Running Length Work Patents (Class 118/718)
  • Patent number: 8430966
    Abstract: An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material. A heated distribution manifold is disposed below the receptacle and includes a plurality of passages defined therethrough. The receptacle is indirectly heated by the distribution manifold to a degree sufficient to sublimate source material within the receptacle. A distribution plate is disposed below the distribution manifold and at a defined distance above a horizontal plane of a substrate conveyed through the apparatus. The distribution plate includes a pattern of holes therethrough that further distribute the sublimated source material passing through the distribution manifold onto the upper surface of the underlying substrate.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: April 30, 2013
    Assignee: Primestar Solar, Inc.
    Inventors: Christopher Rathweg, Max William Reed, Mark Jeffrey Pavol, Scott Daniel Feldman-Peabody, Russell Weldon Black
  • Publication number: 20130089665
    Abstract: A self-limiting reaction deposition apparatus includes a first guide roller, a second guide roller, and at least one first head. The first guide roller changes, while supporting a first surface of a base material conveyed by a roll-to-roll process, a conveying direction of the base material from a first direction to a second direction that is not parallel to the first direction. The second guide roller changes, while supporting the first surface of the base material, the conveying direction of the base material from the second direction to a third direction that is not parallel to the second direction. The at least one first head is disposed between the first guide roller and the second guide roller, faces a second surface opposite to the first surface of the base material, and discharges, towards the second surface, a raw material gas for self-limiting reaction deposition.
    Type: Application
    Filed: September 14, 2012
    Publication date: April 11, 2013
    Applicant: SONY CORPORATION
    Inventors: Hiroya Takenaka, Ryoichi Hiratsuka, Masaaki Sekine, Takuji Matsuo, Hidetoshi Honda
  • Publication number: 20130084409
    Abstract: A continuous plasma treatment process, said process comprising the steps of: providing a plasma treatment apparatus, said apparatus comprising at least one plasma treatment zone, said plasma treatment zone comprising a pair of electrodes with endless dielectric belts each having a first and a second side and each covering an electrode of said pair of electrodes; producing a non-thermal plasma in a process gas at a pressure of 100 Pa to 1 MPa in the space between said pair of endless dielectric belt-covered electrodes by applying a voltage between said electrode pair; providing a web material to be treated such that it can be transported by said two endless dielectric belts in such a way that there is an area in the plane of said belt at least about 5 mm on either side of said web material on the side of said endless dielectric belts with no part thereof facing one electrode of said pair of electrodes; transporting said web material using said endless dielectric belts in frictional contact with said electrodes
    Type: Application
    Filed: June 29, 2011
    Publication date: April 4, 2013
    Applicant: VITO NV
    Inventors: Dirk Vangeneugden, Erwin Van Hoof, Robby Rego
  • Patent number: 8404047
    Abstract: An electron beam vapor deposition apparatus includes a coating chamber having a first chamber section with a first coating zone for depositing a first coating and a second chamber section with a second coating zone for depositing a second coating. At least one electron beam source is associated with the first chamber section and the second chamber section. A first crucible is adjacent to the first coating zone for presenting a first source coating material, and a second crucible is adjacent to the second coating zone for presenting a second source coating material. A transport is operative to move a work piece between the first coating zone of the first chamber section and the second coating zone of the second chamber section.
    Type: Grant
    Filed: September 16, 2008
    Date of Patent: March 26, 2013
    Assignee: United Technologies Corporation
    Inventors: James W. Neal, Michael J. Maloney, David A. Litton, Christopher Masucci
  • Patent number: 8398770
    Abstract: A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material, wherein one or more of the gas flows provides a pressure that at least contributes to the separation of the surface of the substrate from the face of the delivery head. A system capable of carrying out such a process is also disclosed.
    Type: Grant
    Filed: September 26, 2007
    Date of Patent: March 19, 2013
    Assignee: Eastman Kodak Company
    Inventors: David H. Levy, Roger S. Kerr, Jeffrey T. Carey
  • Publication number: 20130061803
    Abstract: The present inventions provide method and apparatus that employ constituents from one or more constituent supply source or sources to form one or more films of a precursor layer formed on a surface of a continuous flexible workpiece. Of particular significance is the implementation of PVD systems that operate upon a horizontally disposed portion of a continuous flexible workpiece and a vertically disposed portion of a continuous flexible workpiece, preferably in conjunction with a short free-span zone of the portion of a continuous flexible workpiece.
    Type: Application
    Filed: August 10, 2012
    Publication date: March 14, 2013
    Applicant: SOLOPOWER, INC.
    Inventors: Jorge Vasquez, James Freitag, Mustafa Pinarbasi
  • Patent number: 8394197
    Abstract: Enhanced corrosion resistance is achieved in a coating by using a germanium-containing precursor and hollow cathode techniques to form a first layer directly on the surface of a workpiece, prior to forming an outer layer, such as a layer of diamond-like carbon (DLC). The use of a germanium or germanium-carbide precursor reduces film stress and enables an increase in the thickness of the subsequently formed DLC. Germanium incorporation also reduces the porosity of the layer. In one embodiment, a cap layer containing germanium is added after the DLC in order to further reduce the susceptibility of the coating to chemical penetration from the top.
    Type: Grant
    Filed: July 11, 2008
    Date of Patent: March 12, 2013
    Assignee: Sub-One Technology, Inc.
    Inventors: Andrew W. Tudhope, Thomas B. Casserly, Karthik Boinapally, Deepak Upadhyaya, William J. Boardman
  • Patent number: 8382900
    Abstract: A system and method for controlling deposition of thin films on substrates. One embodiment includes a vacuum chamber; a plurality of sources located inside the vacuum chamber; and a plurality of gas tubes, each of the plurality of gas tubes comprising a first volume for delivering precursor gas and a second volume for providing pumping.
    Type: Grant
    Filed: February 15, 2007
    Date of Patent: February 26, 2013
    Assignee: Applied Materials, Inc.
    Inventor: Michael W. Stowell
  • Patent number: 8382902
    Abstract: Apparatus and method for vapor deposition of a uniform thickness thin film of lubricant on at least one surface of a disk-shaped substrate. The invention has particular utility in depositing thin films of polymeric lubricants onto disc-shaped substrates in the manufacture of magnetic and MO recording media.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: February 26, 2013
    Inventors: Michael Joseph Stirniman, Paul Stephen McLeod
  • Patent number: 8377209
    Abstract: The present invention generally relates to a method and apparatus for depositing a layer onto a substrate as the substrate is moving through the processing chamber. The substrate may move along a roll to roll system. A roll to roll system is a system where a substrate may be unwound from a first roll so that the substrate may undergo processing and then re-wound onto a second roll after the processing. As the substrate moves through the processing chamber, a plasma source may produce a plasma. An electrical bias applied to the substrate may draw the plasma to the substrate and hence, permit deposition of material onto the substrate as the substrate moves through the chamber.
    Type: Grant
    Filed: February 12, 2009
    Date of Patent: February 19, 2013
    Assignee: Applied Materials, Inc.
    Inventor: John M. White
  • Publication number: 20130037618
    Abstract: A method for producing RFID antennas by vacuum deposition of an electrically conductive material on a web material, wherein at least a first and a second deposition of electrically conductive material are carried out in subsequent steps according to a pattern corresponding to the shape of the antennas.
    Type: Application
    Filed: May 4, 2011
    Publication date: February 14, 2013
    Applicant: GALILEO VACUUM SYSTEMS S.P.A. IN LIQUIDAZIONE
    Inventor: Angelo Pagani
  • Patent number: 8372196
    Abstract: In a manufacturing apparatus for manufacturing an epitaxial wafer with a wafer being mounted substantially concentrically with a susceptor, a center rod is provided to extend in an up-and-down direction on a side of a non-mounting surface of the susceptor so that its upper end is adjacent to the center of the susceptor. With this arrangement, part of radiation light irradiated toward the susceptor is diffusely reflected by the center rod before reaching the central portion of the susceptor, thereby reducing the amount of the radiation light irradiated to the central portion of the susceptor as well as lowering the temperature of the portion. Since the center rod and the susceptor are not in surface contact, the center rod does not take the heat from the susceptor, thereby suppressing the temperature from decreasing locally at the central portion of the susceptor.
    Type: Grant
    Filed: November 2, 2009
    Date of Patent: February 12, 2013
    Assignee: Sumco Techxiv Corporation
    Inventors: Motonori Nakamura, Yoshinobu Mori, Takeshi Masuda, Hidenori Kobayashi, Kazuhiro Narahara
  • Patent number: 8361232
    Abstract: An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A deposition head is configured for sublimating a source material supplied thereto. The sublimated source material condenses onto a transport conveyor disposed below the deposition head. A substrate conveyor is disposed below the transport conveyor and conveys substrates in a conveyance path through the apparatus such that an upper surface of the substrates is opposite from and spaced below a lower leg of the transport conveyor. A heat source is configured adjacent the lower leg of the transport conveyor. The source material plated onto the transport conveyor is sublimated along the lower leg and condenses onto to the upper surface of substrates conveyed by the substrate conveyor.
    Type: Grant
    Filed: April 29, 2010
    Date of Patent: January 29, 2013
    Assignee: Primestar Solar, Inc.
    Inventor: Russell Weldon Black
  • Patent number: 8359884
    Abstract: A glass sheet is formed using a roll-to-roll glass soot deposition and sintering process. The glass sheet formation involves forming a first glass soot layer on a deposition surface of a soot-receiving device, removing the first glass soot layer from the deposition surface, and forming a second glass soot layer on the unsupported first glass soot layer. The resulting composite glass soot sheet is heated to form a sintered glass sheet. The glass sheet can be a substantially homogeneous glass sheet or a composite glass sheet having layer-specific attributes.
    Type: Grant
    Filed: July 17, 2009
    Date of Patent: January 29, 2013
    Assignee: Corning Incorporated
    Inventor: Daniel Warren Hawtof
  • Patent number: 8361930
    Abstract: The invention relates to a method for producing a high temperature superconductor (HTSC) from a strip including an upper side precursor layer and which, for continuous sintering of the precursor layer within a furnace in the presence of a fed-in reaction gas, is drawn across a support. A furnace for performing the method is also described.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: January 29, 2013
    Assignee: BASF SE
    Inventor: Michael Baecker
  • Publication number: 20130014699
    Abstract: A vapor deposition device including an evaporation source for evaporating a vapor-depositing material; a transportation section including first and second rolls for holding the substrate in the state of being wound therearound and a guide section for guiding the substrate; and a shielding section, located in a vapor deposition possible zone, for forming a shielded zone which is not reachable by the vapor-depositing material from the evaporation source. Vapor deposition zones include a planar transportation zone for transporting the substrate such that the surface of the substrate to be subjected to the vapor-depositing material is planar; and the transportation section is located with respect to the evaporation source such that the vapor-depositing material is not incident on the substrate in a direction of the normal to the substrate in the vapor deposition possible zone excluding the shielded zone.
    Type: Application
    Filed: July 13, 2012
    Publication date: January 17, 2013
    Applicant: Panasonic Corporation
    Inventors: Sadayuki Okazaki, Kazuyoshi Honda, Tomofumi Yanagi, Shoichi Imashiku
  • Publication number: 20130011574
    Abstract: Provided is a graphene production method including: contacting a carbon source substance with a surface of a flexible film-forming target having electrical conductivity; and applying a current to the film-forming target and heating the film-forming target at a temperature exceeding a graphene production temperature to produce graphene from the carbon source substance on the surface of the film-forming target.
    Type: Application
    Filed: June 22, 2012
    Publication date: January 10, 2013
    Applicant: SONY CORPORATION
    Inventors: Toshiyuki Kobayashi, Masashi Bando, Nozomi Kimura, Keisuke Shimizu, Koji Kadono
  • Patent number: 8349084
    Abstract: An apparatus for sequential deposition of an intermixed thin film layer and a sublimated source material on a photovoltaic (PV) module substrate is provided, along with associated processes. The process can include introducing a substrate into a deposition chamber, wherein a window layer (e.g., a cadmium sulfide layer) is on a surface of the substrate. A sulfur-containing gas can be supplied to the deposition chamber. In addition, a source vapor can be supplied to the deposition chamber, wherein the source material comprises cadmium telluride. The sulfur-containing gas and the source vapor can be present within the deposition chamber to form an intermixed layer on the window layer. In one particular embodiment, for example, the intermixed layer generally can have an increasing tellurium concentration and decreasing sulfur concentration extending away from the window layer.
    Type: Grant
    Filed: April 5, 2011
    Date of Patent: January 8, 2013
    Assignee: General Electric Company
    Inventors: James Neil Johnson, Bastiaan Arie Korevaar, Yu Zhao
  • Publication number: 20120325147
    Abstract: An apparatus for depositing a polymer layer containing nanomaterial on a substrate material includes a carrier for carrying the substrate material; a transport structure for providing a polymerization material near a surface of the substrate material and conducting a gas flow near the surface of the substrate material with the gas flow comprising a nanomaterial; and a plasma chamber wherein a plasma electrode structure is arranged for depositing the polymer layer containing nanomaterial on the surface of the substrate material by applying a plasma polymerization process.
    Type: Application
    Filed: September 10, 2012
    Publication date: December 27, 2012
    Applicant: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO
    Inventors: Marcel SIMOR, Ales FIALA
  • Patent number: 8333841
    Abstract: [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller. [Solving Means] In the present invention, by adjusting a pressing force between a printing roller and a backup roller through a relative movement of a mask forming unit including the printing roller and a transfer roller with respect to a vacuum chamber, individual adjustments of the printing roller and the transfer roller are eliminated and an adjustment of a pressing force on a unit basis is realized, thus achieving simplification of a structure, simplification and enhancement in precision of tasks, and a reduction in work time.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: December 18, 2012
    Assignee: Ulvac, Inc.
    Inventors: Nobuhiro Hayashi, Tomoharu Fujii, Isao Tada, Atsushi Nakatsuka
  • Patent number: 8333839
    Abstract: A vapor deposition reactor has a configuration where a substrate or a vapor deposition reactor moves in a non-contact state with each other to allow the substrate to pass by the reactor and an injection unit and an exhaust unit are installed as a basic module of the reactor for receiving a precursor or a reactant and for receiving and pumping a purge gas, respectively. With the use of a small-size inlet for the reactor, homogeneous film properties are obtained, the deposition efficiency of precursors is improved, and an amount of time required for a purge/pumping process can be reduced. In addition, since the reactor itself is configured to reflect each step of ALD, it does not need a valve. Moreover, the reactor makes it easier for users to apply remote plasma, use super high frequencies including microwave, and UV irradiation.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: December 18, 2012
    Assignee: Synos Technology, Inc.
    Inventor: Jae-eung Oh
  • Patent number: 8328944
    Abstract: A vacuum evaporation apparatus includes an evaporation source, a combined conveyance body in which a glass substrate is superposed and aligned on a shadow mask fixed to a holding member, and a weight plate placed on the glass substrate presses the glass substrate to the shadow mask by gravity for holding the glass substrate, and a convey mechanism for conveying the combined conveyance body. The weight plate includes a shock absorbing member for absorbing an impact applied to the combined conveyance body in an in-plane direction of the glass substrate. The shock absorbing member includes a sliding body connected to the weight plate via a spring and having multiple recesses formed in a surface of the sliding body facing the glass substrate, and includes slide balls disposed in the multiple recesses.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: December 11, 2012
    Assignees: Canon Kabushiki Kaisha, Hitachi Displays, Ltd.
    Inventors: Masataka Eida, Takehiko Soda, Kazushi Miyata
  • Patent number: 8323408
    Abstract: Processes and apparatus are described that form a solar cell absorber on a surface of a workpiece by reacting a precursor layer disposed on the surface of the workpiece with an absorber constituent vapor in a heating chamber. The absorber constituent material is delivered from an absorber constituent material delivery system in molten form into a container in the heating chamber and vaporized to be used during the reaction.
    Type: Grant
    Filed: June 11, 2008
    Date of Patent: December 4, 2012
    Assignee: SoloPower, Inc.
    Inventors: Howard G. Zolla, Douglas W. Young, Bulent M. Basol
  • Patent number: 8323734
    Abstract: A Fabry-Perot filter is applied as a thin coating on a film, for example, a packaging film, and permits interesting color effects. The coating has a layered construction in which both reflecting layers of the filter may be made of aluminum and the intermediate layer between the reflecting layers may be made of aluminum oxide.
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: December 4, 2012
    Assignee: Applied Materials GmbH & Co. KG
    Inventors: Gerd Hoffmann, Rainer Ludwig, Hans-Georg Lotz, Gerhard Steiniger
  • Patent number: 8304019
    Abstract: Atomic layer deposition in a roll-to-roll manufacturing environment is disclosed. At least a portion of a substrate from a first roll is disposed in a chamber. A first atomic layer deposition (ALD) half reaction is performed on the portion of the substrate while the portion is within the chamber. A subsequent ALD half reaction may be performed on the same portion of the substrate to form a layer of material. Multiple ALD sequences may be performed by passing the substrate through a sequence of ALD reaction chambers or by passing the substrate through one or more ALD reaction chambers in a continuous loop.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: November 6, 2012
    Assignee: Nanosolar Inc.
    Inventor: Karl Pichler
  • Patent number: 8303714
    Abstract: The plasma CVD apparatus of the present invention comprises a pair of deposition rolls 2 and 3 disposed oppositely in parallel so that a substrate S wound thereon faces each other; a magnetic field generating member 12 and 13 provided inside each of the deposition rolls 2 and 3, which generates a magnetic field so as to converge plasma to the vicinity of a roll surface thereof facing a space 5 between the deposition rolls; a plasma power source 14 with polarity alternately reversing between one electrode and the other electrode; a gas supply pipe 8 for supplying a film-forming gas to the space 5; and evacuation means for evacuating the space. One electrode of the plasma power source 14 is connected to one deposition roll 2, and the other electrode thereof to the other deposition roll 3.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: November 6, 2012
    Assignee: Kobe Steel, Ltd.
    Inventor: Hiroshi Tamagaki
  • Patent number: 8298339
    Abstract: Apparatuses and methods are provided for the continuous, roll-to-roll formation of photovoltaic (PV) cells. Apparatuses include reel-to-reel transport chambers, one or more deposition chambers, a differential process isolation unit and a chamber for obtaining real time quality data, including IV data, yield data and uniformity data.
    Type: Grant
    Filed: August 4, 2009
    Date of Patent: October 30, 2012
    Assignee: Xunlight Corporation
    Inventors: Aarohi Vijh, Xinmin Cao, Bradley S. Mohring
  • Patent number: 8287645
    Abstract: In the production process of the present invention for high purity polycrystal silicon, using a vertical reactor having a silicon chloride gas-feeding nozzle and a reducing agent gas-feeding nozzle which are disposed at an upper part and a waste gas discharge pipe, a silicon chloride gas and a reducing agent gas are fed into the reactor to form polycrystal silicon at a tip part of the silicon chloride gas-feeding nozzle by the reaction of the silicon chloride gas with the reducing agent gas, and the polycrystal silicon is allowed to grow from the tip part of the silicon chloride gas-feeding nozzle toward a lower part thereof.
    Type: Grant
    Filed: January 25, 2011
    Date of Patent: October 16, 2012
    Assignee: JNC Corporation
    Inventors: Shuichi Honda, Minoru Yasueda, Satoshi Hayashida, Masatsugu Yamaguchi, Toru Tanaka
  • Publication number: 20120247388
    Abstract: The present inventions provide method and apparatus that employ constituents vaporized from one or more constituent supply source or sources to form one or more films of a precursor layer formed on a surface of a continuous flexible workpiece. Of particular significance is the implementation of vapor deposition systems that operate upon a horizontally disposed portion of a continuous flexible workpiece and a vertically disposed portion of a continuous flexible workpiece, preferably in conjunction with a short free-span zone of the portion of a continuous flexible workpiece.
    Type: Application
    Filed: January 3, 2012
    Publication date: October 4, 2012
    Inventors: Jorge Vasquez, James Freitag, Mustafa Pinarbasi
  • Publication number: 20120225218
    Abstract: The disclosed invention includes apparatus and methods that may be used for plasma-based deposition of thin layers of material on separate or continuous web substrates at very low temperatures with very low defect density. It achieves superior control of gas phase chemistry by controlling the sequence of introduction of gaseous components. It also has substantially independent control over the rate of chemical processes in the gas and of the amount of power and energy of ion bombardment. Such control enables high quality single and multi-layer films to be deposited cost effectively and uniformly over larger areas under very low temperature conditions.
    Type: Application
    Filed: January 10, 2012
    Publication date: September 6, 2012
    Applicant: PlasmaSi, Inc.
    Inventors: Stephen Edward Savas, Sai Mantripragada, Sooyun Joh, Allan B. Wiesnoski, Carl Galewski
  • Patent number: 8236107
    Abstract: A system that forms an alignment layer of a liquid crystal device has an applicator that applies an alignment layer of material on a substrate, a magnetic field generator that applies a magnetic field to directionally align the alignment layer material, and a firing device to fire the directionally aligned material.
    Type: Grant
    Filed: July 9, 2007
    Date of Patent: August 7, 2012
    Assignee: LG Display Co., Ltd.
    Inventors: Jae-Choon Ryu, Hao-Joon Son
  • Publication number: 20120180725
    Abstract: A cold wall type CVD apparatus that can enhance a raw material yield is provided. The CVD apparatus has a raw material gas jetting unit 11 for jetting raw material gas, a susceptor 14 for supporting a tape-shaped base material T and heating the tape-shaped base material T through heat transfer, a heater 15 for heating the susceptor 14, an inert gas introducing unit 12a for introducing inert gas to suppress the contact between the heater and the raw material gas, and a raw material gas transport passage LG for guiding the raw material gas jetted from the raw material gas jetting unit 11 to the surface of the tape-shaped base material.
    Type: Application
    Filed: January 17, 2012
    Publication date: July 19, 2012
    Applicant: FURUKAWA ELECTRIC CO., LTD.
    Inventors: Shinya Yasunaga, Masakiyo Ikeda, Hiroshi KIKUCHI, Noriyasu Sakurai, Ryusuke Nakasaki, Jin Liu, Satoshi Yamano
  • Publication number: 20120174864
    Abstract: The disclosed plasma CVD apparatus (1) is provided with a vacuum chamber (3); a pair of deposition rollers (2, 2) disposed within the vacuum chamber (3) that are connected to both poles of an AC power supply and around which a substrate (W) is wound; a gas-supplying device (5) that supplies process gas containing a source gas to a deposition zone (D) which is a portion of or all of the region that is on one side of a line linking the centers of rotation of the pair of deposition rollers (2, 2); and a magnetic-field-generating device (7) that, by means of the AC power supply being applied to each of the deposition rollers (2, 2), forms a magnetic field that causes the source gas in a predetermined region to become plasma. The magnetic-field-generating device (7) causes the source gas in the region adjacent to the surface of the portion of the pair of deposition rollers (2, 2) located within the deposition zone (D) to become plasma, forming a plasma region (P).
    Type: Application
    Filed: October 1, 2010
    Publication date: July 12, 2012
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
    Inventors: Hiroshi Tamagaki, Tadao Okimoto, Toshiki Segawa
  • Patent number: 8216375
    Abstract: A method and system for performing chemical vapor deposition are disclosed. A chemical vapor deposition reactor can have a generally rectangular chamber that is configured for cross flow and/or zone flow control of reactant gases therethrough. One reactant gas can be injected into the chamber from one end thereof to create cross flow. Another reactant gas can be injected through the top of the chamber. Inert gas can be injected into the chamber to enhance flow control. By providing cross flow and zone flow control, more uniform deposition can be obtained. Also, parameters such as gas flows are less coupled to one another and can therefore be more easily controlled.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: July 10, 2012
    Assignee: Bridgelux, Inc.
    Inventor: Heng Liu
  • Patent number: 8216370
    Abstract: A method for removing defects at high pressure and high temperature (HP/HT) or for relieving strain in a non-diamond crystal commences by providing a crystal, which contains defects, and a pressure medium. The crystal and the pressure medium are disposed in a high pressure cell and placed in a high pressure apparatus, for processing under reaction conditions of sufficiently high pressure and high temperature for a time adequate for one or more of removing defects or relieving strain in the single crystal.
    Type: Grant
    Filed: December 12, 2005
    Date of Patent: July 10, 2012
    Assignee: Momentive Performance Materials Inc.
    Inventors: Mark Philip D'Evelyn, Thomas Richard Anthony, Stephen Daley Arthur, Lionel Monty Levinson, John William Lucek, Larry Burton Rowland, Suresh Shankarappa Vagarali
  • Publication number: 20120160165
    Abstract: An apparatus for manufacturing a thin-film laminate prevents loosening of a strip-shaped flexible substrate at the time of conveying or misalignment of the strip-shaped flexible substrate with respect to a winding roller at the time of winding. In the apparatus, a strip-shaped flexible substrate in a lateral direction is conveyed by positioning longitudinally the width direction of the strip-shaped flexible substrate wound in a roll shape. The apparatus includes a deposition device having a deposition chamber for forming a thin film on the strip-shaped flexible substrate, a winding roll for winding a thin-film laminate, and an adjustment roller to prevent a loosening or misalignment of the strip-shaped flexible substrate between a pair of grip rollers and the winding roll, and the pair of grip rollers arranged in front of the adjustment roller to convey the thin-film laminate while maintaining a given height.
    Type: Application
    Filed: August 4, 2010
    Publication date: June 28, 2012
    Applicant: FUJI ELECTRIC CO., LTD
    Inventors: Masanori Nishizawa, Shoji Yokoyama, Takanori Yamada
  • Patent number: 8202366
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides spaced apart along the first and second precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between the first and second precursor zones and through the third precursor zone, it passes through a first series of flow-restricting passageways of a first isolation region interposed between the first and third precursor zones and a second series of flow-restricting passageways of a second isolation region interposed between the second and third precursor zones.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: June 19, 2012
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8192545
    Abstract: The present invention relates to a film formation apparatus including a first transfer chamber having a roller for sending a substrate, a film formation chamber having a discharging electrode, a buffer chamber provided between the transfer chamber and the film formation chamber or between the film formation chambers, a slit provided in a portion where the substrate comes in and out in the buffer chamber, and a second transfer chamber having a roller for rewinding the substrate. The slit is provided with at least one touch roller, and the touch roller is in contact with a film formation surface of the substrate. In addition, the present invention also relates to a method for forming a film and a method for manufacturing a photoelectric conversion device that are performed by using such a film formation apparatus.
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: June 5, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Yoshikazu Hiura, Hiroki Adachi, Hironobu Takahashi, Yuusuke Sugawara, Tatsuya Arao, Kazuo Nishi, Yasuyuki Arai
  • Patent number: 8192548
    Abstract: The invention relates to an arrangement for the coating of substrates, which comprises an evaporation source and a vapor barrier between the evaporation source and the substrate. The vapor barrier is maintained at a temperature which is at least equal to or above the vaporization temperature of the material to be vaporized. The vapor barrier is implemented as a quartz valve, which includes a spherical closure part connected with a movable rod. In a first position this spherical closure part closes a vapor conducting tube, which is connected with the evaporation source, and, in a second position, the spherical closure part abuts a spherical calotte which seals off a quartz tube.
    Type: Grant
    Filed: October 20, 2005
    Date of Patent: June 5, 2012
    Assignee: Applied Materials GmbH & Co. KG
    Inventors: Uwe Hoffmann, Manfred Schreil, Jose Manuel Dieguez-Campo, Marcus Bender
  • Patent number: 8187385
    Abstract: The conveying unit conveys a long sheet-like subject in its longitudinal direction. The conveying unit includes a stepped roller which has large-diameter portions spaced apart from each other in a direction perpendicular to a direction of conveyance of the sheet-like subject and having a larger diameter than a remainder of the stepped roller being a small-diameter portion of the stepped roller, the large-diameter portions supporting and conveying the sheet-like subject, a closed space forming subunit between the small-diameter portion of the stepped roller and the sheet-like subject and a gas supply subunit for supplying a gas to the closed space. The vacuum deposition device forms a film on a surface of a long substrate by vacuum deposition. The vacuum deposition device includes a vacuum chamber, a conveying device which includes the conveying unit and a film forming unit.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: May 29, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Masami Nakagame, Hiroyuki Nishida, Hideaki Takeuchi
  • Patent number: 8187386
    Abstract: Apparatus is generally provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic module substrate. The apparatus includes a distribution plate disposed below the distribution manifold and at a defined distance above a horizontal conveyance plane of an upper surface of a substrate conveyed through the apparatus. The distribution plate defines a pattern of passages therethrough configured to provide greater resistance to the flow of sublimated source vapors at a first longitudinal end than a second longitudinal end. A process for vapor deposition of a sublimated source material to form thin film on a photovoltaic module substrate is also provided via distributing the sublimated source material onto an upper surface of the substrates through a distribution plate positioned between the upper surface of the substrate and the receptacle.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: May 29, 2012
    Assignee: PrimeStar Solar, Inc.
    Inventor: Mark Jeffrey Pavol
  • Patent number: 8173477
    Abstract: Apparatuses and methods are provided for the continuous formation of solar cell material including an isolation chamber that reduces cross contamination between adjacent formation zones that are at different pressures.
    Type: Grant
    Filed: February 1, 2011
    Date of Patent: May 8, 2012
    Assignee: Xunlight Corporation
    Inventors: Xinmin Cao, Bradley S. Mohring
  • Publication number: 20120107487
    Abstract: A continuous roll-to-roll apparatus for providing a patterned deposit of a material onto a moving substrate web includes a payout station for feeding out a substrate web, a take-up station for taking up the substrate web, and a web transport system for advancing the web through the apparatus from the payout station to the take-up station. The apparatus includes at least one deposition station disposed between the payout station and the take-up station, and the deposition station is operative to deposit a material onto the web as it moves therethrough. The apparatus includes a masking system associated with a deposition station. The masking system is operative to dispose a deposition mask in registry with a portion of the length of the moving web. The deposition mask is comprised of a plurality of filaments which are aligned with the longitudinal axis of the web.
    Type: Application
    Filed: October 27, 2010
    Publication date: May 3, 2012
    Applicant: United Solar Ovonic LLC
    Inventors: Vincent Cannella, Raymond Crucet
  • Patent number: 8163090
    Abstract: A process and apparatus which form a solar cell absorber on a surface of a workpiece as the workpiece and a carrier are advanced through a rapid thermal processing (RTP) chamber. In one embodiment, the surface of the workpiece includes a precursor layer and an absorber constituent is disposed on the carrier. Initially an absorber constituent vapor can be formed in the RTP chamber by advancing the carrier into the RTP chamber to vaporize the absorber constituent from the carrier. The workpiece with the precursor layer is then moved into the RTP chamber to react the absorber constituent vapor and the precursor layer to form an absorber layer on the workpiece.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: April 24, 2012
    Assignee: SoloPower, Inc.
    Inventor: Bulent M. Basol
  • Patent number: 8142569
    Abstract: A method and an apparatus of the present invention is used for the high-rate deposition of materials, such as carbon, silicon, metals, metal oxides, and the like, onto a metal substrate defined by a metal tape. The particles of the material are mixed with fluid and are injected against the metal tape at high pressure and high velocity. The particles of the material form a current collection surface of the metal tape. The metal tape is used as cathode or anode combined with a separator to form a fuel cell of a secondary battery, metal-ceramic membranes, film composite metal-ceramic materials for electronic devices.
    Type: Grant
    Filed: November 20, 2006
    Date of Patent: March 27, 2012
    Assignees: Nanoener Technologies, Inc., Ener1, Inc.
    Inventors: Yevgen Kalynushkin, Peter Novak
  • Patent number: 8137464
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: March 20, 2012
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Patent number: 8128752
    Abstract: In one aspect, a roll-to-roll substrate transfer apparatus is provided that includes: a feed roll and a take-up roll between which a printed circuit board substrate extends; and a plurality of drive roller rows transmitting motive power to the substrate for moving the substrate in a transferring direction, each drive roller row of the plurality includes a roller axis arranged in a direction perpendicular to the transferring direction of the substrate, and a plurality of spaced-apart drive rollers on the roller axis, wherein drive rollers of one drive roller row are arranged in spaces between drive rollers of adjacent drive roller rows. In other aspects, a wet etching apparatus and an apparatus for manufacturing a printed circuit board that include the roll-to-roll substrate transfer apparatus are provided.
    Type: Grant
    Filed: December 23, 2008
    Date of Patent: March 6, 2012
    Assignee: Samsung Techwin Co., Ltd.
    Inventor: Deok-heung Kim
  • Patent number: 8123863
    Abstract: An evaporation apparatus is capable of preventing a sag phenomenon in a substrate. The evaporation apparatus includes a substrate supporting unit. The substrate supporting unit includes a substrate supporter for supporting side walls of a substrate in a chamber toward the same direction as an intake direction of the substrate entering the chamber; and a substrate-aiding supporter for supporting other side walls of the substrate that are not supported by the substrate supporter.
    Type: Grant
    Filed: September 4, 2008
    Date of Patent: February 28, 2012
    Assignee: Samsung Mobile Display Co., Ltd.
    Inventors: Kyung-Hoon Chung, Seuk-Hwan Park, Yoon-Sang Kwon
  • Patent number: 8117987
    Abstract: Methods and apparatus for hot wire chemical vapor deposition (HWCVD) are provided herein. In some embodiments, an inline HWCVD tool may include a linear conveyor for moving a substrate through the linear process tool; and a multiplicity of HWCVD sources, the multiplicity of HWCVD sources being positioned parallel to and spaced apart from the linear conveyor and configured to deposit material on the surface of the substrate as the substrate moves along the linear conveyor; wherein the substrate is coated by the multiplicity of HWCVD sources without breaking vacuum. In some embodiments, methods of coating substrates may include depositing a first material from an HWCVD source on a substrate moving through a first deposition chamber; moving the substrate from the first deposition chamber to a second deposition chamber; and depositing a second material from a second HWCVD source on the substrate moving through the second deposition chamber.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: February 21, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Dieter Haas, Pravin K. Narwankar, Randhir P. S. Thakur
  • Patent number: 8101054
    Abstract: A magnetic particle trapper for use in a sputtering system includes a roller cover plate having a plurality of openings arranged and dimensioned to accommodate a plurality of rollers associated with a mechanical transport mechanism of the sputtering system, and a plurality of magnets to trap magnetic particles, the plurality of magnets being attached to the roller cover plate in locations proximate to the plurality of openings.
    Type: Grant
    Filed: May 28, 2009
    Date of Patent: January 24, 2012
    Assignee: WD Media, Inc.
    Inventors: Jinliang Chen, Kinya Nippa