Abstract: A mold inhibiting emulsion including: an aqueous phase that includes water; a non-aqueous phase that may optionally include an oil; at least one emulsifier; and at least one mold inhibitor. Also provided is a method of inhibiting mold growth on edible baked products (e.g., bread) that involves applying the mold inhibiting emulsion of the present invention to the exterior surfaces of unbaked dough from which the edible baked product is prepared. The mold inhibiting emulsion may be applied to contact surfaces of a vessel in which dough is baked, and then to upper portions of the dough after it has been placed into the treated vessel. An apparatus for treating the exterior surfaces of unbaked dough with spray applied liquids, is further provided. The apparatus includes first and second spray stations each including a primary spray assembly and a secondary spray assembly activated if the primary spray assembly fails.

Abstract: Provided is a substrate processing apparatus and a method of manufacturing a semiconductor device, which are hard to cause a defect in processing a substrate owing to that a pressure inside a process chamber is not kept constant, and which enable a better processing of a substrate.

Abstract: An apparatus for leveling an array of microscopic pens with respect to a substrate surface is provided. The apparatus includes an array of microscopic pens; a substrate having a substrate surface; a controllable arm comprising a spherical ball on an end thereof; a force sensor configured to measure a force exerted on the array or the substrate surface at each of the plurality of positions; one or more actuators configured to drive the array and/or the substrate to vary a relative distance and a relative tilting between the array and the substrate surface; and a controller configured to determine a planar offset of the array with respect to the substrate and initiate a leveling of the array with respect to the substrate based on the planar offset. Methods are also provided.

Abstract: An apparatus for leveling an array of microscopic pens relative to a substrate surface or measuring a relative tilting therebetween includes an actuator configured to drive one of the array or the substrate to vary a distance therebetween, one or more force sensors configured to measure a force between the array and the surface, and a device configured calculate a force curve parameter of the force over the distance or time. The apparatus is configured to level the array relative to the surface by varying a relative tilting between the array and the substrate surface based on the force curve parameter or to measure the relative tilting based on the force curve parameter. Methods and software also are provided.

Abstract: Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.

Abstract: The present invention provides an imprint apparatus which performs imprint processing of curing a resin on a substrate while pressing a mold against the resin, and transferring a pattern onto the substrate by separating the mold from the cured resin, the apparatus including a holding unit including a holding surface which comes into contact with the mold and configured to hold the mold on the holding surface, a measurement unit configured to measure a position of the mold on the holding surface, and a processing unit configured to perform preparation processing including at least one pressing operation of stabilizing the position of the mold on the holding surface by pressing the mold against the holding surface before the imprint processing.

Abstract: Apparatus and methods for forming a silicon-containing i-layer on a substrate for a thin film photovoltaic cell are disclosed. The apparatus includes a chamber body defining a processing region containing the substrate, a hydrogen source and a silane source coupled to a plasma generation region, an RF power source that applies power at a power level in the plasma generation region to generate a plasma and deposit the silicon-containing i-layer at a selected deposition rate to a selected thickness and a controller. The controller controls the power level and the deposition rate of the i-layer on the substrate such that the thin film solar cell exhibits light induced damage that conforms to a linear fit of the product of the RF power, the deposition rate and the selected thickness of the i-layer.

Abstract: In one embodiment, the nozzle includes a first body having an open lower surface and a plurality of buffer spaces to store a processing solution therein. A first shutter is disposed at a lower part of the first body to selectively open and close lower surfaces of the buffer spaces, and a driving unit configured to move the first shutter or the first body so that a position of the first shutter is varied relative to the buffer spaces.

Abstract: A method for etching a bevel edge of a substrate in a processing chamber is provided. The method includes flowing an inert gas into a center region of the processing chamber defined above a center region of the substrate and flowing a mixture of an inert gas and a processing gas over an edge region of the substrate. The method further includes striking a plasma in the edge region, wherein the flow of the inert gas and the flow of the mixture maintain a mass fraction of the processing gas substantially constant. A processing chamber configured to clean a bevel edge of a substrate is also provided.

Abstract: A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.

Abstract: A deposition apparatus includes a vacuum chamber and a heating crucible. A substrate, on which deposition films are formed, is installed in the vacuum chamber. The heating crucible is installed opposite to the substrate so as to vaporize an organic compound. The heating crucible includes a main body and an inner plate. The main body includes a space which contains the organic compound and a nozzle through which the organic compound that is vaporized is discharged. The inner plate is installed within the main body and includes at least one opening formed around an edge of an area facing the nozzle, so as to transmit the vaporized organic compound.

Abstract: An applicator for applying a product includes a motor and a switch for automatically rotating and/or oscillating an applicator head. By virtue of having a motor with a throttling gear, the applicator is capable of rotating and/or oscillating at controlled frequencies during application of cosmetic, medicinal, or other products to a surface.

Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.

Abstract: This invention discloses apparatus for processing one or more of a Lens Precursor, a Lens Precursor Form and an ophthalmic Lens. The apparatus provides for vapor phase processing of the subject Lens Precursor, a Lens Precursor Form and an ophthalmic Lens.

Abstract: A controller 90 of an automatic matching unit includes a first and a second matching control unit 100, 102 for respectively variably controlling the electrostatic capacitances of a first and a second variable capacitors 80, 82 through a first and a second stepping motor 86, 88 such that a measured absolute value ZMm and a measured phase Z?m of a load impedance obtained by an impedance measuring unit 84 become close to a predetermined reference absolute value ZMs and a predetermined reference phase Z?s, respectively; and a gain control unit 112. The gain control unit 112 variably controls a proportional gain of at lease one of the first and the second matching unit based on current electrostatic capacitances NC1 and NC2 of the first and the second variable capacitors 80, 82 obtained by a first and a second electrostatic capacitance monitoring unit 108, 110, respectively.

Abstract: A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).

Abstract: A plasma treatment apparatus has a reaction vessel (11) provided with a top electrode (13) and a bottom electrode (14), and the first electrode is supplied with a VHF band high frequency power from a VHF band high frequency power source (32), while the bottom electrode on which a substrate (12) is loaded and is moved by a vertical movement mechanism. The plasma treatment system has a controller (36) which, at the time of a cleaning process after forming a film on the substrate (12), controls a vertical movement mechanism to move the bottom electrode to narrow the gap between the top electrode and bottom electrode and form a narrow space and starts cleaning by a predetermined high density plasma in that narrow space. In the cleaning process, step cleaning is performed. Due to this, the efficiency of utilization of the cleaning gas is increased, the amount of exhaust gas is cut, and the cleaning speed is raised. Further, the amount of the process gas used is cut and the process cost is reduced.

Abstract: An apparatus and method for coating a functional layer on a current collector with an active material layer thereon, the apparatus including a first roll and a second roll, the first roll and second roll being for advancing the current collector; a gravure roll, the gravure roll being configured to coat the functional layer on the active material layer; a thickness measurer, the thickness measurer being configured to measure at least one of a thickness of the active material layer and a sum thickness of the active material layer and the functional layer; and a controller, the controller being in communication with the thickness measurer and being configured to control a rotation speed of the gravure roll.

Abstract: An imprint apparatus for coating a substrate with a resin by a coating mechanism, and curing the resin while pressing at least one of the substrate and a mold against the other, includes a measurement device configured to detect a position of the coating mechanism, a substrate stage configured to hold a substrate, a positioning system configured to position the substrate stage, and a controller configured to control positioning of the substrate stage by the positioning system, based on the measurement result.

Abstract: Certain example embodiments relate to an in-line scalable system that may be used in the combustion deposition depositing of thin films. The systems of certain example embodiments may comprise one or more modules, with each such module including at least one burner and at least one high volume cooling section. In certain example implementations, multiple burners and multiple cooling sections are provided to a single module in alternating order. The systems of certain example embodiments may, in addition or in the alternative, comprise a combined flame guard and exhaust system. The combined flame guard and exhaust system of certain example embodiments advantageously may provide a means to reduce the amount of interference of the deposition process by ambient conditions, improve flame uniformity in the deposition zone, contain and exhaust combustion products while reducing restrictions to the stable operating space of the combustion deposition process, etc.

Abstract: A microdeposition system includes a stage, a printhead carriage, and a controller. The stage holds a substrate. The printhead carriage includes N printhead modules, where N is an integer greater than one. Each of the N printhead modules includes a printhead and an alignment mechanism. The printhead includes a plurality of nozzles that deposit droplets of fluid manufacturing material onto the substrate while relative movement between the substrate and the printhead is along a first axis. The alignment mechanism adjusts the printhead with respect to the printhead module. The controller controls the alignment mechanisms of the N printhead modules to set effective nozzle spacing for the pluralities of nozzles to a uniform value. The effective nozzle spacing is defined as spacing between adjacent ones of the plurality of nozzles as projected onto a second axis perpendicular to the first axis.

Abstract: A conformal coating system and method for coating a printed circuit board (PCB) is provided. The system comprises a coating station configured to coat the PCB with a coating material and without cleaning the PCB with a saponifier. A surface energy of the PCB is maintained above a target surface energy at least through the cleaning station to promote adhesion of the coating material.

Abstract: The present invention provides a recovery processing method to restore the substrate processing apparatus to an operating state after correcting an abnormality having occurred in the substrate processing apparatus in operation and having resulted in a stop in the operation, comprising a substrate retrieval step in which substrate salvage processing is first executed for a wafer W left in a chamber in the substrate processing apparatus in correspondence to the extent to which the wafer has been processed at the time of the operation stop and the substrate having undergone the substrate salvage processing is then retrieved into the cassette storage container and an apparatus internal state restoration step in which the states inside the individual chambers of the substrate processing apparatus are restored.

Abstract: Method for manufacturing a laminate product comprising at least a laminate layer with a decor sheet, wherein, for forming the laminate layer, at least a decor sheet is formed by providing in a decor application process a decor in the form of a motif on a decor carrier, wherein this decor carrier consists of a continuous material web, wherein the decor is applied by means of one or more digital printers and wherein the global decor during the processing of the material web is controlled in a varying manner, by means of controlling the one or more printers, as a function of varying external data.

Abstract: In a measurement mechanism for continuously measuring a thickness of a coating layer, provided in an apparatus for forming the coating layer on a conductive elongate base material in a coating treatment base station while the base material is fed, a sensing portion for measuring a capacitance value of the coating layer is arranged before and after the base station, and tension applied to the base material at the sensing portion is set to be greater than tension applied to the base material at the base station. Thus, in forming the coating layer on the elongate base material while the base material is continuously fed, variation in a feeding speed is suppressed, influence of sway of a measurement surface in a direction of thickness at the thickness sensing portion during feeding is minimized, and a thickness of the coating layer can be measured with higher accuracy.

Abstract: A device for imparting a gradation of tint density on an ophthalmic or optical lens is described. This gradient-tinting device utilizes both vertical movement and rotation about the vertical axis of the lens as it moves into a tinting solution.

Abstract: The invention concerns a coating plant for the coating of construction units with a coating medium, in particular a paint system for the lacquer finish of motor vehicle body parts, with a dosing pump, the coating medium supplied with a certain delivery (Fm) proportioned, and a pressure control valve arranged upstream before the dosing pump to adjust a coating medium pressure (p v) at the entrance of the dosing pump, as well as a control unit to adjust the pressure control valve a controlled variable of the pressure difference (?p) through the dosing pump independently of the delivery of the dosing pump and the changing viscosity of the lacquers to an essentially constant desired value (?pTARGET).

Abstract: A painting station, e.g., for serially painting components such as motor vehicles, is disclosed. A painting station may include at least one painting cell in which components are coated, e.g., with a paint, that has a certain layer thickness. At least one measuring cell is provided for measuring the layer thickness of the paint, e.g., with a radiation source, a radiation detector, and a conveying path along which the components to be coated are conveyed through the painting and measuring cells. The radiation source may emit light in the visible wavelength range.

Abstract: A droplet jetting applicator includes a coating unit jetting and coating droplets to a to-be-coated object; a storage space storing the to-be-coated object coated with the droplets; an exhaust section exhausting gas in the storage space; an adjustment unit adjusting an outlet flow of the gas exhausted by the exhaust section from the storage space; and a control section controlling the adjustment unit so that the outlet flow is changed in a stepwise manner.

Abstract: A method for coating a fire-resistant substance onto a carrier veil and products containing fire-resistant substances are provided. The method includes delivering a pliable carrier veil in a traveling web, drawing the carrier veil web through a reservoir defined by a nip of two rollers and containing the fire-resistant substance, where the carrier veil is coated with the fire-resistant substance. The method also includes controlling the amount of fire-resistant substance on the carrier veil web by setting a nip dimension between the two rollers, passing the carrier veil through the nip of the two rollers and providing the fire-resistant substance as a slurry suitable to coat the veil exiting the nip with a layer effective to provide a selected fire resistance. Heat is applied to the carrier veil sufficient to accelerate a curing reaction in the fire-resistant substance.

Abstract: A liquid coating apparatus, including; a head which has plural nozzles which eject liquid in which plural particles are dispersed, plural pressuring chambers each communicates to each nozzle, a piezo element which is provided on the pressuring chamber to change a volume of the pressuring chamber, and a common liquid chamber which communicates to each of the plural pressuring chambers; a sub-tank which stores the liquid and has an acceleration device to accelerate the plural particles to disperse in the liquid; a first flow channel which connects the common liquid chamber with the sub-tank; a second flow channel which connects the common liquid chamber with the sub-tank; and a circulation device which circulates the liquid through a circulation flow channel which includes the common liquid chamber, the first flow channel, the sub-tank and the second flow channel.

Abstract: A process and apparatus for free form fabrication of a three-dimensional work piece comprising (a) feeding raw material in a solid state to a first predetermined location; (b) depositing the raw material onto a substrate as a molten pool deposit under a first processing condition; (c) monitoring the molten pool deposit for a preselected condition; (d) comparing information about the preselected condition of the monitored molten pool deposit with a predetermined desired value for the preselected condition of the monitored molten pool deposit; (e) solidifying the molten pool deposit; (f) automatically altering the first processing condition to a different processing condition based upon information obtained from the comparing step (d); and repeating steps (a) through (f) at one or more second locations for building up layer by layer a three-dimensional work piece.

Abstract: Disclosed is an ascent and descent apparatus for a liquid material spray printer, which may control a distance between a subject and a spray assembly optimally. The apparatus includes a sliding member having a pair of sliders selectively reciprocating oppositely by a driving unit; a frame installed above the sliders and having an elongated guide hole corresponding to a reciprocating range of the sliders; and a pair of crosslink members installed to an upper surface of the frame to couple with the sliders through the hole and whose upper end supports a flat table. The crosslink members include a pair of unit links hinged at their substantial center, whose lower ends are respectively coupled to the slider and hinged to the frame, and upper ends are respectively hinged to the flat table and supports the flat table rotatably, whereby the flat table is lifted by reciprocation of the sliders.

Abstract: A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate; a chamber having a coating section in which the coating part applies the liquid material on the substrate and a transport section into which the liquid material is transported; an adjusting part which adjusts at least one of oxygen concentration and humidity inside the chamber; and a control part which stops an operation of the coating part in response to the entrance of foreign object into the chamber.

Abstract: An application device wherein a liquid is applied to an application target region of a substrate disposed on a supporting table by moving a discharge section including a nozzle hole which discharges the liquid in a first direction relative to the supporting table; a displacement amount of the discharge section in a second direction which crosses the first direction is detected while the discharge section moves relative to the supporting table in the first direction; and one of the discharge section and the supporting table is moved in an offset direction which offsets the displacement amount while the discharge section is moved relative to the supporting table in the first direction, so as to control the displacement.

Abstract: In a gluing method of a box production line using a glue gun of a contact-type, the glue can be applied firmly without placing excessive pressure on a gluing margin during a gluing step even when a paper type of the corrugated board sheet changes due to an order change.

Abstract: Apparatus and methods of decorating guitars and other stringed musical instruments are disclosed. In one aspect, an apparatus may include a carrier to hold a portion of a guitar, a surface to support the carrier, one or more ink-jet printheads to apply radiation-sensitive ink compositions on a surface of the portion of the guitar, when the portion of the guitar is held by the carrier, and when the carrier is supported by the surface, and a radiation source to supply radiation to the radiation-sensitive ink on the surface of the portion of the guitar. In another aspect, a method may include providing at least a portion of a guitar having a surface, and applying a decoration over the surface by spraying radiation-sensitive ink compositions over the surface with one or more ink jet spray nozzles and exposing the radiation-sensitive ink compositions to radiation.

Abstract: The present disclosure describes a semiconductor manufacturing apparatus. The apparatus includes a processing chamber designed to perform a process to a wafer; an electrostatic chuck (E-chuck) configured in the processing chamber and designed to secure the wafer, wherein the E-chuck includes an electrode and a dielectric feature formed on the electrode; a tuning structure designed to hold the E-chuck to the processing chamber by clamping forces, wherein the tuning structure is operable to dynamically adjust the clamping forces; a sensor integrated with the E-chuck and sensitive to the clamping forces; and a process control module for controlling the tuning structure to adjust the clamping forces based on pre-measurement data from the wafer and sensor data from the sensor.

Abstract: A method is provided to manufacture displays such as, for example, reflective displays, electrophoretic displays or liquid crystal displays. In one embodiment of the invention, a method is provided for aligning a patterned layer of color filter elements with a display assembly. The method includes activating a first set of addressable pixel elements to change an activation state of each pixel element in the first set of the pixel elements. A required alignment of the patterned layer of color filter elements with the display assembly can be determined based at least on the activated first or a second set of the pixel elements. The patterned layer of color filter elements is aligned with the display assembly according to the required alignment.

Abstract: Embodiments described herein generally relate to apparatus and methods for forming Group III-V materials by metal-organic chemical vapor deposition (MOCVD) processes and hydride vapor phase epitaxial (HVPE) processes. In one embodiment, a method for fabricating a nitrogen-face (N-face) polarity compound nitride semiconductor device is provided. The method comprises depositing a nitrogen containing buffer layer having N-face polarity over one or more substrates using a metal organic chemical vapor deposition (MOCVD) process to form one or more substrates having N-face polarity and depositing a gallium nitride (GaN) layer over the nitrogen containing buffer layer using a hydride vapor phase epitaxial (HVPE) deposition process, wherein the nitrogen containing buffer layer and the GaN layer are formed without breaking vacuum and exposing the one or more substrates to atmosphere.

Abstract: A cylindrical internal surface processing apparatus has an internal diameter measuring device and a controller. The internal diameter measuring device measures an internal diameter of an internal cylindrical bore formed in a base member to obtain a measurement result of the internal diameter of the internal cylindrical bore. The controller includes a surface roughening control section and a quality determining section. The surface roughening control section controls operation of a surface roughening equipment to form a rough surface section and an internal diameter measuring surface section on the internal cylindrical bore. The internal diameter measuring surface section is smoother than the rough surface section.

Abstract: A counter roll (26) is positioned to engage a paper or board web (24) in a paper or board making machine along a contact line. A pressure-sensitive EMFi film (28) is disposed on the counter roll to measure the pressure profile of the web along the contact line. A coating apparatus (22) applies a coating to the web passing over the counter roll (26), and a pressure profile of the applied coating is measured by the pressure-sensitive film (28) on the counter roll (26). The pressure-sensitive film (28) may also be disposed to detect details of coating application in a curtain coater (30). Moreover, the film may be driven to provide adjustable vibration for cleaning the coater, or conditioning or controlling the coating flow.

Abstract: An atomic layer film forming apparatus includes a plurality of gas supply pipes (121-123) for supplying a source gas to a film forming chamber (101), and an exhaust portion (105) for evacuating the inside of the film forming chamber (101). Valves (131-133) are attached to the gas supply pipes (121-123), respectively. In the film forming chamber (101), film forming chamber monitors (141-149) are arranged to measure a state in the film forming chamber (101). Based on the results of measurement by the film forming chamber monitors (141-149), a controller (107) controls the openings or opening times of the valves (131-133). The atomic layer film forming apparatus can improve gas uniformity when a plurality of gas supply ports are used.

Abstract: An image forming apparatus including a medium feeding unit to supply a print medium, a medium coating assembly to coat the print medium with a coating liquid, and an image forming unit to form an image on the coated print medium, the medium coating assembly including a container to store the coating liquid, a coating unit to coat the print medium with the coating liquid, a channel to guide the coating liquid to move between the container and the coating unit, and a controller to selectively control the coating liquid to be supplied from the container to the coating unit and to be recovered from the coating unit to the container through the same channel.

Abstract: Embodiments of the present invention generally relate to a process and apparatus for monitoring and controlling the accuracy and spacing of isolation trenches scribed in a solar module during the fabrication process. In one embodiment, encoder marks, and optionally, encoder lines are scribed into a front contact layer of a solar cell device substrate. The encoder marks and lines may then be used via one or more subsequent scribe modules to control the pulsing and positioning of a laser device to provide accurate and consistent trench lines in various layers of the completed solar module.

Abstract: A deposition rate monitor device for monitoring the deposition rate of a vapor on a substrate is provided, including: a piezoelectric crystal monitor device including a piezoelectric crystal monitor provided in a housing, wherein the housing includes a vapor inlet aperture, and at least one elongated shielding device having a first end and a second end, the first end encompassing the vapor inlet aperture.

Abstract: A liquid dispensing system and method is provided, that can be shifted between dispensing mode and circulation mode. The system comprises: a tank (1) for liquid; a liquid feeder line (5) from the tank to a discharge opening (10); a pump (2) effective for feeding liquid from the tank for dispensing via the discharge opening at dispensing pressure and dispensing flow; a shifting valve (6) controllable for shifting between dispensing and circulation modes, wherein in circulation mode the liquid is circulated through a return line (8) by the pump (2) in continued operation. The system is characterized by a flow area restriction (7) arranged in the return line (8) and dimensioned to generate in the return flow a drop in pressure substantially equal to a drop in pressure generated by the discharge opening (10) in dispensing mode, maintaining thereby during circulation mode the liquid dispensing system at the corresponding pressure of the dispensing mode.

Abstract: The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.

Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized with a system for processing one or more substrates. The system may comprise an ion source for generating ions of desired species, the ions generated from the ion source being directed toward the one or more substrates along an ion beam path; a substrate support for supporting the one or more substrates; a mask disposed between the ion source and the substrate support, the mask comprising a finger defining one or more apertures through which a portion of the ions traveling along the ion beam path pass; and a first detector for detecting ions, the first detector being fixedly positioned relative to the one or more substrates.

Abstract: A thin film deposition apparatus that can be simply applied to manufacture large-sized display devices on a mass scale and that improves manufacturing yield includes: a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; a barrier wall assembly including a plurality of barrier walls that are arranged in the first direction in order to partition a space between the first nozzle and the second nozzle; and an alignment member including an interval control member that adjusts an interval between the second nozzle and the substrate, and/or an alignment control member that adjusts alignment between the second nozzle and the substrate.