorated and the reliability of the semiconductor device 100 is improved.

Abstract: An exemplary integrated circuit comprises: a first device gate disposed over the first device region, the first device gate comprising a first interfacial layer and a first dielectric layer; a second device gate disposed over the second device region, the second device gate comprising a second interfacial layer and a second dielectric layer; and a third device gate disposed over the third device region, the third device gate comprising a third interfacial layer and a third dielectric layer, wherein the first interfacial layer, the second interfacial layer, and the third interfacial layer are different from each other in at least one of a thickness and an interfacial material.

Abstract: A semiconductor device includes a substrate, a semiconductor fin on the substrate, first and second MOS devices on the substrate, and a dummy gate structure on the semiconductor fin and between the first and second MOS devices. The first dummy gate structure is operative to electrically isolate the first MOS device from the second MOS device when a first potential is applied to the dummy gate structure and a second potential is applied to the substrate. The first MOS device includes a first gate structure on the semiconductor fin, a first source and a first drain on opposite sides of the first gate structure and partially in the semiconductor fin. The second MOS device includes a second gate structure on the semiconductor fin, a second source and a second drain on opposite sides of the second gate structure and partially in the semiconductor fin.

Abstract: A method of forming a semiconductor device includes etching a substrate to form two first trenches separated by a fin; filling the two first trenches with an isolation layer; and depositing a dielectric layer over the fin and the isolation layer. The method further includes forming a second trench in the dielectric layer over a channel region of the semiconductor device, the second trench exposing the isolation layer. The method further includes etching the isolation layer through the second trench to expose an upper portion of the fin in the channel region of the semiconductor device, and forming a dummy gate in the second trench over the isolation layer and engaging the upper portion of the fin.

Abstract: A semiconductor device structure is disclosed including a semiconductor-on-insulator (SOI) substrate, the SOI substrate comprising a semiconductor layer, a substrate material and a buried insulating material layer positioned between the semiconductor layer and the substrate material, a trench isolation structure positioned in at least a portion of the SOI substrate, the trench isolation structure defining a first region in the SOI substrate, and a capacitor device formed in the first region, the capacitor device comprising a first electrode formed by a conductive layer portion formed in the first region on the buried insulating material layer, the conductive layer portion at least partially replacing the semiconductor layer in the first region, a second electrode formed over the first electrode, and an insulating material formed between the first electrode and the second electrode.

Abstract: Disclosed is a structure wherein lower source/drain regions of vertical field effect transistors (VFETs) of memory cells in a memory array are aligned above and electrically connected to buried bitlines. Each cell includes a VFET with a lower source/drain region, an upper source/drain region and at least one channel region extending vertically between the source/drain regions. The lower source/drain region is above and immediately adjacent to a buried bitline, which has the same or a narrower width than the lower source/drain region and which includes a pair of bitline sections and a semiconductor region positioned laterally between the sections. The semiconductor region is made of a different semiconductor material than the lower source/drain region. Also disclosed is a method that ensures that bitlines of a desired critical dimension can be achieved and that allows for size scaling of the memory array with minimal bitline coupling.

Abstract: Semiconductor devices and methods of forming the same are provided. The methods may include forming first and second line patterns. The first line pattern has a first side facing the second line pattern, and the second line pattern has a second side facing the first line pattern. The methods may also include forming a first spacer structure on the first side of the first line pattern and a second spacer structure on the second side of the second line pattern. The first and the second spacer structures may define an opening. The methods may further include forming a first conductor in a lower part of the opening, forming an expanded opening by etching upper portions of the first and second spacer structures, and forming a second conductor in the expanded opening. The expanded opening may have a width greater than a width of the lower part of the opening.

Abstract: A method for fabricating semiconductor device includes the steps of: providing a substrate having a cell region and a peripheral region; forming a bit line structure on the cell region and a gate structure on the peripheral region; forming an interlayer dielectric (ILD) layer around the bit line structure and the gate structure; forming a conductive layer on the bit line structure; performing a first photo-etching process to remove part of the conductive layer for forming storage contacts adjacent two sides of the bit line structure and contact plugs adjacent to two sides of the gate structure; forming a first cap layer on the cell region and the peripheral region to cover the bit line structure and the gate structure; and performing a second photo-etching process to remove part of the first cap layer on the cell region.

Abstract: A method for forming a buried local interconnect in a source/drain region is disclosed including, among other things, forming a plurality of VOC structures, forming a first source/drain region between a first pair of the plurality of VOC structures, forming a second source/drain region between a second pair of the plurality of VOC structures, and forming an isolation structure between the first and second source/drain regions. A first trench is formed in the first and second source/drain regions and the isolation structure. A liner layer is formed in the first trench, and a first conductive line is formed in the first trench. A dielectric material is formed above the first conductive line. A first opening is formed in the dielectric material to expose a portion of the first conductive line. A first conductive feature is formed in the first opening contacting the exposed portion of the first conductive line.

Abstract: A multilevel semiconductor device including: a first level including a first array of first memory cells and first control line; a second level including a second array of second memory cells and second control line; a third level including a third array of third memory cells and third control line, where the second level overlays the first, and where the third level overlays the second; a first, second and third access pillar; memory control circuits designed to individually control cells of the first, second and third memory cells, where the device includes an array of units, where each of the units includes a plurality of the first, second and third memory cells, and a portion of the memory control circuits, where the array of units include at least eight rows and eight columns of units, and where the memory control is designed to control independently each of the units.

Abstract: In some embodiments, a flash memory and a fabricating method thereof are provided.

Abstract: According to one embodiment, a memory system classifies a plurality of nonvolatile memory dies connected to a plurality of channels, into a plurality of die groups such that each of the plurality of nonvolatile memory dies belongs to only one die group. The memory system performs a data write/read operation for one die group of the plurality of die groups in accordance with an I/O command from a host designating one of a plurality of regions including at least one region corresponding to each die group. The memory system manages a group of free blocks in the nonvolatile memory for each of the plurality of die group by using a plurality of free block pools corresponding to the plurality of die groups.

Abstract: A semiconductor device and a method of manufacturing a semiconductor device may be provided. The semiconductor device may include a source select line. The semiconductor device may include word lines. The semiconductor device may include a channel layer. The semiconductor device may include a source structure. The source structure may be disposed under the source select line. The source structure may be in contact with the channel layer.

Abstract: A method of controlling the thickness of gate oxides in an integrated CMOS process which includes performing a two-step gate oxidation process to concurrently oxidize and therefore consume at least a first portion of the cap layer of the NV gate stack to form a blocking oxide and form a gate oxide of at least one metal-oxide-semiconductor (MOS) transistor in the second region, wherein the gate oxide of the at least one MOS transistor is formed during both a first oxidation step and a second oxidation step of the gate oxidation process.

Abstract: A vertical memory device includes a plurality of stacked structures, at least one inter-structure layer, and a channel structure. The plurality of stacked structures comprises a plurality of gate electrodes and a plurality of insulation film patterns that are alternately and repeatedly stacked on a substrate. At least one inter-structure layer is positioned between the two stacked structures adjacent to each other from among the plurality of stacked structures. A channel structure penetrates the plurality of stacked structures and the at least one inter-structure layer, the channel structure extending in the first direction, the channel structure being connected to the substrate.

Abstract: A 3D memory device comprising: a substrate; at least three first “U”-shaped strings of memory cells each including a first buried string portion, a first source line selector side string portion and a first bit line selector side string portion, wherein the first buried string portion is formed in the substrate and connects the first source line selector side string portion and the first bit line selector side string portion, each of the first “U”-shaped string of memory cells including stacks of memory cells along the first source line selector string side portion and along the first bit line selector side string portion; and at least three second “U”-shaped strings of memory cells each including a second buried string portion, a second source line selector side string portion and a second bit line selector side string portion, wherein the second buried string portion is formed in the substrate and connects the second source line selector side string portion and the second bit line selector side string porti

Abstract: A semiconductor memory device according to one embodiment, includes a first electrode film, a plurality of semiconductor members, and a charge storage member. The first electrode film includes three or more first portions and a second portion connecting the first portions to each other. The first portions extend in a first direction and are arranged along a second direction that intersects with the first direction. The plurality of semiconductor members are arranged along the first direction between the first portions and extending in a third direction. The third direction intersects with a plane containing the first direction and the second direction. The charge storage member is disposed between each of the semiconductor members and each of the first portions. The second portion is disposed between the semiconductor members.

Abstract: The disclosed technology relates generally to semiconductor devices and more particularly to three dimensional semiconductor memory devices, such as vertical three dimensional non-volatile memory devices. In one aspect, a method of fabricating a memory device comprises providing, on a substrate, an alternating stack of control gate layers and dielectric layers. The method additionally includes forming a memory block. comprising forming at least one memory hole through the alternating stack, where the at least one memory hole comprises on its sidewalls a stack of a programmable material, a channel material and a dielectric material, thereby forming at least one memory cell. The method additionally comprises removing a portion of the alternating stack to form at least one trench, where the at least one trench forms at least part of a boundary of the memory block.

Abstract: A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of insulating films alternately stacked with a plurality of electrode films in a first direction; a selection gate electrode stacked on the stacked structural unit in the first direction; an insulating layer stacked on the selection gate electrode in the first direction; a first semiconductor pillar piercing the stacked structural unit, the selection gate electrode, and the insulating layer in the first direction, a first cross section of the first semiconductor pillar having an annular configuration, the first cross section being cut in a plane orthogonal to the first direction; a first core unit buried in an inner side of the first semiconductor pillar, the first core unit being recessed from an upper face of the insulating layer; and a first conducting layer of the first semiconductor pillar provided on the first core unit to contact the first core unit.

Abstract: Some embodiments include an integrated structure having vertically-stacked conductive levels. Upper conductive levels are memory cell levels, and a lower conductive level is a select device level. Conductively-doped semiconductor material is under the select device level. Channel material extends along the memory cell levels and the select device level, and extends into the conductively-doped semiconductor material. A region of the channel material that extends into the conductively-doped semiconductor material is a lower region of the channel material and has a vertical sidewall. Tunneling material, charge-storage material and charge-blocking material extend along the channel material and are between the channel material and the conductive levels. The tunneling material, charge-storage material and charge-blocking material are not along at least a portion of the vertical sidewall of the lower region of the channel material, and the conductively-doped semiconductor material is directly against such portion.

Abstract: A method of forming a semiconductor device is provided including the steps of providing a silicon-on-insulator (SOI) substrate comprising a semiconductor bulk substrate, a buried insulation layer formed on the semiconductor bulk substrate and a semiconductor layer positioned on the buried insulation layer, and forming a first transistor device, wherein forming the first transistor device includes forming a channel region in the semiconductor bulk substrate and forming a gate insulation layer over the channel region partially of a part of the buried insulation layer and wherein forming the gate insulation layer includes oxidizing a part of the semiconductor layer.

Abstract: A semiconductor device is described, which includes a first transistor, a second transistor, and a capacitor. The second transistor and the capacitor are provided over the first transistor so as to overlap with a gate of the first transistor. A semiconductor layer of the second transistor and a dielectric layer of the capacitor are directly connected to the gate of the first transistor. The second transistor is a vertical transistor, where its channel direction is perpendicular to an upper surface of a semiconductor layer of the first transistor.

Abstract: A substrate, a thin film transistor array substrate, and a manufacturing method are provided. The substrate includes a main plate, a first film layer, a second film layer, and an insulation layer. The first film layer is disposed on the main plate, and is provided with at least two recesses. The insulation layer is disposed on the first film layer. The second film layer is disposed on the insulation layer and provided with at least two protrusions facing the insulation layer. The amount of stress accumulated is effectively reduced after the substrate is heated.

Abstract: The present disclosure provides an array substrate, a fabrication method thereof, and a display device. The array substrate includes a base substrate, a thin film transistor over the base substrate, a first common electrode over the base substrate, a pixel electrode over the first common electrode and being electrically insulated from the first common electrode, and a second common electrode disposed over the pixel electrode and being electrically insulated from the pixel electrode. The pixel electrode is electrically connected to a drain electrode of the thin film transistor.

Abstract: It is an object to manufacture a highly reliable display device using a thin film transistor having favorable electric characteristics and high reliability as a switching element. In a bottom gate thin film transistor including an amorphous oxide semiconductor, an oxide conductive layer having a crystal region is formed between an oxide semiconductor layer which has been dehydrated or dehydrogenated by heat treatment and each of a source electrode layer and a drain electrode layer which are formed using a metal material. Accordingly, contact resistance between the oxide semiconductor layer and each of the source electrode layer and the drain electrode layer can be reduced; thus, a thin film transistor having favorable electric characteristics and a highly reliable display device using the thin film transistor can be provided.

Abstract: An array substrate, a display panel, and a fabrication method of the array-substrate are provided. The array substrate comprises a first thin film transistor including a first metal oxide thin film transistor and disposed in a display region, a second thin film transistor including an amorphous silicon thin film transistor and disposed in a peripheral circuit region; and a third thin film transistor including a second metal oxide thin film transistor and disposed in the peripheral circuit region. A first insulating layer is disposed between a first metal oxide semiconductor layer and a first gate electrode, and a second insulating layer is disposed above the first gate electrode, a second gate electrode, and the first metal oxide semiconductor layer. The amorphous silicon semiconductor layer, a first source electrode, a first drain electrode, a second source electrode, a second drain electrode are disposed above the second insulating layer.

Abstract: An optical receiver that can tune a selected wavelength using a wavelength tunable filter transmitting a plurality of wavelengths. The optical receiver is a wavelength tunable optical receiver that includes: a wavelength tunable filter (100) transmitting laser light from an optical fiber; and a photodiode (300) receiving laser light passing through the wavelength tunable filter (100), in which the wavelength tunable filter 100 is a Fabry-Perot type etalon filter transmitting a plurality of wavelengths. When a channel with a specific wavelength is moved to a channel with another wavelength, an optical channel is selected based on a peak different from a transmissive peak of an FP etalon filter selecting the previous channel so that temperature of the wavelength tunable filter can be changed. A light-receiving photodiode chip is disposed on a thermoelectric element and a wavelength tunable filter transmits different wavelengths in accordance with temperature of the thermoelectric element.

Abstract: A thin film transistor array panel includes a substrate, a first gate electrode disposed on the substrate, a voltage wire disposed on the substrate, a gate insulating layer disposed on the first gate electrode and the voltage wire, a semiconductor pattern including an oxide semiconductor material disposed on the gate insulating layer, a source electrode and a drain electrode disposed at a distance from each other on the semiconductor pattern, a first passivation layer disposed on the source electrode and the drain electrode, and a first electrode disposed on the first passivation layer and connected with the voltage wire.

Abstract: A gate driver circuit and a display device using the same are disclosed. The gate driver circuit includes a first transistor supplying a start signal to a Q node in response to a clock, a second transistor adjusting a gate voltage of the first transistor in response to the clock, a third transistor adjusting a gate voltage of the second transistor in response to the start signal, a fourth transistor changing a voltage of a QB node, a fifth transistor switching a current path between the first transistor and the Q node in response to a first line control signal, a sixth transistor supplying a gate-off voltage to an output node, a seventh transistor supplying a gate-on voltage to the output node, and an eighth transistor supplying a second line control signal to the QB node.